CN109001858B - Polarization beam splitter based on surface plasma sub-wavelength grating - Google Patents
Polarization beam splitter based on surface plasma sub-wavelength grating Download PDFInfo
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- CN109001858B CN109001858B CN201811010642.4A CN201811010642A CN109001858B CN 109001858 B CN109001858 B CN 109001858B CN 201811010642 A CN201811010642 A CN 201811010642A CN 109001858 B CN109001858 B CN 109001858B
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- G—PHYSICS
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/126—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind using polarisation effects
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Abstract
The invention provides a polarization beam splitter based on a surface plasma sub-wavelength grating, which comprises the plasma sub-wavelength grating, a J-shaped silicon waveguide and a first output silicon waveguide, wherein the J-shaped silicon waveguide and the first output silicon waveguide are arranged on two sides of the plasma sub-wavelength grating in parallel at the same interval, the plasma sub-wavelength grating sequentially comprises a first sub-wavelength grating layer, a metal covering layer and a second sub-wavelength grating layer, the metal covering layer is positioned between the two sub-wavelength grating layers with the same width, and the J-shaped silicon waveguide comprises an arc-shaped silicon waveguide, and an input silicon waveguide and a second output silicon waveguide which are connected to two ends of the arc-shaped silicon waveguide. The invention has the beneficial effects that: the polarization beam splitter provided by the invention greatly reduces the coupling length by combining the advantages of the surface plasma and the sub-wavelength grating, realizes the purpose of size reduction, and obtains the effects of high polarization extinction ratio, low insertion loss and large working bandwidth.
Description
Technical Field
The invention relates to the technical field of optical waveguides, in particular to a polarization beam splitter based on a surface plasma sub-wavelength grating.
Background
As a basic functional element of integrated photonic circuits, polarization beam splitters (polarization beam splitters) are useful for many applications when polarization control is required. Especially for coherent receivers and ultra-dense networks on chip, compact polarization splitters with high performance are required. To date, polarizing beam splitters have mostly been based on the principle of mode coupling, or adiabatic mode evolution. However, this technique has the disadvantage of large size.
In order to reduce the size, an effective method is to design a polarization beam splitter waveguide having high birefringence to realize a compact polarization beam splitter. Among them, the surface plasmon waveguide exhibits large birefringence and the surface plasmon propagates along the interface between the dielectric and the metal conductor in the form of an electromagnetic wave, which is an effective method for realizing a high-density integrated photonic circuit.
The sub-wavelength grating is a structure with a grating pitch much smaller than the wavelength of light wave transmitted through the grating, is represented as a uniform medium, has a natural polarization effect due to birefringence caused by geometric asymmetry of the sub-wavelength grating structure, and can modify the material refractive index of the sub-wavelength grating by changing the grating duty ratio. Sub-wavelength gratings provide new degrees of freedom for the design of new photonic devices, and the performance of many devices, including polarizing beam splitters, has been improved. However, the size of the current silicon-based polarization beam splitter is usually about tens of microns, the polarization extinction ratio is difficult to achieve with low insertion loss (about 0.5 dB), the high polarization extinction ratio (about 30 dB), and the operating bandwidth is difficult to cover the whole C (1530-1560 nm) band.
Disclosure of Invention
In view of this, the embodiment of the present invention provides a polarization beam splitter based on a surface plasmon sub-wavelength grating, which has a simple structure, a high polarization extinction ratio, and a large working bandwidth.
The technical scheme adopted by the invention is as follows:
the utility model provides a polarization beam splitter based on sub-wavelength grating of surface plasma, includes the sub-wavelength grating of plasma and locates with the same interval parallel the J type silicon waveguide and the first output silicon waveguide of the sub-wavelength grating both sides of plasma, the sub-wavelength grating of plasma is along following J type silicon waveguide extremely include first sub-wavelength grating layer, metal overburden and second sub-wavelength grating layer in proper order on the first output silicon waveguide direction.
Width w of the J-type silicon waveguide 1 And the width w of the first output silicon waveguide 2 Are equal.
The first sub-wavelength grating width e 1 And the width e of the second sub-wavelength grating 2 Equal and all in the range of 152.5-192.5 nm.
Further, the thickness t of the metal covering layer is in the range of 10-30 nm.
Further, the interval d between the plasma sub-wavelength grating and the J-type silicon waveguide and the first output silicon waveguide is in the range of 175-225 nm.
Further, the J-type silicon waveguide, the plasma sub-wavelength grating and the first output silicon waveguide height h 1、 h 2 And h 3 The same is true.
The J-type silicon waveguide comprises an arc-shaped silicon waveguide, an input silicon waveguide and a second output silicon waveguide which are connected to two ends of the arc-shaped silicon waveguide, the plasma sub-wavelength grating and the input silicon waveguide form a first coupling region, and the coupling length of the first coupling region is L 1 The plasma sub-wavelength grating and the first output silicon waveguide form a second coupling region with a coupling length L 2 。
Further, the coupling length L 1 In the range of 1.7 μm to 2.5 μm, the coupling length L 2 In the range of 1.7 μm to 2.5. Mu.m.
Further, the first sub-wavelength grating layer and the second sub-wavelength grating layer are both made of silicon, and the metal covering layer is made of silver.
Further, the J-type silicon waveguide, the plasma sub-wavelength grating and the first output silicon waveguide are all wrapped in a silica cladding.
The invention has the beneficial effects that: the polarization beam splitter provided by the invention greatly reduces the coupling length by combining the advantages of the surface plasma and the sub-wavelength grating, realizes the purpose of size reduction, and obtains the effects of high polarization extinction ratio, low insertion loss and large working bandwidth.
Drawings
Fig. 1 is a schematic structural diagram of a polarization beam splitter based on a surface plasmon sub-wavelength grating.
FIG. 2 is a partial enlarged cross-sectional view of a coupling region of a surface plasmon sub-wavelength grating based polarizing beam splitter.
FIG. 3 is a graph showing the energy distribution of the TE mode of the input optical signal according to an embodiment of the present invention.
FIG. 4 is a diagram illustrating an energy distribution of a TM mode of an input optical signal according to an embodiment of the present invention.
FIG. 5 is a graph of polarization extinction ratio versus wavelength for a surface plasmon sub-wavelength grating based polarizing beam splitter.
FIG. 6 is a graph of insertion loss versus wavelength for a surface plasmon sub-wavelength grating based polarizing beam splitter.
Wherein: 1-J type silicon waveguide, 11-input silicon waveguide, 12-arc silicon waveguide, 13-second output silicon waveguide, 2-plasma sub-wavelength grating, 21-first sub-wavelength grating layer, 22-metal covering layer, 23-second sub-wavelength grating layer, 3-first output silicon waveguide and 4-cladding layer.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the respective embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
As shown in fig. 1 and 2, the structure diagram of an embodiment of a polarization beam splitter based on a surface plasmon sub-wavelength grating includes a plasmon sub-wavelength grating 2, and a J-type silicon waveguide 1 and a first output silicon waveguide 3 that are disposed in parallel at the same interval on both sides of the plasmon sub-wavelength grating 2, where the plasmon sub-wavelength grating 2 sequentially includes a first sub-wavelength grating layer 21, a metal covering layer 22, and a second sub-wavelength grating layer 23 along a direction from the J-type silicon waveguide 1 to the first output silicon waveguide 3 (taking left to right as an example in the figure), the J-type silicon waveguide 1 includes an arc-shaped silicon waveguide 12, and an input silicon waveguide 11 and a second output silicon waveguide 13 that are connected to both ends of the arc-shaped silicon waveguide 12, the J-type silicon waveguide 1, the plasmon sub-wavelength grating 2, and the first output silicon waveguide 3 are the same in height, and the J-type silicon waveguide 1, the plasmon sub-wavelength grating 2, and the first output silicon waveguide 3 are all wrapped in a silica covering layer 4.
In the present embodiment, the width w of the J-type silicon waveguide 1 1 And stationThe width w of the first output silicon waveguide 3 2 Equal; width e of the first sub-wavelength grating layer 21 1 And a width e of the second sub-wavelength grating layer 23 2 Equal, each in the range of 152.5-192.5nm, the thickness t of the metal cap layer 22 being in the range of 10-30 nm; the interval d between the plasma sub-wavelength grating 2 and the J-type silicon waveguide 1 and the first output silicon waveguide 3 is in the range of 175-225 nm;
the plasma sub-wavelength grating 2 and the input silicon waveguide 11 form a first coupling region with a coupling length L 1 The plasma sub-wavelength grating 2 and the first output silicon waveguide 3 form a second coupling region with a coupling length L 2 . The coupling length L 1 In the range of 1.7 μm to 2.5 μm, the coupling length L 2 In the range of 1.7 μm to 2.5. Mu.m.
Preferably, the period Λ of the plasma sub-wavelength grating 2 is 300nm, and the duty ratio is 0.7.
Preferably, the curved silicon waveguide 12 has a curvature θ =90 ° and a radius R =3 μm.
Preferably, the material of the first sub-wavelength grating layer 21 and the second sub-wavelength grating layer 23 is silicon, and the material of the metal covering layer 22 is silver.
Preferably, the plasmon sub-wavelength grating 2 has a height h 2 340nm, the height h of the J-type silicon waveguide 1 1 And a height h of said first output silicon waveguide 3 3 Are all 340nm and have a width w 1 、w 2 Are all 250nm.
Referring to fig. 1 and 2, the input optical signals of the polarization beam splitter are two single-mode light sources, i.e., a TE mode (transverse electric wave) and a TM mode (transverse magnetic wave), respectively, and the splitting process is as follows: after an input optical signal is input from the input silicon waveguide 11 and enters the first coupling region, as effective refractive indexes of TE mode optical signals in the plasmon sub-wavelength grating 2 and the input silicon waveguide 11 are the same, efficient homodromous coupling is generated by realizing phase matching, the TE mode optical signals continue to propagate forwards, and efficient homodromous coupling is generated again due to phase matching after entering the second coupling region, and in the coupling and transmission process of the TE mode optical signals, as long-range surface plasmons mainly concentrate electromagnetic wave energy in the first sub-wavelength grating layer 21 and the second sub-wavelength grating layer 23 on both sides of the metal covering layer 22, energy loss in the transmission process of the TE mode optical signals is small, and coupling efficiency is high. Since the effective refractive indexes of the plasmon sub-wavelength grating 2 and the input silicon waveguide 11 are very different and there is a large phase mismatch, the TM mode optical signal cannot be efficiently coupled, so that after the input optical signal passes through the first coupling region, the TE mode optical signal and the TM mode optical signal are preliminarily separated. In order to further improve the polarization extinction ratio of the polarization beam splitter, a section of the arc-shaped silicon waveguide 12 and the second output silicon waveguide 13 are introduced at the end of the input silicon waveguide 11 for outputting a TM mode optical signal. Finally, TE mode optical signals and TM mode optical signals with high polarization extinction ratio are respectively obtained at the output ends of the first output silicon waveguide 3 and the second output silicon waveguide 13.
Based on the above embodiments, the scheme of the present invention is explained below by a specific example.
Specifically, the thickness t of the metal covering layer 22 is 10nm, and the width e of the first sub-wavelength grating layer 21 1 And a width e of the second sub-wavelength grating layer 23 2 Both are 172.5nm. The interval d between the plasma sub-wavelength grating 2 and the J-type silicon waveguide 1 and the first output silicon waveguide 3 is 200nm; the coupling length L 1 Is 2.1 μm, the coupling length L 2 The thickness was 2.1. Mu.m.
With reference to fig. 3 and 4, a detailed description will be made with reference to fig. 1: fig. 3 and 4 are energy distribution diagrams of TE mode and TM mode of input optical signals in the transmission process in the polarization beam splitter, wherein the input optical signals are two single-mode optical sources of TE and TM in 1550nm communication band, respectively. The transmission process of the input optical signal in the polarization beam splitter is as follows: after the input optical signal containing the TE mode and the TM mode is input from the input silicon waveguide 11, and enters the first coupling region formed by the plasmon sub-wavelength grating 2 and the input silicon waveguide 11, as the effective refractive indexes of the TE mode optical signal in the plasmon sub-wavelength grating 2 and the input silicon waveguide 11 are the same, phase matching is achieved to generate efficient co-directional coupling in the first coupling region, the TE mode optical signal entering the plasmon sub-wavelength grating 2 continues to propagate forward, and after entering the second coupling region formed by the plasmon sub-wavelength grating 2 and the first output silicon waveguide 3, efficient co-directional coupling is generated again due to phase matching, so that the TE mode optical signal is coupled and propagated in the process, because of long-range surface plasmons (for the wrapped metal sheet structure, surface plasmons are respectively excited on the two side surfaces of the metal sheet, when the thickness of the metal is small, the two modes are coupled with each other in the metal, the electric field is an anti-symmetric distributed mode, the component occupied by the electric field in the metal is small, the energy of the electromagnetic wave is concentrated in the two side surfaces of the metal, so that the electromagnetic wave is concentrated in the metal medium, and the electromagnetic wave loss is small, and the electromagnetic wave loss is caused by the electromagnetic wave loss in the electromagnetic wave transmission process. The TM mode optical signal cannot be efficiently coupled because the effective refractive index difference between the plasmon sub-wavelength grating 2 and the input silicon waveguide 11 is large and there is a large phase mismatch. The TE mode and TM mode have been initially separated after the input optical signal passes through the first coupling region. In order to further improve the polarization extinction ratio of the polarization beam splitter, a section of the arc-shaped silicon waveguide 12 and the second output silicon waveguide 13 are introduced at the end of the first input silicon waveguide 11 for outputting a TM mode optical signal, wherein the arc-shaped silicon waveguide 12 plays a role in limiting further coupling of the TM mode optical signal, and is favorable for directly outputting from the second output silicon waveguide 13. Finally, TE mode optical signals and TM mode optical signals with high polarization extinction ratio are respectively obtained at the output ends of the first output silicon waveguide 3 and the second output silicon waveguide 13.
Fig. 2 is a partial enlarged view of the cross section of the first coupling region and the second coupling region in this embodiment, and it can be seen from fig. 2 that the TE mode optical signal undergoes two times of efficient co-directional coupling, and all the silicon waveguides and the sub-wavelength gratings have the same height, and the intervals between the silicon waveguides and the sub-wavelength gratings are the same.
Fig. 5 and 6 are graphs showing the relationship between the polarization extinction ratio and the insertion loss of the TE and TM mode optical signals obtained by scanning the 1500nm-1600nm wavelength band by FDTD simulation software, where the input optical signals are two single-mode light sources of the TE and TM modes, respectively, which are the same as the light sources in fig. 3 and 4. At 1550nm of a communication waveband, the polarization extinction ratio and the insertion loss of the TE mode optical signal are respectively 31.2dB and 0.63dB, the polarization extinction ratio and the insertion loss of the TM mode optical signal are respectively 29.3dB and 0.15dB, the polarization extinction ratios of the TE mode optical signal are all larger than 30dB, the polarization extinction ratio of the TM mode optical signal is all larger than 20dB, the insertion loss of the TE mode optical signal is smaller than 1dB, and the insertion loss of the TM mode optical signal is smaller than 0.18dB, which indicates that the polarization beam splitter has a larger working bandwidth.
In the present invention, the plasmon sub-wavelength grating 2 greatly reduces the energy loss during the optical signal propagation process by using the characteristic that long-range surface plasmons mainly concentrate electromagnetic wave energy in the first sub-wavelength grating layer 21 and the second sub-wavelength grating layer 23 on both sides of the metal coating layer 22, and the plasmon sub-wavelength grating 2 is a periodic structure, and the reflection and diffraction effects are suppressed by using a sufficiently small grating period (Λ is 300 nm) compared to the operating wavelength (1530-1560 nm), and the plasmon sub-wavelength grating 2 is usually represented as a uniform medium, and the refractive index of the material of the plasmon sub-wavelength grating 2 can be modified by changing the duty ratio, and by setting the duty ratio of the plasmon sub-wavelength grating 2 with the period Λ being 300nm to 0.7 by the present embodiment, the TE mode and the TM mode have a larger refractive index difference in the plasmon sub-wavelength grating 2, so that the coupling efficiency is greatly improved, the coupling length is shortened, the polarization ratio extinction is improved, the insertion loss is reduced, and the plasmon sub-wavelength grating 2 has a larger operating bandwidth.
The invention has the beneficial effects that: the polarization beam splitter provided by the invention greatly reduces the coupling length by combining the advantages of the surface plasma and the sub-wavelength grating, realizes the purpose of size reduction, and obtains the effects of high polarization extinction ratio, low insertion loss and large working bandwidth.
In this document, the terms front, back, upper and lower are used to define the components in the drawings and the positions of the components relative to each other, and are used for clarity and convenience of the technical solution. It is to be understood that the use of the directional terms should not be taken to limit the scope of the claims.
The above description is of the preferred embodiment of the present invention and is not intended to limit the present invention, it should be noted that, for those skilled in the art, many modifications and variations can be made without departing from the principle of the present invention, and these modifications and variations should also be regarded as the scope of the present invention.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (8)
1. A polarization beam splitter based on a surface plasma sub-wavelength grating is characterized in that: including plasma sub-wavelength grating and locating with the same interval parallel the J type silicon waveguide and the first output silicon waveguide of plasma sub-wavelength grating both sides, plasma sub-wavelength grating is along following J type silicon waveguide to include in proper order on the first output silicon waveguide direction first sub-wavelength grating layer, metal overburden and second sub-wavelength grating layer, the width w of J type silicon waveguide 1 And the width w of the first output silicon waveguide 2 Equal; the first sub-wavelength grating width e 1 And the width e of the second sub-wavelength grating 2 Equal and all in the range of 152.5-192.5 nm.
2. The surface plasmon sub-wavelength grating based polarizing beam splitter of claim 1, wherein: the thickness t of the metal covering layer is in the range of 10-30 nm.
3. The surface plasmon sub-wavelength grating based polarizing beam splitter of claim 1, wherein: the interval d between the plasma sub-wavelength grating and the J-type silicon waveguide and the first output silicon waveguide is in the range of 175-225 nm.
4. The surface plasmon sub-wavelength grating based polarizing beam splitter of claim 1, wherein: the height h of the J-shaped silicon waveguide, the plasma sub-wavelength grating and the first output silicon waveguide 1、 h 2 And h 3 The same is true.
5. The surface plasmon sub-wavelength grating based polarizing beam splitter of claim 1, wherein: the J-type silicon waveguide comprises an arc-shaped silicon waveguide, and an input silicon waveguide and a second output silicon waveguide which are respectively connected to two ends of the arc-shaped silicon waveguide.
6. The surface plasmon sub-wavelength grating based polarizing beam splitter of claim 5, wherein: the plasma sub-wavelength grating and the input silicon waveguide form a first coupling region with a coupling length of L 1 The plasma sub-wavelength grating and the first output silicon waveguide form a second coupling region with a coupling length L 2 Said coupling length L 1 In the range of 1.7 μm to 2.5 μm, the coupling length L 2 In the range of 1.7 μm to 2.5. Mu.m.
7. The surface plasmon sub-wavelength grating based polarizing beam splitter of claim 1, wherein: the first sub-wavelength grating layer and the second sub-wavelength grating layer are made of silicon, and the metal covering layer is made of silver.
8. The surface plasmon sub-wavelength grating based polarizing beam splitter of claim 1, wherein: the J-type silicon waveguide, the plasma sub-wavelength grating and the first output silicon waveguide are all wrapped in a silicon dioxide cladding.
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| CN110554458B (en) * | 2019-09-09 | 2020-12-11 | 东南大学 | Symmetrical three-waveguide type polarization beam splitter based on sub-wavelength structure |
| CN110989080B (en) * | 2019-12-19 | 2020-12-08 | 东南大学 | Grating auxiliary polarizer based on reverse coupling principle |
| CN111240051A (en) * | 2020-03-06 | 2020-06-05 | 桂林电子科技大学 | Directional coupling type electro-optical modulator based on surface plasma |
| CN111239896A (en) * | 2020-03-26 | 2020-06-05 | 北京爱杰光电科技有限公司 | Active polarization rotator realized based on mixed surface plasma groove waveguide |
| CN111624709A (en) * | 2020-05-08 | 2020-09-04 | 清华-伯克利深圳学院筹备办公室 | Coupling beam splitter and setting method |
| CN113568100A (en) * | 2021-07-12 | 2021-10-29 | 中国科学院上海微系统与信息技术研究所 | Suspended polarization beam splitter applied to intermediate infrared band |
| CN114019605B (en) * | 2021-11-11 | 2022-06-21 | 西安邮电大学 | Diagonal etching sub-wavelength grating type on-chip polarization rotator based on SOI |
| CN114706166B (en) * | 2022-03-31 | 2024-07-12 | 中北大学 | Integrated silicon-based polarizer with large bandwidth and high polarization extinction ratio |
| CN114924352B (en) * | 2022-05-17 | 2023-03-10 | 浙江大学 | Apodized grating coupler for coupling optical fiber and mixed surface plasma waveguide |
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