Nothing Special   »   [go: up one dir, main page]

CN115497965A - Image sensor, manufacturing method thereof, and method for detecting crosstalk and halo between adjacent pixels of image sensor - Google Patents

Image sensor, manufacturing method thereof, and method for detecting crosstalk and halo between adjacent pixels of image sensor Download PDF

Info

Publication number
CN115497965A
CN115497965A CN202110670617.4A CN202110670617A CN115497965A CN 115497965 A CN115497965 A CN 115497965A CN 202110670617 A CN202110670617 A CN 202110670617A CN 115497965 A CN115497965 A CN 115497965A
Authority
CN
China
Prior art keywords
pixel
light
shielding layer
image sensor
shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110670617.4A
Other languages
Chinese (zh)
Inventor
郑展
张浩然
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Galaxycore Shanghai Ltd Corp
Original Assignee
Galaxycore Shanghai Ltd Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Galaxycore Shanghai Ltd Corp filed Critical Galaxycore Shanghai Ltd Corp
Priority to CN202110670617.4A priority Critical patent/CN115497965A/en
Publication of CN115497965A publication Critical patent/CN115497965A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/802Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
    • H10F39/8023Disposition of the elements in pixels, e.g. smaller elements in the centre of the imager compared to larger elements at the periphery
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011Manufacture or treatment of image sensors covered by group H10F39/12
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/024Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/805Coatings
    • H10F39/8057Optical shielding

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

本发明提供一种图像传感器及其制备方法、以及图像传感器相邻像素间的串扰、光晕的检测方法,图像传感器包括:由像素单元组成的像素阵列,所述像素阵列包括用于感光的感光像素区域和用于校准的黑像素区域;在所述感光像素区域和\或黑像素区域表面,覆盖有不连续的遮光层,以阻挡光线射入,其中,被所述遮光层覆盖的像素单元为遮光像素单元,未被所述遮光层覆盖的像素单元为非遮光像素单元。通过将黑像素区域的遮光层设计为不连续的,可以缓解应力、工艺损伤等,减少黑像素区域和感光像素区域的性能差异,实现更好的黑电平校准;通过不连续遮光层的设计,可以实现单色像素以及未完成颜料工艺的像素间的光晕、串扰测试。

Figure 202110670617

The invention provides an image sensor and its preparation method, and a method for detecting crosstalk and halo between adjacent pixels of the image sensor. The image sensor includes: a pixel array composed of pixel units, and the pixel array includes a photosensitive The pixel area and the black pixel area used for calibration; on the surface of the photosensitive pixel area and/or the black pixel area, a discontinuous light-shielding layer is covered to block the light from entering, wherein the pixel unit covered by the light-shielding layer is a light-shielding pixel unit, and the pixel unit not covered by the light-shielding layer is a non-light-shielding pixel unit. By designing the light-shielding layer of the black pixel area to be discontinuous, stress and process damage can be relieved, the performance difference between the black pixel area and the photosensitive pixel area can be reduced, and better black level calibration can be achieved; through the design of the discontinuous light-shielding layer , which can realize the halo and crosstalk test between monochrome pixels and pixels with unfinished pigment process.

Figure 202110670617

Description

图像传感器及其制备方法、以及图像传感器相邻像素间的串 扰、光晕的检测方法Image sensor and manufacturing method thereof, and serial connection between adjacent pixels of the image sensor Interference and halo detection method

技术领域technical field

本发明涉及图像传感器技术领域,尤其涉及一种图像传感器及其制备方法、以及图像传感器相邻像素间的串扰、光晕的检测方法。The present invention relates to the technical field of image sensors, in particular to an image sensor and a preparation method thereof, and a method for detecting crosstalk and halo between adjacent pixels of the image sensor.

背景技术Background technique

在图像传感器中,具有感光像素阵列和黑像素阵列,黑像素阵列表面覆有遮光层,黑像素阵列用于通过统计黑电平值以校准感光像素阵列的感光像素信号。但黑像素阵列比感光像素阵列多了遮光层,会引入应力、工艺损伤等差异,从而导致黑像素阵列的黑电平与感光像素阵列的黑电平有偏差,导致黑电平校准无法有效地消除黑电平噪声,影响了图像信噪比。In the image sensor, there is a photosensitive pixel array and a black pixel array, the surface of the black pixel array is covered with a light-shielding layer, and the black pixel array is used to calibrate the photosensitive pixel signal of the photosensitive pixel array by counting the black level value. However, the black pixel array has more light-shielding layers than the photosensitive pixel array, which will introduce differences such as stress and process damage, resulting in a deviation between the black level of the black pixel array and the black level of the photosensitive pixel array, resulting in ineffective black level calibration. Eliminate black level noise, which affects the image signal-to-noise ratio.

图像传感器的像素间串扰(Cross Talk)、光晕(Blooming)是像素设计的重要技术指标,对成像性能有显著影响。Inter-pixel crosstalk (Cross Talk) and halo (Blooming) of image sensors are important technical indicators of pixel design, which have a significant impact on imaging performance.

对于具有彩色滤光片的图像传感器来说,测试串扰或光晕的方法是:照射像素,通过检测目标像素与相邻像素的亮度数值,计算得到串扰、光晕数据。For an image sensor with a color filter, the method for testing crosstalk or halo is: illuminate the pixel, and calculate the crosstalk and halo data by detecting the brightness values of the target pixel and adjacent pixels.

如图1所示,现有的彩色滤光片按照RGGB的方式进行排列,其中,R代表覆有红色滤光片的像素单元,B代表覆有蓝色滤光膜的像素单元,G1(2)代表覆有绿色滤光膜的像素单元。在现有技术中,对于具有彩色滤光片的图像传感器的像素间的串扰、光晕测试,通常采用绿色光对像素区域进行照射,并分别采集像素单元G1、G2、B、R内的亮度数值,形成如图2所示的亮度-曝光时间关系图,其中,k G1为像素单元G1的亮度斜率,k G2为像素单元G2的亮度斜率,kRa、kRb为像素单元R的亮度斜率,kBa、kBb为像素单元B的亮度斜率。As shown in Figure 1, the existing color filters are arranged in an RGGB manner, wherein R represents a pixel unit covered with a red filter, B represents a pixel unit covered with a blue filter film, and G1 (2 ) represents a pixel unit covered with a green filter film. In the prior art, for crosstalk and halo tests between pixels of image sensors with color filters, green light is usually used to irradiate the pixel area, and the brightness in the pixel units G1, G2, B, and R are respectively collected. value, forming the brightness-exposure time relationship graph shown in Figure 2, wherein k G1 is the brightness slope of the pixel unit G1, k G2 is the brightness slope of the pixel unit G2, and k R a and k R b are the brightness of the pixel unit R. Brightness slope, k B a, k B b is the brightness slope of pixel unit B.

像素单元G1及G2对像素单元R的串扰数值为kRa*2/(k G1+ k G2);像素单元G1及G2对像素单元R的光晕数值为kRb*2/(k G1+ k G2)- kRa*2/(k G1+ k G2)。The crosstalk value of pixel unit G1 and G2 to pixel unit R is k R a*2/(k G1 + k G2 ); the halo value of pixel unit G1 and G2 to pixel unit R is k R b*2/(k G1 + k G2 ) - k R a*2/(k G1 + k G2 ).

而对于单色图像传感器或未进行颜料工艺的图像传感器来说,无法通过不同颜色得到串扰数据,不能及时、准确的评估串扰(Cross Talk)、光晕(Blooming)对最终图像效果的影响,会增加像素优化的成本和周期。For monochrome image sensors or image sensors without pigment processing, crosstalk data cannot be obtained through different colors, and the influence of crosstalk and blooming on the final image cannot be evaluated in a timely and accurate manner. Increase the cost and cycle of pixel optimization.

发明内容Contents of the invention

本发明的目的在于提供一种图像传感器及其制备方法、以及图像传感器相邻像素间的串扰、光晕的检测方法,用于缓解应力、工艺损伤等,实现更好的黑电平校准,并能够测试图像传感器相邻像素间的串扰或光晕数值。The purpose of the present invention is to provide an image sensor and its preparation method, as well as a method for detecting crosstalk and halo between adjacent pixels of the image sensor, which are used to alleviate stress, process damage, etc., to achieve better black level calibration, and Ability to test crosstalk or halo values between adjacent pixels of an image sensor.

基于以上考虑,本发明提供一种图像传感器,包括由像素单元组成的像素阵列,所述像素阵列包括用于感光的感光像素区域和用于校准的黑像素区域;Based on the above considerations, the present invention provides an image sensor, including a pixel array composed of pixel units, the pixel array includes a photosensitive pixel area for light sensing and a black pixel area for calibration;

在所述感光像素区域和\或黑像素区域表面,覆盖有不连续的遮光层,以阻挡光线射入,其中,被所述遮光层覆盖的像素单元为遮光像素单元,未被所述遮光层覆盖的像素单元为非遮光像素单元。The surface of the photosensitive pixel area and/or the black pixel area is covered with a discontinuous light-shielding layer to block light from entering, wherein the pixel unit covered by the light-shielding layer is a light-shielding pixel unit, and the pixel unit not covered by the light-shielding layer The covered pixel units are non-shading pixel units.

可选地,与某一非遮光像素单元相邻的其他像素单元全部为遮光像素单元。Optionally, other pixel units adjacent to a certain non-shading pixel unit are all light-shielding pixel units.

可选地,确定某两个顶点相连的遮光像素单元,共用该顶点的另外两个像素单元为非遮光像素单元。Optionally, determine the light-shielding pixel units that are connected to certain two vertices, and the other two pixel units that share the vertices are non-light-shielding pixel units.

可选地,在所述黑像素区域表面,覆盖的遮光层为不连续的,以缓解遮光层对黑像素区域内的像素单元的应力及工艺损伤。Optionally, on the surface of the black pixel region, the covered light-shielding layer is discontinuous, so as to alleviate the stress and process damage of the light-shielding layer on the pixel units in the black pixel region.

可选地,所述遮光层为金属或有机遮光材料。Optionally, the light-shielding layer is metal or organic light-shielding material.

本发明还提供一种图像传感器的制备方法,包括步骤:The present invention also provides a method for preparing an image sensor, comprising the steps of:

提供由像素单元组成的像素阵列,所述像素阵列包括用于感光的感光像素区域和用于校准的黑像素区域;providing a pixel array composed of pixel units, the pixel array including a light-sensing pixel area for light-sensing and a black pixel area for calibration;

于所述感光像素区域和\或黑像素区域表面,形成不连续的遮光层,以阻挡光线射入。A discontinuous light-shielding layer is formed on the surface of the photosensitive pixel area and/or the black pixel area to block light from entering.

可选地,于所述感光像素区域和\或黑像素区域表面,形成不连续的遮光层的方法包括:在像素阵列表面,沉积遮光层;Optionally, the method for forming a discontinuous light-shielding layer on the surface of the photosensitive pixel area and/or the black pixel area includes: depositing a light-shielding layer on the surface of the pixel array;

通过光刻、刻蚀工艺去除部分遮光层,于所述感光像素区域和\或黑像素区域表面,形成不连续的遮光层。Part of the light-shielding layer is removed by photolithography and etching, and a discontinuous light-shielding layer is formed on the surface of the photosensitive pixel area and/or the black pixel area.

可选地,在像素阵列内,去除某一像素单元表面的遮光层,保留与该像素单元相邻的其他像素单元表面的遮光层。Optionally, in the pixel array, the light-shielding layer on the surface of a certain pixel unit is removed, and the light-shielding layer on the surface of other pixel units adjacent to the pixel unit remains.

可选地,在像素阵列内,去除某两个顶点相连的像素单元表面的遮光层,保留共用该顶点的另外两个像素单元表面的遮光层。Optionally, in the pixel array, the light-shielding layer on the surface of the pixel unit where two vertices are connected is removed, and the light-shielding layer on the surface of the other two pixel units sharing the vertex is retained.

本发明还提供一种图像传感器相邻像素间的串扰、光晕的检测方法,图像传感器包括由多个像素单元组成的像素阵列;在像素阵列表面,形成不连续的遮光层,以阻止光线射入,被遮光层覆盖的像素单元为遮光像素单元,未被遮光层覆盖的像素单元为非遮光像素单元;The present invention also provides a method for detecting crosstalk and halo between adjacent pixels of an image sensor. The image sensor includes a pixel array composed of a plurality of pixel units; a discontinuous light-shielding layer is formed on the surface of the pixel array to prevent light In, the pixel unit covered by the light-shielding layer is a light-shielding pixel unit, and the pixel unit not covered by the light-shielding layer is a non-light-shielding pixel unit;

对像素阵列进行光照射,分别测得遮光像素单元及与所述遮光像素单元相邻的非遮光像素单元的亮度数值,并进行计算,得到像素单元间的串扰或光晕数据。The pixel array is irradiated with light, and the luminance values of the shading pixel unit and the non-shading pixel unit adjacent to the shading pixel unit are respectively measured and calculated to obtain crosstalk or halo data between the pixel units.

可选地,在像素阵列内选取某一像素单元为非遮光像素单元,将与该非遮光像素单元相邻的其他像素单元全部设置为遮光像素单元。Optionally, a certain pixel unit in the pixel array is selected as a non-shading pixel unit, and all other pixel units adjacent to the non-shielding pixel unit are set as light-shielding pixel units.

可选地,在像素阵列内,选取某两个顶点相连的像素单元为非遮光像素单元,将共用该顶点的另外两个像素单元设置为遮光像素单元。Optionally, in the pixel array, a pixel unit with two connected vertices is selected as a non-shading pixel unit, and the other two pixel units sharing the vertex are set as a light-shielding pixel unit.

可选地,应用于彩色图像传感器制造过程中未进行颜料工艺阶段时像素单元间的串扰或光晕测试。Optionally, it is applied to the crosstalk or halo test between pixel units when the pigment process stage is not performed in the color image sensor manufacturing process.

可选地,应用于单色图像传感器像素单元间的串扰或光晕测试。Optionally, it is applied to the crosstalk or halo test between the pixel units of the monochrome image sensor.

本发明提供的图像传感器及其制备方法、以及图像传感器相邻像素间的串扰、光晕的检测方法,具有以下有益效果:The image sensor and its preparation method provided by the present invention, as well as the crosstalk and halo detection method between adjacent pixels of the image sensor, have the following beneficial effects:

通过将黑像素区域的遮光层设计为不连续的,可以缓解应力、工艺损伤等,减少黑像素区域和感光像素区域的性能差异,实现更好的黑电平校准;By designing the light-shielding layer in the black pixel area to be discontinuous, it can relieve stress, process damage, etc., reduce the performance difference between the black pixel area and the photosensitive pixel area, and achieve better black level calibration;

通过不连续遮光层的设计,可以实现单色像素以及未完成颜料工艺的像素间的光晕、串扰测试;Through the design of the discontinuous shading layer, the halo and crosstalk test between monochrome pixels and pixels with unfinished pigment process can be realized;

不连续的遮光层设计可以摆放在黑像素区域,在使用现有的遮光层的基础上,做到在不增加设计成本,不增加设计面积,实现像素间的光晕、串扰测试;针对某些特殊阶段(如背照式芯片的前照工艺阶段测试)也可以增加遮光层来实现不连续遮光层的设计,以便进行像素间的光晕测试。The discontinuous light-shielding layer design can be placed in the black pixel area. On the basis of using the existing light-shielding layer, the halo and crosstalk test between pixels can be realized without increasing the design cost and design area; In some special stages (such as the front-illumination process stage test of the back-illuminated chip), the light-shielding layer can also be added to realize the design of the discontinuous light-shielding layer, so as to perform the halo test between pixels.

附图说明Description of drawings

通过参照附图阅读以下所作的对非限制性实施例的详细描述,本发明的其它特征、目的和优点将会变得更明显。Other features, objects and advantages of the present invention will become more apparent by reading the following detailed description of non-limiting embodiments with reference to the accompanying drawings.

图1显示为现有的彩色像素阵列的示意图;FIG. 1 is a schematic diagram of an existing color pixel array;

图2显示为现有的彩色像素阵列的亮度-曝光时间的关系图;Fig. 2 shows the relationship diagram of the brightness-exposure time of the existing color pixel array;

图3显示为本发明提供的像素阵列的示意图;Fig. 3 shows the schematic diagram of the pixel array provided for the present invention;

图4显示为本发明提供的另一实施例的像素阵列的示意图;FIG. 4 shows a schematic diagram of a pixel array according to another embodiment of the present invention;

图5显示为本发明提供的像素阵列的亮度-曝光时间的关系图。FIG. 5 is a graph showing the relationship between brightness and exposure time of the pixel array provided by the present invention.

在图中,贯穿不同的示图,相同或类似的附图标记表示相同或相似的装置(模块)或步骤。In the drawings, the same or similar reference numerals denote the same or similar means (modules) or steps throughout different views.

具体实施方式detailed description

在下面的描述中阐述了很多具体细节以便于充分理解本发明。但是本发明能够以很多不同于在此描述的其它方式来实施,本领域技术人员可以在不违背本发明内涵的情况下做类似推广,因此本发明不受下面公开的具体实施的限制。In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention can be implemented in many other ways different from those described here, and those skilled in the art can make similar extensions without violating the connotation of the present invention, so the present invention is not limited by the specific implementations disclosed below.

其次,本发明利用示意图进行详细描述,在详述本发明实施例时,为便于说明,所述示意图只是实例,其在此不应限制本发明保护的范围。Secondly, the present invention is described in detail by means of schematic diagrams. When describing the embodiments of the present invention in detail, for convenience of explanation, the schematic diagrams are only examples, which should not limit the protection scope of the present invention.

以下结合附图通过具体实施例,对本发明的技术方案进行详细描述。The technical solutions of the present invention will be described in detail below through specific embodiments in conjunction with the accompanying drawings.

本发明提供一种图像传感器及其制备方法,在感光像素阵列或黑像素阵列、或者在感光像素阵列及黑像素阵列之上,覆盖有不连续的遮光层。形成不连续的遮光层,能够减少遮光层对像素阵列的应力。The invention provides an image sensor and a preparation method thereof. A discontinuous light-shielding layer is covered on the light-sensitive pixel array or the black pixel array, or on the light-sensitive pixel array and the black pixel array. Forming a discontinuous light-shielding layer can reduce the stress of the light-shielding layer on the pixel array.

以下结合附图对本实施例提供的技术方案进行详细描述。The technical solution provided by this embodiment will be described in detail below in conjunction with the accompanying drawings.

如图3所示,本实施例提供一种图像传感器,包括由像素单元组成的像素阵列,以8*8的像素阵列10作为示例。像素阵列10包括由上至下的第101行、102行、103行、104行、105行、106行、107行、108行及由左至右的第a列、第b列、第c列、第d列、第e列、第f列、第g列、第h列组成。像素阵列10包括用于感光的感光像素区域11及位于感光像素区域11周围的、用于校准的黑像素区域12。黑像素区域可以摆放在感光像素区域周围的任意位置。As shown in FIG. 3 , this embodiment provides an image sensor, including a pixel array composed of pixel units, taking an 8*8 pixel array 10 as an example. The pixel array 10 includes row 101, row 102, row 103, row 104, row 105, row 106, row 107, row 108 from top to bottom and column a, column b and column c from left to right , column d, column e, column f, column g, column h. The pixel array 10 includes a light-sensing pixel area 11 for light-sensing and a black pixel area 12 around the light-sensing pixel area 11 for calibration. The black pixel area can be placed anywhere around the photosensitive pixel area.

在感光像素区域11或黑像素区域12又或感光像素区域11和黑像素区域12表面,覆盖有不连续的遮光层,遮光层用于阻挡光线射入。被遮光层覆盖的像素单元为遮光像素单元,未被遮光层覆盖的像素单元为非遮光像素单元。The surface of the photosensitive pixel area 11 or the black pixel area 12 or the surface of the photosensitive pixel area 11 and the black pixel area 12 is covered with a discontinuous light-shielding layer, which is used to block light from entering. The pixel unit covered by the light-shielding layer is a light-shielding pixel unit, and the pixel unit not covered by the light-shielding layer is a non-light-shielding pixel unit.

在本实施例中,黑像素区域12表面具有不连续的遮光层131,其中,像素单元101e、102a 、102b、102d、102g为非遮光像素单元。通过将黑像素区域12的遮光层131设计为不连续的,在现有的遮光层的基础上,将遮光层打断,可以缓解由遮光层带来的对黑像素区域的应力、工艺损伤等,减少黑像素区域和感光像素区域的性能差异,实现更好的黑电平校准。In this embodiment, the surface of the black pixel region 12 has a discontinuous light-shielding layer 131, wherein the pixel units 101e, 102a, 102b, 102d, and 102g are non-shielding pixel units. By designing the light-shielding layer 131 of the black pixel region 12 to be discontinuous, on the basis of the existing light-shielding layer, interrupting the light-shielding layer can alleviate the stress and process damage to the black pixel region caused by the light-shielding layer. , to reduce the performance difference between the black pixel area and the light-sensitive pixel area, and achieve better black level calibration.

还有,非遮光像素单元102g周围的像素单元,全部被遮光层131覆盖,这种结构不仅可以缓解遮光层带来的应力,还可以用于进行像素间的串扰、光晕测试。或者将像素单元101e、102d为非遮光像素单元,与像素单元101e、102d共用顶点的像素单元101d、102e为遮光像素单元,这种结构也可以用于串扰或光晕测试。具体的,通过对像素阵列进行光照射,分别测得遮光像素单元及与遮光像素单元相邻的非遮光像素单元的亮度数值,并进行计算,得到像素单元间的串扰或光晕数据。在使用现有的遮光层的基础上,选取非遮光像素单元,能够做到不增加设计成本、不增加设计面积的条件下,进行串扰或光晕测试。In addition, the pixel units around the non-shading pixel unit 102g are all covered by the light-shielding layer 131. This structure can not only relieve the stress caused by the light-shielding layer, but also be used for crosstalk and halo tests between pixels. Alternatively, the pixel units 101e and 102d are non-shading pixel units, and the pixel units 101d and 102e that share vertices with the pixel units 101e and 102d are light-shielding pixel units. This structure can also be used for crosstalk or halo testing. Specifically, by irradiating the pixel array with light, the luminance values of the shading pixel unit and the non-shading pixel unit adjacent to the shading pixel unit are respectively measured and calculated to obtain crosstalk or halo data between pixel units. On the basis of using the existing light-shielding layer and selecting non-shading pixel units, it is possible to perform crosstalk or halo tests without increasing the design cost and design area.

在本实施例中,在感光像素区域11内,具有不连续的遮光层132,其中,像素单元104d、105c为遮光像素单元,与像素单元104d、105c共用顶点的像素单元104c、105d为非遮光像素单元,这种结构可以用于串扰或光晕测试。或者将非遮光像素单元107g的周围的像素单元,全部被遮光层132覆盖,这种结构也可以用于串扰或光晕测试。具体的,通过对像素阵列进行光照射,分别测得遮光像素单元及与遮光像素单元相邻的非遮光像素单元的亮度数值,并进行计算,得到像素单元间的串扰或光晕数据。In this embodiment, in the photosensitive pixel area 11, there is a discontinuous light-shielding layer 132, wherein the pixel units 104d and 105c are light-shielding pixel units, and the pixel units 104c and 105d sharing vertices with the pixel units 104d and 105c are non-light-shielding Pixel unit, this structure can be used for crosstalk or halo test. Alternatively, the surrounding pixel units of the non-shading pixel unit 107g are all covered by the light-shielding layer 132, and this structure can also be used for crosstalk or halo testing. Specifically, by irradiating the pixel array with light, the luminance values of the shading pixel unit and the non-shading pixel unit adjacent to the shading pixel unit are respectively measured and calculated to obtain crosstalk or halo data between pixel units.

不连续遮光层的设置还具有其他形式,不限于图3所示的形式,具体形式不做限制。The arrangement of the discontinuous light-shielding layer also has other forms, not limited to the form shown in FIG. 3 , and the specific form is not limited.

需要说明的是,遮光层可以覆盖多个完整的像素单元或者像素单元的部分。在其他的实施例中,如图4所示,遮光层131’、132’覆盖像素单元101e’、101f’、102f’、103f’、105e’、106d’的部分。It should be noted that the light-shielding layer may cover multiple complete pixel units or parts of pixel units. In other embodiments, as shown in FIG. 4 , the light shielding layers 131', 132' cover part of the pixel units 101e', 101f', 102f', 103f', 105e', 106d'.

遮光层的材料为金属或有机遮光材料。The material of the light-shielding layer is metal or organic light-shielding material.

本发明还提供一种图像传感器的制备方法,包括步骤:提供由像素单元组成的像素阵列,所述像素阵列包括用于感光的感光像素区域和用于校准的黑像素区域;The present invention also provides a method for preparing an image sensor, comprising the steps of: providing a pixel array composed of pixel units, the pixel array including a photosensitive pixel area for light sensing and a black pixel area for calibration;

于所述感光像素区域和\或黑像素区域表面,形成不连续的遮光层,以阻挡光线射入。A discontinuous light-shielding layer is formed on the surface of the photosensitive pixel area and/or the black pixel area to block light from entering.

具体的,参照图3,形成不连续的遮光层的方法包括:在像素阵列表面,沉积遮光层;Specifically, referring to FIG. 3 , the method for forming a discontinuous light-shielding layer includes: depositing a light-shielding layer on the surface of the pixel array;

通过光刻、刻蚀工艺去除部分遮光层,于感光像素区域11表面或黑像素区域12表面又或感光像素区域11和黑像素区域 12的表面,形成不连续的遮光层。Part of the light-shielding layer is removed by photolithography and etching, and a discontinuous light-shielding layer is formed on the surface of the photosensitive pixel area 11 or the surface of the black pixel area 12 or the surfaces of the photosensitive pixel area 11 and the black pixel area 12 .

作为示例,在像素阵列内,通过去除像素单元102g或107g表面的遮光层,保留与像素单元102g或107g相邻的其他像素单元表面的遮光层,得到不连续的遮光层13。As an example, in the pixel array, the discontinuous light-shielding layer 13 is obtained by removing the light-shielding layer on the surface of the pixel unit 102g or 107g and retaining the light-shielding layer on the surface of other pixel units adjacent to the pixel unit 102g or 107g.

作为示例,在像素阵列内,通过去除两个顶点相连的像素单元104c、105d表面的遮光层,保留共用该顶点的另外两个像素单元104d、105c表面的遮光层,得到不连续的遮光层13。As an example, in the pixel array, the discontinuous light-shielding layer 13 is obtained by removing the light-shielding layer on the surface of two pixel units 104c and 105d that are connected at the same vertex, and retaining the light-shielding layer on the surface of the other two pixel units 104d and 105c that share the vertex. .

不连续遮光层的设置还具有其他形式,在此不做限制。The setting of the discontinuous light-shielding layer also has other forms, which are not limited here.

本发明还提供一种图像传感器相邻像素间的串扰、光晕的检测方法,主要步骤为:The present invention also provides a method for detecting crosstalk and halo between adjacent pixels of an image sensor, the main steps of which are as follows:

图像传感器包括由多个像素单元组成的像素阵列;The image sensor includes a pixel array composed of a plurality of pixel units;

在像素阵列表面,形成不连续的遮光层,以阻止光线射入,被遮光层覆盖的像素单元为遮光像素单元,未被遮光层覆盖的像素单元为非遮光像素单元;On the surface of the pixel array, a discontinuous light-shielding layer is formed to prevent light from entering, the pixel units covered by the light-shielding layer are light-shielding pixel units, and the pixel units not covered by the light-shielding layer are non-light-shielding pixel units;

对像素阵列进行光照射,分别测得遮光像素单元及与所述遮光像素单元相邻的非遮光像素单元的亮度数值,并进行计算,得到像素单元间的串扰或光晕数据。The pixel array is irradiated with light, and the luminance values of the shading pixel unit and the non-shading pixel unit adjacent to the shading pixel unit are respectively measured and calculated to obtain crosstalk or halo data between the pixel units.

对于无彩色滤光片的像素单元之间的光晕或串扰测试,通过设置不连续的遮光层,得到遮光像素单元及非遮光像素单元,通过将测试得到的遮光像素单元及与遮光像素单元相邻的非遮光像素单元的亮度进行分析处理,从而得到串扰或光晕数值。该方法可应用于单色图像传感器或彩色图像传感器制造过程中未进行颜料工艺阶段时像素单元间的串扰或光晕测试。For the halo or crosstalk test between the pixel units of the achromatic filter, by setting a discontinuous light-shielding layer, the light-shielding pixel unit and the non-light-shielding pixel unit are obtained, and the light-shielding pixel unit and the light-shielding pixel unit obtained by the test are compared with the light-shielding pixel unit The brightness of adjacent non-shading pixel units is analyzed and processed to obtain crosstalk or halo values. The method can be applied to the crosstalk or halo test between pixel units when the pigment process stage is not performed in the manufacturing process of the monochrome image sensor or the color image sensor.

为了得到更精确的像素串扰或光晕数据,从像素区域中确定某一个像素单元,将与该像素单元相邻的其他像素单元全部设计为遮光像素单元,从而精确得到该像素单元对周围相邻像素单元的串扰或光晕数值。In order to obtain more accurate pixel crosstalk or halo data, a certain pixel unit is determined from the pixel area, and all other pixel units adjacent to the pixel unit are designed as light-shielding pixel units, so as to accurately obtain the pixel unit’s surrounding neighbors. The crosstalk or halo value of the pixel unit.

作为示例,如图3所示,以8*8的像素阵列10作为示例。选定像素单元102g或107g,将围绕像素单元102g或107g周围的像素单元全部设计为遮光像素单元。对像素区域进行光照摄,得到像素单元102g或107g及其周边黑像素单元的亮度数值,并进行计算,得到像素单元102g或107g对其周边任一像素单元的串扰或光晕数值。As an example, as shown in FIG. 3 , an 8*8 pixel array 10 is taken as an example. Select the pixel unit 102g or 107g, and design all the pixel units surrounding the pixel unit 102g or 107g as light-shielding pixel units. The pixel area is illuminated to obtain the brightness value of the pixel unit 102g or 107g and its surrounding black pixel units, and is calculated to obtain the crosstalk or halo value of the pixel unit 102g or 107g to any surrounding pixel unit.

具体的,以检测像素单元107g对其相邻的106h的串扰或光晕数值作为示例。对像素区域进行光照射,并分别采集像素单元107g、106h内的亮度数值,形成如图5所示的亮度-曝光时间关系图,其中,kg为像素单元107g的亮度斜率,kha、khb为像素单元106h的亮度斜率。Specifically, the detection of the crosstalk or halo value of the pixel unit 107g to its adjacent 106h is taken as an example. The pixel area is irradiated with light, and the luminance values in the pixel units 107g and 106h are respectively collected to form a luminance-exposure time relationship diagram as shown in FIG. k h b is the brightness slope of the pixel unit 106h.

像素单元107g对像素单元106h的串扰数值为kha/kg;像素单元107g对像素单元106h的光晕数值为khb/kg- kha/kgThe crosstalk value of the pixel unit 107g to the pixel unit 106h is k h a/k g ; the halo value of the pixel unit 107g to the pixel unit 106h is k h b/ kg − k h a/k g .

同样的,也可以利用此方法测出像素单元102g对其周围的像素单元的光晕或串扰数值。Similarly, this method can also be used to measure the halo or crosstalk value of the pixel unit 102g to its surrounding pixel units.

对于彩色图像传感器来说,通常滤光片是以RGGB的方式排布,为了更早的发现像素间串扰或光晕的问题,可以在未进行颜料工艺,或未形成彩色滤光片阶段时对像素单元间的串扰或光晕进行测试。For color image sensors, the filters are usually arranged in the form of RGGB. In order to find the problem of crosstalk or halo between pixels earlier, it can be used when the pigment process is not performed or the color filter stage is not formed. Crosstalk or halo between pixel units is tested.

具体的,如图3所示,在像素区域内,确定两个顶点相连的像素单元101e、102d,将共用该顶点的另外两个像素单元101b、102e作为遮光像素单元,对像素区域进行光照射,分别测得遮光像素单元101d、102e及非遮光像素单元101e、102d的亮度数值,并进行计算,从而得到像素单元101e、102d对相邻像素单元的串扰或光晕数值,具体计算过程如现有技术中像素单元G1及G2对像素单元R的串扰和光晕的计算方式相同。Specifically, as shown in FIG. 3 , in the pixel region, two pixel units 101e and 102d connected to each other are determined, and the other two pixel units 101b and 102e sharing the vertices are used as light-shielding pixel units to irradiate the pixel region with light. , the luminance values of the light-shielding pixel units 101d, 102e and the non-shading pixel units 101e, 102d are respectively measured and calculated, so as to obtain the crosstalk or halo value of the pixel units 101e, 102d to adjacent pixel units. The specific calculation process is as follows In the prior art, the crosstalk and halo of the pixel unit G1 and G2 to the pixel unit R are calculated in the same way.

同样的,像素单元104c、105d对相邻像素单元的串扰或光晕数值,也可以用同样的方法获得。Similarly, the crosstalk or halo values of the pixel units 104c and 105d to adjacent pixel units can also be obtained by the same method.

遮光像素单元与非遮光像素单元的设置不限于图3所示的这两种形式,还可以根据需要进行其他形式的设置,在此不做限制。The setting of light-shielding pixel units and non-light-shielding pixel units is not limited to the two forms shown in FIG. 3 , and other forms of setting can also be performed as required, which is not limited here.

需要说明的是,对于像素阵列中具有感光像素区域及黑像素区域的,可以优先考虑将测试串扰或光晕的不连续遮光层设置于黑像素区域,这样可以利用现有的遮光层,在不能增加设计成本及设计面积的情况下,就可以完成光晕或串扰的测试。It should be noted that, for pixel arrays with light-sensitive pixel areas and black pixel areas, it is possible to give priority to setting the discontinuous light-shielding layer for testing crosstalk or halo in the black pixel area, so that the existing light-shielding layer can be used, and when it is not possible In the case of increasing the design cost and design area, the test of halo or crosstalk can be completed.

针对某些特殊阶段(如背照式芯片的前照工艺阶段测试)也可以通过增加遮光层来实现不连续遮光层的设计,以便进行像素间串扰或光晕的测试。For some special stages (such as the front-illumination process stage test of the back-illuminated chip), the design of the discontinuous light-shielding layer can also be realized by adding a light-shielding layer, so as to test the crosstalk or halo between pixels.

综上所述,本发明提供一种图像传感器及其制备方法、以及图像传感器相邻像素间的串扰、光晕的检测方法,通过将黑像素区域的遮光层设计为不连续的,可以缓解应力、工艺损伤等,减少黑像素区域和感光像素区域的性能差异,实现更好的黑电平校准;通过不连续遮光层的设计,可以实现单色像素以及未完成颜料工艺的像素间的光晕、串扰测试;不连续的遮光层设计可以摆放在黑像素区域,可以使用现有的遮光层,做到在不增加设计成本,不增加设计面积的情况下,实现像素间的光晕、串扰测试;针对某些特殊阶段(如背照式芯片的前照工艺阶段测试)也可以增加遮光层来实现不连续遮光层的设计,以便进行像素间的光晕测试。To sum up, the present invention provides an image sensor and its preparation method, as well as a method for detecting crosstalk and halo between adjacent pixels of the image sensor. By designing the light-shielding layer in the black pixel area to be discontinuous, the stress can be relieved. , process damage, etc., reduce the performance difference between the black pixel area and the photosensitive pixel area, and achieve better black level calibration; through the design of the discontinuous light-shielding layer, the halo between monochrome pixels and pixels that have not completed the pigment process can be realized , Crosstalk test; the discontinuous light-shielding layer design can be placed in the black pixel area, and the existing light-shielding layer can be used to achieve halo and crosstalk between pixels without increasing design cost and design area Test; for some special stages (such as the front-illumination process stage test of the back-illuminated chip), the light-shielding layer can also be added to realize the design of the discontinuous light-shielding layer, so as to perform the halo test between pixels.

对于本领域技术人员而言,显然本发明不限于上述示范性实施例的细节,而且在不背离本发明的精神或基本特征的情况下,能够以其他的具体形式实现本发明。因此,无论如何来看,均应将实施例看作是示范性的,而且是非限制性的。此外,明显的,“包括”一词不排除其他元素和步骤,并且措辞“一个”不排除复数。装置权利要求中陈述的多个元件也可以由一个元件来实现。第一,第二等词语用来表示名称,而并不表示任何特定的顺序。It will be apparent to those skilled in the art that the invention is not limited to the details of the above-described exemplary embodiments, but that the invention can be embodied in other specific forms without departing from the spirit or essential characteristics of the invention. Accordingly, the embodiments should be regarded in all respects as exemplary and not restrictive. Furthermore, it is obvious that the word "comprising" does not exclude other elements and steps, and the word "a" does not exclude the plural. A plurality of elements recited in device claims may also be embodied by one element. The words first, second, etc. are used to denote names and do not imply any particular order.

Claims (14)

1.一种图像传感器,其特征在于,包括由像素单元组成的像素阵列,所述像素阵列包括用于感光的感光像素区域和用于校准的黑像素区域;1. An image sensor, characterized in that it includes a pixel array composed of pixel units, the pixel array includes a photosensitive pixel area for light sensing and a black pixel area for calibration; 在所述感光像素区域和\或黑像素区域表面,覆盖有不连续的遮光层,以阻挡光线射入,其中,被所述遮光层覆盖的像素单元为遮光像素单元,未被所述遮光层覆盖的像素单元为非遮光像素单元。The surface of the photosensitive pixel area and/or the black pixel area is covered with a discontinuous light-shielding layer to block light from entering, wherein the pixel unit covered by the light-shielding layer is a light-shielding pixel unit, and the pixel unit not covered by the light-shielding layer The covered pixel units are non-shading pixel units. 2.根据权利要求1所述的图像传感器,其特征在于,与某一非遮光像素单元相邻的其他像素单元全部为遮光像素单元。2 . The image sensor according to claim 1 , wherein all other pixel units adjacent to a certain non-shading pixel unit are light-shielding pixel units. 3.根据权利要求1所述的图像传感器,其特征在于,确定某两个顶点相连的遮光像素单元,共用该顶点的另外两个像素单元为非遮光像素单元。3 . The image sensor according to claim 1 , wherein the light-shielding pixel units connected to certain two vertices are determined, and the other two pixel units sharing the vertices are non-shading pixel units. 4 . 4.根据权利要求1所述的图像传感器,其特征在于,在所述黑像素区域表面,覆盖的遮光层为不连续的,以缓解遮光层对黑像素区域内的像素单元的应力及工艺损伤。4. The image sensor according to claim 1, characterized in that, on the surface of the black pixel area, the covered light-shielding layer is discontinuous, so as to alleviate the stress and process damage of the light-shielding layer on the pixel units in the black pixel area . 5.根据权利要求1所述的图像传感器,其特征在于,所述遮光层为金属或有机遮光材料。5. The image sensor according to claim 1, wherein the light-shielding layer is a metal or an organic light-shielding material. 6.一种图像传感器的制备方法,其特征在于,包括步骤:6. A method for preparing an image sensor, comprising the steps of: 提供由像素单元组成的像素阵列,所述像素阵列包括用于感光的感光像素区域和用于校准的黑像素区域;providing a pixel array composed of pixel units, the pixel array including a light-sensing pixel area for light-sensing and a black pixel area for calibration; 于所述感光像素区域和\或黑像素区域表面,形成不连续的遮光层,以阻挡光线射入。A discontinuous light-shielding layer is formed on the surface of the photosensitive pixel area and/or the black pixel area to block light from entering. 7.根据权利要求6所述的图像传感器的制备方法,其特征在于,于所述感光像素区域和\或黑像素区域表面,形成不连续的遮光层的方法包括:在像素阵列表面,沉积遮光层;7. The method for preparing an image sensor according to claim 6, wherein the method of forming a discontinuous light-shielding layer on the surface of the photosensitive pixel area and/or the black pixel area comprises: depositing a light-shielding layer on the surface of the pixel array Floor; 通过光刻、刻蚀工艺去除部分遮光层,于所述感光像素区域和\或黑像素区域表面,形成不连续的遮光层。Part of the light-shielding layer is removed by photolithography and etching, and a discontinuous light-shielding layer is formed on the surface of the photosensitive pixel area and/or the black pixel area. 8.根据权利要求7所述的图像传感器的制备方法,其特征在于,在像素阵列内,去除某一像素单元表面的遮光层,保留与该像素单元相邻的其他像素单元表面的遮光层。8 . The method for manufacturing an image sensor according to claim 7 , wherein in the pixel array, the light-shielding layer on the surface of a certain pixel unit is removed, and the light-shielding layer on the surface of other pixel units adjacent to the pixel unit is retained. 9.根据权利要求7所述的图像传感器的制备方法,其特征在于,在像素阵列内,去除某两个顶点相连的像素单元表面的遮光层,保留共用该顶点的另外两个像素单元表面的遮光层。9. The method for preparing an image sensor according to claim 7, wherein, in the pixel array, the light-shielding layer on the surface of the pixel unit connected by two vertices is removed, and the light-shielding layer on the surface of the other two pixel units sharing the vertex is reserved. Shading layer. 10.一种图像传感器相邻像素间的串扰、光晕的检测方法,其特征在于,图像传感器包括由多个像素单元组成的像素阵列;在像素阵列表面,形成不连续的遮光层,以阻止光线射入,被遮光层覆盖的像素单元为遮光像素单元,未被遮光层覆盖的像素单元为非遮光像素单元;10. A detection method for crosstalk and halo between adjacent pixels of an image sensor, characterized in that the image sensor includes a pixel array composed of a plurality of pixel units; on the surface of the pixel array, a discontinuous light-shielding layer is formed to prevent When light is incident, the pixel unit covered by the light-shielding layer is a light-shielding pixel unit, and the pixel unit not covered by the light-shielding layer is a non-light-shielding pixel unit; 对像素阵列进行光照射,分别测得遮光像素单元及与所述遮光像素单元相邻的非遮光像素单元的亮度数值,并进行计算,得到像素单元间的串扰或光晕数据。The pixel array is irradiated with light, and the luminance values of the shading pixel unit and the non-shading pixel unit adjacent to the shading pixel unit are respectively measured and calculated to obtain crosstalk or halo data between the pixel units. 11.根据权利要求10所述的相邻像素间的串扰、光晕的检测方法,其特征在于,在像素阵列内选取某一像素单元为非遮光像素单元,将与该非遮光像素单元相邻的其他像素单元全部设置为遮光像素单元。11. The method for detecting crosstalk and halo between adjacent pixels according to claim 10, wherein a certain pixel unit is selected as a non-shielding pixel unit in the pixel array, and the pixel unit adjacent to the non-shielding pixel unit All the other pixel units are set as light-shielding pixel units. 12.根据权利要求10所述的相邻像素间的串扰、光晕的检测方法,其特征在于,在像素阵列内,选取某两个顶点相连的像素单元为非遮光像素单元,将共用该顶点的另外两个像素单元设置为遮光像素单元。12. The detection method of crosstalk and halo between adjacent pixels according to claim 10, characterized in that, in the pixel array, select the pixel unit connected by two vertices as the non-shielding pixel unit, and share the vertices The other two pixel units are set as light-shielding pixel units. 13.根据权利要求10所述的单色图像传感器相邻像素间的串扰、光晕的检测方法,其特征在于,应用于彩色图像传感器制造过程中未进行颜料工艺阶段时像素单元间的串扰或光晕测试。13. The method for detecting crosstalk and halo between adjacent pixels of a monochrome image sensor according to claim 10, characterized in that it is applied to the crosstalk between pixel units or Halo test. 14.根据权利要求10所述的单色图像传感器相邻像素间的串扰、光晕的检测方法,其特征在于,应用于单色图像传感器像素单元间的串扰或光晕测试。14. The method for detecting crosstalk and halo between adjacent pixels of a monochrome image sensor according to claim 10, characterized in that it is applied to the crosstalk or halo test between pixel units of a monochrome image sensor.
CN202110670617.4A 2021-06-17 2021-06-17 Image sensor, manufacturing method thereof, and method for detecting crosstalk and halo between adjacent pixels of image sensor Pending CN115497965A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110670617.4A CN115497965A (en) 2021-06-17 2021-06-17 Image sensor, manufacturing method thereof, and method for detecting crosstalk and halo between adjacent pixels of image sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110670617.4A CN115497965A (en) 2021-06-17 2021-06-17 Image sensor, manufacturing method thereof, and method for detecting crosstalk and halo between adjacent pixels of image sensor

Publications (1)

Publication Number Publication Date
CN115497965A true CN115497965A (en) 2022-12-20

Family

ID=84464774

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110670617.4A Pending CN115497965A (en) 2021-06-17 2021-06-17 Image sensor, manufacturing method thereof, and method for detecting crosstalk and halo between adjacent pixels of image sensor

Country Status (1)

Country Link
CN (1) CN115497965A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116540435A (en) * 2023-07-04 2023-08-04 惠科股份有限公司 Halation test method and halation test equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116540435A (en) * 2023-07-04 2023-08-04 惠科股份有限公司 Halation test method and halation test equipment
CN116540435B (en) * 2023-07-04 2023-09-22 惠科股份有限公司 Halo test method and halo test equipment

Similar Documents

Publication Publication Date Title
US7215361B2 (en) Method for automated testing of the modulation transfer function in image sensors
KR101130023B1 (en) Solid-state image sensing device
KR101442313B1 (en) Camera sensor correction
US9497397B1 (en) Image sensor with auto-focus and color ratio cross-talk comparison
JP5845856B2 (en) Solid-state imaging device, manufacturing method thereof, and electronic device
US9584743B1 (en) Image sensor with auto-focus and pixel cross-talk compensation
US20080211945A1 (en) Image sensor with extended dynamic range
CN103444183B (en) Color imaging element and imaging device
KR20080030536A (en) Imaging Device and Endoscope Device
US8385642B2 (en) Method for removing color fringe in digital image
JP2021069105A (en) Image sensor
CN115497965A (en) Image sensor, manufacturing method thereof, and method for detecting crosstalk and halo between adjacent pixels of image sensor
JP6805766B2 (en) Imaging device and imaging system
TWI722934B (en) Image sensor with self-testing black level correction
US20120147230A1 (en) Method for characterizing pixels of an image sensor
JP2022553726A (en) Method for generating the output signal of a PDAF pixel
CN107389193B (en) Sensor module, method for determining the brightness and/or color of electromagnetic radiation, and method for producing a sensor module
JP2007123414A (en) Solid-state image sensor
US7400352B1 (en) Method of estimating electrical cross talk in an array of imaging cells
JP2020038107A (en) Temperature measurement device
JPH11354763A (en) Method for manufacturing solid-state imaging device and color filter array
JP2014187648A (en) Solid-state imaging device
JPH07161794A (en) Condensing lens check method of solid-state image sensing device
WO2019216007A1 (en) Solid-state image capturing element, electronic device, and method for manufacturing solid-state image capturing element
JP2004327722A (en) Inspection method of solid-state imaging device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination