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CN103009813B - 喷墨记录头、记录元件基板及制造该记录头和基板的方法 - Google Patents

喷墨记录头、记录元件基板及制造该记录头和基板的方法 Download PDF

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CN103009813B
CN103009813B CN201310001140.6A CN201310001140A CN103009813B CN 103009813 B CN103009813 B CN 103009813B CN 201310001140 A CN201310001140 A CN 201310001140A CN 103009813 B CN103009813 B CN 103009813B
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recording element
element substrate
substrate
ink jet
print head
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CN103009813A (zh
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宫崎浩孝
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Canon Inc
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1635Manufacturing processes dividing the wafer into individual chips
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1601Production of bubble jet print heads
    • B41J2/1603Production of bubble jet print heads of the front shooter type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1607Production of print heads with piezoelectric elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/162Manufacturing of the nozzle plates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1628Manufacturing processes etching dry etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1632Manufacturing processes machining
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1632Manufacturing processes machining
    • B41J2/1634Manufacturing processes machining laser machining
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01Embodiments of or processes related to ink-jet heads
    • B41J2202/20Modules
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/42Piezoelectric device making
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49401Fluid pattern dispersing device making, e.g., ink jet

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

喷墨记录头、记录元件基板及制造该记录头和基板的方法。一种喷墨记录头,其包括多个记录元件基板,每个记录元件基板具有被构造成产生用于从墨排出口排出墨的压力的排出压力产生元件。多个记录元件基板均包括:第一面,在第一面上布置相应的排出压力产生元件;和第二面,第二面被用作与第一面相交的端面,并且至少局部地通过蚀刻形成。

Description

喷墨记录头、记录元件基板及制造该记录头和基板的方法
本申请是申请日为2009年12月16日、申请号为200910252764.9、发明名称为“喷墨记录头、记录元件基板及制造该记录头和基板的方法”的发明专利申请的分案申请。
技术领域
本发明涉及喷墨记录头、记录元件基板、用于制造喷墨记录头的方法以及用于制造记录元件基板的方法。
背景技术
通过排列多个由例如硅或玻璃构成的记录元件基板、使得记录元件基板在记录元件基板的端面处彼此接触,来制造已知的全幅(full-line)喷墨记录头(欧洲专利No.0376514)。然而,因为在这种制造全幅喷墨记录头的方法中,通过使记录元件基板彼此接触来排列记录元件基板,所以记录元件基板的切割精度的变化直接对应于排出口配置的精度。
为了避免这个问题,日本特开平8-127127号公报说明了一种喷墨记录头,该喷墨记录头包括多个以彼此分开的方式被布置于支撑构件的记录元件基板,并且能够通过根据记录元件基板的切割精度的变化而改变基板之间的间隔,从而减小记录元件基板的切割精度的变化。因为,切割记录元件基板的切割机(dicing machine)的切割精度大约是±15μm,所以考虑到喷墨喷嘴(ink ejecting nozzles)的壁的宽度、排出口的直径等,可能的排出口密度大约是360dpi。
然而,为了满足最近市场对具有高记录速度和高图像品质的喷墨记录头的需求,例如,排出口的数量从64或128增加到256,并且例如,排出口的密度也从300dpi增加到600dpi。也就是,因为排出口之间的间隔被减小,所以利用已知的根据变化来改变基板之间的距离的方法很难减小记录元件基板的切割精度的变化。
发明内容
本发明涉及喷墨记录头、记录元件基板、用于制造喷墨记录头的方法和用于制造记录元件基板的方法,该方法能够容易地满足用于接合具有被高密度地配置的排出口的记录元件基板所需的精度。
根据本发明的第一方面,一种喷墨记录头,其包括:多个记录元件基板,该多个记录元件基板均具有被构造成产生用于从墨排出口排出墨的压力的排出压力产生元件,其中多个记录元件基板均包括:第一面,相应的排出压力产生元件被布置于第一面;和第二面,其被用作与第一面相交的端面,并且至少局部是通过蚀刻形成的。
根据本发明的第二方面,一种记录元件基板,其包括:排出压力产生元件,其被构造成产生用于从墨排出口排出墨的压力,其中,记录元件基板包括:第一面,排出压力产生元件被布置于第一面;和第二面,其被用作与第一面相交的端面,并且至少局部是通过蚀刻形成的。
根据本发明的第三方面,一种用于制造喷墨记录头的方法,该喷墨记录头包括形成于支撑构件上的记录元件基板,该方法包括:制备记录元件基板,该基板具有被布置于该基板的主面并被构造成产生用于排出墨的压力的排出压力产生元件,与主面相交的侧面至少局部地经受蚀刻;使记录元件基板的被蚀刻处理的侧面与被构造成定位记录元件基板的定位部接触;以及在记录元件基板的被蚀刻处理的侧面与定位部相互接触的状态下,将记录元件基板固定到支撑构件上。
根据本发明的第四方面,一种用于制造记录元件基板的方法,该记录元件基板具有被构造成产生用于从墨排出口排出墨的压力的排出压力产生元件,该方法包括:制备在记录元件基板的第一面上具有排出压力产生元件的记录元件基板;和至少局部地对用作记录元件基板的与第一面相交的端面的第二面实施蚀刻。
根据本发明的喷墨记录头、记录元件基板、用于制造喷墨记录头的方法和用于制造记录元件基板的方法,与具有墨排出口的第一面相交并且形成各记录元件基板的侧面的第二面至少局部地被蚀刻。因为经受蚀刻的第二面是耐腐蚀的(corrosion-resistant),能够保证第二面的精度。因此,通过使记录元件基板在表面精度得以保证的第二面彼此接触,能够保证多个记录元件基板在被接合时的相对位置的精度。结果,也能够保证配置于记录元件基板的墨排出口之间的距离的精度,并且即使当多个排出口被高密度地配置于各基板时,喷墨记录头也能够支持接合记录元件基板所需的精度。
根据下面参照附图对典型实施方式的详细说明,本发明的其它特征和方面将变得明显。
附图说明
图1是根据本发明的典型实施方式的喷墨记录头的示意立体图。
图2是沿图1的Ⅱ-Ⅱ线截取的喷墨记录头的剖面图。
图3是根据本发明的典型实施方式的喷墨记录头的记录元件基板的示意立体图。
图4A至图4E是示出制造图3中所示的记录元件基板的方法的剖面图。
图5是硅基板的平面图,记录元件基板通过图4A至图4E所示的方法形成于硅基板。
图6是图5中所示的硅基板的局部放大视图。
图7是根据本发明的典型实施方式的用于组装喷墨记录头的装置的示意立体图。
图8是示出用于定位根据本发明的典型实施方式的喷墨记录头的记录元件基板的方法的示意剖面图。
图9A至图9C是示出用于组装根据本发明的典型实施方式的喷墨记录头的方法的变型例的平面图。
具体实施方式
现在将参考附图说明本发明的典型实施方式。
图1是根据本发明的典型实施方式的喷墨记录头1的立体图。图2是沿图1的Ⅱ-Ⅱ线截取的喷墨记录头1的剖面图。喷墨记录头1包括支撑构件5和多个记录元件基板3,并且各记录元件基板3均被布置于相应的形成于支撑板5的凹陷(depression)中(参见图1)。此外,记录元件基板3均包括:墨流动通过的流路(参见图2);和墨排出口7。墨从形成于支撑构件5的墨供给口9供给并且通过记录元件基板3的流路从墨排出口7被喷射到打印材料。此外,热固性粘合剂11(heat-curable adhesive)被布置在记录元件基板3和支撑构件5之间以将这两个组件彼此固定。
接着,将参考图3说明记录元件基板3的结构。各记录元件基板3均包括:第一面13;第二面15;及多个流路。流路彼此分离并且墨通过流路流动以从排出口7喷出。与各流路连通的墨排出口7被形成于第一面13。与第一面13相交的第二面15形成记录元件基板的侧面,并且至少局部地通过蚀刻形成。如图3所示,具有上述结构的记录元件基板3是大致的长方体,该长方体在其侧面具有切除部。
记录元件基板3的制造如图4A至4E所示。首先如图4A所示,排出压力产生元件19被布置于由硅基板(<100>定向结晶(crystallographic orientation),厚625μm)形成的基板构件17的顶面(主表面),并且用作保护膜的氮化硅(silicon nitride)层21和钽层23也形成于基板构件17的顶表面。
接着,如图4B所示,使用抗蚀剂(resist)25形成流路图案,并且感光防水(water-repellent)层29和由感光环氧树脂(epoxyresin)组成的流路形成构件27被形成于抗蚀剂上,以在基板构件17上形成墨流路35。然后,通过图案化形成排出口7。
接着,如图4C所示,抗蚀剂31被涂覆到记录元件基板3的两侧面。底面的抗蚀剂31起到用于干法蚀刻的掩膜的作用,并在通过蚀刻形成墨供给口9和被用作抵接部的第二面(蚀刻面)15的位置处具有开口33。接着,如图4D所示,通过干法蚀刻同时形成墨供给口9和用作蚀刻面15的第二面15。优选地,使用感应耦合等离子体(ICP)类型的反应离子蚀刻(RIE)机以及SF6和C2F8蚀刻气体用于蚀刻。
最后,如图4E所示,除去墨供给口9和抵接部上方的氮化硅层21、及在基板构件17上形成流路35的抗蚀剂25,从而形成流路35。最终,如图5和作为图5的局部放大视图的图6所示的多个记录元件基板3在切割处理阶段被从硅基板37切去。使用上述的方法,能够以若干微米的精度形成各记录元件基板3的蚀刻表面15。各排出压力产生元件19被连接到配线(未示出)和用于驱动元件的晶体管电路。在使用具有<110>定向结晶的硅基板的情况下,也能通过使用诸如氢氧化钾(potassium hydrate)和四甲基氢氧化铵(tetramethylammonium hydroxide)等的强碱溶液的晶体各向异性(crystal anisotropic)蚀刻形成墨供给口9和蚀刻面15。
使用如上制造的记录元件基板3的喷墨记录头1采用以下的方法制造出。
首先,记录元件基板3被布置于如图8所示的组装装置41上的如图7所示的定位夹具43(positioning jig)。定位夹具43具有用于精确定位记录元件基板3的X基准和Y基准。通过使用推销(push pins)51使得记录元件基板3的蚀刻面15与定位夹具43的X基准和Y基准接触而精确地定位记录元件基板3。
接着,如图8所示,使用自动手(automatic hand)45将被精确定位的记录元件基板3移动到支撑构件5,并且经由热固性粘合剂11将记录元件基板3布置于支撑构件5。这里,自动手45的移动距离通常是固定的。此时,多个记录元件基板3被布置于支撑记录元件基板3的支撑构件5,且使得记录元件基板3在其第二面15处彼此接触。这些第二面15起到记录元件基板3之间的基准定位面的作用。在保持上述接触状态的同时,通过加热将热固性粘合剂11固化,从而使记录元件基板3被固定到支撑构件5。
作为另一种定位方法,能够通过使记录元件基板3的蚀刻面15与布置于支撑构件5的定位基准接触,而使多个记录元件基板3被布置于支撑构件5上的预定位置。
根据如上制造的喷墨记录头1,与具有墨排出口7的第一面13相交并且形成记录元件基板3的侧面的第二面15至少局部地经受蚀刻,因为经受蚀刻的第二面15是耐腐蚀的,所以能够保证第二面15的表面精度。因此,通过使得记录元件基板3在表面精度被保证的第二面15处彼此接触,能够保证多个记录元件基板3在它们被接合时的相关位置的精度。结果,也能够保证被配置于记录元件基板的墨排出口之间的距离的精度,并且喷墨记录头能够支持用于粘接高密度地配置有排出口的记录元件基板所要求的精度。因此,与那些已知的喷墨记录头中的记录元件基板相比,能够显著地改进记录元件基板被固定时的位置精度的变化。此外,因为接合记录元件基板3时不用图像处理系统就能满足记录元件基板3的位置精度,因此能够容易地制造喷墨记录头。另外,因为蚀刻开口33形成在两个相邻的记录元件基板3的蚀刻面15之间,如图5和图6所示,所以,不需要用切割机将记录元件基板3彼此分离。这能够减小切割阶段的生产节拍时间(tact time),并能够提高诸如切割机的切割装置的寿命。
以下的变型例能够用于将根据上述典型实施方式的记录元件基板3固定在支撑构件5上。即,能够在支撑构件5上形成定位部,并且能够以使记录元件基板3的第二面15与定位部接触的方式来布置记录元件基板3。利用这样的结构,多个记录元件基板能够被相对于支撑构件定位,并且不用使得记录元件基板彼此接触,也能保证支撑构件上的记录元件基板3被固定时的位置。虽然在上述的典型实施方式中说明了具有多个记录元件基板的全幅记录头,但是本发明不限于此。例如,本发明也适用于通过使得单个记录元件基板与支撑板上的定位部接触而定位此单个记录元件基板的记录头。
另外,能够如下精确地定位记录元件基板3。即,如图9所示,通过使用推销52使下一个记录元件基板3在它的蚀刻面15处与预先接合到支撑构件5的记录元件基板3接触,而精确地定位记录元件基板3。记录元件基板3经由热固性粘合剂11被布置于支撑构件5,并且通过加热并固化热固性粘合剂11,使得记录元件基板3被固定于支撑构件5。与已知的喷墨记录头的精度相比较,如上形成的喷墨记录头1的记录元件基板3的被固定时的位置精度更高,并且因为通过使记录元件基板3彼此接触而定位记录元件基板3,能够减小喷墨记录头的尺寸。
虽然已经参照典型实施方式说明了本发明,应当理解,本发明不限于所公开的典型实施方式。所附的权利要求书的范围符合最宽泛的解释,以包含所有这些变型、等同结构和功能。

Claims (4)

1.一种喷墨记录头,其包括:
多个记录元件基板,所述记录元件基板包括:用于形成供给液体用流路的流路形成构件;和具有用于排出液体的排出压力产生元件的基板构件;以及
支撑构件,所述支撑构件被构造成支撑所述多个记录元件基板,
其中,所述基板构件的侧面的至少一部分是通过蚀刻形成的。
2.根据权利要求1所述的喷墨记录头,其中,彼此相邻地布置的所述多个记录元件基板中的基板构件的相对面是通过蚀刻形成的。
3.一种用于制造记录元件基板的方法,所述方法包括:
制备包括多组能量产生元件的硅基板,其中,所述能量产生元件用于产生排出液体用能量;以及
通过干法蚀刻将所述硅基板分成多个记录元件基板,其中,所述多个记录元件基板中的每个记录元件基板均包括一组能量产生元件。
4.根据权利要求3所述的用于制造记录元件基板的方法,其中,在制备所述硅基板时,使所述硅基板设置有流路形成构件,其中,所述流路形成构件用于形成供给液体用流路。
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