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CN102054712A - Method for controlling surface roughness of circuit board - Google Patents

Method for controlling surface roughness of circuit board Download PDF

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CN102054712A
CN102054712A CN 201010179210 CN201010179210A CN102054712A CN 102054712 A CN102054712 A CN 102054712A CN 201010179210 CN201010179210 CN 201010179210 CN 201010179210 A CN201010179210 A CN 201010179210A CN 102054712 A CN102054712 A CN 102054712A
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gold
plating
copper
roughness
surface roughness
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苏新虹
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Peking University Founder Group Co Ltd
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Peking University Founder Group Co Ltd
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Abstract

本发明公开了一种控制线路板表面粗糙度的方法,现有线路板在进行第二次电镀操作时,由于目前电镀一般采取直接镀铜、镀金的操作,这样电镀后由于金面或者铜面比较光滑,从而导致线路板表面粗糙度不够,常常出现引线键合能力差的问题,本发明通过如下操作:在对线路板进行电镀时,采用如下步骤:进行镀铜的操作;进行镀镍的操作;进行镀金的操作。可以使金面的粗糙度增大,从而金线的键合能力增强,同时也解决了由此产生的外观缺陷的问题。

Figure 201010179210

The invention discloses a method for controlling the surface roughness of a circuit board. When the existing circuit board is subjected to the second electroplating operation, since the current electroplating generally adopts the operation of direct copper plating and gold plating, after electroplating, the gold surface or copper surface relatively smooth, resulting in insufficient surface roughness of the circuit board, and the problem of poor wire bonding ability often occurs. The present invention operates as follows: when the circuit board is electroplated, the following steps are adopted: the operation of copper plating; the process of nickel plating To operate; to perform the operation of gilding. The roughness of the gold surface can be increased, thereby enhancing the bonding ability of the gold wire, and at the same time, the problem of appearance defects caused by it can be solved.

Figure 201010179210

Description

一种控制线路板表面粗糙度的方法 A method for controlling the surface roughness of circuit board

技术领域technical field

本发明属于本发明涉及基板生产领域,特别是一种控制线路板表面粗糙度的方法。The invention belongs to the field of substrate production, in particular to a method for controlling the surface roughness of a circuit board.

背景技术Background technique

在基板生产过程中,特别是后工序需要进行芯片级封装的引线键合的焊盘操作时,需要基板表面保持一定的粗糙度,以保障较强的引线键合能力。During the production process of the substrate, especially when the pad operation of the wire bonding of the chip-scale package is required in the post-process, it is necessary to maintain a certain roughness on the surface of the substrate to ensure a strong wire bonding capability.

目前,比如在TAPP(超薄芯片级封装基板)的制作过程中,基板在进行第二次电镀操作时,由于目前电镀一般采取直接镀铜、镀金的操作,这样电镀后由于铜面或者金面比较光滑,从而导致基板表面粗糙度不够,常常出现引线键合能力差的问题。很难达到客户的要求,同时由此产生的外观缺陷也比较明显,现有技术中还没有提供很好的解决这些问题的方法。At present, for example, in the production process of TAPP (ultra-thin chip level package substrate), when the substrate is subjected to the second electroplating operation, since the current electroplating generally adopts direct copper plating and gold plating operations, the copper surface or gold surface after electroplating is usually Relatively smooth, resulting in insufficient surface roughness of the substrate, often resulting in poor wire bonding capabilities. It is difficult to meet the customer's requirements, and the resulting appearance defects are also relatively obvious, and the prior art does not provide a good solution to these problems.

发明内容Contents of the invention

为了解决现有技术存在的基板表面粗糙度不够,常常出现引线键合能力差的问题,本发明提供一种控制线路板表面粗糙度的方法。In order to solve the problems in the prior art that the surface roughness of the substrate is not enough and the ability of wire bonding is often poor, the invention provides a method for controlling the surface roughness of the circuit board.

本发明的方法具体为:The method of the present invention is specifically:

在对基板进行电镀时,采用如下步骤:When electroplating the substrate, the following steps are used:

进行镀铜的操作;Copper plating operation;

进行镀镍的操作;carry out nickel plating operations;

进行镀金的操作。Perform gold-plating operations.

更优的,所述铜为光亮铜。More preferably, the copper is bright copper.

更优的,镀光亮铜之后还包括镀哑铜的操作。More preferably, after bright copper plating, the operation of dumb copper plating is also included.

更优的,所述哑铜电镀后的厚度控制在9-12um之间。More preferably, the thickness of the dumb copper after electroplating is controlled between 9-12um.

更优的,进行镀金的操作具体为:More preferably, the operation of gold plating is specifically as follows:

首先进行镀闪金的操作;First of all, the operation of flash gold plating is carried out;

再进行镀厚金的操作。Then carry out the operation of thick gold plating.

更优的,所述镀闪金的操作为:直接在镍层上镀闪金,所述闪金的厚度小于0.2um。More preferably, the gold flash plating operation is: directly plating gold flash on the nickel layer, and the thickness of the flash gold is less than 0.2um.

更优的,所述镍电镀后的镍层厚度控制在5-9um之间。More preferably, the thickness of the nickel layer after nickel electroplating is controlled between 5-9um.

通过本发明所述的方法,可以使金面的粗糙度增大,从而金线的键合能力增强,同时也解决了由此产生的外观缺陷的问题。Through the method of the present invention, the roughness of the gold surface can be increased, thereby enhancing the bonding ability of the gold wire, and at the same time, the problem of appearance defects generated thereby can be solved.

附图说明Description of drawings

图1是本发明实施方法流程图;Fig. 1 is a flowchart of the implementation method of the present invention;

图2是哑铜厚度变化对基板表面粗糙度的影响实验图;Figure 2 is an experimental diagram of the influence of the change of the thickness of the dumb copper on the surface roughness of the substrate;

图3是镍铜厚度变化对基板表面粗糙度的影响实验图。Fig. 3 is an experimental diagram of the influence of nickel-copper thickness variation on the surface roughness of the substrate.

具体实施方式Detailed ways

下面结合附图对本发明的具体实施方式进行阐述。Specific embodiments of the present invention will be described below in conjunction with the accompanying drawings.

基板在生产完成后会进行后续的操作,其中之一就是需要进行引线键合,引线键合能力是否达标需要将基板到引线键合设备上验证,主要操作是在金焊盘上打上金线,用设备专用的拉线钩通过不同的力度去拉打在焊盘上的金线,当用客户要求的力度去拉而金面不剥离,表示键合能力达标。如果基板表面粗糙度不够,则在键合过程中往往键合能力比较差。因此本发明的目的就是在第二次电镀时对电镀流程进行优化,可以控制基板表面的粗糙度,解决引线键合能力差的问题,使引线键合能力达到不同客户的要求。After the production of the substrate is completed, follow-up operations will be carried out, one of which is the need for wire bonding. Whether the wire bonding capability meets the standard needs to be verified by the substrate on the wire bonding equipment. The main operation is to put gold wires on the gold pads. Pull the gold wire on the pad with different strengths using the special pull hook for the equipment. When the strength required by the customer is used to pull the gold surface without peeling off, it means that the bonding ability is up to standard. If the surface roughness of the substrate is not enough, the bonding ability is often poor during the bonding process. Therefore, the purpose of the present invention is to optimize the electroplating process during the second electroplating, which can control the roughness of the substrate surface, solve the problem of poor wire bonding ability, and make the wire bonding ability meet the requirements of different customers.

实施例1:Example 1:

为了解决基板表面粗糙度差的问题,在第二次电镀时采用如下电镀顺序:In order to solve the problem of poor surface roughness of the substrate, the following plating sequence is used in the second plating:

首先进行镀铜的操作;Copper plating is performed first;

其次进行镀镍的操作;Then carry out the operation of nickel plating;

最后进行镀金的操作。Finally, the gold plating operation is carried out.

在进行镀镍的操作时保持镍层厚度5-9um,有利于粗糙度控制在预想范围之内,特别是厚度为6-8um的镍层,对粗糙度的反映比较明显,因此可以基本解决表面粗糙度差的问题。Keeping the thickness of the nickel layer at 5-9um during the nickel plating operation is conducive to controlling the roughness within the expected range, especially the nickel layer with a thickness of 6-8um has a more obvious reflection on the roughness, so it can basically solve the surface problem. The problem of poor roughness.

实施例2:Example 2:

为了更好的解决基板表面粗糙度差的问题,本实施例可以采用如下电镀方法:In order to better solve the problem of poor surface roughness of the substrate, the following electroplating method can be used in this embodiment:

进行镀铜的操作;Copper plating operation;

进行镀镍的操作;carry out nickel plating operations;

进行镀闪金的操作;Carry out flash gold plating operations;

进行镀厚金的操作。Thick gold plating is performed.

此处电镀金由闪金和厚金来完成的,闪金是直接在镍层上镀金,因为闪金与镍面的结合力要好,但闪金很薄,一般小于0.2um,为了让金面的键合能力好,此处通过镀厚金来实现。The electroplating here is done by flash gold and thick gold. The flash gold is directly plated on the nickel layer, because the bonding force between the flash gold and the nickel surface is better, but the flash gold is very thin, generally less than 0.2um. In order to make the gold surface The bonding ability is good, which is achieved here by thick gold plating.

在进行上述电镀时按照下表的参数进行电镀。When performing the above electroplating, perform electroplating according to the parameters in the table below.

Figure GSA00000111724600031
Figure GSA00000111724600031

通过上面的电镀流程,特别是分别进行闪金和厚金的电镀之后,可以使金面的粗糙度有效得到改善,也能解决金面粗糙度的问题。Through the above electroplating process, especially after flash gold and thick gold electroplating, the roughness of the gold surface can be effectively improved, and the problem of the roughness of the gold surface can also be solved.

实施例3:Example 3:

为了更好的解决基板表面粗糙度差的问题,如图1所示,在第二次电镀时采用如下电镀顺序:In order to better solve the problem of poor surface roughness of the substrate, as shown in Figure 1, the following plating sequence is used in the second plating:

进行镀光亮铜的操作;Perform bright copper plating operations;

进行镀哑铜的操作;Perform dumb copper plating operation;

进行镀镍的操作;carry out nickel plating operations;

进行镀闪金的操作;Carry out flash gold plating operations;

进行镀厚金的操作。Thick gold plating is performed.

光亮铜与哑铜最大的区别是电镀后铜面的外观及粗糙度,一般光亮铜的表面比较光滑、平整,而哑铜的表面比较粗糙,凹凹坑坑较多,更有利于粗糙度的控制调整。The biggest difference between bright copper and dumb copper is the appearance and roughness of the copper surface after electroplating. Generally, the surface of bright copper is smoother and flatter, while the surface of dumb copper is rougher, with more pits and pits, which is more conducive to the control of roughness. Adjustment.

在进行电镀时按照下表的参数进行电镀。When electroplating, perform electroplating according to the parameters in the table below.

Figure GSA00000111724600041
Figure GSA00000111724600041

通过上面的电镀流程,增加了电镀哑铜的操作,为了控制金面粗糙度的范围,我们使用了通过控制哑铜厚度的方法来控制金面粗糙度。Through the above electroplating process, the operation of electroplating dumb copper is added. In order to control the range of the roughness of the gold surface, we use the method of controlling the thickness of the dumb copper to control the roughness of the gold surface.

其中的哑铜层是TAPP板具有粗糙性能的主要来源,镍层对哑铜层有一定的整平效果,而金层则是对粗糙度的直观表现。金面的粗糙度对引线键合性能的好坏具有极其重要的影响。The dumb copper layer is the main source of the roughness of the TAPP board, the nickel layer has a certain leveling effect on the dumb copper layer, and the gold layer is an intuitive performance of the roughness. The roughness of the gold surface has an extremely important influence on the quality of the wire bonding performance.

通过增镀哑铜层后,可使金面的粗糙度增大。当金面的粗糙度值在

Figure GSA00000111724600042
的范围时,金线的键合能力最好,并且能使TAPP产品较好通过AFI(自动光学检测)进行终检。After the dumb copper layer is added, the roughness of the gold surface can be increased. When the roughness value of the gold surface is
Figure GSA00000111724600042
When the range of the gold wire is the best, the bonding ability of the gold wire is the best, and it can make the TAPP products pass the final inspection of AFI (automatic optical inspection) better.

本发明中新使用的哑铜可以采用市面上常见的乐思化学所产的LP-1哑铜光亮剂所配置的槽液,其镀层具有良好的粗化铜表面的效果。The dumb copper newly used in the present invention can be prepared by using the bath solution prepared by the LP-1 dumb copper brightener produced by Schleich Chemical, which is common on the market, and its coating has a good effect of roughening the copper surface.

金面的粗糙度测量使用台阶测试仪“Alpha step IQ surface profiler”进行测量。The roughness of the gold surface is measured using a step tester "Alpha step IQ surface profiler".

经过一系列DOE实验,我们发现哑铜厚度控制在9-12um时,能使粗糙度基本维持在

Figure GSA00000111724600051
的范围内。实验效果如图1所示。After a series of DOE experiments, we found that when the thickness of dumb copper is controlled at 9-12um, the roughness can be basically maintained at
Figure GSA00000111724600051
In the range. The experimental results are shown in Figure 1.

另外,经过实验也发现镍层的厚度变化也对粗糙度有一定的贡献。镍层厚度5-9um时有利于粗糙度控制在预想范围之内,特别是厚度为6-8um的镍层,对粗糙度的反映比较明显。镍层的增厚,有助于掩盖哑铜所产生的粗糙度,使反映在金面上的粗糙度降低。实验效果如图2所示。In addition, it is also found through experiments that the thickness variation of the nickel layer also has a certain contribution to the roughness. When the thickness of the nickel layer is 5-9um, it is beneficial to control the roughness within the expected range, especially for the nickel layer with a thickness of 6-8um, the reflection of the roughness is more obvious. The thickening of the nickel layer helps to cover up the roughness produced by the dumb copper and reduces the roughness reflected on the gold surface. The experimental results are shown in Figure 2.

通过本发明的上述方法,可以使金面的粗糙度增大,从而金线的键合能力增强,同时也解决了由此产生的外观缺陷的问题。Through the above-mentioned method of the present invention, the roughness of the gold surface can be increased, thereby enhancing the bonding ability of the gold wire, and at the same time, the problem of appearance defects generated thereby can be solved.

显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and equivalent technologies thereof, the present invention also intends to include these modifications and variations.

Claims (7)

1.一种控制线路板表面粗糙度的方法,其特征在于,在对基板进行电镀时,采用如下步骤:1. A method for controlling the surface roughness of a circuit board, characterized in that, when the substrate is electroplated, the steps are as follows: 进行镀铜的操作;Copper plating operation; 进行镀镍的操作;carry out nickel plating operations; 进行镀金的操作。Perform gold-plating operations. 2.如权利要求1所述的控制基板表面粗糙度的方法,其特征在于:所述铜为光亮铜。2. The method for controlling the surface roughness of a substrate according to claim 1, wherein the copper is bright copper. 3.如权利要求2所述的控制基板表面粗糙度的方法,其特征在于:镀光亮铜之后还包括镀哑铜的操作。3. The method for controlling the surface roughness of a substrate according to claim 2, characterized in that: after bright copper plating, the operation of dull copper plating is also included. 4.如权利要求3所述的控制基板表面粗糙度的方法,其特征在于:所述哑铜电镀后的厚度控制在9-12um之间。4. The method for controlling the surface roughness of the substrate according to claim 3, characterized in that: the thickness of the dumb copper after electroplating is controlled between 9-12um. 5.如权利要求1-4所述的控制基板表面粗糙度的方法,其特征在于:进行镀金的操作具体为:5. The method for controlling the surface roughness of a substrate as claimed in claim 1-4, wherein the operation of performing gold plating is specifically: 首先进行镀闪金的操作;First of all, the operation of flash gold plating is carried out; 再进行镀厚金的操作。Then carry out the operation of thick gold plating. 6.如权利要求5所述的控制基板表面粗糙度的方法,其特征在于:所述镀闪金的操作为:直接在镍层上镀闪金,所述闪金的厚度小于0.2um。6 . The method for controlling the surface roughness of a substrate according to claim 5 , wherein the gold flash plating operation is: directly plating gold flash on the nickel layer, and the thickness of the gold flash is less than 0.2 um. 7 . 7.如权利要求6所述的控制基板表面粗糙度的方法,其特征在于:所述镍电镀后的镍层厚度控制在5-9um之间。7. The method for controlling the surface roughness of the substrate according to claim 6, characterized in that: the thickness of the nickel layer after nickel electroplating is controlled between 5-9 um.
CN 201010179210 2009-11-05 2010-05-21 Method for controlling surface roughness of circuit board Pending CN102054712A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104704929A (en) * 2013-07-11 2015-06-10 深圳崇达多层线路板有限公司 Printed circuit board preparation method and printed circuit board
CN106567130A (en) * 2015-10-10 2017-04-19 盛美半导体设备(上海)有限公司 Method for improving roughness of wafers
CN110724982A (en) * 2019-03-18 2020-01-24 杭州埃迷丽珠宝有限公司 Gold-fog electroplating process

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1182660A (en) * 1996-11-20 1998-05-27 揖斐电株式会社 Solder resist composition and printed circuit board
JP2001185836A (en) * 1999-12-24 2001-07-06 Hitachi Ltd Wiring board, method and device for producing wiring board
CN101469420A (en) * 2007-04-16 2009-07-01 上村工业株式会社 Electroless gold-plating method and electronic component

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1182660A (en) * 1996-11-20 1998-05-27 揖斐电株式会社 Solder resist composition and printed circuit board
JP2001185836A (en) * 1999-12-24 2001-07-06 Hitachi Ltd Wiring board, method and device for producing wiring board
CN101469420A (en) * 2007-04-16 2009-07-01 上村工业株式会社 Electroless gold-plating method and electronic component

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104704929A (en) * 2013-07-11 2015-06-10 深圳崇达多层线路板有限公司 Printed circuit board preparation method and printed circuit board
CN104704929B (en) * 2013-07-11 2017-06-27 深圳崇达多层线路板有限公司 A kind of printed circuit board preparation method and printed circuit board
CN106567130A (en) * 2015-10-10 2017-04-19 盛美半导体设备(上海)有限公司 Method for improving roughness of wafers
CN110724982A (en) * 2019-03-18 2020-01-24 杭州埃迷丽珠宝有限公司 Gold-fog electroplating process

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Application publication date: 20110511