CN109112499A - A kind of novel vapour deposition process prepares the process units of graphene - Google Patents
A kind of novel vapour deposition process prepares the process units of graphene Download PDFInfo
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- CN109112499A CN109112499A CN201811005840.1A CN201811005840A CN109112499A CN 109112499 A CN109112499 A CN 109112499A CN 201811005840 A CN201811005840 A CN 201811005840A CN 109112499 A CN109112499 A CN 109112499A
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 34
- 229910021389 graphene Inorganic materials 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 23
- 238000005137 deposition process Methods 0.000 title claims abstract description 13
- 230000005540 biological transmission Effects 0.000 claims abstract description 42
- 238000010574 gas phase reaction Methods 0.000 claims abstract description 9
- 239000000047 product Substances 0.000 claims description 41
- 238000001816 cooling Methods 0.000 claims description 35
- 239000011265 semifinished product Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 25
- 238000006243 chemical reaction Methods 0.000 claims description 23
- 238000010438 heat treatment Methods 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 13
- 239000012495 reaction gas Substances 0.000 claims description 11
- 239000002912 waste gas Substances 0.000 claims description 10
- 239000000112 cooling gas Substances 0.000 claims description 8
- 230000007613 environmental effect Effects 0.000 claims description 7
- 239000006227 byproduct Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 238000005229 chemical vapour deposition Methods 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- -1 and cost is high Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000009377 nuclear transmutation Methods 0.000 description 2
- 230000033116 oxidation-reduction process Effects 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
- C01B32/186—Preparation by chemical vapour deposition [CVD]
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Nanotechnology (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201811005840.1A CN109112499A (en) | 2018-08-30 | 2018-08-30 | A kind of novel vapour deposition process prepares the process units of graphene |
Applications Claiming Priority (1)
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---|---|---|---|
CN201811005840.1A CN109112499A (en) | 2018-08-30 | 2018-08-30 | A kind of novel vapour deposition process prepares the process units of graphene |
Publications (1)
Publication Number | Publication Date |
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CN109112499A true CN109112499A (en) | 2019-01-01 |
Family
ID=64861588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201811005840.1A Pending CN109112499A (en) | 2018-08-30 | 2018-08-30 | A kind of novel vapour deposition process prepares the process units of graphene |
Country Status (1)
Country | Link |
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CN (1) | CN109112499A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11718527B2 (en) | 2021-12-22 | 2023-08-08 | General Graphene Corporation | Systems and methods for high yield and high throughput production of graphene |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102492934A (en) * | 2011-12-26 | 2012-06-13 | 彭鹏 | Apparatus and method used for preparing graphene, and obtained graphene |
KR20120095707A (en) * | 2011-02-21 | 2012-08-29 | 주식회사 제이오 | Synthetic apparatus and method of continuous and large surface area graphene |
CN103435035A (en) * | 2013-08-20 | 2013-12-11 | 常州二维碳素科技有限公司 | Device and method for continuous preparing and transferring graphene |
CN204324889U (en) * | 2014-12-12 | 2015-05-13 | 重庆墨希科技有限公司 | A kind of fixture preparing Graphene |
CN207702975U (en) * | 2017-12-22 | 2018-08-07 | 青岛科硕新材料科技有限公司 | A kind of graphite sinter production line |
CN209010597U (en) * | 2018-08-30 | 2019-06-21 | 郑州大工高新科技有限公司 | A kind of novel vapour deposition process prepares the process units of graphene |
-
2018
- 2018-08-30 CN CN201811005840.1A patent/CN109112499A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20120095707A (en) * | 2011-02-21 | 2012-08-29 | 주식회사 제이오 | Synthetic apparatus and method of continuous and large surface area graphene |
CN102492934A (en) * | 2011-12-26 | 2012-06-13 | 彭鹏 | Apparatus and method used for preparing graphene, and obtained graphene |
CN103435035A (en) * | 2013-08-20 | 2013-12-11 | 常州二维碳素科技有限公司 | Device and method for continuous preparing and transferring graphene |
CN204324889U (en) * | 2014-12-12 | 2015-05-13 | 重庆墨希科技有限公司 | A kind of fixture preparing Graphene |
CN207702975U (en) * | 2017-12-22 | 2018-08-07 | 青岛科硕新材料科技有限公司 | A kind of graphite sinter production line |
CN209010597U (en) * | 2018-08-30 | 2019-06-21 | 郑州大工高新科技有限公司 | A kind of novel vapour deposition process prepares the process units of graphene |
Non-Patent Citations (1)
Title |
---|
(日)长谷川等: "《电液伺服机构基础与应用》", 黑龙江省煤炭科学研究所;黑龙江省煤矿设计院, pages: 52 * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11718527B2 (en) | 2021-12-22 | 2023-08-08 | General Graphene Corporation | Systems and methods for high yield and high throughput production of graphene |
US11718526B2 (en) | 2021-12-22 | 2023-08-08 | General Graphene Corporation | Systems and methods for high yield and high throughput production of graphene |
US11753304B2 (en) | 2021-12-22 | 2023-09-12 | General Graphene Corporation | Systems and methods for high yield and high throughput production of graphene |
US11827519B2 (en) | 2021-12-22 | 2023-11-28 | General Graphene Corporation | Systems and methods for high yield and high throughput production of graphene |
US11858813B2 (en) | 2021-12-22 | 2024-01-02 | General Graphene Corporation | Systems and methods for high yield and high throughput production of graphene |
US11866333B2 (en) | 2021-12-22 | 2024-01-09 | General Graphene Corporation | Systems and methods for high yield and high throughput production of graphene |
US11866334B2 (en) | 2021-12-22 | 2024-01-09 | General Graphene Corporation | Systems and methods for high yield and high throughput production of graphene |
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PB01 | Publication | ||
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TA01 | Transfer of patent application right |
Effective date of registration: 20200407 Address after: 450000 102, No. 2 building, Xinghua building, 58 Avenue, second Zhengzhou street, Zhengzhou, Henan. Applicant after: Zhengzhou great Gong high and new technologies Co.,Ltd. Address before: 450000 Zhengzhou Free Trade Experimental Zone, Zhengzhou, Henan Province 102, No. 2 Building, Xinghua Building, No. 8, Second Street (Jingkai) Applicant before: Zhengzhou great Gong high and new technologies Co.,Ltd. Applicant before: Dalian University of Technology's Grand Equipments design and manufacture Zhengzhou Research Institute |
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TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20220808 Address after: No. 102, Building 2, Xinghua Building, No. 58, Second Street, Henan Free Trade Pilot Zone, Zhengzhou Area (Jingkai), Zhengzhou City, Henan Province, 450000 Applicant after: Zhengzhou great Gong high and new technologies Co.,Ltd. Applicant after: DALIAN University OF TECHNOLOGY Address before: 450000 102, No. 2 building, Xinghua building, 58 Avenue, second Zhengzhou street, Zhengzhou, Henan. Applicant before: Zhengzhou great Gong high and new technologies Co.,Ltd. |
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TA01 | Transfer of patent application right | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190101 |
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RJ01 | Rejection of invention patent application after publication |