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CN114544152A - Observation device and observation method for light output state of far-infrared laser chip - Google Patents

Observation device and observation method for light output state of far-infrared laser chip Download PDF

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CN114544152A
CN114544152A CN202210270508.8A CN202210270508A CN114544152A CN 114544152 A CN114544152 A CN 114544152A CN 202210270508 A CN202210270508 A CN 202210270508A CN 114544152 A CN114544152 A CN 114544152A
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laser chip
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infrared laser
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lens
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曹俊诚
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Jiangxi Wanjun Photoelectric Co ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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Abstract

The invention belongs to the technical field of far infrared measurement, in particular to an observation device and an observation method for the light-emitting state of a far infrared laser chip, which comprises a lens, an optical filter, a thermal detection array, a shell, a mobile station and a computer, wherein the optical filter is arranged on the shell; the lens images the end face of the detected far infrared laser chip, and the optical filter is used for filtering redundant infrared background radiation generated by the detected far infrared laser chip and a surrounding background thereof; during observation, the lens, the optical filter and the thermal detection array are arranged on the shell, the position of the whole observation device is moved through the mobile station, an image of the end face of the detected far infrared laser chip is positioned on the thermal detection array, the driving voltage or current of the detected far infrared laser chip is adjusted, the light emitting state of the laser chip is changed, light emitting spot information under different states is respectively recorded on the thermal detection array, and the size of a light spot, the light emitting intensity and the change of the light spot and the change of the light emitting intensity and the change of the light spot along with time are included, so that the observation of the light emitting state of the far infrared laser chip is realized.

Description

一种远红外激光器芯片出光状态的观测装置及观测方法Observation device and observation method for light output state of far-infrared laser chip

技术领域technical field

本发明属于远红外测量技术领域,具体地说,是一种远红外激光器芯片出光状态的观测装置及观测方法,用于远红外波段激光器芯片出光工作性能的测量。The invention belongs to the technical field of far-infrared measurement, in particular to an observation device and an observation method for the light-emitting state of a far-infrared laser chip, which are used for measuring the light-emitting performance of a far-infrared laser chip.

背景技术Background technique

远红外激光器芯片是甚长波频段主动探测和成像的重要光源之一,其工作波长主要覆盖20微米以上,受限于芯片制备材料的成熟度和工艺水平,当前的远红外激光器芯片尤其是半导体激光器芯片还难以实现室温工作,且芯片材料生长和芯片工艺制备的良率还较低,对不同批次芯片出光测试的需求较大,尤其是不同有源区结构的材料制备的芯片,都需要对芯片是否出光以及出光功率的高低进行定性和定量测量。The far-infrared laser chip is one of the important light sources for active detection and imaging in the even-long wave band. Its working wavelength mainly covers more than 20 microns, which is limited by the maturity and process level of the chip preparation materials. The current far-infrared laser chips, especially semiconductor lasers It is still difficult for chips to work at room temperature, and the yield of chip material growth and chip process preparation is still low, and there is a greater demand for light emission testing of different batches of chips, especially chips prepared from materials with different active area structures. Whether the chip emits light and the level of light output are qualitatively and quantitatively measured.

由于远红外波段的电磁辐射不可见,无法用肉眼或可见光相机来进行比较方便和快速地观测,目前常用的办法有两种:一种是通过分析芯片的电流-电压(I-V)曲线来判断芯片是否出光,但这种方法存在较大的误差,且判断经常不准确,因为不同有源区结构的芯片,制备工艺有一定的差异,导致芯片的I-V曲线差异较大,另外这种方法不能判断芯片出光功率的大小,只能粗略判断芯片的工作性能;第二种方法是通过测量芯片的发射谱来判断芯片的出光状态,这种方法比较灵敏,可以很好地实现对激光器芯片出光峰值波长,出光阈值电流或电压,以及出光功率的相对大小进行测量和分析,是较为常用且可靠的测量方法,但由于远红外激光器芯片通常安装于低温装置中,测量光谱时与光谱仪的光路耦合过程比较繁琐,且这种方法无法获得实时观测结果和难以实现快速测量,难以胜任大批量芯片的快速筛选工作。因此,开发一种可以对激光器芯片是否出光、出光功率大小、出光淬灭等状态进行实时观测的装置及观测方法是当前远红外激光器芯片工作性能测试和芯片筛选中亟需解决的问题。Since the electromagnetic radiation in the far-infrared band is invisible, it cannot be easily and quickly observed with the naked eye or visible light camera. There are two commonly used methods at present: one is to judge the chip by analyzing the current-voltage (I-V) curve of the chip. Whether it emits light or not, but this method has a large error, and the judgment is often inaccurate, because the preparation process of chips with different active area structures has certain differences, resulting in a large difference in the I-V curve of the chip, and this method cannot be judged. The size of the light output power of the chip can only roughly judge the working performance of the chip; the second method is to judge the light output state of the chip by measuring the emission spectrum of the chip. , the threshold current or voltage of light output, and the relative magnitude of light output power are relatively common and reliable measurement methods. It is cumbersome, and this method cannot obtain real-time observation results and is difficult to achieve rapid measurement, and it is difficult to be competent for the rapid screening of large quantities of chips. Therefore, developing a device and an observation method that can observe whether the laser chip emits light, the power of the light, and the quenching of the light in real time is an urgent problem to be solved in the current far-infrared laser chip performance test and chip screening.

发明内容SUMMARY OF THE INVENTION

本发明所要解决的技术问题是提供一种远红外激光器芯片出光状态的观测装置及观测方法,克服现有系统中测量过程繁琐、芯片筛选速度慢、无法获得实时观测结果的缺点,实现远红外激光器芯片出光状态的快速测量和快速筛选,本发明采用可实时工作的热探测阵列,通过滤除背景红外辐射,实现对远红外激光器芯片出光状态的实时观测;通过配置高阻硅透镜和三维平移台,实现对不同芯片出光状态的精确观测和分析。相比传统方法,大大提高了观测效果和芯片筛选速度。The technical problem to be solved by the present invention is to provide an observation device and an observation method for the light output state of a far-infrared laser chip, which overcomes the shortcomings of the existing system that the measurement process is cumbersome, the chip screening speed is slow, and the real-time observation results cannot be obtained. For the rapid measurement and rapid screening of the light-emitting state of the chip, the present invention adopts a thermal detection array that can work in real time, and realizes the real-time observation of the light-emitting state of the far-infrared laser chip by filtering out the background infrared radiation; by configuring a high-resistance silicon lens and a three-dimensional translation stage , to achieve accurate observation and analysis of the light output state of different chips. Compared with the traditional method, the observation effect and chip screening speed are greatly improved.

本发明采用的具体技术方案如下:一种远红外激光器芯片出光状态的观测装置,包括透镜、滤光片、热探测阵列、平移台和计算机,透镜、滤光片和热探测阵列设置在平移台上,透镜、滤光片与平移台垂直,滤光片设置在透镜和热探测阵列之间,热探测阵列采用有线或无线的方式连接到安装有成像软件的计算机上;还包括外壳,外壳设置在平移台上,外壳内封装透镜、滤光片和热探测阵列。The specific technical scheme adopted by the present invention is as follows: a device for observing the light output state of a far-infrared laser chip, comprising a lens, a filter, a thermal detection array, a translation stage and a computer, and the lens, the filter and the thermal detection array are arranged on the translation stage The lens and the filter are perpendicular to the translation stage, and the filter is arranged between the lens and the thermal detection array, and the thermal detection array is connected to the computer with the imaging software installed in a wired or wireless manner; it also includes a housing, the housing is set On the translation stage, the lens, filter and thermal detection array are housed in the housing.

在上述技术方案中,其中透镜对被测远红外激光器芯片端面进行成像,滤光片用于滤除被测远红外激光器芯片端面及其周围物体产生的多余红外背景辐射;观测时,透镜、滤光片和热探测阵列安装于外壳上,并通过移动台实现整个观测装置的位置移动,使得被测远红外激光器芯片端面的像位于热探测阵列上,热探测阵列上产生的电信号连接至计算机,由计算机上的成像软件控制;调节被测远红外激光器芯片的驱动电压或电流,使得激光器芯片出光状态发生改变,在热探测阵列上分别记录不同状态下的出光光斑信息,包括光斑的大小、出光强弱以及二者随时间的变化,从而实现对远红外激光器芯片出光状态的观测和分析。In the above technical solution, the lens images the end face of the far-infrared laser chip under test, and the filter is used to filter out the redundant infrared background radiation generated by the end face of the far-infrared laser chip under test and its surrounding objects; during observation, the lens, filter The light sheet and the thermal detection array are installed on the casing, and the position of the entire observation device is moved through the mobile stage, so that the image of the end face of the far-infrared laser chip to be measured is located on the thermal detection array, and the electrical signal generated on the thermal detection array is connected to the computer. , controlled by the imaging software on the computer; adjust the driving voltage or current of the far-infrared laser chip under test, so that the light output state of the laser chip changes, and record the light spot information in different states on the thermal detection array, including the size of the light spot, The intensity of the light output and the change of the two with time, so as to realize the observation and analysis of the light output state of the far-infrared laser chip.

本发明的进一步改进,透镜为平凸透镜,优选地,采用双面镀膜的高阻硅透镜;滤光片采用薄纸片。In a further improvement of the present invention, the lens is a plano-convex lens, preferably a high-resistance silicon lens coated on both sides; the optical filter is a thin paper sheet.

本发明的进一步改进,热探测阵列的工作波长为30μm-300μm;外壳的材质为铝合金;移动台为三维平移台。In a further improvement of the present invention, the working wavelength of the thermal detection array is 30 μm-300 μm; the material of the casing is aluminum alloy; and the mobile stage is a three-dimensional translation stage.

本发明还披露了一种远红外激光器芯片出光状态的观测方法,使用上述远红外激光器芯片出光状态的观测装置,具体包括以下步骤:The invention also discloses a method for observing the light-emitting state of the far-infrared laser chip, using the above-mentioned observation device for the light-emitting state of the far-infrared laser chip, which specifically includes the following steps:

步骤1:将所述透镜、热探测阵列安装于所述外壳上,并将外壳安装于所述移动台上,形成一个三维位置可移动的远红外辐射观测装置;Step 1: Install the lens and the thermal detection array on the housing, and install the housing on the mobile platform to form a three-dimensional position-movable far-infrared radiation observation device;

步骤2:调节所述移动台,使所述远红外激光器芯片出光端面的像刚好落在所述热探测阵列上,并通过所述计算机上的控制软件清晰地观测到;Step 2: Adjust the mobile stage so that the image of the light-emitting end face of the far-infrared laser chip just falls on the thermal detection array, and is clearly observed by the control software on the computer;

步骤3:从所述外壳顶部插入所述滤光片,滤除多余的红外背景辐射;Step 3: insert the filter from the top of the housing to filter out excess infrared background radiation;

步骤4:调节被测远红外激光器芯片的驱动电压或电流,使得激光器芯片出光状态发生改变,根据步骤2的描述,此时被测远红外激光器芯片端面输出激光光斑的像也位于所述热探测阵列上;Step 4: Adjust the driving voltage or current of the far-infrared laser chip under test, so that the light output state of the laser chip changes. According to the description in step 2, the image of the laser spot output from the end face of the far-infrared laser chip under test is also located in the thermal detector. on the array;

步骤5:通过所述计算机的控制软件分别记录不同状态下的出光光斑信息,包括光斑的大小、出光强弱以及二者随时间的变化。Step 5: Record the light spot information in different states, including the size of the light spot, the intensity of the light output, and the changes of the two over time, respectively, through the control software of the computer.

本发明的有益效果:Beneficial effects of the present invention:

(1)本发明所述的远红外激光器芯片出光状态的观测装置及观测方法,采用热探测阵列和双面镀膜的平凸型高阻硅透镜组合而成的装置来观测远红外激光器芯片出光状态,具有能量损耗小,更真实反应出光端面的激光状态,同时还具有可实时观测、出光状态对应的二维能量分布记录清楚、出光状态的连续变化记录效果好等优点。(1) The observation device and observation method of the light-emitting state of the far-infrared laser chip of the present invention use a device composed of a thermal detection array and a double-sided coated plano-convex high-resistance silicon lens to observe the light-emitting state of the far-infrared laser chip It has the advantages of small energy loss, more realistic reflection of the laser state of the light-emitting end face, real-time observation, clear recording of the two-dimensional energy distribution corresponding to the light-emitting state, and good recording effect of the continuous change of the light-emitting state.

(2)本发明所述的远红外激光器芯片出光状态的观测装置及观测方法,采用外壳将高阻硅透镜、滤光片、热探测阵列组合起来并与三维平移台组装成一个整体,使得观测装置的适用性更强,可以快速地对同一低温装置上不同位置的芯片以及不同低温装置上的芯片进行观测和出光状态分析,使得芯片出光状态的观测速度快,芯片筛选速度快。(2) The device and method for observing the light output state of a far-infrared laser chip according to the present invention use a casing to combine a high-resistance silicon lens, an optical filter, and a thermal detection array, and assemble it into a whole with a three-dimensional translation stage, so that the observation The applicability of the device is stronger, and it can quickly observe and analyze the light-emitting state of chips in different positions on the same low-temperature device and chips on different low-temperature devices, so that the observation speed of the light-emitting state of the chip is fast, and the chip screening speed is fast.

(3)本发明所述的远红外激光器芯片出光状态的观测装置及观测方法,采用插拔式滤光片的设置,使得整个出光状态的观测过程中,可以借助未插入滤光片时整个红外背景的清晰图像来进一步校准插入滤光片时的远红外图像,确保了观测结果的准确性。(3) The device and method for observing the light-emitting state of the far-infrared laser chip of the present invention adopts the setting of the plug-in filter, so that during the observation process of the entire light-emitting state, the entire infrared A clear image of the background to further calibrate the far-infrared image when the filter is inserted ensures the accuracy of the observations.

附图说明Description of drawings

图1是本发明的结构示意图。Figure 1 is a schematic structural diagram of the present invention.

图2是采用本发明提出的观测装置及观测方法获得的远红外激光器芯片出光前后的观测结果图,其中(a)为出光前未插入滤光片,(b)为出光前未插入滤光片,(c)为出光后未插入滤光片,(d)为出光后插入滤光片。Fig. 2 is the observation result diagram before and after the far-infrared laser chip obtained by adopting the observation device and the observation method proposed by the present invention, wherein (a) no filter is inserted before the light is emitted, and (b) the filter is not inserted before the light is emitted , (c) is no filter inserted after the light is emitted, (d) is the filter inserted after the light is emitted.

图3是采用本发明提出的观测装置及观测方法获得的远红外激光器芯片的出光光斑图像(a)及光斑中心处(白色虚线)的能量强弱分布曲线(b)。3 is a light spot image (a) of a far-infrared laser chip and an energy intensity distribution curve (b) at the center of the spot (white dotted line) obtained by using the observation device and observation method proposed by the present invention.

图1中:1-被测远红外激光器芯片端面,2-透镜,3-滤光片,4-热探测阵列,5-外壳,6-移动台,7-计算机。In Figure 1: 1- The end face of the far-infrared laser chip to be measured, 2- Lens, 3- Optical filter, 4- Thermal detection array, 5- Housing, 6- Mobile stage, 7- Computer.

具体实施方式Detailed ways

为了加深对本发明的理解,下面将结合附图和实施例对本发明做进一步详细描述,该实施例仅用于解释本发明,并不对本发明的保护范围构成限定。In order to deepen the understanding of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. The embodiments are only used to explain the present invention and do not limit the protection scope of the present invention.

实施例:如图1所示,一种远红外激光器芯片出光状态的观测装置,包括透镜2、滤光片3、热探测阵列4、外壳5、移动台6和计算机7;透镜2对被测远红外激光器芯片端面1进行成像,滤光片3用于滤除被测远红外激光器芯片端面及其周围物体产生的多余红外背景辐射;观测时,透镜2、滤光片3和热探测阵列4安装于外壳5上,并通过移动台6实现整个观测装置的位置移动,使得被测远红外激光器芯片端面的像位于热探测阵列4上,热探测阵列4上产生的电信号连接至计算机7,由计算机7上的成像软件控制;调节被测远红外激光器芯片的驱动电压或电流,使得激光器芯片出光状态发生改变,在热探测阵列4上分别记录不同状态下的出光光斑信息,包括光斑的大小、出光强弱以及二者随时间的变化,从而实现对远红外激光器芯片出光状态的观测和分析。Example: As shown in Figure 1, a device for observing the light output state of a far-infrared laser chip includes a lens 2, a filter 3, a thermal detection array 4, a housing 5, a mobile station 6 and a computer 7; The far-infrared laser chip end face 1 is used for imaging, and the filter 3 is used to filter out the excess infrared background radiation generated by the far-infrared laser chip end face and its surrounding objects; during observation, the lens 2, the filter 3 and the thermal detection array 4 It is installed on the casing 5, and the position of the entire observation device is moved by the mobile stage 6, so that the image of the end face of the far-infrared laser chip to be measured is located on the thermal detection array 4, and the electrical signal generated on the thermal detection array 4 is connected to the computer 7, It is controlled by the imaging software on the computer 7; the driving voltage or current of the far-infrared laser chip to be measured is adjusted, so that the light-emitting state of the laser chip changes, and the light-emitting light spot information in different states is recorded on the thermal detection array 4, including the size of the light spot. , the intensity of the light output and the change of the two with time, so as to realize the observation and analysis of the light output state of the far-infrared laser chip.

被测远红外激光器芯片端面1为半导体材料解理面,作为可选地,被测远红外激光器芯片端面的尺寸为百微米量级。The measured far-infrared laser chip end face 1 is a cleavage surface of the semiconductor material. Optionally, the measured far-infrared laser chip end face is in the order of hundreds of microns.

透镜2为平凸透镜,材质为高阻硅,作为可选地,透镜2的直径为15mm、焦距为15mm,作为优选地,透镜2的前后表面均蒸镀远红外波段增透膜;滤光片3为薄纸片,作为优选地,滤光片3的厚度为40μm;热探测阵列4的工作波长为30μm-300μm,作为优选地,热探测阵列4的帧率为25Hz,像元尺寸为17μm,像素为384×288;外壳5的材质为铝合金,作为可选地,外壳5的表面采用发黑处理工艺制备。The lens 2 is a plano-convex lens, and the material is high-resistance silicon. Optionally, the diameter of the lens 2 is 15mm and the focal length is 15mm. Preferably, the front and rear surfaces of the lens 2 are vapor-deposited with a far-infrared band antireflection film; filter; 3 is a thin paper sheet, preferably, the thickness of the filter 3 is 40 μm; the working wavelength of the thermal detection array 4 is 30 μm-300 μm, preferably, the frame rate of the thermal detection array 4 is 25 Hz, and the pixel size is 17 μm , the pixels are 384×288; the material of the casing 5 is aluminum alloy, and optionally, the surface of the casing 5 is prepared by a blackening process.

本实施例的应用,用于实现上述远红外激光器芯片出光光斑的观测与分析,具体观测方法包括以下步骤:The application of this embodiment is used to realize the observation and analysis of the light spot emitted by the far-infrared laser chip, and the specific observation method includes the following steps:

步骤1:将透镜、热探测阵列安装于外壳上,并将外壳安装于移动台上,形成一个三维位置可移动的远红外辐射观测装置;Step 1: Install the lens and the thermal detection array on the housing, and install the housing on the mobile platform to form a far-infrared radiation observation device that can move in three-dimensional position;

步骤2:调节移动台,使远红外激光器芯片出光端面的像刚好落在热探测阵列上,并通过计算机上的控制软件清晰地观测到;Step 2: Adjust the mobile stage so that the image of the light-emitting end face of the far-infrared laser chip just falls on the thermal detection array, and is clearly observed through the control software on the computer;

步骤3:从外壳顶部插入滤光片,滤除多余的红外背景辐射;Step 3: Insert a filter from the top of the housing to filter out excess infrared background radiation;

步骤4:调节被测远红外激光器芯片的驱动电压或电流,使得激光器芯片出光状态发生改变,根据步骤2的描述,此时被测远红外激光器芯片端面输出激光光斑的像也位于热探测阵列上;Step 4: Adjust the driving voltage or current of the far-infrared laser chip under test, so that the light output state of the laser chip changes. According to the description in step 2, the image of the laser spot output from the end face of the far-infrared laser chip under test is also located on the thermal detection array. ;

步骤5:通过计算机上的控制软件分别记录不同状态下的出光光斑信息,包括光斑的大小、出光强弱以及二者随时间的变化。Step 5: Record the light spot information in different states through the control software on the computer, including the size of the light spot, the light intensity and the changes of the two with time.

被测远红外激光器芯片的工作波长为81μm,移动台为三维平移台,三个维度的移动精度均为10μm、移动行程均为100mm;采用上述观测方法和三维平移台的移动参数,实现了对远红外激光器芯片是否出光的实时观测,观测结果如图2所示,其中(a)为出光前未插入滤光片,(b)为出光前未插入滤光片,(c)为出光后未插入滤光片,(d)为出光后插入滤光片;采用观测装置和观测方法,还实现了对远红外激光器芯片出光光斑的分析,分析结果如图3所示,其中(a)为出光光斑图像,(b)为光斑中心处(白色虚线)的能量强弱分布曲线,由图3(b)中的能量分布曲线可以看出,被测远红外激光器芯片的出光光斑包含多个次级斑,其中主斑的半高宽Δp1为36个像素间隔,按像素间距17μm计算,对应Δp1=612μm,次级斑的半高宽Δp2为9个像素间隔,计算得到Δp2=153μm。因此,采用本发明所提出的观测装置和观测方法实现了对远红外激光器芯片出光状态的观测以及出光光斑的分析。The operating wavelength of the far-infrared laser chip to be tested is 81 μm, and the mobile stage is a three-dimensional translation stage. The movement accuracy of the three dimensions is 10 μm, and the movement stroke is 100 mm. Using the above observation method and the movement parameters of the three-dimensional translation stage, the accuracy of the three-dimensional translation stage is realized. The real-time observation of whether the far-infrared laser chip emits light or not, the observation results are shown in Figure 2, in which (a) no filter is inserted before the light is emitted, (b) the filter is not inserted before the light is emitted, and (c) is not inserted after the light is emitted. Insert the filter, (d) is to insert the filter after the light is emitted; using the observation device and observation method, the analysis of the light spot of the far-infrared laser chip is also realized. The analysis result is shown in Figure 3, where (a) is the light output Spot image, (b) is the energy intensity distribution curve at the center of the spot (white dashed line). From the energy distribution curve in Figure 3(b), it can be seen that the light spot of the far-infrared laser chip under test contains multiple secondary Spot, in which the half-height width Δp1 of the main spot is 36 pixel intervals, calculated according to the pixel pitch of 17 μm, corresponding to Δp1 = 612 μm, the half-height width Δp2 of the secondary spot is 9 pixel intervals, and Δp2 = 153 μm is calculated. Therefore, the observation device and the observation method proposed in the present invention realize the observation of the light output state of the far-infrared laser chip and the analysis of the light output spot.

以上显示和描述了本发明的基本原理、主要特征及优点。本行业的技术人员应该了解,本发明不受上述实施例的限制,上述实施例和说明书中描述的只是说明本发明的原理,在不脱离本发明精神和范围的前提下,本发明还会有各种变化和改进,这些变化和改进都落入要求保护的本发明范围内。本发明要求保护范围由所附的权利要求书及其等效物界定。The foregoing has shown and described the basic principles, main features and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited by the above-mentioned embodiments, and the descriptions in the above-mentioned embodiments and the description are only to illustrate the principle of the present invention. Without departing from the spirit and scope of the present invention, the present invention will have Various changes and modifications fall within the scope of the claimed invention. The claimed scope of the present invention is defined by the appended claims and their equivalents.

Claims (9)

1.一种远红外激光器芯片出光状态的观测装置,其特征在于,包括透镜、滤光片、热探测阵列、平移台和计算机,所述透镜、滤光片和热探测阵列设置在平移台上,所述透镜、滤光片与所述平移台垂直,所述滤光片设置在所述透镜和所述热探测阵列之间,所述热探测阵列采用有线或无线的方式连接到安装有成像软件的计算机上。1. an observation device of a far-infrared laser chip light-emitting state, is characterized in that, comprises lens, filter, thermal detection array, translation stage and computer, and described lens, filter and thermal detection array are arranged on the translation stage , the lens and the filter are perpendicular to the translation stage, the filter is arranged between the lens and the thermal detection array, and the thermal detection array is connected to the imaging device installed in a wired or wireless manner software on the computer. 2.根据权利要求1所述的远红外激光器芯片出光状态的观测装置,其特征在于,还包括外壳,所述外壳设置在所述平移台上,所述外壳内封装所述透镜、滤光片和热探测阵列。2 . The device for observing the light-emitting state of a far-infrared laser chip according to claim 1 , further comprising a casing, the casing is arranged on the translation stage, and the lens and the filter are packaged in the casing. 3 . and thermal detection arrays. 3.根据权利要求2所述的远红外激光器芯片出光状态的观测装置,其特征在于,所述透镜为平凸透镜。3 . The device for observing the light output state of a far-infrared laser chip according to claim 2 , wherein the lens is a plano-convex lens. 4 . 4.根据权利要求2所述的远红外激光器芯片出光状态的观测装置,其特征在于,所述透镜为双面镀膜的高阻硅透镜。4 . The device for observing the light output state of a far-infrared laser chip according to claim 2 , wherein the lens is a high-resistance silicon lens coated on both sides. 5 . 5.根据权利要求3或4所述的远红外激光器芯片出光状态的观测装置,其特征在于,所述滤光片为薄纸片。5 . The device for observing the light output state of a far-infrared laser chip according to claim 3 or 4 , wherein the filter is a thin paper sheet. 6 . 6.根据权利要求5所述的远红外激光器芯片出光状态的观测装置,其特征在于,所述热探测阵列采用工作波长为30μm-300μm的热探测阵列。6 . The device for observing the light output state of a far-infrared laser chip according to claim 5 , wherein the thermal detection array adopts a thermal detection array with an operating wavelength of 30 μm-300 μm. 7 . 7.根据权利要求6所述的远红外激光器芯片出光状态的观测装置,其特征在于,所述外壳采用铝合金材料制成。7 . The device for observing the light-emitting state of a far-infrared laser chip according to claim 6 , wherein the casing is made of an aluminum alloy material. 8 . 8.根据权利要求7所述的远红外激光器芯片出光状态的观测装置,其特征在于,所述平移台为电动三维平移台。8 . The device for observing the light-emitting state of a far-infrared laser chip according to claim 7 , wherein the translation stage is an electric three-dimensional translation stage. 9 . 9.一种远红外激光器芯片出光状态的观测方法,其特征在于,使用如权利要求8所述的远红外激光器芯片出光状态的观测装置,具体包括以下步骤:9. A method for observing the light-emitting state of a far-infrared laser chip, characterized in that, using the observation device for the light-emitting state of a far-infrared laser chip as claimed in claim 8, specifically comprising the following steps: 步骤1:将所述透镜、热探测阵列安装于所述外壳上,并将外壳安装于所述移动台上,形成一个三维位置可移动的远红外辐射观测装置;Step 1: Install the lens and the thermal detection array on the housing, and install the housing on the mobile platform to form a three-dimensional position-movable far-infrared radiation observation device; 步骤2:调节所述移动台,使所述远红外激光器芯片出光端面的像刚好落在所述热探测阵列上,并通过所述计算机上的控制软件清晰地观测到;Step 2: Adjust the mobile stage so that the image of the light-emitting end face of the far-infrared laser chip just falls on the thermal detection array, and is clearly observed by the control software on the computer; 步骤3:从所述外壳顶部插入所述滤光片,滤除多余的红外背景辐射;Step 3: insert the filter from the top of the housing to filter out excess infrared background radiation; 步骤4:调节被测远红外激光器芯片的驱动电压或电流,使得激光器芯片出光状态发生改变,根据步骤2的描述,此时被测远红外激光器芯片端面输出激光光斑的像也位于所述热探测阵列上;Step 4: Adjust the driving voltage or current of the far-infrared laser chip under test, so that the light output state of the laser chip changes. According to the description in step 2, the image of the laser spot output from the end face of the far-infrared laser chip under test is also located in the thermal detector. on the array; 步骤5:通过所述计算机的控制软件分别记录不同状态下的出光光斑信息,包括光斑的大小、出光强弱以及二者随时间的变化。Step 5: Record the light spot information in different states, including the size of the light spot, the intensity of the light output, and the changes of the two over time, respectively, through the control software of the computer.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6242740B1 (en) * 1997-09-16 2001-06-05 Metorex International Oy Imaging system functioning on submillimeter waves
US20080156991A1 (en) * 2005-03-21 2008-07-03 Qing Hu Real-time, continuous-wave terahertz imaging using a microbolometer focal-plane array
CN102589713A (en) * 2012-01-10 2012-07-18 中国科学院上海微系统与信息技术研究所 Device and method for measuring output laser field shape of terahertz quantum cascade laser
CN113447527A (en) * 2021-06-11 2021-09-28 西安交通大学 Dual-mode laser infrared thermal imaging detection system and method
CN217111422U (en) * 2022-03-18 2022-08-02 江西万骏光电有限公司 Device for observing light-emitting state of far infrared laser chip

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6242740B1 (en) * 1997-09-16 2001-06-05 Metorex International Oy Imaging system functioning on submillimeter waves
US20080156991A1 (en) * 2005-03-21 2008-07-03 Qing Hu Real-time, continuous-wave terahertz imaging using a microbolometer focal-plane array
CN102589713A (en) * 2012-01-10 2012-07-18 中国科学院上海微系统与信息技术研究所 Device and method for measuring output laser field shape of terahertz quantum cascade laser
CN113447527A (en) * 2021-06-11 2021-09-28 西安交通大学 Dual-mode laser infrared thermal imaging detection system and method
CN217111422U (en) * 2022-03-18 2022-08-02 江西万骏光电有限公司 Device for observing light-emitting state of far infrared laser chip

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