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CN102667156A - Cryopump - Google Patents

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Publication number
CN102667156A
CN102667156A CN2010800433845A CN201080043384A CN102667156A CN 102667156 A CN102667156 A CN 102667156A CN 2010800433845 A CN2010800433845 A CN 2010800433845A CN 201080043384 A CN201080043384 A CN 201080043384A CN 102667156 A CN102667156 A CN 102667156A
Authority
CN
China
Prior art keywords
condensing
low temperature
cryopump
vacuum chamber
panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2010800433845A
Other languages
Chinese (zh)
Inventor
铃木直人
增田行男
山口理
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Ulvac Cryogenics Inc
Original Assignee
Ulvac Inc
Ulvac Cryogenics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Ulvac Cryogenics Inc filed Critical Ulvac Inc
Publication of CN102667156A publication Critical patent/CN102667156A/en
Pending legal-status Critical Current

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05BINDEXING SCHEME RELATING TO WIND, SPRING, WEIGHT, INERTIA OR LIKE MOTORS, TO MACHINES OR ENGINES FOR LIQUIDS COVERED BY SUBCLASSES F03B, F03D AND F03G
    • F05B2210/00Working fluid
    • F05B2210/10Kind or type
    • F05B2210/12Kind or type gaseous, i.e. compressible
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05BINDEXING SCHEME RELATING TO WIND, SPRING, WEIGHT, INERTIA OR LIKE MOTORS, TO MACHINES OR ENGINES FOR LIQUIDS COVERED BY SUBCLASSES F03B, F03D AND F03G
    • F05B2250/00Geometry
    • F05B2250/70Shape
    • F05B2250/71Shape curved
    • F05B2250/711Shape curved convex
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05BINDEXING SCHEME RELATING TO WIND, SPRING, WEIGHT, INERTIA OR LIKE MOTORS, TO MACHINES OR ENGINES FOR LIQUIDS COVERED BY SUBCLASSES F03B, F03D AND F03G
    • F05B2250/00Geometry
    • F05B2250/70Shape
    • F05B2250/71Shape curved
    • F05B2250/712Shape curved concave

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

Abstract

Provided is a cryopump which can prevent a condensate from being detached from a panel surface to maintain a stable exhaust operation. A cryopump (30) has a cryopanel (31) to be cooled by a refrigerating machine (32). A condensation plane (310) of the cryopanel is divided into a plurality of divided planes (310a) by boundary portions (groove portions) (310b). Thus, cracks occurring on a divided plane are prevented from being transmitted to another divided plane adjacent thereto, by the boundary portions, and the occurrence region of the cracks can be limited within the divided plane. Further, the inner stress of a condensate on the condensation plane is dispersed to and absorbed by divided planes, so that the condensate is prevented from being detached from the divided planes. Thus, the pressure within a vacuum chamber can be prevented from varying due to the detachment of the condensate from the condensation plane and another condensation occurring thereafter, and a stable exhaust pressure can be maintained

Description

Cryopump
Technical field
The present invention relates to a kind of cryopump with the low temperature panel of catching gas molecule in a vacuum.
Background technique
As everyone knows, cryopump is a kind of as high vacuum pump, and being used for film forming, surfaction, graphic plotting, analysis, evaporation drying etc. is the vacuum treatment installation of purpose.Cryopump has the panel that is disposed in the vacuum chamber and this panel is cooled off the to the utmost point refrigerating machine of low temperature, is that a kind of gas molecule that makes is condensing or be condensed in the catching type pump that carries out exhaust on the said panel.The chilling temperature of panel waits and sets according to arriving the kind of goal pressure with the gas molecule that will capture, and when water molecule (water vapour) is carried out exhaust, for example is cooled to ultralow temperature or the utmost point low temperature (for example with reference to following patent documentation 1) of 80K.
The existing technology document
Patent documentation
Patent documentation 1: TOHKEMY 2002-70738 communique (the 0002nd section, Fig. 1)
Summary of the invention
Yet; Be higher than under the atmosphere of mixed gas of gas molecule (carbon dioxide, chlorine, ammonia etc.) of water vapour when water vapour carried out condensing exhaust at water vapour and saturated vapor pressure; Condensing body on the panel surface (ice film) cracks, and causes condensing body to be peeled off thus.The condensing body distillation (gasification once more) of peeling off, the gas of distillation is condensing once more through being captured to panel surface.The distillation of this condensing body and the condensing once more exhaust pressure that causes fluctuate, and are difficult to the exhaust action that keeps stable.
In view of above situation, the object of the present invention is to provide a kind of panel surface that can prevent that the cryopump that stable exhaust action was peeled off and kept to condensing body takes place.
In order to reach above-mentioned purpose, the cryopump that a mode of the present invention relates to is a kind of being used for the cryopump that is vented to goal pressure in the vacuum chamber, and it has panel and refrigerating machine.
Said panel has the need exhaust body that makes in the said vacuum chamber condensing condensing and is formed at said condensing boundary portion that goes up and said condensing face is divided into a plurality of independently parting planes; And
Said refrigerating machine can be cooled to said panel below the dew point of the said gas under the said goal pressure.
Description of drawings
Fig. 1 is the cut-away section side view of the structure of the vacuum treatment installation with cryopump that relates to of expression mode of execution of the present invention;
Fig. 2 is the concise and to the point plan view of the low temperature panel that relates to of said cryopump;
Fig. 3 is the cut-away section stereogram of said low temperature panel major component;
Fig. 4 is the schematic representation that the release mechanism to the condensing body of on condensing of existing low temperature panel, piling up describes;
Fig. 5 is the schematic representation that the situation of the condensing body piled up on condensing to the low temperature panel that relates at this mode of execution describes;
Fig. 6 is the time dependent experimental result of exhaust pressure of expression cryopump, and (A) the expression comparative example (B) is represented mode of execution of the present invention;
Fig. 7 is the cross-sectional schematic of the variation of condensing the structure of low temperature panel that relate to of expression mode of execution of the present invention;
Fig. 8 is the cross-sectional schematic of the variation of condensing the structure of low temperature panel that relate to of expression mode of execution of the present invention;
Fig. 9 is the cut-away section side view of the structure of the vacuum treatment installation with cryopump that relates to of expression another embodiment of the present invention;
Figure 10 is the cut-away section side view of the structure of the vacuum treatment installation with cryopump that relates to of an expression mode of execution more of the present invention.
Description of reference numerals
1,2,3 vacuum treatment installations
10 vacuum chambers
15 exhaust passages
20 main pumps
30 cryopumps
31,61,71,81,91,131 low temperature panels
32 refrigerating machines
40 gate valves
310 condensing
310a, 410a, 510a, 610a, 710a, 810a, 910a parting plane
310b, 410b, 510b, 810b, 910b ditch portion
610b, 710b wall portion
Embodiment
The cryopump that mode of execution of the present invention relates to is a kind of cryopump that is used for vacuum chamber is vented to goal pressure, and it has panel and refrigerating machine.
Said panel has the need exhaust body that makes in the said vacuum chamber condensing condensing and is formed at said condensing and said condensing face is divided into the boundary portion of a plurality of independently parting planes; And
Said refrigerating machine can be cooled to said panel below the dew point of the said gas under the said goal pressure.
In said cryopump, panel be arranged in the vacuum chamber or the exhaust passage of vacuum chamber in etc., be cooled to need exhaust body in the vacuum chamber below the dew point under the goal pressure by refrigerating machine.Gas in the vacuum chamber is captured on condensing of panel through condensing, and vacuum chamber is by vacuum exhaust thus.
When the gas in vacuum chamber is the different various mixed gases of saturated vapour air pressure, exist the condensing body that is piled up in condensing because the situation that internal stress cracks.Condensing of said panel is divided into a plurality of independently parting planes by boundary portion, and each parting plane is distributed on condensing as isolated island.Therefore, when cracking on the parting plane of somewhere, suppress the propagation of crackle through said boundary portion, thereby the generation zone of crackle is rested in this parting plane to adjacent other parting planes.And the internal stress of the condensing body on condensing obtains on each parting plane relaxing through being dispersed in, thereby stops the condensing body on the parting plane to be peeled off.Thus, prevent since condensing body on condensing peel off and the condensing once more vacuum chamber that causes afterwards in pressure surge, and keep stable exhaust pressure.
Said boundary portion can be made up of the ditch portion that is arranged with on said condensing.Thus, can each parting plane be formed island isolated in said ditch portion.Ditch portion can be that straight line shape also can be a curve-like.Ditch portion both can form regularly also and can be irregularly formed.The formation bar number of ditch portion and form figure etc. and do not do special qualification, the size of the parting plane that can form according to need suitably sets.For example, ditch portion can form clathrate, thereby can easily form parting plane.The section shape of ditch portion is not done special qualification yet, can be triangular shape (V word shape), rectangular-shaped, curved shape etc.
Said boundary portion also can constitute by being convexly set in said condensing wall portion.At this moment, also can each parting plane be formed island isolated in said wall portion.Wall portion both can be that straight line shape also can be a curve-like.Wall portion both can form regularly also and can be irregularly formed.The formation bar number of wall portion with form figure etc. and do not do special qualification, the size of the parting plane that can form according to need suitably sets.For example, wall portion can form clathrate, thereby can easily form parting plane.The section shape of wall portion is not done special qualification yet, can be triangular shape (V word shape), rectangular-shaped, curved shape etc.
Below, with reference to accompanying drawing, mode of execution of the present invention is described.
Fig. 1 is the cut-away section side view of the structure of the vacuum treatment installation with cryopump that relates to of expression mode of execution of the present invention.Vacuum treatment installation 1 has vacuum chamber 10, main pump 20, cryopump 30.
Vacuum chamber 10 has the seal structure that can carry out vacuum exhaust to inside, for example is made up of aluminum alloy, stainless steel and other metal materials.Set inside at vacuum chamber 10 has supporting semiconductor wafers or glass substrate etc. to be processed the platform of substrate, is used for heating being processed substrate, (not shown)s such as various vacuum treated heating sources, plasma source, film deposition source such as plasma irradiating, etching, film forming.
Main pump 20 can use for example dried pump such as turbomolecular pump or roots-type pump, also can use other vacuum pumps such as diffusion pump in addition.Main pump 20 is arranged at the bottom of vacuum chamber 10, with the exhaust gas inside of vacuum chamber 10 to the first predetermined degree of vacuum (for example 1 * 10 -4Pa).
Cryopump 30 is used for the vacuum chamber 10 inner water vapour (H that exist 2O) carry out condensing exhaust, thereby the inside of vacuum chamber 10 is vented to second degree of vacuum (for example 1 * 10 of the high vacuum that is higher than first degree of vacuum -5Pa).In this mode of execution, make through main pump 20 after the inside of vacuum chamber reaches said first degree of vacuum, cryopump 30 drives.
Cryopump 30 has the low temperature panel 31 that is positioned at vacuum chamber 10 inside and is positioned at the refrigerating machine 32 that cool off low temperature panel 31 vacuum chamber 10 outsides.Refrigerating machine 32 has freezing the 32a of airtight perforation vacuum chamber 10 bottom 10a, and the tip portion of freezing 32a supports low temperature panel 31.In the refrigerating machine 32, the helium of sending into from the helium compressor (not shown) expands at freezing 32a, and low temperature panel 31 is cooled to for example ultralow temperature below the 80K or utmost point low temperature.
The chilling temperature of low temperature panel 31 is not done special qualification, reaches under the goal pressure at cryopump 30, can be below the temperature (dew point) of condensing water vapour on the low temperature panel 31 as long as be in.
Details in the face of low temperature panel 31 describe down.Fig. 2 is the plan view of low temperature panel 31, and Fig. 3 is the part stereogram of low temperature panel 31.
Low temperature panel 31 is made up of the high metallic material disk of thermal conductivity such as copper or aluminium.In the low temperature panel 31, upper surface that will be relative with the inside of vacuum chamber 10 is as making condensing condensing 310 of exhaust object water vapour.In addition, low temperature panel 31 is not limited to discoid, can also be rectangular-shaped.And it is dull and stereotyped situation that low temperature panel 31 is not limited to, and can also be twisted plate, cylindric etc.
Have separate a plurality of parting plane 310a for condensing 310.Each parting plane 310a divides by on condensing 310, forming cancellate many ditch portions 310b (boundary portion).Thus, each parting plane 310a is distributed on condensing 310 as isolated each other island.In addition, for the ease of understanding, simply show Fig. 2, in fact, parting plane 310a is more finer than embodiment illustrated formation.
The 310b of ditch portion constitutes the border of a plurality of adjacent parting plane 310a.The 310b of ditch portion has the section shape that roughly is triangular shape (V word shape).In this mode of execution, be formed with many with straight line shape respectively on planar vertical two axle direction (X-axis direction, Y direction) of the 310b of ditch portion, so that each parting plane 310a is a square.Special qualification is not done in the width of the 310b of ditch portion, the degree of depth, formation at interval, can suitably set according to size (area), the interval of each parting plane 310a.For example, when the diameter of low temperature panel 31 was 470mm, the width of the 310b of ditch portion, the degree of depth, formation can be made as 1mm, 0.5mm, 5mm respectively at interval.
In the cryopump 30 of this mode of execution that as above constitutes, low temperature panel 31 is cooled to below the 80K by refrigerating machine 32.Through condensing being captured on condensing 310 of low temperature panel 31, thus, vacuum chamber 10 is vented to said second degree of vacuum to residual gas in the vacuum chamber 10 (or discharging gas).
In this mode of execution, cryopump 30 is mainly with to the water vapour (H in the vacuum chamber 10 2The mode of O) carrying out exhaust turns round.Here; When in vacuum chamber 10, existing saturated vapour air pressure to be higher than the gas (for example carbon dioxide, chlorine, ammonia) of water vapour; These gases also are captured on low temperature panel 31 with water vapour together, and the condensing body of conduct and the mixed gas of water vapour is deposited on condensing 310.The condensing body of said mixed gas is owing to because of the difference of condensing heat or the specific volumetric dilatation when condensing etc. causes internal stress bigger, situation about cracking on the low temperature panel 31 therefore occurs.
Wherein, the crack growth that on condensing body, produces surpasses predetermined, then brings out condensing body and peels off from condensing.Fig. 4 is the schematic representation of the release mechanism of the condensing body on explaining condensing.The crackle C1 of the last generation of (ice film) F of the condensing body on condensing S produces (Fig. 4 (A)) at an arbitrary position, produces bigger crackle C2 (Fig. 4 (B)) through outgrowth with merging.Crackle C2 peels off (Fig. 4 (C)) from condensing S, finally produces stripping film C3 (Fig. 4 (D)).Condensing body F peels off when the venting capacity that causes pump reduces from condensing S, because the distillation of stripping film C3 (gasification once more) causes the pressure in the vacuum chamber to rise.And the gas of distillation is condensing once more on condensing S, makes that thus the pressure in the vacuum chamber reduces.Because these phenomenons repeat to take place, cause the exhaust pressure fluctuation, be difficult to the condition of high vacuum degree that keeps stable.
On the other hand, in this mode of execution, in the low temperature panel 31, condensing 310 is divided into a plurality of independently parting plane 310a by the 310b of ditch portion.Fig. 5 (A) shows the condensing body F on condensing 310 that is deposited in low temperature panel 31.Condensing body F forms the surface configuration of parting plane 310a and the 310b of ditch portion and is piled up on condensing 310.
Fig. 5 (B) is the schematic representation of the situation of expression when cracking on the condensing body F.Each parting plane 310a is distributed on condensing 310 as isolated island.Therefore, when cracking C on the parting plane 310a somewhere, receive than the large propagation resistance, thereby suppress the merging of crackle C to the mutual crackle C of the propagation of other adjacent parting planes and parting plane 310a through the 310b of ditch portion.That is, give the boundary portion of condensing shape anisotropy, thereby can control the spread state of crackle C through formation.Therefore, be set at not produce through size and cause peeling off from this parting plane, thereby the generation zone of crackle is rested in this parting plane by crackle C with each parting plane 310a.
In addition, according to this mode of execution, the internal stress of the condensing body F on condensing 310 is gone up and is obtained relaxing through being dispersed in each parting plane 310a, thereby can effectively stop peeling off of condensing body F on parting plane 310a.Thus, can prevent since condensing body F on condensing 310 peel off and the condensing once more vacuum chamber that causes afterwards in pressure surge, and keep stable exhaust pressure.
In addition, the crackle C of condensing body F also can produce in the 310b of ditch portion.But, because in shape isotropy disappears between the 310b of ditch portion and the parting plane 310a, therefore, the propagation of the crackle between 310b of cross channel portion and the parting plane 310a and merge and can effectively be stoped.
Fig. 6 (A), (B) show exhaust pressure over time; Experimental result when (A) being to use the low temperature panel that comparative example (Fig. 4) relates to; Wherein condensing face is that the mode with continuous level forms; Experimental result when (B) being to use the low temperature panel 31 that this mode of execution relates to, wherein condensing is formed by a plurality of parting planes of dividing with boundary portion.In experiment, vacuum chamber is being vented to 1 * 10 -5After the Pa, in vacuum chamber, continue to import 130sCCm water vapour (H respectively 2O), 100sCCm carbon dioxide (CO 2) and record pressure.The chilling temperature of low temperature panel is made as 70K.
Shown in Fig. 6 (A), be illustrated in the low temperature panel entry into service that comparative example relates to and begin to occur variation in pressure after about one hour, afterwards, continue to take place pressure surge.To this, according to this mode of execution, shown in Fig. 6 (B), show the fluctuation that begins not have pressure from running, and keep stable exhaust pressure in the long period.Show in addition,, in reaching 24 hours period of exhaust, can keep exhaust pressure stable, though not shown according to this mode of execution.So can keep the stable main cause of exhaust pressure to be to prevent really that condensing body from peeling off from the low temperature panel.Also shown,,, also can not peel off from the low temperature panel according to this mode of execution even condensing in the prior art body is peeled off and piled up under the situation that reaches 3mm thickness.
As stated, according to this mode of execution, condensing 310 of low temperature panel 31 because the existence of the 310b of ditch portion and being made up of a plurality of parting plane 310a, therefore, can prevent that condensing body from peeling off from condensing 310.Thus, can realize moving, can prevent the pressure surge in the vacuum chamber through the stable exhaust that cryopump 30 carries out.In addition, can in long-time, stably implement the application of vacuum of the film forming etc. in the vacuum chamber.
More than, be illustrated to mode of execution of the present invention, but the present invention is not limited to this, can carry out various distortion based on technological thought of the present invention.
For example, in above mode of execution, a plurality of parting plane 310a of condensing 310 that constitute low temperature panel 31 are made as plane shape, and the section shape that will divide the 310b of ditch portion of each parting plane 310a is made as triangular shape (V word shape), but is not limited to this.In addition, the width of the 310b of ditch portion is made as the width less than parting plane 310a, but the width of the 310b of ditch portion can also be made as the width more than or equal to parting plane 310a.In aforesaid structure example, also can obtain action effect same as described above.
Fig. 7 (A)-(C) is the cross-sectional schematic of low temperature panel of the variation of condensing structure of expression.In Fig. 7, (A) showing by section shape is the example that the rectangular-shaped 410b of ditch portion forms parting plane 410a.The 410b of ditch portion has the width more than or equal to parting plane 410a.(B) 510b of ditch portion that to show through continuous formation section be triangular shape is by the inclined-plane of the 510b of the ditch portion structure example as parting plane 510a.(C) width that shows the 610b of ditch portion forms the example more than or equal to the width of parting plane 610a.
In addition, in these mode of executions, constitute the boundary portion that the condensing face of low temperature panel is divided into a plurality of parting planes, also can constitute said boundary portion by wall portion by ditch portion.At this moment, also can each parting plane be distributed on condensing as isolated island.An example correspondence of this structure is the structure example of Fig. 7 (A) for example, and at this moment, the 410b of ditch portion is equivalent to parting plane, and parting plane 410a is equivalent to wall portion.
In addition; In the above-described embodiment; Thereby form a plurality of parting planes through on condensing of low temperature panel, forming boundary portion, but also can shown in Fig. 8 (A)-(C), the low temperature panel itself be processed as the shape that on condensing, forms parting plane substitute aforesaid way.For example among Fig. 8 (A) to show by section shape be the low temperature panel 71 that the 710b of wall portion of semicircle shape divides parting plane 710a.(B) showing by section shape is the low temperature panel 81 that the 810b of wall portion of triangular shape divides parting plane 810a.And (C) showing by section shape is the low temperature panel 91 that the rectangular-shaped 910b of ditch portion divides parting plane 910a.These low temperature panels 71,81,91 for example can form through the punch process sheet metal.In addition, in Fig. 8 (A), (B), the said wall 710b of portion, 810b also can be parting planes, and parting plane 710a, 810a also can be ditch portions.In addition, in Fig. 8 (C), the 910b of ditch portion also can be a parting plane, and parting plane 910a also can be a wall portion.
Further, the vacuum treatment installation with cryopump 30 is not limited to the said structure example, can also be structure for example as shown in Figure 9.Vacuum treatment installation 2 as shown in Figure 9 has vacuum chamber 10, main pump 20, cryopump 30, with the inside of vacuum chamber 10 be provided with the gate valve 40 that the pump chamber of cryopump 30 separates.In addition, in Fig. 9, add identical reference character to the part identical with the structure of Fig. 1, it specifies omission.
In Fig. 9, gate valve 40 is made up of open and close valves such as the families of power and influence, when vacuum chamber 10 carries out vacuum exhaust, is in full-gear.In addition, during to outside atmosphere opening etc., gate valve 40 is in full-shut position, thereby can be with remaining vacuum state in the pump chamber in the inside of vacuum chamber 10.In the vacuum treatment installation 2 of this structure, also can obtain the action effect identical with above-mentioned mode of execution.
Further, the vacuum treatment installation with cryopump 30 is not limited to the said structure example, can also be structure for example shown in figure 10.Vacuum treatment installation 3 shown in figure 10 has vacuum chamber 10, main pump 20, cryopump 30, connects the exhaust passage 15 of vacuum chamber 10 and main pump 20.In addition, in Figure 10, add identical reference character to having the part identical with the structure of Fig. 1, it specifies omission.
In Figure 10, cryopump 30 is installed on exhaust passage 15, and gas (for example water vapour) 15 inside is carried out exhaust from vacuum chamber 10 to main pump 20 in the exhaust passage.Cryopump 30 has low temperature panel 131 cylindraceous, and 15 the inside in the exhaust passage is set to for example concentric with exhaust passage 15.On the inner peripheral surface of this low temperature panel 131 cylindraceous and outer circumferential face, form condensing with separate a plurality of parting planes same as described above.
In addition, this condensing as long as be formed at least one side of inner peripheral surface and outer circumferential face of low temperature panel 131 at least.In the vacuum treatment installation 3 of this structure, also can obtain the action effect identical with above-mentioned mode of execution.In addition, the number that is arranged at the low temperature panel 131 in the exhaust passage 15 is not limited to single, can also be a plurality of.At this moment, the different a plurality of cylindric low temperature panel of diameter also can arranged concentric, a plurality of cylindric low temperature panel of same diameter also can be along the exhaust passage arranged in series.
Further, in the above-described embodiment, enumerated with water vapour as the example of need, but be not limited to this, when being used for the exhaust of vacuum treated various process gas (for example, nitrogen or argon gas), also can be suitable for the present invention by the gas of cryopump 30 exhausts.For example, through the low temperature panel is cooled to 30-40K, can carry out condensing exhaust to nitrogen in the vacuum chamber and argon gas.This moment is same, and the condensing body on the low temperature panel possibly crack owing to internal stress, and the low temperature panel that the application of the invention relates to can stop peeling off of this condensing body, prevents the fluctuation of exhaust pressure.

Claims (4)

1. a cryopump that is used for vacuum chamber is vented to goal pressure is characterized in that, comprising:
Panel has the need exhaust body that makes in the said vacuum chamber condensing condensing and is formed at said condensing boundary portion that goes up, said condensing face is divided into a plurality of independently parting planes; And
Refrigerating machine can be cooled to said panel below the dew point of the said gas under the said goal pressure.
2. cryopump according to claim 1 is characterized in that, said boundary portion is the ditch portion that is arranged with on said condensing.
3. cryopump according to claim 2 is characterized in that, said ditch portion forms clathrate on said condensing.
4. cryopump according to claim 1 is characterized in that, said boundary portion is to be convexly set in said condensing wall portion.
CN2010800433845A 2009-09-29 2010-09-28 Cryopump Pending CN102667156A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009225160 2009-09-29
JP2009-225160 2009-09-29
PCT/JP2010/005838 WO2011040002A1 (en) 2009-09-29 2010-09-28 Cryopump

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CN102667156A true CN102667156A (en) 2012-09-12

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JP (1) JP5433702B2 (en)
KR (1) KR20120048689A (en)
CN (1) CN102667156A (en)
TW (1) TW201118250A (en)
WO (1) WO2011040002A1 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59229071A (en) * 1983-06-10 1984-12-22 Mitsubishi Heavy Ind Ltd Adsorptive pump cooling its adsorptive plate cryogenic temperature liquid
JPS60249678A (en) * 1984-05-25 1985-12-10 Toshiba Corp Cryopump
JPS63243470A (en) * 1987-03-30 1988-10-11 Toshiba Corp Vacuum exhaust device
JP2002070738A (en) * 2000-08-31 2002-03-08 Ulvac Kuraio Kk Cryotrap
CN1882779A (en) * 2003-11-20 2006-12-20 住友重机械工业株式会社 Cryopump
WO2008088794A2 (en) * 2007-01-17 2008-07-24 Brooks Automation, Inc. Pressure burst free high capacity cryopump

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1012478A2 (en) * 1997-04-18 2000-06-28 SAES PURE GAS, Inc. In situ getter pump system and method
US5974809A (en) * 1998-01-21 1999-11-02 Helix Technology Corporation Cryopump with an exhaust filter
JP2007154785A (en) * 2005-12-06 2007-06-21 Fuji Electric Holdings Co Ltd Cold trap and vacuum exhaust system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59229071A (en) * 1983-06-10 1984-12-22 Mitsubishi Heavy Ind Ltd Adsorptive pump cooling its adsorptive plate cryogenic temperature liquid
JPS60249678A (en) * 1984-05-25 1985-12-10 Toshiba Corp Cryopump
JPS63243470A (en) * 1987-03-30 1988-10-11 Toshiba Corp Vacuum exhaust device
JP2002070738A (en) * 2000-08-31 2002-03-08 Ulvac Kuraio Kk Cryotrap
CN1882779A (en) * 2003-11-20 2006-12-20 住友重机械工业株式会社 Cryopump
WO2008088794A2 (en) * 2007-01-17 2008-07-24 Brooks Automation, Inc. Pressure burst free high capacity cryopump

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Application publication date: 20120912