CN108062793B - Object top processing method, device, equipment and storage medium based on elevation - Google Patents
Object top processing method, device, equipment and storage medium based on elevation Download PDFInfo
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Abstract
The embodiment of the invention discloses a method, a device, equipment and a storage medium for processing the top of an object based on a high range. The method comprises the following steps: determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object; extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a patch; performing planar estimation on the plaque to distinguish planar plaque from non-planar plaque; and determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch, and assigning the uniform elevation value to each pixel in the plane patch. By the technical scheme, the optimization of the processing process of the top surface of the target object based on the elevation data is realized, and the problem that the top surface of the target object is rough in extraction is solved, so that a more accurate and attractive surface effect can be obtained.
Description
Technical Field
The embodiment of the invention relates to a map data processing technology, in particular to an object top processing method, device, equipment and storage medium based on elevation.
Background
A Digital Surface Model (DSM) is a map Model that represents elevation data. Surface elevation data is typically collected as DSM via satellite or like means.
In order to better utilize data of the DSM and form map data which can be called by other programs and can be conveniently displayed, the requirement for identifying and distinguishing target objects such as buildings and the like in the DSM is provided. I.e., differentiating the building from the DSM and building gridded model data to form an independent data monomer vector.
However, this model can only reflect height changes, and it is not convenient to form a single vector in a map by independently determining various buildings. In particular, the top surface of buildings is not treated effectively in a good way. For example, the display effect of the monomer vector is very rough due to the error of the height data and the actual situation.
Disclosure of Invention
Embodiments of the present invention provide an object top processing method, apparatus, device, and storage medium based on elevation to optimize a target object top surface processing process based on elevation data, and obtain a more accurate and beautiful surface effect.
In a first aspect, an embodiment of the present invention provides an elevation-based object top processing method, including:
determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object;
extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a patch;
performing planar estimation on the plaque to distinguish planar plaque from non-planar plaque;
and determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch, and assigning the uniform elevation value to each pixel in the plane patch.
In a second aspect, an embodiment of the present invention further provides an apparatus for processing a top of an object based on elevation, the apparatus including:
the target area determining module is used for determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object;
the patch forming module is used for extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a patch;
a plane estimation module for performing plane estimation on the plaque to distinguish a planar plaque from a non-planar plaque;
and the elevation value determining module is used for determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch and assigning the uniform elevation value to each pixel in the plane patch.
In a third aspect, an embodiment of the present invention further provides an apparatus, where the apparatus includes: one or more processors;
a storage device for storing one or more programs,
when executed by the one or more processors, cause the one or more processors to implement a method for elevation-based top processing of an object as described in any of the embodiments of the invention.
In a fourth aspect, embodiments of the present invention further provide a computer-readable storage medium, on which a computer program is stored, which, when executed by a processor, implements any one of the elevation-based object top processing methods described in the embodiments of the present invention.
According to the embodiment of the invention, the area where the target object is located is determined from the elevation data model according to the outer contour boundary of the target object, and the area range for processing the top of the object is preliminarily determined; extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, aggregating to form patches, and performing primary processing on the tops; distinguishing planar patches from non-planar patches by performing a planar estimation of the patches; the unified elevation value of the plane patch is determined according to the elevation data of each pixel in the plane patch, and the pixels in the plane patch are assigned, so that the surface of the target object with the planar top can be effectively identified and processed, the error between the elevation data and the actual situation is reduced to a certain extent, the top surface processing process of the target object based on the elevation data is optimized, and a more accurate and attractive surface effect is obtained.
Drawings
FIG. 1 is a flow chart of a method for elevation-based top processing of an object in accordance with a first embodiment of the present invention;
FIG. 2 is a digital surface model diagram of a building in accordance with a first embodiment of the invention;
FIG. 3 is a plot of a building patch formed after processing in elevation according to one embodiment of the present invention;
FIG. 4 is a flow chart of a method for elevation-based top processing of an object in accordance with a second embodiment of the present invention;
FIG. 5 is a three-dimensional model of a building according to a second embodiment of the present invention;
FIG. 6 is a flow chart of a method for elevation-based top processing of an object in accordance with a third embodiment of the present invention;
FIG. 7 is a schematic view of the top treatment process of the half-roof of the building according to the third embodiment of the present invention;
FIG. 8 is a schematic view of a top treatment process of a ridge of a building according to a third embodiment of the present invention;
FIG. 9 is a schematic diagram of an elevation-based object top processing apparatus according to a fourth embodiment of the present invention;
FIG. 10 is a schematic diagram of another elevation-based object top processing apparatus in accordance with a fourth embodiment of the present invention;
fig. 11 is a schematic structural diagram of an apparatus in the fifth embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Example one
The elevation-based object top processing method provided by the embodiment can be applied to digital modeling of surface objects, and can be executed by an elevation-based object top processing device, which can be implemented by software and/or hardware, and can be integrated into a device with data processing capability, such as a typical user terminal device, such as a mobile phone, a tablet computer, or a desktop computer. The technical solution of this embodiment mainly processes raw DSM data including elevation data. Referring to fig. 1, the method of the present embodiment specifically includes:
and S110, determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object.
The outline boundary refers to a boundary corresponding to a peripheral outline of the target object, or boundary data obtained after the target object is vertically projected, and may be obtained by manually measuring the boundary of the target object, or may be obtained by performing automated processing such as boundary extraction on an image of the target object.
Typically, the elevation data obtained prior to identifying or modeling the target object is data for a large spatial range encompassing the target object. In specific implementation, the obtained outline boundary data of the target object can be utilized to cut and extract the elevation data in the larger range, so that the elevation data of the area corresponding to the target object can be preliminarily determined from the huge elevation data. As shown in fig. 2, by forming a boundary line 201 using outline data of a building and performing data extraction on DSM data, DSM data in a small range including the building can be obtained.
And S120, extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a plaque.
The elevation setting range refers to a preset elevation difference value, for example, the elevation difference value range may be set to 1m to 5m, that is, the elevation setting range is set to 1m to 5 m. The smaller the value of the set elevation range is, the finer the processing effect of the top of the object is, and the closer the obtained top of the object is to the actual situation; the larger the value, the rougher the object top treatment effect. In order to quickly obtain a top surface that is more realistic and more aesthetically pleasing to the user, the setting of the elevation range values may be adjusted appropriately according to the size of the building.
Specifically, pixel extraction is performed according to a set elevation range and elevation data of each pixel in a region corresponding to the target object. For example, if the elevation range is set to be 1m, pixel extraction is performed on the elevation data corresponding to the target object every 1m of the elevation difference, a plurality of pixel extraction results corresponding to the target object are obtained, and each pixel extraction result can be aggregated to form a patch. This further reduces the scope of the top treatment of the target object, thereby making the subsequent treatment more accurate and the resulting top surface more aesthetically pleasing.
And S130, performing plane estimation on the plaque to distinguish a plane plaque from a non-plane plaque.
The planar plaque refers to a plaque the surface of which is approximately a horizontal plane, and the non-planar plaque refers to a plaque the included angle between all or part of the plaque and the horizontal plane is larger than a set included angle threshold value. The set angle threshold may be set to a small angle value, such as 20 degrees.
Specifically, plane estimation is performed on all patches obtained in the above process one by one to determine whether the patch is a planar patch. The plane estimation method can be judging by using a patch dip angle, wherein the patch dip angle can be an included angle between a normal of each pixel point of the patch and a vertical line, or an included angle between a normal of a pixel in a local area of the patch and the vertical line; or judging by utilizing the shape change rule among the patches; the judgment may be made by combining the above two. The advantage of this arrangement is that the elevation data of the planar patch and the non-planar patch can be processed separately and subsequently, resulting in a more realistic top surface of the target.
Optionally, before performing planar estimation on the plaque to distinguish a planar plaque from a non-planar plaque, the above technical solution further includes: noise patches are identified from the patches and merged into neighboring patches.
The noise patch is an error patch due to an error in elevation data, an error in patch formation, or the like, and may be an extremely small patch that needs to be ignored.
In a specific implementation process, the area of the plaque can be directly calculated, and if the area is smaller than a certain preset area value (namely a set area value), the plaque can be determined as a noise plaque; it is also possible to calculate the perimeter/area ratio of the plaque, and determine it as a noise plaque if the perimeter/area ratio is larger than a certain preset ratio value (i.e., a set ratio value). After the noise plaque is determined, the elevation data of the noise plaque and the adjacent plaque thereof are compared, for example, the mean value or the median value of the elevation data of the noise plaque and the adjacent plaque thereof are compared, and the noise plaque is merged into the adjacent plaque with the approximate elevation data. For example, the DSM data of the building shown in fig. 2 is subjected to S120 and the above-described noise patch processing, and patch data of the building can be obtained, as shown in fig. 3. The advantage of this arrangement is that the data processing amount can be effectively reduced, and the estimation error of the subsequent plane estimation can be reduced, thereby improving the accuracy of the processing result of the top of the target object.
S140, determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch, and assigning the uniform elevation value to each pixel in the plane patch.
Wherein, the unified elevation value refers to a certain elevation value obtained by processing.
Specifically, for any one of the planar patches determined in the above process, the elevation values of all pixels in the planar patch are processed, such as directly obtaining an elevation average value or sampling the elevation average value, so as to obtain a uniform elevation value in the planar patch. Then, the elevation values of the pixels in the planar patch are all set to be the uniform elevation value. Thus, the planar patch has only one elevation, i.e., a uniform elevation. It should be noted that, because the elevation values of the non-planar patches are not processed, the elevation values of the pixels in the non-planar patches all remain the original elevation values. Alternatively, the elevation values of the non-planar patches may be smoothed or otherwise manipulated to maintain the original value interfaces as much as possible.
According to the technical scheme of the embodiment, the area where the target object is located is determined from the elevation data model according to the outer contour boundary of the target object, and the elevation data range for processing the top of the object is preliminarily determined; extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form patches, so that the elevation data range for processing the top of the object is further reduced; distinguishing planar patches from non-planar patches by performing a planar estimation of the patches; the unified elevation value of the plane patch is determined according to the elevation data of each pixel in the plane patch, and the pixels in the plane patch are assigned, so that the surface of the target object with the planar top can be effectively identified and processed, the error between the elevation data and the actual situation is reduced to a certain extent, the top surface processing process of the target object based on the elevation data is optimized, and a more accurate and attractive surface effect is obtained.
Example two
On the basis of the above embodiments, the present embodiment further optimizes "performing planar estimation on the patches to distinguish planar patches from non-planar patches". On the basis, the method can further add a step of generating a grid model of the target object according to the elevation data of each plaque of the target object. Wherein explanations of the same or corresponding terms as those of the above embodiments are omitted. Referring to fig. 4, the method for processing the top of the object based on the elevation provided by the embodiment includes:
s210, determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object.
S220, extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a patch.
And S230, aiming at the pixels in any one of the patches, calculating an included angle between a normal line and a vertical line at the pixel.
In the specific implementation process, firstly, any one formed patch is selected, and the normal of all pixel points or sampling local pixel points in the selected patch is determined, wherein the normal of the pixel point refers to the normal of a micro-surface formed by the pixel and the adjacent pixels around the pixel. And recording the number of the pixel points with the normal lines calculated as N, and then selecting N normal lines in the patch. And then, calculating an included angle between each normal line of the N normal lines and the vertical line, wherein N included angle values exist in the selected plaque. The angle calculation is performed for all patches formed in S220 according to the above procedure.
S240, if the number of the pixels of which the included angles are smaller than the set included angle threshold exceeds the set lower limit value, determining that the plaque is a planar plaque, otherwise, determining that the plaque is a non-planar plaque.
The set lower limit value refers to a preset threshold value used for judging whether the patch is a plane or not, and can be set as a specific pixel number threshold value, and the setting of the pixel number threshold value is related to the number N of included angles in the patch in S230; a proportional threshold may also be set.
Specifically, in the present embodiment, the setting of the lower limit value as the proportional threshold is taken as an example. And for any plaque, comparing the N included angle values with a set included angle threshold value, and counting the number of pixels of which included angle values are smaller than the set included angle threshold value and recording as M. Then, calculating the ratio of the pixel number M to the included angle value number N, namely M/N, comparing the ratio M/N with a set lower limit value (namely a ratio threshold), if the ratio M/N is larger than or equal to the ratio threshold, judging the patch as a planar patch, otherwise, judging the patch as a non-planar patch. For example, setting the included angle threshold to be 20 degrees, setting the lower limit value to be 50% of the proportional threshold, counting the number M of pixels smaller than 20 degrees in the N included angle values, and if M/N is larger than or equal to 50%, determining that the patch is a planar patch; if M/N < 50%, then the blob is a non-planar blob. According to the above process, whether all the patches in S220 are planar patches is determined.
And S250, determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch, and assigning the uniform elevation value to each pixel in the plane patch.
And S260, generating a grid model of the target object according to the elevation data of each plaque of the target object.
Specifically, a grid model of the target object is generated according to the elevation data of the target object or the patch data formed in the above process. Because the plaque which is a plane in the target object is subjected to the elevation value processing in the process, the actual appearance of the target object can be more accurately restored in the generated grid model, and the three-dimensional model generated according to the grid model in the follow-up process can better accord with the actual situation and is more attractive. The method has the advantages that through the DSM data processing, the grid data of the target object are generated, the data portability can be increased, and the data utilization rate can be improved. For example, after the above-mentioned processing is performed on the patch data of the building shown in fig. 3, a corresponding mesh model is generated, and further, a three-dimensional model of the building is generated according to the mesh model, as shown in fig. 5, which is more similar to the external shape of the building in the DSM data shown in fig. 2.
Optionally, before generating the mesh model of the target object according to the elevation data of each plaque of the target object, the above technical solution further includes: and combining the elongated patches corresponding to the outer contour boundary of the target object into linear patches.
Specifically, in the patches formed in S220, corresponding patches are also formed at the outer contour boundary of the target object, for example, the outer wall of the building should be a straight line segment, but in the formed patch data, a number of strip-shaped patches are formed here, and such patches belong to the error patches at the outer contour boundary and need to be merged into a straight-line patch. The method has the advantages that before the grid model of the target object is generated, the patch data of the outer contour boundary are further processed, so that the generation precision of the grid model can be improved, and the finally generated surface is more attractive and real.
According to the technical scheme, the included angle between the normal line and the vertical line of the pixel is calculated by aiming at any pixel in the patch, if the number of pixels with the included angle smaller than a set included angle threshold value exceeds a set lower limit value, the patch is determined to be a planar patch, otherwise, the patch is a non-planar patch, the planar surface in the top surface of the target object can be accurately judged, the problem that the surface of the target object is rough in display is solved, and the planar surface of the target object can better accord with the actual situation of the target object. By generating the grid model of the target object according to the elevation data of each patch of the target object, the problem of low usage rate of DSM data of the target object is solved, the portability of the data can be increased, and the data utilization rate is improved while the data accuracy rate is improved.
EXAMPLE III
In this embodiment, on the basis of the foregoing embodiments, a "for any current planar patch, if a shape change rule between the current planar patch and at least one adjacent patch satisfies a set condition, the current planar patch is changed into a non-planar patch". Wherein explanations of the same or corresponding terms as those of the above embodiments are omitted. Referring to fig. 6, the method for processing the top of the object based on the elevation provided by the embodiment includes:
s310, determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object.
And S320, extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a patch.
S330, carrying out plane estimation on the plaque to distinguish a plane plaque from a non-plane plaque.
S340, after the planar patches are determined, for any current planar patch, if the shape change rule between the current planar patch and at least one adjacent patch meets a set condition, changing the current planar patch into a non-planar patch.
The setting condition refers to a preset shape change rule used for judging whether the plaque is a planar plaque, for example, the setting condition may be a nested ring shape, a continuously arranged zigzag shape, a continuously parallel line shape, or the like.
Specifically, after the planar patches are determined in S330, any one of the planar patches, that is, the current planar patch, is selected, patch shape recognition is performed on the current planar patch and at least one adjacent patch thereof, and then it is determined whether there is a shape change rule between the recognized shapes, and whether the shape change rule satisfies a set condition. If so, the current planar patch is modified to be a non-planar patch. According to this procedure, all planar patches are judged. The adjacent patches may be planar patches or non-planar patches.
Optionally, S340 includes: if the current plane plaque and at least one adjacent plaque are mutually nested annular, determining that the current plane plaque and the adjacent plaque are non-plane plaques; and if the current plane plaque and at least one adjacent plaque are in a continuously arranged zigzag shape, determining that the current plane plaque and the adjacent plaque are non-plane plaques.
Specifically, after the shape of the current planar patch and at least one adjacent patch thereof are identified, whether all identified shapes are mutually nested annular or continuously arranged zigzag is judged. If so, judging that the current plane patch is a non-plane patch, and in the subsequent elevation value processing process, keeping the original elevation value of the current plane patch and adjacent patches which form a nested annular or continuously arranged zigzag with the current plane patch. The method has the advantages that the top surface of the special target object such as a pointed top, a hemispherical top or a ridge can be processed more accurately, so that the obtained target object model can better meet the actual situation.
Referring to fig. 7, after the processing of S320 and S330 is performed on the hemispherical top 701 in fig. 7, a hemispherical top patch group 702 is formed. Optionally selecting one planar patch in the hemispherical top patch group 702 as a current patch, and according to the processing procedure, determining that the shapes of the patches in the hemispherical top patch group 702 form the mutually nested rings 703, that is, determining that the planar patches in the hemispherical top patch group 702 are all non-planar patches. Then in subsequent processing, these patches retain the original elevation values, and finally, a three-dimensional hemisphere model 704 of the hemisphere top 701 can be formed instead of three-dimensional annular plane models stacked on each other.
Referring to fig. 8, after the processing of S320 and S330 is performed on the ridge 801 in the building, a ridge patch group is formed, and any one of the planar patches in the ridge patch group is selected as the current patch, according to the above processing procedure, it can be determined that the shapes of the patches in the ridge patch group form a continuously arranged zigzag shape 802, that is, it can be determined that the planar patches in the ridge patch group are all non-planar patches. Then in subsequent processing, these patches retain the original elevation values, and finally, a three-dimensional ridge model of the ridge 801 can be formed, instead of three-dimensional plane models stacked on each other.
S350, determining a unified elevation value of the plane patch according to the elevation data of each pixel in the plane patch, and assigning the unified elevation value to each pixel in the plane patch.
Of course, on the basis of the above scheme, the method may further include: and generating a grid model of the target object according to the elevation data of each plaque of the target object.
According to the technical scheme of the embodiment, after the planar patches are determined, for any current planar patch, if the shape change rule between the current planar patch and at least one adjacent patch meets the set condition, the current planar patch is changed into a non-planar patch, the problem that the special top modeling treatment is rough in the top treatment process of the target object is solved, and the more accurate and more attractive top surface of the target object can be further obtained.
The following is an embodiment of an elevation-based object top processing apparatus provided by an embodiment of the present invention, which belongs to the same inventive concept as the elevation-based object top processing methods of the above embodiments, and details that are not described in detail in the embodiment of the elevation-based object top processing apparatus may be referred to the above embodiment of the elevation-based object top processing method.
Example four
The embodiment provides an apparatus for processing the top of an object based on elevation, referring to fig. 9, the apparatus specifically includes:
a target area determining module 910, configured to determine, according to an outer contour boundary of the target object, an area where the target object is located from the elevation data model;
a patch forming module 920, configured to extract pixels of the elevation data within a set elevation range according to elevation data of each pixel in an area where the target object is located, and aggregate the pixels to form a patch;
a plane estimation module 930 for performing plane estimation on the patches to distinguish planar patches from non-planar patches;
and an elevation value determining module 940, configured to determine a uniform elevation value of the planar patch according to the elevation data of each pixel in the planar patch, and assign the uniform elevation value to each pixel in the planar patch.
The plane estimation module 930 is specifically configured to:
aiming at the pixels in any one of the patches, calculating an included angle between a normal line and a vertical line at the pixel;
and if the number of pixels of which the included angles are smaller than the set included angle threshold value exceeds a set lower limit value, determining that the plaque is a planar plaque, otherwise, determining that the plaque is a non-planar plaque.
Optionally, on the basis of the above apparatus, referring to fig. 10, the apparatus further includes:
a noise patch processing module 950 for identifying noise patches from the patches and merging the noise patches into neighboring patches before performing a planar estimation on the patches to distinguish planar patches from non-planar patches.
Optionally, on the basis of the above apparatus, the apparatus further includes:
the patch modifying module 960 is configured to, after determining the planar patches, modify, for any current planar patch, the current planar patch into a non-planar patch if a shape change rule between the current planar patch and at least one adjacent patch satisfies a set condition.
The plaque modification module 960 is specifically configured to:
if the current plane plaque and at least one adjacent plaque are mutually nested annular, determining that the current plane plaque and the adjacent plaque are non-plane plaques;
and if the current plane plaque and at least one adjacent plaque are in a continuously arranged zigzag shape, determining that the current plane plaque and the adjacent plaque are non-plane plaques.
Optionally, on the basis of the above apparatus, the apparatus further includes:
and the grid model generating module 980 is used for determining a uniform elevation value of the planar patch according to the elevation data of each pixel in the planar patch, assigning the uniform elevation value to each pixel in the planar patch, and then generating a grid model of the target object according to the elevation data of each patch of the target object.
Optionally, on the basis of the above apparatus, the apparatus further includes:
the contour processing module 970 is configured to merge the elongated patches corresponding to the outer contour boundaries of the target object into linear patches before generating the mesh model of the target object according to the elevation data of each patch of the target object.
By the object top processing device based on the elevation, optimization of a target object top surface processing process based on elevation data is achieved, the problem that the target object top surface is rough in extraction is solved, and therefore a more accurate and attractive surface effect can be achieved.
The object top processing device based on the elevation provided by the embodiment of the invention can execute the object top processing method based on the elevation provided by any embodiment of the invention, and has corresponding functional modules and beneficial effects of the execution method.
It should be noted that, in the embodiment of the above height-based object top processing apparatus, the included units and modules are merely divided according to the functional logic, but are not limited to the above division as long as the corresponding functions can be realized; in addition, specific names of the functional units are only for convenience of distinguishing from each other, and are not used for limiting the protection scope of the present invention.
EXAMPLE five
Referring to fig. 11, the present embodiment provides an apparatus 1100, comprising: one or more processors 1120; a storage device 1110 for storing one or more programs, which when executed by the one or more processors 1120, cause the one or more processors 1120 to implement a method for elevation-based top processing of an object as provided by an embodiment of the present invention, including:
determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object;
extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a patch;
performing planar estimation on the plaque to distinguish planar plaque from non-planar plaque;
and determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch, and assigning the uniform elevation value to each pixel in the plane patch.
Of course, it will be understood by those skilled in the art that the processor 1120 may also implement the solution of the elevation-based object top processing method provided by any embodiment of the present invention.
The device 1100 shown in fig. 11 is only an example and should not bring any limitations to the functionality or scope of use of the embodiments of the present invention.
As shown in fig. 11, device 1100 is embodied in a general purpose computing device. The components of device 1100 may include, but are not limited to: one or more processors 1120, a storage device 1110, and a bus 1150 that couples the various system components (including the storage device 1110 and the processors 1120).
A program 1114 having a set (at least one) of program modules 1115 may be stored, for example, in the storage device 1110, such program modules 1115 include, but are not limited to, an operating system, one or more application programs, other program modules, and program data, each of which examples or some combination thereof may include an implementation of a network environment. The program modules 1115 generally perform the functions and/or methods described in any of the embodiments of the present invention.
The device 1100 may also communicate with one or more external devices 1160 (e.g., keyboard, pointing device, display 1170, etc.), with one or more devices that enable a user to interact with the device 1100, and/or with any devices (e.g., network card, modem, etc.) that enable the device 1100 to communicate with one or more other computing devices. Such communication may occur via input/output (I/O) interfaces 1130. Also, the device 1100 may communicate with one or more networks (e.g., a Local Area Network (LAN), a Wide Area Network (WAN), and/or a public network such as the internet) via the network adapter 1140. As shown in fig. 11, the network adapter 1140 communicates with the other modules of the device 1100 via the bus 1150. It should be understood that although not shown in the figures, other hardware and/or software modules may be used in conjunction with the device 1100, including but not limited to: microcode, device drivers, redundant processing units, external disk drive arrays, RAID systems, tape drives, and data backup storage systems, among others.
The processor 1120 executes programs stored in the storage device 1110 to perform various functional applications and data processing, such as implementing the elevation-based object top processing method provided by the embodiments of the present invention.
EXAMPLE six
The present embodiments provide a storage medium containing computer-executable instructions which, when executed by a computer processor, perform a method for elevation-based top processing of an object, the method comprising:
determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object;
extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a patch;
performing planar estimation on the plaque to distinguish planar plaque from non-planar plaque;
and determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch, and assigning the uniform elevation value to each pixel in the plane patch.
Of course, the embodiments of the present invention provide a storage medium containing computer-executable instructions, which are not limited to the operations of the method described above, but may also perform related operations in the method for processing the top of an object based on elevation provided by any of the embodiments of the present invention.
Computer storage media for embodiments of the invention may employ any combination of one or more computer-readable media. The computer readable medium may be a computer readable signal medium or a computer readable storage medium. A computer readable storage medium may be, for example, but not limited to, an electronic, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, or device, or any combination of the foregoing. More specific examples (a non-exhaustive list) of the computer readable storage medium would include the following: an electrical connection having one or more wires, a portable computer diskette, a hard disk, a Random Access Memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disc read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the foregoing. In the context of this document, a computer readable storage medium may be any tangible medium that can contain, or store a program for use by or in connection with an instruction execution system, apparatus, or device.
A computer readable signal medium may include a propagated data signal with computer readable program code embodied therein, for example, in baseband or as part of a carrier wave. Such a propagated data signal may take many forms, including, but not limited to, electro-magnetic, optical, or any suitable combination thereof. A computer readable signal medium may also be any computer readable medium that is not a computer readable storage medium and that can communicate, propagate, or transport a program for use by or in connection with an instruction execution system, apparatus, or device.
Program code embodied on a computer readable medium may be transmitted using any appropriate medium, including but not limited to wireless, wireline, optical fiber cable, RF, etc., or any suitable combination of the foregoing.
Computer program code for carrying out operations for aspects of the present invention may be written in any combination of one or more programming languages, including an object oriented programming language such as Java, Smalltalk, C + + or the like and conventional procedural programming languages, such as the "C" programming language or similar programming languages. The program code may execute entirely on the user's computer, partly on the user's computer, as a stand-alone software package, partly on the user's computer and partly on a remote computer or entirely on the remote computer or server. In the case of a remote computer, the remote computer may be connected to the user's computer through any type of network, including a Local Area Network (LAN) or a Wide Area Network (WAN), or the connection may be made to an external computer (for example, through the Internet using an Internet service provider).
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (12)
1. An elevation-based object top processing method, comprising:
determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object;
extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a patch;
aiming at pixels in any one plaque, calculating an included angle between a normal line and a vertical line at the pixel, if the number of the pixels of which the included angle is smaller than a set included angle threshold value exceeds a set lower limit value, determining the plaque to be a planar plaque, and if not, determining the plaque to be a non-planar plaque;
and determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch, and assigning the uniform elevation value to each pixel in the plane patch.
2. The method of claim 1, wherein before performing a planar estimation of the blob to distinguish between planar and non-planar blobs, further comprising:
noise patches are identified from the patches and merged into neighboring patches.
3. The method of claim 1, after determining the planar blob, further comprising:
for any current plane plaque, if the shape change rule between the current plane plaque and at least one adjacent plaque meets a set condition, changing the current plane plaque into a non-plane plaque.
4. The method of claim 3, wherein if the shape change rule between the current planar patch and at least one adjacent patch satisfies a set condition, then modifying the current planar patch to be a non-planar patch comprises:
if the current plane plaque and at least one adjacent plaque are mutually nested annular, determining that the current plane plaque and the adjacent plaque are non-plane plaques;
and if the current plane plaque and at least one adjacent plaque are in a continuously arranged zigzag shape, determining that the current plane plaque and the adjacent plaque are non-plane plaques.
5. The method of claim 1, wherein after determining a uniform elevation value for the planar patch based on the elevation data for each pixel in the planar patch and assigning a value to each pixel in the planar patch, further comprising:
and generating a grid model of the target object according to the elevation data of each plaque of the target object.
6. The method of claim 5, wherein prior to generating the mesh model of the target object from the elevation data for each patch of the target object, further comprising:
and combining the elongated patches corresponding to the outer contour boundary of the target object into linear patches.
7. An elevation-based object top processing apparatus, comprising:
the target area determining module is used for determining the area where the target object is located from the elevation data model according to the outer contour boundary of the target object;
the patch forming module is used for extracting pixels of the elevation data in a set elevation range according to the elevation data of each pixel of the area where the target object is located, and aggregating to form a patch;
the plane estimation module is used for calculating an included angle between a normal line and a vertical line of a pixel in any patch, if the number of pixels of which the included angle is smaller than a set included angle threshold exceeds a set lower limit value, the patch is determined to be a plane patch, and if not, the patch is a non-plane patch;
and the elevation value determining module is used for determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch and assigning the uniform elevation value to each pixel in the plane patch.
8. The apparatus of claim 7, further comprising:
and the patch changing module is used for changing the current plane patch into a non-plane patch if the shape change rule between the current plane patch and at least one adjacent patch meets a set condition for any current plane patch after the plane patches are determined.
9. The apparatus of claim 8, wherein the plaque altering module is specifically configured to:
if the current plane plaque and at least one adjacent plaque are mutually nested annular, determining that the current plane plaque and the adjacent plaque are non-plane plaques;
and if the current plane plaque and at least one adjacent plaque are in a continuously arranged zigzag shape, determining that the current plane plaque and the adjacent plaque are non-plane plaques.
10. The apparatus of claim 7, further comprising:
and the grid model generation module is used for determining a uniform elevation value of the plane patch according to the elevation data of each pixel in the plane patch, assigning the uniform elevation value to each pixel in the plane patch, and then generating a grid model of the target object according to the elevation data of each patch of the target object.
11. A computer device, the device comprising:
one or more processors;
a storage device for storing one or more programs,
when executed by the one or more processors, cause the one or more processors to implement the elevation-based top of object processing method of any one of claims 1-6.
12. A computer-readable storage medium, on which a computer program is stored which, when being executed by a processor, carries out a method for elevation-based top processing of an object as recited in any one of claims 1-6.
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