CN102053419B - Liquid crystal shutter slit grating - Google Patents
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- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 57
- 239000000758 substrate Substances 0.000 claims abstract description 123
- 230000010287 polarization Effects 0.000 claims description 6
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 claims description 2
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical group O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 claims 1
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- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 238000002207 thermal evaporation Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
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- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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Abstract
本发明涉及一种液晶快门狭缝光栅,包括对盒在一起并将液晶夹设其间的第一光栅基板和第二光栅基板,所述第一光栅基板和第二光栅基板上分别包括形成在基板上的光栅层、取向膜和偏光片,所述第一光栅基板上的光栅层和第二光栅基板上的光栅层相对错开。所述光栅层形成在基板上,由宽度相同的透明导电条依次排列组成,所述第一光栅基板上的透明导电条与第二光栅基板上的透明导电条相对设置,且沿着所述透明导电条的垂直方向相对错开。本发明采用透明导电条宽度相同、两个光栅基板上透明导电条错位的结构,与现有技术相比,由于本发明透明导电条的宽度较宽,不仅大大降低了制作工艺难度,而且降低了透明导电条的电阻,提高了产品品质。
The invention relates to a liquid crystal shutter slit grating, which comprises a first grating substrate and a second grating substrate which are boxed together and a liquid crystal is interposed therebetween. The first grating substrate and the second grating substrate respectively include The grating layer, alignment film and polarizer on the first grating substrate are relatively staggered from the grating layer on the second grating substrate. The grating layer is formed on the substrate and is composed of transparent conductive strips with the same width arranged in sequence. The transparent conductive strips on the first grating substrate are opposite to the transparent conductive strips on the second grating substrate, and along the transparent conductive strips The vertical directions of the conductive strips are relatively staggered. The present invention adopts a structure in which the width of the transparent conductive strip is the same and the transparent conductive strips on the two grating substrates are dislocated. The resistance of the transparent conductive strip improves the product quality.
Description
技术领域 technical field
本发明涉及一种立体显示装置,特别是涉及一种液晶快门狭缝光栅。The invention relates to a stereoscopic display device, in particular to a liquid crystal shutter slit grating.
背景技术 Background technique
自由立体显示技术是指不需要带眼睛,裸眼即可观察到立体效果的显示技术,而实现自由立体显示的核心部件是光栅。现有技术中,透镜光栅和狭缝光栅是两种最主要的技术。其中狭缝光栅又可分为黑白条狭缝光栅和液晶快门狭缝光栅,液晶快门狭缝光栅不仅可以用于立体显示,还可以进行二维(2D)显示与三维(3D)显示的切换。Autostereoscopic display technology refers to a display technology that can observe stereoscopic effects without eyes, and the core component to realize autostereoscopic display is grating. In the prior art, lens grating and slit grating are two main technologies. Among them, the slit grating can be divided into black and white strip slit grating and liquid crystal shutter slit grating. The liquid crystal shutter slit grating can not only be used for stereoscopic display, but also switch between two-dimensional (2D) display and three-dimensional (3D) display.
液晶快门狭缝光栅是一种TN模式的液晶面板,通电时显示黑条,相邻的黑条之间可以透光,成为黑白条纹间隔的狭缝光栅,可以实现三维显示;不通电时整体透光,可以进行二维显示。图4为现有技术液晶快门狭缝光栅的结构示意图。如图4所示,现有技术液晶快门狭缝光栅包括对盒在一起并将液晶30夹设其间的第一光栅基板10和第二光栅基板20,每个光栅基板包括基板1、光栅层2、取向膜3和偏光片4,光栅层2形成在基板1上,由较宽的宽透明导电条和较窄的窄透明导电条组成,宽透明导电条和窄透明导电条依次设置并周期性排列,宽透明导电条与窄透明导电条之间相互绝缘。第一光栅基板10与第二光栅基板20上的宽透明导电条相对设置,窄透明导电条也相对设置。取向膜3形成在光栅层2上,偏光片设置在每个基板1的外侧。The liquid crystal shutter slit grating is a kind of TN mode liquid crystal panel. When it is powered on, it displays black stripes, and the adjacent black stripes can transmit light, forming a slit grating with black and white stripe intervals, which can realize three-dimensional display; when it is not powered on, the overall transparency light for two-dimensional display. FIG. 4 is a schematic structural diagram of a liquid crystal shutter slit grating in the prior art. As shown in FIG. 4 , the prior art liquid crystal shutter slit grating includes a
图5为现有技术液晶快门狭缝光栅的工作示意图。如图5所示,当第一光栅基板10和第二光栅基板20上的宽透明导电条和窄透明导电条均输入相同的电压(如0V)时,液晶不偏转,宽透明导电条和窄透明导电条对应位置均为透光状态,整个液晶快门狭缝光栅为透光状态,可用于二维显示。当第一光栅基板10和第二光栅基板20上的宽透明导电条输入不同的电压、第一光栅基板10和第二光栅基板20上的窄透明导电条输入相同的电压时,宽透明导电条对应位置的液晶发生偏转,显示为黑色,窄透明导电条对应位置的液晶不偏转,为透光状态,整个液晶快门狭缝光栅为透光带和遮光带间隔设置的光栅,形成黑白狭缝光栅,可用于三维显示。Fig. 5 is a working schematic diagram of the liquid crystal shutter slit grating in the prior art. As shown in Figure 5, when the wide transparent conductive strips and the narrow transparent conductive strips on the
实际应用中,由于窄透明导电条的宽度较小,其最大宽度相当于一个亚像素的宽度,因此窄透明导电条的电阻非常大,不仅制作工艺难度大,而且大电阻会产生严重的信号损失,降低了显示品质。虽然可以通过增加窄透明导电条厚度的方法来减小电阻,但这无疑会增加生产成本。In practical applications, since the width of the narrow transparent conductive strip is small, its maximum width is equivalent to the width of a sub-pixel, so the resistance of the narrow transparent conductive strip is very large, not only the manufacturing process is difficult, but also the large resistance will cause serious signal loss , reducing the display quality. Although the resistance can be reduced by increasing the thickness of the narrow transparent conductive strips, this will undoubtedly increase the production cost.
发明内容 Contents of the invention
本发明的目的是提供一种液晶快门狭缝光栅,可有效减小透明导电条的电阻,降低工艺难度,提高显示品质。The purpose of the present invention is to provide a liquid crystal shutter slit grating, which can effectively reduce the resistance of the transparent conductive strip, reduce the difficulty of the process, and improve the display quality.
为了实现上述目的,本发明提供了一种液晶快门狭缝光栅,包括对盒在一起并将液晶夹设其间的第一光栅基板和第二光栅基板,所述第一光栅基板和第二光栅基板上分别包括形成在基板上的光栅层、取向膜和偏光片,所述光栅层由宽度相同的具有一定间隙的透明导电条依次排列组成,所述第一光栅基板上的透明导电条与第二光栅基板上的透明导电条相对设置,且沿着所述透明导电条的垂直方向相对错开;其中,所述第一光栅基板上的第n个透明导电条与第二光栅基板上的第n个透明导电条之间部分重叠,且所述第一光栅基板上的第n个透明导电条与第二光栅基板上的第n+1个透明导电条之间也有部分重叠;当给所述第一光栅基板上的透明导电条依次输入电压:V,-V,V,-V,……,以及给第二光栅基板的透明导电条依次输入电压:-V,V,-V,V,……时,整个液晶快门狭缝光栅为透光带和黑色带间隔设置的光栅;当给所述第一光栅基板上的透明导电条与第二光栅基板上的透明导电条施加相同电压时,整个液晶快门狭缝光栅为透光状态。In order to achieve the above object, the present invention provides a liquid crystal shutter slit grating, comprising a first grating substrate and a second grating substrate that are boxed together and liquid crystal is interposed therebetween, the first grating substrate and the second grating substrate The above includes a grating layer, an alignment film and a polarizer formed on the substrate respectively. The grating layer is composed of transparent conductive strips with the same width and a certain gap arranged in sequence. The transparent conductive strips on the first grating substrate and the second The transparent conductive strips on the grating substrate are oppositely arranged, and are relatively staggered along the vertical direction of the transparent conductive strips; wherein, the nth transparent conductive strip on the first grating substrate and the nth transparent conductive strip on the second grating substrate The transparent conductive strips partially overlap, and there is also a partial overlap between the nth transparent conductive strip on the first grating substrate and the n+1th transparent conductive strip on the second grating substrate; when the first The transparent conductive strips on the grating substrate sequentially input voltages: V, -V, V, -V, ..., and the transparent conductive strips on the second grating substrate sequentially input voltages: -V, V, -V, V, ... , the entire liquid crystal shutter slit grating is a grating with light-transmitting bands and black bands spaced apart; when the same voltage is applied to the transparent conductive strips on the first grating substrate and the transparent conductive strips on the second grating substrate, the entire liquid crystal The shutter slit grating is in a light-transmitting state.
所述第一光栅基板上取向膜的取向方向与第二光栅基板上取向膜的取向方向相互垂直。所述第一光栅基板上偏光片的偏光方向与第二光栅基板上偏光片的偏光方向相互垂直。所述透明导电条可以为氧化铟锡、氧化铟锌或氧化铝锌,也可以为其它透明度较高的导电材料。The alignment direction of the alignment film on the first grating substrate is perpendicular to the alignment direction of the alignment film on the second grating substrate. The polarization direction of the polarizer on the first grating substrate is perpendicular to the polarization direction of the polarizer on the second grating substrate. The transparent conductive strips may be indium tin oxide, indium zinc oxide or aluminum zinc oxide, or other conductive materials with high transparency.
本发明提供了一种全新结构的液晶快门狭缝光栅,采用透明导电条宽度相同、两个光栅基板上透明导电条错位的结构,可以实现二维与三维的显示切换。与现有技术相比,由于本发明透明导电条的宽度较宽,不仅大大降低了制作工艺难度,而且降低了透明导电条的电阻,提高了产品品质。The invention provides a liquid crystal shutter slit grating with a new structure, which adopts a structure in which the transparent conductive strips have the same width and the transparent conductive strips on two grating substrates are dislocated, so that two-dimensional and three-dimensional display switching can be realized. Compared with the prior art, since the width of the transparent conductive strip of the present invention is wider, not only the manufacturing process difficulty is greatly reduced, but also the resistance of the transparent conductive strip is reduced, and the product quality is improved.
附图说明 Description of drawings
图1为本发明液晶快门狭缝光栅第一实施例的结构示意图;Fig. 1 is the structure diagram of the first embodiment of the liquid crystal shutter slit grating of the present invention;
图2为本发明液晶快门狭缝光栅第一实施例的工作示意图;Fig. 2 is the working schematic diagram of the first embodiment of the liquid crystal shutter slit grating of the present invention;
图3为本发明液晶快门狭缝光栅第二实施例的结构示意图;3 is a schematic structural view of the second embodiment of the liquid crystal shutter slit grating of the present invention;
图4为现有技术液晶快门狭缝光栅的结构示意图;FIG. 4 is a schematic structural diagram of a liquid crystal shutter slit grating in the prior art;
图5为现有技术液晶快门狭缝光栅的工作示意图。Fig. 5 is a working schematic diagram of the liquid crystal shutter slit grating in the prior art.
附图标记说明:Explanation of reference signs:
1—基板; 2—光栅层; 3—取向膜;1—substrate; 2—grating layer; 3—orientation film;
4—偏光片; 5—透明导电条; 6—第一透明导电条组;4—polarizer; 5—transparent conductive strip; 6—first transparent conductive strip group;
7—第二透明导电条组; 8—绝缘层; 10—第一光栅基板;7—the second transparent conductive strip group; 8—insulating layer; 10—the first grating substrate;
20—第二光栅基板; 30—液晶。20—second grating substrate; 30—liquid crystal.
具体实施方式 Detailed ways
下面通过附图和实施例,对本发明的技术方案做进一步的详细描述。The technical solutions of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments.
图1为本发明液晶快门狭缝光栅第一实施例的结构示意图。如图1所示,本实施例液晶快门狭缝光栅包括对盒在一起并将液晶30夹设其间的第一光栅基板10和第二光栅基板20,每个光栅基板包括基板1、光栅层2、取向膜3和偏光片4,第一光栅基板10上的光栅层2与第二光栅基板20上的光栅层2相对错开。具体地,光栅层2形成在基板1上,由宽度相同且依次排列的透明导电条5组成,相邻的透明导电条5相互绝缘,即相邻的透明导电条5之间设置有较小的间隙,第一光栅基板10上的透明导电条5与第二光栅基板20上的透明导电条5相互平行且相对设置,但沿着透明导电条5的垂直方向,两个光栅基板上的透明导电条相对错开一设定距离b。取向膜3形成在光栅层2上,用于液晶取向,两个光栅基板上取向膜的取向方向相互垂直。偏光片4设置在每个基板1形成有光栅层的另一侧表面上,两个光栅基板上偏光片4的偏光方向相互垂直。实际使用中,距离b可以是一个亚像素的宽度左右,相邻透明导电条之间间隙在保证绝缘的前提下越小越好。FIG. 1 is a schematic structural diagram of a first embodiment of a liquid crystal shutter slit grating according to the present invention. As shown in FIG. 1 , the liquid crystal shutter slit grating of this embodiment includes a
下面以制备栅距为a+b、开口宽度为b的液晶快门狭缝光栅的过程进一步说明本实施例的技术方案。The technical solution of this embodiment will be further described below with the process of preparing a liquid crystal shutter slit grating with a grating pitch of a+b and an opening width of b.
首先分别制备第一光栅基板和第二光栅基板。对于每个光栅基板,采用磁控溅射或热蒸发的方法,在基板(如玻璃基板或石英基板)上沉积一层透明导电薄膜,透明导电薄膜可以采用氧化铟锡(I TO)、氧化铟锌(I ZO)或氧化铝锌等材料,也可以采用其它透明度较高的导电材料。采用普通掩模板通过构图工艺形成光栅层图形,光栅层由宽度为a+b且依次排列的透明导电条组成,相邻的透明导电条之间设置有较小的间隙,以保证相邻的透明导电条之间绝缘。此外,对于第一光栅基板和第二光栅基板,两个光栅基板上透明导电条的位置具有一设定距离b的错位,即如果第一光栅基板上第n个透明导电条的左侧边缘与基板的左侧边缘的距离=L的话,那么第二光栅基板上第n个透明导电条的左侧边缘与基板的左侧边缘的距离=L+b或L-b。前述所称的构图工艺包括光刻胶涂敷、掩模、曝光、刻蚀和光刻胶剥离等工艺,已为本领域技术人员所熟知。之后在完成光栅层的基板上涂敷一层取向膜,并进行摩擦取向。随后在已制备光栅层的基板的另一侧表面上贴附偏光片。Firstly, the first grating substrate and the second grating substrate are respectively prepared. For each grating substrate, a layer of transparent conductive film is deposited on the substrate (such as glass substrate or quartz substrate) by magnetron sputtering or thermal evaporation. The transparent conductive film can be indium tin oxide (ITO), indium oxide Materials such as zinc (I ZO) or aluminum zinc oxide can also be used with other conductive materials with high transparency. A common mask is used to form a grating layer pattern through a patterning process. The grating layer is composed of transparent conductive strips with a width of a+b arranged in sequence. There is a small gap between adjacent transparent conductive strips to ensure adjacent transparent conductive strips. Insulation between conductive strips. In addition, for the first grating substrate and the second grating substrate, the positions of the transparent conductive strips on the two grating substrates have a misalignment of a set distance b, that is, if the left edge of the nth transparent conductive strip on the first grating substrate and If the distance from the left edge of the substrate = L, then the distance from the left edge of the nth transparent conductive strip on the second grating substrate to the left edge of the substrate = L+b or L-b. The aforementioned patterning process includes processes such as photoresist coating, masking, exposure, etching, and photoresist stripping, which are well known to those skilled in the art. Afterwards, a layer of alignment film is coated on the substrate on which the grating layer is completed, and a rubbing alignment is performed. Then attach a polarizer on the other surface of the substrate on which the grating layer has been prepared.
然后,将分别制备完成的第一光栅基板与第二光栅基板对盒,滴入适量的液晶(如TN型液晶),并通过封框胶周边密封,完成第一光栅基板和第二光栅基板的对盒封装。对盒封装中,第一光栅基板上的透明导电条和第二光栅基板上的透明导电条相互平行且相对设置,但沿着透明导电条的垂直方向,第一光栅基板与第二光栅基板上的透明导电条相对错开一设定距离b,即第一光栅基板上第n个透明导电条的左侧边缘与第二光栅基板上第n个透明导电条的左侧边缘之间的距离=b。此外,两个光栅基板上取向膜的取向方向相互垂直,偏光片的偏光方向相互垂直。Then, put the prepared first grating substrate and the second grating substrate into the box, drop an appropriate amount of liquid crystal (such as TN type liquid crystal), and seal the periphery of the first grating substrate and the second grating substrate. Packaged in a box. In box-to-box packaging, the transparent conductive strips on the first grating substrate and the transparent conductive strips on the second grating substrate are parallel and opposite to each other, but along the vertical direction of the transparent conductive strips, the first grating substrate and the second grating substrate The transparent conductive strips are relatively staggered by a set distance b, that is, the distance between the left edge of the nth transparent conductive strip on the first grating substrate and the left edge of the nth transparent conductive strip on the second grating substrate = b . In addition, the alignment directions of the alignment films on the two grating substrates are perpendicular to each other, and the polarization directions of the polarizers are perpendicular to each other.
图2为本发明液晶快门狭缝光栅第一实施例的工作示意图。如图2所示,本实施例液晶快门狭缝光栅的结构特点是:第一光栅基板上的第n个透明导电条与第二光栅基板的第n个透明导电条二者之间重叠区域的宽度为a,第一光栅基板上的第n个透明导电条与第二光栅基板上的第n+1个透明导电条二者之间重叠区域的宽度为b。假定液晶的饱和电压为2V,在第一光栅基板10的数个透明导电条5上依次输入如下电压:V,-V,V,-V,V,-V,……,在第二光栅基板20的数个透明导电条5上依次输入如下电压:-V,V,-V,V,-V,V,......,则对于第一光栅基板10上第n个透明导电条与第二光栅基板20上第n个透明导电条的重叠区域,由于一个透明导电条的电压为V,另一个透明导电条的电压为-v,则其间液晶在2V的电压下发生偏转,使该重叠区域显示为黑色条纹;对于第一光栅基板10上第n个透明导电条与第二光栅基板20上第n+1个透明导电条的重叠区域,由于两个透明导电条的电压均为V,则其间液晶不发生偏转,使该重叠区域显示为透光。以此类推,就使本实施例液晶快门狭缝光栅形成栅距为a+b、黑条纹宽度为a、开口宽度为b的狭缝光栅结构。Fig. 2 is a working diagram of the first embodiment of the liquid crystal shutter slit grating of the present invention. As shown in Figure 2, the structural feature of the liquid crystal shutter slit grating in this embodiment is: the overlapping area between the nth transparent conductive strip on the first grating substrate and the nth transparent conductive strip on the second grating substrate The width is a, and the width of the overlapping area between the nth transparent conductive strip on the first grating substrate and the n+1th transparent conductive strip on the second grating substrate is b. Assuming that the saturation voltage of the liquid crystal is 2V, the following voltages are sequentially input on several transparent
实际使用时,将本实施例液晶快门狭缝光栅设置在液晶显示面板的前面。当需要进行三维显示时,按照前述方式向第一光栅基板和第二光栅基板上的透明导电条输入电压,整个液晶快门狭缝光栅为透光带和黑色带间隔设置的光栅,黑白狭缝光栅产生用于三维显示的立体效果。当需要进行二维显示时,向第一光栅基板和第二光栅基板上的透明导电条输入相同的电压(如0V),整个液晶快门狭缝光栅为透光状态,可用于二维显示。狭缝光栅结构中栅距、黑条纹宽度和开口宽度可以根据实际需要进行设置。In actual use, the liquid crystal shutter slit grating of this embodiment is arranged in front of the liquid crystal display panel. When three-dimensional display is required, input voltage to the transparent conductive strips on the first grating substrate and the second grating substrate according to the aforementioned method, and the entire liquid crystal shutter slit grating is a grating with light-transmitting bands and black bands arranged at intervals, black and white slit gratings Produces a stereoscopic effect for three-dimensional display. When two-dimensional display is required, the same voltage (such as 0V) is input to the transparent conductive strips on the first grating substrate and the second grating substrate, and the entire liquid crystal shutter slit grating is in a light-transmitting state and can be used for two-dimensional display. The grating pitch, black stripe width and opening width in the slit grating structure can be set according to actual needs.
从上述技术方案可以看出,本实施例采用透明导电条宽度相同、两个光栅基板上透明导电条错位的结构,可以实现二维与三维的显示切换。与现有技术相比,由于本实施例透明导电条的宽度较宽,不仅大大降低了制作工艺难度,而且降低了透明导电条的电阻,提高了产品品质。It can be seen from the above technical solution that this embodiment adopts a structure in which the width of the transparent conductive strips is the same and the transparent conductive strips on the two grating substrates are dislocated, so that two-dimensional and three-dimensional display switching can be realized. Compared with the prior art, since the width of the transparent conductive strip in this embodiment is wider, not only the manufacturing process difficulty is greatly reduced, but also the resistance of the transparent conductive strip is reduced, and the product quality is improved.
图3为本发明液晶快门狭缝光栅第二实施例的结构示意图。如图3所示,本实施例液晶快门狭缝光栅是前述第一实施例的一种结构变形,主体结构与前述第一实施例基本相同,所不同的是,光栅层包括第一透明导电条组6、第二透明导电条组7和绝缘层8,每个透明导电条组包括依次排列的数个透明导电条,第一透明导电条组6中的每个透明导电条位于第二透明导电条组7中相邻的两个透明导电条之间,或第二透明导电条组7中的每个透明导电条位于第一透明导电条组6中相邻的两个透明导电条之间,使相邻的透明导电条位于不同结构层中,实现相邻透明导电条之间的绝缘。本实施例液晶快门狭缝光栅的制备过程也与前述第一实施例基本相同,所不同的是形成光栅层图形的过程。本实施例形成光栅层图形的过程为:首先采用磁控溅射或热蒸发的方法,在基板上沉积一层透明导电薄膜,采用普通掩模板通过构图工艺形成第一透明导电条组6,第一透明导电条组6包括数个依次排列的透明导电条,相邻的透明导电条之间的距离大于或等于透明导电条的宽度。之后,采用旋涂或其他方法在完成前述流程的基板上涂敷一层绝缘层8。随后,采用磁控溅射或热蒸发的方法,在完成前述流程的基板上沉积另一层透明导电薄膜,采用普通掩模板通过构图工艺形成第二透明导电条组7,第二透明导电条组7包括数个依次排列的透明导电条,且第二透明导电条组7中每个透明导电条位于第一透明导电条组6中相邻的两个透明导电条之间。本实施例的优点是可以保证相邻两个透明导电条之间的绝缘,并最大限度地减小相邻两个透明导电条之间的间隙。本实施例液晶快门狭缝光栅中取向膜、偏光片以及工作原理与前述第一实施例相同,不再赘述。FIG. 3 is a schematic structural diagram of a second embodiment of a liquid crystal shutter slit grating according to the present invention. As shown in Figure 3, the liquid crystal shutter slit grating of this embodiment is a structural deformation of the aforementioned first embodiment, the main structure is basically the same as that of the aforementioned first embodiment, the difference is that the grating layer includes a first transparent
最后应说明的是:以上实施例仅用以说明本发明的技术方案而非限制,尽管参照较佳实施例对本发明进行了详细说明,本领域的普通技术人员应当理解,可以对本发明的技术方案进行修改或者等同替换,而不脱离本发明技术方案的精神和范围。Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present invention without limitation, although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present invention can be Modifications or equivalent replacements can be made without departing from the spirit and scope of the technical solutions of the present invention.
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