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CN101100354B - A kind of manufacturing method of low-emissivity glass - Google Patents

A kind of manufacturing method of low-emissivity glass Download PDF

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Publication number
CN101100354B
CN101100354B CN200710011854XA CN200710011854A CN101100354B CN 101100354 B CN101100354 B CN 101100354B CN 200710011854X A CN200710011854X A CN 200710011854XA CN 200710011854 A CN200710011854 A CN 200710011854A CN 101100354 B CN101100354 B CN 101100354B
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CN
China
Prior art keywords
raw material
glass
silver
optical glass
frit
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Expired - Fee Related
Application number
CN200710011854XA
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Chinese (zh)
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CN101100354A (en
Inventor
王子健
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Shenyang Jianzhu University
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Shenyang Jianzhu University
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Priority to CN200710011854XA priority Critical patent/CN101100354B/en
Publication of CN101100354A publication Critical patent/CN101100354A/en
Application granted granted Critical
Publication of CN101100354B publication Critical patent/CN101100354B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

This invention relates to a method for producing low radiation glass. It comprises procedures of: (1), melting an ordinary optical glass raw material; (2), adding, into said raw material, nanometer silver 0.1-0.21% of the weight of the raw material and lead oxide 0.05-0.1% of the weight of the raw material; (3), thoroughly mixing said three materials; (4), the molten mixture temperature is lowered, and proceeding formation to obtain final products. The optical glass, thus produced based on this invention method, can be used for manufacturing sunglasses and protective spectacles for effectively protecting infrared from passing through the same, with no influence of the strength of the glass, and characteristics of anti-ultraviolet rays and light-flux.

Description

A kind of making method of low emissivity glass
Technical field
The present invention relates to a kind of making method of opticglass, particularly relate to a kind of making method of low emissivity glass.
Background technology
Ultraviolet ray is to bring out the cataractous main inducing of human eye with infrared rays, all exists high-intensity ultraviolet ray, infrared rays in intensive sunlight or the special production environment.At present, the main protective devices that people adopt is to wear sun glasses or special-purpose eye-protection glasses, but common sun glasses or eye-protection glasses eyeglass only have the function of antiultraviolet, and is very faint to ultrared protective effect, can not effectively protect eyes.The low emissivity glass of manufacturing of the present invention infrared rays more than 70% capable of blocking passes through, and does not influence glass intensity, anti-uv and logical light rate simultaneously, is a kind of ideal sun glasses or eye-protection glasses opticglass.
Summary of the invention
The objective of the invention is to overcome existing sun glasses or protective glasses and can not effectively prevent ultrared shortcoming with opticglass, improve by test, providing a kind of is main raw material with the ordinary optical frit, is the making method of the low emissivity glass of additive with nanometer silver and plumbous oxide.This product can effectively prevent from not influence when infrared rays from passing through glass intensity, anti-uv and logical light rate.
The objective of the invention is to be achieved through the following technical solutions:
A kind of making method of low emissivity glass, this method may further comprise the steps:
(1) raw material with ordinary optical glass melts;
(2) nanometer silver and other frit quality 0.05%~0.10% lead oxide powder of other frit quality 0.1%~0.21% of adding in the frit of fusing;
(3) nanometer silver and plumbous oxide and other frit are stirred;
(4) with the cooling of fused mixture, moulding, can obtain qualified product.
The making method of aforesaid a kind of low emissivity glass, described ordinary optical frit are the raw material of general industry production opticglass, and nanometer silver and plumbous oxide are the silver powder of diameter between 1~100 nanometer.
Advantage of the present invention and effect are:
1. the present invention is a main raw material with the ordinary optical frit, is additive with nanometer silver and plumbous oxide, can prevent effectively that infrared rays from passing through.
2. the present invention adopts the production method production of ordinary optical glass, and its production technique is simple, and raw material is easy to get, and is with low cost.
Embodiment
Embodiment 1
Raw material fusing with ordinary optical glass, the nanometer silver and 0.05% lead oxide powder that in the frit of fusing, add other frit quality 0.1%, nanometer silver and plumbous oxide and other frit are stirred,, can obtain qualified product the cooling of fused mixture, moulding.Can prevent that 70% infrared rays from passing through.
Embodiment 2
Raw material fusing with ordinary optical glass, the nanometer silver and 0.075% lead oxide powder that in the frit of fusing, add other frit quality 0.15%, nanometer silver and plumbous oxide and other frit are stirred, with the cooling of fused mixture, moulding, can obtain qualified product.Can prevent that 74% infrared rays from passing through.
Embodiment 3
Raw material fusing with ordinary optical glass, the nanometer silver and 0.1% lead oxide powder that in the frit of fusing, add other frit quality 0.21%, nanometer silver and plumbous oxide and other frit are stirred,, can obtain qualified product the cooling of fused mixture, moulding.Can prevent that 75% infrared rays from passing through.

Claims (2)

1.一种低辐射玻璃的制作方法,其特征在于,该方法包括以下步骤:1. A method for making low-emissivity glass, characterized in that the method may further comprise the steps: (1)将普通光学玻璃的原料熔化;(1) Melting the raw materials of ordinary optical glass; (2)在熔化的玻璃原料中加入其它玻璃原料质量0.1%~0.21%的纳米银和其它玻璃原料质量0.05%~0.10%氧化铅粉体;(2) Add other glass raw material quality 0.1%~0.21% nano-silver and other glass raw material quality 0.05%~0.10% lead oxide powder in the molten glass raw material; (3)将纳米银和氧化铅与其它玻璃原料搅拌均匀;(3) Stir nano-silver and lead oxide with other glass raw materials; (4)将熔融的混合物降温、成型,即可得到合格的产品。(4) Cool down and shape the molten mixture to obtain qualified products. 2.根据权利要求1所述的一种低辐射玻璃的制作方法,其特征在于所述的普通光学玻璃原料为普通工业化生产光学玻璃的原料,纳米银为直径在1~100纳米之间的金属银粉。2. The manufacturing method of a kind of low-emissivity glass according to claim 1, characterized in that said common optical glass raw material is the raw material of ordinary industrialized production of optical glass, and nano-silver is a metal whose diameter is between 1 and 100 nanometers silver dust.
CN200710011854XA 2007-06-25 2007-06-25 A kind of manufacturing method of low-emissivity glass Expired - Fee Related CN101100354B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200710011854XA CN101100354B (en) 2007-06-25 2007-06-25 A kind of manufacturing method of low-emissivity glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN200710011854XA CN101100354B (en) 2007-06-25 2007-06-25 A kind of manufacturing method of low-emissivity glass

Publications (2)

Publication Number Publication Date
CN101100354A CN101100354A (en) 2008-01-09
CN101100354B true CN101100354B (en) 2011-01-19

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN200710011854XA Expired - Fee Related CN101100354B (en) 2007-06-25 2007-06-25 A kind of manufacturing method of low-emissivity glass

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102838934B (en) * 2012-09-27 2015-09-16 富思特新材料科技发展股份有限公司 Low-E coating with function of purifying indoor air and preparation method thereof
CN104829131A (en) * 2015-06-03 2015-08-12 苏州靖羽新材料有限公司 High-strength glass material and production method thereof
CN105060705A (en) * 2015-08-03 2015-11-18 芜湖真空科技有限公司 LOW-E glass matrix material composition and preparation method of LOW-E glass matrix

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN87105971A (en) * 1986-12-29 1988-08-31 Ppg工业公司 The low radiation film of pyroprocess
CN1078219A (en) * 1992-04-30 1993-11-10 加迪安工业公司 High-performance and competent low-E glass and manufacture method thereof
CN1133899A (en) * 1994-12-27 1996-10-23 Ppg工业公司 Annealed low emissivity coating

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN87105971A (en) * 1986-12-29 1988-08-31 Ppg工业公司 The low radiation film of pyroprocess
CN1078219A (en) * 1992-04-30 1993-11-10 加迪安工业公司 High-performance and competent low-E glass and manufacture method thereof
CN1133899A (en) * 1994-12-27 1996-10-23 Ppg工业公司 Annealed low emissivity coating

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Publication number Publication date
CN101100354A (en) 2008-01-09

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Termination date: 20110625