CN102790348A - High pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system - Google Patents
High pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system Download PDFInfo
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- CN102790348A CN102790348A CN2012101034805A CN201210103480A CN102790348A CN 102790348 A CN102790348 A CN 102790348A CN 2012101034805 A CN2012101034805 A CN 2012101034805A CN 201210103480 A CN201210103480 A CN 201210103480A CN 102790348 A CN102790348 A CN 102790348A
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- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 title abstract 2
- 238000006243 chemical reaction Methods 0.000 claims abstract description 14
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- 230000001276 controlling effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
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- 230000006641 stabilisation Effects 0.000 description 2
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Abstract
The invention discloses a high pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system. The system comprises a pyroelectric detector, an operational amplifying circuit, a peak holding circuit, a main control circuit and a PI (proportional integral) control algorithm; the main controller of the main control circuit is a singlechip; the pyroelectric detector converts an optical signal into an electric pulse signal; the electric pulse signal is amplified by the operational amplifying circuit; after the peak holding circuit performs peak holding tracking, the amplified electric pulse signal is converted into a digital signal by an A/D (analogue/digital) conversion module and then is input the singlechip; the singlechip utilizes the PI algorithm to calculate the reference voltage digital signal required by the next pulse discharging; after the reference voltage digital signal is converted into analogue quantity through a DA (digital/analogue) module, the analogue quantity acts on the high voltage direct current power supply or controllable resonant charging module in an all-solid pulse power supply used by a high pulse repetition frequency ArF excimer laser. The PI voltage adjusting algorithm disclosed by the invention can be used for improving the control prevision and reducing the operation cost of the high pulse repetition frequency ArF excimer laser.
Description
Technical Field
The invention relates to the field of excimer lasers, in particular to a high repetition frequency ArF excimer laser (1 k-4 kHz) used as a photoetching light source, and specifically relates to a pulse energy control system of the high repetition frequency ArF excimer laser.
Background
193nmArF excimer laser is the mainstream light source for the lithography production of integrated semiconductor devices below 90nm node, and ArF immersion technology is used to reduce the lithography node to 22 nm. At present, internationally advanced photoetching light sources and photoetching machine technologies are mastered in developed countries in the daytime, the United states and the like, and photoetching production equipment and high-end integrated circuit devices in China basically depend on import. Moreover, introduction of key technologies and devices is also faced with national obstacles. In order to change the situation of being restricted by people in the field of integrated circuit production, China starts 'very large scale integrated circuit manufacturing equipment and complete process special items' during 'eleven-five', wherein the development of a photoetching light source with high repetition frequency and high energy stability is included.
When the high repetition frequency ArF excimer laser continuously operates, the high-voltage rapid discharge enables the halogen gas to be converted into a stable compound, the concentration of the halogen gas is gradually reduced, and the laser output energy is obviously reduced. In the photoetching process, the pulse energy stability of the laser light source directly influences the control of the critical dimension of the integrated chip circuit. Real-time adjustment of the laser pulse energy is necessary to improve lithographic quality. The traditional energy stability control method delays the energy descending trend by supplementing halogen gas or partially ventilating, but the method is difficult to adjust the energy of each pulse of the laser operated at high repetition frequency in real time. Because: firstly, the response speed of air supply regulation is slow, and the air supply regulation is not suitable for application under high repetition frequency; secondly, the single air supplement amount is not easy to control, and the precision is not high; finally, the gas aging speed of the laser operated at high repetition frequency is high, and the production cost is increased due to frequent gas supply or air exchange.
Disclosure of Invention
The invention aims to provide a high-speed and high-precision control system for pulse energy of a high-repetition-frequency ArF excimer laser. The invention designs an energy stabilization closed-loop control circuit, provides a discharging voltage real-time regulation PI control algorithm, and performs pulse energy stabilization control from the perspective of a control power supply.
The technical scheme of the invention is as follows:
high repetition frequency ArF excimer laser pulse energy control system, its characterized in that: the pyroelectric infrared detector comprises a pyroelectric detector, an operational amplifier circuit, a peak holding circuit, a main control circuit and a PI control algorithm, wherein a main controller of the main control circuit is a single chip microcomputer with a built-in A/D conversion module, the peak holding circuit comprises a positive peak holding circuit and a negative peak holding circuit, the pyroelectric detector converts an optical signal into an electric pulse signal, then the electric pulse signal is amplified by the operational amplifier circuit, then the amplified electric pulse signal is respectively subjected to positive and negative peak holding tracking by the peak holding circuit, and then the electric pulse signal is converted into a digital signal by the built-in A/D conversion module of the single chip microcomputer; the singlechip adds the digital quantities converted from the positive peak value and the negative peak value to obtain a digital quantity corresponding to the single pulse energy value, and after the singlechip calculates a reference voltage digital signal required by next pulse discharge by using a PI control algorithm, the singlechip transmits the digital signal to the D/A conversion module through SPI serial communication to be converted into an analog quantity to act on a high-voltage direct current power supply or a controllable resonance charging module in an all-solid-state pulse power supply used by the high-repetition-frequency ArF excimer laser; the expression of the PI control algorithm is as follows:
wherein,
the output voltage of the direct-current power supply,
is single energy deviation (namely the difference value between the actually measured pulse energy value and the set target pulse energy value, the target pulse energy value is set in the program of the single chip microcomputer),
is the integral of the deviation of the energy,
is a coefficient of proportionality that is,
in order to be the integral coefficient of the light,is the derivative of the pulse output energy with respect to the dc power supply output voltage.
In the expression of the PI control algorithm
、
The values of (c) are known from matlab simulation results:
、
the adjustment effect is good when the values of (A) and (B) are 0.2 and 0.02, respectively, so that
=0.2，=0.02。
The response wavelength of the probe of the pyroelectric detector is 0.15-3 um, the response frequency is up to 5kHz, and the measurable range is 15 uJ-10J.
The operational amplifier of the operational amplification circuit is AD 548.
The main chip of the peak holding circuit is PKD 01.
The single chip microcomputer is a PIC16F873A single chip microcomputer.
The chip of the D/A conversion module is a high-speed digital-to-analog conversion chip DA 7731.
The invention has the advantages that:
the control system of the invention requires high response speed, and the whole closed-loop control process is completed within 1 ms. The PI control theory is applied to the control of the pulse energy of the high repetition frequency ArF excimer laser, a PI algorithm for adjusting the power supply voltage of the laser is provided, and the control precision is improved. Compared with gas supplement regulation, the invention is more suitable for the high repetition frequency excimer laser, is beneficial to saving gas and reducing the cost of photoetching production.
Drawings
Fig. 1 is a block diagram of an all-solid-state pulse power supply according to the present invention.
Fig. 2 is a schematic diagram of a pulse energy closed-loop control circuit according to the present invention.
Fig. 3 is a circuit diagram of the present invention.
FIG. 4 is a schematic diagram of matlab simulation verification of the PI algorithm of the present invention.
Detailed Description
An all-solid-state pulse power supply used by a high repetition frequency ArF excimer laser for photoetching is shown in figure 1 and mainly comprises a direct-current high-voltage power supply, a controllable resonance charging module, a high-voltage transformer and a magnetic pulse compression module, wherein the output voltage of the direct-current high-voltage power supply is determined by the reference voltage of the direct-current high-voltage power supply, and the regulation of gas discharge excitation voltage is realized by controlling the reference voltage of the direct-current high-voltage power supply. In addition, the gas discharge exciting voltage can be controlled by controlling the resonant capacitor C2The voltage across the terminals is regulated. Coupling a programmably adjustable resonant reference voltage to C2The sampled voltages are compared for controlling S1To complete the control of the resonant charging voltage.
The pulse energy control system of the high-repetition-frequency ArF excimer laser comprises a pyroelectric detector 1, an operational amplifier circuit 2, a peak holding circuit 3, a main control circuit 4 and a PI control algorithm, wherein a main controller of the main control circuit is a single chip microcomputer 5 with a built-in A/D conversion module, the peak holding circuit 3 comprises a positive peak holding circuit and a negative peak holding circuit, the pyroelectric detector 1 converts an optical signal detected by the pyroelectric probe into an electric pulse signal, then the electric pulse signal is amplified by the operational amplifier circuit 2, and then the amplified electric pulse signal is subjected to positive and negative peak holding tracking by the peak holding circuit 3 and then converted into a digital signal by the built-in A/D conversion module of the single chip microcomputer 5; the singlechip 5 adds the digital quantities converted by the positive peak value and the negative peak value to obtain a digital quantity corresponding to the single pulse energy value, after the singlechip 5 calculates a reference voltage digital signal required by next pulse discharge by using a PI control algorithm, the singlechip 5 transmits the digital control signal to the D/A conversion module 6 through SPI serial communication to be converted into an analog quantity, and then the analog quantity acts on a high-voltage direct-current power supply or a controllable resonance charging module in an all-solid-state pulse power supply 7 used by the high-repetition-frequency ArF excimer laser 8.
The expression for the PI control algorithm is as follows:
wherein,
the output voltage of the direct-current power supply,
is single energy deviation, is equal to the difference value between each pulse energy and the set target energy, the target energy value is set in the program of the single chip microcomputer,
is the integral of the deviation of the energy,
is a coefficient of proportionality that is,
for the integral coefficient, the matlab simulation result:
、
the adjustment effect is good when the values of (A) and (B) are 0.2 and 0.02, respectively, so that
=0.2，
=0.02；
Is the derivative of the pulse output energy with respect to the dc power supply output voltage.
For the PI algorithm shown in the formula (1), the specific operation steps in the singlechip program are as follows: first, after starting up, the gas condition is good and calibratedAnd (4) corresponding relation. The single chip microcomputer automatically increases the reference voltage signal from low to high in a certain step, and acquires 64 energy values corresponding to each voltage value, averages the energy values and stores the energy values in corresponding registers. When the voltage rises to the maximum value allowed, the acquisition is ended. Secondly, setting an initial reference voltage and expected target energy E by the singlechipT. Thirdly, the single chip microcomputer starts to collect pulse energy values in real time, and the difference value between each pulse energy and the target energy is calculated
And accumulating the difference values of each time
. Multiplying the two quantities by proportional-integral coefficients、
After-addition to obtain
. Finally, according toCorresponding relation, calculate
Value of will
And
by division, calculate
The value is obtained. Then will be
And
making difference to obtain reference voltage required by next pulse discharge
。
And (3) simulating the operating environment of the high repetition frequency ArF excimer laser by using matlab, and verifying the effect of the laser under the adjustment of the PI algorithm. The results are shown in FIG. 4:
、
the adjusting effect is better when the values of (A) and (B) are respectively 0.2 and 0.02, and 1010Within each pulse, the laser can stably output with target energy under the regulation of the PI algorithm, and the voltage is in a continuous rising trend.
The response wavelength of the probe of the pyroelectric detector 1 is 0.15-3 um, the response frequency is up to 5kHz, and the measurable range is 15 uJ-10J.
The operational amplifier of the operational amplifier circuit 2 is AD 548.
The main chip of the peak hold circuit 3 is PKD 01.
The singlechip 5 is a PIC16F873A singlechip.
Claims (7)
1. A high repetition frequency ArF excimer laser pulse energy control system is characterized in that: the pyroelectric infrared detector comprises a pyroelectric detector, an operational amplifier circuit, a peak holding circuit, a main control circuit and a PI control algorithm, wherein a main controller of the main control circuit is a single chip microcomputer with a built-in A/D conversion module, the peak holding circuit comprises a positive peak holding circuit and a negative peak holding circuit, the pyroelectric detector converts an optical signal into an electric pulse signal, then the electric pulse signal is amplified by the operational amplifier circuit, then the amplified electric pulse signal is respectively subjected to positive and negative peak holding tracking by the peak holding circuit, and then the electric pulse signal is converted into a digital signal by the built-in A/D conversion module of the single chip microcomputer; the singlechip adds the digital quantities converted from the positive peak value and the negative peak value to obtain a digital quantity corresponding to the single pulse energy value, and after the singlechip calculates a reference voltage digital signal required by next pulse discharge by using a PI control algorithm, the singlechip transmits the digital signal to the D/A conversion module through SPI serial communication to be converted into an analog quantity to act on a high-voltage direct current power supply or a controllable resonance charging module in an all-solid-state pulse power supply used by the high-repetition-frequency ArF excimer laser; the expression of the PI control algorithm is as follows:
wherein,
the output voltage of the direct-current power supply,
is single energy deviation (i.e. the difference value between the actually measured pulse energy value and the set target pulse energy value, the target pulse energy value is set in the program of single-chip microcomputer),
is the integral of the deviation of the energy,
is a coefficient of proportionality that is,
in order to be the integral coefficient of the light,
is the derivative of the pulse output energy with respect to the dc power supply output voltage.
2. According to claim 1The pulse energy control system of the high repetition frequency ArF excimer laser is characterized in that: in the expression of the PI control algorithm、The values of (c) are known from matlab simulation results:
、
the adjustment effect is good when the values of (A) and (B) are 0.2 and 0.02, respectively, so that
=0.2，
=0.02。
3. The high repetition rate ArF excimer laser pulse energy control system of claim 1, wherein: the response wavelength of the probe of the pyroelectric detector is 0.15-3 um, the response frequency is up to 5kHz, and the measurable range is 15 uJ-10J.
4. The high repetition rate ArF excimer laser pulse energy control system of claim 1, wherein: the operational amplifier of the operational amplification circuit is AD 548.
5. The high repetition rate ArF excimer laser pulse energy control system of claim 1, wherein: the main chip of the peak holding circuit is PKD 01.
6. The high repetition rate ArF excimer laser pulse energy control system of claim 1, wherein: the single chip microcomputer is a PIC16F873A single chip microcomputer.
7. The high repetition rate ArF excimer laser pulse energy control system of claim 1, wherein: the chip of the D/A conversion module is a high-speed digital-to-analog conversion chip DAC 7731.
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Cited By (3)
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| CN106058629A (en) * | 2016-07-22 | 2016-10-26 | 中国电子科技集团公司第三十四研究所 | Closed-ring feedback control fiber amplifier and feedback control method thereof |
| CN109638629A (en) * | 2019-02-19 | 2019-04-16 | 北京科益虹源光电技术有限公司 | A kind of quasi-molecule laser pulse energy stability control method and system |
| CN109950786A (en) * | 2019-03-29 | 2019-06-28 | 北京科益虹源光电技术有限公司 | Excimer laser dosage stability control system and control method |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106058629A (en) * | 2016-07-22 | 2016-10-26 | 中国电子科技集团公司第三十四研究所 | Closed-ring feedback control fiber amplifier and feedback control method thereof |
| CN109638629A (en) * | 2019-02-19 | 2019-04-16 | 北京科益虹源光电技术有限公司 | A kind of quasi-molecule laser pulse energy stability control method and system |
| WO2020168583A1 (en) * | 2019-02-19 | 2020-08-27 | 北京科益虹源光电技术有限公司 | Excimer laser pulse energy stability control method and system |
| JP2022520563A (en) * | 2019-02-19 | 2022-03-31 | 北京科益虹源光電技術有限公司 | Excimer laser pulse energy stability control method and system |
| JP7161062B2 (en) | 2019-02-19 | 2022-10-25 | 北京科益虹源光電技術有限公司 | EXCIMER LASER PULSE ENERGY STABILITY CONTROL METHOD AND SYSTEM |
| CN109950786A (en) * | 2019-03-29 | 2019-06-28 | 北京科益虹源光电技术有限公司 | Excimer laser dosage stability control system and control method |
| CN109950786B (en) * | 2019-03-29 | 2024-04-19 | 北京科益虹源光电技术有限公司 | Excimer laser dose stabilization control system and control method |
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