CN102209425B - Radio frequency discharge plasma diagnostic device - Google Patents
Radio frequency discharge plasma diagnostic device Download PDFInfo
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- CN102209425B CN102209425B CN2011100032634A CN201110003263A CN102209425B CN 102209425 B CN102209425 B CN 102209425B CN 2011100032634 A CN2011100032634 A CN 2011100032634A CN 201110003263 A CN201110003263 A CN 201110003263A CN 102209425 B CN102209425 B CN 102209425B
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- probe
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- 239000000523 sample Substances 0.000 claims abstract description 52
- 230000005684 electric field Effects 0.000 claims abstract description 5
- 238000002955 isolation Methods 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000013480 data collection Methods 0.000 abstract 1
- 210000002381 plasma Anatomy 0.000 description 27
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 230000003321 amplification Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000003745 diagnosis Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
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Abstract
The invention relates to a diagnostic device of radio frequency discharge plasma, belonging to the plasma science and technology field and being used for diagnosing radio frequency discharge plasma. The diagnostic device can overcome radio frequency discharge especially radio frequency disturbance existed in the simultaneous discharge of three or more radio frequency and obtain parameters such as electron density, electron temperature and the like. The diagnostic device of radio frequency discharge plasma comprises a detector and a servo system, wherein the detector is composed of a metallic probe, a base electrode and a reference electrode; the base electrode is annular and arranged parallel to the equipotential surface of the discharge electric field of the place where the base electrode locates in; the probe is locate in the center of the annular base electrode; the reference electrode can locate in any position of the plasma; the surface area of the base electrode is 300 times larger than the surface area of the probe; and the servo system is composed of a computer, a data collection card, a sawtooth wave generator and an interface circuit; and the servo system does not share a power source with discharge equipment and does not share a land with discharge loop. Sawtooth wave scan voltage generated by a sawtooth wave generator is added between the probe and the base electrode. The potential of the probe is calculated with the potential of the reference electrode as reference.
Description
Technical field
The invention belongs to plasma science and technical field, relate to a kind of rf (discharge) plasma diagnostic device, can overcome radio frequency discharge, the radio frequency disturbance that exists when particularly two above radio frequencies discharge simultaneously, parameters such as electron gain density and electron temperature.
Background technology
Probe is a diagnosis plasma parameter device commonly used.When utilizing common probe diagnostics rf (discharge) plasma, the VA characteristic curve of probe is given the diagnostic result that makes mistake because radio frequency disturbance meeting is distorted.Radio frequency disturbance for single-frequency; Common solution is radio-frequency choke and auxiliary electrode to be installed in probe circuit disturbance is decayed to radio frequency; Or utilize external circuit that radiofrequency signal is sampled, offset disturbance through feeding back to probe after phase shift and the amplification again.But above-mentioned two kinds of measures all can only overcome the disturbance of single-frequency radio frequency discharge to probe, and powerless for discharge the simultaneously disturbance that produced of two above radio frequencies.Because in this case; Because the non-linear characteristics of plasma; The radio frequency disturbance of different frequency intercouples; Making synthetic disturbance have the advantages that frequency band range is wide, spectrum component is complicated, still is that phase shift can only be tuned on the individual frequencies with the amplification feedback circuit and no matter radio-frequency choke adds auxiliary electrode, can not work to a frequency band.
In fact; At present institute generally the probe unit of use why receive the strong disturbance of radio frequency discharge; Be because the scanning bias voltage of probe is added between the sparking electrode of probe and ground connection; Therefore probe circuit must connect the sparking electrode of ground connection, with discharge loop altogether, the probe current potential is with the earth potential of discharge loop as a reference.This just makes radio-frequency voltage be coupled to discharge loop ground through probe and probe circuit, thereby in probe circuit, forms very strong radio frequency current perturbation.If probe circuit can be independent of discharge loop; Not with discharge loop altogether; And take measures to eliminate the distributed capacitance coupling between probe circuit and the discharge loop, just can cut off radio-frequency current through the coupling channel of probe circuit, thereby eliminate the radio frequency disturbance to discharge loop ground.
Summary of the invention
The technical problem that the present invention will solve provides a kind of rf (discharge) plasma diagnostic device, to solve the diagnosis rf (discharge) plasma, particularly two above radio frequencies discharge simultaneously plasma the time radio frequency perturbed problem that exists.
Technical scheme of the present invention is:
A kind of rf (discharge) plasma diagnostic device comprises detector and servo system.The probe that detector is made of metal, base electrode and reference electrode are formed, and are in the plasma.Base electrode is an annular, and with the parallel placement of the equipotential surface of position discharge electric field, probe is positioned at the center of circular base electrode, and reference electrode can be arranged in any position of plasma; The base electrode surface area is greater than long-pending 300 times of detecting probe surface; Probe, base electrode and reference electrode are connected with servo system through the lead that is connected separately respectively.
Servo system is made up of computer, data collecting card, saw-toothed wave generator and interface circuit; Servo system not with the discharge equipment common source, not with discharge loop altogether.
Probe, base electrode and reference electrode are connected with servo system through interface circuit.Wherein, base electrode is connected with the ground wire of servo system through the isolation inductance in the interface circuit; Probe is through the LC filter in the interface circuit and the output and the data acquisition card connection of saw-toothed wave generator; Reference electrode is through RC filter and data acquisition card connection in the interface circuit.In the interface circuit, the LC filter tuner is on discharge frequency and second harmonic thereof, and resistance is greater than 1 megohm in the RC filter.
The sawtooch sweep voltage that saw-toothed wave generator produces is added between probe and the base electrode, and the current potential of probe is a reference calculation with the current potential of reference electrode; The electric current of the voltage of data collecting card acquisition probe, the voltage of reference electrode and probe, with transfer of data to computer.Computer utilizes the parameters of the characteristic curve analytical calculation plasma that voltage difference and the probe current between probe and the reference electrode constituted.
The invention has the beneficial effects as follows:
(a) device of the present invention can overcome radio frequency discharge, the radio frequency disturbance that exists when particularly two above radio frequencies discharge simultaneously, and the article on plasma body is diagnosed, parameters such as the density of acquisition plasma and electron temperature.
(b) device of the present invention not with the discharge equipment common source, not with discharge loop altogether, avoided discharging current through diagnostic device shunting, article on plasma body discharge disturbance is little.
(c) device middle probe of the present invention and circular base electrode assemblie are flat structure, and reference electrode can be arranged in any position of plasma, can diagnose the plasma of short air gap discharge.
Description of drawings
Fig. 1 is the structure chart of detector in the device of the present invention.
Fig. 2 is structure of the present invention and use sketch map.
Fig. 3 is the actual measurement performance diagram that utilizes the present invention that the single rf (discharge) plasma of 60MHz is diagnosed.
Fig. 4 is the actual measurement performance diagram that utilizes the present invention that 60MHz/2MHz double frequency while discharge plasma is diagnosed.
Among the figure: 1 probe, 2 base electrodes, 3 reference electrodes, 4 lead-in wires, 5 insulating sleeves; 6 interface circuits, 7 current sensors, 8 saw-toothed wave generators, 9 data collecting cards, 10 servo systems ground; 11 data wires, 12 computers, 13 sparking electrodes, 14 plasmas, 15 discharge loop ground.
Embodiment
Be described in detail specific embodiment of the present invention below in conjunction with technical scheme and accompanying drawing.
In Fig. 1, detector is made up of probe 1, base electrode 2 and reference electrode 3; Probe 1 is the copper wire of diameter 0.5mm, long 1mm, and base electrode 2 is annulus of the diameter 30mm that processes of the thick copper wire of 2mm, and base electrode 2 areas are 335 times of probe 1 area approximately, and reference electrode 3 is copper wires of diameter 0.5mm; Probe 1 is positioned at the center of circular base electrode 2, and reference electrode 3 is positioned at outside base electrode 2 rings; Probe 1, base electrode 2 and reference electrode 3 are drawn through the 4 warp insulation sleeve pipes 5 that go between.
In Fig. 2, radio frequency discharge takes place between the sparking electrode 13, produce plasma 14.Detector is arranged in plasma 14, and wherein, circular base electrode 2 is parallel with sparking electrode 13, and is promptly parallel with the equipotential surface of discharge electric field, vertical with discharge electric field; Probe 1 is positioned at the center of circular base electrode 2; Reference electrode 3 is positioned near the edge of plasma 14.Servo system is made up of computer 12, data collecting card 9, saw-toothed wave generator 8 and interface circuit 6; Servo system is a reference point with servo system ground 10, and discharge loop is a reference point with discharge loop ground 15, servo system not with discharge loop altogether.Base electrode 2 is connected with the ground wire of servo system through the isolation inductance in the interface circuit 6; Probe 1 is connected with the output and the data collecting card 9 of saw-toothed wave generator 8 through the LC filter in the interface circuit 6; Reference electrode 3 is connected with data collecting card 9 through the RC filter in the interface circuit 6.In the interface circuit 6, the LC filter tuner is on discharge frequency and second harmonic thereof, and resistance is 2.2 megohms in the RC filter.Computer 12 is battery powered notebook computers; The 5V output voltage of its USB interface is data collecting card 9 and saw-toothed wave generator 8 power supplies; Be the battery that whole servo system electricity consumption all comes from computer 12, the required positive negative high-voltage of saw-toothed wave generator 8 is by conversion module boosts provides through DC-to-dc (DC-DC) from the 5V voltage of the USB interface of computer 12.The sawtooch sweep voltage that saw-toothed wave generator 8 produces is added between probe 1 and the base electrode 2, and the signal of the voltage and current transducer 7 of probe 1, reference electrode 3 is gathered by data collecting card 9, through data wire 11 input computers 12.
In the embodiments of figure 3, utilize the present invention that radio frequency 60MHz capacitive coupling discharge plasma is diagnosed and obtain VA characteristic curve.Discharge gas is an argon gas, and air pressure is 5Pa, and electrode spacing 3cm, discharge power are 100W.To draw electron density be 8.29 * 10 in analytical calculation to VA characteristic curve
9Cm
-3, electron temperature is 6.31eV.
In the embodiment of Fig. 4, utilize the present invention that double frequency (60MHz+2MHz) capacitive coupling discharge plasma is diagnosed and obtain VA characteristic curve.Discharge gas is an argon gas, and air pressure is 5Pa, electrode spacing 3cm, and the low-and high-frequency discharge power is 100W.To draw plasma density be 8.62 * 10 in analytical calculation to VA characteristic curve
9Cm
-3, electron temperature is 6.47eV.
Claims (1)
1. a rf (discharge) plasma diagnostic device comprises detector and servo system, it is characterized in that:
The probe that detector is made of metal (1), base electrode (2) and reference electrode (3) are formed; Base electrode (2) is an annular; With the parallel placement of the equipotential surface of position discharge electric field; Probe (1) is positioned at the center of circular base electrode (2), and reference electrode (3) is arranged in any position of plasma (14), and base electrode (2) surface area is greater than 300 times of probe (1) surface area;
Servo system is made up of computer (12), data collecting card (9), saw-toothed wave generator (8) and interface circuit (6), servo system not with the discharge equipment common source, not with discharge loop altogether;
Probe (1), base electrode (2) and reference electrode (3) are connected with servo system through interface circuit (6); Base electrode is connected with the ground wire of servo system through the isolation inductance in the interface circuit; Probe is through the LC filter in the interface circuit and the output and the data acquisition card connection of saw-toothed wave generator; Reference electrode is through RC filter and data acquisition card connection in the interface circuit; In the interface circuit (6), the LC filter tuner is on discharge frequency and second harmonic thereof, and the resistance in the RC filter is greater than 1 megohm;
The 5V output voltage of computer (12) is data collecting card (9) and saw-toothed wave generator (8) power supply, and the required positive negative high-voltage of saw-toothed wave generator (8) is boosted through the dc-dc conversion module by the 5V output voltage from computer (12) and provides;
The sawtooch sweep voltage that saw-toothed wave generator (8) produces is added between probe (1) and the base electrode (2), and the current potential of probe (1) is a reference calculation with the current potential of reference electrode (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011100032634A CN102209425B (en) | 2011-01-08 | 2011-01-08 | Radio frequency discharge plasma diagnostic device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011100032634A CN102209425B (en) | 2011-01-08 | 2011-01-08 | Radio frequency discharge plasma diagnostic device |
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| Publication Number | Publication Date |
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| CN102209425A CN102209425A (en) | 2011-10-05 |
| CN102209425B true CN102209425B (en) | 2012-07-18 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2011100032634A Expired - Fee Related CN102209425B (en) | 2011-01-08 | 2011-01-08 | Radio frequency discharge plasma diagnostic device |
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Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104849678B (en) * | 2015-05-22 | 2017-07-21 | 大连理工大学 | The probe of alternating magnetic field ionization meter a kind of electric discharge suitable for low pressure very high frequency(VHF) |
| US9966231B2 (en) * | 2016-02-29 | 2018-05-08 | Lam Research Corporation | Direct current pulsing plasma systems |
| CN106851953B (en) * | 2017-02-22 | 2018-12-21 | 大连理工大学 | A kind of convex-concave probe and its plasma diagnostic method |
| CN107680897B (en) * | 2017-10-10 | 2024-02-09 | 中国科学技术大学 | Interventional diagnosis device capable of precisely moving and laterally guiding wires |
| CN109600900A (en) * | 2019-01-23 | 2019-04-09 | 电子科技大学 | A kind of plasma jet array inhomogeneous plasma generation device |
| CN110381659B (en) * | 2019-06-04 | 2021-08-10 | 西安电子科技大学 | Radio frequency dynamic capacitive coupling plasma diagnosis system and method |
| CN110505744B (en) * | 2019-07-19 | 2020-11-17 | 北京航空航天大学 | Radio frequency compensation emission probe |
| CN113543439B (en) * | 2021-07-12 | 2022-06-07 | 山东大学 | Emission probe and method for plasma diagnostics |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19634356A1 (en) * | 1996-08-26 | 1998-03-05 | Moritz Heintze | Radio frequency compensation method for potential measuring probe |
| CN1998069A (en) * | 2004-03-30 | 2007-07-11 | 朗姆研究公司 | Method of plasma etch endpoint detection using a V-I probe diagnostics |
| CN101354406A (en) * | 2008-09-12 | 2009-01-28 | 大连理工大学 | Probe apparatus of radio frequency plasma |
| WO2010005933A2 (en) * | 2008-07-07 | 2010-01-14 | Lam Research Corporation | Passive capacitively-coupled electrostatic (cce) probe arrangement for detecting plasma instabilities in a plasma processing chamber |
-
2011
- 2011-01-08 CN CN2011100032634A patent/CN102209425B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19634356A1 (en) * | 1996-08-26 | 1998-03-05 | Moritz Heintze | Radio frequency compensation method for potential measuring probe |
| CN1998069A (en) * | 2004-03-30 | 2007-07-11 | 朗姆研究公司 | Method of plasma etch endpoint detection using a V-I probe diagnostics |
| WO2010005933A2 (en) * | 2008-07-07 | 2010-01-14 | Lam Research Corporation | Passive capacitively-coupled electrostatic (cce) probe arrangement for detecting plasma instabilities in a plasma processing chamber |
| CN101354406A (en) * | 2008-09-12 | 2009-01-28 | 大连理工大学 | Probe apparatus of radio frequency plasma |
Non-Patent Citations (2)
| Title |
|---|
| S. K. Ahn et al..Role of low-frequency power in dual-frequency capacitive discharges.《Applied Physics Letters》.2009,第95卷111502. * |
| V A Godyak et al..Measurement of electron energy distribution in low-pressure RF discharges.《Plasma Sources Science and Technology》.1992,第1卷36-58. * |
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| CN102209425A (en) | 2011-10-05 |
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