CN102788563B - Device and method for adjusting inclination of measured mirror in planar subaperture splicing measurement - Google Patents
Device and method for adjusting inclination of measured mirror in planar subaperture splicing measurement Download PDFInfo
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- CN102788563B CN102788563B CN201210319845.8A CN201210319845A CN102788563B CN 102788563 B CN102788563 B CN 102788563B CN 201210319845 A CN201210319845 A CN 201210319845A CN 102788563 B CN102788563 B CN 102788563B
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Abstract
The invention discloses a device and a method for adjusting the inclination of a measured mirror in the splicing measurement of a plane sub-aperture, wherein the device comprises a Fizeau phase-shifting interferometer, a standard mirror, a semi-transparent semi-reflecting mirror, the measured mirror, a laser autocollimator, a two-dimensional translation table, an inclination adjusting device, a rotary table, a plane reflecting mirror, a computer, a detector and a focusing lens.
Description
Technical field
The invention belongs to optic test field, be specifically related to a kind of apparatus and method that measured lens tilts of adjusting in plane sub-aperture stitching is measured.
Background technology
Plane sub-aperture stitching measuring method is by carrying out region division to tested level crossing, then in different positions, measure, obtain a plurality of sub-aperture plane shapes, and then the sub-aperture plane shape that these are had to certain overlapping region is spliced, realized the measurement to the high precision of heavy caliber face shape, high spatial resolution, removed heavy caliber standard component difficult processing from, the shortcoming that cost is high simultaneously.
Plane sub-aperture stitching measuring method is all according to overlapping region phase error inconsistency minimum principle, first to obtain relative tilt, the translation coefficient in each sub-aperture, then each sub-aperture tilt quantity, translational movement is compensated, thereby obtains full aperture face shape.In the Phase-shifting Errors of phase-shifting interferometer and environment, vibration noise impact makes to comprise in measurement result periodic error, frequency is 2 times of interference fringe spatial frequency, when measuring sub-aperture plane shape, the relative tilt amount of measured lens and standard mirror is larger, and the suffered periodic error of sub-aperture plane shape is just larger.And the tilt quantity of sub-aperture plane shape is larger, the error of fitting of inclination factor will be larger, and splicing result is also just poorer.For this reason, in order to improve the measuring accuracy of sub-aperture stitching, need to adjust measured lens at the pose at each sub-aperture location place, reduce the tilt quantity in sub-aperture plane shape.
Summary of the invention
In order to address the above problem, the present invention proposes a kind of apparatus and method that measured lens tilts of adjusting in plane sub-aperture stitching is measured, can at the pose at each sub-aperture location place, adjust measured lens, reduce the tilt quantity in sub-aperture plane shape, thereby improved the precision that plane sub-aperture stitching is measured.
To achieve these goals, a kind of device of adjusting measured lens inclination in plane sub-aperture stitching is measured that the present invention proposes, comprises Feisuo phase-shifting interferometer, standard mirror, semi-transparent semi-reflecting lens, measured lens, Laser Autocollimator, two-dimension translational platform, inclination adjusting device, turntable, plane mirror, computing machine, detector and condenser lens, there is a light hole at the center of its intermediate station, two-dimension translational platform, inclination adjusting device; In angle of 45 degrees, the rotating shaft of plane mirror and turntable in angle of 45 degrees for the optical axis of semi-transparent semi-reflecting lens and Feisuo phase-shifting interferometer; Detector is placed on the focus place of condenser lens; Computing machine is connected with Feisuo phase-shifting interferometer, detector, turntable, two-dimension translational platform, inclination adjusting device respectively, is used for controlling Feisuo phase-shifting interferometer, detector, turntable, two-dimension translational platform and inclination adjusting device; The light sending from Laser Autocollimator passes through the light hole at the center of described turntable, two-dimension translational platform, inclination adjusting device after plane mirror reflection, utilize Laser Autocollimator to monitor, regulate inclination adjusting device, make the table top of turntable parallel with standard mirror; The light sending in Feisuo phase-shifting interferometer passes standard mirror, semi-transparent semi-reflecting lens, and reflects at the upper surface of measured lens, and then arrives condenser lens after semi-transparent semi-reflecting lens reflection, then arrives detector after line focus lens focus.
A kind of method of measured lens inclination of adjusting in plane sub-aperture stitching is measured that adopts said apparatus is provided in addition, and the step of the method is as follows:
Step (1), according to the size of standard mirror and measured lens, plan the number in sub-aperture and the position in each sub-aperture, the All Ranges that makes measured lens all quilt aperture covers;
Step (2), adjusting inclination adjusting device, make the table top of turntable parallel with standard mirror;
Step (3), at the first sub-aperture location place, the convergent point of detecting light beam, will set up the measured lens reference point A parallel with standard mirror, and measure the first sub-aperture plane shape;
Step (4), adjustment measured lens are to next son aperture location place;
The convergent point of step (5), detecting light beam, and take reference point A as benchmark, calculate the pitch angle of measured lens;
Step (6), according to the pitch angle of the measured lens calculating in step (5), judge and adjust the pitch angle of measured lens: if pitch angle does not meet the demands, adjust the pose of measured lens, then turn back to step (5); If pitch angle does not meet the demands, enter step (7);
Step (7), measure measured lens the sub-aperture plane shape of this position, if do not complete measurement, turn back to step (4), until all sub-apertures measured completing all.
Further, the pitch angle of calculating measured lens in step (5) is specially: the light sending in Feisuo phase-shifting interferometer is through standard mirror, semi-transparent semi-reflecting lens, and reflect at the upper surface of measured lens, and then arrive condenser lens after semi-transparent semi-reflecting lens reflection, after line focus lens focus, arrive detector again, on detector, form very little energy spot, computing machine is processed the energy spot information on detector again, obtain center of energy point, convergent point B when this point has certain tilt quantity for measured lens with respect to standard mirror, record this position on detector, computing machine is according to the reference point A of record and the position of convergent point B, calculate the tiltangleθ at directions X of measured lens
xwith the tiltangleθ in Y-direction
y, its computing method are as follows:
Wherein, (x
a, y
a), (x
b, y
b) be respectively the coordinate of reference point A and convergent point B, the focal length that f is condenser lens.
Further, judge and adjust the pitch angle of measured lens in step (6): by computing machine according to the tiltangleθ at directions X of the measured lens calculating in step (5)
xwith the tiltangleθ in Y-direction
y, judge processing: if θ
x, θ
yin have one to be greater than the critical angle θ that measured lens need to carry out tilt adjustment
0computing machine sends the signal that regulates measured lens to tilt to inclination adjusting device, inclination adjusting device is received this signal, measured lens is carried out to tilt adjustments, when completing, inclination adjusting device adjustment feeds back a signal to computing machine, computing machine is received after the signal of inclination adjusting device feedback, is turned back to step (5), until θ
x, θ
yall be less than θ
0time enter step (7), wherein θ
0according to the resolution of detector, determine, its computing method are as shown in the formula θ
0=tg
-1(b/f)
Wherein, b is the size of a pixel of detector.
The invention has the advantages that:
(1), this device realized in plane sub-aperture stitching, the leveling after measured lens moves, and structure and algorithm simple.
(2), when measured lens is carried out to leveling, according to the catoptrical focal position of measured lens, carried out feedback regulation, precision is higher.
Accompanying drawing explanation
Fig. 1 is the device schematic diagram that measured piece tilts of adjusting in plane sub-aperture stitching is measured of the present invention;
Fig. 2 is the process flow diagram of adjusting the method for measured piece inclination in plane sub-aperture stitching is measured of the present invention;
Fig. 3 is the measurement scheme of plane sub-aperture stitching of the present invention;
Fig. 4 is light path schematic diagram when measured lens is without inclination in the present invention;
Fig. 5 is light path schematic diagram when measured lens tilts in the present invention;
Fig. 6 is the local enlarged diagram of light path when measured lens tilts in the present invention;
Fig. 7 is the energy point distribution plan detecting on detector of the present invention.
Embodiment
Below in conjunction with the drawings and specific embodiments, further illustrate the present invention.
Fig. 1 is the device schematic diagram that measured piece tilts of adjusting in plane sub-aperture stitching is measured of the present invention, comprises Feisuo phase-shifting interferometer 101, standard mirror 102, semi-transparent semi-reflecting lens 103, measured lens 104, Laser Autocollimator 105, two-dimension translational platform 106, inclination adjusting device 107, turntable 108, plane mirror 109, computing machine 110, detector 111, condenser lens 112.There is a light hole 113 at its intermediate station 108, two-dimension translational platform 106, inclination adjusting device 107 center; In angle of 45 degrees, the rotating shaft of plane mirror 109 and turntable in angle of 45 degrees for the optical axis of semi-transparent semi-reflecting lens 103 and Feisuo phase-shifting interferometer 101; Detector 111 is placed on the focus place of condenser lens 112; Computing machine 110 is connected with Feisuo phase-shifting interferometer 101, detector 111, turntable 108, two-dimension translational platform 106, inclination adjusting device 107 respectively.
The method of adjusting measured piece inclination in plane sub-aperture stitching is measured of the present invention is as shown in process flow diagram 2, and concrete implementation step is as follows:
Step (1), build measuring table as shown in Figure 1, the scheme that planning plane sub-aperture stitching is measured: according to the size of standard mirror 102 and measured lens 104, plan the number in sub-aperture and the position in each sub-aperture, the All Ranges of measured lens 104 is all covered in quilt aperture.As shown in Figure 3, standard mirror 102 diameter 100mm, measured lens 104 diameter 150mm, the scheme that plane sub-aperture stitching is measured is: 7 sub-apertures, 1 of inner ring, 6 of outer rings, the center of inner ring and the centre distance of outer ring are 60mm, and the angle in adjacent sub-aperture, outer ring is 60 degree.
Step (2), regulate parallel: measured lens 104 is not put into described device, utilizes Laser Autocollimator 105 to monitor, and regulates inclination adjusting device 107, makes the table top of turntable 108 parallel with standard mirror 102.
Step (3), set up measured lens 104 reference point parallel with standard mirror 102: turn off Laser Autocollimator 105, put measured lens 104, allow the light sending in Feisuo phase-shifting interferometer 101 successively through standard mirror 102, semi-transparent semi-reflecting lens 103, and return semi-transparent semi-reflecting lens 103 after the upper surface reflection of measured lens 104, then reflected light arrives condenser lens 112 again after semi-transparent semi-reflecting lens 103 reflections, line focus lens 112 arrive detector 111 after focusing on again, reflected light forms very little energy spot on detector 111, the light path of above-mentioned light transmission process as shown in Figure 4.Energy spot on 110 pairs of detectors 111 of computing machine is processed, and obtains center of energy point, and using this as the measured lens 104 reference point A parallel with standard mirror 102, records this position on detector 111.Then computing machine 110 sends measuring-signal to Feisuo phase-shifting interferometer 101, and Feisuo phase-shifting interferometer 101 is measured measured lens 104 the sub-aperture plane shape of this position after receiving measuring-signal.
Step (4), adjust measured lens 104 to next son aperture location place: computing machine 110 is according to the positional information in next son aperture, control the motion of two-dimension translational platform 106 and turntable 108, make measured lens 104 arrive next son aperture location place, motion due to two-dimension translational platform 106 and turntable 108, the pose of measured lens 104 changes, no longer parallel with standard mirror 102.
The tilt quantity of step (5), measurement measured lens 104: the light sending in Feisuo phase-shifting interferometer 101 is through standard mirror 102, semi-transparent semi-reflecting lens 103, and reflect at the upper surface of measured lens 104, and then arrive condenser lens 112 after semi-transparent semi-reflecting lens 103 reflections, line focus lens 112 arrive detector 111 after focusing on again, on detector 111, form very little energy spot, its light path as shown in Figure 5,6.As shown in Figure 7, computing machine 110 is processed the energy spot on detector 111 again, obtains center of energy point, and convergent point B when this point has certain tilt quantity for measured lens 104 with respect to standard mirror 102, records this position on detector 111.Computing machine 110, according to the reference point A of record and the position of convergent point B, calculates the tiltangleθ at directions X of measured lens 104
xwith the tiltangleθ in Y-direction
y, its computing method are as follows:
Wherein, (x
a, y
a), (x
b, y
b) being respectively the coordinate of reference point A and convergent point B, f is the focal length of condenser lens 112.
Step (6), judge and adjust the tilt quantity of measured lens 104: computing machine 110 is according to the tiltangleθ at directions X of the measured lens 104 calculating in step (5)
xwith the tiltangleθ in Y-direction
y, judge processing: if θ
x, θ
yin have one to be greater than the critical angle θ that measured lens 104 need to carry out tilt adjustment
0computing machine 110 sends the signal that regulates measured piece 104 inclinations to inclination adjusting device 107, inclination adjusting device 107 is received this signal, measured lens 104 is carried out to tilt adjustments, when having adjusted, inclination adjusting device 107 feeds back a signal to computing machine 110, computing machine 110 is received after the signal of inclination adjusting device 107 feedbacks, is turned back to step (5), until θ
x, θ
yall be less than θ
0time enter step (7).θ wherein
0according to the resolution of detector, determine, its computing method as shown in the formula:
θ
0＝tg
-1(b/f)
Wherein, b is the size of a pixel of detector.
Step (7), computing machine 110 send measuring-signal to Feisuo phase-shifting interferometer 101, Feisuo phase-shifting interferometer 101 is measured measured lens 104 the sub-aperture plane shape of this position after receiving signal, Feisuo phase-shifting interferometer 101 feeds back a signal to computing machine 101 after having measured, computing machine 110 judges after receiving this signal: all sub-apertures are all measured, if do not complete measurement, turn back to step (4), until all sub-aperture plane shapes are all measured.
The above; it is only the embodiment in the present invention; but protection scope of the present invention is not limited to this; any people who is familiar with this technology is in the disclosed technical scope of the present invention; can understand conversion or the replacement expected; all should be encompassed in of the present invention comprise scope within, therefore, protection scope of the present invention should be as the criterion with the protection domain of claims.
Claims (1)
1. in measuring, plane sub-aperture stitching adjusts the method that measured lens tilts for one kind, the device that the method adopts is a kind of device that measured lens tilts of adjusting in plane sub-aperture stitching is measured, comprise Feisuo phase-shifting interferometer (101), standard mirror (102), semi-transparent semi-reflecting lens (103), measured lens (104), Laser Autocollimator (105), two-dimension translational platform (106), inclination adjusting device (107), turntable (108), plane mirror (109), computing machine (110), detector (111) and condenser lens (112), its intermediate station (108), two-dimension translational platform (106), there is a light hole (113) at the center of inclination adjusting device (107), in angle of 45 degrees, the rotating shaft of plane mirror (109) and turntable in angle of 45 degrees for the optical axis of semi-transparent semi-reflecting lens (103) and Feisuo phase-shifting interferometer (101), detector (111) is placed on the focus place of condenser lens (112), computing machine (110) is connected with Feisuo phase-shifting interferometer (101), detector (111), turntable (108), two-dimension translational platform (106), inclination adjusting device (107) respectively, is used for controlling Feisuo phase-shifting interferometer (101), detector (111), turntable (108), two-dimension translational platform (106) and inclination adjusting device (107), the light sending from Laser Autocollimator (105) passes through the light hole (113) at the center of described turntable (108), two-dimension translational platform (106), inclination adjusting device (107) after plane mirror (109) reflection, utilize Laser Autocollimator (105) to monitor, regulate inclination adjusting device (107), make the table top of turntable (108) parallel with standard mirror (102), the light sending in Feisuo phase-shifting interferometer (101) is through standard mirror (102), semi-transparent semi-reflecting lens (103), and reflect at the upper surface of measured lens (104), and then arrive condenser lens (112) after semi-transparent semi-reflecting lens (103) reflection, line focus lens (112) arrive detector (111) after focusing on again, it is characterized in that: the step of the method is as follows:
Step 1), according to the size of standard mirror (102) and measured lens (104), plan the number in sub-aperture and the position in each sub-aperture, the All Ranges that makes measured lens (104) all quilt aperture covers;
Step 2), regulate inclination adjusting device (107), make the table top of turntable (108) parallel with standard mirror (102);
Step 3), at the first sub-aperture location place, the convergent point of detecting light beam, will set up measured lens (104) the reference point A parallel with standard mirror (102), and measure the first sub-aperture plane shape;
Step 4), adjust measured lens (104) to next son aperture location place;
Step 5), the convergent point of detecting light beam, and take reference point A as benchmark, calculate the pitch angle of measured lens (104);
The pitch angle of calculating measured lens (104) step 5 wherein) is specially: the light sending in Feisuo phase-shifting interferometer (101) is through standard mirror (102), semi-transparent semi-reflecting lens (103), and reflect at the upper surface of measured lens (104), and then arrive condenser lens (112) after semi-transparent semi-reflecting lens (103) reflection, line focus lens (112) arrive detector (111) after focusing on again, at the very little energy spot of the upper formation of detector (111), computing machine (110) is processed the energy spot information on detector (111) again, obtain center of energy point, convergent point B when this point has certain tilt quantity for measured lens (104) with respect to standard mirror (102), record the position of this point on detector (111), computing machine (110) is according to the reference point A of record and the position of convergent point B, calculate the tiltangleθ at directions X of measured lens (104)
xwith the tiltangleθ in Y-direction
y, its computing method are as follows:
Wherein, (x
a, y
a), (x
b, y
b) being respectively the coordinate of reference point A and convergent point B, f is the focal length of condenser lens (112);
Step 6), according to step 5) in the pitch angle of the measured lens that calculates, judge and adjust the pitch angle of measured lens (104): if pitch angle does not meet the demands, adjust the pose of measured lens (104), then turn back to step 5); If pitch angle meets the demands, enter step 7);
Step 6 wherein) in, judge and adjust the pitch angle of measured lens (104): by computing machine (110) according to step 5) in the tiltangleθ at directions X of the measured lens (104) that calculates
xwith the tiltangleθ in Y-direction
y, judge processing: if θ
x, θ
yin have one to be greater than the critical angle θ that measured lens (104) need to carry out tilt adjustment
0computing machine (110) sends the signal that regulates measured lens (104) to tilt to inclination adjusting device (107), inclination adjusting device (107) is received this signal, measured lens (104) is carried out to tilt adjustments, when having adjusted, inclination adjusting device (107) feeds back a signal to computing machine (110), computing machine (110) is received after the signal of inclination adjusting device (107) feedback, is turned back to step 5), until θ
x, θ
yall be less than θ
0time enter step 7), θ wherein
0according to the resolution of detector, determine, its computing method as shown in the formula:
θ
0＝tg
-1(b/f)
Wherein, b is the size of a pixel of detector;
Step 7), measure measured lens (104) the sub-aperture plane shape of this position, if do not complete measurement, turn back to step 4), until all sub-apertures measured completing all.
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| CN104154876B (en) * | 2014-08-26 | 2017-07-14 | 中国科学院上海光学精密机械研究所 | Sub-aperture stitching measurement apparatus and method for 45 degree of level crossing surface testings |
| CN105571527B (en) * | 2015-12-23 | 2018-08-24 | 中国科学院长春光学精密机械与物理研究所 | A kind of turntable pivot angle precision measurement method |
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| CN106679595B (en) * | 2016-12-29 | 2019-03-22 | 福州华友光学仪器有限公司 | The centre deviation of angle of wedge spherical lens and the measurement method of the angle of wedge |
| CN108956098B (en) * | 2018-07-27 | 2020-08-28 | 莱特巴斯光学仪器（镇江）有限公司 | Inclination eliminating device and method for wavefront test of plano-convex aspheric lens |
| CN109341587B (en) * | 2018-11-28 | 2021-03-23 | 中国科学院光电技术研究所 | Splicing measuring device and method |
| CN109798840A (en) * | 2019-02-26 | 2019-05-24 | 中国科学院光电技术研究所 | The detection device of lens face shape deflection is detected in stitching interferometer instrument |
| CN110082073B (en) * | 2019-05-22 | 2022-08-23 | 中国科学院光电技术研究所 | Device and method for adjusting inclination of plane mirror in transmission wavefront of subaperture splicing detection optical system |
| CN110243306B (en) * | 2019-07-22 | 2024-06-11 | 中国工程物理研究院激光聚变研究中心 | Plane surface shape sub-aperture splicing interferometry device and method based on robot |
| CN114812428B (en) * | 2021-01-21 | 2023-09-01 | 中国科学院上海光学精密机械研究所 | Planar surface shape sub-aperture splicing interferometry device and measurement method |
| CN113091637B (en) * | 2021-03-22 | 2022-06-28 | 中国科学院光电技术研究所 | Ultra-high precision plane mirror full-aperture medium-frequency surface shape measuring device and method |
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