CN102969886A - Plasma milling arc source - Google Patents
Plasma milling arc source Download PDFInfo
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- CN102969886A CN102969886A CN2012104819624A CN201210481962A CN102969886A CN 102969886 A CN102969886 A CN 102969886A CN 2012104819624 A CN2012104819624 A CN 2012104819624A CN 201210481962 A CN201210481962 A CN 201210481962A CN 102969886 A CN102969886 A CN 102969886A
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- China
- Prior art keywords
- arc source
- plasma
- output
- power factor
- milling arc
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B70/00—Technologies for an efficient end-user side electric power management and consumption
- Y02B70/10—Technologies improving the efficiency by using switched-mode power supplies [SMPS], i.e. efficient power electronics conversion e.g. power factor correction or reduction of losses in power supplies or efficient standby modes
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P80/00—Climate change mitigation technologies for sector-wide applications
- Y02P80/10—Efficient use of energy, e.g. using compressed air or pressurized fluid as energy carrier
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- Arc Welding Control (AREA)
Abstract
The invention relates to a milling arc source, and particularly relates to a plasma milling arc source. The plasma milling arc source adopts the structure that the input end of a power factor correcting device is connected with a power supply; the output end of the power factor correcting device is connected with the input end of a step-down transformer; the output end of the step-down transformer is connected with the input end of a converter device; the output end of the converter device is connected with the input end of a swing reactor; the input end of a feedback control system is connected to the output end of the swing reactor; and the output end of the feedback control system is connected with the feedback signal receiving end of the converter device. The plasma milling arc source has the advantages that the swing reactor has the capacity that an inductance value changes along with dynamic load under different work currents; the power factor correcting device overcomes the defects of generally low power factor and large loss of the conventional milling arc source; and therefore, the plasma milling arc source successfully meets the requirement on preparation of nanometer powder, and achieves continuous output of high-power pulsed plasma arc.
Description
Technical field
The present invention relates to powder process arc source, particularly relate to a kind of plasma powder process arc source.
Background technology
At present in new material metallurgy, nano powder preparation field, generally adopt a kind of more advanced process " arc-plasma " method to realize high-quality nano powder preparation both at home and abroad, the process requirement that this is advanced, powder process arc source can provide high power CW
Pulse plasma electric arc, and high-power DC power supply is generally adopted in traditional nano powder powder process arc source, its generation
Free electric arcTemperature is between the 6000-8000 degree, and the arc column energy is concentrated not, if improve temperature, increase the arc column energy density, can only strengthen the power of DC power supply, the ubiquity energy loss is large like this, and power factor is low, electrical network is had the problems such as pollution, be difficult to adapt to preparation high quality nano powder, more can not satisfy the requirement that nano powder prepares serialization, industrialization.
Summary of the invention
The present invention provides a kind of plasma powder process arc source, purpose exactly in order to address the above problem be to reduce energy consumption, improves power factor, output pulse plasma electric arc.
For reaching above-mentioned purpose plasma powder process of the present invention arc source, the input that is made of power factor correcting following structure is connected with power supply, the output of power factor correcting is connected with the input of step-down transformer, the output of step-down transformer is connected with the input of convertor assembly, the output of convertor assembly is connected with the input of Swing Reactor, the input of feedback control system is connected on the output of Swing Reactor, and the output of feedback control system is connected with convertor assembly feedback signal receiving terminal.
Described power supply is 380 volts of AC power.
Described feedback control system is PWM.
Advantageous effect of the present invention: Swing Reactor has solved the ability of its inductance value servo-actuated load variations under the different operating current conditions, and namely during large electric current, inductance value diminishes, and the response of system is accelerated, and satisfies the rate request on pulse rise and fall edge; Otherwise during little electric current, the inductance quantitative change is large, satisfies the requirement of the little current continuity of system.It is generally on the low side that power factor correcting has solved traditional powder process arc source power factor, the shortcoming that own loss is large, successfully satisfied the requirement of preparation nano powder, realized the continuous wave output of highpowerpulse plasma arc, power factor reaches 0.95, own loss is less than 2.5%, and the pulse plasma arc temperature of exporting during work is up to 1.5-3 ten thousand degree, energy density high concentration.
Description of drawings
Fig. 1 is structured flowchart of the present invention.
Among the figure: 1, power factor correcting 2, step-down transformer 3, convertor assembly 4, Swing Reactor 5, feedback control system.
Embodiment
The invention will be further described below in conjunction with accompanying drawing.
Plasma powder process arc of the present invention source as shown in the figure, be made of following structure: the input of power factor correcting 1 is connected with power supply, the output of power factor correcting 1 is connected with the input of step-down transformer 2, the output of step-down transformer 2 is connected with the input of convertor assembly 3, the output of convertor assembly 3 is connected with the input of Swing Reactor 4, the input of feedback control system 5 is connected on the output of Swing Reactor 4, and the output of feedback control system 5 is connected with convertor assembly 3 feedback signal receiving terminals.
Described power supply is 380 volts of AC power.
Described feedback control system is PWM.
Claims (3)
1. plasma powder process arc source, the input that it is characterized in that power factor correcting is connected with power supply, the output of power factor correcting is connected with the input of step-down transformer, the output of step-down transformer is connected with the input of convertor assembly, the output of convertor assembly is connected with the input of Swing Reactor, the input of feedback control system is connected on the output of Swing Reactor, and the output of feedback control system is connected with convertor assembly feedback signal receiving terminal.
2. plasma powder process arc according to claim 1 source is characterized in that described power supply is 380 volts of AC power.
3. plasma powder process arc according to claim 1 source is characterized in that described feedback control system is PWM.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012104819624A CN102969886A (en) | 2012-11-25 | 2012-11-25 | Plasma milling arc source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012104819624A CN102969886A (en) | 2012-11-25 | 2012-11-25 | Plasma milling arc source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102969886A true CN102969886A (en) | 2013-03-13 |
Family
ID=47799827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012104819624A Pending CN102969886A (en) | 2012-11-25 | 2012-11-25 | Plasma milling arc source |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102969886A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1502402A (en) * | 2002-11-26 | 2004-06-09 | ���ϸ����Ƽ���չ����˾ | Industrial apparatus for plasma capable of generating random streamer discharge and application thereof |
| CN1838517A (en) * | 2005-03-24 | 2006-09-27 | 林肯环球公司 | Improved three stage power source for electronic arc welding |
| US20110183083A1 (en) * | 2008-07-16 | 2011-07-28 | Eric Tixhon | Process and installation for depositing films onto a substrate |
| CN202906733U (en) * | 2012-11-25 | 2013-04-24 | 沈阳一特电工有限公司 | Plasma milling arc source |
-
2012
- 2012-11-25 CN CN2012104819624A patent/CN102969886A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1502402A (en) * | 2002-11-26 | 2004-06-09 | ���ϸ����Ƽ���չ����˾ | Industrial apparatus for plasma capable of generating random streamer discharge and application thereof |
| CN1838517A (en) * | 2005-03-24 | 2006-09-27 | 林肯环球公司 | Improved three stage power source for electronic arc welding |
| US20110183083A1 (en) * | 2008-07-16 | 2011-07-28 | Eric Tixhon | Process and installation for depositing films onto a substrate |
| CN202906733U (en) * | 2012-11-25 | 2013-04-24 | 沈阳一特电工有限公司 | Plasma milling arc source |
Non-Patent Citations (2)
| Title |
|---|
| 孙强等: "基于 DSP新型等离子切割电源的研究", 《电力电子技术》, vol. 44, no. 7, 31 July 2010 (2010-07-31), pages 60 - 62 * |
| 郑国梁: "等离子体法制取纳米粉末", 《全国第二届纳米材料和技术应用会议论文集(上卷)》, 31 December 2001 (2001-12-31), pages 6 - 10 * |
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| Date | Code | Title | Description |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130313 |