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CN101456222A - Method for cutting wafer - Google Patents

Method for cutting wafer Download PDF

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CN101456222A
CN101456222A CNA2008101869324A CN200810186932A CN101456222A CN 101456222 A CN101456222 A CN 101456222A CN A2008101869324 A CNA2008101869324 A CN A2008101869324A CN 200810186932 A CN200810186932 A CN 200810186932A CN 101456222 A CN101456222 A CN 101456222A
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wafer
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wafers
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laser processing
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荒井一尚
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Disco Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Dicing (AREA)

Abstract

本发明提供一种晶片的分割方法,其能够沿着呈格子状地形成的间隔道高效率地分割多个晶片。晶片在表面上通过呈格子状地形成的间隔道而划分出多个区域,并在该划分出的区域上形成有多个器件,上述晶片的分割方法沿着间隔道将上述晶片分割成一个个器件,在上述晶片的分割方法中,在将多个光器件晶片粘贴在安装于环状框架的切割带的表面上的状态下,实施以下工序:激光加工槽形成工序,沿着间隔道对多个晶片分别照射激光光线,从而在晶片上沿着间隔道形成激光加工槽;分割工序,将晶片沿着形成有激光加工槽的间隔道分割成一个个器件;和拾取工序,将分割成一个一个的器件从切割带剥离并进行拾取。

The present invention provides a wafer dividing method capable of efficiently dividing a plurality of wafers along grid-shaped lanes. The surface of the wafer is divided into a plurality of regions by grid-shaped partitions, and a plurality of devices are formed on the partitioned regions. For the device, in the method for dividing the above-mentioned wafer, in the state where a plurality of optical device wafers are pasted on the surface of the dicing tape mounted on the ring frame, the following steps are carried out: a laser processing groove forming step, along the interval lanes for multiple The wafers are respectively irradiated with laser light, thereby forming laser processing grooves on the wafer along the interval roads; the dividing process divides the wafer into individual devices along the interval roads formed with the laser processing grooves; The devices are peeled from the dicing tape and picked.

Description

晶片的分割方法 Wafer Separation Method

技术领域 technical field

本发明涉及一种晶片的分割方法,晶片在表面上通过呈格子状地形成的间隔道划分出多个区域,并在该划分出的区域上形成有多个器件,该晶片的分割方法沿着间隔道将上述晶片分割成一个个器件。The present invention relates to a method for dividing a wafer. The surface of the wafer is divided into a plurality of regions by grid-shaped spacers, and a plurality of devices are formed on the divided regions. The method for dividing the wafer is along the The lanes divide the wafer into individual devices.

背景技术 Background technique

光器件晶片在蓝宝石基板等的表面上通过呈格子状地形成的被称为间隔道的分割预定线划分出多个区域,在该划分出的区域上层叠有氮化镓类化合物半导体等光器件,该光器件晶片沿着间隔道被分割成一个个发光二极管等光器件,并广泛地应用于电气设备。Optical device wafers are divided into a plurality of regions on the surface of a sapphire substrate or the like by dividing lines called streets formed in a grid pattern, and optical devices such as gallium nitride-based compound semiconductors are stacked on the divided regions. , the optical device wafer is divided into light-emitting diodes and other optical devices along the interval lanes, and is widely used in electrical equipment.

这样的光器件晶片的沿着间隔道的切断通常利用切削刀片高速旋转地进行切削的切削装置来进行。但是,由于蓝宝石基板的莫氏硬度高,是难切削材料,所以需要减慢加工速度,存在生产率差的问题。Cutting of such an optical device wafer along the lanes is generally performed by a cutting device in which a cutting blade rotates at a high speed and cuts. However, since the sapphire substrate has a high Mohs hardness and is a difficult-to-cut material, the processing speed needs to be slowed down, resulting in poor productivity.

近年来,作为沿着间隔道分割光器件晶片的方法,提出了这样的方法:沿着间隔道照射相对于晶片具有吸收性的脉冲激光光线,从而形成激光加工槽,通过沿着该激光加工槽施加外力来割断晶片。(例如参照专利文献1。)In recent years, as a method of dividing an optical device wafer along the lanes, a method has been proposed in which a laser-processed groove is formed by irradiating pulsed laser light having absorption properties with respect to the wafer along the lanes, and by External force is applied to break the wafer. (For example, refer to Patent Document 1.)

专利文献1:日本特开平10-305420号公报Patent Document 1: Japanese Patent Application Laid-Open No. 10-305420

然而,形成上述的光器件晶片的蓝宝石基板的直径是50mm左右,比较小。另一方面,激光加工装置的保持晶片的卡盘工作台构成为与直径在200~300mm的半导体晶片对应的大小。因此,为了有效地利用卡盘工作台的保持面,在安装于环状框架的粘胶带上粘贴多个光器件晶片,将粘贴在该粘胶带上的多个光器件晶片保持在卡盘工作台上,并实施激光加工,由此,提高了生产率。However, the diameter of the sapphire substrate on which the above-mentioned optical device wafer is formed is about 50 mm, which is relatively small. On the other hand, the chuck table holding the wafer of the laser processing apparatus is configured to have a size corresponding to a semiconductor wafer having a diameter of 200 to 300 mm. Therefore, in order to effectively utilize the holding surface of the chuck table, a plurality of optical device wafers are attached to an adhesive tape attached to a ring frame, and the plurality of optical device wafers attached to the adhesive tape are held in the chuck. On the workbench, and implement laser processing, thereby improving productivity.

这样,通过在安装于环状框架的粘胶带上粘贴多个光器件晶片,将粘贴在该粘胶带上的多个光器件晶片保持在卡盘工作台上后,沿着间隔道照射激光光线,从而在光器件晶片上沿着间隔道形成激光加工槽,然后实施分割工序,即,将沿着间隔道形成有激光加工槽的光器件晶片逐个地移贴到切割带上,沿着间隔道将光器件晶片分割开来。因此必须实施将沿着间隔道形成有激光加工槽的晶片移贴到切割带上的工序,在生产率方面不一定能够满足。In this way, by affixing a plurality of optical device wafers on the adhesive tape attached to the ring frame, holding the plurality of optical device wafers attached to the adhesive tape on the chuck table, and then irradiating laser light along the interval lanes light, so as to form laser processing grooves on the optical device wafer along the interval road, and then implement the dividing process, that is, the optical device wafers with laser processing grooves formed along the interval roads are moved and pasted on the dicing tape one by one, along the interval The road separates the optical device wafer. Therefore, it is necessary to carry out the process of transferring and attaching the wafer having the laser-processed grooves formed along the lanes to the dicing tape, which is not necessarily satisfactory in terms of productivity.

发明内容 Contents of the invention

本发明是鉴于上述事实而完成的,其主要的技术课题在于提供一种能够沿着呈格子状地形成的间隔道高效率地分割多个晶片的晶片的分割方法。The present invention has been made in view of the above facts, and its main technical task is to provide a wafer dividing method capable of efficiently dividing a plurality of wafers along grid-shaped streets.

为了解决上述主要的技术课题,根据本发明,提供一种晶片的分割方法,晶片在表面上通过呈格子状地形成的间隔道而划分出多个区域,并在该划分出的区域上形成有多个器件,上述晶片的分割方法沿着上述间隔道将上述晶片分割成一个个器件,其特征在于,In order to solve the above-mentioned main technical problems, according to the present invention, a method for dividing a wafer is provided. The wafer is divided into a plurality of regions by grid-shaped partitions formed on the surface, and the divided regions are formed with A plurality of devices, the method for dividing the above-mentioned wafer divides the above-mentioned wafer into individual devices along the above-mentioned interval road, and it is characterized in that,

上述晶片的分割方法包括以下工序:The dividing method of above-mentioned wafer comprises following operation:

晶片支承工序,将多个晶片粘贴在安装于环状框架的切割带的表面上;Wafer supporting process, sticking a plurality of wafers on the surface of the dicing tape installed on the ring frame;

激光加工槽形成工序,对安装于上述环状框架的上述切割带的表面上所粘贴的多个晶片沿着间隔道照射激光光线,从而在多个晶片上沿着间隔道形成激光加工槽;a laser processing groove forming step of irradiating laser beams along the interval lanes to the plurality of wafers attached to the surface of the above-mentioned dicing tape attached to the above-mentioned annular frame, thereby forming laser processing grooves along the interval lanes on the plurality of wafers;

分割工序,在将沿着间隔道形成有激光加工槽的晶片粘贴在上述切割带的表面上的状态下,沿着形成有激光加工槽的间隔道将上述晶片分割成一个个器件;和A dividing step, in a state where the wafer having laser-processed grooves formed along the intervals is pasted on the surface of the above-mentioned dicing tape, dividing the above-mentioned wafer into individual devices along the intervals formed with the laser-processed grooves; and

拾取工序,在实施了上述分割工序之后,将分割成一个一个的器件从上述切割带剥离并进行拾取。In the picking-up step, after the above-mentioned dividing step is performed, the individual devices separated from the dicing tape are peeled off and picked up.

上述激光加工槽形成工序使用激光加工装置来实施,该激光加工装置包括:保持被加工物的卡盘工作台;对保持在卡盘工作台上的被加工物照射激光光线的激光光线照射构件;和对保持在卡盘工作台上的被加工物进行拍摄的摄像构件,在上述激光加工槽形成工序中,在实施校准工序后,对多个晶片分别沿着间隔道照射激光光线,其中在上述校准工序中,利用摄像构件分别对隔着切割带保持在卡盘工作台上的多个晶片进行拍摄,对多个晶片分别进行形成在晶片上的间隔道与激光光线照射构件的激光光线照射位置的位置对准。The laser processing groove forming step is carried out using a laser processing device including: a chuck table holding a workpiece held on the chuck table; a laser beam irradiation member for irradiating laser light to the workpiece held on the chuck table; As for the imaging means for photographing the workpiece held on the chuck table, in the above-mentioned laser machining groove forming step, after the alignment step is performed, laser light is irradiated to the plurality of wafers respectively along the interval lanes, wherein in the above-mentioned In the alignment process, the plurality of wafers held on the chuck table with the dicing tape interposed therebetween are photographed by the imaging unit, and the spacing lanes formed on the wafers and the laser beam irradiation position of the laser beam irradiation unit are respectively determined for the plurality of wafers. position aligned.

此外,优选的是,在实施上述拾取工序时,使切割带扩张从而在分割成一个一个的器件之间形成间隙。In addition, it is preferable to expand the dicing tape so as to form gaps between the individual devices when the above-mentioned picking-up step is carried out.

在本发明的晶片的分割方法中,由于在将多个光器件晶片粘贴在安装于环状框架的切割带的表面上的状态下,实施以下工序:激光加工槽形成工序,沿着间隔道对多个晶片分别照射激光光线,从而在晶片上沿着间隔道形成激光加工槽;分割工序,将晶片沿着形成有激光加工槽的间隔道分割成一个个器件;和拾取工序,将分割成一个一个的器件从切割带剥离并进行拾取,所以能够高效率地分割多个晶片。In the wafer dividing method of the present invention, since a plurality of optical device wafers are pasted on the surface of the dicing tape mounted on the ring frame, the following steps are carried out: the laser processing groove forming step, along the separation lane A plurality of wafers are respectively irradiated with laser light, thereby forming laser processing grooves on the wafer along the interval road; a dividing process, dividing the wafer into individual devices along the interval road formed with the laser processing groove; One device is peeled from the dicing tape and picked up, so multiple wafers can be efficiently divided.

附图说明 Description of drawings

图1是作为利用本发明的晶片的分割方法被分割的晶片的光器件晶片的立体图。FIG. 1 is a perspective view of an optical device wafer as a wafer divided by a method for dividing a wafer according to the present invention.

图2是表示实施本发明的晶片的分割方法中的晶片支承工序,在安装于环状框架的切割带的表面上粘贴有多个图1所示的光器件晶片的状态的立体图。2 is a perspective view showing a state in which a plurality of optical device wafers shown in FIG. 1 are pasted on the surface of a dicing tape mounted on a ring frame in a wafer supporting step in the method of dividing a wafer according to the present invention.

图3是用于实施本发明的晶片的分割方法中的激光加工槽形成工序的激光加工装置的立体图。3 is a perspective view of a laser processing apparatus for performing a laser processing groove forming step in the wafer dividing method of the present invention.

图4是表示图2所示的粘贴在安装于环状框架的切割带的表面上的多个光器件晶片与保持在图3所示的激光加工装置的卡盘工作台的预定位置上的状态下的坐标的关系的说明图。FIG. 4 shows a state in which a plurality of optical device wafers attached to the surface of the dicing tape attached to the ring frame shown in FIG. 2 are held at predetermined positions on the chuck table of the laser processing apparatus shown in FIG. 3 An explanatory diagram of the relationship of the coordinates below.

图5是本发明的晶片的分割方法中的激光加工槽形成工序的说明图。5 is an explanatory diagram of a laser machining groove forming step in the wafer dividing method of the present invention.

图6是实施了本发明的晶片的分割方法中的激光加工槽形成工序的光器件晶片的主要部分放大剖视图。6 is an enlarged cross-sectional view of a main part of an optical device wafer subjected to a laser machining groove forming step in the wafer dividing method of the present invention.

图7是用于实施本发明的晶片的分割方法中的分割工序和拾取工序的分割装置的立体图。FIG. 7 is a perspective view of a dividing apparatus for carrying out the dividing step and the picking-up step in the wafer dividing method of the present invention.

图8是分解表示图7所示的分割装置的主要部分的立体图。Fig. 8 is an exploded perspective view showing a main part of the dividing device shown in Fig. 7 .

图9是表示构成图7所示的分割装置的第二工作台、框架保持构件和带扩张构件的剖视图。Fig. 9 is a cross-sectional view showing a second table, a frame holding member, and a belt expanding member constituting the dividing device shown in Fig. 7 .

图10是表示本发明的晶片的分割方法中的分割工序的说明图。FIG. 10 is an explanatory view showing a dividing step in the wafer dividing method of the present invention.

图11是表示本发明的晶片的分割方法中的拾取工序的说明图。FIG. 11 is an explanatory diagram showing a pick-up step in the wafer dividing method of the present invention.

标号说明Label description

1:激光加工装置;2:静止基座;3:卡盘工作台机构;36:卡盘工作台;37:加工进给构件;374:X轴方向位置检测构件;38:第一分度进给构件;384:Y轴方向位置检测构件;4:激光光线照射单元支承机构;42:可动支承基座;43:第二分度进给构件;5:激光光线照射单元;52:激光光线照射构件;522:聚光器;55:摄像构件;6:控制构件;7:分割装置;70:基座;71:第一工作台;72:第二工作台;75:框架保持构件;76:带扩张构件;760:扩张鼓;77:转动构件;78:超声波振动施加构件;8:检测构件;9:拾取构件;10:光器件晶片;101:间隔道;102:器件;110:激光加工槽;F:环状框架;T:切割带。1: Laser processing device; 2: Stationary base; 3: Chuck table mechanism; 36: Chuck table; 37: Processing feed member; 374: X-axis position detection member; 38: First index feed Giving component; 384: Y-axis position detection component; 4: Laser beam irradiation unit support mechanism; 42: Movable support base; 43: Second index feed component; 5: Laser beam irradiation unit; 52: Laser beam Illumination component; 522: condenser; 55: camera component; 6: control component; 7: dividing device; 70: base; 71: first workbench; 72: second workbench; 75: frame holding member; 76 : belt expansion member; 760: expansion drum; 77: rotating member; 78: ultrasonic vibration applying member; 8: detecting member; 9: picking member; 10: optical device wafer; 101: spacer; 102: device; 110: laser Processing groove; F: ring frame; T: cutting belt.

具体实施方式 Detailed ways

以下参照附图更详细地说明本发明的晶片的分割方法的优选实施方式。Preferred embodiments of the method for dividing a wafer according to the present invention will be described in more detail below with reference to the drawings.

图1表示了利用本发明的晶片的分割方法分割的光器件晶片10。图1所示的光器件晶片10在例如直径为50mm的蓝宝石基板的表面10a上通过呈格子状地形成的间隔道101划分出多个区域,在该划分出的区域上形成有多个发光二极管等光器件102。FIG. 1 shows an optical device wafer 10 divided by the wafer dividing method of the present invention. The optical device wafer 10 shown in FIG. 1 is divided into a plurality of regions on the surface 10a of a sapphire substrate with a diameter of 50 mm, for example, by grid-shaped partitions 101, and a plurality of light-emitting diodes are formed in the divided regions. and other optical devices 102 .

在将如上所述地构成的光器件晶片10沿着间隔道101分割成一个个光器件102时,首先将光器件晶片10粘贴在安装于环状框架的切割带的表面上。然而,由于光器件晶片10如上述那样直径比较小,为50mm,所以如果逐个地分割的话则生产率差,因此如图2所示,将多个(在图示的实施方式中是7个)光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7各自的背面10b粘贴到安装于环状框架F的切割带T的表面上(晶片支承工序)。因此,多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7各自的表面10a处于上侧。此外,环状框架F由不锈钢等金属材料形成,切割带T由聚烯烃等合成树脂片构成,并且在表面形成有厚度为5μm左右的粘结层。这样,将多个光器件晶片10粘贴到安装于环状框架F的切割带T的表面上的晶片支承工序,能够使用例如日本特开2006-324502号公报中公开的贴带机来实施。When the optical device wafer 10 configured as described above is divided into individual optical devices 102 along the lanes 101, the optical device wafer 10 is first attached to the surface of a dicing tape attached to a ring frame. However, since the optical device wafer 10 has a relatively small diameter of 50 mm as described above, if it is divided one by one, the productivity will be poor. Therefore, as shown in FIG. The device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, and 10-7 are pasted on the surface of the dicing tape T attached to the ring frame F on the respective back surfaces 10b (wafer supporting process). Therefore, the respective surfaces 10a of the plurality of optical device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, and 10-7 are located on the upper side. Also, the ring frame F is made of a metal material such as stainless steel, and the dicing tape T is made of a synthetic resin sheet such as polyolefin, and an adhesive layer with a thickness of about 5 μm is formed on the surface. In this way, the wafer supporting step of attaching a plurality of optical device wafers 10 to the surface of the dicing tape T attached to the ring frame F can be performed using, for example, a tape bonding machine disclosed in JP-A-2006-324502.

在实施了上述的晶片支承工序之后,实施校准工序和激光加工槽形成工序,在所述校准工序中,将粘贴在安装于环状框架F的切割带T的表面上的多个光器件晶片10保持在激光加工装置的卡盘工作台上,对多个光器件晶片10分别进行形成在光器件晶片10上的间隔道101与激光加工装置的激光光线照射构件的激光光线照射位置的位置对准;在所述激光加工槽形成工序中,沿着间隔道101对多个光器件晶片10照射激光光线,从而在多个光器件晶片10上沿着间隔道101形成激光加工槽。该校准工序和激光加工槽形成工序使用图3所示的激光加工装置来实施。After performing the above-mentioned wafer supporting step, an alignment step and a laser machining groove forming step are carried out. Holding on the chuck table of the laser processing device, the plurality of optical device wafers 10 are respectively aligned with the spacer 101 formed on the optical device wafer 10 and the laser beam irradiation position of the laser beam irradiation member of the laser processing device In the laser machining groove forming step, laser beams are irradiated to the plurality of optical device wafers 10 along the spacing lanes 101 to form laser machining grooves along the spacing lanes 101 on the plurality of optical device wafers 10 . The alignment step and the laser processing groove forming step are carried out using the laser processing device shown in FIG. 3 .

图3所示的激光加工装置1包括:静止基座2;卡盘工作台机构3,其以能够沿箭头X所示的加工进给方向(X轴方向)移动的方式配设在上述静止基座2上,用于保持被加工物;激光光线照射单元支承机构4,其以能够沿与上述箭头X所示的方向(X轴方向)正交的箭头Y所示的分度进给方向(Y轴方向)移动的方式配设在静止基座2上;和激光光线照射单元5,其以能够沿箭头Z所示的方向(Z轴方向)移动的方式配设在上述激光光线照射单元支承机构4上。The laser processing device 1 shown in Fig. 3 comprises: a stationary base 2; On the seat 2, it is used to hold the workpiece; the laser light irradiates the unit support mechanism 4, which can follow the direction of the indexing feed shown by the arrow Y (X-axis direction) perpendicular to the direction shown by the arrow X above ( Y-axis direction) is arranged on the stationary base 2; and a laser beam irradiation unit 5 is arranged on the support of the above-mentioned laser beam irradiation unit in a manner capable of moving in a direction (Z-axis direction) shown by arrow Z. Institution 4 on.

上述卡盘工作台机构3包括:沿着箭头X所示的加工进给方向(X轴方向)平行地配设在静止基座2上的一对导轨31、31;以能够沿箭头X所示的加工进给方向(X轴方向)移动的方式配设在上述导轨31、31上的第一滑块32;以能够沿箭头Y所示的分度进给方向(Y轴方向)移动的方式配设在上述第一滑块32上的第二滑块33;通过圆筒部件34支承在上述第二滑块33上的覆盖工作台35;和作为被加工物保持构件的卡盘工作台36。该卡盘工作台36包括由多孔性材料形成的吸附卡盘361,作为被加工物的例如圆盘状的半导体晶片通过未图示的吸引构件保持在吸附卡盘361上。这样构成的卡盘工作台36通过配设在圆筒部件34内的脉冲马达360旋转。此外,在卡盘工作台36上配设有用来固定后述的环状框架的夹紧器362。The above-mentioned chuck table mechanism 3 includes: a pair of guide rails 31, 31 arranged parallelly on the stationary base 2 along the processing feed direction (X-axis direction) shown by the arrow X; The first slide block 32 arranged on the above-mentioned guide rails 31, 31 in a manner to move in the processing feed direction (X-axis direction); in a manner capable of moving in the indexing feed direction (Y-axis direction) shown by arrow Y The second slider 33 arranged on the first slider 32; the cover table 35 supported on the second slider 33 via the cylindrical member 34; and the chuck table 36 as a workpiece holding member . The chuck table 36 includes a suction chuck 361 formed of a porous material, and a workpiece such as a disk-shaped semiconductor wafer is held on the suction chuck 361 by a suction member (not shown). The chuck table 36 configured in this way is rotated by the pulse motor 360 arranged in the cylindrical member 34 . In addition, a clamp 362 for fixing a ring frame to be described later is disposed on the chuck table 36 .

上述第一滑块32在其下表面设置有与上述一对导轨31、31配合的一对被引导槽321、321,并且在其上表面设置有沿着箭头Y所示的分度进给方向(Y轴方向)平行地形成的一对导轨322、322。这样构成的第一滑块32构成为:通过被引导槽321、321与一对导轨31、31配合,而能够沿着一对导轨31、31在箭头X所示的加工进给方向(X轴方向)上移动。图示的实施方式中的卡盘工作台机构3包括加工进给构件37,该加工进给构件37用于使第一滑块32沿着一对导轨31、31在箭头X所示的加工进给方向(X轴方向)上移动。加工进给构件37包括:平行地配设在上述一对导轨31和31之间的外螺纹杆371、和用于驱动该外螺纹杆371旋转的脉冲马达372等驱动源。外螺纹杆371的一端以能够自由旋转的方式支承于固定在上述静止基座2上的轴承块373,外螺纹杆371的另一端与上述脉冲马达372的输出轴传动连接。此外,外螺纹杆371与形成在未图示的内螺纹块中的内螺纹贯穿孔旋合,所述内螺纹块凸出地设置在第一滑块32的中央部下表面。因此,通过利用脉冲马达372驱动外螺纹杆371正转和反转,第一滑块32沿着导轨31、31在箭头X所示的加工进给方向(X轴方向)上移动。The above-mentioned first slider 32 is provided with a pair of guided grooves 321, 321 on its lower surface to cooperate with the above-mentioned pair of guide rails 31, 31, and on its upper surface is provided with an indexing feed direction along the arrow Y. (Y-axis direction) A pair of guide rails 322, 322 formed in parallel. The first slide block 32 constituted in this way is configured to be able to move along the pair of guide rails 31, 31 in the processing feed direction (X axis) shown by the arrow X by engaging the guided grooves 321, 321 with the pair of guide rails 31, 31. direction) to move up. The chuck table mechanism 3 in the illustrated embodiment includes a machining feed member 37 for making the first slider 32 move along the pair of guide rails 31, 31 in the machining progress indicated by the arrow X. Move in the given direction (X-axis direction). The machining feed member 37 includes an externally threaded rod 371 arranged in parallel between the pair of guide rails 31 and 31 , and a driving source such as a pulse motor 372 for driving the externally threaded rod 371 to rotate. One end of the externally threaded rod 371 is freely rotatably supported on a bearing block 373 fixed on the above-mentioned stationary base 2 , and the other end of the externally threaded rod 371 is in transmission connection with the output shaft of the above-mentioned pulse motor 372 . In addition, the externally threaded rod 371 is screwed into an internally threaded through hole formed in an unillustrated internally threaded block protrudingly provided on the lower surface of the central portion of the first slider 32 . Therefore, by using the pulse motor 372 to drive the externally threaded rod 371 to rotate forward and backward, the first slider 32 moves along the guide rails 31 , 31 in the machining feed direction (X-axis direction) indicated by the arrow X.

图示的实施方式中的激光加工装置1具有X轴方向位置检测构件374,该X轴方向位置检测构件374用来检测上述卡盘工作台36的加工进给量即X轴方向位置。X轴方向位置检测构件374包括:线性标度尺374a,其沿着导轨31配设;和读取头374b,其配设在第一滑块32上并且与第一滑块32一起沿着线性标度尺374a移动。在图示的实施方式中,该X轴方向位置检测构件374的读取头374b每走1μm就向后述的控制构件发送一个脉冲的脉冲信号。然后,后述的控制构件通过对所输入的脉冲信号进行计数,来检测卡盘工作台36的加工进给量即X轴方向位置。此外,在使用脉冲马达372作为上述加工进给构件37的驱动源的情况下,通过对向脉冲马达372输出驱动信号的后述控制构件的驱动脉冲进行计数,也能够检测卡盘工作台36的加工进给量即X轴方向位置。此外,在使用伺服马达来作为上述加工进给构件37的驱动源的情况下,通过将检测伺服马达的转速的旋转编码器所输出的脉冲信号发送至后述的控制构件,由控制构件对所输入的脉冲信号进行计数,也能够检测卡盘工作台36的加工进给量即X轴方向位置。The laser processing apparatus 1 in the illustrated embodiment has an X-axis direction position detecting member 374 for detecting the X-axis direction position which is the processing feed amount of the chuck table 36 . The X-axis direction position detection member 374 includes: a linear scale 374a arranged along the guide rail 31; and a read head 374b arranged on the first slider 32 and along the linear The scale 374a moves. In the illustrated embodiment, the head 374b of the X-axis direction position detecting means 374 sends a pulse signal of one pulse to the control means described later every time the head 374b travels by 1 μm. Then, the control means described later detects the machining feed amount of the chuck table 36 , that is, the position in the X-axis direction by counting the input pulse signal. In addition, when the pulse motor 372 is used as the driving source of the processing feed member 37, by counting the driving pulses of the control member described later that outputs a driving signal to the pulse motor 372, the position of the chuck table 36 can also be detected. The machining feed is the position in the X-axis direction. In addition, when a servo motor is used as the driving source of the above-mentioned processing feeding member 37, by sending a pulse signal output from a rotary encoder that detects the rotation speed of the servo motor to the control member described later, the control member controls the processing feed member 37. The input pulse signal is counted, and the machining feed rate of the chuck table 36 , that is, the position in the X-axis direction can be detected.

上述第二滑块33在其下表面设置有与一对导轨322、322配合的一对被引导槽331、331,这一对导轨322、322设置于上述第一滑块32的上表面,通过使该被引导槽331、331与一对导轨322、322配合,上述第二滑块33构成为能够沿着箭头Y所示的分度进给方向(Y轴方向)移动。图示的实施方式中的卡盘工作台机构3包括第一分度进给构件38,该第一分度进给构件38用于使第二滑块33沿着设置在第一滑块32上的一对导轨322、322在箭头Y所示的分度进给方向(Y轴方向)上移动。该第一分度进给构件38包括:平行地配设在上述一对导轨322和322之间的外螺纹杆381、和用于驱动该外螺纹杆381旋转的脉冲马达382等驱动源。外螺纹杆381的一端以能够自由旋转的方式支承于固定在上述第一滑块32的上表面上的轴承块383,外螺纹杆381的另一端与上述脉冲马达382的输出轴传动连接。此外,外螺纹杆381与形成在未图示的内螺纹块中的内螺纹贯穿孔旋合,所述内螺纹块凸出地设置在第二滑块33的中央部下表面。因此,通过利用脉冲马达382驱动外螺纹杆381正转和反转,第二滑块33沿着导轨322、322在箭头Y所示的分度进给方向(Y轴方向)上移动。The above-mentioned second slider 33 is provided with a pair of guided grooves 331, 331 on its lower surface to cooperate with a pair of guide rails 322, 322, and the pair of guide rails 322, 322 are arranged on the upper surface of the above-mentioned first slider 32. By engaging the guided grooves 331, 331 with the pair of guide rails 322, 322, the second slider 33 is configured to be movable in the index feed direction (Y-axis direction) indicated by arrow Y. The chuck table mechanism 3 in the illustrated embodiment includes a first index feed member 38 for making the second slider 33 set on the first slider 32 along the A pair of guide rails 322, 322 moves in the index feed direction (Y-axis direction) shown by arrow Y. The first index feeding member 38 includes an externally threaded rod 381 arranged in parallel between the pair of guide rails 322 and 322 , and a driving source such as a pulse motor 382 for driving the externally threaded rod 381 to rotate. One end of the externally threaded rod 381 is freely rotatably supported on a bearing block 383 fixed on the upper surface of the first slider 32 , and the other end of the externally threaded rod 381 is in transmission connection with the output shaft of the pulse motor 382 . In addition, the male thread rod 381 is screwed into a female thread through hole formed in a not shown female thread block protrudingly provided on the lower surface of the central portion of the second slider 33 . Therefore, by using the pulse motor 382 to drive the externally threaded rod 381 to rotate forward and backward, the second slider 33 moves along the guide rails 322 , 322 in the index feed direction (Y-axis direction) indicated by the arrow Y.

图示的实施方式中的激光加工装置1具有Y轴方向位置检测构件384,该Y轴方向位置检测构件384用来检测卡盘工作台36的分度加工进给量即Y轴方向位置。Y轴方向位置检测构件384包括:线性标度尺384a,其沿着导轨322配设;和读取头384b,其配设在第二滑块33上,并且与第二滑块33一起沿着线性标度尺384a移动。在图示的实施方式中,该Y轴方向位置检测构件384的读取头384b每走1μm就向后述的控制构件发送一个脉冲的脉冲信号。然后,后述的控制构件通过对所输入的脉冲信号进行计数,来检测卡盘工作台36的分度进给量即Y轴方向位置。此外,在使用脉冲马达382作为上述分度进给构件38的驱动源的情况下,通过对向脉冲马达382输出驱动信号的后述的控制构件的驱动脉冲进行计数,也能够检测卡盘工作台36的分度进给量即Y轴方向位置。此外,在使用伺服马达作为上述第一分度进给构件38的驱动源的情况下,通过将检测伺服马达的转速的旋转编码器所输出的脉冲信号发送至后述的控制构件,并由控制构件对所输入的脉冲信号进行计数,也能够检测卡盘工作台36的分度进给量即Y轴方向位置。The laser processing apparatus 1 in the illustrated embodiment has a Y-axis direction position detection member 384 for detecting the indexing feed amount of the chuck table 36 , that is, the Y-axis direction position. The Y-axis direction position detection member 384 includes: a linear scale 384a arranged along the guide rail 322; and a reading head 384b arranged on the second slider 33 and along with the second slider 33 The linear scale 384a moves. In the illustrated embodiment, the head 384b of the Y-axis direction position detecting means 384 sends a pulse signal of one pulse to the control means described later every time the head 384b travels by 1 μm. Then, the control means described later detects the index feed amount of the chuck table 36 , that is, the position in the Y-axis direction by counting the input pulse signal. In addition, when the pulse motor 382 is used as the driving source of the above-mentioned index feeding member 38, by counting the driving pulses of the control member described later that outputs a driving signal to the pulse motor 382, the chuck table can also be detected. The index feed amount of 36 is the position in the Y-axis direction. In addition, in the case of using a servo motor as the drive source of the first index feed member 38, the pulse signal output by the rotary encoder that detects the rotation speed of the servo motor is sent to the control member described later, and the control The member counts the input pulse signal, and can also detect the index feed amount of the chuck table 36 , that is, the position in the Y-axis direction.

上述激光光线照射单元支承机构4包括:沿着箭头Y所示的分度进给方向(Y轴方向)平行地配设在静止基座2上的一对导轨41、41;和以能够沿箭头Y所示的方向移动的方式配设在该导轨41、41上的可动支承基座42。该可动支承基座42由以能够移动的方式配设在导轨41、41上的移动支承部421、和安装在该移动支承部421上的安装部422构成。安装部422在一个侧面上平行地设置有沿着箭头Z所示的方向(Z轴方向)延伸的一对导轨423、423。图示的实施方式中的激光光线照射单元支承机构4包括第二分度进给构件43,该第二分度进给构件43用于使上述可动支承基座42沿着一对导轨41、41在箭头Y所示的分度进给方向(Y轴方向)上移动。第二分度进给构件43包括:平行地配设在上述一对导轨41和41之间的外螺纹杆431、和用于驱动该外螺纹杆431旋转的脉冲马达432等驱动源。外螺纹杆431的一端以能够自由旋转的方式支承于固定在上述静止基座2上的未图示的轴承块,外螺纹杆431的另一端与上述脉冲马达432的输出轴传动连接。此外,外螺纹杆431与形成在未图示的内螺纹块中的内螺纹孔旋合,所述内螺纹块凸出地设置在构成可动支承基座42的移动支承部421的中央部下表面。因此,通过利用脉冲马达432驱动外螺纹杆431正转和反转,可动支承基座42沿着导轨41、41在箭头Y所示的分度进给方向(Y轴方向)上移动。Above-mentioned laser beam irradiation unit supporting mechanism 4 comprises: along the index feed direction (Y-axis direction) shown by arrow Y a pair of guide rails 41,41 that are arranged on the stationary base 2 in parallel; The movable support base 42 is arranged on the guide rails 41 , 41 so as to move in the direction indicated by Y. The movable support base 42 is composed of a movable support portion 421 movably disposed on the guide rails 41 , 41 , and a mounting portion 422 mounted on the movable support portion 421 . A pair of guide rails 423 , 423 extending in a direction indicated by an arrow Z (Z-axis direction) are provided in parallel on one side of the mounting portion 422 . The laser beam irradiation unit support mechanism 4 in the illustrated embodiment includes a second index feed member 43 for moving the movable support base 42 along the pair of guide rails 41, 41 moves in the index feed direction (Y-axis direction) shown by arrow Y. The second index feeding member 43 includes an externally threaded rod 431 arranged in parallel between the pair of guide rails 41 and 41 , and a driving source such as a pulse motor 432 for driving the externally threaded rod 431 to rotate. One end of the externally threaded rod 431 is rotatably supported on an unillustrated bearing block fixed on the stationary base 2 , and the other end of the externally threaded rod 431 is drive-connected to the output shaft of the pulse motor 432 . In addition, the externally threaded rod 431 is screwed into a female threaded hole formed in an unillustrated female thread block protrudingly provided on the lower surface of the central portion of the movable support portion 421 constituting the movable support base 42 . . Therefore, by using the pulse motor 432 to drive the externally threaded rod 431 to rotate forward and backward, the movable support base 42 moves along the guide rails 41, 41 in the index feed direction (Y-axis direction) indicated by the arrow Y.

图示的实施方式中的激光光线照射单元5包括单元保持器51和安装在该单元保持器51上的激光光线照射构件52。单元保持器51上设置有一对被引导槽511、511,该被引导槽511、511能够滑动地与设置在上述安装部422上的一对导轨423、423配合,通过使该被引导槽511、511与上述导轨423、423配合,单元保持器51被支承成能够沿箭头Z所示的方向(Z轴方向)移动。The laser beam irradiation unit 5 in the illustrated embodiment includes a unit holder 51 and a laser beam irradiation member 52 mounted on the unit holder 51 . The unit holder 51 is provided with a pair of guided grooves 511, 511, which are slidably engaged with a pair of guide rails 423, 423 provided on the above-mentioned mounting part 422. By making the guided grooves 511, 511 511 cooperates with the above-mentioned guide rails 423, 423, and the unit holder 51 is supported so as to be movable in the direction indicated by the arrow Z (Z-axis direction).

图示的实施方式中的激光光线照射单元5包括移动构件53,该移动构件53用于使单元保持器51沿着一对导轨423、423在箭头Z所示的方向(Z轴方向)上移动。移动构件53包括:配设在一对导轨423和423之间的外螺纹杆(未图示)、和用于驱动该外螺纹杆旋转的脉冲马达532等驱动源,通过利用脉冲马达532驱动未图示的外螺纹杆正转和反转,使单元保持器51和激光光线照射构件52沿着导轨423、423在箭头Z所示的方向(Z轴方向)上移动。此外,在图示的实施方式中,通过驱动脉冲马达532正转,激光光线照射构件52向上方移动,通过驱动脉冲马达532反转,激光光线照射构件52向下方移动。The laser beam irradiation unit 5 in the illustrated embodiment includes a moving member 53 for moving the unit holder 51 in the direction indicated by the arrow Z (Z-axis direction) along the pair of guide rails 423 , 423 . The moving member 53 includes: an externally threaded rod (not shown) arranged between a pair of guide rails 423 and 423, and a driving source such as a pulse motor 532 for driving the externally threaded rod to rotate. The illustrated externally threaded rod rotates forward and backward to move the unit holder 51 and the laser beam irradiation member 52 in the direction indicated by the arrow Z (Z-axis direction) along the guide rails 423 , 423 . In addition, in the illustrated embodiment, the laser beam irradiating member 52 moves upward by driving the pulse motor 532 to rotate forward, and the laser beam irradiating member 52 moves downward by driving the pulse motor 532 in reverse.

上述激光光线照射构件52包括固定在单元保持器51上且实质上水平地延伸的圆筒形状的壳体521。在壳体521内配设有脉冲激光光线振荡构件,该脉冲激光光线振荡构件包括由YAG激光振荡器或YVO4激光振荡器构成的脉冲激光光线振荡器、和重复频率设定构件,在图示的实施方式中,该脉冲激光光线振荡构件振荡出对蓝宝石基板具有吸收性的波长(例如355nm)的脉冲激光光线。在上述壳体521的前端部安装有收纳了聚光透镜(未图示)的聚光器522。从上述脉冲激光光线振荡构件振荡出的激光光线经未图示的传送光学系统到达聚光器522,并从聚光器522以预定的聚光点直径照射向保持在上述卡盘工作台36上的被加工物。The laser beam irradiation member 52 includes a cylindrical housing 521 fixed to the unit holder 51 and extending substantially horizontally. Inside the housing 521 is provided a pulsed laser beam oscillating member, which includes a pulsed laser beam oscillator composed of a YAG laser oscillator or a YVO4 laser oscillator, and a repetition rate setting member. In an embodiment, the pulsed laser light oscillating means oscillates the pulsed laser light having a wavelength (for example, 355 nm) that is absorptive to the sapphire substrate. A condenser 522 in which a condenser lens (not shown) is accommodated is attached to the front end portion of the housing 521 . The laser beam oscillated from the above-mentioned pulsed laser light oscillating member reaches the condenser 522 through a transmission optical system not shown, and is irradiated from the condenser 522 with a predetermined spot diameter to be held on the above-mentioned chuck table 36. processed objects.

图示的实施方式中的激光加工装置包括摄像构件55,该摄像构件55配设在壳体521的前端部,用于拍摄应利用上述激光光线照射构件52进行激光加工的加工区域。该摄像构件55包括对被加工物进行照明的照明构件、捕捉被该照明构件照亮的区域的光学系统、和对由该光学系统捕捉到的像进行拍摄的摄像元件(CCD)等,该摄像构件55将拍摄得到的图像信号发送至后述的控制构件。The laser processing device in the illustrated embodiment includes an imaging unit 55 disposed at the front end of the casing 521 for imaging a processing area to be laser processed by the above-mentioned laser beam irradiation unit 52 . The imaging unit 55 includes an illuminating unit for illuminating the workpiece, an optical system for capturing an area illuminated by the illuminating unit, and an imaging device (CCD) for capturing an image captured by the optical system. The means 55 transmits the captured image signal to the control means described later.

图示的实施方式中的激光加工装置1包括控制构件6。控制构件6由计算机构成,其包括按照控制程序进行运算处理的中央处理装置(CPU)61、存储控制程序等的只读存储器(ROM)62、存储运算结果等的可读写的随机存取存储器(RAM)63、计数器64、输入接口65和输出接口66。来自上述X轴方向位置检测构件374、Y轴方向位置检测构件384和摄像构件55等的检测信号被输入到控制构件6的输入接口65中。然后从控制构件6的输出接口66向上述脉冲马达360、脉冲马达372、脉冲马达382、脉冲马达432、脉冲马达532、脉冲激光光线照射构件52和显示构件60等输出控制信号。The laser processing apparatus 1 in the illustrated embodiment includes a control member 6 . The control unit 6 is composed of a computer, which includes a central processing unit (CPU) 61 that performs calculation processing according to a control program, a read-only memory (ROM) 62 that stores control programs, etc., and a readable and writable random access memory that stores calculation results, etc. (RAM) 63 , counter 64 , input interface 65 and output interface 66 . Detection signals from the above-described X-axis direction position detection means 374 , Y-axis direction position detection means 384 , imaging means 55 and the like are input into the input interface 65 of the control means 6 . Then output control signals from the output interface 66 of the control member 6 to the pulse motor 360 , pulse motor 372 , pulse motor 382 , pulse motor 432 , pulse motor 532 , pulse laser light irradiation member 52 , and display member 60 .

在使用上述的激光加工装置1实施上述校准工序和激光加工槽形成工序时,将如图2所示安装于环状框架F的切割带T上所粘贴的多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7的切割带T侧载置在图1所示的激光加工装置1的卡盘工作台36上。然后,通过使未图示的吸引构件动作,将多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7隔着切割带T吸引保持在卡盘工作台36上。此外,环状框架F通过夹紧器362被固定。When using the above-mentioned laser processing apparatus 1 to carry out the above-mentioned alignment process and the laser processing groove forming process, the plurality of optical device wafers 10-1, 10 attached to the dicing tape T mounted on the ring frame F as shown in FIG. -2, 10-3, 10-4, 10-5, 10-6, and 10-7 are placed on the chuck table 36 of the laser processing apparatus 1 shown in FIG. 1 on the dicing tape T side. Then, a plurality of optical device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, 10-7 are separated by dicing tape T by operating a suction member (not shown). Suction remains on the chuck table 36. In addition, the ring frame F is fixed by clamps 362 .

如上所述地保持在卡盘工作台36上的多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7成为定位于图4中(a)所示的坐标位置的状态。此外,图4中(b)表示卡盘工作台36从图4中(a)所示的状态旋转了90度后的状态。在这样在卡盘工作台36上吸引保持多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7后,对各个光器件晶片10实施校准工序,即,进行间隔道101与激光光线照射构件52的聚光器522(激光光线照射位置)的位置对准。在实施校准工序时,首先使加工进给构件37动作,将保持有多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7的卡盘工作台36定位于摄像构件55的正下方。A plurality of optical device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, 10-7 held on the chuck table 36 as described above become positioned as shown in FIG. The state of the coordinate position shown in (a). In addition, (b) in FIG. 4 has shown the state which the chuck table 36 rotated 90 degrees from the state shown in FIG. 4 (a). After attracting and holding a plurality of optical device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, and 10-7 on the chuck table 36 in this way, each optical device wafer 10. An alignment step is performed, that is, the positioning of the partition road 101 and the light collector 522 (laser beam irradiation position) of the laser beam irradiation member 52 is performed. When performing the alignment process, firstly, the processing feeding member 37 is operated to hold a plurality of optical device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, and 10-7. The chuck table 36 is positioned directly below the imaging member 55 .

在将卡盘工作台36定位于摄像构件55的正下方之后,摄像构件55对保持在卡盘工作台36上的上述图4中(a)状态下的多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7进行拍摄,并将其图像数据发送至控制构件6。控制构件6根据从摄像构件55发送来的图像数据,求出多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7的坐标,并将其坐标值存储在随机存取存储器(RAM)63中。接着,使加工进给构件37和第一分度进给构件38动作以使卡盘工作台36移动,将光器件晶片10-1定位于摄像构件55的正下方。然后利用摄像构件55对形成在光器件晶片10-1上的沿着预定方向(在图4中(a)的状态下是X轴方向)延伸的间隔道101进行拍摄,并将其图像数据发送至控制构件6。控制构件6根据从摄像构件55发送来的图像数据,判断间隔道101是否与X轴平行。然后,在间隔道101与X轴不平行的情况下,使脉冲马达360动作,使得卡盘工作台36转动,从而调整成间隔道101与X轴平行(θ修正工序)。将这时的转动位置存储在随机存取存储器(RAM)63中。After the chuck table 36 is positioned directly below the imaging member 55, the imaging member 55 scans the plurality of optical device wafers 10-1, 10 held on the chuck table 36 in the state of (a) in FIG. -2, 10-3, 10-4, 10-5, 10-6, 10-7 are photographed, and the image data thereof are sent to the control member 6 . The control means 6 obtains the coordinates of the plurality of optical device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, and 10-7 based on the image data transmitted from the imaging means 55. , and store its coordinate values in random access memory (RAM) 63. Next, the process feed member 37 and the first index feed member 38 are operated to move the chuck table 36 to position the optical device wafer 10 - 1 directly under the imaging member 55 . Then, the street 101 formed on the optical device wafer 10-1 extending along a predetermined direction (the X-axis direction in the state of FIG. to the control member 6. The control means 6 judges whether or not the partition lane 101 is parallel to the X-axis based on the image data sent from the imaging means 55 . Then, when the partition road 101 is not parallel to the X-axis, the pulse motor 360 is operated to rotate the chuck table 36 to adjust the partition road 101 to be parallel to the X-axis (θ correction step). The rotational position at this time is stored in a random access memory (RAM) 63 .

接着使加工进给构件37和第一分度进给构件38动作,使卡盘工作台36移动,将图4中(a)所示的状态的光器件晶片10-1上形成的各间隔道101分别定位于摄像构件55的正下方,利用摄像构件55分别对各间隔道101的图4的(a)中左端(起点)和右端(终点)进行拍摄,并将其图像数据发送至控制构件6。控制构件6根据从摄像构件55发送来的图像数据,作为各间隔道的照射激光光线的起点坐标值和终点坐标值存储在随机存取存储器(RAM)63中(起点和终点坐标检测工序)。这样求出沿光器件晶片10-1的预定方向延伸的各间隔道101的照射激光光线的起点坐标值和终点坐标值,然后使脉冲马达360动作,使卡盘工作台36转动90度,将光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7定位于图4中(b)的状态。然后对定位于图4中(b)的状态的光器件晶片10-1的形成在与上述预定方向正交的方向上的各间隔道101执行上述起点和终点坐标检测工序。Then, the processing feeding member 37 and the first index feeding member 38 are moved to move the chuck table 36, and each spaced road formed on the optical device wafer 10-1 of the state shown in (a) in FIG. 101 are respectively positioned directly below the imaging member 55, and utilize the imaging member 55 to respectively photograph the left end (starting point) and the right end (end point) in Fig. 4 (a) of each interval lane 101, and send its image data to the control member 6. The control means 6 stores the image data sent from the imaging means 55 in the random access memory (RAM) 63 as the start point coordinates and the end point coordinates of the irradiated laser light for each lane (start point and end point coordinate detection process). In this way, the coordinate values of the start point and the end point of the irradiation laser light of each spaced lane 101 extending along the predetermined direction of the optical device wafer 10-1 are obtained, and then the pulse motor 360 is operated to rotate the chuck table 36 by 90 degrees, and the The optical device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, 10-7 are positioned in the state of (b) in FIG. 4 . Then, the above-mentioned starting point and ending point coordinate detection process is performed for each of the streets 101 formed in the direction orthogonal to the above-mentioned predetermined direction of the optical device wafer 10-1 positioned in the state of (b) in FIG. 4 .

在如上所述地对光器件晶片10-1实施了θ修正工序以及起点和终点坐标检测工序之后,对保持在卡盘工作台36上的其他光器件晶片10-2、10-3、10-4、10-5、10-6、10-7依次实施上述θ修正工序以及起点和终点坐标检测工序。After performing the θ correction process and the start and end point coordinate detection process on the optical device wafer 10-1 as described above, other optical device wafers 10-2, 10-3, 10- 4, 10-5, 10-6, and 10-7 carry out the above-mentioned θ correction process and the start point and end point coordinate detection process in sequence.

在如上所述地对保持在卡盘工作台36上的多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7分别实施了包括上述θ修正工序以及起点和终点坐标检测工序的校准工序之后,实施激光加工槽形成工序,即,沿着间隔道101对各光器件晶片10照射激光光线,从而在各光器件晶片10上沿着间隔道101形成激光加工槽。即,使加工进给构件37和第一分度进给构件38动作,如图5所示地将卡盘工作台36移动至聚光器522所处的激光光线照射区域,并将形成在光器件晶片10-1上的预定的间隔道101定位于聚光器522的正下方。这时,卡盘工作台36定位于通过上述θ修正工序进行了θ修正并存储在随机存取存储器(RAM)63中的转动位置。然后根据存储在随机存取存储器(RAM)63中的起点坐标值,如图5所示地将预定的间隔道101的起点坐标值(图5中的左端)定位于聚光器522的正下方。关于将该预定的间隔道101的起点坐标值定位于聚光器522的正下方的控制,根据来自X轴方向位置检测构件374和Y轴方向位置检测构件384的检测信号来实施。然后使激光光线照射构件52动作,从聚光器522照射脉冲激光光线,同时使加工进给构件37动作,使卡盘工作台36以预定的加工进给速度在图5中箭头X1所示的加工进给方向上移动(激光光线照射工序)。这时,从聚光器522照射的脉冲激光光线的聚光点P对准光器件晶片10-1的表面10a附近。然后,根据存储在随机存取存储器(RAM)63中的终点坐标值,在预定的间隔道101的终点坐标值(图5中的右端)到达聚光器522的正下方后,停止卡盘工作台36的移动并且停止照射脉冲激光光线。此外,关于停止卡盘工作台36的移动的控制,根据来自X轴方向位置检测构件374的检测信号来实施。其结果为,如图6所示,在光器件晶片10-1上沿着间隔道101形成激光加工槽110。As described above, each of the plurality of optical device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, and 10-7 held on the chuck table 36 was respectively implemented. After the calibration process including the above-mentioned θ correction process and the start point and end point coordinate detection process, the laser processing groove formation process is implemented, that is, the laser beam is irradiated to each optical device wafer 10 along the spacer 101, so that the edge of each optical device wafer 10 is formed. Laser-machined grooves are formed along the spacers 101 . That is, the processing feed member 37 and the first index feed member 38 are moved, and the chuck table 36 is moved to the laser beam irradiation area where the light collector 522 is located as shown in FIG. The predetermined spaced lanes 101 on the device wafer 10 - 1 are positioned directly under the light concentrator 522 . At this time, the chuck table 36 is positioned at the rotational position that has been corrected in θ by the θ correction step described above and stored in the random access memory (RAM) 63 . Then, according to the starting point coordinate value stored in the random access memory (RAM) 63, as shown in FIG. . The control of positioning the predetermined starting point coordinate value of the lane 101 directly under the condenser 522 is performed based on detection signals from the X-axis direction position detection means 374 and the Y-axis direction position detection means 384 . Then the laser beam irradiation member 52 is moved, and the pulsed laser beam is irradiated from the light collector 522, and the processing feed member 37 is moved simultaneously, so that the chuck table 36 is shown by the arrow X1 in FIG. 5 at a predetermined processing feed speed. Move in the machining feed direction (laser beam irradiation process). At this time, the converging point P of the pulsed laser light irradiated from the concentrator 522 is aligned near the surface 10a of the optical device wafer 10-1. Then, according to the end point coordinate value stored in the random access memory (RAM) 63, after the end point coordinate value (the right end in Fig. 5) of the predetermined interval track 101 arrives directly below the light collector 522, the chuck operation is stopped The movement of the stage 36 and the irradiation of the pulsed laser light are stopped. In addition, control for stopping the movement of the chuck table 36 is performed based on a detection signal from the X-axis direction position detection member 374 . As a result, as shown in FIG. 6 , laser-processed grooves 110 are formed along the streets 101 on the optical device wafer 10 - 1 .

此外,上述激光加工槽形成工序中的加工条件例如如下所示地设定。In addition, the processing conditions in the said laser processing groove formation process are set as follows, for example.

光源                :LD激发Q开关Nd:YVO4激光Light source: LD excitation Q switch Nd: YVO4 laser

波长                :355nmWavelength: 355nm

重复频率            :100kHzRepetition frequency : 100kHz

平均输出            :1.0WAverage output : 1.0W

聚光点直径          :Φ10μmFocus spot diameter : Φ10μm

加工进给速度        :100mm/秒Processing feed speed : 100mm/sec

在这样沿着在光器件晶片10-1的预定方向上延伸的所有间隔道101实施了上述的激光加工槽形成工序之后,将卡盘工作台36转动90度,然后沿着在与上述预定方向正交的方向上延伸的各间隔道101实施上述的激光加工槽形成工序。After carrying out the above-mentioned laser processing groove forming process along all the spacers 101 extending in the predetermined direction of the optical device wafer 10-1 in this way, the chuck table 36 is rotated by 90 degrees, and then along the above-mentioned predetermined direction Each of the streets 101 extending in the orthogonal direction is subjected to the above-mentioned laser machining groove forming step.

在如上所述地沿着在光器件晶片10-1上形成的所有间隔道101实施了上述的激光加工槽形成工序之后,对光器件晶片10-2、10-3、10-4、10-5、10-6、10-7依次实施上述的激光加工槽形成工序。其结果为,在安装于环状框架F的切割带T的表面上所粘贴的多个光器件晶片10-1、10-2、10-3、10-4、10-5、10-6、10-7上,分别沿着所有的间隔道101形成了激光加工槽110。After performing the above-mentioned laser machining groove formation process along all the spacers 101 formed on the optical device wafer 10-1 as described above, the optical device wafers 10-2, 10-3, 10-4, 10- 5, 10-6, and 10-7 carry out the above-mentioned laser machining groove forming steps in sequence. As a result, a plurality of optical device wafers 10-1, 10-2, 10-3, 10-4, 10-5, 10-6, 10 - 7 , laser-processed grooves 110 are formed along all the lanes 101 , respectively.

在实施了上述的激光加工槽形成工序之后,在将多个光器件晶片10粘贴在切割带T表面上的状态下,实施分割工序和拾取工序,在所述分割工序中,将所述多个光器件晶片10沿着形成有激光加工槽110的间隔道101分割成一个个器件102;在所述拾取工序中,将分割成一个一个的器件102从切割带T剥离并进行拾取。该分割工序和拾取工序使用图7至图9所示的分割装置来实施。图7表示分割装置的立体图,图8示出了分解表示图7所示的分割装置的主要部分的立体图。图7至图9所示的分割装置7包括:基座70、以能够沿箭头Y所示的方向移动的方式配设在该基座70上的第一工作台71、和以能够沿与箭头Y正交的箭头X所示的方向移动的方式配设在该第一工作台71上的第二工作台72。基座70形成为矩形,在其两侧部上表面沿箭头Y所示的方向相互平行地配设有两条导轨701、702。此外,在两条导轨中的一条导轨701的上表面上形成有截面为V字形的引导槽701a。After performing the above-mentioned laser processing groove formation process, in the state where the plurality of optical device wafers 10 are pasted on the surface of the dicing tape T, a division process and a pick-up process are performed. In the division process, the plurality of optical device wafers 10 are The optical device wafer 10 is divided into individual devices 102 along the lanes 101 formed with laser-processed grooves 110; The dividing step and the picking-up step are carried out using the dividing apparatus shown in FIGS. 7 to 9 . FIG. 7 is a perspective view of the dividing device, and FIG. 8 is an exploded perspective view showing the main parts of the dividing device shown in FIG. 7 . The dividing device 7 shown in Fig. 7 to Fig. 9 comprises: a base 70, a first workbench 71 arranged on the base 70 in a manner capable of moving along the direction shown by the arrow Y, and a first workbench 71 capable of moving along the direction indicated by the arrow Y The second table 72 is disposed on the first table 71 so as to move in a direction indicated by an arrow X perpendicular to Y. The base 70 is formed in a rectangular shape, and two guide rails 701 and 702 are arranged parallel to each other along the direction indicated by the arrow Y on the upper surfaces of both sides. In addition, a guide groove 701a having a V-shaped cross section is formed on the upper surface of one guide rail 701 of the two guide rails.

上述第一工作台71如图8所示地形成为在中央部具有矩形的开口711的窗框状。在该第一工作台71的一个侧部下表面设置有能够滑动地与引导槽701a配合的被引导轨道712,所述引导槽701a形成于设置在上述基座70上的一条导轨701中。此外,在第一工作台71的两侧部上表面,沿着与上述被引导轨道712正交的方向相互平行地配设有两条导轨713、714。此外,在两条导轨中的一条导轨713的上表面上形成有截面为V字形的引导槽713a。关于这样构成的第一工作台71,如图7所示,被引导轨道712与在设置于基座70的一条轨道701中形成的引导槽701a配合,并且第一工作台71的另一侧部下表面载置在设于基座70的另一条导轨702上。图示的实施方式中的晶片的分割装置7包括第一移动构件73,该第一移动构件73使第一工作台71沿着设置在基座70上的导轨701、702在箭头Y所示的方向上移动。如图8所示,该第一移动构件73具有:与设于基座70的另一条导轨702平行地配设的外螺纹杆731;配设在基座70上、并将外螺纹杆731的一端部支承成能够旋转的轴承732;与外螺纹杆731的另一端连接、并用于驱动外螺纹杆731旋转的脉冲马达733;和设置在上述第一工作台71的下表面、并与外螺纹杆731旋合的内螺纹块734。这样构成的第一移动构件73通过驱动脉冲马达733使外螺纹杆731转动,来使第一工作台71在箭头Y所示的方向移动。The first table 71 is formed in the shape of a window frame having a rectangular opening 711 in the center as shown in FIG. 8 . A side lower surface of the first table 71 is provided with a guided rail 712 slidably engaged with a guide groove 701 a formed in a guide rail 701 provided on the base 70 . In addition, two guide rails 713 and 714 are arranged in parallel to each other along the direction perpendicular to the guide rail 712 on the upper surface of both sides of the first table 71 . In addition, a guide groove 713a having a V-shaped cross section is formed on the upper surface of one guide rail 713 of the two guide rails. With regard to the first table 71 thus constituted, as shown in FIG. The surface is mounted on another guide rail 702 provided on the base 70 . The wafer splitting device 7 in the illustrated embodiment includes a first moving member 73 that moves the first table 71 along the guide rails 701 and 702 provided on the base 70 in the direction indicated by the arrow Y. direction to move. As shown in Figure 8, the first moving member 73 has: an externally threaded rod 731 arranged in parallel with another guide rail 702 provided on the base 70; One end is supported as a rotatable bearing 732; connected with the other end of the externally threaded rod 731 and used to drive the pulse motor 733 to rotate the externally threaded rod 731; The rod 731 is screwed into an internally threaded block 734 . The first moving member 73 configured in this way moves the first table 71 in the direction indicated by the arrow Y by driving the pulse motor 733 to rotate the externally threaded rod 731 .

上述第二工作台72如图8所示形成为矩形,并且在中央部具有圆形的孔721。在该第二工作台72的一个侧部下表面设置有能够滑动地与引导槽713a配合的被引导轨道722,所述引导槽713a形成于设置在上述第一工作台71上的一条导轨713中。关于这样构成的第二工作台72,如图7所示使被引导轨道722与在设于第一工作台71的一条导轨713上形成的引导槽713a配合,并且第二工作台72的另一侧部下表面载置在设置于第一工作台71的另一条导轨714上。图示的实施方式中的分割装置7包括第二移动构件74,该第二移动构件74使第二工作台72沿着设置在第一工作台71上的导轨713、714在箭头X所示的方向移动。如图8所示,该第二移动构件74具有:与设于第一工作台71的另一条导轨714平行地配设的外螺纹杆741;配设在第一工作台71上、并将外螺纹杆741的一端部支承成能够旋转的轴承742;与外螺纹杆741的另一端连接、并用于驱动外螺纹杆741旋转的脉冲马达743;和设置在上述第二工作台72的下表面、并与外螺纹杆741旋合的内螺纹块744。这样构成的第二移动构件74通过驱动脉冲马达743使外螺纹杆741转动,来使第二工作台72在箭头X所示的方向移动。The second table 72 is formed in a rectangular shape as shown in FIG. 8 and has a circular hole 721 in the center. A side lower surface of the second table 72 is provided with a guided rail 722 slidably engaged with a guide groove 713 a formed in a guide rail 713 provided on the first table 71 . With regard to the second table 72 constituted in this way, as shown in FIG. The lower surface of the side portion is placed on another guide rail 714 provided on the first workbench 71 . The splitting device 7 in the illustrated embodiment comprises a second moving member 74, and the second moving member 74 makes the second table 72 move along the guide rails 713, 714 provided on the first table 71 in the direction indicated by the arrow X. direction to move. As shown in Figure 8, the second moving member 74 has: an external threaded rod 741 arranged in parallel with another guide rail 714 provided on the first workbench 71; One end of the threaded rod 741 is supported as a rotatable bearing 742; the other end of the external threaded rod 741 is connected to a pulse motor 743 for driving the rotation of the external threaded rod 741; And an internally threaded block 744 screwed with the externally threaded rod 741 . The second moving member 74 configured in this way moves the second table 72 in the direction indicated by the arrow X by driving the pulse motor 743 to rotate the externally threaded rod 741 .

图示的实施方式中的分割装置7包括:保持上述环状框架F的框架保持构件75;和带扩张构件76,其用于使在保持于该框架保持构件75的环状框架F上所安装的切割带T扩张。如图7和图9所示,框架保持构件75包括:环状的框架保持部件751,其内径大于设置于上述第二工作台72的孔721的直径;和作为固定构件的多个夹紧器752,它们配设在上述框架保持部件751的外周。框架保持部件751的上表面形成载置环状框架F的载置面751a,在该载置面751a上载置环状框架F。另外,载置在载置面751a上的环状框架F通过夹紧器752固定在框架保持部件751上。这样构成的框架保持构件75通过支承构件763被支承成能够在上下方向进退,所述支承构件763配设在第二工作台72的孔721的上方,并构成后述的带扩张构件76。The dividing device 7 in the illustrated embodiment includes: a frame holding member 75 holding the above-mentioned ring frame F; The cutting zone T dilates. As shown in FIGS. 7 and 9 , the frame holding member 75 includes: a ring-shaped frame holding part 751 whose inner diameter is larger than the diameter of the hole 721 provided on the second workbench 72; and a plurality of clampers as fixing members. 752, which are arranged on the outer periphery of the above-mentioned frame holding member 751. The upper surface of the frame holding member 751 forms a mounting surface 751a on which the annular frame F is placed, and the annular frame F is placed on the mounting surface 751a. In addition, the ring-shaped frame F placed on the mounting surface 751 a is fixed to the frame holding member 751 by clamps 752 . The frame holding member 75 configured in this way is supported vertically by a support member 763 arranged above the hole 721 of the second table 72 and constituting a belt expansion member 76 described later.

如图7和图9所示,带扩张构件76包括配设在上述环状的框架保持部件751内侧的扩张鼓760。该扩张鼓760的内径和外径小于上述环状框架F的内径,并大于安装于该环状框架F的切割带T上所粘贴的多个光器件晶片10的粘贴区域。此外,扩张鼓760在下端部具有安装部761,并且在该安装部761的上侧外周面具有向径向凸出地形成的支承凸缘762,所述安装部761以能够转动的方式与设置于上述第二工作台72的孔721的内周面配合。图示的实施方式中的带扩张构件76具有使上述环状的框架保持部件751能够在上下方向进退的支承构件763。该支承构件763由配设在上述支承凸缘762上的多个空气缸763a构成,活塞杆763b与上述环状的框架保持部件751的下表面连接。这样由多个空气缸763a构成的支承构件763使环状的框架保持部件751沿上下方向在基准位置与扩张位置之间移动,所述基准位置是载置面751a与扩张鼓760的上端位于大致同一高度的位置;所述扩张位置是载置面751a比扩张鼓760的上端靠下预定量的位置。因此,由多个空气缸763a构成的支承构件763作为使扩张鼓760和框架保持部件751在上下方向相对移动的扩张移动构件发挥作用。As shown in FIGS. 7 and 9 , the belt expansion member 76 includes an expansion drum 760 disposed inside the above-mentioned annular frame holding member 751 . The inner diameter and outer diameter of the expansion drum 760 are smaller than the inner diameter of the ring frame F and larger than the bonding area of the plurality of optical device wafers 10 attached to the dicing tape T mounted on the ring frame F. In addition, the expansion drum 760 has a mounting portion 761 at its lower end, and a support flange 762 formed radially protrudingly on the upper outer peripheral surface of the mounting portion 761 , and the mounting portion 761 is rotatably connected to the set. It fits on the inner peripheral surface of the hole 721 of the above-mentioned second workbench 72 . The belt expansion member 76 in the illustrated embodiment has a support member 763 that enables the above-mentioned annular frame holding member 751 to advance and retreat in the vertical direction. The support member 763 is constituted by a plurality of air cylinders 763a disposed on the support flange 762, and a piston rod 763b is connected to the lower surface of the annular frame holding member 751 described above. In this way, the support member 763 constituted by the plurality of air cylinders 763a moves the annular frame holding member 751 in the vertical direction between the reference position where the mounting surface 751a and the upper end of the expansion drum 760 are approximately positioned. The position at the same height; the expansion position is a position at which the mounting surface 751 a is lower than the upper end of the expansion drum 760 by a predetermined amount. Therefore, the support member 763 constituted by the plurality of air cylinders 763 a functions as an expansion movement member that relatively moves the expansion drum 760 and the frame holding member 751 in the vertical direction.

如图7所示,图示的实施方式中的分割装置7包括转动构件77,该转动构件77使上述扩张鼓760和框架保持部件751转动。该转动构件77具有:配设在上述第二工作台72上的脉冲马达771、安装在该脉冲马达771的旋转轴上的带轮772、和卷绕在该带轮772和扩张鼓760的支承凸缘762上的环形带773。这样构成的转动构件77通过驱动脉冲马达771,经带轮772和环形带773使扩张鼓760和框架保持部件751转动。As shown in FIG. 7 , the dividing device 7 in the illustrated embodiment includes a rotating member 77 that rotates the expansion drum 760 and the frame holding member 751 described above. This rotating member 77 has: a pulse motor 771 arranged on the above-mentioned second table 72 , a pulley 772 mounted on the rotation shaft of the pulse motor 771 , and a support wound around the pulley 772 and the expansion drum 760 . Annulus 773 on flange 762. The rotating member 77 configured in this way rotates the expansion drum 760 and the frame holding member 751 via the pulley 772 and the endless belt 773 by driving the pulse motor 771 .

图示的实施方式中的分割装置7具有作为外力施加构件的超声波振动施加构件78,该超声波振动施加构件78对隔着切割带T支承在环状框架F上的多个光器件晶片10作用外力,其中所述环状框架F保持在上述环状的框架保持部件751上。超声波振动施加构件78配设在上述基座70上并配置在扩张鼓760内。如图8所示,该超声波振动施加构件78具有:配设在基座70上的空气缸781、配设在该空气缸781的活塞杆782的上端的超声波振动元件783、和安装在该超声波振动元件783的上表面的振动传递部件784,该超声波振动施加构件78通过未图示的电力供给构件对超声波振动元件783施加预定频率(例如100kHz)的交流电力。此外,构成该超声波振动施加构件78的振动传递部件784形成为直径与光器件晶片10的直径大致相同的圆盘状。The dividing device 7 in the illustrated embodiment has an ultrasonic vibration applying member 78 as an external force applying member that acts an external force on a plurality of optical device wafers 10 supported on the ring frame F via a dicing tape T. , wherein the ring-shaped frame F is held on the above-mentioned ring-shaped frame holding member 751 . The ultrasonic vibration applying member 78 is arranged on the above-mentioned base 70 and arranged inside the expansion drum 760 . As shown in Figure 8, this ultrasonic vibration applying member 78 has: the air cylinder 781 that is arranged on the base 70, the ultrasonic vibration element 783 that is arranged on the upper end of the piston rod 782 of this air cylinder 781, and the ultrasonic vibration element 783 that is installed on this ultrasonic vibration The vibration transmitting member 784 on the upper surface of the vibrating element 783 applies AC power of a predetermined frequency (for example, 100 kHz) to the ultrasonic vibrating element 783 through the power supply means (not shown). In addition, the vibration transmitting member 784 constituting the ultrasonic vibration applying member 78 is formed in a disk shape having a diameter substantially equal to that of the optical device wafer 10 .

返回图7继续说明,图示的实施方式中的分割装置7具有检测构件8,该检测构件8用来检测隔着切割带T支承在环状框架F上的光器件晶片10和后述的分割成一个一个的器件,其中所述环状框架F保持在上述环状的框架保持部件751上。检测构件8安装在配设于基座70的L字形支承柱81上。该检测构件8由光学系统和摄像元件(CCD)等构成,该检测构件8配置在上述超声波振动施加构件78的上方位置。这样构成的检测构件8对隔着切割带T支承在环状框架F上的光器件晶片10和后述的分割成一个一个的器件进行拍摄,并将其转换为电信号后发送至未图示的控制构件,其中所述环状框架F保持在上述环状的框架保持部件751上。Returning to FIG. 7 to continue the description, the dicing device 7 in the illustrated embodiment has a detection member 8 for detecting the optical device wafer 10 supported on the ring frame F via the dicing tape T and for the dicing described later. One-by-one devices, wherein the ring-shaped frame F is held on the above-mentioned ring-shaped frame holding member 751 . The detection member 8 is attached to an L-shaped support column 81 provided on the base 70 . The detecting means 8 is composed of an optical system, an imaging device (CCD), and the like, and is disposed above the above-mentioned ultrasonic vibration applying means 78 . The detecting member 8 configured in this way takes an image of the optical device wafer 10 supported on the ring frame F via the dicing tape T and the individual devices which will be described later, converts it into an electrical signal, and sends it to an unillustrated The control member, wherein the ring frame F is held on the above ring frame holding part 751.

此外,如图7所示,图示的实施方式中的分割装置7具有从切割带T拾取后述的分割成一个一个的器件的拾取构件9。该拾取构件9由配设在基座70上的回转臂91、和安装在该回转臂91的前端的拾取夹头92构成,回转臂91通过未图示的驱动构件回转。此外,回转臂91构成为能够上下运动,安装在前端的拾取夹头92能够拾取粘贴在切割带T上的器件。In addition, as shown in FIG. 7 , the dividing device 7 in the illustrated embodiment has a pick-up member 9 that picks up, from the dicing tape T, devices that are divided one by one, which will be described later. The pickup member 9 is composed of a swivel arm 91 arranged on the base 70 and a pickup chuck 92 attached to the front end of the swivel arm 91 , and the swivel arm 91 is swiveled by a driving member not shown. In addition, the swivel arm 91 is configured to be movable up and down, and the pickup chuck 92 attached to the front end can pick up the components stuck on the dicing tape T. As shown in FIG.

主要参照图7和图10说明分割工序,在该分割工序中,使用如上所述地构成的分割装置7,将通过实施上述激光加工槽形成工序而形成有激光加工槽110的多个光器件晶片10分割成一个个器件102。Referring mainly to FIG. 7 and FIG. 10 , the dividing step will be described. In this dividing step, the plurality of optical device wafers on which the laser machining grooves 110 are formed by performing the above laser machining groove forming process are divided into two parts using the dividing apparatus 7 configured as described above. 10 is divided into individual devices 102 .

如图10中(a)所示,将隔着切割带T支承有实施了上述激光加工槽形成工序的多个光器件晶片10的环状框架F,载置在构成框架保持构件75的框架保持部件751的载置面751a上,并通过夹紧器752将环状框架F固定在框架保持部件751上。这时,框架保持部件751定位于图10中(a)所示的基准位置。As shown in (a) in FIG. 10 , the ring-shaped frame F supporting the plurality of optical device wafers 10 subjected to the above-mentioned laser machining groove forming process through the dicing tape T is placed on the frame holding member 75 constituting the frame holding member 75 . On the mounting surface 751 a of the member 751 , the ring frame F is fixed to the frame holding member 751 by clamps 752 . At this time, the frame holding member 751 is positioned at the reference position shown in FIG. 10( a ).

在将隔着切割带T支承了多个光器件晶片10的环状框架F保持在框架保持部件751上之后,使第一移动构件73和第二移动构件74动作,使第一工作台71沿箭头Y所示的方向(参照图7)移动,并且使第二工作台72沿箭头X所示的方向(参照图7)移动,从而如图10中(a)所示使例如光器件晶片10-1定位于超声波振动元件783的正上方。接着使构成超声波振动施加元件78的空气缸781动作,使振动传递部件784上升,如图10中(b)所示使振动传递部件784与切割带T中的粘贴有光器件晶片10-1的区域接触。然后通过未图示的电力供给构件对超声波振动元件783施加预定频率(例如100kHz)的交流电力。从而,经振动传递部件784和切割带T对光器件晶片10-1施加超声波振动。其结果为,光器件晶片10-1由于沿着间隔道101形成有激光加工槽110而使得强度降低,所以光器件晶片10-1沿着间隔道101被分割成一个个器件102(分割工序)。此外,作为在上述分割工序中对晶片施加外力的方法,表示了对晶片施加超声波振动的例子,但是也可以使用以下方法等其它的分割方法:隔着形成在晶片上的间隔道地吸引保持切割带T,并使切割带T向与间隔道垂直的方向背离,从而将晶片沿着因形成了激光加工槽而导致强度下降的间隔道分割开来。After holding the ring frame F supporting the plurality of optical device wafers 10 through the dicing tape T on the frame holding member 751, the first moving member 73 and the second moving member 74 are operated to move the first table 71 along the The direction shown by the arrow Y (refer to FIG. 7 ) moves, and the second stage 72 is moved along the direction shown by the arrow X (refer to FIG. 7 ), so that, for example, the optical device wafer 10 is moved as shown in (a) in FIG. -1 is located directly above the ultrasonic vibrating element 783 . Then make the air cylinder 781 that constitutes the ultrasonic vibration applying element 78 act, the vibration transmission member 784 is lifted, and as shown in FIG. regional contacts. Then, AC power of a predetermined frequency (for example, 100 kHz) is applied to the ultrasonic vibration element 783 by a power supply means not shown. Accordingly, ultrasonic vibrations are applied to the optical device wafer 10 - 1 via the vibration transmission member 784 and the dicing tape T . As a result, the strength of the optical device wafer 10-1 decreases due to the formation of the laser-processed grooves 110 along the streets 101, so the optical device wafer 10-1 is divided into individual devices 102 along the streets 101 (dividing process) . In addition, as a method of applying an external force to the wafer in the above-mentioned dividing step, an example of applying ultrasonic vibration to the wafer was shown, but other dividing methods such as a method of attracting and holding the dicing via the streets formed on the wafer may also be used. Tape T, and make the dicing tape T deviate from the direction perpendicular to the spacer, so that the wafer is divided along the spacer where the strength is reduced due to the formation of the laser processing groove.

在如上所述地对光器件晶片10-1实施了分割工序之后,使第一移动构件73和第二移动构件74动作,将例如光器件晶片10-2定位于超声波振动元件783的正上方,对光器件晶片10-2实施上述分割工序。以后对光器件晶片10-3、10-4、10-5、10-6、10-7也依次实施上述分割工序。After performing the dividing process on the optical device wafer 10-1 as described above, the first moving member 73 and the second moving member 74 are operated to position, for example, the optical device wafer 10-2 directly above the ultrasonic vibrating element 783, The above-described dividing step is performed on the optical device wafer 10-2. Thereafter, the above-described dividing steps are also sequentially performed on the optical device wafers 10-3, 10-4, 10-5, 10-6, and 10-7.

通过如上所述地对粘贴在安装于环状框架F的切割带T上的所有光器件晶片10实施分割工序,将所有的光器件晶片10沿着形成有激光加工槽110的间隔道101分割成一个个器件102,然后实施将分割成一个一个的器件102从切割带T剥离并进行拾取的拾取工序。By performing the dividing process on all the optical device wafers 10 attached to the dicing tape T attached to the ring frame F as described above, all the optical device wafers 10 are divided into The devices 102 are separated one by one, and then a pick-up process of peeling and picking up the individual devices 102 from the dicing tape T is performed.

如图11中(a)所示,该拾取工序中,使构成超声波振动施加构件78的空气缸781动作,使振动传递部件784下降。接着使作为构成带扩张构件76的支承构件763的多个空气缸763a动作,使环状的框架保持部件751下降至图11中(b)所示的扩张位置。因此,固定在框架保持部件751的载置面751a上的环状框架F也下降,所以如图11中(b)所示,安装在环状框架F上的切割带T与扩张鼓760的上端缘抵接从而被扩张。其结果为,在粘贴在切割带T上的分割成一个一个的器件102之间形成间隙S。之后如图11中(b)所示,使拾取构件9动作,利用拾取夹头92拾取分割成一个一个的器件102,并搬送至未图示的托盘或芯片接合工序。在该拾取工序中,由于在分割成一个一个的器件102之间形成有间隙S,所以在从切割带T剥离器件102时,不会与相邻的器件102擦碰,能够防止因器件102擦碰引起的器件的损伤。As shown in FIG. 11( a ), in this pickup step, the air cylinder 781 constituting the ultrasonic vibration applying member 78 is operated to lower the vibration transmission member 784 . Next, a plurality of air cylinders 763a serving as support members 763 constituting the belt expansion member 76 are operated to lower the annular frame holding member 751 to the expansion position shown in FIG. 11( b ). Therefore, the annular frame F fixed on the mounting surface 751a of the frame holding member 751 also descends, so as shown in FIG. The edges are abutted and thus expanded. As a result, gaps S are formed between the individual divided devices 102 attached to the dicing tape T. As shown in FIG. Thereafter, as shown in FIG. 11( b ), the pickup member 9 is operated, and the individual devices 102 are picked up by the pickup chuck 92 and transported to a tray or die bonding process not shown. In this pick-up process, since the gap S is formed between the individual devices 102, when the device 102 is peeled off from the dicing tape T, it will not rub against the adjacent device 102, and it is possible to prevent the device 102 from being scratched. Device damage caused by impact.

如上所述,在本发明的晶片的分割方法中,由于在将多个光器件晶片10粘贴在安装于环状框架F的切割带T的表面上的状态下,实施上述激光加工槽形成工序、分割工序和拾取工序,所以能够高效率地分割多个光器件晶片10。As described above, in the wafer dividing method of the present invention, since the plurality of optical device wafers 10 are attached to the surface of the dicing tape T attached to the ring frame F, the above-mentioned laser machining groove forming step, Since the dividing process and the picking process are performed, a plurality of optical device wafers 10 can be efficiently divided.

Claims (3)

1, a kind of dividing method of wafer, wafer marks off a plurality of zones by the spacing track that is the formation of clathrate ground from the teeth outwards, and on this zone that marks off, be formed with a plurality of devices, the dividing method of above-mentioned wafer is divided into device one by one along above-mentioned spacing track with above-mentioned wafer, it is characterized in that
The dividing method of above-mentioned wafer comprises following operation:
The wafer supporting operation sticks on a plurality of wafers on the surface of the cutting belt that is installed on ring-shaped frame;
Laser processing groove forms operation, and a plurality of wafers of being pasted on the surface to the above-mentioned cutting belt that is installed on above-mentioned ring-shaped frame are along spacing track irradiating laser light, thereby forms laser processing groove along spacing track on a plurality of wafers;
Segmentation process sticks under the lip-deep state of above-mentioned cutting belt at the wafer that will be formed with laser processing groove along spacing track, along the spacing track that is formed with laser processing groove above-mentioned wafer is divided into device one by one; With
Pick up operation, after having implemented above-mentioned segmentation process, the device that is divided into is one by one peeled off and picked up from above-mentioned cutting belt.
2, the dividing method of wafer as claimed in claim 1 is characterized in that,
Above-mentioned laser processing groove forms operation and uses laser processing device to implement, and this laser processing device comprises: the chuck table that keeps machined object; To remaining on the laser light irradiation member of the machined object irradiating laser light on this chuck table; With the shooting member that the machined object that remains on this chuck table is taken, form in the operation in above-mentioned laser processing groove, after implementing calibration procedure, to a plurality of wafers respectively along spacing track irradiating laser light, wherein in above-mentioned calibration procedure, utilize above-mentioned shooting member respectively a plurality of wafers that remain on the above-mentioned chuck table across above-mentioned cutting belt to be taken, a plurality of wafers are formed on the position alignment of the laser light irradiation position of spacing track on the wafer and above-mentioned laser light irradiation member respectively.
3, the dividing method of wafer as claimed in claim 1 or 2 is characterized in that,
State when picking up operation on the implementation, thereby make above-mentioned cutting belt expansion between the device that is divided into one by one, form the gap.
CNA2008101869324A 2007-12-11 2008-12-10 Method for cutting wafer Pending CN101456222A (en)

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Cited By (2)

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KR101217398B1 (en) * 2011-02-25 2013-01-02 앰코 테크놀로지 코리아 주식회사 Apparatus for Dicing Wafer and Method for Dicing Wafer by using the same
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Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3163614B2 (en) * 1998-06-19 2001-05-08 株式会社東京精密 Work cutting method and device
JP2000353816A (en) * 1999-06-14 2000-12-19 Kanegafuchi Chem Ind Co Ltd Manufacture of thin film solar battery module
JP2003282482A (en) * 2002-03-20 2003-10-03 Nec Kansai Ltd Method for manufacturing semiconductor device
JP2004111601A (en) * 2002-09-18 2004-04-08 Tokyo Seimitsu Co Ltd Die bonder
JP4505789B2 (en) * 2004-02-10 2010-07-21 株式会社東京精密 Chip manufacturing method
JP4174437B2 (en) * 2004-03-04 2008-10-29 日本航空電子工業株式会社 Connectors and printed circuit boards
JP2006134971A (en) * 2004-11-04 2006-05-25 Disco Abrasive Syst Ltd Laser processing method of wafer
JP4648056B2 (en) * 2005-03-31 2011-03-09 株式会社ディスコ Wafer laser processing method and laser processing apparatus
JP4865306B2 (en) * 2005-11-18 2012-02-01 株式会社ディスコ Tape applicator

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Publication number Priority date Publication date Assignee Title
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CN102881782B (en) * 2011-07-11 2016-12-28 株式会社迪思科 The dividing method of optical device substrate

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