CN103064136B - Combined microlens array for integrated imaging three-dimensional (3D) display and manufacturing method thereof - Google Patents
Combined microlens array for integrated imaging three-dimensional (3D) display and manufacturing method thereof Download PDFInfo
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- CN103064136B CN103064136B CN201310014861.0A CN201310014861A CN103064136B CN 103064136 B CN103064136 B CN 103064136B CN 201310014861 A CN201310014861 A CN 201310014861A CN 103064136 B CN103064136 B CN 103064136B
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Abstract
The invention relates to the technical field of integrated imaging three-dimensional (3D) display, in particular to a combined microlens array for the integrated imaging 3D display and a manufacturing method of the combined microlens array. The combined microlens array for the integrated imaging 3D display is characterized by comprising a substrate, a small hole raster and a microlens array, wherein the small hole raster is arranged on one surface of the substrate, the small hole raster is opaque metal or photoresist with a hollow hole array, the microlens array is arranged on one face of the substrate, the microlens array is composed of lens units which correspond to the small hole raster of the small hole array, and the lens units are located in the corresponding small hole array. The manufacturing method of the combined microlens array have the advantages of being simple in method, low in cost, and capable of effectively resolving the problems of serious image crosstalk and reduction of resolution caused by a single microlens array. Meanwhile, the problem of reduction of display brightness caused by the single microlens array is also resolved, and the high-performance integrated imaging 3D display is easy to achieve.
Description
Technical field
The present invention relates to integration imaging 3D display technique field, particularly relate to a kind of combination microlens array for integration imaging 3D display and preparation method thereof.
Background technology
Integration imaging (Integral Imaging, II), as a kind of free 3 D display technology, is a kind of new method of authentic three-dimensional optical imaging.Integration imaging 3D display technique adopts microlens array or aperture grating to realize objective stereoscopic features information record and stereo-picture reconstruct.Compared with other stereo display techniques, this technology has does not need utility appliance and coherent source; The very three-dimensional real-time stereo images of full parallax, continuously viewpoint, full color can be provided; Effectively can overcome converge like the spokes of a wheel at the hub visual fatigue phenomenon caused with focus adjustment range that conventional multi-view Auto-stereo display occurs; The advantages such as good compatibility can be had with existing HDTV Systems, become the important subject in 3D display field.
Wherein, microlens array or aperture grating are the key components of integration imaging 3D display system, and the research of its Optimal Structure Designing and manufacture craft plays an important role to high-performance integration imaging 3D display technique.The 3D display device that single microlens array realizes, display brightness is high, but the gap same energy printing opacity in single microlens array between lens with lens, therefore increase the crosstalk between image disruption and micro unit image, reduce the resolution of display.And single aperture grating can not cause picture crosstalk, but due to aperture must much smaller than the size of micro unit image, guarantee display clear picture, certainly will cause display brightness to reduce like this.
For single microlens array and single aperture grating above shortcomings, the present invention, in conjunction with the advantage of aperture grating and microlens array, proposes a kind of combination microlens array newly shown for integration imaging 3D and preparation method thereof.
Summary of the invention
In view of this, the object of this invention is to provide a kind of combination microlens array for integration imaging 3D display and preparation method thereof.
The invention provides a kind of combination microlens array shown for integration imaging 3D, it is characterized in that, comprising:
One substrate;
One aperture grating, is arranged at a surface of described substrate, and described aperture grating is one with the opaque metal of hollow out array of orifices or photoresist; And
One microlens array, be arranged at the one side that described substrate contains described aperture grating, described microlens array by the array of orifices aperture with described aperture grating one to one lens unit form, and described lens unit is arranged in the array of orifices aperture of described correspondence.
In an embodiment of the present invention, described substrate is clear glass, transparent organic material or transparent polymer material.
In an embodiment of the present invention, described array of orifices aperture is consistent with the shape of microlens array lens unit, equal and opposite in direction, and aligns one by one in center; Wherein microlens array be used for integration imaging 3D show in micro unit Image Acquisition and reconstruct, the lightproof part of array of orifices for reducing or eliminate the crosstalk of single microlens array owing to causing between the interference of gap transmitted light between lenticule unit and lenticule unit.
In an embodiment of the present invention, the shape of described array of orifices aperture and microlens array lens unit is circular or regular polygon.
The present invention also provides a kind of method for making of the combination microlens array for integration imaging 3D display, the first the method for making concrete scheme adopted is: the method for making providing a kind of combination microlens array for integration imaging 3D display, it is characterized in that, comprise following steps:
S11 a: substrate is provided and adopts photoetching, etching or serigraphy to make an aperture grating in surface thereof;
S12: the one side that described substrate is provided with described aperture grating evenly applies layer of transparent and bears photoresist;
S13: adopt back of the body Exposure mode, the one side not arranging described aperture grating from described substrate carries out exposing and developing; Described photoresist will be developed liquid by the part that described aperture grating stops and remove, and stay not by the photoresist column pattern array of described aperture grating stop;
S14: adopt nuda rice to make described photoresist column pattern array melt distortion, form photoresist microlens array, thus obtain described combination microlens array.
In an embodiment of the present invention, described aperture grating is one with the opaque metal of hollow out array of orifices or photoresist; Described microlens array by the array of orifices aperture with described aperture grating one to one lens unit form.
The second method for making concrete scheme that the present invention adopts is: the method for making providing a kind of combination microlens array for integration imaging 3D display, is characterized in that, comprise following steps:
S21: two plate bases are provided and adopt photoetching, etching or serigraphy to make an aperture grating in surface thereof respectively;
S22: get the wherein plate base prepared in described step S21 and evenly apply layer of transparent in its one side being provided with described aperture grating and bear photoresist;
S23: adopt back of the body Exposure mode, the one side that the substrate containing aperture grating prepared from described step S22 is not provided with aperture grating carries out exposing and developing, described photoresist will be developed liquid by the part that described aperture grating stops and remove, and stay not by the photoresist column pattern array of described aperture grating stop;
S24: get the substrate containing photoresist column pattern array prepared in described step S23, adopts nuda rice to make described photoresist column pattern array melt distortion, forms photoresist microlens array;
S25: get the substrate containing photoresist microlens array prepared in described step S24, and use silicon rubber to make the silicon rubber negative norm plate of described photoresist microlens array;
S26: utilize described silicon rubber negative norm plate, the substrate that another sheet adopting hot padding or ultraviolet stamping to prepare in described step S21 is provided with aperture grating makes a transparent organic material microlens array, thus obtains described combination microlens array.
In an embodiment of the present invention, described aperture grating is one with the opaque metal of hollow out array of orifices or photoresist; Described microlens array by the array of orifices aperture with described aperture grating one to one lens unit form.
In an embodiment of the present invention, the concrete steps of described step S25 are:
S251: the potpourri preparing monomer and crosslinking chemical in ratio needed for described silicon rubber;
S252: be positioned in a container by the described substrate containing photoresist microlens array, pours described potpourri into and leaves standstill;
S253: after described potpourri bubbles all eliminations, this container is put into baking oven, take out after described potpourri solidifies completely;
S254: described potpourri is separated with the described substrate containing photoresist microlens array, and cut described potpourri and form described silicon rubber negative norm plate.
In an embodiment of the present invention, the concrete steps of described step S26 are:
S261: described silicon rubber negative norm plate is positioned in airtight container and vacuumizes, make it have negative pressure;
S262: the one side that the substrate that another sheet prepared in described step S21 is provided with aperture grating contains described aperture grating evenly applies layer of transparent organic material;
S263: the described silicon rubber negative norm plate with negative pressure is positioned over described transparent organic material Shang Bingshiqi center and aligns one by one with the small hole center of described aperture grating, and described silicon rubber negative norm plate is contacted with described aperture grating;
S264: because described silicon rubber negative norm plate has negative pressure, described transparent organic material will form the transparent organic material microlens array corresponding with described silicon rubber negative norm plate under the acting in conjunction of negative pressure with capillary force;
S265: adopt the mode of cooling curing or ultra-violet curing that described transparent organic material microlens array is solidified;
S266: described silicon rubber negative norm plate is separated with described transparent organic material microlens array.
Remarkable advantage of the present invention is: microlens array and aperture grating are combined, microlens array and aperture grating are had complementary advantages, efficiently solve the problem of the problem that the serious and resolution of picture crosstalk that single microlens array brings reduces and the display brightness reduction brought by single aperture grating, be easy to realize high-performance integration imaging 3D and show.Further, combination method for fabricating microlens array provided by the invention is simple, with low cost.
Accompanying drawing explanation
Fig. 1 is the structural representation of a kind of combination microlens array for integration imaging 3D display of the present invention.
Fig. 2 a-2d is the Making programme diagrammatic cross-section adopting the first method for making of the present invention.
Fig. 3 is the silicon rubber negative norm plate diagrammatic cross-section adopting the second method for making of the present invention to make.
Fig. 4 is that the one side that another plate base adopting the second method for making of the present invention to prepare in described step S21 contains aperture grating evenly applies layer of transparent organic material 206 diagrammatic cross-section.
Fig. 5 utilizes silicon rubber to bear template construct transparent organic material microlens array diagrammatic cross-section for adopting the second method for making of the present invention.
Fig. 6 is the combination microlens array diagrammatic cross-section shown for integration imaging 3D adopting the second method for making of the present invention to make.
Embodiment
For making object of the present invention, technical scheme and advantage clearly understand, below by specific embodiment and relevant drawings, the present invention will be described in further detail.
The invention provides a kind of combination microlens array shown for integration imaging 3D, it is characterized in that, comprising:
One substrate;
One aperture grating, is arranged at a surface of described substrate, and described aperture grating is one with the opaque metal of hollow out array of orifices or photoresist; And
One microlens array, be arranged at the one side that described substrate contains described aperture grating, described microlens array by the array of orifices aperture with described aperture grating one to one lens unit form, and described lens unit is arranged in the array of orifices aperture of described correspondence.
The present invention also provides a kind of method for making of the combination microlens array for integration imaging 3D display, the first the method for making concrete scheme adopted is: the method for making providing a kind of combination microlens array for integration imaging 3D display, it is characterized in that, comprise following steps:
S11 a: substrate is provided and adopts photoetching, etching or serigraphy to make an aperture grating in surface thereof;
S12: the one side that described substrate is provided with described aperture grating evenly applies layer of transparent and bears photoresist;
S13: adopt back of the body Exposure mode, the one side not arranging described aperture grating from described substrate carries out exposing and developing; Described photoresist will be developed liquid by the part that described aperture grating stops and remove, and stay not by the photoresist column pattern array of described aperture grating stop;
S14: adopt nuda rice to make described photoresist column pattern array melt distortion, form photoresist microlens array, thus obtain described combination microlens array.
Described aperture grating is one with the opaque metal of hollow out array of orifices or photoresist; Described microlens array by the array of orifices aperture with described aperture grating one to one lens unit form.
The second method for making concrete scheme that the present invention adopts is: the method for making providing a kind of combination microlens array for integration imaging 3D display, is characterized in that, comprise following steps:
S21: two plate bases are provided and adopt photoetching, etching or serigraphy to make an aperture grating in surface thereof respectively;
S22: get the wherein plate base prepared in described step S21 and evenly apply layer of transparent in its one side being provided with described aperture grating and bear photoresist;
S23: adopt back of the body Exposure mode, the one side that the substrate containing aperture grating prepared from described step S22 is not provided with aperture grating carries out exposing and developing, described photoresist will be developed liquid by the part that described aperture grating stops and remove, and stay not by the photoresist column pattern array of described aperture grating stop;
S24: get the substrate containing photoresist column pattern array prepared in described step S23, adopts nuda rice to make described photoresist column pattern array melt distortion, forms photoresist microlens array;
S25: get the substrate containing photoresist microlens array prepared in described step S24, and use silicon rubber to make the silicon rubber negative norm plate of described photoresist microlens array;
S26: utilize described silicon rubber negative norm plate, the substrate that another sheet adopting hot padding or ultraviolet stamping to prepare in described step S21 is provided with aperture grating makes a transparent organic material microlens array, thus obtains described combination microlens array.
Described aperture grating is one with the opaque metal of hollow out array of orifices or photoresist; Described microlens array by the array of orifices aperture with described aperture grating one to one lens unit form.
The concrete steps of described step S25 are:
S251: the potpourri preparing monomer and crosslinking chemical in ratio needed for described silicon rubber;
S252: be positioned in a container by the described substrate containing photoresist microlens array, pours described potpourri into and leaves standstill;
S253: after described potpourri bubbles all eliminations, this container is put into baking oven, take out after described potpourri solidifies completely;
S254: described potpourri is separated with the described substrate containing photoresist microlens array, and cut described potpourri and form described silicon rubber negative norm plate.
The concrete steps of described step S26 are:
S261: described silicon rubber negative norm plate is positioned in airtight container and vacuumizes, make it have negative pressure;
S262: the one side that the substrate that another sheet prepared in described step S21 is provided with aperture grating contains described aperture grating evenly applies layer of transparent organic material;
S263: the described silicon rubber negative norm plate with negative pressure is positioned over described transparent organic material Shang Bingshiqi center and aligns one by one with the small hole center of described aperture grating, and described silicon rubber negative norm plate is contacted with described aperture grating;
S264: because described silicon rubber negative norm plate has negative pressure, described transparent organic material will form the transparent organic material microlens array corresponding with described silicon rubber negative norm plate under the acting in conjunction of negative pressure with capillary force;
S265: adopt cooling curing or ultra-violet curing that described transparent organic material microlens array is solidified;
S266: described silicon rubber negative norm plate is separated with described transparent organic material microlens array.
As shown in Figure 1, the present invention also provides a kind of combination microlens array shown for integration imaging 3D, it is characterized in that, comprising:
One substrate 1;
One aperture grating 2, is arranged at a surface of described substrate 1, and described aperture grating 2 is one with the opaque metal of hollow out array of orifices or photoresist; And
One microlens array 3, be arranged at the one side of described substrate 1 containing described aperture grating 2, described microlens array 3 by the array of orifices aperture with described aperture grating 2 one to one lens unit form, and described lens unit is arranged in the array of orifices aperture of described correspondence.
Described substrate is clear glass, transparent organic material or transparent polymer material.Align one by one in the array of orifices of described aperture grating and equal and opposite in direction identical with the shape of the lens unit of described microlens array and center; Wherein microlens array be used for integration imaging 3D show in micro unit Image Acquisition and reconstruct, the lightproof part of array of orifices for reducing or eliminate the crosstalk of single microlens array owing to causing between the interference of lens gap transmitted light and lens unit.The shape of described array of orifices aperture and microlens array lens unit is circular or regular polygon, in the present invention not as limit.The thickness of described photoresist microlens array is determined by photoresist kind and coating thickness.
In the drawings, in order to represent the clear thickness being exaggerated layer and region, but should not be considered to as schematic diagram the proportionate relationship strictly reflecting physical dimension.Reference diagram is the schematic diagram of idealized embodiments of the present invention, and illustrated embodiment should not be considered to the given shape being only limitted to the region shown in figure, but comprises obtained shape (such as manufacturing the deviation caused).All represent with rectangle in the present embodiment, the expression in figure is schematic, but this should not be considered to limit the scope of the invention.
Better the present invention is understood in order to allow those skilled in the art, preferably, in the specific embodiment of the invention, glass substrate selected by substrate, aperture grating selects Cr film, silastic material for making silicon rubber negative norm plate selects dimethyl silicone polymer (PDMS) and the ratio column selection 10:1 of monomer whose and crosslinking chemical, for making the material selection SU8 3050 of photoresist microlens array, for making the material selection NOA81 of transparent organic material microlens array.
embodiment one
As shown in Figure 2 a-2d, Fig. 2 a-2d is the Making programme diagrammatic cross-section adopting the first method for making of the present invention, and in the present embodiment, microlens array is transparent photomask glue, so adopt the first method for making, its concrete scheme comprises the following steps:
s11:one substrate 101 is provided and adopts photoetching, etching or serigraphy to make an aperture grating 102 in surface thereof:
The glass substrate choosing one piece of required size carries out scribing and is placed in the aqueous solution of glass cleaning solution Win-10 that (volume ratio is Win-10: DI water=3: 97), the ultrasonic machine cleaning 15min utilizing frequency to be 32KHz, after spray 2min, (volume ratio is Win-41: DI water=5: 95) to be placed in the aqueous solution of glass cleaning solution Win-41 again, the ultrasonic machine cleaning 10min utilizing frequency to be 40KHz, after circulation tap water spray rinsing 2min, recycling frequency is that the ultrasonic machine of 28KHz cleans 10min in DI pure water, dry up through nitrogen gun and be placed on that to be incubated more than 30min in 50 DEG C of cleaning ovens for subsequent use.
Take out the glass substrate 101 of above-mentioned preparation, the one side Cr film that utilizes magnetically controlled sputter method to prepare a layer thickness to be greater than 100nm wherein, Cr film evenly applies one deck photoresist RJZ304,110 DEG C of bakings, after 20 minutes, form the photoresist with aperture grating pattern after overexposure and development on Cr film; This glass substrate is placed in containing Ce(NH4) 2(NO3) 6 and the aqueous solution etching liquid of HClO4; the metallic member exposed (has the hollow out aperture portion of aperture grating pattern photoresist; in the present embodiment, hollow out aperture portion is for circular) be etched; stayed by the metal that photoresist is protected; after photoresist cleaning, final formation aperture grating 102.
:the one side that described substrate 101 is provided with described aperture grating 102 evenly applies layer of transparent and bears photoresist 104:
The glass substrate 101 prepared in step S11 toasts 2 minutes containing the one side of aperture grating 102 evenly applying one deck photoresist SU8 3050,65 DEG C, and 95 DEG C are toasted 5 minutes.
:adopt back of the body Exposure mode, the one side not arranging described aperture grating 102 from described substrate 101 carries out exposing and developing; Described photoresist will be developed liquid by the part that described aperture grating stops and remove, and stay not by the photoresist column pattern array of described aperture grating stop:
Adopt back of the body Exposure mode, namely do not inject ultraviolet light 105 containing the surface of aperture grating 102 from glass substrate 101 to expose, now aperture grating 102 is as exposure mask version, described photoresist is washed in development by SU8 3050 photoresist that aperture grating 102 lightproof part blocks, only leave the photoresist column pattern array be exposed, in the present embodiment, described photoresist column pattern array configuration is cylindric, is photoresist rod array 106.
:adopt nuda rice to make described photoresist column pattern array melt distortion, form photoresist microlens array 103, thus obtain described combination microlens array:
The photoresist rod array 106 prepared by step S13 carries out homogeneous heating, and heating temperature range generally (depends on photoresist and required lenticular radius-of-curvature) between 100 DEG C to 300 DEG C.Preferably, the heating-up temperature that the present embodiment adopts is 150 DEG C, and photoresist rod array 106 melted by heat is out of shape, and forms photoresist microlens array 103 after cooling.Now, photoresist microlens array 103 and aperture grating 102 are combined on same transparent glass substrate 101, form a kind of combination microlens array shown for integration imaging 3D of the present invention.
embodiment two
When microlens array is not Other substrate materials, can not adopt photolithographicallpatterned to prepare, now adopt soft printing process, the present embodiment adopts the second method for making, and its concrete scheme comprises the following steps:
s21:two plate bases are provided and adopt photoetching, etching or serigraphy to make an aperture grating in surface thereof respectively:
The glass substrate choosing two pieces of required sizes carries out scribing and is placed in the aqueous solution of glass cleaning solution Win-10 that (volume ratio is Win-10: DI water=3: 97), the ultrasonic machine cleaning 15min utilizing frequency to be 32KHz, after spray 2min, (volume ratio is Win-41: DI water=5: 95) to be placed in the aqueous solution of glass cleaning solution Win-41 again, the ultrasonic machine cleaning 10min utilizing frequency to be 40KHz, after circulation tap water spray rinsing 2min, recycling frequency is that the ultrasonic machine of 28KHz cleans 10min in DI pure water, dry up through nitrogen gun and be placed on that to be incubated more than 30min in 50 DEG C of cleaning ovens for subsequent use.
Take out the two panels glass substrate of above-mentioned preparation, respectively at the Cr film that the wherein one side of these two pieces of cleaned glass substrates utilizes magnetically controlled sputter method to prepare a layer thickness to be greater than 100nm, and one deck photoresist RJZ304 is evenly applied on Cr film, 110 DEG C of bakings are after 20 minutes, through overexposure with to be developed on Cr film the photoresist that formation has aperture grating pattern; This two panels glass substrate is placed in containing Ce(NH4) 2(NO3) 6 and the aqueous solution etching liquid of HClO4; the metallic member exposed (has the hollow out aperture portion of aperture grating pattern photoresist; in the present embodiment, hollow out aperture portion is for circular) be etched; stayed by the metal that photoresist is protected; after photoresist cleaning, final formation aperture grating.
:get the wherein plate base prepared in described step S21 and evenly apply one deck photoresist in its one side being provided with described aperture grating:
Get the wherein plate base prepared in described step S21 and evenly apply layer of transparent in its one side being provided with described aperture grating and bear photoresist SU8 3050,65 DEG C baking 2 minutes, 95 DEG C of bakings 5 minutes.
:adopt back of the body Exposure mode, the one side that the substrate containing aperture grating prepared from described step S22 is not provided with aperture grating carries out exposing and developing, described photoresist will be developed liquid by the part that described aperture grating stops and remove, and stay not by the photoresist column pattern array of described aperture grating stop:
Adopt back of the body Exposure mode, the substrate containing aperture grating prepared from described step S22 is not injected ultraviolet light containing the one side of aperture grating and is exposed, now aperture grating is as exposure mask version, washed in development by SU8 3050 photoresist that aperture grating lightproof part blocks, only leave the photoresist column pattern array be exposed, in the present embodiment, described photoresist column pattern array configuration is cylindric, is photoresist rod array.
:get the substrate containing photoresist column pattern array prepared in described step S23, adopt nuda rice to make described photoresist column pattern array melt distortion, form photoresist microlens array:
Get the substrate containing photoresist column pattern array prepared in described step S23 and carry out homogeneous heating, heating temperature range generally (depends on photoresist and required lenticular radius-of-curvature) between 100 DEG C to 300 DEG C.Preferably, the heating-up temperature that the present embodiment adopts is 150 DEG C, and photoresist rod array melted by heat is out of shape, and forms photoresist microlens array after cooling.
:get the substrate containing photoresist microlens array prepared in described step S24, and use silicon rubber to make the silicon rubber negative norm plate of described photoresist microlens array:
Get prepare in described step S24 containing photoresist microlens array smooth substrate sealing be placed in trimethyl chlorosilane molecule (TMCS) is housed container in, place after about 5 minutes and take out, now this photoresist microlens array surface self-organization one deck TMCS, for antiseized.Prepare the potpourri of monomer and crosslinking chemical in ratio needed for described silicon rubber, namely press ratio row configuration dimethyl silicone polymer (PDMS) potpourri of monomer and crosslinking chemical 10:1, be stirred to Homogeneous phase mixing.The smooth substrate containing photoresist microlens array of above-mentioned self assembly one deck TMCS is placed horizontally in a container, pour dimethyl silicone polymer (PDMS) potpourri into, leave standstill about 30 minutes all to eliminate to bubbling, this container is put into 80 DEG C of baking ovens more than two hours, take out after PDMS solidifies completely, be separated with this photoresist microlens array by PDMS, cutting PDMS forms the silicon rubber negative norm plate 204 of photoresist microlens array.
:utilize described silicon rubber negative norm plate, the substrate that another sheet adopting hot padding or ultraviolet stamping to prepare in described step S21 is provided with aperture grating make a transparent organic material microlens array, thus obtains described combination microlens array:
Preferably, the present embodiment selects NOA81 as the material of transparent organic material microlens array, first, step S25 is made silicon rubber negative norm plate 204 sealing be placed in trimethyl chlorosilane molecule (TMCS) is housed container in, place after about 5 minutes and take out, now silicon rubber negative norm plate 204 surface self-organization one deck TMCS, for antiseized.Then be positioned in airtight container by this silicon rubber negative norm plate 204 and vacuumize, because silastic material is porosint, the method makes this silicon rubber negative norm plate 204 have negative pressure.Next another block made by step S21 evenly applies layer of transparent organic material 206(NOA81 containing the one side of substrate 201 containing aperture grating 202 of aperture grating), silicon rubber negative norm plate 204 alignment with negative pressure is positioned on NOA81, and is alignd one by one with the small hole center of aperture grating 202 in the center of silicon rubber negative norm plate 204; And the outstanding part of described silicon rubber negative norm plate is directly contacted with described aperture grating opaque section, thus makes transparent organic material NOA81 form lens unit in the recess of described silicon rubber film coated plate and the array of orifices of described aperture grating.Because silicon rubber negative norm plate 204 has negative pressure, flow-like NOA81 will form the transparent organic material microlens array 203 corresponding to silicon rubber negative norm plate 204 under the acting in conjunction of negative pressure and capillary force, after ultraviolet light 205 exposure is greater than 100 seconds, flow-like NOA81 solidifies.Silicon rubber negative norm plate 204 is separated with the described substrate 201 containing aperture grating, described transparent organic material microlens array 203 and described aperture grating 202 are combined on same substrate 201, form a kind of combination microlens array shown for integration imaging 3D of the present invention.
Above-listed preferred embodiment; the object, technical solutions and advantages of the present invention are further described; be understood that; the foregoing is only preferred embodiment of the present invention; not in order to limit the present invention; within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (7)
1., for the combination microlens array that integration imaging 3D shows, it is characterized in that, comprising:
One substrate;
One aperture grating, be arranged at a surface of described substrate, described aperture grating is made with the opaque metal of hollow out array of orifices or opaque photoresist by one; And
One microlens array, be arranged at the one side that described substrate contains described aperture grating, described microlens array by the array of orifices aperture with described aperture grating one to one lens unit form, and described lens unit is arranged in the array of orifices aperture of described correspondence;
Described substrate is clear glass, transparent organic material or transparent polymer material;
Described array of orifices aperture is consistent with the shape of microlens array lens unit, equal and opposite in direction, and aligns one by one in center; Wherein microlens array be used for integration imaging 3D show in micro unit Image Acquisition and reconstruct, the lightproof part of aperture grating for reducing or eliminate the picture crosstalk of single microlens array owing to causing between the interference of gap transmitted light between lenticule unit and lenticule unit;
The shape of described array of orifices aperture and microlens array lens unit is circular or regular polygon.
2., for a method for making for the combination microlens array of integration imaging 3D display, it is characterized in that, comprise following steps:
S11 a: substrate is provided and adopts photoetching, etching or serigraphy to make an aperture grating in surface thereof;
S12: the one side that described substrate is provided with described aperture grating evenly applies layer of transparent and bears photoresist;
S13: adopt back of the body Exposure mode, the one side not arranging described aperture grating from described substrate carries out exposing and developing; Described photoresist will be developed liquid by the part that described aperture grating stops and remove, and stay not by the photoresist column pattern array of described aperture grating stop;
S14: adopt nuda rice to make described photoresist column pattern array melt distortion, form photoresist microlens array, thus obtain described combination microlens array.
3. the method for making of combination microlens array shown for integration imaging 3D according to claim 2, is characterized in that: described aperture grating is made with the opaque metal of hollow out array of orifices or opaque photoresist by one; Described microlens array by the array of orifices aperture with described aperture grating one to one lens unit form.
4., for a method for making for the combination microlens array of integration imaging 3D display, it is characterized in that, comprise following steps:
S21: two plate bases are provided and adopt photoetching, etching or serigraphy to make an aperture grating in surface thereof respectively;
S22: get the wherein plate base prepared in described step S21 and evenly apply layer of transparent in its one side being provided with described aperture grating and bear photoresist;
S23: adopt back of the body Exposure mode, the one side that the substrate containing aperture grating prepared from described step S22 is not provided with aperture grating carries out exposing and developing, described photoresist will be developed liquid by the part that described aperture grating stops and remove, and stay not by the photoresist column pattern array of described aperture grating stop;
S24: get the substrate containing photoresist column pattern array prepared in described step S23, adopts nuda rice to make described photoresist column pattern array melt distortion, forms photoresist microlens array;
S25: get the substrate containing photoresist microlens array prepared in described step S24, and use silicon rubber to make the silicon rubber negative norm plate of described photoresist microlens array;
S26: utilize described silicon rubber negative norm plate, the substrate that another sheet adopting hot padding or ultraviolet stamping to prepare in described step S21 is provided with aperture grating makes a transparent organic material microlens array, thus obtains described combination microlens array.
5. the method for making of combination microlens array shown for integration imaging 3D according to claim 4, is characterized in that: described aperture grating is made with the opaque metal of hollow out array of orifices or opaque photoresist by one; Described microlens array by the array of orifices aperture with described aperture grating one to one lens unit form.
6. the method for making of the combination microlens array for integration imaging 3D display according to claim 4, is characterized in that: the concrete steps of described step S25 are:
S251: the potpourri preparing monomer and crosslinking chemical in ratio needed for described silicon rubber;
S252: be positioned in a container by the described substrate containing photoresist microlens array, pours described potpourri into and leaves standstill;
S253: after described potpourri bubbles all eliminations, this container is put into baking oven, take out after described potpourri solidifies completely;
S254: described potpourri is separated with the described substrate containing photoresist microlens array, and cut described potpourri and form described silicon rubber negative norm plate.
7. the method for making of the combination microlens array for integration imaging 3D display according to claim 4, is characterized in that: the concrete steps of described step S26 are:
S261: described silicon rubber negative norm plate is positioned in airtight container and vacuumizes, make it have negative pressure;
S262: the one side that the substrate that another sheet prepared in described step S21 is provided with aperture grating contains described aperture grating evenly applies layer of transparent organic material;
S263: the described silicon rubber negative norm plate with negative pressure is positioned over described transparent organic material Shang Bingshiqi center and aligns one by one with the small hole center of described aperture grating, and described silicon rubber negative norm plate is contacted with described aperture grating;
S264: because described silicon rubber negative norm plate has negative pressure, described transparent organic material will form the transparent organic material microlens array corresponding with described silicon rubber negative norm plate under the acting in conjunction of negative pressure with capillary force;
S265: adopt the mode of cooling curing or ultra-violet curing that described transparent organic material microlens array is solidified;
S266: described silicon rubber negative norm plate is separated with described transparent organic material microlens array.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310014861.0A CN103064136B (en) | 2013-01-16 | 2013-01-16 | Combined microlens array for integrated imaging three-dimensional (3D) display and manufacturing method thereof |
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