CN114956787B - Formula and process of low-temperature porcelain - Google Patents
Formula and process of low-temperature porcelain Download PDFInfo
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
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Abstract
The invention relates to the technical field of low-temperature porcelain, and particularly discloses a formula of low-temperature porcelain, which comprises the following raw materials in parts by weight: 15.5-45.6 parts of kaolin, 10.6-39.5 parts of feldspar, 15.0-45.0 parts of quartz, 20.0-50.0 parts of porcelain stone, 5.5-25.8 parts of clay, 2.4-18.8 parts of modified talc, 0.5-5.8 parts of dolomite and 1.2-1.8 parts of modified graphene; and carrying out thermal sintering treatment at the temperature of 1080-1190 ℃ for 1-2h to obtain the low-temperature porcelain. According to the low-temperature porcelain, kaolin, feldspar and other raw materials are matched, the modified talc and the modified graphene are added to enhance the performance of the product, the modified talc can enhance the strength and toughness of the product after being modified, the graphene and the modified talc have a synergistic effect after being optimized and modified, and the reinforcing of the modified talc and the graphene are assisted to cooperatively improve the strength and toughness of the product.
Description
Technical Field
The invention relates to the technical field of low-temperature porcelain, in particular to a formula and a process of low-temperature porcelain.
Background
The porcelain is completely sintered in firing, namely, the physicochemical reaction is sufficient, mullite crystal phase is introduced, a large amount of glass phase is generated at the same time, and the mullite crystal phase is filled in pores of a porcelain body, and the porcelain is a high-grade fine porcelain with the water absorption of 0.15 part by definition, a common daily porcelain with the water absorption of 0.15-0.5 part by definition, and a coarse porcelain with the water absorption of 0.5-1.0 part by definition; pottery: the product has high water absorption, high porosity, high iron content, water absorption of 1.0-3.0 weight portions, and is ceramic product of the kind including wall tile and floor tile of 3-9 weight portions.
The existing low-temperature porcelain has poor strength and toughness performance, the strength and the toughness performance of the existing low-temperature porcelain cannot achieve the coordination effect, the strength of the existing porcelain product is improved, but the toughness performance of the existing porcelain product is reduced, and on the basis, the invention further improves and processes the existing low-temperature porcelain.
Disclosure of Invention
Aiming at the defects of the prior art, the invention aims to provide a formula and a process of low-temperature porcelain so as to solve the problems in the background technology.
The technical scheme adopted by the invention for solving the technical problems is as follows:
the invention provides a formula of a low-temperature porcelain, which comprises the following raw materials in parts by weight:
15.5-45.6 parts of kaolin, 10.6-39.5 parts of feldspar, 15.0-45.0 parts of quartz, 20.0-50.0 parts of porcelain stone, 5.5-25.8 parts of clay, 2.4-18.8 parts of modified talc, 0.5-5.8 parts of dolomite and 1.2-1.8 parts of modified graphene.
Preferably, the formula of the low-temperature porcelain comprises the following raw materials in parts by weight:
26.8 parts of kaolin, 18.0 parts of feldspar, 21.0 parts of quartz, 20.7 parts of porcelain stone, 8.6 parts of clay, 9.1 parts of modified talc, 1.8 parts of dolomite and 1.2-1.8 parts of modified graphene.
Preferably, the preparation method of the modified talc comprises the following steps:
s01: feeding talc into a proton irradiation box to be irradiated for 10-20min, wherein the irradiation power is 300-500W, and obtaining irradiation type talc after irradiation is finished;
s02: adding 5-10 parts of sodium dodecyl sulfate into 10-15 parts of chitosan solution, then adding hydrochloric acid, adjusting the pH to 4.5, then adding 2-4 parts of additive, and stirring and mixing fully to obtain a modifier;
s03: adding the S01 irradiation type talc into 3-6 times of the S02 modifier, stirring for 10-20min at 65-75 ℃, washing with water, and drying to obtain the modified talc.
The inventor of the invention finds that the performance of the prepared product can realize the coordinated remarkable improvement of strength and toughness; the strength and toughness of the product are obviously reduced without adding the modified talc, and meanwhile, the performance improvement of the product also shows a reduction trend without adding the modified graphene, and in addition, the modified graphene and the modified talc have a coordinated and synergistic effect and jointly enhance the strength and toughness of the product;
in addition, the modified talc has different preparation methods and different product performances, but the modified talc has a remarkable effect which is not as good as the talc modified by the method, and the strength and the toughness of the product can be improved in a coordinated manner.
Preferably, the stirring speed of S03 is 600-800r/min.
Preferably, the chitosan solution is prepared from chitosan and deionized water according to a weight ratio of 1.
Preferably, the additive comprises the following raw materials in parts by weight: 1-3 parts of lanthanum sulfate, 0.2-0.6 part of zirconia and 1-2 parts of tetra-n-propyl zirconate.
Preferably, the modified graphene is modified by the following method:
sending graphene into 3-5 times of mixed acid for full ultrasonic dispersion, and then washing and drying; then placing the mixture in a thermal calciner for thermal treatment;
the heat treatment comprises the following specific steps: treating graphene at 300-350 ℃ for 5-10min, then increasing the temperature to 410-430 ℃ at the speed of 1-3 ℃/min, spraying a barium nitrate aqueous solution with the mass fraction of 5% on the surface of the graphene until the surface is wetted, and then cooling the graphene to room temperature in air.
The inventor of the invention finds that the strength and toughness of the product are deteriorated when the mixed acid in the modified graphene is subjected to ultrasonic dispersion treatment, segmented heat treatment is not adopted, and barium nitrate aqueous solution spraying treatment is not adopted.
Preferably, the mixed acid is citric acid, oxalic acid and deionized water which are mixed according to the weight ratio of 1.
Preferably, the power of the ultrasonic dispersion is 350-450W, and the ultrasonic time is 10-20min.
The invention also provides a production process of the low-temperature porcelain, which comprises the following steps:
step one, weighing the following raw materials in parts by weight:
step two, sequentially adding the raw materials into a ball mill for ball milling, wherein the ball milling rotating speed is 1000-1500r/min, and the ball milling time is 20-30min;
and step three, then carrying out thermal sintering treatment at 1080-1190 ℃ for 1-2h to obtain the low-temperature porcelain.
Compared with the prior art, the invention has the following beneficial effects:
according to the low-temperature porcelain, kaolin, feldspar, porcelain stone, clay and other raw materials are matched, the modified talc and the modified graphene are added to enhance the performance of the product, the modified talc can enhance the strength and toughness of the product after being modified, the graphene and the modified talc have synergistic effects after being optimized and modified, and the modified talc and the graphene are used for enhancing and improving the strength and toughness of the product together.
Detailed Description
The technical solutions in the embodiments of the present invention are clearly and completely described below with reference to specific embodiments, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The formula of the low-temperature porcelain comprises the following raw materials in parts by weight:
15.5-45.6 parts of kaolin, 10.6-39.5 parts of feldspar, 15.0-45.0 parts of quartz, 20.0-50.0 parts of porcelain stone, 5.5-25.8 parts of clay, 2.4-18.8 parts of modified talc, 0.5-5.8 parts of dolomite and 1.2-1.8 parts of modified graphene.
The formula of the low-temperature porcelain comprises the following raw materials in parts by weight:
26.8 parts of kaolin, 18.0 parts of feldspar, 21.0 parts of quartz, 20.7 parts of porcelain stone, 8.6 parts of clay, 9.1 parts of modified talc, 1.8 parts of dolomite and 1.2-1.8 parts of modified graphene.
The preparation method of the modified talc of the present example is:
s01: feeding the talc into a proton irradiation box to be irradiated for 10-20min, wherein the irradiation power is 300-500W, and obtaining irradiation type talc after irradiation is finished;
s02: adding 5-10 parts of sodium dodecyl sulfate into 10-15 parts of chitosan solution, then adding hydrochloric acid, adjusting the pH to 4.5, then adding 2-4 parts of additive, and fully stirring and mixing to obtain a modifier;
s03: adding the S01 irradiation type talc into 3-6 times of the S02 modifier, stirring at 65-75 ℃ for 10-20min, washing with water, and drying to obtain the modified talc.
The stirring speed of S03 in this embodiment is 600-800r/min.
The chitosan solution of the embodiment is prepared from chitosan and deionized water according to a weight ratio of 1.
The additive of the embodiment comprises the following raw materials in parts by weight: 1-3 parts of lanthanum sulfate, 0.2-0.6 part of zirconia and 1-2 parts of tetra-n-propyl zirconate.
The modification method of the modified graphene of the embodiment comprises the following steps:
sending the graphene into 3-5 times of mixed acid for sufficient ultrasonic dispersion, and then washing and drying; then placing the mixture in a thermal calcining furnace for thermal treatment;
the heat treatment comprises the following specific steps: treating graphene at 300-350 ℃ for 5-10min, then increasing the temperature to 410-430 ℃ at the speed of 1-3 ℃/min, spraying a barium nitrate aqueous solution with the mass fraction of 5% on the surface of the graphene until the surface is wetted, and then cooling the graphene to room temperature in air.
The mixed acid of the embodiment is prepared by mixing citric acid, oxalic acid and deionized water according to a weight ratio of 1.
The ultrasonic dispersion power of the embodiment is 350-450W, and the ultrasonic time is 10-20min.
The production process of the low-temperature porcelain comprises the following steps:
step one, weighing the following raw materials in parts by weight:
step two, adding the raw materials into a ball mill in sequence for ball milling, wherein the ball milling rotating speed is 1000-1500r/min, and the ball milling time is 20-30min;
and step three, then carrying out thermal sintering treatment at 1080-1190 ℃ for 1-2h to obtain the low-temperature porcelain.
Example 1.
The formula of the low-temperature porcelain comprises the following raw materials in parts by weight:
15.5 parts of kaolin, 10.6 parts of feldspar, 15.0 parts of quartz, 20.0 parts of porcelain stone, 5.5 parts of clay, 2.4 parts of modified talc, 0.5 part of dolomite and 1.2 parts of modified graphene.
The preparation method of the modified talc of this example is:
s01: feeding the talc into a proton irradiation box to be irradiated for 10min, wherein the irradiation power is 300W, and obtaining irradiation type talc after irradiation is finished;
s02: adding 5 parts of sodium dodecyl sulfate into 10 parts of chitosan solution, then adding hydrochloric acid, adjusting the pH to 4.5, then adding 2 parts of additive, and fully stirring and mixing to obtain a modifier;
s03: and adding the S01 irradiation type talc into 3 times of the S02 modifier, stirring for 10min at 65 ℃, washing with water, and drying to obtain the modified talc.
In the present example, the stirring speed in S03 was 600r/min.
The chitosan solution of the embodiment is prepared from chitosan and deionized water according to a weight ratio of 1.
The additive of the embodiment comprises the following raw materials in parts by weight: 1 part of lanthanum sulfate, 0.2 part of zirconia and 1 part of tetra-n-propyl zirconate.
The modification method of the modified graphene of the embodiment comprises the following steps:
sending graphene into 3 times of mixed acid, performing ultrasonic dispersion, washing with water, and drying; then placing the mixture in a thermal calcining furnace for thermal treatment;
the heat treatment comprises the following specific steps: treating graphene at 300 ℃ for 5min, then increasing the temperature to 410 ℃ at a speed of 1 ℃/min, spraying a barium nitrate aqueous solution with the mass fraction of 5% on the surface of the graphene until the surface is wetted, and then cooling the graphene to room temperature in air.
The mixed acid of the embodiment is prepared by mixing citric acid, oxalic acid and deionized water according to a weight ratio of 1.
The power of ultrasonic dispersion in this example was 350W and the ultrasonic time was 10min.
The production process of the low-temperature porcelain comprises the following steps:
weighing the following raw materials in parts by weight:
step two, sequentially adding the raw materials into a ball mill for ball milling, wherein the ball milling rotating speed is 1000r/min, and the ball milling time is 2min;
and step three, then carrying out thermal sintering treatment at 1080 ℃ for 1h to obtain the low-temperature porcelain.
Example 2.
The formula of the low-temperature porcelain comprises the following raw materials in parts by weight:
45.6 parts of kaolin, 39.5 parts of feldspar, 45.0 parts of quartz, 50.0 parts of porcelain stone, 25.8 parts of clay, 18.8 parts of modified talc, 5.8 parts of dolomite and 1.8 parts of modified graphene.
The preparation method of the modified talc of the present example is:
s01: feeding the talc into a proton irradiation box to be irradiated for 20min, wherein the irradiation power is 500W, and obtaining irradiation type talc after irradiation is finished;
s02: adding 10 parts of sodium dodecyl sulfate into 15 parts of chitosan solution, then adding hydrochloric acid, adjusting the pH to 4.5, then adding 4 parts of additive, and fully stirring and mixing to obtain a modifier;
s03: and adding the S01 irradiation type talc into 6 times of the S02 modifier, stirring for 20min at 75 ℃, washing and drying after stirring to obtain the modified talc.
In this example, the stirring speed in S03 was 800r/min.
The chitosan solution of the embodiment is prepared from chitosan and deionized water according to a weight ratio of 1.
The additive of the embodiment comprises the following raw materials in parts by weight: 3 parts of lanthanum sulfate, 0.6 part of zirconia and 2 parts of tetra-n-propyl zirconate.
The modification method of the modified graphene of the embodiment comprises the following steps:
sending the graphene into 5 times of mixed acid, performing ultrasonic dispersion fully, and then washing and drying; then placing the mixture in a thermal calcining furnace for thermal treatment;
the heat treatment comprises the following specific steps: processing graphene at 350 ℃ for 10min, then increasing the temperature to 430 ℃ at a speed of 3 ℃/min, spraying a barium nitrate aqueous solution with the mass fraction of 5% on the surface of the graphene until the surface is wetted, and then cooling the graphene to room temperature in air.
The mixed acid of the embodiment is prepared by mixing citric acid, oxalic acid and deionized water according to a weight ratio of 1.
The power of ultrasonic dispersion in this example was 450W and the ultrasonic time was 20min.
The production process of the low-temperature porcelain comprises the following steps:
step one, weighing the following raw materials in parts by weight:
step two, sequentially adding the raw materials into a ball mill for ball milling, wherein the ball milling rotating speed is 1500r/min, and the ball milling time is 30min;
and step three, then carrying out thermal sintering treatment at the temperature of 1190 ℃ for 2h to obtain the low-temperature porcelain.
Example 3.
The formula of the low-temperature porcelain comprises the following raw materials in parts by weight:
26.8 parts of kaolin, 18.0 parts of feldspar, 21.0 parts of quartz, 20.7 parts of porcelain stone, 8.6 parts of clay, 9.1 parts of modified talc, 1.8 parts of dolomite and 1.2-1.8 parts of modified graphene.
The preparation method of the modified talc of this example is:
s01: feeding talc into a proton irradiation box to be irradiated for 15min, wherein the irradiation power is 300-500W, and obtaining irradiation type talc after irradiation is finished;
s02: adding 7.5 parts of sodium dodecyl sulfate into 12.5 parts of chitosan solution, then adding hydrochloric acid, adjusting the pH to 4.5, then adding 3 parts of additive, and fully stirring and mixing to obtain a modifier;
s03: and adding the S01 irradiation type talc into 4.5 times of the S02 modifier, stirring for 15min at 70 ℃, washing and drying to obtain the modified talc after stirring.
In this example, the stirring speed in S03 was 700r/min.
The chitosan solution of the present embodiment is prepared from chitosan and deionized water according to a weight ratio of 1.
The additive of the embodiment comprises the following raw materials in parts by weight: 2 parts of lanthanum sulfate, 0.4 part of zirconia and 1.5 parts of tetra-n-propyl zirconate.
The modification method of the modified graphene of the embodiment comprises the following steps:
sending the graphene into 4 times of mixed acid, performing ultrasonic dispersion fully, and then washing and drying; then placing the mixture in a thermal calcining furnace for thermal treatment;
the heat treatment comprises the following specific steps: processing graphene at 325 ℃ for 7.5min, raising the temperature to 420 ℃ at the speed of 2 ℃/min, spraying a barium nitrate aqueous solution with the mass fraction of 5% on the surface of the graphene until the surface is wetted, and then cooling the graphene to room temperature in air.
The mixed acid of the embodiment is prepared by mixing citric acid, oxalic acid and deionized water according to a weight ratio of 1.
The power of the ultrasonic dispersion of this example was 400W, and the ultrasonic time was 15min.
The low-temperature porcelain production process comprises the following steps:
weighing the following raw materials in parts by weight:
step two, sequentially adding the raw materials into a ball mill for ball milling, wherein the ball milling rotating speed is 1250r/min, and the ball milling time is 25min;
and step three, then carrying out thermal sintering treatment at 1100 ℃ for 1.5h to obtain the low-temperature porcelain.
Example 4.
The formula of the low-temperature porcelain comprises the following raw materials in parts by weight:
18 parts of kaolin, 12 parts of feldspar, 17 parts of quartz, 22 parts of porcelain stone, 8 parts of clay, 3 parts of modified talc, 3 parts of dolomite and 1.4 parts of modified graphene.
The preparation method of the modified talc of this example is:
s01: feeding the talc into a proton irradiation box to be irradiated for 12min, wherein the irradiation power is 350W, and obtaining irradiation type talc after irradiation is finished;
s02: adding 6 parts of sodium dodecyl sulfate into 12 parts of chitosan solution, then adding hydrochloric acid, adjusting the pH to 4.5, then adding 3 parts of additive, and fully stirring and mixing to obtain a modifier;
s03: and adding the S01 irradiation type talc into 4 times of the S02 modifier, stirring at 68 ℃ for 12min, washing with water, and drying to obtain the modified talc.
In the present example, the stirring speed in S03 was 650r/min.
The chitosan solution of the embodiment is prepared from chitosan and deionized water according to a weight ratio of 1.
The additive of the embodiment comprises the following raw materials in parts by weight: 1.4 parts of lanthanum sulfate, 0.3 part of zirconia and 1.5 parts of tetra-n-propyl zirconate.
The modification method of the modified graphene of the embodiment comprises the following steps:
sending graphene into mixed acid of which the amount is 4 times that of graphene, performing ultrasonic dispersion sufficiently, and then washing and drying the graphene; then placing the mixture in a thermal calciner for thermal treatment;
the heat treatment comprises the following specific steps: treating graphene at 310 ℃ for 6min, then increasing the temperature to 415 ℃ at a speed of 1.2 ℃/min, spraying a barium nitrate aqueous solution with the mass fraction of 5% on the surface of the graphene until the surface is wet, and then air-cooling to room temperature.
The mixed acid of the embodiment is prepared by mixing citric acid, oxalic acid and deionized water according to a weight ratio of 1.
The power of ultrasonic dispersion in this embodiment is 360W, and the ultrasonic time is 12min.
The low-temperature porcelain production process comprises the following steps:
weighing the following raw materials in parts by weight:
step two, adding the raw materials into a ball mill in sequence for ball milling, wherein the ball milling rotating speed is 1200r/min, and the ball milling time is 20-30min;
and step three, then carrying out thermal sintering treatment at 1100 ℃ for 1.2h to obtain the low-temperature porcelain.
Comparative example 1.
In contrast to example 3, no modified talc was added.
Comparative example 2.
The difference from example 3 is that no additives were added in the preparation of the modified talc.
Comparative example 3.
Different from the embodiment 3 in the preparation method of the modified talc; no chitosan solution was added and no proton irradiation treatment was used.
Comparative example 4.
Different from the example 3 in the preparation method of the modified talc;
s01: feeding talc into a proton irradiation box to be irradiated for 12min, wherein the irradiation power is 350W, and obtaining irradiation type talc after irradiation is finished;
s02: adding 6 parts of hydrochloric acid into 12 parts of chitosan solution, then adding 3 parts of sodium alginate, then adding 3 parts of lanthanum sulfate, and stirring and mixing fully to obtain a modifier;
s03: and adding the S01 irradiation type talc into 4 times of the S02 modifier, stirring at 68 ℃ for 12min, washing with water, and drying to obtain the modified talc.
Comparative example 5.
Unlike example 3, no modified graphene was added.
The results of the performance measurements of examples 1 to 3 and comparative examples 1 to 5 are as follows
| Flexural strength (MPa) | Fracture toughness (MPa/m) 1/2 ) | |
| Example 1 | 90 | 5.1 |
| Example 2 | 90 | 5.2 |
| Example 3 | 92 | 5.4 |
| Comparative example 1 | 78 | 4.1 |
| Comparative example 2 | 81 | 4.3 |
| Comparative example 3 | 84 | 4.5 |
| Comparative example 4 | 84 | 4.8 |
| Comparative example 5 | 82 | 4.3 |
The products obtained in the embodiment 3 of the invention have excellent strength and toughness performance, and the prepared products can obviously improve the coordination of strength and toughness; the strength and toughness of the product are obviously reduced without adding the modified talc, and meanwhile, the performance improvement of the product is reduced without adding the modified graphene, and in addition, the modified graphene and the modified talc have a coordinated and synergistic effect and jointly enhance the strength and toughness of the product;
in addition, the modified talc has different preparation methods and different product performances, but the modified talc has a less obvious effect than the talc modified by the method, and the strength and the toughness of the product can be improved in a coordinated manner.
The modification method of the modified graphene comprises the following steps:
sending graphene into mixed acid of which the amount is 4 times that of graphene, performing ultrasonic dispersion sufficiently, and then washing and drying the graphene; then placing the mixture in a thermal calciner for thermal treatment;
the heat treatment comprises the following specific steps: treating graphene at 310 ℃ for 6min, then increasing the temperature to 415 ℃ at a speed of 1.2 ℃/min, spraying a barium nitrate aqueous solution with the mass fraction of 5% on the surface of the graphene until the surface is wetted, and then cooling the graphene to room temperature in air.
The invention further explores the product performance by modified graphene
Experimental example 1.
The procedure was as in example 3 except that the mixed acid ultrasonic dispersion treatment was not added.
Experimental example 2.
The same as example 3, except that the thermal treatment is directly carried out at 415 ℃ for 10min, the surface of the graphene is sprayed with a barium nitrate aqueous solution with the mass fraction of 5% until the surface is wet, and then the graphene is cooled to room temperature in air.
Experimental example 3.
The same as in example 3, except that the spraying treatment with the aqueous barium nitrate solution was not carried out.
| Flexural strength (MPa) | Fracture toughness (MPa/m) 1/2 ) | |
| Experimental example 1 | 85 | 4.6 |
| Experimental example 2 | 83 | 4.5 |
| Experimental example 3 | 84 | 4.4 |
From the experimental examples 1-3, it can be seen that the strength and toughness of the product are deteriorated when the mixed acid in the modified graphene is subjected to ultrasonic dispersion treatment, segmented heat treatment is not adopted, and barium nitrate aqueous solution spraying treatment is not adopted.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (8)
1. The formula of the low-temperature porcelain is characterized by comprising the following raw materials in parts by weight:
15.5-45.6 parts of kaolin, 10.6-39.5 parts of feldspar, 15.0-45.0 parts of quartz, 20.0-50.0 parts of porcelain stone, 5.5-25.8 parts of clay, 2.4-18.8 parts of modified talc, 0.5-5.8 parts of dolomite and 1.2-1.8 parts of modified graphene; the preparation method of the modified talc comprises the following steps:
s01: feeding the talc into a proton irradiation box to be irradiated for 10-20min, wherein the irradiation power is 300-500W, and obtaining irradiation type talc after irradiation is finished;
s02: adding 5-10 parts of sodium dodecyl sulfate into 10-15 parts of chitosan solution, then adding hydrochloric acid, adjusting the pH to 4.5, then adding 2-4 parts of additive, and fully stirring and mixing to obtain a modifier;
s03: adding S01 irradiation type talc into 3-6 times of S02 modifier, stirring at 65-75 ℃ for 10-20min, washing with water, and drying to obtain modified talc; the modification method of the modified graphene comprises the following steps:
sending the graphene into 3-5 times of mixed acid for sufficient ultrasonic dispersion, and then washing and drying; then placing the mixture in a thermal calcining furnace for thermal treatment;
the heat treatment comprises the following specific steps: treating graphene at 300-350 ℃ for 5-10min, then increasing the temperature to 410-430 ℃ at the speed of 1-3 ℃/min, spraying a barium nitrate aqueous solution with the mass fraction of 5% on the surface of the graphene until the surface is wetted, and then cooling the graphene to room temperature in air.
2. The formula of the low-temperature porcelain according to claim 1 is characterized by comprising the following raw materials in parts by weight:
26.8 parts of kaolin, 18.0 parts of feldspar, 21.0 parts of quartz, 20.7 parts of porcelain stone, 8.6 parts of clay, 9.1 parts of modified talc, 1.8 parts of dolomite and 1.2-1.8 parts of modified graphene.
3. The formula of the low-temperature porcelain according to claim 1, wherein the stirring speed of S03 is 600-800r/min.
4. The formula of the low-temperature porcelain according to claim 1 is characterized in that the chitosan solution is prepared from chitosan and deionized water according to a weight ratio of 1.
5. The formula of the low-temperature porcelain according to claim 1, wherein the additive comprises the following raw materials in parts by weight: 1-3 parts of lanthanum sulfate, 0.2-0.6 part of zirconia and 1-2 parts of tetra-n-propyl zirconate.
6. The formula of the low-temperature porcelain according to claim 1, wherein the mixed acid is citric acid, oxalic acid and deionized water which are mixed according to a weight ratio of 1.
7. The formula of the low-temperature porcelain according to claim 1, wherein the ultrasonic dispersion power is 350-450W, and the ultrasonic time is 10-20min.
8. A process for producing a low-temperature porcelain according to any one of claims 1 to 7, comprising the steps of:
weighing the following raw materials in parts by weight:
step two, adding the raw materials into a ball mill in sequence for ball milling, wherein the ball milling rotating speed is 1000-1500r/min, and the ball milling time is 20-30min;
and step three, then performing thermal sintering treatment at the temperature of 1080-1190 ℃ for 1-2 hours to obtain the low-temperature porcelain.
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