CN108886099B - 电荷传输性清漆 - Google Patents
电荷传输性清漆 Download PDFInfo
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- CN108886099B CN108886099B CN201780009466.XA CN201780009466A CN108886099B CN 108886099 B CN108886099 B CN 108886099B CN 201780009466 A CN201780009466 A CN 201780009466A CN 108886099 B CN108886099 B CN 108886099B
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- 239000002966 varnish Substances 0.000 title claims abstract description 69
- 239000000126 substance Substances 0.000 claims abstract description 54
- 238000006243 chemical reaction Methods 0.000 claims abstract description 48
- 239000002019 doping agent Substances 0.000 claims abstract description 25
- 239000003960 organic solvent Substances 0.000 claims abstract description 16
- 239000010409 thin film Substances 0.000 claims description 22
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 10
- XTEGVFVZDVNBPF-UHFFFAOYSA-N naphthalene-1,5-disulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1S(O)(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-N 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 8
- 150000003577 thiophenes Chemical class 0.000 claims description 6
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 claims description 5
- ZPBSAMLXSQCSOX-UHFFFAOYSA-N naphthalene-1,3,6-trisulfonic acid Chemical compound OS(=O)(=O)C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 ZPBSAMLXSQCSOX-UHFFFAOYSA-N 0.000 claims description 4
- INMHJULHWVWVFN-UHFFFAOYSA-N naphthalene-1,3,5-trisulfonic acid Chemical compound C1=CC=C(S(O)(=O)=O)C2=CC(S(=O)(=O)O)=CC(S(O)(=O)=O)=C21 INMHJULHWVWVFN-UHFFFAOYSA-N 0.000 claims description 3
- VILFVXYKHXVYAB-UHFFFAOYSA-N naphthalene-2,7-disulfonic acid Chemical compound C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 VILFVXYKHXVYAB-UHFFFAOYSA-N 0.000 claims description 3
- HVDHZPNTFQLUHO-UHFFFAOYSA-N C1(=CC=C(C=2C(=CC(=CC1=2)S(=O)(=O)O)S(=O)(=O)O)S(=O)(=O)O)S(=O)(=O)O Chemical compound C1(=CC=C(C=2C(=CC(=CC1=2)S(=O)(=O)O)S(=O)(=O)O)S(=O)(=O)O)S(=O)(=O)O HVDHZPNTFQLUHO-UHFFFAOYSA-N 0.000 claims description 2
- 125000002490 anilino group Chemical class [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims 1
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 abstract description 11
- YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 abstract description 9
- ROZRLDJKXCKWCD-UHFFFAOYSA-N naphthalene-1,2,3,4-tetrasulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=C(S(O)(=O)=O)C(S(O)(=O)=O)=C21 ROZRLDJKXCKWCD-UHFFFAOYSA-N 0.000 abstract description 5
- -1 nitro, cyano, amino Chemical group 0.000 description 93
- 125000004432 carbon atom Chemical group C* 0.000 description 89
- 238000000034 method Methods 0.000 description 47
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 19
- 239000000463 material Substances 0.000 description 19
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- 125000000217 alkyl group Chemical group 0.000 description 16
- 125000005843 halogen group Chemical group 0.000 description 16
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 12
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- 125000003118 aryl group Chemical group 0.000 description 12
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 12
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- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 9
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- 125000004093 cyano group Chemical group *C#N 0.000 description 8
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- 125000002252 acyl group Chemical group 0.000 description 7
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- FDRNXKXKFNHNCA-UHFFFAOYSA-N 4-(4-anilinophenyl)-n-phenylaniline Chemical compound C=1C=C(C=2C=CC(NC=3C=CC=CC=3)=CC=2)C=CC=1NC1=CC=CC=C1 FDRNXKXKFNHNCA-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 6
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- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 5
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- 125000001188 haloalkyl group Chemical group 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
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- 125000003107 substituted aryl group Chemical group 0.000 description 4
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 3
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 3
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
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- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
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- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 3
- 229940092714 benzenesulfonic acid Drugs 0.000 description 3
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 3
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
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- YGUFXEJWPRRAEK-UHFFFAOYSA-N dodecyl(triethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OCC)(OCC)OCC YGUFXEJWPRRAEK-UHFFFAOYSA-N 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
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- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- DCTMXCOHGKSXIZ-UHFFFAOYSA-N (R)-1,3-Octanediol Chemical compound CCCCCC(O)CCO DCTMXCOHGKSXIZ-UHFFFAOYSA-N 0.000 description 2
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- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 2
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 2
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- 238000009835 boiling Methods 0.000 description 2
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
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- 239000010406 cathode material Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
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- 230000006866 deterioration Effects 0.000 description 2
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- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 2
- SCPWMSBAGXEGPW-UHFFFAOYSA-N dodecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OC)(OC)OC SCPWMSBAGXEGPW-UHFFFAOYSA-N 0.000 description 2
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 2
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- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 2
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- 125000002541 furyl group Chemical group 0.000 description 2
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- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
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- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 2
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- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
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- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
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- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
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- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- PAYSBLPSJQBEJR-UHFFFAOYSA-N naphtho[2,3-e][1]benzothiole Chemical compound C1=CC=C2C=C3C(C=CS4)=C4C=CC3=CC2=C1 PAYSBLPSJQBEJR-UHFFFAOYSA-N 0.000 description 1
- 125000004998 naphthylethyl group Chemical group C1(=CC=CC2=CC=CC=C12)CC* 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000005246 nonafluorobutyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
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- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 1
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 1
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- 230000008569 process Effects 0.000 description 1
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- 239000004332 silver Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 description 1
- 229910001637 strontium fluoride Inorganic materials 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
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- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- YNHJECZULSZAQK-UHFFFAOYSA-N tetraphenylporphyrin Chemical compound C1=CC(C(=C2C=CC(N2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3N2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 YNHJECZULSZAQK-UHFFFAOYSA-N 0.000 description 1
- CRUIOQJBPNKOJG-UHFFFAOYSA-N thieno[3,2-e][1]benzothiole Chemical compound C1=C2SC=CC2=C2C=CSC2=C1 CRUIOQJBPNKOJG-UHFFFAOYSA-N 0.000 description 1
- 150000007970 thio esters Chemical group 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- MLXDKRSDUJLNAB-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F MLXDKRSDUJLNAB-UHFFFAOYSA-N 0.000 description 1
- XVYIJOWQJOQFBG-UHFFFAOYSA-N triethoxy(fluoro)silane Chemical compound CCO[Si](F)(OCC)OCC XVYIJOWQJOQFBG-UHFFFAOYSA-N 0.000 description 1
- FCIABWJRBPKYJO-UHFFFAOYSA-N triethoxy(furan-3-yl)silane Chemical compound CCO[Si](OCC)(OCC)C=1C=COC=1 FCIABWJRBPKYJO-UHFFFAOYSA-N 0.000 description 1
- SAWDTKLQESXBDN-UHFFFAOYSA-N triethoxy(heptyl)silane Chemical compound CCCCCCC[Si](OCC)(OCC)OCC SAWDTKLQESXBDN-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FHVAUDREWWXPRW-UHFFFAOYSA-N triethoxy(pentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)OCC FHVAUDREWWXPRW-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- ZRQAIBMAFLMIND-UHFFFAOYSA-N triethoxy(thiophen-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CS1 ZRQAIBMAFLMIND-UHFFFAOYSA-N 0.000 description 1
- CUVIJHAPWYUQIV-UHFFFAOYSA-N triethoxy-[3-(1,1,1,2,3,3,3-heptafluoropropan-2-yloxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOC(F)(C(F)(F)F)C(F)(F)F CUVIJHAPWYUQIV-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- PBTDWUVVCOLMFE-UHFFFAOYSA-N triethoxy-[4-(trifluoromethyl)phenyl]silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C(C(F)(F)F)C=C1 PBTDWUVVCOLMFE-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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Abstract
包含电荷传输性物质、电子接受性掺杂剂物质和有机溶剂并且电子接受性掺杂剂物质包含选自萘二磺酸、萘三磺酸和萘四磺酸中的至少1种的电荷传输性清漆适于形成提供光电转换效率高的有机光电转换元件的空穴捕集层。
Description
技术领域
本发明涉及电荷传输性清漆。
背景技术
有机太阳能电池是在活性层、电荷传输物质中使用了有机物的太阳能电池元件,由M.Gratzel开发的色素增感太阳能电池和由C.W.Tang开发的有机薄膜太阳能电池已公知(非专利文献1、2)。
由于它们均在为轻质-薄膜、可柔性化的方面、可采用辊到辊进行生产的方面等具有与现在主流的无机系太阳能电池不同的优点,因此期待着新市场的形成。
尤其是有机薄膜太阳能电池具有不含电解质、不含重金属化合物等优点,而且最近由UCLA的小组报道了光电转换效率(以下简写为PCE)为10.6%,由于此等理由,集中了大量的关注(非专利文献3)。
另一方面,有机薄膜太阳能电池与现有的使用了硅系材料的光电转换元件相比,由于在低照度下也显示高的光电转换效率、可进行元件的薄化和像素微细化、能够兼具滤色器的性质等优点,因此不仅是太阳能电池用途,而且作为以有机CMOS图像传感器为首的光传感器用途也受到了关注(非专利文献4)。以下将有机薄膜太阳能电池概括地称为有机光电转换元件(以下也有时简写为OPV)进行记述。
有机光电转换元件具有活性层(光电转换层)、电荷(空穴、电子)捕集层和电极(阳极、阴极)等而构成。
这些中,活性层和电荷捕集层一般采用真空蒸镀法形成,在真空蒸镀法中,在批量生产工艺产生的复杂性、装置的高成本化、材料的利用效率等方面存在问题。
从这些方面出发,作为空穴捕集层用的涂布型材料,也有时使用PEDOT/PSS等这样的水分散性高分子有机导电材料,但由于为水分散液,因此水分的完全除去、再吸湿的控制困难,存在容易使元件的劣化加速的问题。
并且PEDOT/PSS水分散液具有固体成分容易凝聚的性质,因此存在容易产生涂布膜的缺陷、容易发生涂布装置的阻塞、腐蚀这样的问题,而且在耐热性方面也不充分,在批量生产化上留有各种课题。
现有技术文献
非专利文献
非专利文献1:Nature,vol.353,737-740(1991)
非专利文献2:Appl.Phys.Lett.,Vol.48,183-185(1986)
非专利文献3:Nature Photonics Vol.6,153-161(2012)
非专利文献4:Scientific Reports,Vol.5:7708,1-7(2015)
发明内容
发明要解决的课题
本发明鉴于上述实际情况而完成,目的在于提供电荷传输性清漆,该电荷传输性清漆适于形成提供光电转换效率高的有机光电转换元件的空穴捕集层。
用于解决课题的手段
本发明人为了实现上述目的反复认真研究,结果发现:通过将由包含电荷传输性物质、包括萘二磺酸等萘多磺酸的电子接受性掺杂剂物质和有机溶剂的电荷传输性清漆制作的薄膜用作有机光电转换元件的空穴捕集层,从而能够实现高的光电转换效率,完成了本发明。
即,本发明提供:
1.电荷传输性清漆,其特征在于,包含电荷传输性物质、电子接受性掺杂剂物质和有机溶剂,上述电子接受性掺杂剂物质包含选自萘二磺酸、萘三磺酸和萘四磺酸中的至少1种,
2.1中所述的电荷传输性清漆,其中,上述电子接受性掺杂剂物质包含选自萘二磺酸和萘三磺酸中的至少1种,
3.1或2中所述的电荷传输性清漆,其中,上述电荷传输性物质为分子量200~2000的电荷传输性物质,
4.1~3中任一项所述的电荷传输性清漆,其中,上述电荷传输性物质为选自苯胺衍生物和噻吩衍生物中的至少1种,
5.1~4中任一项所述的电荷传输性清漆,其用于形成有机光电转换元件的空穴捕集层,
6.5中所述的电荷传输性清漆,其中,有机光电转换元件为有机薄膜太阳能电池或光传感器,
7.由1~6中任一项所述的电荷传输性清漆制作的电荷传输性薄膜,
8.由5中所述的电荷传输性清漆制作的空穴捕集层,
9.有机光电转换元件,其具有:8中所述的空穴捕集层和与其相接地设置的活性层,
10.9中所述的有机光电转换元件,其中,上述活性层包含富勒烯衍生物,
11.9中所述的有机光电转换元件,其中,上述活性层包含在主链中含有噻吩骨架的聚合物,
12.9中所述的有机光电转换元件,其中,上述活性层包含富勒烯衍生物和在主链中含有噻吩骨架的聚合物,
13.9~12中任一项所述的有机光电转换元件,其为有机薄膜太阳能电池,
14.9~12中任一项所述的有机光电转换元件,其为光传感器。
发明的效果
通过使用由本发明的电荷传输性清漆制作的薄膜作为有机光电转换元件的空穴捕集层,从而能够得到光电转换效率高的有机光电转换元件。
另外,本发明的电荷传输性清漆由于为均匀有机溶液,因此对于批量生产工艺的适合性高,另外使具有凹凸的基底的阳极平坦化,同时显示高的均匀成膜性,因此能够实现元件的高收率,而且能够抑制电流泄漏,将反偏压暗电流抑制得低。
另外,本发明的有机光电转换元件对于可见光、近紫外光、近红外光,不依赖于照射光强度地显示高转换效率,并且显示出高耐久性。
由于这些性质,本发明的有机光电转换元件能够作为以太阳光发电、室内光发电等为用途的有机薄膜太阳能电池使用,同时也能够适合在包括图像传感器的光传感器用途中使用。
进而,由本发明的电荷传输性清漆制作的空穴捕集层显示出高耐热性,因此能够耐受成膜后的各种高温工艺。
具体实施方式
以下对本发明更详细地说明。
本发明涉及的电荷传输性清漆包含电荷传输性物质、电子接受性掺杂剂物质和有机溶剂,电子接受性掺杂剂物质包含选自萘二磺酸、萘三磺酸和萘四磺酸中的至少1种的萘多磺酸。
本发明中,对电荷传输性物质的分子量并无特别限定,如果考虑导电性方面,优选200~2000,作为下限,优选为300以上,更优选为400以上,如果考虑提高对于溶剂的溶解性,作为上限,优选为1500以下,更优选为1000以下。
作为电荷传输性物质,可从公知的电荷传输性物质中适当地选择使用,优选苯胺衍生物、噻吩衍生物,特别优选苯胺衍生物。
作为这些苯胺衍生物和噻吩衍生物的具体例,例如可列举出在国际公开第2005/043962号、国际公开第2013/042623号、国际公开第2014/141998号等中公开的实例。
更具体地,可列举出由下述式(H1)~(H3)表示的实例。
[化1]
再有,由式(H1)表示的苯胺衍生物可以是在其分子内具有由下述式表示的醌二亚胺结构的氧化型苯胺衍生物(醌二亚胺衍生物)。作为将苯胺衍生物氧化而制成醌二亚胺衍生物的方法,可列举出国际公开第2008/010474号、国际公开第2014/119782号记载的方法等。
[化2]
式(H1)中,R1~R6各自独立地表示氢原子、卤素原子、硝基、氰基、氨基、可被Z1取代的、碳数1~20的烷基、碳数2~20的烯基或碳数2~20的炔基、可被Z2取代的、碳数6~20的芳基或碳数2~20的杂芳基、-NHY1、-NY2Y3、-OY4、或-SY5基,Y1~Y5各自独立地表示可被Z1取代的、碳数1~20的烷基、碳数2~20的烯基或碳数2~20的炔基、或者可被Z2取代的、碳数6~20的芳基或碳数2~20的杂芳基,Z1表示卤素原子、硝基、氰基、氨基、或者可被Z3取代的、碳数6~20的芳基或碳数2~20的杂芳基,Z2表示卤素原子、硝基、氰基、氨基、或者可被Z3取代的、碳数1~20的烷基、碳数2~20的烯基或碳数2~20的炔基,Z3表示卤素原子、硝基、氰基、或氨基,k和l各自独立地为1~5的整数。
式(H2)中,R7~R10各自独立地表示氢原子、卤素原子、硝基、氰基、羟基、硫醇基、磷酸基、磺酸基、羧基、可被Z1取代的、碳数1~20的烷氧基、碳数1~20的硫代烷氧基、碳数1~20的烷基、碳数2~20的烯基或碳数2~20的炔基、可被Z2取代的、碳数6~20的芳基或碳数7~20的芳烷基、或者碳数1~20的酰基,R11~R14各自独立地表示氢原子、苯基、萘基、吡啶基、嘧啶基、哒嗪基、吡嗪基、呋喃基、吡咯基、吡唑基、咪唑基、噻吩基(这些基团可以被卤素原子、硝基、氰基、羟基、硫醇基、磷酸基、磺酸基、羧基、碳数1~20的烷氧基、碳数1~20的硫代烷氧基、碳数1~20的烷基、碳数1~20的卤代烷基、碳数2~20的烯基、碳数2~20的炔基、碳数6~20的芳基、碳数7~20的芳烷基或碳数1~20的酰基取代)、或者由式(H4)表示的基团(不过,R11~R14中的至少1个为氢原子),m表示2~5的整数。Z1和Z2表示与上述相同的含义。
[化3]
式(H4)中,R15~R18各自独立地表示氢原子、卤素原子、硝基、氰基、羟基、硫醇基、磷酸基、磺酸基、羧基、可被Z1取代的、碳数1~20的烷氧基、碳数1~20的硫代烷氧基、碳数1~20的烷基、碳数2~20的烯基或碳数2~20的炔基、可被Z2取代的、碳数6~20的芳基或碳数7~20的芳烷基、或者碳数1~20的酰基,R19和R20各自独立地表示苯基、萘基、蒽基、吡啶基、嘧啶基、哒嗪基、吡嗪基、呋喃基、吡咯基、吡唑基、咪唑基、噻吩基(这些基团可相互结合而形成环,另外,可被卤素原子、硝基、氰基、羟基、硫醇基、磷酸基、磺酸基、羧基、碳数1~20的烷氧基、碳数1~20的硫代烷氧基、碳数1~20的烷基、碳数1~20的卤代烷基、碳数2~20的烯基、碳数2~20的炔基、碳数6~20的芳基、碳数7~20的芳烷基、或碳数1~20的酰基取代。)。Z1和Z2表示与上述相同的含义。
式(H3)中,R21~R24各自独立地表示氢原子、卤素原子、羟基、氨基、硅烷醇基、硫醇基、羧基、磺酸基、磷酸基、磷酸酯基、酯基、硫酯基、酰氨基、硝基、可被Z1取代的、碳数1~20的烷基、碳数2~20的烯基或碳数2~20的炔基、可被Z2取代的、碳数6~20的芳基或碳数7~20的芳烷基、碳数1~20的酰基、磺酸基、-NHY1、-NY2Y3、-OY4、-SY5或-SiY6Y7Y8,Y1~Y8各自独立地表示可被Z1取代的、碳数1~20的烷基、碳数2~20的烯基或碳数2~20的炔基、或者可被Z2取代的、碳数6~20的芳基或碳数2~20的杂芳基,X和Y各自独立地表示可被Z2取代的噻吩环,二噻嗪环中所含的2个硫原子可各自独立地为SO基或SO2基。p、q和r各自独立地为0或1以上的整数,是满足p+q+r≦20的数。Z1和Z2表示与上述相同的含义。
上述各式中,作为卤素原子,可列举出氟原子、氯原子、溴原子、碘原子等。
作为碳数1~20的烷基,直链状、分支链状、环状的烷基均可,例如可列举出甲基、乙基、正丙基、异丙基、正丁基、异丁基、仲丁基、叔丁基、正戊基、正己基、正庚基、正辛基、正壬基、正癸基等碳数1~20的直链或分支链状烷基;环丙基、环丁基、环戊基、环己基、环庚基、环辛基、环壬基、环癸基、双环丁基、双环戊基、双环己基、双环庚基、双环辛基、双环壬基、双环癸基等碳数3~20的环状烷基等。
作为碳数2~20的烯基的具体例,可列举出乙烯基、正-1-丙烯基、正-2-丙烯基、1-甲基乙烯基、正-1-丁烯基、正-2-丁烯基、正-3-丁烯基、2-甲基-1-丙烯基、2-甲基-2-丙烯基、1-乙基乙烯基、1-甲基-1-丙烯基、1-甲基-2-丙烯基、正-1-戊烯基、正-1-癸烯基、正-1-二十碳烯基等。
作为碳数2~20的炔基的具体例,可列举出乙炔基、正-1-丙炔基、正-2-丙炔基、正-1-丁炔基、正-2-丁炔基、正-3-丁炔基、1-甲基-2-丙炔基、正-1-戊炔基、正-2-戊炔基、正-3-戊炔基、正-4-戊炔基、1-甲基-正-丁炔基、2-甲基-正-丁炔基、3-甲基-正-丁炔基、1,1-二甲基-正-丙炔基、正-1-己炔基、正-1-癸炔基、正-1-十五碳炔基、正-1-二十碳炔基等。
作为碳数6~20的芳基的具体例,可列举出苯基、1-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、1-菲基、2-菲基、3-菲基、4-菲基、9-菲基等。
作为碳数7~20的芳烷基的具体例,可列举出苄基、苯基乙基、苯基丙基、萘基甲基、萘基乙基、萘基丙基等。
作为碳数2~20的杂芳基的具体例,可列举出2-噻吩基、3-噻吩基、2-呋喃基、3-呋喃基、2-噁唑基、4-噁唑基、5-噁唑基、3-异噁唑基、4-异噁唑基、5-异噁唑基、2-噻唑基、4-噻唑基、5-噻唑基、3-异噻唑基、4-异噻唑基、5-异噻唑基、2-咪唑基、4-咪唑基、2-吡啶基、3-吡啶基、4-吡啶基等。
作为碳数1~20的卤代烷基,可列举出将上述碳数1~20的烷基的氢原子中的至少1个用卤素原子取代的基团,其中,优选氟代烷基,更优选全氟烷基。
作为其具体例,可列举出氟甲基、二氟甲基、三氟甲基、五氟乙基、2,2,2-三氟乙基、七氟丙基、2,2,3,3,3-五氟丙基、2,2,3,3-四氟丙基、2,2,2-三氟-1-(三氟甲基)乙基、九氟丁基、4,4,4-三氟丁基、十一氟戊基、2,2,3,3,4,4,5,5,5-九氟戊基、2,2,3,3,4,4,5,5-八氟戊基、十三氟己基、2,2,3,3,4,4,5,5,6,6,6-十一氟己基、2,2,3,3,4,4,5,5,6,6-十氟己基、3,3,4,4,5,5,6,6,6-九氟己基等。
作为碳数1~20的烷氧基的具体例,可列举出甲氧基、乙氧基、正丙氧基、异丙氧基、环丙氧基、正丁氧基、异丁氧基、仲丁氧基、叔丁氧基、正戊氧基、正己氧基、正庚氧基、正辛氧基、正壬氧基、正癸氧基、正十一烷氧基、正十二烷氧基、正十三烷氧基、正十四烷氧基、正十五烷氧基、正十六烷氧基、正十七烷氧基、正十八烷氧基、正十九烷氧基、正二十烷氧基等。
作为碳数1~20的硫代烷氧基(烷硫基)的具体例,可列举出甲硫基、乙硫基、正丙硫基、异丙硫基、正丁硫基、异丁硫基、仲丁硫基、叔丁硫基、正戊硫基、正己硫基、正庚硫基、正辛硫基、正壬硫基、正癸硫基、正十一烷硫基、正十二烷硫基、正十三烷硫基、正十四烷硫基、正十五烷硫基、正十六烷硫基、正十七烷硫基、正十八烷硫基、正十九烷硫基、正二十烷硫基等。
作为碳数1~20的酰基的具体例,可列举出甲酰基、乙酰基、丙酰基、丁酰基、异丁酰基、戊酰基、异戊酰基、苯甲酰基等。
式(H1)中,R1~R6优选氢原子、卤素原子、可被Z1取代的碳数1~20的烷基、可被Z2取代的碳数6~20的芳基、-NHY1、-NY2Y3、-OY4、或-SY5,在这种情况下,Y1~Y5优选可被Z1取代的碳数1~10的烷基或可被Z2取代的碳数6~10的芳基,更优选可被Z1取代的碳数1~6的烷基或可被Z2取代的苯基,进一步优选碳数1~6的烷基或苯基。
特别地,R1~R6更优选氢原子、氟原子、甲基、苯基或二苯基氨基(Y2和Y3为苯基的-NY2Y3),进一步优选R1~R4为氢原子并且R5和R6同时为氢原子或二苯基氨基。
特别地,R1~R6和Y1~Y5中,Z1优选卤素原子或可被Z3取代的碳数6~10的芳基,更优选氟原子或苯基,进一步优选不存在(即,为未取代的基团),另外,Z2优选卤素原子或可被Z3取代的碳数1~10的烷基,更优选氟原子或碳数1~6的烷基,进一步优选不存在(即,为未取代的基团)。
另外,Z3优选卤素原子,更优选氟原子,进一步优选不存在(即,为未取代的基团)。
作为k和l,从提高由式(H1)表示的苯胺衍生物的溶解性的观点出发,优选为k+l≦8,更优选为k+l≦5。
式(H2)中,R7~R10优选氢原子、卤素原子、碳数1~4的烷基、碳数1~4的全氟烷基、碳数1~4的烷氧基,更优选氢原子。
另外,如果考虑提高由式(H2)表示的苯胺衍生物对于溶剂的溶解性的同时提高得到的薄膜的均匀性,则优选R11和R13都为氢原子。
特别地,优选R11和R13都为氢原子,R12和R14各自独立地为苯基(该苯基可被卤素原子、硝基、氰基、羟基、硫醇基、磷酸基、磺酸基、羧基、碳数1~20的烷氧基、碳数1~20的硫代烷氧基、碳数1~20的烷基、碳数1~20的卤代烷基、碳数2~20的烯基、碳数2~20的炔基、碳数6~20的芳基、碳数7~20的芳烷基或碳数1~20的酰基取代)、或者由上述式(H4)表示的基团,更优选R11和R13都为氢原子,R12和R14各自独立地为苯基、或者R19'和R20'都为苯基的由下述式(H4′)表示的基团,进一步优选R11和R13都为氢原子,R12和R14都为苯基。
另外,作为m,如果考虑化合物的获得容易性、制造的容易性、成本方面等,优选2~4,如果考虑提高在溶剂中的溶解性,更优选2或3,如果考虑化合物的获得容易性、制造的容易性、制造成本、在溶剂中的溶解性、得到的薄膜的透明性等的平衡,最优选2。
[化4]
式(H3)中,作为R21~R24,优选氢原子、氟原子、磺酸基、碳数1~8的烷基、-OY4基、-SiY6Y7Y8基,更优选氢原子。
另外,从提高该化合物的溶解性的方面出发,p、q和r优选各自为1以上并且p+q+r≦20,更优选各自为1以上并且p+q+r≦10。进而,从使高电荷传输性显现的方面出发,优选各自为1以上并且5≦p+q+r,更优选q为1、p和r各自为1以上并且5≦p+q+r。
由式(H1)~(H3)表示的苯胺衍生物或噻吩衍生物可使用市售品,也可使用采用上述各公报中记载的方法等公知的方法制造的产物,在所有的情况下都优选使用在制备电荷传输性清漆之前采用重结晶、蒸镀法等进行了精制的产物。通过使用精制过的产物,能够进一步提高具有由该清漆得到的薄膜的有机光电转换元件的特性。在采用重结晶进行精制的情况下,作为溶剂,例如能够使用1,4-二噁烷、四氢呋喃等。
本发明的电荷传输性清漆中,作为由式(H1)~(H3)表示的电荷传输性物质,可单独使用选自由式(H1)~(H3)表示的化合物中的1种的化合物(即,分子量分布的分散度为1),也可将2种以上的化合物组合使用。
特别地,从提高空穴捕集层的透明性的方面出发,优选使用由式(H2)表示的苯胺衍生物,其中更优选使用上述m为2的联苯胺衍生物,进一步优选使用由下述式(g)表示的二苯基联苯胺。
作为本发明中能够优选使用的电荷传输性物质的具体例,可列举出下述的实例,但并不限定于这些。
[化5]
[化6]
[化7]
本发明的电荷传输性清漆除了上述电荷传输性物质以外,包含电子接受性掺杂剂物质,该电子接受性掺杂剂物质包含选自萘二磺酸、萘三磺酸和萘四磺酸中的至少1种的萘多磺酸。
作为萘多磺酸的具体例,可列举出1,5-萘二磺酸、2,7-萘二磺酸等萘二磺酸、1,3,5-萘三磺酸,1,3,6-萘三磺酸等萘三磺酸、1,4,5,7-萘四磺酸等萘四磺酸等,其中优选萘二磺酸、萘三磺酸。
另外,除了上述萘多磺酸以外,根据得到的薄膜的用途,以得到的有机光电转换元件的光电转换效率提高等为目的,可包含其他的电子接受性掺杂剂物质。
其他的电子接受性掺杂剂物质只要在电荷传输性清漆中使用的至少一种溶剂中溶解,则并无特别限定。
作为其他的电子接受性掺杂剂物质的具体例,可列举出氯化氢、硫酸、硝酸、磷酸等无机强酸;氯化铝(III)(AlCl3)、四氯化钛(IV)(TiCl4)、三溴化硼(BBr3)、三氟化硼醚络合物(BF3·OEt2)、氯化铁(III)(FeCl3)、氯化铜(II)(CuCl2)、五氯化锑(V)(SbCl5)、五氟化砷(V)(AsF5)、五氟化磷(PF5)、三(4-溴苯基)铝六氯锑酸盐(TBPAH)等路易斯酸;苯磺酸、甲苯磺酸、樟脑磺酸、羟基苯磺酸、5-磺基水杨酸、十二烷基苯磺酸、聚苯乙烯磺酸、国际公开第2005/000832号中记载的1,4-苯并二噁烷二磺酸化合物、国际公开第2006/025342号中记载的萘或蒽磺酸化合物、日本特开2005-108828号公报中记载的二壬基萘磺酸化合物等芳基磺酸化合物等有机强酸;7,7,8,8-四氰基醌二甲烷(TCNQ)、2,3-二氯-5,6-二氰基-1,4-苯醌(DDQ)、碘等有机氧化剂、国际公开第2010/058777号中记载的磷钼酸、磷钨酸、磷钨钼酸等杂多酸等无机氧化剂等,可将它们彼此组合使用。
作为用于电荷传输性清漆的制备的有机溶剂,能够使用可将上述电荷传输性物质和电子接受性掺杂剂物质良好地溶解的高溶解性溶剂。高溶解性溶剂能够1种单独地使用或者将2种以上混合使用,相对于清漆中使用的全部溶剂,其使用量能够规定为5~100质量%。
作为这样的高溶解性溶剂,例如可列举出N-甲基甲酰胺、N,N-二甲基甲酰胺、N,N-二乙基甲酰胺、N-甲基乙酰胺、N,N-二甲基乙酰胺、N-甲基吡咯烷酮、1,3-二甲基-2-咪唑啉酮等。
这些中,优选作为酰胺系溶剂的N-甲基甲酰胺、N,N-二甲基甲酰胺、N,N-二乙基甲酰胺、N-甲基乙酰胺、N,N-二甲基乙酰胺,更优选N,N-二甲基乙酰胺。
优选电荷传输性物质和电子接受性掺杂剂物质都在上述有机溶剂中完全地溶解,或者成为了均匀地分散的状态,如果考虑再现性良好地得到提供光电转换效率高的有机光电转换元件的空穴捕集层,更优选这些物质在上述有机溶剂中完全地溶解。
本发明的电荷传输性清漆优选含有至少一种25℃下具有10~200mPa·s、特别地35~150mPa·s的粘度、常压下沸点为50~300℃、特别地150~250℃的高粘度有机溶剂。
对高粘度有机溶剂并无特别限定,例如可列举出环己醇、乙二醇、1,3-辛二醇、二甘醇、二丙二醇、三甘醇、三丙二醇、1,3-丁二醇、2,3-丁二醇、1,4-丁二醇、丙二醇、己二醇等。
相对于本发明的电荷传输性清漆中使用的溶剂全体的高粘度有机溶剂的添加比例优选为固体不析出的范围内,只要固体不析出,添加比例优选为5~80质量%。
进而,出于对于涂布面的润湿性的提高、溶剂的表面张力的调整、极性的调整、沸点的调整等目的,相对于清漆中使用的全部溶剂,也能够以1~90质量%、优选1~50质量%的比例混合在热处理时可赋予膜的平坦性的其他溶剂。
作为这样的溶剂,例如可列举出丁基溶纤剂、二甘醇二乙基醚、二甘醇二甲基醚、二甘醇单乙基醚乙酸酯、二甘醇单丁基醚乙酸酯、二丙二醇单甲基醚、丙二醇单甲基醚、丙二醇单甲基醚乙酸酯、乙基卡必醇、双丙酮醇、γ-丁内酯、乳酸乙酯、乙酸正己酯等,但并不限定于这些。
从提高得到的有机光电转换元件的电子阻挡性的观点出发,在本发明的电荷传输性清漆中可添加有机硅烷化合物。
作为有机硅烷化合物,可列举出三烷氧基硅烷、二烷氧基硅烷等,特别地,优选芳基三烷氧基硅烷、芳基二烷氧基硅烷、含有氟原子的三烷氧基硅烷、含有氟原子的二烷氧基硅烷化合物,更优选由式(S1)或(S2)表示的硅烷化合物。
[化8]
RSi(OCH3)3 (S1)
RSi(OC2H5)3 (S2)
(式中,R表示碳数1~6的氟代烷基。)
作为碳数1~6的氟代烷基的具体例,可列举出三氟甲基、2,2,2-三氟乙基、1,1,2,2,2-五氟乙基、3,3,3-三氟丙基、2,2,3,3,3-五氟丙基、1,1,2,2,3,3,3-七氟丙基、4,4,4-三氟丁基、3,3,4,4,4-五氟丁基、2,2,3,3,4,4,4-七氟丁基、1,1,2,2,3,3,4,4,4-九氟丁基等。
作为二烷氧基硅烷化合物的具体例,可列举出二甲基二甲氧基硅烷、二甲基二乙氧基硅烷、甲基乙基二甲氧基硅烷、二乙基二甲氧基硅烷、二乙基二乙氧基硅烷、甲基丙基二甲氧基硅烷、甲基丙基二乙氧基硅烷、二异丙基二甲氧基硅烷、苯基甲基二甲氧基硅烷、乙烯基甲基二甲氧基硅烷、3-缩水甘油氧基丙基甲基二甲氧基硅烷、3-缩水甘油氧基丙基甲基二乙氧基硅烷、3-(3,4-环氧环己基)乙基甲基二甲氧基硅烷、3-甲基丙烯酰氧基丙基甲基二甲氧基硅烷、3-甲基丙烯酰氧基丙基甲基二乙氧基硅烷、3-巯基丙基甲基二甲氧基硅烷、γ-氨基丙基甲基二乙氧基硅烷、N-(2-氨基乙基)氨基丙基甲基二甲氧基硅烷、3,3,3-三氟丙基甲基二甲氧基硅烷等。
作为三烷氧基硅烷化合物的具体例,可列举出甲基三甲氧基硅烷、甲基三乙氧基硅烷、乙基三甲氧基硅烷、乙基三乙氧基硅烷、丙基三甲氧基硅烷、丙基三乙氧基硅烷、丁基三甲氧基硅烷、丁基三乙氧基硅烷、戊基三甲氧基硅烷、戊基三乙氧基硅烷、庚基三甲氧基硅烷、庚基三乙氧基硅烷、辛基三甲氧基硅烷、辛基三乙氧基硅烷、十二烷基三甲氧基硅烷、十二烷基三乙氧基硅烷、十六烷基三甲氧基硅烷、十六烷基三乙氧基硅烷、十八烷基三甲氧基硅烷、十八烷基三乙氧基硅烷、苯基三甲氧基硅烷、苯基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、γ-氨基丙基三甲氧基硅烷、3-氨基丙基三乙氧基硅烷、γ-缩水甘油氧基丙基三甲氧基硅烷、3-缩水甘油氧基丙基三乙氧基硅烷、γ-甲基丙烯酰氧基丙基三甲氧基硅烷、γ-甲基丙烯酰氧基丙基三乙氧基硅烷、三乙氧基(4-(三氟甲基)苯基)硅烷、十二烷基三乙氧基硅烷、3,3,3-三氟丙基三甲氧基硅烷、(三乙氧基甲硅烷基)环己烷、全氟辛基乙基三乙氧基硅烷、三乙氧基氟硅烷、十三氟-1,1,2,2-四氢辛基三乙氧基硅烷、3-(七氟异丙氧基)丙基三乙氧基硅烷、十七氟-1,1,2,2-四氢癸基三乙氧基硅烷、三乙氧基-2-噻吩基硅烷、3-(三乙氧基甲硅烷基)呋喃等。
使用有机硅烷化合物的情况下,就其含量而言,相对于本发明的电荷传输性清漆的电荷传输性物质和电子接受性掺杂剂物质,通常为0.1~200质量%左右,优选为1~100质量%,更优选为5~50质量%。
就本发明的电荷传输性清漆的固体成分浓度而言,考虑清漆的粘度和表面张力等、制作的薄膜的厚度等适当地设定,通常为0.1~10.0质量%左右,优选为0.5~5.0质量%,更优选为1.0~3.0质量%。
应予说明,固体成分意指构成电荷传输性清漆的、有机溶剂以外的成分。
另外,电荷传输性物质与电子接受性掺杂剂物质的物质的量(mol)比也考虑显现的电荷传输性、电荷传输性物质的种类等来适当地设定,通常,相对于电荷传输性物质为1,电子接受性掺杂剂物质为0.1~10,优选为0.2~5.0,更优选为0.5~3.0。
而且,就本发明中使用的电荷传输性清漆的粘度而言,考虑制作的薄膜的厚度等、固体成分浓度,根据涂布方法来适当地调节,通常在25℃下为0.1~50mPa·s左右。
制备本发明的电荷传输性清漆时,只要固体成分在溶剂中均匀地溶解或分散,则能够以任意的顺序将电荷传输性物质、电子接受性掺杂剂物质、有机溶剂混合。即,例如,使电荷传输性物质溶解于有机溶剂后在该溶液中使电子接受性掺杂剂物质溶解的方法、在有机溶剂中使电子接受性掺杂剂物质溶解后在该溶液中使电荷传输性物质溶解的方法、将电荷传输性物质和电子接受性掺杂剂物质混合后将该混合物投入有机溶剂而使其溶解的方法只要固体成分在有机溶剂中均匀地溶解或分散,则都能够采用。
另外,通常,电荷传输性清漆的制备在常温、常压的非活性气体气氛下进行,只要清漆中的化合物不分解、组成不发生大的变化,可在大气气氛下(氧存在下)进行,也可边加热边进行。
通过将以上说明的电荷传输性清漆涂布于有机光电转换元件的阳极并烧成,从而能够形成本发明的空穴捕集层。
涂布时,考虑清漆的粘度和表面张力、所期望的薄膜的厚度等,可从液滴流延法、旋涂法、刮刀涂布法、浸涂法、辊涂法、棒涂法、模压涂布法、喷墨法、印刷法(凸版、凹版、平版、丝网印刷等)等各种湿法中采用最佳的方法。
通常,涂布在常温、常压的非活性气体气氛下进行,只要清漆中的化合物不分解、组成不发生大的变化,可在大气气氛下(氧存在下)进行,也可边加热边进行。
膜厚通常为1~200nm左右,优选为3~100nm左右,更优选为3~30nm。作为使膜厚变化的方法,有使清漆中的固体成分浓度变化、使涂布时的溶液量变化等方法。
以下对使用了本发明的电荷传输性清漆的有机光电转换元件的制造方法进行说明。
[阳极层的形成]:在透明基板的表面形成阳极材料的层而制造透明电极的工序
作为阳极材料,能够使用铟锡氧化物(ITO)、铟锌氧化物(IZO)等金属氧化物、聚噻吩衍生物、聚苯胺衍生物等高电荷传输性有机化合物。另外,作为透明基板,能够使用由玻璃或透明树脂制成的基板。
根据阳极材料的性质来适当地选择阳极材料的层(阳极层)的形成方法,通常,采用使用了升华性化合物的干法(蒸镀法)或者使用了包含电荷传输性化合物的清漆的湿法(特别是旋涂法或狭缝涂布法)的任一个。
另外,作为透明电极,也能够优选使用市售品,这种情况下,从提高元件的收率的观点出发,优选使用进行了平滑化处理的基盘。在使用市售品的情况下,本发明的有机光电转换元件的制造方法不含形成阳极层的工序。
就使用的透明电极而言,优选在使用洗涤剂、醇、纯水等洗净后使用。例如,对于阳极基板而言,优选在使用前即刻实施UV臭氧处理、氧-等离子体处理等表面处理(在阳极材料以有机物为主成分的情况下,也可不进行表面处理)。
[空穴捕集层的形成]:在阳极材料的层上形成空穴捕集层的工序
按照上述方法,在阳极材料的层上使用本发明的电荷传输性清漆形成空穴捕集层。
[活性层的形成]:在空穴捕集层上形成活性层的工序
活性层可以是将包含n型半导体材料的薄膜即n层和包含p型半导体材料的薄膜即p层层叠而成的,也可以是包含这些材料的混合物的非层叠薄膜。
作为n型半导体材料,可列举出富勒烯、[6,6]-苯基-C61-丁酸甲酯(PC61BM)、[6,6]-苯基-C71-丁酸甲酯(PC71BM)等。另一方面,作为p型半导体材料,可列举出区域规整聚(3-己基噻吩)(P3HT)、PTB7、PDTP-DFBT、日本特开2009-158921号公报和国际公开第2010/008672号中记载的含有噻吩并噻吩单元的聚合物类等在主链中含有噻吩骨架的聚合物、CuPC,ZnPC等酞菁类、四苯并卟啉等卟啉类等。
这些中,作为n型材料,优选PC61BM、PC71BM,作为p型材料,优选PTB7等在主链中含有噻吩骨架的聚合物类。
应予说明,这里所说的“主链中的噻吩骨架”表示只包含噻吩的2价的芳香环或者噻吩并噻吩、苯并噻吩、二苯并噻吩、苯并二噻吩、萘并噻吩、萘并二噻吩、蒽并噻吩、蒽并二噻吩等含有1个以上的噻吩的2价的稠合芳香环,它们可被由上述R1~R6表示的取代基取代。
根据n型半导体或p型半导体材料的性质来适当地选择活性层的形成方法,通常,采用使用了升华性化合物的干法(特别是蒸镀法)或者使用了包含材料的清漆的湿法(特别是旋涂法或狭缝涂布法)的任一个。
[化9]
(式中,n1和n2表示重复单元数,表示正的整数。)
[电子捕集层的形成]:在活性层上形成电子捕集层的工序
根据需要,可在活性层与阴极层之间形成电子捕集层。
作为形成电子捕集层的材料,可列举出氧化锂(Li2O)、氧化镁(MgO)、氧化铝(Al2O3)、氟化锂(LiF)、氟化镁(MgF2)、氟化锶(SrF2)等。
就电子捕集层的形成方法而言,根据其材料的性质来适当地选择,通常,采用使用了升华性化合物的干法(特别是蒸镀法)或者使用了包含材料的清漆的湿法(特别是旋涂法或狭缝涂布法)的任一个。
[阴极层的形成]:在电子捕集层上形成阴极层的工序
作为阴极材料,可列举出铝、镁-银合金、铝-锂合金、锂、钠、钾、铯、钙、钡、银、金等,能够将多个阴极材料层叠或者混合来使用。
就阴极层的形成方法而言,根据其材料的性质来适当地选择,通常采用干法(特别是蒸镀法)。
[载流子阻挡层的形成]
根据需要,以控制光电流的整流性等为目的,可在任意的层间设置载流子阻挡层。
作为形成载流子阻挡层的材料,可列举出氧化钛、氧化锌等。
就载流子阻挡层的形成方法而言,根据其材料的性质适当地选择,通常,在使用升华性化合物的情况下采用蒸镀法,在使用材料溶解而成的清漆的情况下采用旋涂法或狭缝涂布法中的任一个。
为了防止大气引起的元件劣化,将采用上述例示的方法制作的有机光电转换元件再次导入手套箱内,在氮气等非活性气体气氛下进行密封操作,能够在密封的状态下发挥作为有机光电转换元件的功能、进行其特性的测定。
作为密封法,可列举出:使UV固化树脂附着于端部的凹型玻璃基板在非活性气体气氛下附着于有机光电转换元件的成膜面侧,通过UV照射使树脂固化的方法;在真空下采用溅射等方法进行膜密封型的密封的方法等。
实施例
以下列举实施例和比较例,对本发明更具体地说明,但本发明并不限定于下述的实施例。应予说明,使用的装置如下所述。
(1)手套箱:美国VAC公司制手套箱系统
(2)蒸镀装置:青山工程(株)制造、真空蒸镀装置
(3)测定装置:(株)小坂研究所制造、全自动微细形状测定机ET-4000A
(4)电流值测定中使用的装置:アジレント(Agilent)(株)制造、4156C精细半导体参数分析仪
(5)光电流测定中使用的光源装置:分光计器(株)制造、SM-250超单光系统
[1]活性层用组合物的制备
[制备例1]
在装有PTB7(ワンマテリアル社制造)20mg和PCBM(Frontier Carbon Corporation制造、制品名:nanom spectra E100)30mg的样品瓶中加入氯苯2.0mL,在80℃的热板上搅拌了15小时。将该溶液放冷到室温后,加入1,8-二碘辛烷(东京化成工业(株)制造)60μL,搅拌,得到了活性层用组合物A1。
[2]电荷传输性清漆的制备
[实施例1-1]
在由式[1]表示的N,N′-二苯基联苯胺(东京化成工业(株)制造、下同)322.5mg(0.959mmol)和由式[2]表示的1,3,6-萘三磺酸(富山药品工业(株)制造)188.3mg(0.511mmol)的混合物中加入N,N-二甲基乙酰胺(以下记为DMAc)12.5g,在室温下边照射超声波边搅拌,使其溶解。进而,向其中加入环己醇(以下记为CHN)12.5g,搅拌,得到了褐色溶液。
使用孔径0.2μm的注射器式过滤器将得到的褐色溶液过滤,得到了电荷传输性清漆B1。
[化10]
[实施例1-2]
在N,N′-二苯基联苯胺60.5mg(0.180mmol)和由式[3]表示的1,5-萘二磺酸(东京化成工业(株)制造)41.5mg(0.144mmol)的混合物中加入DMAc2.5g,在室温下边照射超声波边搅拌,使其溶解。进而,向其中加入CHN2.5g,搅拌,得到了褐色溶液。
使用孔径0.2μm的注射器式过滤器将得到的褐色溶液过滤,得到了电荷传输性清漆B2。
[化11]
[比较1-1]
在N,N′-二苯基联苯胺51.3mg(0.153mmol)和由式[4]表示的2-萘磺酸(东京化成工业(株)制造)50.8mg(0.244mmol)的混合物中加入DMAc2.5g,在室温下边照射超声波边搅拌,使其溶解。进而,向其中加入CHN2.5g,搅拌,得到了褐色溶液。
使用孔径0.2μm的注射器式过滤器将得到的褐色溶液过滤,得到了电荷传输性清漆C1。
[化12]
[比较例1-2]
在N,N′-二苯基联苯胺58.3mg(0.173mmol)和由式[5]表示的苯磺酸(东京化成工业(株)制造)43.9mg(0.277mmol)的混合物中加入DMAc2.5g,在室温下边照射超声波边搅拌,使其溶解。进而,向其中加入CHN2.5g,搅拌,得到了褐色溶液。
使用孔径0.2μm的注射器式过滤器将得到的褐色溶液过滤,得到了电荷传输性清漆C2。
[化13]
[3]空穴捕集层和有机光电转换元件的制作
[实施例2-1]
对将成为正极的ITO透明导电层图案化为2mm×20mm的条状的20mm×20mm的玻璃基板进行15分钟UV/臭氧处理后,采用旋涂法在基板上涂布实施例1-1中得到的电荷传输性清漆B1。使用热板在50℃下将该玻璃基板加热5分钟,进而在230℃下加热20分钟,形成了空穴捕集层。
然后,在用非活性气体置换过的手套箱中,将制备例1中得到的活性层用组合物A1滴到形成的空穴捕集层上,采用旋涂法成膜。
接下来,将形成了有机半导体层的基板和负极用掩模设置在真空蒸镀装置内,进行排气直至装置内的真空度成为1×10-3Pa以下,采用电阻加热法,将成为负极的铝层蒸镀为80nm的厚度。
最后,使用热板,在80℃下加热10分钟,制作了条状的ITO层与铝层交叉的部分的面积为2mm×2mm的OPV元件。
[实施例2-2]
除了代替电荷传输性清漆B1而使用了电荷传输性清漆B2以外,采用与实施例2-1同样的方法制作了OPV元件。
[比较例2-1]
除了代替电荷传输性清漆B1而使用了电荷传输性清漆C1以外,采用与实施例2-1同样的方法制作了OPV元件。
[比较例2-2]
除了代替电荷传输性清漆B1而使用了电荷传输性清漆C2以外,采用与实施例2-1同样的方法制作了OPV元件。
[5]特性评价
对于上述制作的各OPV元件,进行了短路电流密度(Jsc[mA/cm2])、开放电压(Voc[V])、曲线因子(FF)和光电转换效率(PCE[%])的评价。将结果示于表1中。应予说明,光电转换效率根据下式算出。
PCE[%]=Jsc[mA/cm2]×Voc[V]×FF÷入射光强度(100[mW/cm2])×100
[表1]
如表1中所示那样,可知与具有由使用了萘单磺酸(比较例2-1)或苯磺酸(比较例2-2)作为电子接受性掺杂剂物质的清漆制作的电荷传输性薄膜的OPV元件相比,具有由包含萘三磺酸(实施例2-1)或萘二磺酸(实施例2-2)作为电子接受性掺杂剂物质的清漆制作的电荷传输性薄膜的元件显示出高转换效率。
Claims (14)
1.电荷传输性清漆,其特征在于,包含电荷传输性物质、电子接受性掺杂剂物质和有机溶剂,所述电子接受性掺杂剂物质包含选自1,5-萘二磺酸、2,7-萘二磺酸、1,3,5-萘三磺酸,1,3,6-萘三磺酸和1,4,5,7-萘四磺酸中的至少1种。
2.根据权利要求1所述的电荷传输性清漆,其中,所述电子接受性掺杂剂物质包含选自1,5-萘二磺酸、2,7-萘二磺酸、1,3,5-萘三磺酸和1,3,6-萘三磺酸中的至少1种。
3.根据权利要求1或2所述的电荷传输性清漆,其中,所述电荷传输性物质为分子量200~2000的电荷传输性物质。
4.根据权利要求1~3中任一项所述的电荷传输性清漆,其中,所述电荷传输性物质为选自苯胺衍生物和噻吩衍生物中的至少1种。
5.根据权利要求1~4中任一项所述的电荷传输性清漆,其用于形成有机光电转换元件的空穴捕集层。
6.根据权利要求5所述的电荷传输性清漆,其中,有机光电转换元件为有机薄膜太阳能电池或光传感器。
7.由根据权利要求1~6中任一项所述的电荷传输性清漆制作的电荷传输性薄膜。
8.由根据权利要求5所述的电荷传输性清漆制作的空穴捕集层。
9.有机光电转换元件,其具有:根据权利要求8所述的空穴捕集层、和与其相接地设置的活性层。
10.根据权利要求9所述的有机光电转换元件,其中,所述活性层包含富勒烯衍生物。
11.根据权利要求9所述的有机光电转换元件,其中,所述活性层包含在主链中含有噻吩骨架的聚合物。
12.根据权利要求9所述的有机光电转换元件,其中,所述活性层包含富勒烯衍生物和在主链中含有噻吩骨架的聚合物。
13.根据权利要求9~12中任一项所述的有机光电转换元件,其为有机薄膜太阳能电池。
14.根据权利要求9~12中任一项所述的有机光电转换元件,其为光传感器。
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EP3413367A4 (en) | 2019-01-30 |
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JP6988483B2 (ja) | 2022-01-05 |
TW201800511A (zh) | 2018-01-01 |
JPWO2017135117A1 (ja) | 2018-12-06 |
CN108886099A (zh) | 2018-11-23 |
US20190062572A1 (en) | 2019-02-28 |
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