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CN114990509A - Strengthening method of medium-entropy alloy coating - Google Patents

Strengthening method of medium-entropy alloy coating Download PDF

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CN114990509A
CN114990509A CN202210674557.8A CN202210674557A CN114990509A CN 114990509 A CN114990509 A CN 114990509A CN 202210674557 A CN202210674557 A CN 202210674557A CN 114990509 A CN114990509 A CN 114990509A
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sputtering
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entropy alloy
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CN114990509B (en
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王弘喆
张磊
崔雄华
杨哲一
崔锦文
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Xian Thermal Power Research Institute Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C30/00Alloys containing less than 50% by weight of each constituent
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5806Thermal treatment
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5893Mixing of deposited material

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Abstract

本发明公开了一种中熵合金涂层的强化方法,包括如下步骤:将需要涂层的构件表面进行处理;将中熵合金靶以及Al靶分别安装在真空磁控溅射镀膜机的两个直流靶位置,将构件作为基体固定于样品台上,当溅射室内真空度达到预定值后,通入氩气,进行预溅射;调节溅射室内的气压,设定溅射功率,进行共溅射涂层;将涂层后的构件加热至1200℃后保温,然后进行淬火处理;再将构件加热至600℃后保温,随炉冷却,实现对中熵合金涂层的强化。本发明通过磁控溅射将中熵合金及Al靶共溅射至构件表面,通过控制Al靶的溅射功率在保证涂层原有固溶体的基础上形成适量的金属间化合物,并通过固溶处理和时效处理对中熵合金涂层进行有效的强化。

Figure 202210674557

The invention discloses a method for strengthening a medium-entropy alloy coating, which comprises the following steps: treating the surface of a component that needs to be coated; installing a medium-entropy alloy target and an Al target on two parts of a vacuum magnetron sputtering coating machine respectively At the direct current target position, the component is fixed on the sample stage as the base. When the vacuum degree in the sputtering chamber reaches a predetermined value, argon gas is introduced to carry out pre-sputtering; the air pressure in the sputtering chamber is adjusted, the sputtering power is set, and a total of Sputter coating; heat the coated component to 1200°C, then keep it warm, and then quench it; then heat the component to 600°C, then keep it warm, and cool it with the furnace to strengthen the medium-entropy alloy coating. In the present invention, the medium-entropy alloy and the Al target are co-sputtered to the surface of the component by magnetron sputtering, and an appropriate amount of intermetallic compounds are formed on the basis of ensuring the original solid solution of the coating by controlling the sputtering power of the Al target, and the solid solution Treatment and aging treatment can effectively strengthen the medium-entropy alloy coating.

Figure 202210674557

Description

一种中熵合金涂层的强化方法A kind of strengthening method of medium entropy alloy coating

技术领域technical field

本发明涉及表面涂层技术领域,特别涉及一种中熵合金涂层的强化方法。The invention relates to the technical field of surface coatings, in particular to a method for strengthening a medium-entropy alloy coating.

背景技术Background technique

中熵合金是近年来发展的一种新型金属材料,由三种主元合金组成,具有单一的固溶体相。相对于传统金属材料,中熵合金材料具有良好的强度、硬度及耐磨损性能,媲美甚至优于多数高熵合金和多相合金。在表面处理方面,中熵合金作为涂层材料,可以改善构件的可靠性,可作为一种推广使用的硬质涂层材料。Medium-entropy alloy is a new type of metal material developed in recent years. It consists of three principal alloys and has a single solid solution phase. Compared with traditional metal materials, medium-entropy alloy materials have good strength, hardness and wear resistance, which are comparable to or even better than most high-entropy alloys and multiphase alloys. In terms of surface treatment, as a coating material, medium-entropy alloy can improve the reliability of components, and can be used as a hard coating material for popularization.

磁控溅射是一种物理气相沉积技术,不仅可以进行大面积涂层,而且具有一些其他优点如:制得的涂层表面均匀,涂层与基体的结合力好,同时涂层的质量可以通过控制磁控溅射参数进一步调控,从而对涂层中的元素含量予以有效的控制。Magnetron sputtering is a physical vapor deposition technology, which can not only coat a large area, but also has some other advantages such as: the obtained coating surface is uniform, the bonding force between the coating and the substrate is good, and the quality of the coating can be improved. By controlling the parameters of magnetron sputtering, the content of elements in the coating can be effectively controlled.

现有的中熵合金涂层的力学性能在一些特定的使用条件下,仍不能满足使用要求,因此需要对中熵合金涂层的力学性能进一步提升。The mechanical properties of the existing medium-entropy alloy coatings still cannot meet the application requirements under some specific use conditions, so the mechanical properties of the medium-entropy alloy coatings need to be further improved.

发明内容SUMMARY OF THE INVENTION

为解决上述技术问题,本发明的目的在于提供一种中熵合金涂层的强化方法,通过磁控溅射将中熵合金及Al靶共溅射至构件表面,通过控制Al靶的溅射功率在保证涂层原有固溶体的基础上,形成适量的金属间化合物,并通过固溶处理和时效处理对中熵合金涂层进行有效的强化。In order to solve the above-mentioned technical problems, the purpose of the present invention is to provide a method for strengthening the medium-entropy alloy coating, by co-sputtering the medium-entropy alloy and the Al target on the surface of the component by magnetron sputtering, and by controlling the sputtering power of the Al target. On the basis of ensuring the original solid solution of the coating, an appropriate amount of intermetallic compound is formed, and the medium-entropy alloy coating is effectively strengthened through solid solution treatment and aging treatment.

为实现上述技术目的,达到上述技术效果,本发明通过以下技术方案实现:In order to realize the above-mentioned technical purpose and achieve the above-mentioned technical effect, the present invention is realized through the following technical solutions:

一种中熵合金涂层的强化方法,包括如下步骤:A method for strengthening a medium-entropy alloy coating, comprising the following steps:

(1)构件处理(1) Component processing

将需要涂层的构件表面依次经打磨、抛光、清洗、烘干,备用;The surfaces of the components that need to be coated are ground, polished, cleaned, and dried in sequence for use;

(2)靶材预处理(2) Target pretreatment

将中熵合金靶以及Al靶分别安装在真空磁控溅射镀膜机的两个直流靶位置;将步骤(1)处理后的构件作为基体固定于样品台上,关闭溅射室,先进行低真空的抽取,当溅射室的腔内气压达到4Pa以下时,再启动分子泵进行高真空的抽取;当溅射室内真空度达到预定值后,通入氩气,进行预溅射,以去除靶材表面的污染物;The medium-entropy alloy target and the Al target are respectively installed at the two DC target positions of the vacuum magnetron sputtering coater; the component processed in step (1) is fixed on the sample stage as the base, the sputtering chamber is closed, and the low-temperature process is carried out first. Vacuum extraction, when the air pressure in the sputtering chamber reaches below 4Pa, start the molecular pump to extract high vacuum; when the vacuum degree in the sputtering chamber reaches a predetermined value, pass argon gas for pre-sputtering to remove Contamination on the target surface;

(3)共溅射涂层(3) Co-sputtering coating

调节溅射室内的气压,设定中熵合金靶以及Al靶的溅射功率,进行共溅射涂层;溅射完成后,将构件随炉冷却至室温后取出;Adjust the air pressure in the sputtering chamber, set the sputtering power of the medium-entropy alloy target and the Al target, and carry out co-sputtering coating; after the sputtering is completed, the component is cooled to room temperature with the furnace and taken out;

(4)固溶处理(4) Solution treatment

将涂层后的构件通过真空感应炉加热至1200℃后保温2h,然后进行淬火处理,使中熵合金涂层添加Al元素后所产生的过剩相溶解到固溶体中;The coated component was heated to 1200 °C in a vacuum induction furnace, and then kept for 2 h, and then quenched to dissolve the excess phase generated by adding Al element to the medium-entropy alloy coating into the solid solution;

(5)时效处理(5) Aging treatment

将步骤(4)所处理的构件通过真空感应炉加热至600℃后保温2~8h,随炉冷却,以析出铝基金属间化合物,实现对中熵合金涂层的强化。The component processed in step (4) is heated to 600° C. in a vacuum induction furnace, then kept for 2-8 hours, and then cooled with the furnace to precipitate aluminum-based intermetallic compounds, thereby realizing the strengthening of the medium-entropy alloy coating.

进一步的,所述构件选自钢制材料、铸铁类材料或其他有色金属类材料。Further, the components are selected from steel materials, cast iron materials or other non-ferrous metal materials.

进一步的,所述步骤(1)的清洗过程采用超声波依次进行无水乙醇清洗和等离子水清洗。Further, in the cleaning process of the step (1), ultrasonic waves are used to sequentially perform cleaning with absolute ethanol and cleaning with plasma water.

进一步的,所述中熵合金靶选自CoCrNi合金靶、FeCoNi合金靶、CrFeNi合金靶、CrNiTi合金靶中的一种;所述Al靶的纯度大于99.9%。Further, the medium-entropy alloy target is selected from one of CoCrNi alloy target, FeCoNi alloy target, CrFeNi alloy target, and CrNiTi alloy target; the purity of the Al target is greater than 99.9%.

进一步的,预溅射时的溅射室内的真空度为7×10-4Pa,预溅射的时间为10min。Further, the degree of vacuum in the sputtering chamber during pre-sputtering was 7×10 -4 Pa, and the time of pre-sputtering was 10 min.

进一步的,步骤(3)中,溅射前的基体温度为100~500℃;溅射室内的气压调节至0.2~0.5Pa;中熵合金靶的溅射功率为100W,Al靶的溅射功率为20~100W;溅射时间为10~60min。Further, in step (3), the temperature of the substrate before sputtering is 100-500°C; the air pressure in the sputtering chamber is adjusted to 0.2-0.5Pa; the sputtering power of the medium-entropy alloy target is 100W, and the sputtering power of the Al target is 100W. It is 20-100W; the sputtering time is 10-60min.

进一步的,步骤(2)中,通入氩气的流量为50sccm。Further, in step (2), the flow rate of the argon gas introduced is 50 sccm.

进一步的,固溶处理和时效处理的加热方式为表面加热。Further, the heating method of solution treatment and aging treatment is surface heating.

本发明的有益效果:Beneficial effects of the present invention:

本发明通过共溅射使氩气在电场作用下电离,电离出的氩离子轰击中熵合金靶以及Al靶的表面,靶材溅射出大量靶材原子,在构件上沉积形成涂层;将涂层后的构件通过真空感应炉表面加热后保温,之后进行淬火处理,促使中熵合金涂层添加Al元素后所产生的过剩相溶解到固溶体中;之后再次加热至较低温度长时间保温进行时效处理,达到中熵合金涂层的强化效果。In the invention, argon gas is ionized under the action of an electric field by co-sputtering, the ionized argon ions bombard the surface of the entropy alloy target and the Al target, and the target material sputters out a large number of target material atoms, which are deposited on the component to form a coating; The layered component is heated by the surface of the vacuum induction furnace and then kept warm, and then subjected to quenching treatment to promote the dissolution of the excess phase generated by the addition of Al element into the medium-entropy alloy coating into the solid solution; then heated to a lower temperature for a long time for aging. treatment to achieve the strengthening effect of the medium-entropy alloy coating.

中熵合金中加入Al元素,可以在形成固溶体基础上,产生金属间化合物,从而在固溶强化的基础上形成沉淀强化效果,可进一步提升其耐磨损性能。The addition of Al element to the medium-entropy alloy can generate intermetallic compounds on the basis of forming a solid solution, thereby forming a precipitation strengthening effect on the basis of solid solution strengthening, which can further improve its wear resistance.

本发明采用共溅射法进行中熵合金涂层的制备,一方面保证了涂层的制备质量,另一方面可通过Al靶功率参数的控制有效调控中熵合金涂层中Al的含量和物相组成,防止过多Al的加入导致的Al相富集,从而避免Al相富集对涂层的硬度及耐磨损性能的影响。The invention adopts the co-sputtering method to prepare the medium-entropy alloy coating, which on the one hand ensures the preparation quality of the coating, and on the other hand can effectively regulate the content and content of Al in the medium-entropy alloy coating by controlling the power parameter of the Al target. The phase composition can prevent the Al phase enrichment caused by the addition of too much Al, thereby avoiding the influence of the Al phase enrichment on the hardness and wear resistance of the coating.

本发明结合磁控共溅射以及后续的热处理技术,通过控制Al靶的溅射功率控制中熵合金涂层的成分及组织结构,在此基础上应用固溶处理及时效处理工艺对涂层的结构进一步调控,实现中熵合金涂层的有效强化。The invention combines magnetron co-sputtering and subsequent heat treatment technology to control the composition and structure of the entropy alloy coating by controlling the sputtering power of the Al target, and on this basis, the solution treatment and aging treatment process are applied to the coating. The structure is further regulated to achieve effective strengthening of the medium-entropy alloy coating.

本发明的方法生产工艺可重复性好、沉积速度快、工艺可控性高,所得涂层具有强度、硬度及耐磨损性能优良、致密性高、成膜均匀等优点,易于实现工业化,可用于构件的表面强化处理。The method of the invention has the advantages of good production process repeatability, fast deposition speed and high process controllability, and the obtained coating has the advantages of excellent strength, hardness and wear resistance, high compactness, uniform film formation and the like, is easy to realize industrialization, and can be used Surface strengthening treatment of components.

附图说明Description of drawings

图1为本发明实施例1中熵合金CoCrNi靶与Al靶共溅射涂层的XRD图谱。FIG. 1 is the XRD pattern of the co-sputtering coating of the entropy alloy CoCrNi target and the Al target in Example 1 of the present invention.

图2为本发明实施例1中熵合金CoCrNi靶与Al靶共溅射涂层表面及截面SEM形貌图;Fig. 2 is the SEM topography of the surface and cross-section of the co-sputtered coating of the entropy alloy CoCrNi target and the Al target in Example 1 of the present invention;

图3为本发明实施例1的中熵合金CoCrNi靶与Al靶共溅射时不同Al靶溅射功率下的涂层硬度变化。FIG. 3 is the change of the coating hardness under different sputtering powers of the Al target when the medium-entropy alloy CoCrNi target and the Al target are co-sputtered in Example 1 of the present invention.

具体实施方式Detailed ways

下面结合附图对本发明的较佳实施例进行详细阐述,以使本发明的优点和特征能更易于被本领域技术人员理解,从而对本发明的保护范围做出更为清楚明确的界定。The preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art, and the protection scope of the present invention can be more clearly defined.

本发明提供了一种中熵合金涂层的强化方法,包括如下步骤:The invention provides a method for strengthening a medium-entropy alloy coating, comprising the following steps:

(1)构件处理(1) Component processing

将需要涂层的构件表面依次经打磨、抛光、清洗、烘干,备用;所述构件选自钢制材料、铸铁类材料或其他有色金属类材料;其中的清洗过程采用超声波依次进行无水乙醇清洗和等离子水清洗;The surfaces of the components that need to be coated are ground, polished, cleaned, and dried in turn, and used for later use; the components are selected from steel materials, cast iron materials or other non-ferrous metal materials; the cleaning process is carried out by ultrasonic waves in anhydrous ethanol. cleaning and plasma water cleaning;

(2)靶材预处理(2) Target pretreatment

将中熵合金靶以及Al靶分别安装在真空磁控溅射镀膜机的两个直流靶位置;将步骤(1)处理后的构件作为基体固定于样品台上,关闭溅射室,先进行低真空的抽取,当溅射室的腔内气压达到4Pa以下时,再启动分子泵进行高真空的抽取;当溅射室内真空度达到预定值后,通入氩气,进行预溅射,以去除靶材表面的污染物;The medium-entropy alloy target and the Al target are respectively installed at the two DC target positions of the vacuum magnetron sputtering coater; the component processed in step (1) is fixed on the sample stage as the base, the sputtering chamber is closed, and the low-temperature process is carried out first. Vacuum extraction, when the air pressure in the sputtering chamber reaches below 4Pa, start the molecular pump to extract high vacuum; when the vacuum degree in the sputtering chamber reaches a predetermined value, pass argon gas for pre-sputtering to remove Contamination on the target surface;

其中,中熵合金靶选自CoCrNi合金靶、FeCoNi合金靶、CrFeNi合金靶、CrNiTi合金靶中的一种;Al靶的纯度大于99.9%;预溅射时的溅射室内的真空度为7×10-4Pa,通入氩气的流量为50sccm,预溅射的时间为10min;The medium-entropy alloy target is selected from one of CoCrNi alloy target, FeCoNi alloy target, CrFeNi alloy target, and CrNiTi alloy target; the purity of the Al target is greater than 99.9%; the vacuum degree in the sputtering chamber during pre-sputtering is 7× 10 -4 Pa, the flow rate of argon is 50sccm, and the time of pre-sputtering is 10min;

(3)共溅射涂层(3) Co-sputtering coating

溅射前,将基体温度加热至100~500℃;调节溅射室内的气压至0.2~0.5Pa,设定中熵合金靶的溅射功率为100W,Al靶的溅射功率为20~100W,进行共溅射涂层;溅射时间为10~60min;溅射完成后,将构件随炉冷却至室温后取出;Before sputtering, the substrate temperature was heated to 100-500°C; the air pressure in the sputtering chamber was adjusted to 0.2-0.5Pa, the sputtering power of the medium-entropy alloy target was set to 100W, and the sputtering power of the Al target was 20-100W. Co-sputtering coating is carried out; the sputtering time is 10-60min; after the sputtering is completed, the component is cooled to room temperature with the furnace and taken out;

(4)固溶处理(4) Solution treatment

将涂层后的构件通过真空感应炉表面加热至1200℃后保温2h,然后进行淬火处理,使中熵合金涂层添加Al元素后所产生的过剩相溶解到固溶体中;其中,淬火处理采用油淬;The coated component was heated to 1200 °C through a vacuum induction furnace and kept for 2 hours, and then quenched to dissolve the excess phase generated by adding Al element to the medium-entropy alloy coating into the solid solution; among them, oil was used for quenching treatment. quenched;

(5)时效处理(5) Aging treatment

将步骤(4)所处理的构件通过真空感应炉表面加热至600℃后保温2~8h,随炉冷却,以析出铝基金属间化合物,实现对中熵合金涂层的强化。The component processed in step (4) is heated to 600° C. through a vacuum induction furnace, then kept for 2 to 8 hours, and then cooled with the furnace to precipitate aluminum-based intermetallic compounds to strengthen the medium-entropy alloy coating.

实施例1Example 1

(1)构件处理(1) Component processing

将需要涂层的构件表面用砂纸打磨,然后进行抛光,直至表面无明显的划痕;通过超声波清洗器,依次将构件在无水乙醇和等离子水中各清洗十分钟后烘干备用;Sand the surface of the component to be coated with sandpaper, and then polish it until there is no obvious scratch on the surface; use an ultrasonic cleaner to clean the component in anhydrous ethanol and plasma water for ten minutes each, and then dry it for later use;

(2)靶材预处理(2) Target pretreatment

将CoCrNi合金靶以及Al靶分别安装在真空磁控溅射镀膜机的两个直流靶位置;将步骤(1)处理后的构件固定于样品台上,关闭溅射室,先进行低真空的抽取,当溅射室的腔内气压达到4Pa以下,再启动分子泵进行高真空的抽取;当溅射室内真空度达到预定值7×10-4Pa后,通入氩气50sccm,预溅射10min以去除靶材表面污染物;Install the CoCrNi alloy target and the Al target on the two DC target positions of the vacuum magnetron sputtering coater respectively; fix the component processed in step (1) on the sample stage, close the sputtering chamber, and first perform low vacuum extraction , when the air pressure in the sputtering chamber reaches below 4Pa, then start the molecular pump to extract high vacuum; when the vacuum degree in the sputtering chamber reaches the predetermined value of 7×10 -4 Pa, pass argon gas for 50sccm, and pre-sputter for 10min To remove contaminants on the target surface;

(3)共溅射涂层(3) Co-sputtering coating

调节溅射室内的气压为0.3Pa,基体温度为100℃,CoCrNi合金靶的溅射功率为100W,Al靶的溅射功率为20W,进行共溅射涂层;溅射10min后,将构件随炉冷却至室温后取出。The air pressure in the sputtering chamber was adjusted to 0.3 Pa, the substrate temperature was 100 °C, the sputtering power of the CoCrNi alloy target was 100 W, and the sputtering power of the Al target was 20 W, and the co-sputtering coating was performed; Remove from oven after cooling to room temperature.

(4)固溶处理(4) Solution treatment

将涂层后的构件通过真空感应炉表面加热至1200℃后保温2h,之后进行淬火处理,促使中熵合金涂层添加Al元素后所产生的过剩相溶解到固溶体中。The coated component was heated to 1200 °C through a vacuum induction furnace and kept for 2 h, and then quenched to promote the dissolution of the excess phase generated by the addition of Al element into the solid solution in the medium-entropy alloy coating.

(5)时效处理(5) Aging treatment

将步骤(4)所处理的构件通过真空感应炉表面加热至600℃后保温2h,随炉冷却,以析出铝基金属间化合物,达到中熵合金涂层的强化效果。The component processed in step (4) is heated to 600° C. through the vacuum induction furnace surface, then kept for 2 hours, and cooled with the furnace to precipitate aluminum-based intermetallic compounds to achieve the strengthening effect of the medium-entropy alloy coating.

实施例2Example 2

(1)构件处理(1) Component processing

将需要涂层的构件表面用砂纸打磨然后再进行抛光,直至表面无明显的划痕;通过超声波清洗器,依次将构件在无水乙醇和等离子水中各清洗十分钟后烘干备用;The surface of the component that needs to be coated is ground with sandpaper and then polished until there is no obvious scratch on the surface; through the ultrasonic cleaner, the component is cleaned in anhydrous ethanol and plasma water for ten minutes each, and then dried for use;

(2)靶材预处理(2) Target pretreatment

将CoCrNi合金靶及Al靶分别安装在真空磁控溅射镀膜机的两个直流靶位置;将步骤(1)处理后的构件固定于样品台上,关闭溅射室,先进行低真空的抽取,当溅射室的腔内气压达到4Pa以下,再启动分子泵进行高真空的抽取;当溅射室内真空度达到预定值7×10- 4Pa后,通入氩气50sccm,预溅射10min以去除靶材表面污染物;Install the CoCrNi alloy target and the Al target on the two DC target positions of the vacuum magnetron sputtering coater respectively; fix the component processed in step (1) on the sample stage, close the sputtering chamber, and first perform low vacuum extraction , when the pressure in the sputtering chamber reaches below 4Pa, then start the molecular pump to extract high vacuum; when the vacuum degree in the sputtering chamber reaches the predetermined value of 7×10 - 4 Pa, pass argon gas for 50sccm, and pre-sputter for 10min To remove contaminants on the target surface;

(3)共溅射涂层(3) Co-sputtering coating

调节溅射室内的气压为0.4Pa,基体温度为200℃,CrNiTi合金靶的溅射功率为100W,Al靶的溅射功率为30W,进行共溅射涂层;溅射20min后,将构件随炉冷却至室温后取出;The air pressure in the sputtering chamber was adjusted to 0.4 Pa, the substrate temperature was 200 °C, the sputtering power of the CrNiTi alloy target was 100 W, and the sputtering power of the Al target was 30 W, and the co-sputtering coating was carried out; Take out the furnace after cooling to room temperature;

(4)固溶处理(4) Solution treatment

将涂层后的构件通过真空感应炉表面加热至1200℃后保温2h,之后进行淬火处理,促使中熵合金涂层添加Al元素后所产生的过剩相溶解到固溶体中。The coated component was heated to 1200 °C through a vacuum induction furnace and kept for 2 h, and then quenched to promote the dissolution of the excess phase generated by the addition of Al element into the solid solution in the medium-entropy alloy coating.

(5)时效处理(5) Aging treatment

将步骤(4)所处理的构件通过真空感应炉表面加热至600℃后保温4h,随炉冷却,以析出铝基金属间化合物,达到中熵合金涂层的强化效果。The component treated in step (4) is heated to 600° C. through a vacuum induction furnace, and then kept for 4 hours, followed by cooling in the furnace to precipitate aluminum-based intermetallic compounds to achieve the strengthening effect of the medium-entropy alloy coating.

实施例3Example 3

(1)构件处理(1) Component processing

将需要涂层的构件表面用砂纸打磨然后再进行抛光,直至表面无明显的划痕;通过超声波清洗器,依次将构件在无水乙醇和等离子水中各清洗十分钟后烘干备用;The surface of the component that needs to be coated is ground with sandpaper and then polished until there is no obvious scratch on the surface; through the ultrasonic cleaner, the component is cleaned in anhydrous ethanol and plasma water for ten minutes each, and then dried for use;

(2)靶材预处理(2) Target pretreatment

将CoCrNi合金靶及Al靶分别安装在真空磁控溅射镀膜机的两个直流靶位置;将步骤(1)处理后的构件固定于样品台上,关闭溅射室,先进行低真空的抽取,当溅射室的腔内气压达到4Pa以下,再启动分子泵进行高真空的抽取;当溅射室内真空度达到预定值7×10- 4Pa后,通入氩气50sccm,预溅射10min以去除靶材表面污染物。Install the CoCrNi alloy target and the Al target on the two DC target positions of the vacuum magnetron sputtering coater respectively; fix the component processed in step (1) on the sample stage, close the sputtering chamber, and first perform low vacuum extraction , when the pressure in the sputtering chamber reaches below 4Pa, then start the molecular pump to extract high vacuum; when the vacuum degree in the sputtering chamber reaches the predetermined value of 7×10 - 4 Pa, pass argon gas for 50sccm, and pre-sputter for 10min to remove contaminants from the target surface.

(3)共溅射涂层(3) Co-sputtering coating

调节溅射室内的气压为0.5Pa,基体温度为100℃,CrNiTi合金靶的溅射功率为100W,Al靶的溅射功率为50W,进行共溅射涂层。溅射30min后,将构件随炉冷却至室温后取出;The air pressure in the sputtering chamber was adjusted to 0.5Pa, the substrate temperature was 100°C, the sputtering power of the CrNiTi alloy target was 100W, and the sputtering power of the Al target was 50W, and the co-sputtering coating was performed. After sputtering for 30 minutes, the component was cooled to room temperature with the furnace and taken out;

(4)固溶处理(4) Solution treatment

将涂层后的构件通过真空感应炉表面加热至1200℃后保温2h,之后进行淬火处理,促使中熵合金涂层添加Al元素后所产生的过剩相溶解到固溶体中;The coated component was heated to 1200°C through a vacuum induction furnace, and then kept for 2 hours, and then quenched to promote the dissolution of the excess phase generated by the addition of Al element into the medium-entropy alloy coating into the solid solution;

(5)时效处理(5) Aging treatment

将步骤(4)所处理的构件通过真空感应炉表面加热至600℃后保温6h,随炉冷却,以析出铝基金属间化合物,达到中熵合金涂层的强化效果。The component treated in step (4) is heated to 600° C. through a vacuum induction furnace, and then kept for 6 hours, followed by cooling in the furnace to precipitate aluminum-based intermetallic compounds to achieve the strengthening effect of the medium-entropy alloy coating.

如图1和图2所示,利用本发明方法所得的涂层强度高,硬度高,耐磨损性能优良,致密性高,成膜均匀。As shown in Figures 1 and 2, the coating obtained by the method of the present invention has high strength, high hardness, excellent wear resistance, high compactness and uniform film formation.

以上所述仅为本发明的实施例,并非因此限制本发明的专利范围,凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本发明的专利保护范围内。The above descriptions are only the embodiments of the present invention, and are not intended to limit the scope of the present invention. Any equivalent structure or equivalent process transformation made by using the contents of the description and drawings of the present invention, or directly or indirectly applied to other related technologies Fields are similarly included in the scope of patent protection of the present invention.

Claims (8)

1.一种中熵合金涂层的强化方法,其特征在于,包括如下步骤:1. a kind of strengthening method of medium entropy alloy coating, is characterized in that, comprises the steps: (1)构件处理(1) Component processing 将需要涂层的构件表面依次经打磨、抛光、清洗、烘干,备用;The surfaces of the components that need to be coated are ground, polished, cleaned, and dried in sequence for use; (2)靶材预处理(2) Target pretreatment 将中熵合金靶以及Al靶分别安装在真空磁控溅射镀膜机的两个直流靶位置;将步骤(1)处理后的构件作为基体固定于样品台上,关闭溅射室,先进行低真空的抽取,当溅射室的腔内气压达到4Pa以下时,再启动分子泵进行高真空的抽取;当溅射室内真空度达到预定值后,通入氩气,进行预溅射,以去除靶材表面的污染物;The medium-entropy alloy target and the Al target are respectively installed at the two DC target positions of the vacuum magnetron sputtering coater; the component processed in step (1) is fixed on the sample stage as the base, the sputtering chamber is closed, and the low-temperature process is carried out first. Vacuum extraction, when the air pressure in the sputtering chamber reaches below 4Pa, start the molecular pump to extract high vacuum; when the vacuum degree in the sputtering chamber reaches a predetermined value, pass argon gas for pre-sputtering to remove Contamination on the target surface; (3)共溅射涂层(3) Co-sputtering coating 调节溅射室内的气压,设定中熵合金靶以及Al靶的溅射功率,进行共溅射涂层;溅射完成后,将构件随炉冷却至室温后取出;Adjust the air pressure in the sputtering chamber, set the sputtering power of the medium-entropy alloy target and the Al target, and carry out co-sputtering coating; after the sputtering is completed, the component is cooled to room temperature with the furnace and taken out; (4)固溶处理(4) Solution treatment 将涂层后的构件通过真空感应炉加热至1200℃后保温2h,然后进行淬火处理,使中熵合金涂层添加Al元素后所产生的过剩相溶解到固溶体中;The coated component was heated to 1200 °C in a vacuum induction furnace, and then kept for 2 h, and then quenched to dissolve the excess phase generated by adding Al element to the medium-entropy alloy coating into the solid solution; (5)时效处理(5) Aging treatment 将步骤(4)所处理的构件通过真空感应炉加热至600℃后保温2~8h,随炉冷却,以析出铝基金属间化合物,实现对中熵合金涂层的强化。The component processed in step (4) is heated to 600° C. in a vacuum induction furnace, then kept for 2-8 hours, and then cooled with the furnace to precipitate aluminum-based intermetallic compounds, thereby realizing the strengthening of the medium-entropy alloy coating. 2.根据权利要求1所述的一种中熵合金涂层的强化方法,其特征在于:所述构件选自钢制材料、铸铁类材料或其他有色金属类材料。2 . The method for strengthening a medium-entropy alloy coating according to claim 1 , wherein the components are selected from steel materials, cast iron materials or other non-ferrous metal materials. 3 . 3.根据权利要求1所述的一种中熵合金涂层的强化方法,其特征在于:所述步骤(1)的清洗过程采用超声波依次进行无水乙醇清洗和等离子水清洗。3 . The method for strengthening a medium-entropy alloy coating according to claim 1 , wherein the cleaning process of the step (1) adopts ultrasonic waves to sequentially carry out anhydrous ethanol cleaning and plasma water cleaning. 4 . 4.根据权利要求1所述的一种中熵合金涂层的强化方法,其特征在于:所述中熵合金靶选自CoCrNi合金靶、FeCoNi合金靶、CrFeNi合金靶、CrNiTi合金靶中的一种;所述Al靶的纯度大于99.9%。4. The method for strengthening a medium-entropy alloy coating according to claim 1, wherein the medium-entropy alloy target is selected from the group consisting of CoCrNi alloy target, FeCoNi alloy target, CrFeNi alloy target, and CrNiTi alloy target. species; the purity of the Al target is greater than 99.9%. 5.根据权利要求1所述的一种中熵合金涂层的强化方法,其特征在于:步骤(2)中,预溅射时的溅射室内的真空度为7×10-4Pa,预溅射的时间为10min。5. The method for strengthening a medium-entropy alloy coating according to claim 1, wherein in step (2), the vacuum degree in the sputtering chamber during pre-sputtering is 7 × 10 -4 Pa, and the pre-sputtering The sputtering time was 10 min. 6.根据权利要求1所述的一种中熵合金涂层的强化方法,其特征在于:步骤(3)中,溅射前的基体温度为100~500℃;溅射室内的气压调节至0.2~0.5Pa;中熵合金靶的溅射功率为100W,Al靶的溅射功率为20~100W;溅射时间为10~60min。6 . The method for strengthening a medium-entropy alloy coating according to claim 1 , wherein: in step (3), the temperature of the substrate before sputtering is 100 to 500° C.; the air pressure in the sputtering chamber is adjusted to 0.2 ~0.5Pa; the sputtering power of the medium-entropy alloy target is 100W, the sputtering power of the Al target is 20-100W; the sputtering time is 10-60min. 7.根据权利要求1所述的一种中熵合金涂层的强化方法,其特征在于:步骤(2)中,通入氩气的流量为50sccm。7 . The method for strengthening a medium-entropy alloy coating according to claim 1 , wherein: in step (2), the flow rate of the argon gas introduced is 50 sccm. 8 . 8.根据权利要求1所述的一种中熵合金涂层的强化方法,其特征在于:固溶处理和时效处理的加热方式为表面加热。8 . The method for strengthening a medium-entropy alloy coating according to claim 1 , wherein the heating method of solution treatment and aging treatment is surface heating. 9 .
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