CN103064136B - Combined microlens array for integrated imaging three-dimensional (3D) display and manufacturing method thereof - Google Patents

Abstract

The invention relates to the technical field of integrated imaging three-dimensional (3D) display, in particular to a combined microlens array for the integrated imaging 3D display and a manufacturing method of the combined microlens array. The combined microlens array for the integrated imaging 3D display is characterized by comprising a substrate, a small hole raster and a microlens array, wherein the small hole raster is arranged on one surface of the substrate, the small hole raster is opaque metal or photoresist with a hollow hole array, the microlens array is arranged on one face of the substrate, the microlens array is composed of lens units which correspond to the small hole raster of the small hole array, and the lens units are located in the corresponding small hole array. The manufacturing method of the combined microlens array have the advantages of being simple in method, low in cost, and capable of effectively resolving the problems of serious image crosstalk and reduction of resolution caused by a single microlens array. Meanwhile, the problem of reduction of display brightness caused by the single microlens array is also resolved, and the high-performance integrated imaging 3D display is easy to achieve.

Description

Combined microlens array for integrated imaging 3D display and manufacturing method thereof

technical field

The invention relates to the technical field of integrated imaging 3D display, in particular to a combined microlens array for integrated imaging 3D display and a manufacturing method thereof.

Background technique

Integrated imaging (Integral Imaging, II), as an autostereoscopic display technology, is a new method of true three-dimensional optical imaging. Integrated imaging 3D display technology uses microlens arrays or pinhole gratings to achieve three-dimensional object stereoscopic feature information recording and stereoscopic image reconstruction. Compared with other stereoscopic display technologies, this technology does not require auxiliary equipment and coherent light sources; it can provide true three-dimensional real-time stereoscopic images with full parallax, continuous viewpoints, and full color; it can effectively overcome the convergence and focus of traditional multi-view autostereoscopic display The visual fatigue phenomenon caused by the adjustment range and the good compatibility with the existing high-definition television system have become important research topics in the field of 3D display.

Among them, the microlens array or pinhole grating is a key component of the integrated imaging 3D display system, and the research on its structure optimization design and manufacturing process plays an important role in the high-performance integrated imaging 3D display technology. The 3D display device realized by a single microlens array has high display brightness, but the gap between the lenses in the single microlens array can also transmit light, thus increasing image interference and crosstalk between micro-unit images and reducing the resolution of the display Rate. A single small-hole grating will not cause image crosstalk, but since the small holes must be much smaller than the size of the micro-unit image to ensure a clear display image, this will inevitably result in a decrease in display brightness.

Aiming at the above shortcomings of single microlens array and single pinhole grating, the present invention combines the advantages of pinhole grating and microlens array to propose a new combined microlens array for integrated imaging 3D display and its manufacturing method.

Contents of the invention

In view of this, the object of the present invention is to provide a composite microlens array for integrated imaging 3D display and a manufacturing method thereof.

The present invention provides a combined microlens array for integrated imaging 3D display, characterized in that it comprises:

a substrate;

A small hole grating is arranged on a surface of the substrate, and the small hole grating is an opaque metal or photoresist with a hollow hole array; and

A microlens array, arranged on the side of the substrate containing the pinhole grating, the microlens array is composed of lens units corresponding to the pinhole array pinholes of the pinhole grating, and the lens unit located in the corresponding apertures of the array of apertures.

In an embodiment of the present invention, the substrate is transparent glass, transparent organic material or transparent polymer material.

In an embodiment of the present invention, the small holes of the small hole array and the lens units of the microlens array have the same shape and size, and their centers are aligned one by one; wherein the microlens array is used for image acquisition and In reconstruction, the opaque part of the small hole array is used to reduce or eliminate the interference of the light transmitted through the gap between the microlens units of a single microlens array and the crosstalk between the microlens units.

In an embodiment of the present invention, the shape of the apertures of the aperture array and the lens unit of the microlens array is a circle or a regular polygon.

The present invention also provides a method for manufacturing a combined microlens array for integrated imaging 3D display, and the specific scheme of the first manufacturing method adopted is as follows: providing a method for manufacturing a combined microlens array for integrated imaging 3D display, It is characterized in that it comprises the following steps:

S11: Provide a substrate and make a grating with a small hole on one surface thereof by photolithography, etching or screen printing;

S12: Uniformly coating a layer of transparent negative photoresist on the side of the substrate provided with the pinhole grating;

S13: Adopting the back exposure method, exposing and developing from the side of the substrate where the pinhole grating is not provided; the part of the photoresist blocked by the pinhole grating will be removed by the developing solution, leaving the part not covered by the pinhole grating. The photoresist columnar pattern array blocked by the small hole grating;

S14: Using a photoresist hot-melt method to melt and deform the photoresist columnar pattern array to form a photoresist microlens array, thereby obtaining the combined microlens array.

In one embodiment of the present invention, the small hole grating is an opaque metal or photoresist with a hollow small hole array; lens unit.

The specific scheme of the second manufacturing method adopted in the present invention is: to provide a method for manufacturing a combined microlens array for integrated imaging 3D display, which is characterized in that it includes the following steps:

S21: Provide two substrates and use photolithography, etching or screen printing to make a small hole grating on one surface respectively;

S22: Take one of the substrates prepared in the step S21 and uniformly coat a layer of transparent negative photoresist on the side provided with the pinhole grating;

S23: Using the back exposure method, exposing and developing from the side of the substrate containing the pinhole grating prepared in the step S22 that is not provided with the pinhole grating, the part of the photoresist blocked by the pinhole grating will be The developer solution is removed, leaving the photoresist columnar pattern array not blocked by the aperture grating;

S24: Taking the substrate containing the photoresist columnar pattern array prepared in the step S23, using a photoresist hot-melt method to melt and deform the photoresist columnar pattern array to form a photoresist microlens array;

S25: Take the substrate containing the photoresist microlens array prepared in the step S24, and use silicone rubber to make a silicone rubber negative template of the photoresist microlens array;

S26: Using the silicone rubber negative template, hot embossing or ultraviolet embossing is used to fabricate a transparent organic material microlens array on the other substrate provided with the pinhole grating prepared in the step S21, so as to obtain the Combined microlens array.

In one embodiment of the present invention, the small hole grating is an opaque metal or photoresist with a hollow small hole array; lens unit.

In an embodiment of the present invention, the specific steps of the step S25 are:

S251: Prepare a mixture of monomers and crosslinking agents according to the required ratio of the silicone rubber;

S252: placing the substrate containing the photoresist microlens array in a container, pouring the mixture and leaving it still;

S253: Put the container into an oven after all the bubbles of the mixture are eliminated, and take it out after the mixture is completely cured;

S254: Separate the mixture from the substrate containing the photoresist microlens array, and cut the mixture to form the silicone rubber negative template.

In an embodiment of the present invention, the specific steps of the step S26 are:

S261: Place the silicone rubber negative template in a sealed container for vacuuming, so that it has a negative pressure;

S262: On the other substrate provided with the pinhole grating prepared in the step S21, the side containing the pinhole grating is evenly coated with a layer of transparent organic material;

S263: Place the silicone rubber negative template with negative pressure on the transparent organic material and align its center with the aperture center of the aperture grating one by one, and align the silicone rubber negative template with the The pinhole gratings are in contact;

S264: Since the silicone rubber negative template has a negative pressure, the transparent organic material will form a transparent organic material microlens array corresponding to the silicone rubber negative template under the combined action of negative pressure and capillary force;

S265: curing the transparent organic material microlens array by means of cooling and curing or ultraviolet curing;

S266: Separate the silicone rubber negative template from the transparent organic material microlens array.

The remarkable advantage of the present invention is that: the microlens array and the pinhole grating are organically combined, so that the advantages of the microlens array and the pinhole grating are complementary, effectively solving the problems of serious image crosstalk and resolution reduction caused by a single microlens array and The problem of reduced display brightness caused by a single aperture grating is easy to realize high-performance integrated imaging 3D display. Moreover, the manufacturing method of the combined microlens array provided by the invention is simple and low in cost.

Description of drawings

FIG. 1 is a schematic structural diagram of a combined microlens array for integrated imaging 3D display according to the present invention.

2a-2d are schematic cross-sectional views of the production process using the first production method of the present invention.

Fig. 3 is a schematic cross-sectional view of a silicone rubber negative template produced by the second production method of the present invention.

FIG. 4 is a schematic cross-sectional view of another substrate prepared in the step S21 by adopting the second manufacturing method of the present invention, the side containing the pinhole grating uniformly coated with a layer of transparent organic material 206 .

Fig. 5 is a schematic cross-sectional view of a transparent organic material microlens array fabricated by using a silicone rubber negative template using the second fabrication method of the present invention.

FIG. 6 is a schematic cross-sectional view of a combined microlens array for integrated imaging 3D display manufactured by the second manufacturing method of the present invention.

Detailed ways

In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below through specific embodiments and related drawings.

The present invention provides a combined microlens array for integrated imaging 3D display, characterized in that it comprises:

a substrate;

A small hole grating is arranged on a surface of the substrate, and the small hole grating is an opaque metal or photoresist with a hollow hole array; and

A microlens array, arranged on the side of the substrate containing the pinhole grating, the microlens array is composed of lens units corresponding to the pinhole array pinholes of the pinhole grating, and the lens unit located in the corresponding apertures of the array of apertures.

The present invention also provides a method for manufacturing a combined microlens array for integrated imaging 3D display, and the specific scheme of the first manufacturing method adopted is as follows: providing a method for manufacturing a combined microlens array for integrated imaging 3D display, It is characterized in that it comprises the following steps:

S11: Provide a substrate and make a grating with a small hole on one surface thereof by photolithography, etching or screen printing;

S12: Uniformly coating a layer of transparent negative photoresist on the side of the substrate provided with the pinhole grating;

S13: Adopting the back exposure method, exposing and developing from the side of the substrate where the pinhole grating is not provided; the part of the photoresist blocked by the pinhole grating will be removed by the developing solution, leaving the part not covered by the pinhole grating. The photoresist columnar pattern array blocked by the small hole grating;

S14: Using a photoresist hot-melt method to melt and deform the photoresist columnar pattern array to form a photoresist microlens array, thereby obtaining the combined microlens array.

The pinhole grating is an opaque metal or photoresist with a hollowed pinhole array; the microlens array is composed of lens units corresponding to the pinhole array pinholes of the pinhole grating.

The specific scheme of the second manufacturing method adopted in the present invention is: to provide a method for manufacturing a combined microlens array for integrated imaging 3D display, which is characterized in that it includes the following steps:

S21: Provide two substrates and use photolithography, etching or screen printing to make a small hole grating on one surface respectively;

S22: Take one of the substrates prepared in the step S21 and uniformly coat a layer of transparent negative photoresist on the side provided with the pinhole grating;

S23: Using the back exposure method, exposing and developing from the side of the substrate containing the pinhole grating prepared in the step S22 that is not provided with the pinhole grating, the part of the photoresist blocked by the pinhole grating will be The developer solution is removed, leaving the photoresist columnar pattern array not blocked by the aperture grating;

S24: Taking the substrate containing the photoresist columnar pattern array prepared in the step S23, using a photoresist hot-melt method to melt and deform the photoresist columnar pattern array to form a photoresist microlens array;

S25: Take the substrate containing the photoresist microlens array prepared in the step S24, and use silicone rubber to make a silicone rubber negative template of the photoresist microlens array;

S26: Using the silicone rubber negative template, hot embossing or ultraviolet embossing is used to fabricate a transparent organic material microlens array on the other substrate provided with the pinhole grating prepared in the step S21, so as to obtain the Combined microlens array.

The pinhole grating is an opaque metal or photoresist with a hollowed pinhole array; the microlens array is composed of lens units corresponding to the pinhole array pinholes of the pinhole grating.

The concrete steps of described step S25 are:

S251: Prepare a mixture of monomers and crosslinking agents according to the required ratio of the silicone rubber;

S252: placing the substrate containing the photoresist microlens array in a container, pouring the mixture and leaving it still;

S253: Put the container into an oven after all the bubbles of the mixture are eliminated, and take it out after the mixture is completely cured;

S254: Separate the mixture from the substrate containing the photoresist microlens array, and cut the mixture to form the silicone rubber negative template.

The concrete steps of described step S26 are:

S261: Place the silicone rubber negative template in a sealed container for vacuuming, so that it has a negative pressure;

S262: On the other substrate provided with the pinhole grating prepared in the step S21, the side containing the pinhole grating is evenly coated with a layer of transparent organic material;

S263: Place the silicone rubber negative template with negative pressure on the transparent organic material and align its center with the aperture center of the aperture grating one by one, and align the silicone rubber negative template with the The pinhole gratings are in contact;

S264: Since the silicone rubber negative template has a negative pressure, the transparent organic material will form a transparent organic material microlens array corresponding to the silicone rubber negative template under the combined action of negative pressure and capillary force;

S265: curing the transparent organic material microlens array by cooling or ultraviolet curing;

S266: Separate the silicone rubber negative template from the transparent organic material microlens array.

As shown in Figure 1, the present invention also provides a combined microlens array for integrated imaging 3D display, characterized in that it includes:

a substrate 1;

A small hole grating 2 is arranged on a surface of the substrate 1, the small hole grating 2 is an opaque metal or photoresist with a hollow hole array; and

A microlens array 3 is arranged on the side of the substrate 1 containing the pinhole grating 2, the microlens array 3 is composed of lens units corresponding to the pinhole array pinholes of the pinhole grating 2 one by one, And the lens unit is located in the corresponding hole of the hole array.

The substrate is transparent glass, transparent organic material or transparent polymer material. The pinhole array of the pinhole grating has the same shape and the same size as the lens unit of the microlens array, and the centers are aligned one by one; wherein the microlens array is used for image acquisition and reconstruction of the microunit in the integrated imaging 3D display, and the small The opaque part of the hole array is used to reduce or eliminate the interference of the light transmitted through the lens gap of the single microlens array and the crosstalk caused between the lens units. The shape of the apertures of the aperture array and the lens unit of the microlens array is a circle or a regular polygon, which is not limited in the present invention. The thickness of the photoresist microlens array is determined by the type of photoresist and the coating thickness.

In the drawings, the thicknesses of layers and regions are exaggerated for clarity, but as schematic diagrams, they should not be considered to strictly reflect the proportional relationship of geometric dimensions. The referenced figures are schematic illustrations of idealized embodiments of the present invention, and the illustrated embodiments of the present invention should not be considered limited to the particular shapes of the regions shown in the figures, but include resulting shapes (such as manufacturing-induced deviations) . All are represented by rectangles in this embodiment, and the representation in the figure is schematic, but this should not be considered as limiting the scope of the present invention.

In order to allow those of ordinary skill to better understand the present invention, preferably, in the specific embodiment of the present invention, the substrate is selected from a glass substrate, the aperture grating is selected from a Cr film, and the silicone rubber material used to make the silicone rubber negative template is selected from polydimethylsiloxane. The ratio of oxane (PDMS) and its monomer to crosslinking agent is 10:1. The material used to make the photoresist microlens array is SU8 3050, and the material used to make the transparent organic material microlens array is NOA81.

Embodiment one

As shown in Figures 2a-2d, Figures 2a-2d are schematic cross-sectional views of the production process using the first production method of the present invention. In this embodiment, the microlens array is a transparent photoresist, so the first production method is adopted, and its specific The protocol includes the following steps:

S11: Provide a substrate 101 and fabricate a small hole grating 102 on one surface thereof by photolithography, etching or screen printing:

Select a glass substrate of the required size for scribing, place it in the aqueous solution of glass cleaning solution Win-10 (volume ratio is Win-10 : DI water = 3 : 97), clean it with an ultrasonic machine with a frequency of 32KHz for 15 minutes, spray After spraying for 2 minutes, put it in the aqueous solution of glass cleaning solution Win-41 (volume ratio is Win-41 : DI water = 5 : 95), use an ultrasonic machine with a frequency of 40KHz to clean for 10 minutes, and then spray and rinse with circulating tap water for 2 minutes. , and then use an ultrasonic machine with a frequency of 28KHz to wash in DI pure water for 10 minutes, dry it with a nitrogen gun, and then place it in a clean oven at 50°C for more than 30 minutes for later use.

Take out the glass substrate 101 prepared above, prepare a Cr film with a thickness greater than 100 nm on one side by using the magnetron sputtering method, uniformly coat a layer of photoresist RJZ304 on the Cr film, bake at 110 ° C for 20 minutes, and then After exposure and development, a photoresist with a small hole grating pattern is formed on the Cr film; the glass substrate is placed in an aqueous etching solution containing Ce(NH4)2(NO3)6 and HClO4, and the exposed metal part (with The hollow hole part of the small hole grating pattern photoresist (in this embodiment, the hollow small hole part is a circle) is etched, and the metal protected by the photoresist is left. After the photoresist is cleaned, the small hole grating is finally formed 102.

: uniformly coating a layer of transparent negative photoresist 104 on the side of the substrate 101 provided with the pinhole grating 102:

On the side of the glass substrate 101 prepared in step S11 containing the small hole grating 102, evenly coat a layer of photoresist SU8 3050, bake at 65°C for 2 minutes, and bake at 95°C for 5 minutes.

: adopt back exposure method, expose and develop from the side of the substrate 101 that is not provided with the pinhole grating 102; the part of the photoresist blocked by the pinhole grating will be removed by the developer, leaving The photoresist columnar pattern array blocked by the pinhole grating:

The back exposure method is adopted, that is, ultraviolet light 105 is injected from the surface of the glass substrate 101 without the pinhole grating 102 for exposure. At this time, the pinhole grating 102 is used as an exposure mask, and the photoresist is impervious to the pinhole grating 102. The SU8 3050 photoresist partially blocked by light is washed away during development, leaving only the exposed photoresist columnar pattern array. In this embodiment, the shape of the photoresist columnar pattern array is cylindrical, which is Photoresist cylindrical array 106 .

: Using a photoresist hot-melt method to melt and deform the photoresist columnar pattern array to form a photoresist microlens array 103, thereby obtaining the combined microlens array:

The photoresist cylindrical array 106 prepared in step S13 is uniformly heated, and the heating temperature range is generally between 100° C. and 300° C. (depending on the photoresist and the radius of curvature of the required microlens). Preferably, the heating temperature adopted in this embodiment is 150° C., the photoresist cylindrical array 106 is heated and melted and deformed, and the photoresist microlens array 103 is formed after cooling. At this time, the photoresist microlens array 103 and the pinhole grating 102 are combined on the same transparent glass substrate 101 to form a combined microlens array for integrated imaging 3D display of the present invention.

Embodiment two

When the microlens array is not a photoresist material, it cannot be prepared by photolithography. At this time, a soft printing method is used. This embodiment adopts the second manufacturing method. The specific scheme includes the following steps:

S21: Provide two substrates and use photolithography, etching or screen printing to make a small hole grating on one surface:

Select two glass substrates of the required size for scribing and place them in the aqueous solution of glass cleaning solution Win-10 (volume ratio is Win-10 : DI water = 3 : 97), and use an ultrasonic machine with a frequency of 32KHz to clean them for 15 minutes. After spraying for 2 minutes, put it in the aqueous solution of glass cleaning solution Win-41 (volume ratio is Win-41 : DI water = 5 : 95), use an ultrasonic machine with a frequency of 40KHz to clean for 10 minutes, and then spray and rinse with circulating tap water for 2 minutes Finally, use an ultrasonic machine with a frequency of 28KHz to wash in DI pure water for 10 minutes, dry it with a nitrogen gun, and then place it in a clean oven at 50°C for more than 30 minutes for later use.

Take out the two glass substrates prepared above, prepare a layer of Cr film with a thickness greater than 100nm on one side of the two clean glass substrates by magnetron sputtering method, and evenly coat a layer of photoresist RJZ304 on the Cr film , after baking at 110°C for 20 minutes, a photoresist with a small hole grating pattern was formed on the Cr film after exposure and development; the two glass substrates were placed in an aqueous solution containing Ce(NH4)2(NO3)6 and HClO4 In the etching solution, the exposed metal part (the hollow hole part with the photoresist of the small hole grating pattern, the hollow hole part is circular in this embodiment) is etched, and the metal protected by the photoresist remains, After the photoresist is cleaned, the pinhole grating is finally formed.

: Take one of the substrates prepared in the step S21 and evenly coat a layer of photoresist on the side provided with the aperture grating:

Take one of the substrates prepared in step S21 and evenly coat a layer of transparent negative photoresist SU8 3050 on the side provided with the pinhole grating, bake at 65°C for 2 minutes, and bake at 95°C for 5 minutes.

: Adopting the back exposure method, exposing and developing from the side of the substrate containing the pinhole grating prepared in the step S22 that is not provided with the pinhole grating, the part of the photoresist blocked by the pinhole grating will be developed Liquid removal, leaving an array of photoresist columnar patterns not blocked by the aperture grating:

Using the back exposure method, the substrate containing the pinhole grating prepared in the step S22 is exposed to ultraviolet light from the side that does not contain the pinhole grating. At this time, the pinhole grating is used as an exposure mask and is impermeable by the pinhole grating. The SU8 3050 photoresist partially blocked by light is washed away during development, leaving only the exposed photoresist columnar pattern array. In this embodiment, the shape of the photoresist columnar pattern array is cylindrical, which is Photoresist cylindrical array.

: Take the substrate containing the photoresist columnar pattern array prepared in the step S23, and use the photoresist hot-melt method to melt and deform the photoresist columnar pattern array to form a photoresist microlens array:

The substrate containing the photoresist columnar pattern array prepared in step S23 is uniformly heated, and the heating temperature range is generally between 100°C and 300°C (depending on the photoresist and the radius of curvature of the required microlens). Preferably, the heating temperature used in this embodiment is 150° C., the photoresist cylindrical array is heated and melted and deformed, and the photoresist microlens array is formed after cooling.

: Get the substrate containing the photoresist microlens array prepared in the step S24, and use silicon rubber to make the silicon rubber negative template of the photoresist microlens array:

Take the smooth substrate containing the photoresist microlens array prepared in step S24 and seal it in a container containing trimethylchlorosilane molecules (TMCS), and take it out after about 5 minutes. At this time, the photoresist microlens A layer of TMCS is self-assembled on the surface of the array for anti-sticking. Prepare a mixture of monomer and crosslinking agent according to the required ratio of the silicone rubber, that is, configure a polydimethylsiloxane (PDMS) mixture in a ratio of 10:1 between the monomer and the crosslinking agent, and stir until uniformly mixed. Put the above-mentioned self-assembled layer of TMCS smooth substrate containing photoresist microlens array horizontally in a container, pour polydimethylsiloxane (PDMS) mixture, and let it stand for about 30 minutes until all the bubbles are eliminated. Put the container in an oven at 80° C. for more than two hours, take it out after the PDMS is completely cured, separate the PDMS from the photoresist microlens array, and cut the PDMS to form a silicone rubber negative template 204 for the photoresist microlens array.

: Utilizing the silicone rubber negative template, adopting thermal embossing or ultraviolet embossing to make a transparent organic material microlens array on another substrate prepared in the step S21 provided with a small hole grating, thereby obtaining the combination Microlens array:

Preferably, in this embodiment, NOA81 is selected as the material of the transparent organic material microlens array. First, the silicone rubber negative template 204 prepared in step S25 is sealed and placed in a container containing trimethylchlorosilane molecules (TMCS), and placed for about Take it out after 5 minutes, at this time, a layer of TMCS is self-assembled on the surface of the silicone rubber negative template 204 for anti-sticking. Then place the silicone rubber negative template 204 in a sealed container for vacuuming. Since the silicone rubber material is a porous material, this method makes the silicone rubber negative template 204 have a negative pressure. Next, the surface of another substrate 201 containing pinhole gratings produced in step S21 containing pinhole gratings 202 is evenly coated with a layer of transparent organic material 206 (NOA81), and the silicone rubber negative template 204 with negative pressure is aligned and placed on the NOA81, and align the center of the silicone rubber negative template 204 with the aperture center of the aperture grating 202; and make the protruding part of the silicone rubber negative template directly contact with the opaque part of the aperture grating, thereby making the The organic material NOA81 forms a lens unit in the concave portion of the silicone rubber film-coated plate and the aperture array of the aperture grating. Since the silicone rubber negative template 204 has a negative pressure, the fluid-like NOA81 will form a transparent organic material microlens array 203 corresponding to the silicone rubber negative template 204 under the joint action of the negative pressure and capillary force, and after being exposed to ultraviolet light 205 for more than 100 seconds , Fluid NOA81 solidified. The silicone rubber negative template 204 is separated from the substrate 201 containing the small hole grating, and the transparent organic material microlens array 203 and the small hole grating 202 are combined on the same substrate 201 to form an integrated imaging system of the present invention. Combined microlens array for 3D display.

The above-listed preferred embodiments have further described the purpose, technical solutions and advantages of the present invention in detail. It should be understood that the above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Within the spirit and principles of the present invention, any modifications, equivalent replacements, improvements, etc., shall be included within the protection scope of the present invention.

Claims (7)

1. A combined microlens array for integrated imaging 3D display, characterized in that, comprising: a substrate; A small hole grating is arranged on a surface of the substrate, and the small hole grating is made of an opaque metal or opaque photoresist with a hollow hole array; and A microlens array, arranged on the side of the substrate containing the pinhole grating, the microlens array is composed of lens units corresponding to the pinhole array pinholes of the pinhole grating, and the lens unit located in the corresponding apertures of the array of apertures; The substrate is transparent glass, transparent organic material or transparent polymer material; The pinholes of the pinhole array are consistent in shape and size with the lens units of the microlens array, and their centers are aligned one by one; the microlens array is used for image acquisition and reconstruction of microunits in integrated imaging 3D display, and the pinhole grating is not The light-transmitting part is used to reduce or eliminate the interference of the light transmitted through the gap between the micro-lens units of a single micro-lens array and the image crosstalk caused between the micro-lens units; The shape of the apertures of the aperture array and the lens unit of the microlens array is a circle or a regular polygon. 2. A method for making a combined microlens array for integrated imaging 3D display, characterized in that it comprises the following steps: S11: Provide a substrate and make a grating with a small hole on one surface thereof by photolithography, etching or screen printing; S12: Uniformly coating a layer of transparent negative photoresist on the side of the substrate provided with the pinhole grating; S13: Adopting the back exposure method, exposing and developing from the side of the substrate where the pinhole grating is not provided; the part of the photoresist blocked by the pinhole grating will be removed by the developing solution, leaving the part not covered by the pinhole grating. The photoresist columnar pattern array blocked by the small hole grating; S14: Using a photoresist hot-melt method to melt and deform the photoresist columnar pattern array to form a photoresist microlens array, thereby obtaining the combined microlens array. 3. The manufacturing method of the combined microlens array for integrated imaging 3D display according to claim 2, characterized in that: the small hole grating is made of an opaque metal or opaque photoresist with a hollow small hole array ; The microlens array is composed of lens units that correspond one-to-one to the pinholes of the pinhole array. 4. A method for making a combined microlens array for integrated imaging 3D display, characterized in that it comprises the following steps: S21: Provide two substrates and use photolithography, etching or screen printing to make a small hole grating on one surface respectively; S22: Take one of the substrates prepared in the step S21 and uniformly coat a layer of transparent negative photoresist on the side provided with the pinhole grating; S23: Using the back exposure method, exposing and developing from the side of the substrate containing the pinhole grating prepared in the step S22 that is not provided with the pinhole grating, the part of the photoresist blocked by the pinhole grating will be The developer solution is removed, leaving the photoresist columnar pattern array not blocked by the aperture grating; S24: Taking the substrate containing the photoresist columnar pattern array prepared in the step S23, using a photoresist hot-melt method to melt and deform the photoresist columnar pattern array to form a photoresist microlens array; S25: Take the substrate containing the photoresist microlens array prepared in the step S24, and use silicone rubber to make a silicone rubber negative template of the photoresist microlens array; S26: Using the silicone rubber negative template, hot embossing or ultraviolet embossing is used to fabricate a transparent organic material microlens array on the other substrate provided with the pinhole grating prepared in the step S21, so as to obtain the Combined microlens array. 5. The manufacturing method of the combined microlens array for integrated imaging 3D display according to claim 4, characterized in that: the small hole grating is made of an opaque metal or opaque photoresist with a hollow small hole array ; The microlens array is composed of lens units that correspond one-to-one to the pinholes of the pinhole array. 6. The method for manufacturing a combined microlens array for integrated imaging 3D display according to claim 4, characterized in that: the specific steps of the step S25 are: S251: Prepare a mixture of monomers and crosslinking agents according to the required ratio of the silicone rubber; S252: placing the substrate containing the photoresist microlens array in a container, pouring the mixture and leaving it still; S253: Put the container into an oven after all the bubbles of the mixture are eliminated, and take it out after the mixture is completely cured; S254: Separate the mixture from the substrate containing the photoresist microlens array, and cut the mixture to form the silicone rubber negative template. 7. The method for manufacturing a combined microlens array for integrated imaging 3D display according to claim 4, characterized in that: the specific steps of the step S26 are: S261: Place the silicone rubber negative template in a sealed container for vacuuming, so that it has a negative pressure; S262: On the other substrate provided with the pinhole grating prepared in the step S21, the side containing the pinhole grating is evenly coated with a layer of transparent organic material; S263: Place the silicone rubber negative template with negative pressure on the transparent organic material and align its center with the aperture center of the aperture grating one by one, and align the silicone rubber negative template with the The pinhole gratings are in contact; S264: Since the silicone rubber negative template has a negative pressure, the transparent organic material will form a transparent organic material microlens array corresponding to the silicone rubber negative template under the combined action of negative pressure and capillary force; S265: curing the transparent organic material microlens array by means of cooling and curing or ultraviolet curing; S266: Separate the silicone rubber negative template from the transparent organic material microlens array.