CN109360900A - A kind of display panel and preparation method thereof - Google Patents
A kind of display panel and preparation method thereof Download PDFInfo
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- CN109360900A CN109360900A CN201811075693.5A CN201811075693A CN109360900A CN 109360900 A CN109360900 A CN 109360900A CN 201811075693 A CN201811075693 A CN 201811075693A CN 109360900 A CN109360900 A CN 109360900A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
- H10K50/824—Cathodes combined with auxiliary electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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Abstract
This application discloses a kind of display panels and preparation method thereof, auxiliary electrode and anode in the display panel are set on substrate, pixel defining layer covers auxiliary electrode and anode, and anode and auxiliary electrode portion are exceptionally revealed, cathode insulated column is set on the exposed part of auxiliary electrode, isolation platform in cathode insulated column is conductive and contacts with auxiliary electrode, insulated column main body in cathode insulated column is set on isolation platform, luminescent layer covers on pixel defining layer, anode and the exposed part of auxiliary electrode, and is separated by cathode insulated column；Cathode is covered on luminescent layer, and is separated by cathode insulated column, and cathode is at least contacted with isolation platform.It is electrically connected by the above-mentioned means, the application can be realized cathode with the effective of auxiliary electrode, individually control cathode is realized, so that display panel is shown uniformly.
Description
Technical field
This application involves field of display technology, and in particular to a kind of display panel and preparation method thereof.
Background technique
Surmount liquid crystal display because Organic Light Emitting Diode (Organic Light-Emitting Diode, OLED) has
The display characteristic and quality of (Liquid Crystal Display, LCD), such as lightening, short reaction time, low driving
It the advantages that voltage, preferably display color and display view angle, is widely paid close attention to by everybody.It is new to develop day by OLED in recent years
The moon is different, can not only make curved-surface display, while also gradually developing to large scale.But there is problem of pressure drop again in large scale, especially
It is the display panel for top emitting, and cathode relatively thin the problem of leading to pressure drop is more urgently to be resolved, therefore makes in technique auxiliary
Electrode and cathode insulated column are helped, cathode isolation is opened to achieve the purpose that individually to control cathode to reduce pressure drop.
Present inventor has found in long-term R & D, auxiliary in the case where the processing procedure of vapor deposition luminescent layer controls bad situation
Electrode is helped all to be covered by luminescent layer, cathode can not be connect with auxiliary electrode, abnormal so as to cause display.
Summary of the invention
The application mainly solves the problems, such as to be to provide a kind of display panel and preparation method thereof, can be realized cathode and auxiliary
Effective electrical connection of electrode realizes individually control cathode, so that display panel is shown uniformly.
In order to solve the above technical problems, the application is the technical solution adopted is that provide a kind of display panel, the display panel
It include: substrate, auxiliary electrode, anode, pixel defining layer, cathode insulated column, luminescent layer and cathode；Auxiliary electrode is set to substrate
On；Anode is set on substrate；Pixel defining layer is covered on auxiliary electrode and anode, and makes anode and auxiliary electrode through picture
Plain definition layer part is exposed；Cathode insulated column is set to auxiliary electrode through on the exposed part of pixel defining layer, cathode insulated column
Including isolation platform and insulated column main body, isolation platform is conductive and contacts with auxiliary electrode, and insulated column main body has insulating properties
And it is set on isolation platform；Luminescent layer is covered in pixel defining layer and anode and the auxiliary electrode portion exposed through pixel defining layer
On point, and separated by cathode insulated column；Cathode is covered on luminescent layer, and is separated by cathode insulated column, and cathode is extremely
It is few to be contacted with isolation platform.
In order to solve the above technical problems, another technical solution that the application uses is to provide a kind of production side of display panel
Method, this method comprises: providing a substrate；Auxiliary electrode and anode are formed on substrate；Picture is formed on auxiliary electrode and anode
Plain definition layer, and make anode and auxiliary electrode exposed through pixel defining layer part；It is exposed through pixel defining layer in auxiliary electrode
Part on form cathode insulated column；On pixel defining layer and anode and the auxiliary electrode part exposed through pixel defining layer
Form luminescent layer；Cathode is formed on the light-emitting layer；Wherein, cathode insulated column includes isolation platform and insulated column main body, isolation platform tool
Conductive and contact with auxiliary electrode, insulated column main body has insulating properties and is set on isolation platform, luminescent layer by cathode every
Separated from column, cathode is separated by cathode insulated column, and is at least contacted with isolation platform.
Through the above scheme, the beneficial effect of the application is: the application designs the yin with isolation platform on auxiliary electrode
Pole insulated column contacts cathode with the isolation platform in cathode insulated column, since isolation platform is conductive, even if cathode
It is not directly electrically connected to auxiliary electrode, can also realize that cathode is electrically connected with the effective of auxiliary electrode by isolation platform, thus
It realizes individually control cathode, improves problem of pressure drop, so that display panel is shown uniformly.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.Wherein:
Fig. 1 is the structural schematic diagram of one embodiment of display panel provided by the present application；
Fig. 2 is the structural schematic diagram of another embodiment of display panel provided by the present application；
Fig. 3 is the flow diagram of one embodiment of production method of display panel provided by the present application；
Fig. 4 is the structural schematic diagram of each step based on the manufacture display panel of method shown in Fig. 3.
Specific embodiment
Below in conjunction with the attached drawing in the embodiment of the present application, technical solutions in the embodiments of the present application carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of embodiments of the present application, rather than whole embodiments.Based on this
Embodiment in application, those of ordinary skill in the art are obtained every other under the premise of not making creative labor
Embodiment shall fall in the protection scope of this application.
Refering to fig. 1, Fig. 1 is the structural schematic diagram of one embodiment of display panel provided by the present application, which includes:
Substrate 111, auxiliary electrode 112, anode 113, pixel defining layer 114, cathode insulated column 115, luminescent layer 116 and cathode 117.
Substrate 111 can be glass substrate or resin substrate；Auxiliary electrode 112 and anode 113 are set on substrate 111,
And auxiliary electrode 112 and anode 113 are set to same layer；Auxiliary electrode 112 can be molybdenum, aluminium, titanium, copper, silver or indium oxide
The conductive materials such as tin (Indium Tin Oxides, ITO).
Pixel defining layer 114 is covered on auxiliary electrode 112 and anode 113, and makes anode 113 and auxiliary electrode 112
It is exposed through 114 part of pixel defining layer, and pixel defining layer 114 covers the interstice coverage between auxiliary electrode 112 and anode 113
Domain.The material of pixel defining layer 114 can be positivity or negativity photoresist.
Cathode insulated column 115 is set to auxiliary electrode 112 through on the exposed part of pixel defining layer 114, cathode insulated column
115 include isolation platform 1151 and insulated column main body 1152, and isolation platform 1151 is conductive and contacts with auxiliary electrode 112, every
There is insulating properties from column main body 1152 and be set on isolation platform 1151.
Isolation platform 1151 is conductive metal material, specifically, can have for molybdenum, aluminium, titanium, copper, silver or ITO etc. and lead
Electrical material.The material of isolation platform 1151 may be selected to that the material of auxiliary electrode 112 is different from overlapped below.
Insulated column main body 1152 is the multiple film layers obtained by chemical vapor deposition, is at least two layers or more of film
Structure, consistency at least successively increases multiple film layers from bottom to up.
Luminescent layer 116 be covered in pixel defining layer 114 and anode 113 and auxiliary electrode 112 through pixel defining layer 114 outside
On the part of dew, and separated by cathode insulated column 115；Luminescent layer can be made by the method for vapor deposition or inkjet printing
116。
Cathode 117 is covered on luminescent layer 116, and is separated by cathode insulated column 115, cathode 117 at least be isolated
Platform 1151 contacts；Cathode 117 can be transparent metal electrode, such as ITO can be by way of being deposited or printing by cathode
117 are formed on luminescent layer 116.
Due to the height with higher of cathode insulated column 115, so as to which cathode 117 is separated；By in auxiliary electrode
Cathode insulated column 115 is set on 112, cathode 117 is contacted with the isolation platform 1151 in cathode insulated column 115, due to
It is conductive that platform 1151 is isolated, it, can also be by the way that platform be isolated even if cathode 117 is not directly electrically connected to auxiliary electrode 112
1151 realization cathodes 117 are electrically connected with the effective of auxiliary electrode 112, to realize individually control cathode 117, are improved pressure drop and are asked
Topic, so that display panel is shown uniformly.
Fig. 1 is further regarded to, cathode 117 is further contacted with the auxiliary electrode 112 of 1151 periphery of isolation platform.It is specific next
It says, can be during the vapor deposition of luminescent layer 116, the vapor deposition angle by controlling luminescent layer 116 makes that 1151 periphery of platform is isolated
Auxiliary electrode 112 is exposed through luminescent layer 116.Further, during the vapor deposition of cathode 117, by the vapor deposition for controlling cathode 117
Angle, and cathode 117 is contacted with the auxiliary electrode 112 that 1151 periphery of platform is isolated.At this point, cathode 117 is auxiliary except through contacting
It helps electrode 112 to realize outer with directly be electrically connected for auxiliary electrode 112, the realization of platform 1151 and auxiliary electrode is also isolated by contact
112 indirect electrical connection, connection effect are relatively reliable.
With continued reference to Fig. 1, display panel further includes planarization layer 118, driving circuit 119 and auxiliary circuit in the application
120。
Driving circuit 119 and auxiliary circuit 120 are set on substrate 111, and planarization layer 118 covers 119 He of driving circuit
Auxiliary circuit 120, planarization layer 118 can be in film and polyimide material made of chemical vapor deposition at least
It is a kind of.
Anode 113 and auxiliary electrode 112 are set on planarization layer 118, and pass through the through-hole on planarization layer 118 respectively
1181 are electrically connected to driving circuit 119 and auxiliary circuit 120.
The material that platform 1151 is isolated is different from auxiliary electrode 112, and the width of insulated column main body 1152 is in separate substrate 111
It is gradually increased on direction.For example, insulated column main body 1152 is arranged in inverted trapezoidal in Fig. 1.Specifically, insulated column main body 1152
Including the multiple film layers being stacked, the elching resistant of multiple film layers successively increases on the direction far from substrate 111, Jin Ertong
It crosses aforesaid way and realizes above-mentioned shape.
Further, display panel further includes shading metal pattern 121 and buffer layer 122, and shading metal pattern 121 is arranged
In on substrate 111, buffer layer 122 is set on substrate 111 and covers shading metal pattern 121；Driving circuit 119 can be thin
Film transistor, thin film transistor (TFT) are set to the surface of shading metal pattern 121, the source/drain and anode of thin film transistor (TFT)
113 electrical connections, auxiliary circuit 120 can be metal electrode, be electrically connected respectively with shading metal pattern 121 and auxiliary electrode 112
It connects.
By contacting cathode 117 with auxiliary electrode 112, realizes and individually control cathode 117, improvement problem of pressure drop, so that
Display panel is shown uniformly.In addition, insulated column main body 1152 is set as multiple film layers of stacking, the elching resistant of multiple film layers exists
Successively increase on direction far from substrate 111, after being etched, the width of insulated column main body 1152 is far from substrate 111
Direction on gradually increase, and then be better controlled in the forming region of subsequent luminescent layer 116.
Referring to Fig.2, Fig. 2 is the structural schematic diagram of another embodiment of display panel provided by the present application.In the present embodiment,
Since the processing procedure control of luminescent layer 116 is bad or for otherwise consideration, the exposed parts of auxiliary electrode 112 are all sent out
Photosphere 116 is covered.At this point, cathode 117 still can be electrically connected to auxiliary electrode 112 and with the contact of isolation platform 1151.
Fig. 3 is the flow diagram of one embodiment of production method of display panel provided by the present application,
Fig. 4 is the structural schematic diagram of each step based on the manufacture display panel of method shown in Fig. 3.In conjunction with Fig. 3 and Fig. 4 institute
Show, production method may include steps of:
Step 31: a substrate 111 is provided.
Step 32: auxiliary electrode 112 and anode 113 are formed on substrate 111.
A substrate 111 is provided first, and substrate 111 can be glass substrate or resin substrate, can carry out to substrate 111 clearly
It washes or toasts；Then auxiliary electrode 112 and anode 113 are formed on substrate 111.
Auxiliary electrode 112 can be the conductive material such as molybdenum, aluminium, titanium, copper, silver or ITO.
The metal light-shielding pattern 121 and buffer layer 122 for making stacking on substrate 111 it is possible to further elder generation, then exist
Driving circuit 119 and auxiliary circuit 120 are made on buffer layer 122, and is formed on planarization layer 118, in planarization layer 118
Multiple through-holes 1181 are provided with, for anode 113 and auxiliary electrode 112 is electric with driving circuit 119 and auxiliary circuit 120 respectively
Connection.
Wherein, for 121 array distribution of metal light-shielding pattern on substrate 111, driving circuit 119 is set to metal light-shielding pattern
121 surface and be electrically connected with anode 113, auxiliary circuit 120 respectively with 112 electricity of metal light-shielding pattern 121 and auxiliary electrode
Connection.
Step 33: forming pixel defining layer 114 on auxiliary electrode 112 and anode 113, and make anode 113 and auxiliary
Electrode 112 is exposed through 114 part of pixel defining layer.
The coating photoresistance on auxiliary electrode 112 and anode 113, and the processes such as exposure and imaging are carried out, it is fixed to form pixel
The pattern of adopted layer 114.
Step 34: in auxiliary electrode 112 through forming cathode insulated column 115 on the exposed part of pixel defining layer 114.
Wherein, cathode insulated column 115 includes isolation platform 1151 and insulated column main body 1152, and isolation platform 1151 is conductive
And contacted with auxiliary electrode 112, insulated column main body 1152 has insulating properties and is set on isolation platform 1151.
First in auxiliary electrode 112 through forming isolation platform 1151 on the exposed part of pixel defining layer 114, i.e., not by picture
One layer of conductor material is covered on the auxiliary electrode 112 that plain definition layer 114 covers, and uses wet etching process to be etched to make
Platform 1151 is isolated.
Multiple film layers are deposited on isolation platform 1151 using chemical vapor deposition, the elching resistants of multiple film layers (such as cause
Density) successively increase on the direction far from substrate 111.Photoresist is coated in multiple film layers, be then exposed and develop with
Form predetermined pattern.Multiple film layers are etched by the method for dry ecthing again, so that the width of multiple film layers is from top to bottom
It becomes larger, and after the etch is completed, removes the photoresist in multiple film layers, with formation width on the direction far from substrate 111
The insulated column main body 1152 gradually increased.For example, as shown in figure 4, the cathode insulated column 115 formed after dry ecthing is inverted trapezoidal.
In addition, isolation platform 1151 can also pass through together dry ecthing with insulated column main body 1152 in other implementations
Mode be made.
Step 35: in pixel defining layer 114 and anode 113 and auxiliary electrode 112 portion exposed through pixel defining layer 114
Luminescent layer 116 is formed on point.
Luminescent layer 116 is separated by cathode insulated column 115；In pixel defining layer 114 and anode 113 and auxiliary electrode
112 through being deposited the material of luminescent layer 116 on the exposed part of pixel defining layer 114；Since vapor deposition angle difference causes luminescent layer 116
Coverage area it is different, by controlling the vapor deposition angle of luminescent layer 116, so that the auxiliary electrode 112 of 1151 periphery of isolation platform is through sending out
Photosphere 116 is exposed, i.e., so that the luminescent layer 116 of 114 top of pixel defining layer is not contacted with isolation platform 1151.
Step 36: cathode 117 is formed on luminescent layer 116.
Wherein, cathode 117 is separated by cathode insulated column 115, and is at least contacted with isolation platform 1151.
The evaporation cathode 117 on luminescent layer 116, by control cathode 117 vapor deposition angle so that cathode 117 with platform is isolated
The auxiliary electrode 112 of 1151 peripheries contacts, to ensure that cathode 117 can be directly electrically connected with auxiliary electrode 112, while luminescent layer
116 are separated by cathode insulated column 115.
The production method of display panel can be applied on ordinary display panel in above-described embodiment, can also be applied to
AMOLED (Active-matrix organic light-emitting diode, active matrix organic light-emitting diode) or
In IJP (Ink-Jet Printing, inkjet printing) technology.
It can be made into display panel using the above method, by controlling luminescent layer during the vapor deposition of luminescent layer 116
116 vapor deposition angle, so that cathode 117 is contacted with the auxiliary electrode 112 of 1151 periphery of isolation platform；Even if there is luminescent layer 116
Processing procedure controls bad situation, and the exposed parts of auxiliary electrode 112 are all covered by luminescent layer 116, and cathode 117 can still lead to
It crosses the contact with platform 1151 is isolated and is electrically connected to auxiliary electrode 112；To realize individually control cathode 117, improves pressure drop and ask
Topic, so that display panel is shown uniformly.
Since the elching resistant of multiple film layers successively increases on the direction far from substrate 111, and then in subsequent luminescent layer
116 forming region is better controlled；After overetch, since the characteristic of film layer forms the insulated column of inverted trapezoidal
Main body 1152 has process stability good and not easily to fall off using the insulated column main body 1152 that the method in the present embodiment is formed
The characteristics of, improve the yield of display product.
The above is only embodiments herein, are not intended to limit the scope of the patents of the application, all to be said using the application
Equivalent structure or equivalent flow shift made by bright book and accompanying drawing content is applied directly or indirectly in other relevant technology necks
Domain similarly includes in the scope of patent protection of the application.
Claims (10)
1. a kind of display panel, which is characterized in that the display panel includes:
Substrate；
Auxiliary electrode is set on the substrate；
Anode is set on the substrate；
Pixel defining layer is covered on the auxiliary electrode and the anode, and the anode and the auxiliary electrode are passed through
The pixel defining layer part is exposed；
Cathode insulated column is set to the auxiliary electrode through on the exposed part of the pixel defining layer, wherein the cathode every
It include isolation platform and insulated column main body from column, the isolation platform is conductive and contacts with the auxiliary electrode, the isolation
Column main body has insulating properties and is set on the isolation platform；
Luminescent layer, is covered in the pixel defining layer and the anode and the auxiliary electrode is exposed through the pixel defining layer
Part on, and separated by the cathode insulated column；
Cathode is covered on the luminescent layer, and is separated by the cathode insulated column, wherein the cathode at least with institute
State isolation platform contact.
2. display panel according to claim 1, which is characterized in that the cathode further with it is described be isolated platform periphery
The auxiliary electrode contact.
3. display panel according to claim 1, which is characterized in that the width of the insulated column main body is far from the base
It is gradually increased on the direction of plate.
4. display panel according to claim 3, which is characterized in that the insulated column main body is arranged in inverted trapezoidal.
5. display panel according to claim 3, which is characterized in that the insulated column main body include be stacked it is multiple
Film layer, wherein the elching resistant of the multiple film layer successively increases on the direction far from the substrate.
6. display panel according to claim 1, which is characterized in that the material of the isolation platform is different from the auxiliary electricity
Pole.
7. display panel according to claim 1, which is characterized in that the display panel further comprises:
Driving circuit is set on the substrate；
Auxiliary circuit is set on the substrate；
Planarization layer covers the driving circuit and the auxiliary circuit, wherein the anode and the auxiliary electrode are set to
On the planarization layer, and the driving circuit and auxiliary electricity are electrically connected to by the through-hole on the planarization layer respectively
Road.
8. a kind of production method of display panel, which is characterized in that the described method includes:
One substrate is provided；
Auxiliary electrode and anode are formed on the substrate；
Pixel defining layer is formed on the auxiliary electrode and the anode, and makes the anode and the auxiliary electrode through institute
It is exposed to state pixel defining layer part；
In the auxiliary electrode through forming cathode insulated column on the exposed part of the pixel defining layer, wherein the cathode every
It include isolation platform and insulated column main body from column, the isolation platform is conductive and contacts with the auxiliary electrode, the isolation
Column main body has insulating properties and is set on the isolation platform；
In the pixel defining layer and the anode and the auxiliary electrode through shape on the exposed part of the pixel defining layer
At luminescent layer, wherein the luminescent layer is separated by the cathode insulated column；
Form cathode on the light-emitting layer, wherein the cathode is separated by the cathode insulated column, and at least with it is described
Platform contact is isolated.
9. the production method of display panel according to claim 8, which is characterized in that it is described in the auxiliary electrode through institute
Stating the step of forming cathode insulated column on the exposed part of pixel defining layer includes:
In the auxiliary electrode through forming the isolation platform on the exposed part of the pixel defining layer；
Multiple film layers are formed on the isolation platform, wherein the elching resistant of the multiple film layer is in the side far from the substrate
Successively increase upwards；
The multiple film layer is etched, the isolation gradually increased on the direction far from the substrate with formation width
Column main body.
10. the production method of display panel according to claim 8, which is characterized in that described in the pixel defining layer
And the anode and the auxiliary electrode through forming luminescent layer on the exposed part of the pixel defining layer the step of include:
By controlling the vapor deposition angle of the luminescent layer so that the auxiliary electrode of the isolation platform periphery through the luminescent layer outside
Dew；
It is described on the light-emitting layer formed cathode the step of include:
By controlling the vapor deposition angle of the cathode, so that the cathode is contacted with the auxiliary electrode of the isolation platform periphery.
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