CN103243885A - Low-cost color-adjustable low-radiation window sill wall film system and preparation method thereof - Google Patents

Abstract

The invention discloses a low-cost color-adjustable low-radiation window sill wall film system and a preparation method thereof. The film system sequentially includes a lower silicon nitride thin film plated on the transparent base, a visible light absorption thin film, a metal thin film and an upper silicon nitride protective film from the top of the transparent base. The film system of the invention has an average reflectance to sunlight of 5% to 30% in the range of visible light, and an emissivity of less than 10%. At the same time, under the premise of maintaining low reflection of visible light and low infrared emissivity, the film system of the present invention also has the characteristics that the appearance color can be adjusted according to requirements, and the rich and colorful appearance colors can better realize the beautification of the building by the window sill wall Effect. Due to the sandwich structure of the upper and lower silicon nitride protective films, the film system of the present invention also has the property of being temperable. The color-adjustable low-emissivity window and sill wall film system of the present invention can be directly plated continuously on a large-area transparent substrate through an industrialized magnetron sputtering preparation method, and is easy to realize low-cost, large-scale industrial production.

Description

A low-cost color-adjustable low-e window sill wall film system and its preparation method

technical field

The invention relates to the field of building energy conservation, in particular to a low-cost color-adjustable low-radiation window sill wall film system and a preparation method thereof.

Background technique

With the advocacy of energy conservation, emission reduction and low-carbon life, countries around the world are paying more and more attention to energy conservation and environmental protection of buildings. According to statistics, China's building energy consumption accounts for more than 30% of the total energy consumption of the society, and with the expansion of urbanization, this proportion is still increasing year by year. Studies have shown that windows are the main channel for energy exchange between buildings and the outside world, and the energy consumption of glass windows accounts for 40% to 50% of all building energy consumption. Therefore, reducing the energy exchange of the windows and the sill walls above and below the windows is the key to reducing the energy consumption of the entire building.

In architecture, the solid wall between the upper and lower windows of the building facade is called the window sill wall. As a wall, the weight of the window frame and sash can be ignored, so the window sill wall can be regarded as non-load-bearing, and its area accounts for 15% to 30% of the wall. Unlike window glass, window sill walls do not need to be light-transmissive. With the popularity of building curtain walls and the emergence of various new materials, the aesthetic expression of window sill walls is becoming more and more flexible, which can create a greater imagination space for the beautification of building appearance.

However, most of the current window sill walls do not have the low-radiation function, and cannot play the role of isolating heat exchange between indoors and outdoors, and cannot achieve energy-saving and environmental protection effects. And this kind of window sill wall, whose area accounts for 15% to 30% of the wall, also plays an important role in the energy exchange between the building and the outdoors. Therefore, it is imminent to develop new window sill wall coating products with low radiation function.

The purpose of the present invention is to disclose a low-cost color-adjustable low-e window sill wall film system and its preparation method, which can effectively complement the glass curtain wall. While maintaining excellent low-radiation effect, effectively reducing light pollution, energy saving and environmental protection, it is also simple and convenient to adjust the appearance color according to the demand. The rich and colorful appearance color can better realize the beautification effect of the window sill wall on the building .

Contents of the invention

The invention discloses a low-cost color-adjustable low-radiation window sill wall film system and a preparation method thereof. The invention aims to provide a low-cost, low-radiation, adjustable temperable film system with rich appearance and color, which is suitable for industrial production. It can not only have the effect of energy saving and environmental protection, but also play a decorative role, especially suitable for the beautification of buildings, and meet customers' needs for beauty, variety and individuality of products.

The structure of the low-cost color-adjustable low-e window sill wall film system of the present invention is shown in Figure 1. On the transparent substrate, the film system sequentially includes: a lower layer of silicon nitride plated on the transparent substrate thin film, visible light absorbing thin film, metal thin film and upper silicon nitride protective film. That is: transparent substrate/lower silicon nitride film/visible light absorbing film/metal film/upper silicon nitride protective film. in:

The transparent base 1 is transparent glass or plastic, and is the main body of the window sill wall. Glass can be used, such as tempered glass, float glass, insulating glass, bulletproof glass, organic glass; high-strength engineering plastics can also be used, such as polycarbonate (PC) resin, PBT plus glass fiber, nylon plus glass fiber, PPS plus Glass fiber, PPO plus glass fiber, glass reinforced plastic, polycarbonate, PMMA;

The lower silicon nitride thin film 2 is an auxiliary color adjustment film, and also a protective film and an anti-reflection film, and its thickness is 0nm-200nm;

The visible light absorbing film 3 is an oxide, nitride or oxynitride that absorbs visible light, and is used to reduce the visible light reflectance of the film system, thereby reducing architectural light pollution. At the same time, the visible light absorbing film 3 is also the main color adjustment layer of the film system. Its thickness is 20nm-200nm. Preferably, select NiCrO film with low cost and simple preparation method;

The metal thin film 4 is a variety of metal thin films with high infrared reflection, and is a low-radiation functional film of the window sill wall film system, which plays the role of isolating heat exchange between indoor and outdoor, and its thickness is 50nm to 200nm;

The upper silicon nitride protective film 5 is a protective layer of a metal film, and its thickness is 0nm-200nm.

As shown in Figure 1, when the low-cost color-adjustable low-e window sill wall film system disclosed by the present invention is in use, the coated side of the base faces indoors, and the non-coated side faces outdoors. Since the window sill wall film itself is opaque, the indoor side of the window sill wall can be decorated according to actual needs without affecting the exterior color of the window sill wall facing the outside.

The film system of the present invention utilizes the visible light absorbing thin film 3 and the silicon nitride anti-reflection film 2 that have certain absorption to visible light to reduce the reflectance of the film system to visible light, so that the average visible light reflectance towards the outdoor side without coating is 5 % to 30%, effectively reducing light pollution, energy saving and environmental protection. Different from the high requirements for the light absorption rate of the solar heat absorbing film, the absorption rate of the visible light absorbing film 3 used in the present invention is not high, only 70% to 80% is enough, thereby reducing the harshness on the type of film material and the preparation process demand, greatly reducing the cost of the product.

Utilize the low-radiation heat insulation characteristics of the metal film to isolate the indoor and outdoor heat exchange, so that the radiation rate toward the indoor coating side is less than 10%. Therefore, the film system of the present invention also has an excellent low-radiation effect.

At the same time, the film system of the present invention can also adjust the appearance color of the film system as required by adjusting the thickness of the visible light absorbing film 3 and the underlying silicon nitride film 2 under the premise of maintaining low reflection of visible light and low emissivity. Among them, the visible light absorbing film 3 is the main color adjustment layer, and the lower silicon nitride film 2 is the auxiliary color adjustment layer. The auxiliary adjustment of the lower silicon nitride film 2 can expand the color adjustment range of the film system. By controlling and adjusting the thicknesses of the visible light absorbing film (3) and the lower silicon nitride film (2) during film coating, the appearance color of the window sill wall facing the outdoor side can be adjusted simply and conveniently.

Using the interference effect of multi-layer thin films can realize the adjustment of visible light reflectance and color of the film system. The specific physical principles are as follows:

For optical thin-film systems, the study of the transmission of light in it is the study of the propagation of electromagnetic waves in multi-layer media, and the physical basis of its design and calculation is Maxwell's equations. In actual calculation, Maxwell's equations are usually transformed into transmission matrix method and optical admittance to calculate the spectral characteristics of optical thin films. Using Maxwell's equations to solve the electric field and magnetic field on two adjacent layers, the transmission matrix can be obtained, and then the single layer conclusion can be extended to the entire medium space, so that the transmission coefficient and reflection coefficient of the entire multilayer medium can be calculated.

For a single-layer thin film, using the boundary conditions of the electric field and magnetic field can be obtained:

$\left[\begin{array}{c}{\mathrm{<span\; class="notranslate">\; E.</span>}}_{\mathrm{<span\; class="notranslate">\; 0</span>}}\\ {\mathrm{<span\; class="notranslate">\; h</span>}}_{\mathrm{<span\; class="notranslate">\; 0</span>}}\end{array}\right]<span\; class="notranslate">\; =</span>\left[\begin{array}{cc}\mathrm{<span\; class="notranslate">\; c</span>}{\mathrm{<span\; class="notranslate">\; os\&delta;</span>}}_{\mathrm{<span\; class="notranslate">\; 1</span>}}& \frac{\mathrm{<span\; class="notranslate">\; i</span>}}{{\mathrm{<span\; class="notranslate">\; no</span>}}_{\mathrm{<span\; class="notranslate">\; 1</span>}}}{\mathrm{<span\; class="notranslate">\; sin</span>}\mathrm{<span\; class="notranslate">\; \&delta;</span>}}_{\mathrm{<span\; class="notranslate">\; 1</span>}}\\ {\mathrm{<span\; class="notranslate">\; i\&eta;</span>}}_{\mathrm{<span\; class="notranslate">\; 1</span>}}{\mathrm{<span\; class="notranslate">\; sin</span>}\mathrm{<span\; class="notranslate">\; \&delta;</span>}}_{\mathrm{<span\; class="notranslate">\; 1</span>}}& {\mathrm{<span\; class="notranslate">\; cos</span>}\mathrm{<span\; class="notranslate">\; \&delta;</span>}}_{\mathrm{<span\; class="notranslate">\; 1</span>}}\end{array}\right]\left[\begin{array}{c}{\mathrm{<span\; class="notranslate">\; E.</span>}}_{\mathrm{<span\; class="notranslate">\; 2</span>}}\\ {\mathrm{<span\; class="notranslate">\; <figure-callout\; id="2"\; label="h"\; filenames="HDA00003108695900021.png,HDA00003108695900022.png"\; state="\{\{state\}\}">h</figure-callout></span>}}_{\mathrm{<span\; class="notranslate">\; 2</span>}}\end{array}\right]$

θ₁是入射角；Among them, _δ1 is the phase thickness,

_θ1 is the angle of incidence;

For the p component, η ₁ =n ₁ /cosθ ₁ , and for the s component, η ₁ =n ₁ cosθ ₁ .

make $\left[\begin{array}{c}B\\ C\end{array}\right]=\left[\begin{array}{cc}{\cos \mathrm{\&delta;}}_1& \frac{i}{{\mathrm{\&eta;}}_1}{\sin \mathrm{\&delta;}}_1\\ {\mathrm{i\&eta;}}_1{\sin \mathrm{\&delta;}}_1& \cos {\mathrm{\&delta;}}_1\end{array}\right]\left[\begin{array}{c}1\\ {\mathrm{\&eta;}}_2\end{array}\right],$ This is the characteristic equation of the film,

but ${\mathrm{<figure-callout\; id="1"\; label="m"\; filenames="HDA00003108695900022.png,HDA00003108695900032.png"\; state="\{\{state\}\}">m</figure-callout>}}_1=\left[\begin{array}{cc}{\cos \mathrm{\&delta;}}_1& \frac{i}{{\mathrm{\&eta;}}_1}{\sin \mathrm{\&delta;}}_1\\ {\mathrm{i\&eta;}}_1{\sin \mathrm{\&delta;}}_1& {\cos \mathrm{\&delta;}}_1\end{array}\right]$ Called the feature matrix of the film, it contains all the useful parameters of the film.

The admittance of the film layer and substrate combination is Y=C/B,

Then the energy reflectivity is $R=\left(\frac{{\mathrm{\&eta;}}_0-Y}{{\mathrm{\&eta;}}_0+Y}\right){\left(\frac{{\mathrm{\&eta;}}_0-Y}{{\mathrm{\&eta;}}_0+Y}\right)}^{*},$

Transmittance is $T=\frac{{4\mathrm{\&eta;}}_0{\mathrm{\&eta;}}_2}{({\mathrm{\&eta;}}_{0}B+C){({\mathrm{\&eta;}}_{0}B+C)}^{*}}.$

In this way, when extended to multi-layer films, the transmission and reflection spectral characteristics of multi-layer films can be obtained.

Since the transmissive (reflective) color of the film system is determined by the relative intensity of each monochromatic light in the transmissive (reflective) light of the film, the dominant wavelength in the spectrum corresponds to the dominant color tone observed by the human eye. Therefore, the purpose of adjusting the color of the film system can be achieved by adjusting the position of the dominant wavelength in the transmission and reflection spectra of the multilayer film system.

The feature of the present invention is that the silicon nitride film layer used in the lowermost layer and the uppermost layer of the film system is a superhard wear-resistant material that is very stable at high temperature. It has excellent performance as a protective layer of the film system and can greatly improve the film performance. The weather resistance and stability of the system. Silicon nitride film is often used as a toughened protective film on Low-ε glass, and it can withstand high temperature when used on the window sill and wall film system of the present invention, and prevent the intrusion of external oxygen and impurities, and prevent the metal film from being oxidized. Due to the sandwich structure of the upper and lower silicon nitride protective films, the film system of the present invention has the property of being temperable, and the film system plated on the glass substrate can be tempered.

The feature of the present invention is also that when using a substrate that does not need to be tempered, such as a transparent plastic substrate or a tempered glass substrate, the film system of the present invention can also be simplified, and the lower silicon nitride film 2 can be omitted to make its thickness 0nm; When the metal thin film 4 is a metal such as aluminum that can form a dense passivation film on its surface, the upper silicon nitride protective film can be omitted, so that its thickness is 0 nm. In these cases, further cost reductions can be achieved.

The low-cost, color-adjustable low-radiation window and sill wall film system disclosed by the invention can be continuously plated on a large-area transparent substrate through an industrialized magnetron sputtering preparation method. The preparation process is as follows:

Firstly, the lower silicon nitride film 2 is plated on the transparent substrate 1 by magnetron sputtering. Silicon targets can be used, and nitrogen is used as the reactive gas for reactive sputtering plating; silicon nitride ceramic targets can also be used for direct sputtering plating;

Secondly, a layer of visible light absorbing film 3 is plated on the lower silicon nitride film 2 . Metal or alloy targets can be used for reactive sputtering plating with oxygen, nitrogen or both oxygen and nitrogen as reactive gases; oxide, nitride or oxynitride ceramic targets can also be used for direct sputtering plating;

Thirdly, a metal target material is used on the visible light absorbing film 3, and a layer of infrared highly reflective metal film 4 is directly plated by sputtering;

Finally, the upper silicon nitride protective film 5 is plated on the metal thin film 4 . Si targets can be used, and nitrogen gas is used as the reactive gas for reactive sputtering plating; silicon nitride ceramic targets can also be used for direct sputtering plating.

The window sill wall film system of the present invention has the following advantages:

1. The average visible light reflectance of the window sill wall facing the outdoor side without coating is between 5% and 30%; the emissivity of the side facing the indoor coating is less than 10%, which effectively isolates the heat exchange between indoor and outdoor. This not only effectively reduces the light pollution of the building curtain wall, but also plays a role in building energy saving and environmental protection.

2. On the premise of maintaining low reflection of visible light and low emissivity, the film system of the present invention also has the characteristic that the appearance color can be adjusted according to requirements. During the preparation process, the color of the film system can be simply adjusted by controlling the thickness of the lower silicon nitride film and the visible light absorbing film. Since the film system of the present invention is opaque, the indoor side of the window sill wall can be decorated according to actual needs without affecting the exterior color of the window sill wall facing the outside.

3. Since the film system of the present invention uses superhard, wear-resistant and stable silicon nitride material at high temperature, the weather resistance and stability of the film system are improved, thereby increasing the service life of the product. At the same time, due to the sandwich structure of the upper and lower silicon nitride protective films, the film system of the present invention also has the property of being temperable.

4. The film system of the present invention has a simple structure, wide sources of materials, low cost, simple preparation method, and is fully compatible with large-scale industrial production methods, and can be directly industrialized.

Description of drawings

Accompanying drawing 1 is low-cost color-adjustable low-e window sill wall film system structure of the present invention, wherein, the meaning of each number is as follows:

1. Transparent substrate; 2. Lower silicon nitride film; 3. Visible light absorbing film; 4. Metal film; 5. Upper silicon nitride protective film.

Accompanying drawing 2 is the reflectance spectrum of the low-cost color-adjustable low-emission window sill wall film system with NiCrO as the visible light absorbing film and Al as the metal film, and simultaneously omitting the lower silicon nitride film and the upper silicon nitride protective film;

Accompanying drawing 3 is the reflectance spectrum of the low-emissivity window sill wall film system with NiCrO as the visible light absorbing film, which can be tempered, low cost and color adjustable;

Accompanying drawing 4 uses NiCrN as the visible light absorbing film, Al as the metal film, saves the low-cost color-adjustable low-emission window wall film system reflection spectrum of the upper silicon nitride protective film;

Accompanying drawing ₅ uses _TiNxOy as the visible light absorbing film, saves the reflectance spectrum of the low-cost color-adjustable low-emission window and wall film system of the lower silicon nitride film;

Detailed ways

In order to make the content, technical solutions and advantages of the present invention clearer, the present invention will be further described below in conjunction with specific examples. These examples are only used to illustrate the present invention, and the present invention is not limited to the following examples. The specific embodiment of the present invention is described in detail below in conjunction with accompanying drawing:

Example 1:

A low-cost color-adjustable low-radiation window and sill wall film system with NiCrO as the visible light absorbing film, Al as the metal film, and simultaneously omitting the lower silicon nitride and the upper silicon nitride, and a preparation method thereof.

The structure of the low-cost color-adjustable low-e window sill wall film system is shown in Figure 1. The film system on the transparent substrate includes NiCrO visible light absorbing film and metal Al film plated on the transparent substrate from bottom to top. That is: transparent substrate/NiCrO visible light absorbing film/metal Al film. in:

The transparent substrate is tempered glass with a thickness of 2-20 mm;

The thickness of the NiCrO visible light absorbing film is between 20 and 120 nm, and the appearance color of the film system can be adjusted by adjusting NiCrO films of different thicknesses;

The metal thin film Al thin film has a thickness of 100-300 nm.

The film system of this embodiment can be continuously plated on a large-area tempered glass substrate by an industrialized magnetron sputtering preparation method. The preparation process is as follows:

First, NiCrO visible light absorbing film is plated on the toughened glass substrate by magnetron sputtering method using NiCr alloy target and oxygen as the reactive gas, with a thickness of 20-120nm. The NiCrO film can be adjusted by controlling the sputtering time. thickness to achieve color adjustment of the film system;

Then, a metal Al target material was used on the NiCrO visible light absorbing film, and a layer of infrared highly reflective metal Al film was directly sputtered, with a thickness of 200 nm, a sputtering power of 1 kW, and an Ar gas flow of 50 sccm. A dense aluminum oxide passivation layer can be formed on the surface of the Al film by itself, which plays a role in protecting the Al metal film.

The advantage of this film system is that tempered glass is used, so tempering is not required, and at the same time, the upper and lower silicon nitride films are omitted, thereby further reducing the cost of the product.

This film system uses oxide as the visible light absorbing film, its reflection spectrum is shown in Figure 2, and the color coordinates in CIELAB color space are shown in Table 1. Under various colors, the average emissivity in the visible light range is 5% to 30%, and the emissivity is less than 10%.

Table 1

1 2 3 4 5 6 7 8 9 10 11 12 13 L* 34.4 28.4 26.5 34.8 48.6 51.7 52.5 52.6 51.1 45.6 43.9 42.6 43.9 a* 10 10.2 8.6 0 -3.1 -3.2 -3.1 -2 0 4.8 5.3 4.1 -0.9 b* 14.9 0 -8.6 -16.8 -6.2 0 3.1 10 13.7 9.6 5.3 0 -0.9

Example 2:

A temperable, low-cost, color-adjustable low-emission window and sill wall film system using NiCrO as a visible light-absorbing film and a preparation method thereof.

The structure of the low-cost color-adjustable low-e window and sill wall film system is shown in Figure 1. The film system on the transparent substrate consists of a lower layer of silicon nitride film plated on the transparent substrate, NiCrO visible light absorbing film from bottom to top. thin film, metal Cu thin film and upper silicon nitride protective film. That is: transparent substrate/lower silicon nitride film/NiCrO visible light absorbing film/metal Cu film/upper silicon nitride protective film. in:

Described transparent substrate is voltaic glass, and thickness is 10mm;

The thickness of the lower layer of silicon nitride is 20-200nm, which is used as a tempered protective layer and an auxiliary color adjustment layer;

The visible light absorbing film 3 is a NiCrO visible light absorbing film with a thickness of 20-120nm, and the appearance color of the film system is adjusted by adjusting the thickness of the NiCrO film 3 and matching the thickness of the lower silicon nitride film 2;

The metal thin film 4 is a metal Cu thin film with high infrared reflectivity, with a thickness of 100nm;

The thickness of the upper silicon nitride protection film 5 is 50nm.

The film system of this embodiment can be continuously plated on a large-area voltaic glass substrate by an industrialized magnetron sputtering preparation method. The preparation process is as follows:

Firstly, the silicon nitride thin film 2 of the lower layer with a thickness of 20-200nm is directly sputtered on the voltaic glass substrate by using the magnetron sputtering method with a silicon nitride ceramic target, the sputtering power is 1kW, and the intermediate frequency is 100kHz , the Ar gas flow rate is 100 sccm. Adjust the thickness of the silicon nitride film by controlling the sputtering time to realize the color adjustment of the film system;

Secondly, the NiCr alloy target material is used on the lower silicon nitride film 2, and the NiCrO visible light absorbing film 3 is plated by reactive sputtering with oxygen as the reactive gas, with a thickness of 20-120 nm, and the thickness of the NiCrO film is adjusted by controlling the sputtering time , to realize the color adjustment of the film system;

Thirdly, a metal Cu target is used on the NiCrO visible light absorbing film 3, and a layer of infrared highly reflective metal Cu film is directly sputtered, with a thickness of 100 nm, a sputtering power of 1 kW, and an Ar gas flow of 50 sccm;

Finally, magnetron sputtering method is used on the metal Cu film to use silicon nitride ceramic target material, and the upper silicon nitride protective film with a thickness of 50nm is directly sputtered, the sputtering power is 1kW, the intermediate frequency frequency is 100kHz, and the Ar gas flow rate is 100 sccm.

Since the upper and lower layers of this film are made of silicon nitride film, it has the property of being temperable. After the entire film system is plated, it can be tempered.

This film system uses oxide as a visible light absorbing film, its reflection spectrum is shown in Figure 3, and the color coordinates in CIELAB color space are shown in Table 2. Under various colors, the average emissivity in the visible light range is 5% to 30%, and the emissivity is less than 10%.

Table 2

1 2 3 4 5 6 7 8 9 10 11 12 L* 27.7 40.4 47.6 50.9 44.6 31.1 39.7 40.8 42.5 42.5 38.8 36.2 a* 0 -5 -2.7 0 5.5 0 -10.3 -12.7 -11.4 0 20.7 17.3 b* 0 -6.6 0 7.1 13.5 -19.8 -10.3 0 11.5 19 0 17.4

Example 3:

A low-cost, color-adjustable low-radiation window, sill, and wall film system with NiCrN as the visible light absorption film, Al as the metal film, and a silicon nitride protective film on the upper layer are omitted, and a preparation method thereof.

The structure of the low-cost color-adjustable low-e window and sill wall film system is shown in Figure 1. The film system on the transparent substrate consists of a lower layer of silicon nitride film plated on the transparent substrate, NiCrN visible light absorbing film from bottom to top. thin film, metal Al thin film. That is: transparent substrate/lower silicon nitride film/NiCrN visible light absorbing film/metal Al film. in:

Described transparent substrate is plexiglass, and thickness is 5mm;

The thickness of the lower layer of silicon nitride is 0-200nm, which is used as an auxiliary color adjustment layer;

The visible light absorbing film is a NiCrN visible light absorbing film with a thickness of 20-120nm, and the appearance color of the film system is adjusted by adjusting the thickness of the NiCrN film and adjusting the thickness of the lower silicon nitride film;

The metal thin film 4 is a metal Al thin film with high infrared reflectivity, with a thickness of 200nm;

The thickness of the upper silicon nitride protection film 5 is 100nm.

The film system of this embodiment can be continuously plated on a large-area metal transparent substrate by an industrialized magnetron sputtering preparation method. The preparation process is as follows:

First, use magnetron sputtering method to use silicon nitride ceramic target material on the plexiglass substrate, and directly sputter-plate the lower layer silicon nitride film with a thickness between 0 and 200nm. The sputtering power is 1kW, and the intermediate frequency is 100kHz. The Ar gas flow rate was 100 sccm. Adjust the thickness of the silicon nitride film by controlling the sputtering time to realize the color adjustment of the film system;

Secondly, NiCr alloy target material is used on the lower silicon nitride film, and NiCrN visible light absorbing film is produced by reactive sputtering with nitrogen as the reactive gas, with a thickness of 20-200nm. To realize the color adjustment of the film system, the sputtering power is 1kW, the intermediate frequency is 30kHz, the Ar gas flow is 50 sccm, and the nitrogen gas flow is 100 sccm;

Finally, a metal aluminum target is used on the NiCrN visible light-absorbing film, and a layer of infrared high-reflective aluminum film is directly sputtered, with a thickness of 200 nm, a sputtering power of 1 kW, and an Ar gas flow of 50 sccm.

This film system uses a metal Al film, and a dense aluminum oxide passivation layer can be formed on the surface of the Al film to protect the Al metal film. Therefore, the upper silicon nitride film can be omitted, thereby further reducing the cost of the product.

This film system uses nitride as the visible light absorbing film, its reflection spectrum is shown in Figure 4, and the color coordinates in CIELAB color space are shown in Table 3. Under various colors, the average emissivity in the visible light range is 5% to 30%, and the emissivity is less than 10%.

table 3

1 2 3 4 5 6 7 8 9 10 11 12 13 L* 25.9 41.2 41.5 43.4 35.4 48.8 53.4 55 58 44.8 43.2 43.1 55.8 a* 0 2 5.7 -5 3.1 -8.3 -10.5 -8.2 -2.7 16.6 19 13.3 -20.2 b* -2.5 2 5.7 -4.7 -17.1 -11 6.6 16.9 25.4 3.5 -8.6 -14.3 10.4

Example 4:

A low-cost, color-adjustable low-emission window and sill wall film system and a preparation method thereof are based on TiN _x O _y as a visible light absorbing film and omit the underlying silicon nitride film.

The structure of the low-cost color-adjustable low-e window sill wall film system is shown in Figure 1. The film system on the transparent substrate includes TiN _x O _y visible light absorbing film plated on the transparent substrate from bottom to top, metal Cu thin film and upper silicon nitride protective film. That is: transparent substrate/TiN _x O _y visible light absorbing film/metal Cu film/upper silicon nitride protective film. in:

Described transparent substrate is polycarbonate (PC) resin, and this is a kind of thermoplastic engineering plastics with good performance, and thickness is 2mm;

The visible light absorbing film is a TiN _x O _y visible light absorbing film with a thickness of 20 to 120 nm, and the appearance color of the film system can be adjusted by adjusting the thickness of the TiN _x O _y film;

The metal thin film is a copper thin film with high infrared reflectivity, with a thickness of 200nm;

The thickness of the upper silicon nitride protection film is 200nm.

The film system of this embodiment can be continuously plated on a large-area polycarbonate (PC) resin substrate by an industrialized magnetron sputtering preparation method. The preparation process is as follows:

Firstly, TiN _x O _y visible light-absorbing film was deposited on polycarbonate (PC) resin substrate by magnetron sputtering method, with titanium nitride ceramics as the target material and oxygen as the reactive gas, with a thickness of 20 ~120nm, adjust the thickness of the silicon nitride film by controlling the sputtering time to realize the color adjustment of the film system, the sputtering power is 1kW, the intermediate frequency frequency is 30kHz, the Ar gas flow rate is 50sccm, and the oxygen flow rate is 5sccm;

Secondly, a metal Cu target is used on the TiN _x O _y visible light absorbing film, and a layer of copper film with high infrared reflection is directly sputtered, with a thickness of 120nm, a sputtering power of 1kW, and an Ar gas flow of 50sccm;

Finally, on the metal film 4, use the silicon nitride ceramic target material by the magnetron sputtering method, and directly carry out sputtering plating on the upper silicon nitride protective film with a thickness of 200nm, the sputtering power is 1kW, the intermediate frequency frequency is 100kHz, and the Ar gas flow rate is 100 sccm.

This film system uses high-strength and processable engineering plastic polycarbonate (PC) resin as the base, and does not require tempering treatment, because the lower silicon nitride film can be omitted, further saving costs.

This film system uses metal oxynitride as the visible light absorbing film. The reflection spectrum of the film system is shown in Figure 5, and the color coordinates in CIELAB color space are shown in Table 4. Under various colors, the average emissivity in the visible light range is 5% to 30%, and the emissivity is less than 10%.

Table 4

1 2 3 4 5 6 7 8 9 10 11 12 13 L* 28.1 36.5 44.9 46.3 46.5 46.7 43.4 39.6 37.1 50 39.7 32.4 42.8 a* 14.9 0 -8.4 -9.3 -8.8 -10.0 0 10.1 15.7 16 17.5 12.9 -15.7 b* -23.7 -8.3 19.8 0 16.4 10.0 21.5 10.1 0 31.7 18.8 -12.9 7.4

Claims (6)

1. the low radiation window still wall film of a low-cost color tunable is; it comprises: transparent substrates (1), lower floor's silicon nitride film (2), visible absorption film (3), metallic film (4) and upper silicon nitride diaphragm (5); it is characterized in that: described film structure is: be followed successively by lower floor's silicon nitride film (2), visible absorption film (3), metallic film (4) and upper silicon nitride diaphragm (5) from bottom to top on transparent substrates (1), that is:

Transparent substrates/lower floor's silicon nitride film/visible absorption film/metallic film/upper silicon nitride diaphragm is wherein:

Described transparent substrates (1) as the main body of window still wall is clear glass or plastics;

The thickness range of the described lower floor silicon nitride film (2) of the diaphragm of film system is 0nm～200nm during as assisted color regulating course and tempering;

Described visible absorption film (3) as main color adaptation layer is oxide, nitride or the nitrogen oxide that visible light is had absorption, and its thickness range is 20nm～200nm;

Be that the described metallic film (4) of low radiation functions layer is the various infrared high reflective metal film that have as film, its thickness range is 50nm～200nm;

Thickness range as the described upper silicon nitride diaphragm (5) of metallic film topping is 0nm～200nm.

2. the low radiation window still wall film of a kind of low-cost color tunable according to claim 1 is, it is characterized in that: when transparent substrates (1) adopted transparent plastic or tempered glass not to need the material of tempering, described lower floor silicon nitride film (2) can save.

3. the low radiation window still wall film of a kind of low-cost color tunable according to claim 1 is it is characterized in that: the preferred film of described visible absorption film (3) is the NiCrO film of low-cost and easy-to preparation.

4. the low radiation window still wall film of a kind of low-cost color tunable according to claim 1 is; it is characterized in that: when metallic film (4)) in the time of can surperficial can generating the metal of fine and close passivating film voluntarily for this class of aluminium, described upper silicon nitride diaphragm (5) can save.

5. the low radiation window still wall film of a kind of low-cost color tunable according to claim 1 is it is characterized in that: the window still wall obtains by the thickness that changes described visible absorption film (3) and described lower floor silicon nitride film (2) towards the required appearance color of an outdoor side.

6. preparation method of the low radiation window still wall film system of low-cost color tunable according to claim 1 is characterized in that:

At first, upward be coated with described lower floor silicon nitride film (2) with magnetron sputtering method in transparent substrates (1), adopt the silicon target material, carry out reactive sputtering with nitrogen as reacting gas and be coated with; Or adopt the silicon nitride ceramics target, directly carry out sputter and be coated with;

Secondly, be coated with one deck visible absorption film (3) at lower floor's silicon nitride film (2), adopt the metal or alloy target, carry out reactive sputtering with oxygen, nitrogen as reacting gas with oxygen, nitrogen or while and be coated with; Or adopt oxide, nitride or nitrogen oxide ceramic target directly to carry out sputter to be coated with;

Again, adopt metal targets at visible absorption film (3), directly carry out sputter and be coated with the infrared high reflecting metal film of one deck (4);

At last, be coated with described upper silicon nitride diaphragm (5) at metallic film (4), adopt the silicon target material, carry out reactive sputtering with nitrogen as reacting gas and be coated with; Or adopt the silicon nitride ceramics target, directly carry out sputter and be coated with.

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