Nothing Special   »   [go: up one dir, main page]

CN108650798A - A kind of production method of the thick copper coin of acid etching - Google Patents

A kind of production method of the thick copper coin of acid etching Download PDF

Info

Publication number
CN108650798A
CN108650798A CN201810695167.2A CN201810695167A CN108650798A CN 108650798 A CN108650798 A CN 108650798A CN 201810695167 A CN201810695167 A CN 201810695167A CN 108650798 A CN108650798 A CN 108650798A
Authority
CN
China
Prior art keywords
acid etching
copper coin
thick copper
production method
thick
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810695167.2A
Other languages
Chinese (zh)
Inventor
李雄仔
贺波
蒋善刚
文国堂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aoshikang Precision Circuit Huizhou Co Ltd
Original Assignee
Aoshikang Precision Circuit Huizhou Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aoshikang Precision Circuit Huizhou Co Ltd filed Critical Aoshikang Precision Circuit Huizhou Co Ltd
Priority to CN201810695167.2A priority Critical patent/CN108650798A/en
Publication of CN108650798A publication Critical patent/CN108650798A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067Etchants

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

The invention discloses a kind of production methods of the thick copper coin of acid etching.This method comprises the following steps:(1)Copper facing is carried out to semi-finished product PCB, obtains thick copper coin;(2)Acid etching is performed under heating conditions to obtained thick copper coin, obtains the thick copper coin of acid etching.The method of the present invention realizes the stability of thick copper coin acid etching, the thick copper coin yield height of the acid etching of production scraps few, effective reduction PCB production costs by effectively controlling copper facing uniformity, etch uniformity, etching factor and acid etching technique.

Description

A kind of production method of the thick copper coin of acid etching
Technical field
The present invention relates to PCB production technical fields, and in particular to a kind of production method of the thick copper coin of acid etching.
Background technology
Printed circuit board(PCB)It is the final products of PCB industrial chains, is influenced to compare by upstream materials price ups and downs Greatly.Currently, plate, copper valence, the chemical products prices of raw materials rise steadily, up-trend, PCB is also presented in other prices of raw materials Product cost pressure is increasing.In addition by influence of market economy, PCB prices are constantly being lowered, and profit is constantly being compressed, drop Low cost, promotion quality are imperative.
Acid etching flow production process is few, and Material Cost is low, has become the project of each PCB enterprise developments.However it is sour Property be etched to etching face copper, thick copper coin face copper reaches 2OZ even 3OZ, and etching difficulty is big, and quality scraps height, and is susceptible to benefit Rear spacing deficiency problem is repaid, how to solve the problems, such as that thick copper coin acid etching has become one of each PCB enterprises primary study project.
Invention content
In view of the above-mentioned deficiencies in the prior art, it is an object of the present invention to provide a kind of producer of the thick copper coin of acid etching Method.This method realizes thick copper by effectively controlling copper facing uniformity, etch uniformity, etching factor and acid etching technique The stability of plate acid etching, the thick copper coin yield height of the acid etching of production are scrapped less.
The purpose of the present invention is achieved through the following technical solutions.
A kind of production method of the thick copper coin of acid etching, includes the following steps:
(1)Copper facing is carried out to semi-finished product PCB, obtains thick copper coin;
(2)Acid etching is performed under heating conditions to obtained thick copper coin, obtains the thick copper coin of acid etching.
Preferably, step(1)In, the copper facing is electroplated using vertical continuous plating lines.
Preferably, step(1)In, the copper-plated uniformity is very poor≤5um.
Preferably, step(1)In, the hole copper thickness upper limit in the thickness copper coin is up to the copper thickness+1um of semi-finished product PCB.
Preferably, step(1)In, etching factor >=4.0 of the thickness copper coin.
Preferably, step(2)In, the heating is heated to 48 ~ 52 DEG C.
Preferably, step(2)In, in the etching solution of the acid etching, NaClO3Content control it is dense in 28 ~ 36 equivalents The content of degree, HCl is controlled in 2.3 ~ 2.7 equivalent concentration, Cu2+Concentration control in 130 ~ 140g/L.
Preferably, step(2)In, the pressure of the acid etching controls:Upper pressure is 2.7 ~ 3.1kg/cm2, it is 2.3 to push ~2.7kg/cm2
Preferably, step(2)In, the etch uniformity up and down of the acid etching is >=93%.
Compared with prior art, the invention has the advantages that and advantageous effect:
The method of the present invention is realized by effectively controlling copper facing uniformity, etch uniformity, etching factor and acid etching technique The stability of thick copper coin acid etching, the thick copper coin yield height of the acid etching of production are scrapped less, and PCB productions are effectively reduced Cost economizes on resources.
Specific implementation mode
Technical scheme of the present invention is described in further detail below in conjunction with specific embodiment, but the protection of the present invention Range and embodiment are without being limited thereto.
Embodiment 1
A kind of production method of the thick copper coin of acid etching, specifically comprises the following steps:
(1)Copper facing is carried out using vertical continuous plating lines plating to the semi-finished product PCB of copper thickness 21um, copper-plated uniformity is very poor to be 4.5um obtains the thick copper coin that hole copper thickness is 21.5um, etching factor 4.6;
(2)Under 52 DEG C of heating conditions, acid etching is carried out to obtained thick copper coin;Wherein, in etching solution, NaClO3Content Control is 32 equivalent concentration, and the content control of HCl is 2.7 equivalent concentration, Cu2+Concentration control be 136g/L;The pressure of etching Control:Upper pressure is 3.1kg/cm2, push as 2.3kg/cm2;Upper and lower etch uniformity difference 93.5%, 95%, obtains acid etching Thick copper coin.
Embodiment 2
A kind of production method of the thick copper coin of acid etching, specifically comprises the following steps:
(1)Copper facing is carried out using vertical continuous plating lines plating to the semi-finished product PCB of copper thickness 20um, copper-plated uniformity is very poor to be 5um obtains the thick copper coin that hole copper thickness is 21um, etching factor 4.0;
(2)Under 50 DEG C of heating conditions, acid etching is carried out to obtained thick copper coin;Wherein, in etching solution, NaClO3Content Control is 36 equivalent concentration, and the content control of HCl is 2.3 equivalent concentration, Cu2+Concentration control be 130g/L;The pressure of etching Control:Upper pressure is 2.7kg/cm2, push as 2.5kg/cm2;Upper and lower etch uniformity is 94%, obtains the thick copper of acid etching Plate.
Embodiment 3
A kind of production method of the thick copper coin of acid etching, specifically comprises the following steps:
(1)Copper facing is carried out using vertical continuous plating lines plating to the semi-finished product PCB of copper thickness 21um, copper-plated uniformity is very poor to be 3um obtains the thick copper coin that hole copper thickness is 22um, etching factor 5.2;
(2)Under 48 DEG C of heating conditions, acid etching is carried out to obtained thick copper coin;Wherein, in etching solution, NaClO3Content Control is 28 equivalent concentration, and the content control of HCl is 2.5 equivalent concentration, Cu2+Concentration control be 140g/L;The pressure of etching Control:Upper pressure is 2.8kg/cm2, push as 2.7kg/cm2;Upper and lower etch uniformity is respectively 95%, 93.6%, obtains acid erosion The thick copper coin at quarter.
According to traditional thick copper coin etching management and control can cause yield it is low, etching it is not clean or directly can not production loss order, Because traditional thick copper coin extremely caused by scrappage be about 0.13%, and cause to lose order monthly 10 because thick copper coin can not be produced It is single.And by using the method for embodiment 1 ~ 3 not only avoid compensation after spacing deficiency problem, and scrappage be 0.According to monthly 11000m2Production capacity, can monthly reduce and scrap 143m2, about 143m2*600 members/m2=85800 yuan can be that company saves every year 85800*12=1029600 yuan.
Above example is only the preferred embodiment of the present invention, is only that further detailed to technical scheme of the present invention work Description, but do not limit the scope of the invention, any change done without departing from spirit of the invention, combination, deletion, Modifications or substitutions etc. are included in protection scope of the present invention.

Claims (9)

1. a kind of production method of the thick copper coin of acid etching, which is characterized in that include the following steps:
(1)Copper facing is carried out to semi-finished product PCB, obtains thick copper coin;
(2)Acid etching is performed under heating conditions to obtained thick copper coin, obtains the thick copper coin of acid etching.
2. a kind of production method of the thick copper coin of acid etching according to claim 1, which is characterized in that step(1)In, The copper facing is electroplated using vertical continuous plating lines.
3. a kind of production method of the thick copper coin of acid etching according to claim 1 or 2, which is characterized in that step(1) In, the copper-plated uniformity is very poor≤5um.
4. a kind of production method of the thick copper coin of acid etching according to claim 1, which is characterized in that step(1)In, The hole copper thickness upper limit in the thickness copper coin is up to the copper thickness+1um of semi-finished product PCB.
5. a kind of production method of the thick copper coin of acid etching according to claim 1, which is characterized in that step(1)In, Etching factor >=4.0 of the thickness copper coin.
6. a kind of production method of the thick copper coin of acid etching according to claim 1, which is characterized in that step(2)In, The heating is heated to 48 ~ 52 DEG C.
7. a kind of production method of the thick copper coin of acid etching according to claim 1, which is characterized in that step(2)In, In the etching solution of the acid etching, NaClO3Content control in 28 ~ 36 equivalent concentration, the content of HCl is controlled 2.3 ~ 2.7 Equivalent concentration, Cu2+Concentration control in 130 ~ 140g/L.
8. a kind of production method of the thick copper coin of acid etching according to claim 1, which is characterized in that step(2)In, The pressure of the acid etching controls:Upper pressure is 2.7 ~ 3.1kg/cm2, push as 2.3 ~ 2.7kg/cm2
9. a kind of production method of the thick copper coin of acid etching according to claim 1, which is characterized in that step(2)In, The etch uniformity up and down of the acid etching is >=93%.
CN201810695167.2A 2018-06-29 2018-06-29 A kind of production method of the thick copper coin of acid etching Pending CN108650798A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810695167.2A CN108650798A (en) 2018-06-29 2018-06-29 A kind of production method of the thick copper coin of acid etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810695167.2A CN108650798A (en) 2018-06-29 2018-06-29 A kind of production method of the thick copper coin of acid etching

Publications (1)

Publication Number Publication Date
CN108650798A true CN108650798A (en) 2018-10-12

Family

ID=63749889

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810695167.2A Pending CN108650798A (en) 2018-06-29 2018-06-29 A kind of production method of the thick copper coin of acid etching

Country Status (1)

Country Link
CN (1) CN108650798A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110191596A (en) * 2019-04-18 2019-08-30 奥士康精密电路(惠州)有限公司 A kind of PCB production method of BGA welding roundlet PAD

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03222392A (en) * 1990-01-29 1991-10-01 Hitachi Ltd Formation of printed wiring pattern
CN103208401A (en) * 2013-04-01 2013-07-17 Aem科技(苏州)股份有限公司 Circuit protection device and manufacturing method thereof
CN104762620A (en) * 2014-06-13 2015-07-08 叶涛 High-efficient high-quality acidic copper chloride circuit board etching solution
CN105072810A (en) * 2015-07-15 2015-11-18 恩达电路(深圳)有限公司 Method for producing double-surface thick copper flexible working board
CN105407645A (en) * 2015-10-29 2016-03-16 深圳市五株科技股份有限公司 Etching method of thick-copper circuit board
CN106961800A (en) * 2017-03-21 2017-07-18 奥士康精密电路(惠州)有限公司 Double IC clamps preparation method on a kind of PCB
CN107872921A (en) * 2017-08-30 2018-04-03 奥士康精密电路(惠州)有限公司 A kind of design method of characteristic impedance

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03222392A (en) * 1990-01-29 1991-10-01 Hitachi Ltd Formation of printed wiring pattern
CN103208401A (en) * 2013-04-01 2013-07-17 Aem科技(苏州)股份有限公司 Circuit protection device and manufacturing method thereof
CN104762620A (en) * 2014-06-13 2015-07-08 叶涛 High-efficient high-quality acidic copper chloride circuit board etching solution
CN105072810A (en) * 2015-07-15 2015-11-18 恩达电路(深圳)有限公司 Method for producing double-surface thick copper flexible working board
CN105407645A (en) * 2015-10-29 2016-03-16 深圳市五株科技股份有限公司 Etching method of thick-copper circuit board
CN106961800A (en) * 2017-03-21 2017-07-18 奥士康精密电路(惠州)有限公司 Double IC clamps preparation method on a kind of PCB
CN107872921A (en) * 2017-08-30 2018-04-03 奥士康精密电路(惠州)有限公司 A kind of design method of characteristic impedance

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110191596A (en) * 2019-04-18 2019-08-30 奥士康精密电路(惠州)有限公司 A kind of PCB production method of BGA welding roundlet PAD

Similar Documents

Publication Publication Date Title
CN106244989B (en) The method and apparatus of the flexible micro-nano metalolic network transparent conductive film of continuous production
CN103060882B (en) The method and system of electrolytic copper foil are produced in a kind of copper-bath countercurrent flow
CN104540335A (en) Method for routing golden finger area in circuit board
CN101392392A (en) Rigid pure gold ornamental article processing technology
CN108650798A (en) A kind of production method of the thick copper coin of acid etching
CN205764355U (en) Prevent narrow boards from cutting the fitting device of groove deformation open
CN110402033B (en) Circuit processing method of 10oz thick copper circuit board
CN201376988Y (en) Continuous annealing device for copper alloy flat wire
CN115821336A (en) Additive for super-thick electrolytic copper foil, super-thick electrolytic copper foil and preparation process of super-thick electrolytic copper foil
CN116709662A (en) Solder resist printing process for printed circuit board
CN202220129U (en) Multi-dimensional glass-conveying rotatory table
CN102180655B (en) Crucible and production process thereof
CN203904492U (en) Anode plate used in treatment of heat-resistant layer of copper foil
CN106970081B (en) A kind of crack defect method of inspection of silica crucible finished product
CN206385264U (en) A kind of corrugation copper-clad plate
CN113549773A (en) Process for producing high-purity sponge copper by using copper chloride acidic etching waste liquid
CN102350860B (en) Method for preventing printing ink from entering hole during preparation process of printed circuit board (PCB)
CN206467314U (en) Multilager base plate level plating electricity and electroless-plating mechanism
CN201872292U (en) Micro-adjusting device for polyvinyl chloride (PVC) celuka foam sheet setting plate
CN111958494A (en) Production process of surface oxide of base material for composite board
CN105731768A (en) Plate glass circular ring rotation continuous molding annealing furnace
CN205473992U (en) A multithread way send whitewashed mouth for laser cladding
CN111304575A (en) Method for reducing zinc slag defects on surface of hot-dip galvanized automobile plate
CN218835615U (en) Metal wire drawing processing integrated device
CN114227018A (en) Display panel structure and method suitable for efficiently cutting special-shaped screen

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20181012

RJ01 Rejection of invention patent application after publication