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CN103477206B - Optical anisotropy's parameter measuring apparatus, measuring method and measurement system - Google Patents

Optical anisotropy's parameter measuring apparatus, measuring method and measurement system Download PDF

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Publication number
CN103477206B
CN103477206B CN201280017649.3A CN201280017649A CN103477206B CN 103477206 B CN103477206 B CN 103477206B CN 201280017649 A CN201280017649 A CN 201280017649A CN 103477206 B CN103477206 B CN 103477206B
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mentioned
reflected light
intensity
wavelength plate
semi
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CN103477206A (en
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田之冈大辅
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Moritex Corp
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Moritex Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

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Abstract

The object of the invention is to the miniaturization by incident light vertical irradiation to be sought device entirety in sample, the direction of optic axis and anisotropic size can be measured simultaneously in very short time.Optical anisotropy's parameter measuring apparatus of the present invention, be formed and from laser instrument (6) incident light exposed to sample (3) towards vertical direction and the reflected light reflected towards vertical direction guided to the measurement optical system (4) of photo detector (9) via semi-transparent semi-reflecting lens (7), polarizer (P) is configured between laser instrument (6) and semi-transparent semi-reflecting lens (7), and between semi-transparent semi-reflecting lens (7) and photo detector (9), configure device for testing light (A), configure between semi-transparent semi-reflecting lens (7) and sample (3): 1/2 wavelength plate (12), the rectilinearly polarized light produced by polarizer (P) is rotated, and 1/4 wavelength plate (13), make the direction of slow phase axle from the slow phase axle offset relative to 1/2 wavelength plate (12) ± δ (δ ≠ n π/4, n is integer) initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to 1/2 wavelength plate (12).

Description

Optical anisotropy's parameter measuring apparatus, measuring method and measurement system
Technical field
The present invention relates to a kind of measurement and there is optical anisotropy's parameter measuring apparatus of the orientation of the optic axis of optically anisotropic sample and anisotropic size, measuring method and measurement program, be particularly useful for the inspection etc. of liquid crystal orienting film.
Background technology
Liquid crystal display is formed as following structure: at surface stack transparency electrode and alignment film backside glass substrate and define color filter film at surface stack, the table side glass substrate of transparency electrode and alignment film, across distance piece (spacer) make alignment film toward each other to and enclosed the state lower seal of liquid crystal in the gap of this alignment film, and have polarized light filter coating at its table back of the body both sides lamination.
At this, in order to make liquid crystal display regular event, liquid crystal molecule need be made to be arranged in equidirectional equably, and to decide the directivity of liquid crystal molecule by alignment film.
Why this alignment film can make liquid crystal molecule proper alignment, because have molecule orientation, as long as alignment film contains its whole mask uniform molecule orientation, then be not easy to produce defect in liquid crystal display, as long as and the uneven part of molecule orientation exists, the direction of liquid crystal molecule will be disorderly, and liquid crystal display just becomes defective products.
That is, the quality of alignment film directly can affect the quality of liquid crystal display, as long as alignment film defectiveness, the directivity of liquid crystal molecule will be disorderly, therefore also can produce defect in liquid crystal display.
Therefore, when assembling liquid crystal display, as long as check alignment film whether defectiveness the alignment film that only service property (quality) is stable in advance, then the yield rate of liquid crystal display improves, and production efficiency improves.
Therefore, exist and want ordinary surveying because the molecule orientation institute of alignment film causes asking of the direction of optically anisotropic optic axis or anisotropic size to be wanted, the applicant proposes a kind of high speed and measures because the optically anisotropic method (reference patent documentation 1) that causes of molecule orientation.
The method be a kind of by incident light oblique illumination to the sample of liquid crystal orienting film etc., detect the method for the polarization state of its reflected light, the intensity of reflected light obtained is rotated based on by optical system or sample mounting table (stage), measure the direction of the optic axis in its measurement point, anisotropic size, have for the anisotropic highly sensitive and advantage that Measuring Time is short.
But, irradiating in the optical system of light from vergence direction with the incident angle of regulation, because reflected light reflects with the reflection angle identical with incident angle, therefore must the light path of incident light and reflected light be guaranteed in both sides relative to measuring center, therefore have the problem that measurement mechanism maximizes.
And, when making optical system rotate, owing to also needing the circular space guaranteeing to become the operation range corresponding with this radius of turn, therefore more need large-scale installation space.
Especially the size of female glass (motherglass) of liquid crystal display, even middle-size and small-size liquid crystal display is also about 2m with its 1 limit of female glass, large-scale liquid crystal display with female glass then 1 limit more than 3m, therefore in order to measure within the limited time under the state of female glass, multiple measurement mechanism need be configured to a dimension or matrix (matrix) shape, therefore require measurement mechanism miniaturization.
Therefore, as long as light vertical irradiation is measured optical anisotropy's parameter in the measuring surface of sample, then can the miniaturization of implement device, and this kind of measurement mechanism is also suggested (with reference to patent documentation 2).
Figure 11 illustrates the key diagram of this measurement mechanism 31, it is formed and will irradiates in sample 34 in the vertical direction by the incident light that semi-transparent semi-reflecting lens 33 reflects from the laser instrument 32 becoming light source, and the reflected light reflected in the vertical direction from sample 34 is guided to the light path of photo detector 35 through above-mentioned semi-transparent semi-reflecting lens 33, due to not oblique illumination incident light, therefore, it is possible to the miniaturization of implement device 31.
In this measurement mechanism 31, fixed polarizer P is configured between laser instrument 32 and semi-transparent semi-reflecting lens 33, and between semi-transparent semi-reflecting lens 33 and photo detector 35, rotatably configure device for testing light A, and between semi-transparent semi-reflecting lens 33 and sample 34, be provided with 1/2 wavelength plate 36 of the rectilinearly polarized light rotation making to be produced by polarizer P rotationally.
Now, if make 1/2 wavelength plate 36 rotate 180 °, the incident orientation then irradiated in the rectilinearly polarized light of sample 34 will rotating 360 degrees, as long as therefore while make the such as every 5 ° of stoppings of 1/2 wavelength plate, while make device for testing light A rotating 360 degrees, then the polarization state of reflected light when can detect the every 10 ° of changes of the incident orientation irradiated in the rectilinearly polarized light of sample.
Then, such as, if device for testing light A is often rotated 10 ° to measure intensity of reflected light, then fasten at the rotation angle θ of device for testing light A and the pass of intensity of reflected light R and can obtain 36 data, carry out Fourier (Fourier) based on these data to resolve, then can obtain the phase data of rectilinearly polarized light now relative to incident orientation ψ.
But, in order to obtain the phase data of rectilinearly polarized light relative to incident orientation 0 to 360 °, must while make the such as every 5 ° of stoppings of 1/2 wavelength plate 36, while measure for 0 ° to 180 ° 36, therefore device for testing light A to be made relative to this angle rotating 360 degrees and obtain 36 data for every 10 °, therefore device for testing light A to be made 36 times to rotate and obtain the data of total totally 36 × 36=1296 point, not only measure and expend time in, computing afterwards also expends time in, and group can not enter actual production line.
If make every 10 ° of 1/2 wavelength plate 36 stop and obtaining data for every 10 degree of device for testing light A, data number will be reduced to 1/4 and be 18 × 18=324, but result device for testing light A still must rotate 18 times, therefore Measuring Time only reduces about 1/2, and, have measuring accuracy and reduce and the problem of reduction with data number.
[at first technical literature]
Patent documentation 1
Patent documentation 1: Japanese Unexamined Patent Publication 2008-76324 publication
Patent documentation 2: Japanese Unexamined Patent Publication 11-304645 publication
Summary of the invention
Therefore, technical task of the present invention is the miniaturization by incident light vertical irradiation to be sought device entirety in sample, can measure the direction of optic axis and anisotropic size in very short time simultaneously.
In order to solve the problem, the present invention is to provide a kind of optical anisotropy's parameter measuring apparatus, the direction of the optic axis of this sample and optically anisotropic size are measured in change based on the incident light of measured zone and the polarization state of reflected light thereof that expose to sample, the feature of this optical anisotropy's parameter measuring apparatus is to comprise: measure optical system, via semi-transparent semi-reflecting lens, incident light is irradiated in above-mentioned measured zone towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to photo detector via above-mentioned semi-transparent semi-reflecting lens, and arithmetic processing apparatus, optical anisotropy's parameter is calculated based on by the intensity of reflected light detected by photo detector, above-mentioned measurement optical system configures polarizer between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, being configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, being driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate, and 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, synchronously be driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer, above-mentioned arithmetic processing apparatus calculates intensity of reflected light R (+δ) detected when 1/4 wavelength plate is synchronously rotated with 1/2 wavelength plate from initial position+δ, the difference △ R of intensity of reflected light R (-δ) detected when synchronously rotating with 1/2 wavelength plate from initial position-δ with making 1/4 wavelength plate, the direction of the optic axis of sample and optically anisotropic size is decided based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference △ R.
Optical anisotropy's parameter measuring apparatus involved in the present invention possesses measurement optical system, incident light irradiates in above-mentioned measured zone towards vertical direction from the laser instrument becoming light source via semi-transparent semi-reflecting lens by this measurement optical system, and the reflected light reflected from this measured zone towards vertical direction is guided to photo detector via above-mentioned semi-transparent semi-reflecting lens.
Therefore, incident light will irradiate in sample towards vertical direction, compared with the situation from oblique direction incident light, not only by equipment miniaturization, and can not need optical system is rotated, will not therefore need to guarantee its space.
Rectilinearly polarized light is become by polarizer from the light of laser illumination, and by 1/2 wavelength plate, the polarization axle of this rectilinearly polarized light is rotated, be converted to elliptically polarized light by 1/4 wavelength plate making slow phase axle offset ± δ configure, and irradiate in sample towards vertical direction.
The unchanged polarized light component of polarization state in the polarized light component that this reflected light comprises, again revert to rectilinearly polarized light by during 1/4 wavelength plate, be the polarization axle rectilinearly polarized light equal with the rectilinearly polarized light produced by polarizer by the point-in-time recovery of 1/2 wavelength plate, therefore can be cut off (cut) by the device for testing light being the relation of orthogonal Ni Keer relative to polarizer, relative to this, the polarized light component that polarization state has changed, owing to becoming the polarization state different from original rectilinearly polarized light, therefore photo detector can be arrived through device for testing light, the change as light intensity can be detected.
From the reflected light with optically anisotropic specimen surface, because polarized light component changes, therefore correspondingly with this anisotropy detect intensity variation.
When carrying out actual measurement, intensity of reflected light R (+δ) detected when synchronously rotating from initial position+δ and 1/2 wavelength plate making 1/4 wavelength plate, detected intensity of reflected light R (-δ) measures when 1/4 wavelength plate is synchronously rotated from initial position-δ and 1/2 wavelength plate.
That is, about a measurement point, for 2 times when the initial position of 1/4 wavelength plate being set to+δ and when being set to-δ, only make 1/2 wavelength plate rotate 180 °, make 1/4 wavelength plate rotating 360 degrees just complete measurement simultaneously.
Then difference △ R=R (+the δ)-R (-δ) of intensity of reflected light is calculated.
That is, by obtaining the difference being in the polarization state comprised in the reflected light of 2 elliptically polarized lights of symmetric relation, only can extract out and resulting from the change of optically anisotropic polarization state of sample.
Then, according to the relation of the rotation angle of rectilinearly polarized light and difference △ R, the direction of the optic axis of sample and optically anisotropic size can be decided.
Such as, if draw with the rotation angle of rectilinearly polarized light for X-axis, taking difference as the curve map of Y-axis, is the direction of the optic axis of sample in rotation angle, because difference △ R is 0, therefore reads the direction that this rotation angle just can know the optic axis of sample.
In addition, the amplitude of the short transverse of difference △ R can be reflected in due to anisotropic size, therefore just can judge optically anisotropic size according to the size of the maximum value or minimum value of difference, can pole simply and measure these optical anisotropy's parameters at short notice.
In addition, difference now presents that to be similar to 180 ° be the sinusoidal change in 1 cycle, every 90 ° obtain 0 value.This is because when the direction of the optic axis of sample is set to 0 °, intensity of reflected light can be equal with when 180 ° at 0 °, and intensity of reflected light can be equal with 270 ° at 90 °.
Therefore, the direction of optic axis only cannot be determined from these data.
But, such as, the development test of liquid crystal orienting film is the skew for confirming the distribution of alignment direction (direction of optic axis) in multiple measurement point or the direction from orientation process, known by orientation process alignment direction roughly, its skew is maximum also with regard to about 20 °, does not therefore have wrong for the direction of the optic axis situation thinking 90 °.
Accompanying drawing explanation
Fig. 1 is the key diagram of the example that optical anisotropy's parameter measuring apparatus involved in the present invention is shown.
Fig. 2 is the key diagram that its processing sequence is shown.
Fig. 3 (a) to Fig. 3 (c) is the curve map that the measurement result that the inventive method is carried out is shown.
Fig. 4 is the curve map of the distribution in the direction that optic axis is shown.
Fig. 5 is the curve map of the distribution that anisotropic size is shown.
Fig. 6 (a) to Fig. 6 (g) is the curve map that the measurement result that other method involved in the present invention is carried out is shown.
Fig. 7 (a) to Fig. 7 (d) is the curve map that the measurement result that other method involved in the present invention is carried out is shown.
Fig. 8 (a) to Fig. 8 (c) is the curve map that the measurement result that other method involved in the present invention is carried out is shown.
Fig. 9 is the key diagram that another optical anisotropy's parameter measuring apparatus involved in the present invention is shown.
Figure 10 is the key diagram that another optical anisotropy's parameter measuring apparatus involved in the present invention is shown.
Figure 11 is the key diagram that existing apparatus is shown.
Main element symbol description
1 optical anisotropy's parameter measuring apparatus; 2 mounting tables; 3 samples; S measurement point (measured zone); 4 measure optical system; 5 arithmetic processing apparatus; 6 laser instruments; 7 semi-transparent semi-reflecting lens; 9 photo detectors; P polarizer; A device for testing light; 10 two-dimentional optical position detecting elements; 121/2 wavelength plate; 131/4 wavelength plate; 14 pairs of thing side collector lenses; 17 detection side collector lenses; 18 pin holes.
Embodiment
The present invention is in order to realize the miniaturization by incident light vertical irradiation to be sought device entirety in sample, the direction of optic axis and the object of anisotropic size can be measured in very short time simultaneously, possess: measure optical system, via semi-transparent semi-reflecting lens, incident light is irradiated in above-mentioned measured zone towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to photo detector via above-mentioned semi-transparent semi-reflecting lens; And arithmetic processing apparatus, calculate optical anisotropy's parameter based on by the intensity of reflected light detected by photo detector.
Measure optical system and configure polarizer between laser instrument and semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, and be configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, is driven in rotation to make the rectilinearly polarized light produced by polarizer rotate; And 1/4 wavelength plate, make the direction of slow phase axle from the slow phase axle offset relative to above-mentioned 1/2 wavelength plate ± δ (δ ≠ n π/4, n is integer) initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate.
Arithmetic processing apparatus calculates intensity of reflected light R (+δ) detected when 1/4 wavelength plate is synchronously rotated from initial position+δ and 1/2 wavelength plate, difference △ R with intensity of reflected light R (-δ) detected when making 1/4 wavelength plate synchronously rotate from initial position-δ with 1/2 wavelength plate, and decides the direction of the optic axis of sample and optically anisotropic size according to the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference △ R.
(embodiment 1)
Optical anisotropy's parameter measuring apparatus 1 of this example shown in Fig. 1 be for detect be arranged at mounting table 2 sample 3 on the device of optical anisotropy's parameter of measurement point (point-like measured zone) S.
This optical anisotropy's parameter measuring apparatus 1 measures the direction of the optic axis in this measurement point S and the device of optically anisotropic size in order to the change of the polarization state based on the incident light and this reflected light that expose to measurement point S, and it possesses the arithmetic processing apparatus 5 such as measurement optical system 4 and computer carrying out its polarized light parsing.
In measurement optical system 4, be formed: the input path L via semi-transparent semi-reflecting lens 7, incident light being exposed to measured zone S from the laser instrument 6 becoming light source towards vertical direction 1; The reflected light reflected from measured zone S towards vertical direction is diverged via semi-transparent semi-reflecting lens 7, and makes it to diverge at semi-transparent semi-reflecting lens 8 and guide to the reflected light path L of photo detector 9 2; And the light through semi-transparent semi-reflecting lens 8 is guided to the swing detection light path L of two-dimentional optical position detecting element 10 3.
At input path L 1in, between laser instrument 6 and semi-transparent semi-reflecting lens 7, be configured with and irradiated light amplification and the optical beam expander 11 and the polarizer P that are set to parallel beam, and be configured with between semi-transparent semi-reflecting lens 7 and mounting table 2: 1/2 wavelength plate 12, in order to make the rectilinearly polarized light produced by polarizer P rotate by motor M 1rotary actuation; And 1/4 wavelength plate 13, make the direction of slow phase axle make the anglec of rotation become the mode of 2 times by motor M relative to this 1/2 wavelength plate 12 from the initial position of the slow phase axle offset+δ (δ ≠ n π/4, n is integer) relative to above-mentioned 1/2 wavelength plate 12 2synchronously rotary actuation.
In addition, between 1/4 wavelength plate 13 and mounting table 2, with by motor M 3rotate and pass through to make incident light on the surface of sample 3 to link the mode of focus by motor M to thing side collector lens 14 4spinner (revolver) 16 can be configured with up or down, this spinner 16 possess make incident light optically focused to thing side collector lens 14, and be formed with the open-work 15 under directional light state, incident light being passed.
In this example, laser instrument 6 is the semiconductor lasers using wavelength 532nm, light intensity 10mW, and is zoomed into the parallel beam of diameter 5mm by the optical beam expander 11 that magnification is 10 times, through employing extinction ratio 10 -6the polarizer P of Glan thomson (Glan-Thompson) prism, and through exposing to sample to thing side collector lens (Olympus system: multiplying power 50 times).
Now, irradiation luminous point (spot) system for sample is about 1 micron.
At reflected light path L 2in, device for testing light A is configured between semi-transparent semi-reflecting lens 7 and 8, and between semi-transparent semi-reflecting lens 8 and photo detector 9, be provided with making after reflected light converges on focal position, spread while guide to the detection side collector lens 17 of photo detector 9, and be provided with pin hole (pinhole) 18 in this focal position, accordingly, can remove and make an uproar (noise) (back reflected light of such as sample) to the focal position of thing side collector lens 14 with the light of external reflection.
In this example, use the detection side collector lens 17 of focal length 25mm, through the pin hole 18 in 20 μm, aperture, and detected the light intensity of reflected light by the photo detector 9 be made up of photomultipliers.
In addition, possess can X platform (table) 19x, Y platform 19y of the X-axis orthogonal at the optical axis Z relative to incident light and Y direction movement for mounting table 2; The θ x platform 20x that can fascinate at θ x and θ y direction in order to the swing carrying out sample 2 adjusts and θ y platform 20y, and each platform is by motor M 5to M 8drive.
In addition, in this example, the polarization axle of polarizer P is oriented parallel with X-direction, and the slow phase axle of 1/2 wavelength plate 12 at initial position towards the direction consistent with polarization axle, and the slow phase axle of 1/4 wavelength plate 13 by the slow phase axle offset relative to 1/2 wavelength plate 12 ± δ (δ ≠ n π/4, n is integer) position be set as initial position, and it is parallel with Y-axis that the polarization axle of device for testing light A is oriented.
That is, in an initial condition, the polarization axle of polarizer P and the slow phase axle of 1/2 wavelength plate 12 towards X-direction, the slow phase axle of 1/4 wavelength plate 13 then relative to X-axis towards+δ or-δ.
At this, fixed by polarizer P and device for testing light A, after making 1/2 wavelength plate 12 rotate 0 ~ 180 °, the rectilinearly polarized light being incident to 1/4 wavelength plate 13 is 0 ° with X-direction and rotates 0 ~ 360 ° around Z axis.
Now, the rotation angle of rectilinearly polarized light defines by the rotation angle of its polarization axle, and when the anglec of rotation of 1/2 wavelength plate 12 is set to ψ, the rotation angle inciding the polarization axle of the rectilinearly polarized light of 1/4 wavelength plate 13 through 1/2 wavelength plate 12 represents with 2 ψ.
In addition, because 1/4 wavelength plate 13 rotates the anglec of rotation becoming 2 times of 1/2 wavelength plate 12 from initial position ± δ, therefore this rotation angle 2 ψ ± δ represent, slow phase axle always offsets ± δ (δ ≠ n π/4 relative to the polarization axle of the rectilinearly polarized light of incidence, n is integer), the light therefore through 1/4 wavelength plate 13 is elliptically polarized light.
Thus, elliptically polarized light can under in maintenance, its ellipticity be fixing state, makes to be equivalent to the position angle rotating 360 degrees of transverse and exposes to sample.
In addition, between 1/4 wavelength plate 13 and spinner 16, be configured with the observation semi-transparent semi-reflecting lens 21 can retreated on optical axis, its reflection optical axis is then configured with the video camera 22 of the band illumination observing sample 3.
In addition, this measures optical system 4 can be accommodated in the housing (not shown) that diameter is about 100mm, and optical system in the past comprises operating range and needs diameter 600mm, therefore with area ratio Miniaturizable to about 1/36th.
Arithmetic processing apparatus 5 is connected with photo detector 9, two-dimentional optical position detecting element 10 and video camera 22 at its input interface, and is connected with each motor M at output interface 1~ M8, and according to regulated procedure, carry out the location in the XY face of the swing adjustment of sample 3, measurement point S, the measurement of Z-direction position of measurement point S, the initial position setting of 1/2 wavelength plate 12 and 1/4 wavelength plate 13 and driving, by the storage of the reflective light intensity degrees of data measured by photo detector 9, the calculating of optical anisotropy's parameter.
Fig. 2 is the process flow diagram representing a series of processing sequence that arithmetic processing apparatus 5 carries out.
Will measure optically anisotropic sample and be arranged at mounting table 2, and when main switch (mainswitch) is set to conducting (on), power supply supplies to arithmetic processing apparatus 5, laser instrument 6, photo detector 9 and each motor M 1~ M8, starts to perform following process.
First, when when the XY coordinate of step STP1 input measurement point S, in step STP2 CD-ROM drive motor M 5, M 6, make measurement point S consistent with incident light axis Z by XY platform 19x, 19y.
[swing adjustment unit]
Then, motor M is passed through in step STP3 6make spinner 16 rotate and make open-work 15 debouch incident light axis Z, step STP4 by two-dimentional optical position detecting element 10 judge from the reflected light of sample 3 optical axis whether with swing detection light path L 3optical axis consistent, when inconsistent, in step STP5 CD-ROM drive motor M 7, M 8and turn back to step STP4 by the swing of θ x, θ y platform 20x, 20y adjustment sample 3, when without when swinging, then move to step STP6.
[to collector lens focal position, thing side adjustment unit]
In step STP6 by motor M 3spinner 16 is made to rotate and make to debouch incident light axis Z to thing side collector lens 14, in step STP7, collector lens 14 is scanned in incident light axis Z-direction, the light reception intensity in step STP8 the position of collector lens 14 being fixed on photo detector 9 becomes maximum position, and the Building Z mark stored now, then move to step STP9.
[measurement point detecting unit]
Observation semi-transparent semi-reflecting lens 21 is made to debouch optical axis Z in step STP9, the image analysis of video camera 22 is carried out to judge that whether incident light axis Z is consistent with measurement point S in step STP10, just in step STP11, XY platform 19x, 19y are carried out inching if inconsistent and then turn back to step STP10, as long as be subject to irradiating and just store this XYZ coordinate in step STP12, observation semi-transparent semi-reflecting lens 21 is kept out of the way, and moves to step STP13.
[intensity of reflected light measuring unit]
In step STP13 by motor M 1the slow phase axle of 1/2 wavelength plate 12 is set to parallel with X-axis, by motor M 2the slow phase axle of 1/4 wavelength plate 13 is made to set initial position relative to X-axis towards+δ.
Afterwards, in step STP14, by motor M 1, M 2the mode making the anglec of rotation of 1/4 wavelength plate 13 become 2 times relative to the anglec of rotation ψ of 1/2 wavelength plate 12 synchronously drives, in step STP15,1/2 wavelength plate 12 is then made to rotate according to predetermined angular and measure intensity of reflected light by photo detector 9, corresponding with 2 times of angles of the rotation angle i.e. rotation angle of 1/2 wavelength plate 12 of the rectilinearly polarized light that have passed through 1/2 wavelength plate 12 and store intensity of reflected light R (+δ).
Then, in step STP16, the time point rotating 180 ° at 1/2 wavelength plate 12 interrupts measuring.
Then, motor M is passed through in step STP17 1make the slow phase axle of 1/2 wavelength plate 12 parallel with X-axis, by motor M 2the slow phase axle of 1/4 wavelength plate 13 is made to reset initial position relative to X-axis towards-δ.
Afterwards, in step STP18, by motor M 1, M 2synchronously drive in the mode that the anglec of rotation of 1/4 wavelength plate 13 becomes 2 times relative to the anglec of rotation ψ of 1/2 wavelength plate 12, in step STP19,1/2 wavelength plate 12 rotates and to 180 °, often to carry out predetermined angular rotate and then measure intensity of reflected light by photo detector 9, corresponding with 2 times of angles of the rotation angle i.e. rotation angle of 1/2 wavelength plate 12 of the rectilinearly polarized light that have passed through 1/2 wavelength plate 12 and store intensity of reflected light R (-δ).
[difference calculated unit]
Then, move to step STP20, based on measured intensity of reflected light R (+δ) and R (-δ), calculate their difference △ R=R (+δ)-R (-δ).
In addition, in order to make an uproar resulting from the light of optical system 4 removal, the process carrying out step STP13 to 20 when being arranged at mounting table 2 when being arranged at mounting table 2 when as required sample 3 being arranged at mounting table 2 towards 0 ° of direction, by sample 3 towards 90 ° of directions, by the isotropic materials without optically anisotropic glass etc. is also effective.
In this case each intensity of reflected light R is expressed as follows.
R 0(+δ): make sample 3 towards 0 °, and the initial position of 1/4 wavelength plate 13 is set to the situation of+δ,
R 0(-δ): make sample 3 towards 0 °, and the initial position of 1/4 wavelength plate 13 is set to the situation of-δ,
R 90(+δ): make sample 3 towards 90 °, and the initial position of 1/4 wavelength plate 13 is set to the situation of+δ,
R 90(-δ): make sample 3 towards 90 °, and the initial position of 1/4 wavelength plate 13 is set to the situation of-δ,
R e(+δ): isotropic materials is set, and the situation initial position of 1/4 wavelength plate 13 being set to+δ,
R e(-δ): isotropic materials is set, and the situation initial position of 1/4 wavelength plate 13 being set to-δ,
Difference △ R apart from the above, also calculates by following formula.
ΔR=[R 0(+δ)-R 0(-δ)]-[R E(+δ)-R E(-δ)]
Δ R=[R 0(+δ)-R 0(-δ)) [R 90(+δ)-R 90(-δ)]
ΔR=ΔR 0-ΔR 90
ΔR 0=[R 0(+δ)-R 0(-6)]-[R E(+δ)-R E(-δ))
ΔR 90=[R 90(+δ)-R 90(-δ)]-[R E(+δ)-R E(-δ)]
[anisotropy analytic unit]
In step STP21, rectilinearly polarized light is depicted on curve map relative to the difference △ R of rotation angle 2 ψ, carries out process of fitting treatment in step STP22, describe the curve map of 2 ψ-△ R line charts.
In step STP23, read the angle becoming △ R=0, one of them is the direction of the optic axis in the measurement point S of sample 3.
In addition, as long as the direction of the optic axis in measurement point S is consistent, then can says that anisotropy is comparatively large, can be evaluated by the amplitude of the short transverse of △ R.Therefore, in step STP24, by calculating the maximum value of △ R and minimizing difference, reflecting the value of the amplitude of the short transverse of △ R from the height etc. of 0 to maximum value, evaluate anisotropic size.
Be more than a configuration example of the present invention, then the inventive method be described.
Such as, as sample 3, the LCD TFT substrate (each pixel 30 microns) of the liquid crystal orienting film implementing orientation process will be coated with, make the direction of its orientation process parallel with X-axis and be arranged at mounting table 2, make to rotate thing lens automatic rotation spinner, make from the state that light path is left, to carry out swing adjustment based on the signal of optical position detecting element to thing lens.
After swing adjustment, incident light axis Z will be inserted into thing side collector lens 14, collector lens 14 will be scanned towards Z-direction.Become maximum position and storage Building Z mark now as long as be fixed on the position of thing side being got to optical lens 14 in the intensity of photo detector 9, then can measure the Z-direction position of measurement point S.
Then, by the image of video camera 22, adjustment XY platform 19x, 19y are to make after incident light irradiates in the pixel of TFT substrate, to measure intensity of reflected light.
First, set initial position for 1/2 wavelength plate 12 and make slow phase axle become parallel with X-axis, the initial position of slow phase axle relative to X-axis skew+δ (+2 °) is set in 1/4 wavelength plate 13.
Then, become the mode of 2 times relative to 1/2 wavelength plate 12 with the anglec of rotation of 1/4 wavelength plate, rotate 1/2 wavelength plate 12 and 1/4 wavelength plate 13 with rotational speed 20rpm and 40rpm respectively, till 1/2 wavelength plate 12 from 0 to 180 °, often rotate 5 ° all read intensity of reflected light R (+δ) by photo detector 9.
Now, the light irradiated from laser instrument 6 is advanced along input path L1, at the rectilinearly polarized light that polarizer P makes polarization axle become parallel with X-direction, at 1/2 wavelength plate 12, the polarization axle of this rectilinearly polarized light is rotated, by slow phase axle offset+2 °, 1/4 wavelength plate 13 of configuration is converted to elliptically polarized light, is irradiating sample 3 by focusing on the luminous point of diameter 1 micron to thing side collector lens 14 towards vertical direction.
Then, the reflected light spread from the measurement point S of sample 3 is advanced along reflected light path L2, to thing side collector lens 14 by parallelization, again be converted to rectilinearly polarized light through 1/4 wavelength plate 13 and 1/2 wavelength plate 12, reflected at semi-transparent semi-reflecting lens 7, after device for testing light A, reflected at semi-transparent semi-reflecting lens 8, by being arranged on the pin hole 18 in 20 μm, the aperture of the focal position of detection side collector lens 17, remove and make an uproar (back reflected light of such as sample) to the focal position of thing side collector lens 14 with the light of external reflection, and only make the reflected light reflected from measurement point S arrive photo detector 9.
Now, the unchanged polarized light component of polarization state in the polarized light component comprised in reflected light reverts to rectilinearly polarized light by during 1/4 wavelength plate 13 again, be the polarization axle rectilinearly polarized light parallel with X-axis at the point-in-time recovery that have passed 1/2 wavelength plate 12, the device for testing light A that therefore can be polarized axle parallel with Y-axis cut off, relative to this, the vicissitudinous polarized light component of polarization state, owing to becoming the polarization state different from original rectilinearly polarized light, therefore can arrive photo detector 9 through device for testing light A, can be detected as the change of light intensity.
Then, setting initial position for 1/2 wavelength plate 12 makes slow phase axle become parallel with X-axis, after the initial position of slow phase axle relative to X-axis skew-δ (-2 °) is set in 1/4 wavelength plate 13, similarly measure intensity of reflected light R (-δ) by photo detector 9.
Then, the difference △ R of these intensity of reflected light R (+δ), R (-δ) is calculated by following formula.
ΔR=R(+δ)-R(-δ)
Fig. 3 (a) to Fig. 3 (c) is the curve map of the measurement result represented now, following curve map is rotation angle 2 ψ that transverse axis is the rectilinearly polarized light rotated by 1/2 wavelength plate 12, the longitudinal axis is Fig. 3 (a) is intensity of reflected light R (+δ), Fig. 3 (b) is intensity of reflected light R (-δ), and Fig. 3 (c) is difference △ R.
Then, carry out process of fitting treatment to the data of Fig. 3 (c), reading angle 2 ψ becoming the polarization axle of △ R=0, is then 10 °, 100 °, 190 °, 280 °.
The orientation process direction parallel with X-axis (0 °) being arranged at the sample 3 of mounting table 2 is known 10 ° (190 °) closest to the 0 ° direction (alignment direction) that is the optic axis of this measurement point S therefore.
Anisotropic size H such as can obtain with following formula.
H=ΔRmax-Δrmin
Now, for the non-defective unit measured in advance, measure anisotropic size H 0, and based on the ratio H/H with it 0if be such as more than 0.9, then can judge that anisotropic size is suitable.
Fig. 4 represents that Fig. 5 is the curve map representing its distribution for anisotropic size for being set as that on the surface of sample 3 rectangular multiple measurement points measure the curve map of the result in the direction of optic axis.
(embodiment 2)
In addition, the light of optical system 4 is measured when making an uproar larger because result from, in order to be removed, when being arranged at mounting table 2 when as required sample 3 being arranged at mounting table 2 towards 0 ° of direction, by sample 3 towards 90 ° of directions, the situation that the optics isotropic materials without optically anisotropic glass etc. is arranged at mounting table 2 gets off to measure intensity of reflected light, calculate difference like that if as follows, then can more with high accuracy measure optical anisotropy's parameter.
Fig. 6 is based on from the intensity of reflected light R making orientation process direction be arranged at the sample 3 of mounting table 2 towards parallel with X-axis (0 ° of direction) 0(+δ), R 0(-δ), intensity of reflected light R when optics isotropic materials and glass being arranged at mounting table 2 e(+δ), R e(-δ), measurement result when calculating difference △ R in order to formula.
Δ R=[R 0(+δ)-R 0(-δ))-[R e(+δ) R e(-δ)]
Fig. 6 (a) is intensity of reflected light R 0(+δ), Fig. 6 (b) is intensity of reflected light R 0(-δ), Fig. 6 (c) is its poor [R 0(+δ)-R 0(-δ)], Fig. 6 (d) is intensity of reflected light R e(+δ), Fig. 6 (e) is intensity of reflected light R e(-δ), Fig. 6 (f) are its poor [R e(+δ)-R e(-δ)], Fig. 6 (g) is difference △ R.
Then, carry out process of fitting treatment to the data of Fig. 6 (g), reading angle 2 ψ becoming the polarization axle of △ R=0, is 12 °, 102 °, 192 °, 282 °.
Because the orientation process direction being arranged at the sample 3 of mounting table 2 is parallel with X-axis (0 °), therefore known 12 ° (192 °) closest to 0 ° are the directions (alignment direction) of the optic axis of this measurement point S.
(embodiment 3)
Fig. 7 is based on from the intensity of reflected light R making orientation process direction be arranged at the sample 3 of mounting table 2 towards parallel with X-axis (0 ° of direction) 0(+δ), R 0(-δ), will from the intensity of reflected light R making orientation process direction be arranged at the sample 3 of mounting table 2 towards parallel with X-axis (90 ° of directions) 90(+δ), R 90(-δ), measurement result when calculating difference △ R with following formula.
ΔR=[R 0(+δ)-R 0(-δ)]-[R 90(+δ)-R 90(-δ)]
Accordingly, anisotropy intrinsic for optical system can be removed, and anisotropic size becomes 2 times further, therefore can carry out the higher measurement of degree of accuracy.
For intensity of reflected light R 0(+δ) and R 0(-δ), uses the data of Fig. 6 (a) and Fig. 6 (b).
Fig. 7 (a) is intensity of reflected light R 90(+δ), Fig. 7 (b) is intensity of reflected light R 90(-δ), Fig. 7 (c) represents its poor [R 90(+δ)-R 90(-δ)], Fig. 7 (d) is difference delta R.
Then, carry out process of fitting treatment to the data of Fig. 7 (d), reading angle 2 Ψ becoming the polarization axle of Δ R=0, is 15 °, 105 °, 195 °, 285 °.
Because the orientation process direction being arranged at the sample 3 of mounting table 2 is parallel with X-axis (0 °), therefore known 15 ° (195 °) closest to 0 ° are the directions (alignment direction) of the optic axis of this measurement point S.
(embodiment 4)
At this, as long as need to utilize intermediate data [R 0(+δ)-R 0(-δ)] and [R 90(+δ)-R 90(-δ)], and remove in advance for each and result from the light of optical system 4 and make an uproar, then obtain difference delta R by following formula 0and Δ R 90.
ΔR 0=[R 0(+δ)-R 0(-δ)]-[R E(+δ)-R E(-δ)]
ΔR 90=[R 90(+δ)-R 90(-δ)]-[R E(+δ)-R E(-δ)]
Based on these data, obtain difference delta R by following formula.
ΔR=ΔR 0-ΔR 90。
Intensity of reflected light R 0(+δ), R 0(-δ), R e(+δ), R e(-δ) uses the data of Fig. 6 (a), Fig. 6 (b), Fig. 6 (d), Fig. 6 (e), intensity of reflected light R 90(+δ), R 90(-δ) uses the data of Fig. 7 (a), Fig. 7 (b).
Fig. 8 (a) is difference delta R 0, Fig. 8 (b) is difference delta R 90, its difference delta R=Δ R 0-Δ R 90with coming to the same thing of Fig. 7 (d).
(embodiment 5)
Fig. 9 is the key diagram representing another optical anisotropy's parameter measuring apparatus of the present invention.
Optical anisotropy's parameter measuring apparatus 25 of this example can for the measured zone S of width with a certain degree 2(such as diameter 10mm) entirety carries out optically anisotropic evaluation.In addition, the part repeated with Fig. 1 gives same-sign and detailed.
In this example, setting its multiplying power by being arranged at the optical beam expander 11 measured between the laser instrument 6 of optical system 4 and semi-transparent semi-reflecting lens 7, incident light being become have the parallel beam of the beam diameter (such as diameter 10mm) of the size corresponding with measured zone S2.
In addition, do not arrange Fig. 1 to thing side collector lens 14, detection side collector lens 17, pin hole 18.
Accordingly, become the incident light of the parallel beam of diameter 10mm at optical beam expander 11, through polarizer P, 1/2 wavelength plate 12,1/4 wavelength plate 13 and become elliptically polarized light, expose to the measured zone S of sample 3 2overall.
This reflected light passes 1/4 wavelength plate 13,1/2 wavelength plate 12 under the state of the parallel beam of diameter 10mm, and along reflected light path L 2through device for testing light A, arrive photo detector 9, measure its light intensity.
Now, measured zone S 2the direction of interior optic axis is detected its average direction, as long as the direction of optic axis is consistent, then represents that the value H of anisotropic size is comparatively large, if having deviation in the direction of optic axis, then represents that the value H of anisotropic size is less.
(embodiment 6)
Figure 10 is the key diagram representing another optical anisotropy's parameter measuring apparatus of the present invention, and the part repeated with Fig. 1 gives same-sign and detailed.
Optical anisotropy's parameter measuring apparatus 26 of this example, even if when the diameter of wavelength plate 12,13 sets larger by measured zone S3 (such as diameter about 1mm), also can for this measured zone S 3entirety carries out optically anisotropic evaluation by one-shot measurement.
In this example, between the laser instrument 6 measuring optical system 4 and semi-transparent semi-reflecting lens 7, be provided with and irradiated the optical beam expander 11 that light is set to the parallel beam of the beam diameter (such as 5mm) of regulation, and between 1/4 wavelength plate 13 and the mounting table 2 that sample 3 is set, be provided with expanding for incident light as having and measured zone S 3the optical beam expander 27 of the parallel beam of the beam diameter of corresponding size.
In addition, do not arrange Fig. 1 to thing side collector lens 14, detection side collector lens 17, pin hole 18.
Accordingly, the incident light of the parallel beam of 5mm is become at initial optical beam expander 11, through polarizer P, 1/2 wavelength plate 12,1/4 wavelength plate 13 and become elliptically polarized light, and optical beam expander 27 by expanding be the parallel beam of diameter 1m, and expose to the measured zone S of sample 3 2overall.
This reflected light becomes the parallel beam of diameter 1m, advances in the opposite direction to optical beam expander 27, becomes the parallel beam of diameter 5mm and passes 1/4 wavelength plate 13,1/2 wavelength plate 12, along reflected light path L 2and arrive photo detector 9 through device for testing light A, and measure its light intensity.
Now, measured zone S 2the angle detecting of interior optic axis goes out its average direction, as long as the direction of optic axis is consistent, then represents that the value H of anisotropic size is comparatively large, if there is deviation, then represents that the point that the value H of anisotropic size is less is identical with the above embodiments.
[utilizability in industry]
The present invention can be applicable to have optically anisotropic goods, is specially adapted to the quality check etc. of liquid crystal orienting film.

Claims (12)

1. optical anisotropy's parameter measuring apparatus measures the direction of the optic axis of this sample and an optically anisotropic size based on the change of the incident light of measured zone and the polarization state of reflected light thereof that expose to sample, and the feature of this optical anisotropy's parameter measuring apparatus is to comprise:
Measure optical system, via semi-transparent semi-reflecting lens, incident light is irradiated in above-mentioned measured zone towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to photo detector via above-mentioned semi-transparent semi-reflecting lens; And
Arithmetic processing apparatus, calculates optical anisotropy's parameter based on by the intensity of reflected light detected by photo detector,
Above-mentioned measurement optical system configures polarizer between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, being configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, being driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate; And 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer,
Above-mentioned arithmetic processing apparatus calculates intensity of reflected light R (+δ) detected when 1/4 wavelength plate is synchronously rotated with 1/2 wavelength plate from initial position+δ, difference delta R with detected intensity of reflected light R (-δ) when making 1/4 wavelength plate synchronously rotate with 1/2 wavelength plate from initial position-δ, decides the direction of the optic axis of sample and optically anisotropic size based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference delta R.
2. optical anisotropy's parameter measuring apparatus according to claim 1, it is characterized in that: between the above-mentioned laser instrument and semi-transparent semi-reflecting lens of above-mentioned measurement optical system, being provided with the optical beam expander of the parallel beam above-mentioned incident light being set to the beam diameter with the size corresponding with measuring region.
3. optical anisotropy's parameter measuring apparatus according to claim 1, is characterized in that:
Between the above-mentioned laser instrument and semi-transparent semi-reflecting lens of above-mentioned measurement optical system, be provided with and irradiated the optical beam expander that light is set to the parallel beam with regulation beam diameter;
Between above-mentioned 1/4 wavelength plate and said sample, can be provided with thing side collector lens relatively movably at its optical axis direction, this makes above-mentioned incident light optically focused to make focal point on the surface of this sample to thing side collector lens;
Between above-mentioned device for testing light and photo detector, be provided with and make after above-mentioned reflected light converges on focal position, to spread the detection side collector lens guiding to photo detector, and be provided with pin hole in this focal position.
4. optical anisotropy's parameter measuring apparatus according to claim 1, is characterized in that:
When said determination region is set greater than the diameter of each above-mentioned wavelength plate,
Between the above-mentioned laser instrument and semi-transparent semi-reflecting lens of above-mentioned measurement optical system, be provided with and irradiated the optical beam expander that light is set to the parallel beam of the beam diameter with regulation;
Between above-mentioned 1/4 wavelength plate and said sample, be provided with the optical beam expander of the parallel beam of expanding for the above-mentioned incident light beam diameter for having the size corresponding with measured zone.
5. optical anisotropy's measurement method of parameters, the direction of the optic axis of this sample and optically anisotropic size are measured in change based on the incident light of measured zone and the polarization state of reflected light thereof that expose to sample, and the feature of this optical anisotropy's measurement method of parameters is to comprise:
Measure optical system, via semi-transparent semi-reflecting lens, incident light irradiated in above-mentioned measured zone towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to photo detector via above-mentioned semi-transparent semi-reflecting lens,
This measurement optical system configures polarizer between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, being configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, being driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate; And 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer,
This optical anisotropy's measurement method of parameters possesses:
Intensity of reflected light measuring process, make above-mentioned 1/4 wavelength plate while synchronously rotate while measure intensity of reflected light R (+δ) with 1/2 wavelength plate from initial position+δ, and above-mentioned 1/4 wavelength plate is synchronously rotated with 1/2 wavelength plate while measure intensity of reflected light R (-δ) from initial position-δ;
Difference calculates step, based on detected intensity of reflected light R (+δ) and R (-δ), calculates difference delta R by Δ R=R (+δ)-R (-δ);
Anisotropy analytical procedure, decides the direction of optic axis and optically anisotropic size based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference delta R.
6. optical anisotropy's measurement method of parameters, the direction of the optic axis of this sample and optically anisotropic size are measured in change based on the incident light of measured zone and the polarization state of reflected light thereof that expose to sample, and the feature of this optical anisotropy's measurement method of parameters is to comprise:
Measure optical system, via semi-transparent semi-reflecting lens, incident light is irradiated in above-mentioned measured zone towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to photo detector via above-mentioned semi-transparent semi-reflecting lens;
This measurement optical system configures polarizer between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, being configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, being driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate; And 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer,
This optical anisotropy's measurement method of parameters possesses:
Intensity of reflected light measuring process, said sample is set, make above-mentioned 1/4 wavelength plate while synchronously rotate while measure intensity of reflected light R (+δ) with 1/2 wavelength plate from initial position+δ, above-mentioned 1/4 wavelength plate is synchronously rotated with 1/2 wavelength plate while measure intensity of reflected light R (-δ) from initial position-δ;
With reference to intensity of reflected light measuring process, substitute said sample and arrange without optically anisotropic reference plate, measuring in the same manner as above-mentioned intensity of reflected light measuring process with reference to intensity of reflected light R e(+δ) and R e(-δ);
Difference calculates step, based on above-mentioned intensity of reflected light R (+δ) and R (-δ), above-mentioned reference intensity of reflected light R e(+δ) and R e(-δ), passes through
ΔR＝[R(+δ)-R(-δ)]-[R E(+δ)-R E(-δ)]
Calculate difference delta R; And
Anisotropy analytical procedure, decides the direction of optic axis and optically anisotropic size based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference delta R.
7. optical anisotropy's measurement method of parameters, the direction of the optic axis of this sample and optically anisotropic size are measured in change based on the incident light of measured zone and the polarization state of reflected light thereof that expose to sample, and the feature of this optical anisotropy's measurement method of parameters is to comprise:
Measure optical system, via semi-transparent semi-reflecting lens, incident light is irradiated in above-mentioned measured zone towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to photo detector via above-mentioned semi-transparent semi-reflecting lens;
This measurement optical system configures polarizer between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, being configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, being driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate; And 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer,
This optical anisotropy's measurement method of parameters possesses:
1st intensity of reflected light measuring process, under the state that said sample is arranged at any direction, makes above-mentioned 1/4 wavelength plate synchronously rotate while measure intensity of reflected light R with 1/2 wavelength plate from initial position+δ 0(+δ), makes above-mentioned 1/4 wavelength plate synchronously rotate while measure intensity of reflected light R with 1/2 wavelength plate from initial position-δ 0(-δ);
2nd intensity of reflected light measuring process, under the state making said sample half-twist centered by the optical axis of incident light, measures intensity of reflected light R in the same manner as above-mentioned 1st intensity of reflected light measuring process 90(+δ) and R 90(-δ);
1st difference calculates step, based on intensity of reflected light R measured in above-mentioned 1st intensity of reflected light measuring process 0(+δ) and R 0(-δ) and intensity of reflected light R measured in the 2nd intensity of reflected light measuring process 90(+δ) and R 90(-δ), passes through
ΔR＝[R 0(+δ)-R 0(-δ)]-[R 90(+δ)-R 90(-δ)]
Calculate difference delta R; And
Anisotropy analytical procedure, decides the direction of optic axis and optically anisotropic size based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference delta R.
8. optical anisotropy's measurement method of parameters, the direction of the optic axis of this sample and optically anisotropic size are measured in change based on the incident light of measured zone and the polarization state of reflected light thereof that expose to sample, and the feature of this optical anisotropy's measurement method of parameters is to comprise:
Measure optical system, via semi-transparent semi-reflecting lens, incident light is irradiated in above-mentioned measured zone towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to photo detector via above-mentioned semi-transparent semi-reflecting lens;
This measurement optical system configures polarizer between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, being configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, being driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate; And 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer,
This optical anisotropy's measurement method of parameters possesses:
1st intensity of reflected light measuring process, under the state that said sample is arranged at any direction, makes above-mentioned 1/4 wavelength plate synchronously rotate while measure intensity of reflected light R with 1/2 wavelength plate from initial position+δ 0(+δ), makes above-mentioned 1/4 wavelength plate synchronously rotate while measure intensity of reflected light R with 1/2 wavelength plate from initial position-δ 0(-δ);
2nd intensity of reflected light measuring process, under the state making said sample half-twist centered by the optical axis of incident light, measures intensity of reflected light R in the same manner as above-mentioned 1st intensity of reflected light measuring process 90(+δ) and R 90(-δ);
With reference to intensity of reflected light measuring process, alternative said sample arranges without optically anisotropic reference plate, measures with reference to intensity of reflected light R in the same manner as above-mentioned 1st intensity of reflected light measuring process e(+δ) and R e(-δ);
1st difference calculates step, based on intensity of reflected light R measured in above-mentioned 1st intensity of reflected light measuring process 0(+δ) and R 0(-δ), reference intensity of reflected light R e(+δ) and R e(-δ), passes through
ΔR 0＝[R 0(+δ)-R 0(-δ)]-[R E(+δ)-R E(-δ)]
Calculate difference delta R 0;
2nd difference calculates step, based on intensity of reflected light R measured in above-mentioned 2nd intensity of reflected light measuring process 90(+δ) and R 90(-δ), reference intensity of reflected light R e(+δ) and R e(-δ), passes through
ΔR 90＝[R 90(+δ)-R 90(-δ)]-[R E(+δ)-R E(-δ)]
Calculate difference delta R 90;
3rd difference calculates step, based on each above-mentioned difference delta R 0and Δ R 90, pass through
ΔR＝ΔR 0-ΔR 90
Calculate difference delta R; And
Anisotropy analytical procedure, decides the direction of optic axis and optically anisotropic size based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference delta R.
9. optical anisotropy's parameter measurement system, operational measure optical system is carried out by computer, the direction of the optic axis of sample and optically anisotropic size is measured based on the intensity by the reflected light detected by photo detector, this measurement optical system is formed with light path, this light path via semi-transparent semi-reflecting lens, incident light is irradiated measured zone in said sample towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to above-mentioned photo detector via above-mentioned semi-transparent semi-reflecting lens, polarizer is configured between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, be configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, be driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate, and 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer,
This optical anisotropy's parameter measurement system possesses:
Intensity of reflected light measuring unit, above-mentioned 1/4 wavelength plate is set in initial position+δ, make this 1/4 wavelength plate while with 1/2 wavelength plate synchronously rotary actuation while measure intensity of reflected light R (+δ) with above-mentioned photo detector, and associate with the rotation angle of above-mentioned rectilinearly polarized light and be stored in the storage area preset, above-mentioned 1/4 wavelength plate is set in initial position-δ, make this 1/4 wavelength plate while with 1/2 wavelength plate synchronously rotary actuation while measure intensity of reflected light R (-δ) with above-mentioned photo detector, and associate with the rotation angle of above-mentioned rectilinearly polarized light and be stored in the storage area preset,
Difference calculated unit, based on stored intensity of reflected light R (+δ) and R (-δ), passes through
ΔR＝R(+δ)-R(-δ)
Calculate difference delta R; And
Anisotropy analytic unit, decides the direction of optic axis and optically anisotropic size based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference delta R.
10. optical anisotropy's parameter measurement system, operational measure optical system is carried out by computer, the direction of the optic axis of sample and optically anisotropic size is measured based on the intensity by the reflected light detected by photo detector, this measurement optical system is formed with light path, this light path via semi-transparent semi-reflecting lens, incident light is irradiated measured zone in said sample towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to above-mentioned photo detector via above-mentioned semi-transparent semi-reflecting lens, polarizer is configured between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, be configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, be driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate, and 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer,
This optical anisotropy's parameter measurement system possesses:
Intensity of reflected light measuring unit, above-mentioned 1/4 wavelength plate is set in initial position+δ, make this 1/4 wavelength plate while with 1/2 wavelength plate synchronously rotary actuation while measure intensity of reflected light R (+δ) with above-mentioned photo detector, and associate with the rotation angle of above-mentioned rectilinearly polarized light and be stored in the storage area preset, above-mentioned 1/4 wavelength plate is set in initial position-δ, make this 1/4 wavelength plate while with 1/2 wavelength plate synchronously rotary actuation while measure intensity of reflected light R (-δ) with above-mentioned photo detector, and associate with the rotation angle of above-mentioned rectilinearly polarized light and be stored in the storage area preset,
With reference to intensity of reflected light measuring unit, for without optically anisotropic reference plate, measure in the same manner as above-mentioned intensity of reflected light measuring unit with reference to intensity of reflected light R e(+δ) and R e(-δ);
Difference calculated unit, based on above-mentioned intensity of reflected light R (+δ) and R (-δ), above-mentioned reference intensity of reflected light R e(+δ) and R e(-δ), passes through
ΔR＝[R(+δ)-R(-δ)]-[R E(+δ)-R E(-δ)]
Calculate difference delta R; And
Anisotropy analytic unit, decides the direction of optic axis and optically anisotropic size based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference delta R.
11. 1 kinds of optical anisotropy's parameter measurement systems, operational measure optical system is carried out by computer, the direction of the optic axis of sample and optically anisotropic size is measured based on the intensity by the reflected light detected by photo detector, this measurement optical system is formed with light path, this light path via semi-transparent semi-reflecting lens, incident light is irradiated measured zone in said sample towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to above-mentioned photo detector via above-mentioned semi-transparent semi-reflecting lens, polarizer is configured between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, be configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, be driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate, and 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer,
This optical anisotropy's parameter measurement system possesses:
1st intensity of reflected light measuring unit, for the said sample being arranged at any direction, makes above-mentioned 1/4 wavelength plate synchronously rotate while measure intensity of reflected light R with 1/2 wavelength plate from initial position+δ 0(+δ), makes above-mentioned 1/4 wavelength plate synchronously rotate while measure intensity of reflected light R with 1/2 wavelength plate from initial position-δ 0(-δ), makes each intensity of reflected light associate with the rotation angle of above-mentioned rectilinearly polarized light and be stored in the storage area preset;
2nd intensity of reflected light measuring unit, under the state making said sample half-twist centered by the optical axis of incident light, measures intensity of reflected light R in the same manner as above-mentioned 1st intensity of reflected light measuring unit 90(+δ) and R 90(-δ), and make each intensity of reflected light associate with the rotation angle of above-mentioned rectilinearly polarized light and be stored in the storage area preset;
Difference calculated unit, based on intensity of reflected light R measured in above-mentioned 1st intensity of reflected light measuring unit 0(+δ) and R 0(-δ) and intensity of reflected light R measured in the 2nd intensity of reflected light measuring unit 90(+δ) and R 90(-δ), passes through
ΔR＝[R 0(+δ)-R 0(-δ)]-[R 90(+δ)-R 90(-δ)]
Calculate difference delta R; And
Anisotropy analytic unit, decides the direction of optic axis and optically anisotropic size based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference delta R.
12. 1 kinds of optical anisotropy's parameter measurement systems, operational measure optical system is carried out by computer, the direction of the optic axis of sample and optically anisotropic size is measured based on the intensity by the reflected light detected by photo detector, this measurement optical system is formed with light path, this light path via semi-transparent semi-reflecting lens, incident light is irradiated measured zone in said sample towards vertical direction from the laser instrument becoming light source, and the reflected light reflected from this measured zone towards vertical direction is guided to above-mentioned photo detector via above-mentioned semi-transparent semi-reflecting lens, polarizer is configured between above-mentioned laser instrument and above-mentioned semi-transparent semi-reflecting lens, and between semi-transparent semi-reflecting lens and photo detector, configure device for testing light, be configured with between semi-transparent semi-reflecting lens and sample: 1/2 wavelength plate, be driven in rotation to make the rectilinearly polarized light produced by above-mentioned polarizer rotate, and 1/4 wavelength plate, from make the direction of slow phase axle relative to the slow phase axle offset ± δ of above-mentioned 1/2 wavelength plate initial position, be synchronously driven in rotation in the mode that the anglec of rotation becomes 2 times relative to this 1/2 wavelength plate, wherein, δ ≠ n π/4, n is integer,
This optical anisotropy's parameter measurement system possesses:
1st intensity of reflected light measuring unit, for the said sample being arranged at any direction, make above-mentioned 1/4 wavelength plate from initial position+δ with 1/2 wavelength plate synchronous rotary while measure intensity of reflected light R 0(+δ), make above-mentioned 1/4 wavelength plate from initial position-δ with 1/2 wavelength plate synchronous rotary while measure intensity of reflected light R 0(-δ), and make each intensity of reflected light associate with the rotation angle of above-mentioned rectilinearly polarized light and be stored in the storage area preset;
2nd intensity of reflected light measuring unit, under the state making said sample half-twist centered by the optical axis of incident light, measures intensity of reflected light R in the same manner as above-mentioned 1st intensity of reflected light measuring unit 90(+δ) and R 90(-δ), and make each intensity of reflected light associate with the rotation angle of above-mentioned rectilinearly polarized light and be stored in the storage area preset;
With reference to intensity of reflected light measuring unit, arrange for alternative said sample without optically anisotropic reference plate, measure in the same manner as above-mentioned 1st intensity of reflected light measuring unit with reference to intensity of reflected light R e(+δ) and R e(-δ), and make each intensity of reflected light associate with the rotation angle of above-mentioned rectilinearly polarized light and be stored in the storage area preset;
1st difference calculated unit, based on intensity of reflected light R measured in above-mentioned 1st intensity of reflected light measuring unit 0(+δ) and R 0(-δ), reference intensity of reflected light R e(+δ) and R e(-δ), passes through
ΔR 0＝[R 0(+δ)-R 0(-δ)]-[R E(+δ)-R E(-δ)]
Calculate difference delta R 0;
2nd difference calculated unit, based on intensity of reflected light R measured in above-mentioned 2nd intensity of reflected light measuring unit 90(+δ) and R 90(-δ), reference intensity of reflected light R e(+δ) and R e(-δ), passes through
ΔR 90＝[R 90(+δ)-R 90(-δ)]-[R E(+δ)-R E(-δ)]
Calculate difference delta R 90;
3rd difference calculated unit, based on each above-mentioned difference delta R 0and Δ R 90, pass through
ΔR＝ΔR 0-ΔR 90
Calculate difference delta R; And
Anisotropy analytic unit, decides the direction of optic axis and optically anisotropic size based on the rotation angle of above-mentioned rectilinearly polarized light and the relation of above-mentioned difference delta R.
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