CN101487986A - Sensor of photo-etching equipment, its production method and self-calibration method - Google Patents
Sensor of photo-etching equipment, its production method and self-calibration method Download PDFInfo
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- CN101487986A CN101487986A CNA2009100463093A CN200910046309A CN101487986A CN 101487986 A CN101487986 A CN 101487986A CN A2009100463093 A CNA2009100463093 A CN A2009100463093A CN 200910046309 A CN200910046309 A CN 200910046309A CN 101487986 A CN101487986 A CN 101487986A
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Abstract
The invention provides a sensor device applied to a lithography device, a manufacturing method and an automatic correction method thereof. Structures such as a rotary optical module installation hole, a rotary optical module, a rotary adjustment control and signal conditioning substrate installation hole and a rotary adjustment control and signal conditioning substrate are designed, therefore, manufacturing difficulty of the rotary optical module installation hole is reduced while adaptability of the sensor device to accuracy of different partial assembly is improved; in addition, the method for manufacturing the sensor device applied to the lithography device of the invention ensures that the sensor device can be manufactured by adopting conventional semiconductor technology, thus ensuring manufacturing accuracy; the automatic correction method of the rotary optical module is applied in use of the sensor device applied to the lithography device, thus improving structural stability of the device under the working condition of the lithography device and ensuring detection accuracy of the sensor device.
Description
Technical field
The present invention relates to field of lithography, and be particularly related to a kind of sensor device of lithographic equipment, the method of using this sensor device that the space pattern of mask registration figure in the lithographic equipment is surveyed, and the manufacture method of this sensor device and method for self-calibrating.
Background technology
In commercial plant, because the needs of high precision and high production capacity, the sensor device and the control system of distributing a large amount of high-speed real-time measurements, signal sampling, data acquisition, exchanges data and communications etc.The control that these systems need us to adopt that multiple mode realizes that sensor detection, signal sampling control, data acquisition control, exchanges data control are communicated by letter with data transmission etc.Have the device of this demand for control to comprise: integrated circuit is made lithographic equipment, panel display board lithographic equipment, MEMS/MOEMS lithographic equipment, advanced encapsulation lithographic equipment, printed circuit board (PCB) lithographic equipment, printed circuit board (PCB) processing unit (plant) and printing circuit board element mounting device etc.
Lithographic equipment is a kind of required pattern to be applied to device on the workpiece.Normally required pattern is applied to the device on the target part on the workpiece.Lithographic equipment can be used to for example manufacturing of integrated circuit (IC).In this case, mask plate is used to produce the circuit pattern that forms on individual course of IC, and this pattern is passed to the target part of workpiece (as silicon wafer), for example comprises a part, on one or more tube core.Normally, one deck radiation-sensitive materials (resist) that provides on the workpiece comes up to duplicate in proportion required image by being provided.Known lithographic equipment also comprises scanner, and the utilization radiation laser beam scans described pattern along given direction (" scanning " direction), and simultaneously along coming each target part of irradiation with the parallel or antiparallel direction synchronous scanning of this direction workpiece.Also by pattern being stamped on the workpiece and pattern is generated on the workpiece by patterning device.
A plurality of sensor devices that utilization is positioned at workpiece height place evaluate and optimize imaging performance.These sensor devices comprise space pattern sensor device (SIDU, Spatial Image Detecting Unit), the energy sensor device (EDU that is used for the exposing radiation dosage measurement, Energy Detecting Unit) and the integral micro-lens interference sensor device (IMIDU, Integrating Microbeam InterferenceDetecting Unit) that measure to use.
SIDU is a kind of sensor device in measurement space picture position, workpiece height place, and this space pattern forms in mask height place projection indicia patterns.The projective patterns that is positioned at workpiece height place is line image normally, and the wavelength of its live width and exposing radiation is suitable.Measure these mask patterns when SIDU utilize to throw pattern, this projective patterns has the photovoltaic element that is positioned at below it.The data of sensor device are used to measure that mask in addition, also is used to measure the enlargement ratio of the mask that is throwed with respect to the position (three translation freedoms and three rotary freedoms) of base station on the six-freedom degree.Because sensor device can be set with all irradiations the measured pattern position: δ, lens numerical aperture NA, all masks, for example influence of binary mask (binary mask), phase shifting mask PSM etc., therefore little live width is through optimizing.Also use SIDU to come the optical property of survey instrument.The multiple character of projection system is measured in the combination that can use different irradiations to be set in different projective patterns, as pupil shape, spherical aberration, coma, astigmatism and the curvature of field etc.
IMIDU is a kind of interference wavefront measurement system that the lens aberration that reaches high-order is carried out static measurement.IMIDU can realize by the integral measuring system that is used for system initialization and calibration.
In the former said apparatus, what use when the lithography alignment system is DUV (deep ultraviolet) light source, and then this radiation source is that the quasi-molecule laser source of 248nm, 193nm is main with the wavelength, also uses the quasi-molecule laser source of 157nm, 126nm.In addition, use the alignment system of EUV (extreme ultraviolet) impulse radiation source and X ray impulse radiation source in addition.Be that the sensor described in the patent of CN200710046955.0, CN200710173575.3 and CN200810038391.0 is owing to be that the detection pattern plate of modulation usefulness and the element of spectrum and opto-electronic conversion are integrated as application number, therefore, the heat that the element of spectrum and opto-electronic conversion generates in surveying transfer process can cause that the detection pattern plate produces distortion with vertical direction in the horizontal direction, and make they self performance drift, thereby the processing that has influenced sensor detection signal forms error, and then influences the performance of whole sensor.
Because the sensor device of lithographic equipment is the comprehensive superelevation sophisticated sensor device of positional information and optical information, therefore employed material there be the optics and the photo-thermal characteristic of strict requirement, particularly material.Simultaneously, manufacturing accuracy and manufacture difficulty to this sensor device have specific (special) requirements, assembly precision and long-term the use under the stable prerequisite of detection accuracy need do not reduced, reduce manufacture difficulty and cost, therefore, need to adopt the special material fit manufacturing structure and the requirement of assembly structure, realize the assembling superhigh precision of lithographic equipment sensor device, and improve the detection accuracy stability of sensor device under long-term service condition of lithographic equipment.
Summary of the invention
Technical matters solved by the invention is to provide the sensor device of lithographic equipment, the method of using this sensor device that the space pattern of mask registration figure in the lithographic equipment is surveyed, and method and the method for self-calibrating of making this sensor device, regulate measurement with self calibration in the sensor of realizing radiation detection in the lithographic equipment, improve the assembly precision and the stability of this device, thereby improve the performance and the efficient of lithographic equipment.
In order to achieve the above object, the present invention proposes a kind of sensor device of lithographic equipment, place lithographic equipment workpiece altitude datum place, this lithographic equipment has optical projection system, be used for patterned radiation laser beam is projected workpiece target part to form the radiation space pattern, this sensor device is used for the chopped radiation space pattern and surveys the center of this pattern, wherein, described sensor device comprises: the spatial modulation pattern plate, the rotary optical module, control and signal conditioner substrate are regulated in rotation, the front of described spatial modulation pattern plate has transmission modulation pattern and reflection modulation pattern, and the back side has the installation hole that is installed with described rotary optical module and is installed with the installation hole that control and signal conditioner substrate are regulated in described rotation;
Described rotary optical module comprises rotary optical support and photon conversion crystal, and wherein the photon conversion crystal is installed in the through hole of rotary optical support, and rotary optical support circular periphery is distributed with transmission gear;
Described rotation adjusting control and signal conditioner substrate comprise rotating stepper motor, rotational positioner, rotational positioner control circuit and the optical detector array signal modulate circuit of optical detector array, filter plate, belt driving gear, the rotational positioner control circuit is used to control rotational positioner the rotary optical support is rotated the location, and optical detector array signal modulate circuit is used to the optical detector array is carried out signal condition and transmission.
Further, described radiation space pattern, after the modulation of the transmission modulation pattern on the spatial modulation pattern plate, project on the rotary optical module, behind filter plate on photon conversion crystal and rotation adjusting control and the signal conditioner substrate, the optical detector array converts electric signal to, this electric signal is imported into the optical detector array signal modulate circuit plate on rotation adjusting control and the signal conditioner substrate, and wherein filter plate is used to filter not by the DUV of photon conversion crystal transition or EUV laser.
Further, control of described rotary optical module installation hole specific rotation modulation joint and signal conditioner substrate installation hole are dark.
Further, the rotating stepper motor of the belt driving gear in the described sensor device on rotation adjusting control and the signal conditioner substrate, the total quantity of swing pinion are n, 3≤n≤10 wherein, the quantity of rotating stepper motor is 1 to n-1, and rotating stepper motor, swing pinion equidistantly distribute in rotation and regulate the periphery that is used to install the rotary optical rack ventilating hole on control and the signal conditioner substrate.
Further, described rotary optical module installation hole is arranged on the back side of transmission modulation pattern correspondence, makes the radiation space pattern after the modulation corresponding with the photon conversion crystal on the rotary optical module.
Further, described rotary optical module, rotation adjusting control and signal conditioner substrate all use the semiconductor-based end to make.
Further, transmission modulation pattern on the described spatial modulation pattern plate is the transmission-type mark, have the modulating characteristic that is easy to be detected, comprise the combination of the one or more characteristics in unimodal value characteristic, peak feature, valley characteristic, phase propetry, local edge, pattern identification characteristic or the window features.
Further, reflection modulation pattern on the described spatial modulation pattern plate is the reflection-type mark, have the modulating characteristic that is easy to be detected, comprise the combination of the one or more characteristics in the unimodal value characteristic of reflection, reflection multi-peak characteristic, reflection valley characteristic, diffraction phase characteristic, reflective edges characteristic, pattern identification characteristic or the window features.
Further, described spatial modulation pattern plate is by high-transmission rate, low-expansion light-transparent substrate made, there is multilayer dielectric structure in reflection modulation pattern on the described spatial modulation pattern plate, comprises transparency carrier, chrome plating, aluminium coat and transparent coating successively.
Further, described spatial modulation pattern backboard face is provided with magnetic voussoir installation hole, is used to assemble the magnetic voussoir.
Further, described rotational positioner is made of magnetostrictive rod and solenoid.
Further, described magnetostrictive rod and rotary optical support contact portion deposit semiconductor material, this material has and the identical structure of rotary optical support circular periphery gear with the manufacturing of rotary optical support contact portion, and the magnetostrictive rod of rotational positioner has the characteristics with rotary optical support circular periphery gearing mesh.
Further, the transition material of described photon conversion crystal use is by the compound with quantum conversion effet of III family and V group element, II family and IV family element or II family in the periodic table of elements and the element generation of VI family and the potpourri that they form.
In addition, the present invention also provides a kind of manufacture method of lithographic equipment sensor device, this sensor device is placed in workpiece altitude datum place in the lithographic equipment, this lithographic equipment has optical projection system, be used for patterned radiation laser beam is projected workpiece target part to form the radiation space pattern, this sensor device is used to the chopped radiation space pattern and surveys the center of this pattern, sensor device comprises the spatial modulation pattern plate, the rotary optical module, control and signal conditioner substrate are regulated in rotation, the front of spatial modulation pattern plate has transmission modulation pattern and reflection modulation pattern, and the back side has the installation hole that is installed with described rotary optical module and is installed with the installation hole that control and signal conditioner substrate are regulated in described rotation; The rotary optical module comprises rotary optical support and photon conversion crystal; Rotation adjusting control and signal conditioner substrate comprise rotating stepper motor, rotational positioner, rotational positioner control circuit and the optical detector array signal modulate circuit of optical detector array, filter plate, belt driving gear, and this method comprises the steps:
(1) aluminize on the chromium layer that plates in advance in the front of spatial modulation pattern plate, etching reflection modulation pattern aluminizes for once more the front of spatial modulation pattern plate; Make the etching window of transmission modulation pattern then by the photoetching method etching, etch the transmission modulation pattern again;
(2) make rotary optical module installation hole, magnetic voussoir installation hole, rotation adjusting control and signal conditioner substrate installation hole respectively at the back side of spatial modulation pattern plate;
(3) according to the manufacturing tolerance and the assembly precision requirement of rotary optical module installation hole, rotation adjusting control and signal conditioner substrate installation hole, magnetic voussoir installation hole, make the rotary optical support, make rotation adjusting control and signal conditioner substrate and magnetic voussoir;
(4) the photon conversion crystal is packed into rotary optical support is implanted the rotary optical module in the rotary optical module installation hole of spatial modulation pattern backboard face;
(5) will rotate regulate control and signal conditioner substrate implant the rotation of spatial modulation pattern backboard face regulate control and the signal conditioner substrate installation hole in and fix, pack in magnetic voussoir installation hole according to orientation the magnetic voussoir at last and fix.
Correspondingly, the invention provides a kind of method for self-calibrating of lithographic equipment sensor device, this sensor device comprises spatial modulation pattern plate, rotary optical module, rotation adjusting control and signal conditioner substrate, the rotary optical module comprises rotary optical support and photon conversion crystal, wherein the photon conversion crystal is installed in the through hole of rotary optical support, and rotary optical support circular periphery is distributed with transmission gear; Described rotation adjusting control and signal conditioner substrate comprise rotating stepper motor, rotational positioner, rotational positioner control circuit and the optical detector array signal modulate circuit of optical detector array, filter plate, belt driving gear, it is characterized in that this method comprises the steps:
(a) rotational positioner control circuit control rotating stepper motor carries out clockwise direction and the rotation of stepping counterclockwise respectively, and processing is counted in the rotation stepping, to adjust the position of rotation of calibration rotary optical support;
(b) synchronous with the rotation step-by-step counting, signal to the output of optical detector array signal modulate circuit is sampled, obtain the rotation number of steps of the peak signal correspondence of clockwise direction and the output of the rotation of stepping counterclockwise time radiation detector array signal conditioning circuit, from peak signal, select the rotation step-by-step counting of the greater correspondence;
(c) according to the rotation step-by-step counting of selecting in (b) to obtain, calibration rotational positioner control circuit control rotating stepper motor carries out the stepping rotation, makes the rotary optical support rotate to the position of the signal of optical detector array signal modulate circuit output correspondence when maximum.
The present invention makes it compared with prior art owing to adopted above-mentioned technical scheme, has following advantage and good effect:
1. the present invention regulates control and signal conditioner substrate installation hole and rotation and regulates structures such as control and signal conditioner substrate by design rotary optical module installation hole, rotary optical module, rotation, reduced the manufacture difficulty of rotary optical module installation hole, improved the adaptability of sensor device simultaneously for different parts assembly precisions;
2. the invention provides the manufacture method of complete lithographic equipment sensor device, guaranteed that sensor device can use conventional semiconductor technology to make, and has guaranteed manufacturing accuracy.
3. in the sensor device process of using lithographic equipment, pass through to adopt the method for self-calibrating of rotary optical module, improved the structural stability of this device under the lithographic equipment working environment, guaranteed the detection accuracy of this sensor device.
Description of drawings
Fig. 1 is the structural representation of the lithographic equipment alignment system of application preferred embodiment sensor device of the present invention.
Fig. 2 is the decomposition texture synoptic diagram of preferred embodiment sensor device of the present invention.
Fig. 3 is the manufacture method process flow diagram of preferred embodiment sensor device of the present invention.
Fig. 4 is the method for self-calibrating process flow diagram of preferred embodiment sensor device of the present invention.
Embodiment
In order more to understand technology contents of the present invention, especially exemplified by specific embodiment and cooperate appended graphic being described as follows.
The present invention proposes a kind of sensor device of lithographic equipment, the method of using this sensor device that the space pattern of mask registration figure in the lithographic equipment is surveyed, and method and the method for self-calibrating of making this sensor device, regulate measurement with self calibration in the sensor of realizing radiation detection in the lithographic equipment, improve the assembly precision and the stability of this device, thereby improve the performance and the efficient of lithographic equipment.
Please refer to Fig. 1, Fig. 1 is the structural representation of the lithographic equipment alignment system of application preferred embodiment sensor device of the present invention.4 is patterning device among Fig. 1, has composition figure (comprise exposure composition figure and aim at composition figure 5) on it, 9 is by the photoetching workpiece, and composition figure illumination window 2 and control panel 3 thereof are used to form window radiation 1 is transmitted on the aligning composition figure 5, to form the transmission picture; Optical projection system 8 is used for this transmission picture projection is formed aerial image, and surveys this aerial image with work stage alignment mark 11; The sensor device 12 of lithographic equipment is used to detect the radiation information after aerial image passes through 11 transmissions of work stage alignment mark; Patterning device plummer position sensor 7 and work stage position sensor 13 are surveyed the patterning device plummer 6 in the alignment scanning process and the locus of work stage 10 respectively, also synchro measure obtains the radiation information in the sensor device 12, all information acquisitions of detecting in registration signal treating apparatus 14, are carried out registration signal and handled and obtain aligned position.
Please refer to Fig. 2 again, Fig. 2 is the decomposition texture synoptic diagram of preferred embodiment sensor device of the present invention.As shown in Figure 2, this sensor device comprises spatial modulation pattern plate 15, rotary optical module, photon conversion crystal 24, rotation adjusting control and signal conditioner substrate 20, the front of described spatial modulation pattern plate has transmission modulation pattern and reflection modulation pattern, and the back side has the installation hole 19 that is installed with described rotary optical module installation hole 17 and rotation adjusting control and signal conditioner substrate; The rotary optical module comprises rotary optical support 25 and photon conversion crystal 24, and wherein photon conversion crystal 24 is installed in the through hole 28 of rotary optical support, and rotary optical support 25 circular periphery are distributed with transmission gear; Described rotation adjusting control and signal conditioner substrate 20 comprise rotating stepper motor 22, rotational positioner, rotational positioner control circuit 23 and the optical detector array signal modulate circuit 21 of optical detector array 31, filter plate 32, belt driving gear, the rotational positioner control circuit is used to control rotational positioner rotary optical support 25 is rotated the location, rotational positioner is made of magnetostrictive rod 26 and solenoid 27, and optical detector array signal modulate circuit 21 is used to optical detector array 31 is carried out signal condition and transmission.
In the sensor device, described radiation space pattern, after the modulation of the transmission modulation pattern on the spatial modulation pattern plate, project on the rotary optical module, behind filter plate 32 on photon conversion crystal 24 and rotation adjusting control and the signal conditioner substrate 20, optical detector array 31 converts electric signal to, this electric signal is imported into the optical detector array signal modulate circuit plate on rotation adjusting control and the signal conditioner substrate 20, and wherein filter plate 32 is used to filter not by the DUV or the EUV laser of 4 conversions of photon conversion crystal 2.
In the sensor device, the installation hole that control and signal conditioner substrate 20 are regulated in the rotary optical module of described spatial modulation pattern backboard face and rotation comprises: be installed with the installation hole 17 of rotary optical module and be installed with the installation hole 19 that control and signal conditioner substrate are regulated in rotation, wherein rotary optical module installation hole 17 is distributed in rotation adjusting control and the signal conditioner substrate installation hole 19, and control of rotary optical module installation hole 17 specific rotation modulations joint and signal conditioner substrate installation hole 19 are dark.
In the sensor device, the rotating stepper motor of the belt driving gear in the described sensor device on rotation adjusting control and the signal conditioner substrate 20, swing pinion 22 total quantity are n, n=3,4,5,6,7,8,9 or 10, wherein, the quantity of rotating stepper motor is 1 to n-1, rotating stepper motor, swing pinion equidistantly distribute to regulate in rotation and are used to install on control and the signal conditioner substrate near the periphery of rotary optical rack ventilating hole, typically, and n=3.
In the sensor device, described rotary optical module installation hole 17 is arranged on the back side of transmission modulation pattern correspondence, makes the radiation space pattern after the modulation corresponding with the photon conversion crystal on the rotary optical module.
In the sensor device, control is regulated in described rotary optical module, rotation and signal conditioner substrate 20 all uses the semiconductor-based end to make.
In the sensor device, transmission modulation pattern on the described spatial modulation pattern plate 15 is the transmission-type mark, have the modulating characteristic that is easy to be detected, comprise the combination of the one or more characteristics in unimodal value characteristic, peak feature, valley characteristic, phase propetry, local edge, pattern identification characteristic or the window features.
In the sensor device, reflection modulation pattern on the described spatial modulation pattern plate 15 is the reflection-type mark, have the modulating characteristic that is easy to be detected, comprise the combination of the one or more characteristics in the unimodal value characteristic of reflection, reflection multi-peak characteristic, reflection valley characteristic, diffraction phase characteristic, reflective edges characteristic, pattern identification characteristic or the window features.
In the sensor device, described spatial modulation pattern plate 15 is by high-transmission rate, low-expansion light-transparent substrate made, there is multilayer dielectric structure in reflection modulation pattern on the described spatial modulation pattern plate, this reflection modulation pattern is grown on the transparency carrier, what contact with transparency carrier is chrome plating, what cover on chromium coating is aluminium coat, and what cover on aluminium coat is transparent coating.Described spatial modulation pattern backboard face is provided with magnetic voussoir installation hole, is used to assemble magnetic voussoir 18.
In the sensor device, described magnetostrictive rod 26 deposits semiconductor material with rotary optical support contact portion, this material has and the identical structure of rotary optical support 25 circular periphery gears with the 25 contact portion manufacturings of rotary optical support, the magnetostrictive rod 26 of rotational positioner has the characteristics with rotary optical support circular periphery gearing mesh, and the typical material that magnetostrictive rod uses is TbDy-CoFe.
In the sensor device, the transition material that described photon conversion crystal 24 uses is by the compound with quantum conversion effet of III family and V group element, II family and IV family element or II family in the periodic table of elements and the element generation of VI family and the potpourri that they form.
Please refer to Fig. 3 again, Fig. 3 is the manufacture method process flow diagram of preferred embodiment sensor device of the present invention.Please the manufacture method of the sensor device of preferred embodiment of the present invention is described in conjunction with Fig. 2 and Fig. 3.Sensor device is placed in workpiece altitude datum place in the lithographic equipment, this lithographic equipment has optical projection system, be used for patterned radiation laser beam is projected workpiece target part to form the radiation space pattern, this sensor device is used to the chopped radiation space pattern and surveys the center of this pattern, sensor device comprises spatial modulation pattern plate 15, the rotary optical module, control and signal conditioner substrate 20 are regulated in rotation, the front of spatial modulation pattern plate has transmission modulation pattern and reflection modulation pattern, and the back side has the installation hole 19 that is installed with described rotary optical module installation hole 17 and rotation adjusting control and signal conditioner substrate; The rotary optical module comprises rotary optical support 25 and photon conversion crystal 24; Rotation adjusting control and signal conditioner substrate 20 comprise rotating stepper motor 22, rotational positioner (constituting by 26,27), rotational positioner control circuit 23 and the optical detector array signal modulate circuit of optical detector array 31, filter plate 32, belt driving gear, the manufacture method of lithographic equipment sensor device is, comprises the steps:
(S1) aluminize on the chromium layer that plates in advance in the front of spatial modulation pattern plate 15, etching reflection modulation pattern aluminizes for once more the front of spatial modulation pattern plate; Make the etching window of transmission modulation pattern then by the photoetching method etching, etch the transmission modulation pattern again;
(S2) make rotary optical module installation hole 17, magnetic voussoir installation hole 16, rotation adjusting control and signal conditioner substrate installation hole 19 respectively at the back side of spatial modulation pattern plate;
(S3) regulate the manufacturing tolerance and the assembly precision requirement of control and signal conditioner substrate installation hole 19, magnetic voussoir installation hole 16 according to rotary optical module installation hole 17, rotation, make rotary optical support 25, make rotation and regulate control and signal conditioner substrate 20 and magnetic voussoir 18;
(S4) photon conversion crystal 24 is packed into rotary optical support 25 is implanted the rotary optical module in the rotary optical module installation hole 17 at spatial modulation pattern plate 20 back sides;
(S5) will rotate regulate control and signal conditioner substrate 20 implant the rotation of spatial modulation pattern backboard faces regulate control and signal conditioner substrate installation hole 19 in fix, pack in magnetic voussoir installation hole 16 according to orientation magnetic voussoir 18 at last and fix.
Please refer to Fig. 4 again, Fig. 4 is the method for self-calibrating process flow diagram of preferred embodiment sensor device of the present invention.Below in conjunction with Fig. 2 and Fig. 4 the method for self-calibrating of the sensor device of preferred embodiment of the present invention is described.Sensor device is placed in workpiece altitude datum place in the lithographic equipment, this lithographic equipment has optical projection system, be used for patterned radiation laser beam is projected workpiece target part to form the radiation space pattern, this sensor device is used to the chopped radiation space pattern and surveys the center of this pattern, sensor device comprises spatial modulation pattern plate 15, the rotary optical module, control and signal conditioner substrate 20 are regulated in rotation, the front of spatial modulation pattern plate 15 has transmission modulation pattern and reflection modulation pattern, and the back side has the installation hole 19 that is installed with described rotary optical module installation hole 17 and rotation adjusting control and signal conditioner substrate; The rotary optical module comprises rotary optical support 25 and photon conversion crystal 24; Rotation adjusting control and signal conditioner substrate 20 comprise rotating stepper motor 22, rotational positioner (constituting by 26,27), rotational positioner control circuit 23 and optical detector array 31 signal conditioning circuits of optical detector array 31, filter plate 32, belt driving gear, the manufacture method of lithographic equipment sensor device is, comprises the steps:
(a) rotational positioner control circuit 23 control rotating stepper motors 22 carry out clockwise direction and the rotation of stepping counterclockwise respectively, and processing is counted in the rotation stepping, to adjust the position of rotation of calibration rotary optical support 25;
(b) synchronous with the rotation step-by-step counting, signal to the output of optical detector array 31 signal conditioning circuits is sampled, obtain the rotation number of steps of the peak signal correspondence of clockwise direction and the output of the rotation of stepping counterclockwise time radiation detector array 31 signal conditioning circuits, from peak signal, select the rotation step-by-step counting of the greater correspondence;
(c) according to the rotation step-by-step counting of selecting in (b) to obtain, calibration rotational positioner control circuit 23 control rotating stepper motors carry out the stepping rotation, make rotary optical support 25 rotate to the position of the signal of optical detector array 31 signal conditioning circuits output correspondence when maximum.
Though the present invention discloses as above with preferred embodiment, so it is not in order to limit the present invention.The persond having ordinary knowledge in the technical field of the present invention, without departing from the spirit and scope of the present invention, when being used for a variety of modifications and variations.Therefore, protection scope of the present invention is as the criterion when looking claims person of defining.
Claims (15)
1, a kind of sensor device of lithographic equipment, place lithographic equipment workpiece altitude datum place, this lithographic equipment has optical projection system, be used for patterned radiation laser beam is projected workpiece target part to form the radiation space pattern, this sensor device is used for the chopped radiation space pattern and surveys the center of this pattern, it is characterized in that, described sensor device comprises: the spatial modulation pattern plate, the rotary optical module, control and signal conditioner substrate are regulated in rotation, the front of described spatial modulation pattern plate has transmission modulation pattern and reflection modulation pattern, and the back side has the installation hole that is installed with described rotary optical module and is installed with the installation hole that control and signal conditioner substrate are regulated in described rotation;
Described rotary optical module comprises rotary optical support and photon conversion crystal, and wherein the photon conversion crystal is installed in the through hole of rotary optical support, and rotary optical support circular periphery is distributed with transmission gear;
Described rotation adjusting control and signal conditioner substrate comprise rotating stepper motor, rotational positioner, rotational positioner control circuit and the optical detector array signal modulate circuit of optical detector array, filter plate, belt driving gear, the rotational positioner control circuit is used to control rotational positioner the rotary optical support is rotated the location, and optical detector array signal modulate circuit is used to the optical detector array is carried out signal condition and transmission.
2, the sensor device of lithographic equipment according to claim 1, it is characterized in that, described radiation space pattern, after the modulation of the transmission modulation pattern on the spatial modulation pattern plate, project on the rotary optical module, behind filter plate on photon conversion crystal and rotation adjusting control and the signal conditioner substrate, the optical detector array converts electric signal to, this electric signal is imported into the optical detector array signal modulate circuit plate on rotation adjusting control and the signal conditioner substrate, and wherein filter plate is used to filter not by the DUV of photon conversion crystal transition or EUV laser.
3, the sensor device of lithographic equipment according to claim 1 is characterized in that, control of described rotary optical module installation hole specific rotation modulation joint and signal conditioner substrate installation hole are dark.
4, the sensor device of lithographic equipment according to claim 1, it is characterized in that, the rotating stepper motor of the belt driving gear in the described sensor device on rotation adjusting control and the signal conditioner substrate, the total quantity of swing pinion are n, 3≤n≤10 wherein, the quantity of rotating stepper motor is 1 to n-1, and rotating stepper motor, swing pinion equidistantly distribute in rotation and regulate the periphery that is used to install the rotary optical rack ventilating hole on control and the signal conditioner substrate.
5, the sensor device of lithographic equipment according to claim 1, it is characterized in that, described rotary optical module installation hole is arranged on the back side of transmission modulation pattern correspondence, makes the radiation space pattern after the modulation corresponding with the photon conversion crystal on the rotary optical module.
6, the sensor device of lithographic equipment according to claim 1 is characterized in that, control is regulated in described rotary optical module, rotation and signal conditioner substrate all uses the semiconductor-based end to make.
7, the sensor device of lithographic equipment according to claim 1, it is characterized in that, transmission modulation pattern on the described spatial modulation pattern plate is the transmission-type mark, have the modulating characteristic that is easy to be detected, comprise the combination of the one or more characteristics in unimodal value characteristic, peak feature, valley characteristic, phase propetry, local edge, pattern identification characteristic or the window features.
8, the sensor device of lithographic equipment according to claim 1, it is characterized in that, reflection modulation pattern on the described spatial modulation pattern plate is the reflection-type mark, have the modulating characteristic that is easy to be detected, comprise the combination of the one or more characteristics in the unimodal value characteristic of reflection, reflection multi-peak characteristic, reflection valley characteristic, diffraction phase characteristic, reflective edges characteristic, pattern identification characteristic or the window features.
9, the sensor device of lithographic equipment according to claim 1, it is characterized in that, described spatial modulation pattern plate is by high-transmission rate, low-expansion light-transparent substrate made, there is multilayer dielectric structure in reflection modulation pattern on the described spatial modulation pattern plate, comprises transparency carrier, chrome plating, aluminium coat and transparent coating successively.
10, the sensor device of lithographic equipment according to claim 1 is characterized in that, described spatial modulation pattern backboard face is provided with magnetic voussoir installation hole, is used to assemble the magnetic voussoir.
11, the sensor device of lithographic equipment according to claim 1 is characterized in that, described rotational positioner is made of magnetostrictive rod and solenoid.
12, the sensor device of lithographic equipment according to claim 11, it is characterized in that, described magnetostrictive rod and rotary optical support contact portion deposit semiconductor material, this material has and the identical structure of rotary optical support circular periphery gear with the manufacturing of rotary optical support contact portion, and the magnetostrictive rod of rotational positioner has the characteristics with rotary optical support circular periphery gearing mesh.
13, the sensor device of lithographic equipment according to claim 1, it is characterized in that the transition material that described photon conversion crystal uses is by the compound with quantum conversion effet of III family and V group element, II family and IV family element or II family in the periodic table of elements and the element generation of VI family and the potpourri that they form.
14, a kind of manufacture method of lithographic equipment sensor device, this sensor device is placed in workpiece altitude datum place in the lithographic equipment, this lithographic equipment has optical projection system, be used for patterned radiation laser beam is projected workpiece target part to form the radiation space pattern, this sensor device is used to the chopped radiation space pattern and surveys the center of this pattern, sensor device comprises the spatial modulation pattern plate, the rotary optical module, control and signal conditioner substrate are regulated in rotation, the front of spatial modulation pattern plate has transmission modulation pattern and reflection modulation pattern, and the back side has the installation hole that is installed with described rotary optical module and is installed with the installation hole that control and signal conditioner substrate are regulated in described rotation; The rotary optical module comprises rotary optical support and photon conversion crystal; Rotation adjusting control and signal conditioner substrate comprise rotating stepper motor, rotational positioner, rotational positioner control circuit and the optical detector array signal modulate circuit of optical detector array, filter plate, belt driving gear, it is characterized in that this method comprises the steps:
(1) aluminize on the chromium layer that plates in advance in the front of spatial modulation pattern plate, etching reflection modulation pattern aluminizes for once more the front of spatial modulation pattern plate; Make the etching window of transmission modulation pattern then by the photoetching method etching, etch the transmission modulation pattern again;
(2) make rotary optical module installation hole, magnetic voussoir installation hole, rotation adjusting control and signal conditioner substrate installation hole respectively at the back side of spatial modulation pattern plate;
(3) according to the manufacturing tolerance and the assembly precision requirement of rotary optical module installation hole, rotation adjusting control and signal conditioner substrate installation hole, magnetic voussoir installation hole, make the rotary optical support, make rotation adjusting control and signal conditioner substrate and magnetic voussoir;
(4) the photon conversion crystal is packed into rotary optical support is implanted the rotary optical module in the rotary optical module installation hole of spatial modulation pattern backboard face;
(5) will rotate regulate control and signal conditioner substrate implant the rotation of spatial modulation pattern backboard face regulate control and the signal conditioner substrate installation hole in and fix, pack in magnetic voussoir installation hole according to orientation the magnetic voussoir at last and fix.
15, a kind of method for self-calibrating of lithographic equipment sensor device, this sensor device comprises spatial modulation pattern plate, rotary optical module, rotation adjusting control and signal conditioner substrate, the rotary optical module comprises rotary optical support and photon conversion crystal, wherein the photon conversion crystal is installed in the through hole of rotary optical support, and rotary optical support circular periphery is distributed with transmission gear; Described rotation adjusting control and signal conditioner substrate comprise rotating stepper motor, rotational positioner, rotational positioner control circuit and the optical detector array signal modulate circuit of optical detector array, filter plate, belt driving gear, it is characterized in that this method comprises the steps:
(a) rotational positioner control circuit control rotating stepper motor carries out clockwise direction and the rotation of stepping counterclockwise respectively, and processing is counted in the rotation stepping, to adjust the position of rotation of calibration rotary optical support;
(b) synchronous with the rotation step-by-step counting, signal to the output of optical detector array signal modulate circuit is sampled, obtain the rotation number of steps of the peak signal correspondence of clockwise direction and the output of the rotation of stepping counterclockwise time radiation detector array signal conditioning circuit, from peak signal, select the rotation step-by-step counting of the greater correspondence;
(c) according to the rotation step-by-step counting of selecting in (b) to obtain, calibration rotational positioner control circuit control rotating stepper motor carries out the stepping rotation, makes the rotary optical support rotate to the position of the signal of optical detector array signal modulate circuit output correspondence when maximum.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102253603A (en) * | 2010-05-21 | 2011-11-23 | 上海微电子装备有限公司 | Alignment detection device for photoetching equipment |
| CN102540744A (en) * | 2010-12-22 | 2012-07-04 | 上海微电子装备有限公司 | Mask alignment detecting device and method |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102253603A (en) * | 2010-05-21 | 2011-11-23 | 上海微电子装备有限公司 | Alignment detection device for photoetching equipment |
| CN102253603B (en) * | 2010-05-21 | 2013-05-22 | 上海微电子装备有限公司 | Alignment detection device for photoetching equipment |
| CN102540744A (en) * | 2010-12-22 | 2012-07-04 | 上海微电子装备有限公司 | Mask alignment detecting device and method |
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