CN109387966A - Transparent conductive film, the touch panel including the transparent conductive film - Google Patents
Transparent conductive film, the touch panel including the transparent conductive film Download PDFInfo
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- CN109387966A CN109387966A CN201710691001.9A CN201710691001A CN109387966A CN 109387966 A CN109387966 A CN 109387966A CN 201710691001 A CN201710691001 A CN 201710691001A CN 109387966 A CN109387966 A CN 109387966A
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- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 2
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- 229910000484 niobium oxide Inorganic materials 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Nonlinear Science (AREA)
- Human Computer Interaction (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
Abstract
The present invention provides a kind of transparent conductive film of yellow after sufficiently transparent electrode layer being inhibited to be formed and the touch panel including the transparent conductive film.Transparent conductive film (9a) and (9b) stack gradually low-index layer (21) on a surface side of transparent substrate (20) and transparent electrode layer (22) forms.The refractive index of low-index layer (21) be 1.42 to 1.50, low-index layer (21) with a thickness of 150 to 190nm.Transparent conductive film (9a) and (9b) in CIE L*a*b*A in color space*Value is -0.75 to+0.75, b*Value is -0.1 to+0.6, in addition, the reflectance spectrum of the light of 400 to 800nm wavelength region obtains maximum value in the range of 500 to 620nm.
Description
Technical field
The present invention relates to be laminated with transparent conductive film made of refractive index adjustment layer and transparent electrode layer over the transparent substrate
And the touch panel including the transparent conductive film.
Background technique
As the display device of electronic equipment, it is widely used for for transparent conductive film being fitted in the polarisation of liquid crystal display panel
The touch panel constituted on the surface of plate.Transparent conductive film is to be laminated on the film constituted based on transparent substrate by saturating
Material obtained by the transparent electrode layer that bright conductive material is constituted.As the forming material of transparent electrode layer, can be widely used
Tin indium oxide (ITO).
In recent years, it is reduced the requirement of the resistance of transparent conductive film, in order to realize the requirement, needs to increase transparent electrode layer
Thickness.However, the light transmission rate of ITO wavelength below for 550nm is low, if being laminated as transparent electrode layer, can be in
Reveal yellow, if thus increase the thickness of transparent electrode layer being made of ITO, transparent conductive film can be made further to have Huang
Color.
Conventionally, by transparent conductive film, there are the parts of transparent electrode layer and the part that transparent electrode layer is not present
The difference of optical characteristics to inhibit the pattern of transparent electrode visually identified phenomenon, thus is developed in transparent substrate
Setting has the method for the optical adjustment layer of set refractive index (for example, referring to Japanese Unexamined Patent Publication 2003- between transparent electrode layer
No. 80624 bulletins, Japanese Unexamined Patent Publication 2010-15861 bulletin, Japanese Patent No. No. 5078534 bulletins, Japanese Patent No.
No. 4364938 bulletins).
However, in conventional optical adjustment layer, it is difficult to be adequately suppressed the transparent electrode being made of compared with conventional ITO
The yellow of the thicker transparent conductive film of layer.
Summary of the invention
Therefore, the transparent of yellow after sufficiently transparent electrode layer being inhibited to be formed the purpose of the present invention is to provide one kind is led
Electrolemma and touch panel including the transparent conductive film.
It is transparent obtained by low-index layer and transparent electrode layer the present invention relates to being stacked gradually in the one side of transparent substrate
Conductive film, the present invention is characterized in that: the refractive index of low-index layer be 1.42 to 1.50, low-index layer with a thickness of 150
To 190nm, transparent conductive film in CIE L*a*b*A in color space*Value is -0.75 to+0.75, b*Value for -0.1 to+
The reflectance spectrum of the light of 0.6,400 to 800nm wavelength region obtains maximum value in the range of 500 to 620nm.
Moreover, it relates to stack gradually high refractive index hard coat, low-index layer in the one side of transparent substrate
And transparent conductive film obtained by transparent electrode layer, the present invention is characterized in that: the refractive index of high refractive index hard coat is 1.63
To 1.67, the refractive index of low-index layer is 1.42 to 1.50, low-index layer with a thickness of 150 to 190nm, transparent conductive film
In CIE L*a*b*A in color space*Value is -0.75 to+0.75, b*The wavelength that value is -0.1 to+0.6,400 to 800nm
The reflectance spectrum of the light in region obtains maximum value in the range of 500 to 620nm.
According to the present invention it is possible to provide it is a kind of sufficiently transparent electrode layer can be inhibited to be formed after yellow transparent conductive film and
Touch panel including the transparent conductive film.
Referring to attached drawing, these and other purposes, feature, aspect and effect of the invention will be made by detailed description below
It becomes more clear.
Brief Description Of Drawings
Fig. 1 is the cross-sectional view for showing the configuration example of the image display device including touch panel.
Fig. 2 is the cross-sectional view for showing an example of layer composition for transparent conductive film shown in FIG. 1.
Fig. 3 is the cross-sectional view for showing another example of layer composition of transparent conductive film shown in FIG. 1.
Fig. 4 is the cross-sectional view for showing another example of layer composition of transparent conductive film shown in FIG. 1.
Fig. 5 is the reflectance spectrum of embodiment 3, transparent conductive film involved in comparative example 2 and comparative example 3.
Specific embodiment
Fig. 1 is the cross-sectional view for showing the configuration example of the image display device including touch panel.
Image display device 1 conforms to the touch surface of image display panel 2 including image display panel 2, via adhesive layer 8
Plate 3 and the cover-plate glass 12 that the surface of touch panel 3 is conformed to via adhesive layer 11.It should be noted that upper in Fig. 1
The face side (viewable side) of side correspondence image display device 1, the back side of downside correspondence image display device 1 in Fig. 1.
Image display panel 2 successively includes backlight 4, polarizer 5, liquid crystal surface from the reverse side of image display device 1
Plate 6 and polarizer 7.Touch panel 3 by across adhesive layer 10 stacking have transparent electrode transparent conductive film 9a and 9b from
And it constitutes.The polarizer 7 of image display panel 2 and the transparent conductive film 9a of touch panel 3 are via the side for being provided only on polarizer 7
The adhesive layer 8 of edge, is bonded by GAP TYPE.Above-mentioned adhesive layer 8,10 and 11 is by (for example) transparent optical bonding film (OCA；
Optical Clear Adhesive film) it constitutes.
Fig. 2 to 4 is the cross-sectional view for showing an example of layer composition for transparent conductive film shown in FIG. 1.
Transparent conductive film 9a and 9b shown in Fig. 2 is to stack gradually transparent substrate 20, low-index layer 21 and transparent electrode
Film obtained by layer 22.
In addition, as shown in figure 3, high refractive index can also to be further arranged between transparent substrate 20 and low-index layer 21 hard
Matter coating 23.
In addition, other than the layer of transparent conductive film 9a and 9b shown in Fig. 2 is constituted, as shown in figure 4, can also be in transparent base
Antiblocking layers 24 are set on the face with the face opposite side for being provided with low-index layer 21 in the two sides of material 20.
It should be noted that, although omitted in the example shown, but in transparent conductive film 9a and 9b shown in Fig. 3,
Antiblocking layers can also be set on the face with the face opposite side for being provided with low-index layer 21 in the two sides of transparent substrate 20
24。
Transparent conductive film 9a and 9b according to the present invention is used as optical adjustment layer by setting low-index layer 21, thus
Meet the following conditions (1) and (2) simultaneously.By meeting condition (1) and (2) simultaneously, in the yellow from transparent electrode layer 22
While sense is inhibited, also inhibit with purple.
(1)CIE L*a*b*The a through light in color space*Value is -0.75 to+0.75, through the b of light*Value is -0.1
To+0.6.
The spectrum of the reflectivity of the light of (2) 400 to 800nm wavelength region obtains maximum in the range of 500 to 620nm
Value.
Hereinafter, each layer for constituting transparent conductive film 9a and 9b is described in detail.
(transparent substrate)
Transparent substrate 20 is the film of the matrix as transparent conductive film 9a and 9b, by the material shape that visible light permeability is excellent
At.As the forming material of transparent substrate 20, the polyolefin such as polyethylene, polypropylene, polyethylene terephthalate can be used
The polyester such as ester, polybutylene terephthalate (PBT), polyethylene naphthalate, the polyamide such as nylon 6, nylon66 fiber, polyamides are sub-
Amine, polyarylate, polycarbonate, polyacrylate, polyether sulfone, the transparent resins such as polysulfones or unorganic glass.In these, preferably
Use the film being made of polyethylene terephthalate.The thickness of transparent substrate 20 is not particularly limited, but preferably 10 μm extremely
200μm。
(low-index layer)
Low-index layer 21 is the part in order to make to have the part of transparent electrode layer 22 with no transparent electrode layer 22
Color difference reduces and the optical adjustment layer of setting.By the way that low-index layer 21 is arranged, to may make transparent conductive film 9a and 9b
Through a of light*Value is -0.75 to+0.75, through the b of light*Value be -0.1 to+0.6, thus can inhibit transparent conductive film 9a and
The yellow of 9b.The refractive index of low-index layer 21 is set as 1.42 to 1.50.If the refractive index of low-index layer 21 less than 1.42,
The then a through light of transparent conductive film*Value increases, through the b of light*Value becomes smaller than -0.1, thus transparent conductive film 9a and 9b band
There is purple.On the other hand, if the refractive index of low-index layer 21 is greater than 1.50, the b through light of transparent conductive film 9a and 9b*
Value becomes larger than+0.6, thus becomes that yellow can not be inhibited.
In addition, the thickness of low-index layer 21 is set as 150 to 190nm.If the thickness of low-index layer 21 is in the range
In addition, then the maximum value of the spectrum of the reflectivity of transparent conductive film 9a and 9b can be transparent to lead other than 500 to 620nm range
The b through light of electrolemma 9a and 9b*Value becomes larger than+0.6.As a result, becoming that transparent conductive film 9a and 9b can not be inhibited
Yellow.
Low-index layer 21 can be formed in the following manner, i.e., will comprising the binders such as ionizing radiation gel-type resin with
And as needed and the inorganic fine particles of addition coating fluids are coated on transparent substrate 20, then make curing of coating by photopolymerization.
There is no particular limitation for the binder used in the coating fluid or additive, preferably using the refractive index after solidifying above-mentioned
Material in range.There is no particular limitation for the coating method of coating fluid, and flow coat method, spray coating method, rolling method, gravure roll can be used
Coating, gas scraper for coating method, scraper coating method, line scrape rubbing method, cutter painting method, reversed rubbing method, transmitting rolling method, micro gravure
Rubbing method, contact rubbing method (キ ス コ ー テ ィ Application グ), cast coating method, slot rubbing method, calendering rubbing method, die coating method etc.
Well known wet coating method.It, can be using the irradiation of (for example) ultraviolet light or electronics as the method for the curing of coating for making coating fluid
Beam irradiation.In the case where ultraviolet light irradiation, high-pressure sodium lamp, tungsten halogen lamp, xenon lamp, FUSION lamp (フ ュ ー ジ ョ Application can be used
ラ Application プ) etc..Ultraviolet irradiation amount is usually about 100 to 800mJ/cm2。
(transparent electrode layer)
Transparent electrode layer 22 is by using refractive index such as tin indium oxide (ITO), indium oxide, zinc oxide, tin oxide, titanium oxide
For 1.7 to 2.2 transparent conductive material and formed.In order to reduce resistance to increase thickness, preferably make transparent
Electrode layer 22 with a thickness of 20 to 30nm.
There is no particular limitation for the forming method of transparent electrode layer 22, can pass through sputtering method, vacuum vapour deposition, ion plating
The formation such as method, chemical vapour deposition technique (CVD method).In the case where forming transparent electrode layer 22 by ITO, in order to tie ITO
Crystalline substance is made annealing treatment at about 100 to 200 DEG C after film forming.Later, by the patterned predetermined shape of transparent electrode layer 22, from
And it is formed with multiple transparent electrodes of rectangular arrangement.
(high refractive index hard coat)
High refractive index hard coat 23 can be formed in the following manner, i.e., will be viscous comprising ionizing radiation gel-type resin etc.
The coating fluid of knot agent and high-refractive index particulate is coated on transparent substrate 20, then makes curing of coating by photopolymerization.In the painting
There is no particular limitation for binder used in cloth liquid or additive, preferably within the above range using the refractive index after solidifying
Material.For example, zirconium oxide, titanium oxide, niobium oxide, antimony trioxide, antimony pentaoxide, oxygen can be used as high refractive index particle
Change the metal oxides such as tin, ATO, indium oxide, ITO, zinc oxide.In these high-index materials, due to the refraction of zirconium oxide
Rate is relatively high, and can promote the transparency of high refractive index hard coat 23, thus more preferably.High-refractive index particulate
Partial size is 10 to 100nm.In order to improve the binding force with binder, more preferably reflected using surface through the height of organic chain modified mistake
Rate particulate.The coating method and curing method of coating fluid may be used at side shown in the forming method of above-mentioned low-index layer
Method.
Such as the configuration example of Fig. 3, in the case where high refractive index hard coat 23 is arranged, by high refractive index hard coat 23
Refractive index is set as 1.63 to 1.67.If the refractive index of high refractive index hard coat less than 1.63, transparent conductive film 9a's and 9b
Through the b of light*Value becomes larger than+0.6, and transparent conductive film 9a and 9b have yellow.On the other hand, if high refractive index hard coat
Refractive index become larger than 1.67, then the b through light of transparent conductive film 9a and 9b*Value becomes smaller than -0.1, transparent conductive film
9a and 9b has purple.In addition, if the refractive index of high refractive index hard coat becomes larger than 1.67,400 to 800nm wavelength
The reflectance spectrum of the light in region becomes contoured waveform, due to the interference item of high refractive index hard coat 23 and transparent substrate 20
There is iris in line, transparent electrode layer 22.Additionally, it is preferred that make high refractive index hard coat 23 with a thickness of 1.0 to 2.0 μm.
(antiblocking layers)
Antiblocking layers 24 be when transparent conductive film 9a and 9b is manufactured in roll-to-roll mode and/or manufacture after, be
The layer for preventing the adherency between film and being arranged, there is a subtle bumps on the surface of antiblocking layers 24.It is this subtle
Bumps are formed by particulate contained by antiblocking layers 24.Antiblocking layers 24 can be formed in the following manner, i.e., will include electricity
Coating fluid from the binders such as radiation-curing type resin and particulate is coated on transparent substrate 20, then makes to apply by photopolymerization
Film solidification.There is no particular limitation for the binder used in the coating fluid or additive, and well known substance can be used.For example,
As particulate, it can be used the inorganic fine particles or acrylic resin or styrene resin etc. such as silica, talcum organic micro-
Particle.
It should be noted that being used to form above-mentioned low-index layer 21, high refractive index hard coat 23 and antiblocking layers
In 24 coating fluid, as needed, Photoepolymerizationinitiater initiater, solvent, detergent, surface conditioner, levelling agent, refraction can also be added
Rate regulator, photosensitizer etc..
As described above, in transparent conductive film 9a and 9b according to the present invention, by the way that 21 conduct of low-index layer is arranged
Optical adjustment layer, so that there are the color difference of the part of transparent electrode layer 22 and the part that transparent electrode layer 22 is not present after patterning
Become smaller, even if can also sufficiently inhibit by transparent electrode in the case where increasing the thickness of transparent electrode layer 22 compared with conventional
Layer 22 and the yellow sense come, and transparent conductive film 9a and 9b can also be inhibited with purple.In addition, by transparent substrate 20
It is inserted into low-index layer 21 (and high refractive index hard coat 23) between transparent electrode layer 22, transparent electrode layer can be improved
22 dhering strength relative to transparent substrate 20.
Embodiment
Hereinafter, being illustrated for the embodiment that transparent conductive film according to the present invention is embodied.
(embodiment 1 to 5, comparative example 1 to 4)
The film of layer composition shown in Fig. 2 is made as transparent conductive film involved in embodiment 1 to 5 and comparative example 1 to 4.
Firstly, low-index layer formation shown in table 1 is coated on the poly terephthalic acid with a thickness of 50 μm with coating fluid
In the one side of glycol ester film, then it is dried.Later, using ultraviolet lamp and with 250mJ/cm2Exposure dose
It carries out ultraviolet light irradiation and forms low-index layer to make curing of coating.It is used it should be noted that low-index layer is formed
Coating fluid is coated in such a way that the thickness after drying is as value shown in table 1.
Then, on the low-index layer of resulting stacked film, by sputtering method and with thickness documented by table 1 by ITO
It forms a film, is made annealing treatment at 150 DEG C after film forming, to form transparent electrode layer, obtained transparent conductive film.
(embodiment 6 to 14, comparative example 5 and 6)
The film of layer composition shown in Fig. 3 is made as transparent conductive film involved in embodiment 6 to 14 and comparative example 5 and 6.
Firstly, high refractive index hard coat formation shown in table 1 is coated on coating fluid poly- to benzene with a thickness of 50 μm
In the one side of naphthalate film, then it is dried.Later, using ultraviolet lamp and with 200mJ/cm2Photograph
It penetrates dosage progress ultraviolet light irradiation and forms high refractive index hard coat to make curing of coating.It should be noted that high folding
It penetrates the formation of rate hard coat and is coated in such a way that the thickness after drying becomes 1.5 μm with coating fluid.
Then, it on the high refractive index hard coat of resulting stacked film, is coated with low-index layer shown in table 1 and forms use
Coating fluid, then be dried.Later, using ultraviolet lamp and with 250mJ/cm2Exposure dose carry out ultraviolet light photograph
It penetrates, to make curing of coating, forms low-index layer.It should be noted that low-index layer formation coating fluid is with drying
The mode that thickness afterwards becomes value shown in table 1 is coated.
Then, on the low-index layer of resulting stacked film, by sputtering method and with thickness documented by table 1 by ITO
It forms a film, is made annealing treatment at 150 DEG C after film forming, to form transparent electrode layer, obtained transparent conductive film.
As described below, to a through light of gained transparent conductive film*Value and b*Value, rainbow hot spot (rainbow system ラ) have
Maximum value without reflectance spectrum in, 400 to 800nm wave-length coverage is evaluated.
[through a of light*Value and b*Value]
Using spectrophotometer (UV-4100, Hitachi Co., Ltd), from transparency conducting layer side with 5 ° of incidence angle
Irradiation light, and determine a through light*Value and b*Value.
[the presence or absence of rainbow hot spot]
Polyethylene terephthalate film with black adhesive layer is fitted into the back side of gained transparent conductive film (not
The face of the transparent substrate of the side of laminating transparent electrode layer), and confirmed by visual observation whether transparent electrode layer side generates rainbow
The interference fringe (rainbow hot spot) of color.
[reflectivity of 400 to 800nm wave-length coverage]
Using spectrophotometer (UV-4100, Hitachi Co., Ltd), make in 400 to 800nm wave-length coverage
Change to the every 1nm of wavelength, and determines the light reflectivity of transparent conductive film from transparency conducting layer side irradiation light simultaneously.By being surveyed
The spectrum of fixed light reflectivity determines the wavelength that maximum value is obtained in the range of 500 to 620nm.
Table 1 is shown used in the production of the transparent conductive film involved in embodiment 1 to 14 and comparative example 1 to 6
Coating fluid, the thickness of each layer, low-index layer and high refractive index hard coat refractive index, a*Value and b*Value, rainbow hot spot have
Without (zero: without rainbow hot spot, ×: have rainbow hot spot), wave when reflectance spectrum becomes maximum value in the range of 500 to 620nm
It is long.
In addition, Fig. 5 shows the reflectance spectrum of transparent conductive film involved in embodiment 3, comparative example 2 and comparative example 3.
As shown in table 1, it has been confirmed that any one for transparent conductive film involved in embodiment 1 to 14, a*Value-
In the range of 0.75 to+0.75, b*In the range of -0.1 to+0.6, reflectance spectrum obtains value in the range of 500 to 620nm
Maximum value, even if also inhibiting the yellow from transparency conducting layer being more than to form transparency conducting layer under the thickness of 20nm.Separately
Outside, any one for transparent conductive film involved in embodiment 1 to 14, it is unconfirmed to have rainbow hot spot.
For transparent conductive film involved in comparative example 1, since the refractive index of its low-index layer is less than 1.42, a*Value and
b*Value is inhibiting other than range required for tone, thus transparent conductive film has purple.
For transparent conductive film involved in comparative example 2 and 3, due to its low-index layer thickness 150 to 190nm's
Other than range, thus reflectance spectrum does not obtain maximum value, and b in the range of 500 to 620nm*Value becomes larger, transparent conductive film
With yellow.
For transparent conductive film involved in comparative example 4, since the refractive index of low-index layer is greater than 1.50, thus b*Value
Become larger, transparent conductive film has yellow.
For comparative example 5 and 6, although the refractive index of low-index layer and thickness are inhibiting in range required for tone,
But the refractive index of high refractive index hard coat is other than the scope of the present invention.More specifically, for involved in comparative example 5
Transparent conductive film, since the refractive index of its high refractive index hard coat is less than 1.63, thus b*Value becomes larger, and transparent conductive film has
Yellow.In addition, for transparent conductive film involved in comparative example 6, since the refractive index of its high refractive index hard coat is greater than
1.67, thus produce rainbow hot spot (irised interference fringe).
It, can in transparent conductive film and touch panel including the transparent conductive film by upper it has been confirmed that according to the present invention
To be adequately suppressed yellow.
The present invention can be used for the transparent conductive film used in touch panel.
More than, although invention is explained in detail, explanation above-mentioned is all only this hair in all respects
Bright illustration limits its range without being intended to.It is self-evident, can carry out the various improvement for not departing from the scope of the present invention or
Deformation.
Claims (5)
1. a kind of transparent conductive film, stacks gradually low-index layer in the one side of transparent substrate and transparent electrode layer forms,
It is characterized by:
The refractive index of the low-index layer is 1.42 to 1.50, the low-index layer with a thickness of 150 to 190nm,
The transparent conductive film in CIE L*a*b*A in color space*Value is -0.75 to+0.75, b*Value for -0.1 to+
0.6, and
The reflectance spectrum of the light of 400 to 800nm wavelength region obtains maximum value in the range of 500 to 620nm.
2. a kind of transparent conductive film stacks gradually high refractive index hard coat, low-index layer in the one side of transparent substrate
And transparent electrode layer forms, it is characterised in that:
The refractive index of the high refractive index hard coat is 1.63 to 1.67,
The refractive index of the low-index layer is 1.42 to 1.50, the low-index layer with a thickness of 150 to 190nm,
The transparent conductive film in CIE L*a*b*A in color space*Value is -0.75 to+0.75, b*Value for -0.1 to+
0.6, and
The reflectance spectrum of the light of 400 to 800nm wavelength region obtains maximum value in the range of 500 to 620nm.
3. transparent conductive film according to claim 1 or 2, it is characterised in that: the low-index layer and the transparent electricity
The dhering strength of pole layer is higher than the dhering strength of the transparent substrate and the transparent electrode layer.
4. transparent conductive film according to claim 1 or 2, it is characterised in that: enterprising in the another side of the transparent substrate
One step includes antiblocking layers.
5. a kind of touch panel comprising transparent conductive film according to claim 1 or 2.
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