CN107976870B - Motion platform positioning error compensation device and compensation method - Google Patents
Motion platform positioning error compensation device and compensation method Download PDFInfo
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- CN107976870B CN107976870B CN201610925991.3A CN201610925991A CN107976870B CN 107976870 B CN107976870 B CN 107976870B CN 201610925991 A CN201610925991 A CN 201610925991A CN 107976870 B CN107976870 B CN 107976870B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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Abstract
The invention discloses a motion table positioning error compensation device and a compensation method, wherein the device comprises a mask plate, wherein the mask plate is provided with a measurement mark for measuring the positioning error of a motion table, and the measurement mark comprises an X-direction measurement mark and a Y-direction measurement mark; the mask table is used for bearing a mask plate; the workpiece table is used for bearing the substrate after the glue coating; a projection objective for imaging the measurement mark on the mask onto a substrate; and the alignment device is used for measuring the imaging mark of the measurement mark on the developed substrate. Setting an X-direction measurement mark and a Y-direction measurement mark on a mask plate, carrying out positioning error test exposure aiming at a workpiece table and a mask table, measuring through an alignment device to obtain positioning errors of the workpiece table and the mask table, and processing data to obtain a positioning error compensation table; the invention can be used for on-line compensation and off-line calibration, is not limited by the type of the sensor and has stronger adaptability.
Description
Technical Field
The invention relates to the technical field of photoetching, in particular to a motion table positioning error compensation device and a compensation method.
Background
Photolithography, or photolithography, has been widely used in integrated circuit manufacturing processes. This technique transfers the designed mask pattern onto the photoresist by exposure through an optical projection device. Optical projection devices, which are important equipment in the fabrication of integrated circuits, ultimately determine the feature sizes of the integrated circuits, the accuracy requirements of which are of considerable importance to the lithographic process. In the exposure process, because the workpiece stage bearing the silicon wafer and the mask stage bearing the mask can generate stepping or scanning movement, the positioning precision of the moving stage can directly influence the quality of the pattern exposed on the silicon wafer.
The reflecting plane mirror is used for influencing the positioning accuracy in the motion platform measuring system controlled by the interferometer, and the plane grating is used for influencing the positioning accuracy in the motion platform measuring system controlled by the plane grating ruler. In any case, although the mirror plane or the grating scale plane is precisely machined and polished, the surface of the mirror or the grating scale inevitably has defects. Even defect spots of only a few nanometers in size cause considerable errors in the accuracy of the optical projection device. In order to reduce the above errors as much as possible, the optical plane surface must be tested before exposure to obtain the measurement data of the surface shape image, and then the surface defects are corrected and compensated, so as to meet the high precision requirement of the system.
In the prior art, a method for calibrating a positioning error of a motion stage is provided, which obtains interferometer reflector profile data by using redundancy of interferometer measurement axes, and performs filtering processing on the data to obtain final profile data. In actual use, feedforward compensation is carried out on the control parameters of the motion table according to the measured surface type data, so that the motion positioning error is reduced. However, this method is only suitable for a motion stage system using an interferometer with redundant measurement axes as a control sensor, and with the continuous development of the lithography technology, the planar grating scale has become the mainstream measurement sensor instead of the interferometer, so this method is no longer suitable.
Disclosure of Invention
The invention provides a motion platform positioning error compensation device and a compensation method, which are used for solving the problems in the prior art.
In order to solve the technical problems, the technical scheme of the invention is as follows: a motion stage positioning error compensation apparatus comprising:
the measurement mark comprises an X-direction measurement mark and a Y-direction measurement mark;
the mask table is used for bearing the mask plate and is connected with a mask table control system;
the workpiece table is used for bearing the substrate after the glue coating, and is connected with a workpiece table control system;
a projection objective for imaging the measurement mark on the mask onto a substrate;
an alignment device for measuring an imaging mark of the measurement mark on the developed substrate;
the X-direction measurement mark comprises two X-direction gratings, the Y-direction measurement mark comprises two Y-direction gratings, the X-direction measurement mark and the Y-direction measurement mark are arranged independently, the two X-direction gratings are arranged in a step shape and staggered along the X-axis direction, and the two Y-direction gratings are arranged in a step shape and staggered along the Y-axis direction;
the method comprises the steps of utilizing an X-direction measuring mark and a Y-direction measuring mark arranged on a mask plate, respectively carrying out X-direction stepping exposure and Y-direction stepping exposure on a substrate through a moving workpiece table, utilizing the Y-direction measuring mark arranged on the mask plate, carrying out Y-direction stepping exposure on the substrate through a moving mask table and the workpiece table, measuring deviation of overlapping areas of the measuring marks after a plurality of adjacent stepping exposures through an alignment device to obtain positioning errors of the workpiece table and the mask table, carrying out data processing to obtain a compensation table of the positioning errors, and respectively carrying out feedforward compensation on a workpiece table control system and the mask table control system through the obtained compensation table.
Furthermore, the mask stage control system and the workpiece stage control system adopt an interferometer, a grating ruler or a planar grating ruler.
Further, the alignment device adopts a CCD or a grating ruler.
Further, the X-direction measurement marks and the Y-direction measurement marks are combined and arranged to form combined marks, the X-direction measurement marks and the Y-direction measurement marks are alternately arranged along the X direction and the Y direction, wherein two X-direction gratings in the X-direction measurement marks are arranged in parallel along the Y-axis direction, two Y-direction gratings in the Y-direction measurement marks are arranged in parallel along the X-axis direction, a distance between a first edge of any one of the X-direction gratings in the X-direction measurement marks and a second edge of any one of the Y-direction gratings in the Y-direction measurement marks is greater than a length of a slit in the X-direction grating or the Y-direction grating, the first edge is an edge of any one of the X-direction gratings close to any one of the Y-direction gratings, and the second edge is an edge of any one of the Y-direction gratings close to any one of the X-direction gratings.
The invention also provides a compensation method of the motion platform positioning error compensation device, which comprises the following steps:
s1: gluing the substrate, and uploading the glued substrate to a workpiece table;
s2: carrying out positioning error test exposure on the workpiece table;
s3: carrying out mask table positioning error test exposure;
s4: downloading the exposed substrate for development;
s5: uploading the developed substrate to a workpiece table again and moving the developed substrate to the lower part of the alignment device for measurement;
s6: calculating the positioning errors of the workpiece table and the mask table according to the measurement result, and performing data processing to obtain a positioning error compensation table;
s7: respectively carrying out feedforward compensation on the workpiece table control system and the mask table control system by using the obtained compensation table;
wherein, the motion stage positioning error compensation device as described above is used in the positioning error test exposure in the steps S2 and S3.
Further, in step S2, the exposure for testing the positioning error of the workpiece stage includes the following steps:
s21: uploading a mask plate with the X-direction measurement mark and the Y-direction measurement mark arranged independently;
s22: moving the X-direction measuring mark above the projection objective and keeping the mask table still;
s23: setting the size of an exposure window to ensure that only the X-direction measurement mark region is transparent, and performing X-direction stepping exposure;
s24: and moving the Y-direction measuring mark above the projection objective, keeping the mask table still, setting the size of an exposure window, ensuring that only one area with the size of the Y-direction measuring mark is transparent, and carrying out Y-direction stepping exposure.
Further, the step dx of the X-direction step exposure and the step dy of the Y-direction step exposure are as follows:
dx is the distance between the middle positions of two X-direction gratings in the X-direction measuring mark in the X-direction, Dy is the distance between the middle positions of two Y-direction gratings in the Y-direction measuring mark in the Y-direction, and M is the magnification of the objective lens.
Further, in step S3, the performing of the mask stage positioning error test exposure includes the following steps:
s31: uploading a mask plate with the X-direction measurement mark and the Y-direction measurement mark arranged independently;
s32: selecting a blank area on the substrate and moving the area under the projection objective;
s33: setting the size of an exposure window to ensure that only one region with the size of the Y-direction measurement mark is transparent;
s34: carrying out Y-direction motion mask stage by a step distance Ly, and simultaneously carrying out Y-direction stepping exposure on the workpiece stage by a step distance Dy, wherein the step distance Dy is Dy & M;
where Ly is the distance between the Y-direction measurement marks on the mask, Dy is the distance between the middle positions of the two Y-direction gratings in the Y-direction measurement marks in the Y-direction, and M is the magnification of the objective lens.
Further, in step S6, the positioning errors of the workpiece stage and the mask stage are obtained by calculating the deviation amount of the X-direction measurement mark and the deviation amount of the Y-direction measurement mark in three adjacent step exposures in the positioning error test exposure of the workpiece stage and the mask stage, respectively.
Further, in step S7, if no reference value is set, the compensation table obtained by the first test is used as a reference value, and feed-forward compensation is performed when the workpiece stage control system and the mask stage control system perform servo control; if the reference value is set, comparing the compensation table obtained by the first test with the reference value, if the difference value is smaller than a preset warning threshold value, adopting the newly-tested compensation table to perform feedforward compensation, otherwise sending warning information to prompt a user, and selecting whether to continue the mass production exposure by the user, if the user selects to continue the production, adopting the newly-tested compensation table to perform feedforward compensation, otherwise, stopping the production; and if the difference value is larger than the preset dislocation threshold value, sending out error information and stopping production.
Further, in step S2, the exposure for testing the positioning error of the workpiece stage includes the following steps:
s21: uploading a mask plate with combined arrangement of an X-direction measurement mark and a Y-direction measurement mark;
s22: moving the combined mark on the mask plate to the position above the projection objective and keeping the mask table still;
s23: setting the size of an exposure window to ensure that only one combined mark region is transparent;
s24: and carrying out X-direction stepping exposure or Y-direction stepping exposure.
Further, the step dx of the X-direction step exposure and the step dy of the Y-direction step exposure are as follows:
dx is the distance between the middle positions of two X-direction gratings in the X-direction measuring mark on the mask in the X-axis direction, Dy is the distance between the middle positions of two Y-direction gratings in the Y-direction measuring mark on the mask in the Y-axis direction, and M is the magnification of the objective lens.
Further, in step S3, the performing a mask stage positioning error test exposure includes the following steps:
s31: uploading a mask plate with combined arrangement of an X-direction measurement mark and a Y-direction measurement mark;
s32: selecting a blank area on the substrate and moving the area under the projection objective;
s33: setting the size of an exposure window to ensure that only one area with the size of the combined mark is transparent;
s34: carrying out Y-direction motion mask stage by a step distance Ly, and simultaneously carrying out Y-direction stepping exposure on the workpiece stage by a step distance Dy, wherein the step distance Dy is Dy & M;
where Ly is the distance between the combined marks on the mask, Dy is the distance between the middle positions of the two Y-directional gratings in the Y-directional measurement mark in the Y-axis direction, and M is the magnification of the objective lens.
The device comprises a mask plate, wherein measurement marks for measuring the positioning error of the motion table are arranged on the mask plate, and the measurement marks comprise an X-direction measurement mark and a Y-direction measurement mark; the mask table is used for bearing the mask plate; the workpiece table is used for bearing the substrate after the glue coating; a projection objective for imaging the measurement mark on the mask onto a substrate; and the alignment device is used for measuring the imaging mark of the measurement mark on the developed substrate. Setting an X-direction measurement mark and a Y-direction measurement mark on a mask plate, respectively carrying out positioning error test exposure on a workpiece table and a mask table, obtaining the positioning errors of the workpiece table and the mask table through the measurement result of an alignment device, and carrying out data processing to obtain a positioning error compensation table; the invention can be used for on-line compensation and off-line calibration, is not limited by the type of the sensor and has stronger adaptability.
Drawings
Fig. 1 is a schematic structural diagram of a motion stage positioning error compensation apparatus according to embodiment 1 of the present invention;
FIGS. 2a and 2b are schematic views showing the respective individual arrangements of the X-direction measurement mark and the Y-direction measurement mark in example 1 of the present invention;
FIG. 3 is a flowchart of a compensation method of the motion stage positioning error compensation apparatus according to embodiment 1 of the present invention;
FIG. 4 is a schematic view of a measurement mark on a reticle in example 1 of the present invention;
FIG. 5 is a schematic view of measurement marks after exposure of a positioning error test of a workpiece stage and a reticle in embodiment 1 of the present invention;
fig. 6a and 6b are schematic diagrams of measurement marks after three adjacent times of step exposures in the X direction and step exposures in the Y direction in embodiment 1 of the present invention, respectively;
FIG. 7 is a schematic view showing the arrangement of the combination of the X-direction measurement marks and the Y-direction measurement marks in embodiment 2 of the present invention;
FIG. 8 is a schematic view of a measurement mark on a reticle in example 2 of the present invention;
fig. 9a and 9b are schematic diagrams of measurement marks after three adjacent times of the X-direction step exposure and the Y-direction step exposure in embodiment 2 of the present invention, respectively.
Fig. 10a and 10b are schematic diagrams of measurement marks after three adjacent X-direction step exposures and three adjacent Y-direction step exposures in embodiment 2 of the present invention, respectively.
Shown in the figure: 1. masking the plate; 11. an X-direction measurement mark; 12. a Y-direction measurement mark; 2. a mask stage; 3. a mask stage control system; 4. a workpiece stage; 5. a workpiece stage control system; 6. a projection objective; 7. a substrate; 8. and (4) aligning the device.
Detailed Description
The invention is described in detail below with reference to the attached drawing figures:
example 1
As shown in fig. 1-2b, the present invention provides a motion stage positioning error compensation apparatus, comprising:
the mask 1 is provided with measurement marks for measuring the positioning error of the moving table, and the measurement marks comprise X-direction measurement marks 11 and Y-direction measurement marks 12.
A mask stage 2 for carrying the mask 1;
and the mask stage control system 3 is connected with the mask stage 2 and controls the mask stage 2 to move, and the mask stage control system 3 adopts an interferometer, a grating ruler or a planar grating ruler.
The workpiece table 4 is used for bearing the substrate 7 after gluing;
and the workpiece table control system 5 is connected with the workpiece table 4 and controls the workpiece table 4 to move, and the workpiece table control system 5 adopts an interferometer, a grating ruler or a planar grating ruler.
A projection objective 6 for imaging the measurement marks on the reticle 1 onto a substrate 7;
and the alignment device 8 is used for measuring the imaging mark of the measurement mark on the developed substrate 7 and adopts a CCD or a grating ruler.
Setting an X-direction measurement mark and a Y-direction measurement mark on a mask 1, respectively carrying out positioning error test exposure on a workpiece table 4 and a mask table 2, obtaining the positioning errors of the workpiece table 4 and the mask table 2 through the measurement result of an alignment device 8, and carrying out data processing to obtain a compensation table of the positioning errors; the obtained compensation tables are used to perform feedforward compensation on the workpiece stage control system 5 and the mask stage control system 3, respectively.
Preferably, the X-direction measurement mark 11 includes two X-direction gratings, the Y-direction measurement mark 12 includes two Y-direction gratings, and the X-direction measurement mark 11 and the Y-direction measurement mark 12 are separately arranged to be separate marks, as shown in fig. 2a and 2b, the two X-direction gratings are arranged in a step shape and staggered in the X-axis direction, a distance between the two X-direction gratings is Dx, the two Y-direction gratings are arranged in a step shape and staggered in the Y-axis direction, and a distance between the two Y-direction gratings is Dy.
As shown in fig. 3, the present invention further provides a compensation method for a motion stage positioning error compensation apparatus, comprising the following steps:
s1: gluing the substrate 7, and uploading the glued substrate 7 to the workpiece table 4;
s2: the exposure for testing the positioning error of the workpiece table 4 comprises the following steps:
s21: uploading a reticle 2 with X-direction measurement marks 11 and Y-direction measurement marks 12 arranged separately, as shown in FIG. 4, in the reticle 2, the Y-direction measurement marks 12 are arranged along the Y axis, the X-direction measurement marks 11 are located at any positions except the Y-direction measurement marks 12, and the distance between two adjacent Y-direction measurement marks 12 can be adjusted according to the requirement of test accuracy.
S22: moving the X-direction measurement mark 11 above the projection objective 6 and keeping the mask table 2 stationary;
s23: and setting the size of an exposure window to ensure that only the region of the X-direction measurement mark 11 is transparent, and carrying out X-direction stepping exposure, wherein the step distance Dx of the X-direction stepping exposure is Dx.M, Dx is the distance between the middle positions of two X-direction gratings in the X-direction measurement mark 11 in the X-direction in the X-axis direction, and M is the magnification of the objective lens.
S24: moving the Y-direction measuring mark 12 to the position above the objective lens, keeping the mask table 2 still, setting the size of an exposure window, ensuring that only one area with the size of the Y-direction measuring mark 12 is transparent, and carrying out Y-direction stepping exposure, wherein the step distance Dy of the Y-direction stepping exposure is Dy.M, Dy is the distance between the middle positions of two Y-direction gratings in the Y-direction measuring mark 12 in the Y-direction, and M is the magnification of the objective lens.
S3: the mask stage 2 positioning error test exposure is carried out, and the method comprises the following steps:
s31: reticles 2 arranged separately with the X-direction measurement marks 11 and the Y-direction measurement marks 12 are uploaded, as shown in fig. 4.
S32: selecting a blank area on the substrate and moving the area under the projection objective 6;
s33: setting the size of an exposure window to ensure that only one area with the size of the Y-direction measurement mark 12 is transparent;
s34: the mask stage is moved in the Y direction by a step distance Ly, which is Dy · M, a distance between the Y-direction measurement marks on the mask, Dy being a distance between intermediate positions of two Y-direction gratings in the Y-direction measurement mark 12 in the Y-direction in the Y-axis direction, and M being an objective magnification, and step exposure in the Y direction of the workpiece stage is performed at the step distance Dy.
S4: downloading the substrate 7 after exposure for development, wherein the distribution of the measurement marks on the substrate 7 after exposure for the positioning error test of the workpiece stage 4 in step S2 is shown as black marks in fig. 5, wherein the triangle mark is the projection of the X-direction measurement mark 11 on the substrate 7, and the circle mark is the projection of the Y-direction measurement mark 12 on the substrate 7; the distribution of the measurement marks on the substrate after exposure for mask stage 2 positioning error test in step S3 is shown as gray marks in fig. 5, and the circular marks represent the projection of the Y-directional measurement mark 12 on the substrate 7.
S5: the developed substrate 7 is re-uploaded onto the workpiece stage 4 and moved to below the alignment device 8 for measurement; as shown in fig. 6a, the mark map after three adjacent X-direction step exposures is obtained, the amount of deviation of the overlapping region of the X-direction measurement mark 11 after the first and second X-direction step exposures is Δ X1, the amount of deviation of the overlapping region of the X-direction measurement mark 11 after the second and third X-direction step exposures is Δ X2, and as shown in fig. 6b, the map after the three adjacent Y-direction step exposures is obtained, the amount of deviation of the overlapping region of the Y-direction measurement mark 11 after the first and second Y-direction step exposures is Δ Y1, and the amount of deviation of the overlapping region of the Y-direction measurement mark 11 after the second and third Y-direction step exposures is Δ Y2.
S6: calculating the positioning errors of the workpiece table 4 and the mask table 2 according to the measurement result, and performing data processing such as interpolation, filtering and the like to obtain a compensation table of the positioning errors; namely, the positioning errors of the workpiece table 4 and the mask table 2 are obtained by calculating the deviation amounts Δ X1, Δ X2, Δ y1 and Δ y2 in the positioning error test exposure of the workpiece table 4 and the mask table 2, respectively, and a compensation table is obtained by calculating according to the positioning errors, for example, the method for calculating the positioning error of the X-direction moving table according to the measurement result of the X-direction is shown in formula (1):
wherein:
Δ xi — the amount of deviation of the overlapping region of the X-direction measurement mark from the previous time after the i +1 th X-direction step exposure;
mxi-the XTX surface type of the ith position, and XTX refers to a compensation table of X position when the motion platform X moves.
The XTX surface type can be obtained by calculation, and YTY surface type can be obtained by the same method, which is not described herein again, and YTY refers to a compensation table of Y position when the motion table moves in Y direction. Since the mask stage YTY surface profile measurement includes part of the workpiece stage YTY surface profile, the influence of the workpiece surface profile is also removed in the calculation.
S7: the obtained compensation tables are used to perform feedforward compensation on the workpiece stage control system 5 and the mask stage control system 3, respectively. Specifically, if no reference value is set, the compensation table obtained by the first test is used as a reference value, and feedforward compensation is performed when the workpiece stage control system 5 and the mask stage control system 3 perform servo control; if the reference value is set, comparing the compensation table obtained by the first test with the reference value, if the difference value is smaller than a preset warning threshold value, adopting the newly-tested compensation table to perform feedforward compensation, otherwise sending warning information to prompt a user, and selecting whether to continue the mass production exposure by the user, if the user selects to continue the production, adopting the newly-tested compensation table to perform feedforward compensation, otherwise, stopping the production; and if the difference value is larger than the preset dislocation threshold value, sending out error information and stopping production.
Example 2
As shown in fig. 7, this embodiment is different from embodiment 1 in that the X-direction measurement mark 11 and the Y-direction measurement mark 12 are arranged in combination to form a combined mark, the X-direction measurement marks 11 and the Y-direction measurement marks 12 are alternately arranged in the X-direction and the Y-direction respectively, wherein two X-directional gratings in the X-directional measurement marks 11 are arranged in parallel along the Y-axis direction, two Y-directional gratings in the Y-directional measurement marks 12 are arranged in parallel along the X-axis direction, the distance m between the first edge of any X-direction grating in the X-direction measuring mark 11 and the first edge of any Y-direction grating in the Y-direction measuring mark 12 is larger than the length l of the slit in the X-direction grating or the Y-direction grating, the first edge is the edge of any X-direction grating close to any Y-direction grating, and the second edge is the edge of any Y-direction grating close to any X-direction grating.
Correspondingly, in step S2 of the compensation method of the motion stage positioning error compensation device, the exposure for testing the positioning error of the workpiece stage 4 includes the following steps:
s21: the reticle 1 on which the X-direction measurement mark 11 and the Y-direction measurement mark 12 are arranged in combination is uploaded, as shown in fig. 8, in which circular marks represent the combination marks shown in fig. 7, and in the figure, the distance between two adjacent combination marks in the X direction is Lx, and the distance in the Y direction is Ly.
S22: moving the combined mark on the mask 1 above the objective lens and keeping the mask table 2 still;
s23: setting the size of an exposure window to ensure that only one combined mark region is transparent;
s24: performing X-direction stepping exposure or Y-direction stepping exposure, wherein the step size dx of the X-direction stepping exposure and the step size dy of the Y-direction stepping exposure are as follows:
wherein Dx is the distance between the middle positions of two X-direction gratings in the X-direction measuring mark 11 on the mask in the X-axis direction, Dy is the distance between the middle positions of two Y-direction gratings in the Y-direction measuring mark 12 on the mask in the Y-axis direction, and M is the magnification of the objective lens.
Correspondingly, in step S3 of the compensation method of the motion stage positioning error compensation device, the exposure for testing the positioning error of the mask stage 2 includes the following steps:
s31: uploading a mask 2 formed by combining and arranging an X-direction measurement mark 11 and a Y-direction measurement mark 12;
s32: selecting a blank area on the substrate and moving the area under the projection objective 6;
s33: setting the size of an exposure window to ensure that only one area with the size of the combined mark is transparent;
s34: carrying out Y-direction motion mask stage by a step distance Ly, and simultaneously carrying out Y-direction stepping exposure on the workpiece stage by a step distance Dy, wherein the step distance Dy is Dy & M;
where Ly is the distance between the combined marks on the mask, Dy is the distance between the middle positions of the two Y-directional gratings in the Y-directional measurement mark 12 in the Y-axis direction, and M is the magnification of the objective lens.
Thus, by using the combined mark, the X-direction measurement mark error and the Y-direction measurement mark error are obtained while the X-direction step exposure is performed, so as to obtain XTX and XTY, wherein XTY refers to the compensation table of the Y position when the motion stage moves in the X direction, as shown in FIG. 9 a. Similarly, the combined mark can be used to obtain the error of the X-direction measuring mark and the error of the Y-direction measuring mark while exposing in the Y-direction, so as to obtain YTX and YTY, wherein YTX refers to the compensation table of the X position when the motion platform moves in the Y-direction, as shown in FIG. 9 b.
As shown in fig. 9a, the mark schematic diagram after three adjacent X-direction step exposures of the combination mark is shown, the deviation amount of the overlapping region of the Y-direction measurement mark 11 after the first and second X-direction step exposures is Δ Y1 ', the deviation amount of the overlapping region of the Y-direction measurement mark 11 after the second and third X-direction step exposures is Δ Y2', as shown in fig. 9b, the distribution diagram after three adjacent Y-direction step exposures of the combination mark is shown, the deviation amount of the overlapping region of the X-direction measurement mark 11 after the first and second Y-direction step exposures is Δ X1 ', and the deviation amount of the overlapping region of the X-direction measurement mark 11 after the second and third Y-direction step exposures is Δ X2'. By using the combined mark, the positioning error of the workpiece table 4 can be obtained by the deviation amounts Δ X1 ', Δ X2', Δ Y1 'and Δ Y2' in the positioning error test exposure of the workpiece table 4 only by stepping exposure in one direction, the X direction or the Y direction.
Furthermore, a row of marks in the X direction on the mask shown in fig. 8 is selected, and step exposure in the Y direction is performed, so as to obtain an exposure pattern shown in fig. 10a, and according to the exposure result, YRZ, which is a compensation table of Rz position when the motion stage moves in the Y direction, can be calculated. Similarly, a column of marks in the Y-direction on the reticle as shown in fig. 8 is selected and step-wise exposure in the X-direction is performed to obtain the exposure pattern as shown in fig. 10b, and XRZ, which is a compensation table of Rz positions of the motion stage during X-direction motion, can be calculated according to the exposure result.
The YTX measurement and calculation method in the mask stage positioning error test described in step 3 of example 1 is implemented using a combination mark, similar to the workpiece stage positioning error YTX, except that the mask stage Y is stepped according to the mark pitch Ly on the mask during exposure, and the workpiece stage is stepped according to the image plane mark pitch dy. Similarly, selecting a row of mark exposures may also result in mask stage YRZ.
In summary, the motion stage positioning error compensation apparatus and compensation method provided by the present invention includes a mask 1, where the mask 1 is provided with measurement marks for measuring the positioning error of the motion stage, and the measurement marks include an X-direction measurement mark 11 and a Y-direction measurement mark 12; a mask stage 2 for carrying the mask 1; the workpiece table 4 is used for bearing the substrate 7 after gluing; a projection objective 6 for imaging the measurement marks on the reticle 1 onto a substrate 7; and an alignment device 8 for measuring the imaging mark of the measurement mark on the developed substrate. Arranging an X-direction measuring mark 11 and a Y-direction measuring mark 12 on the mask 1, respectively carrying out positioning error test exposure on the workpiece table 4 and the mask table 2, obtaining the positioning errors of the workpiece table 4 and the mask table 2 through the measuring result of the alignment device 8, and carrying out data processing to obtain a positioning error compensation table; the obtained compensation table is used for respectively carrying out feedforward compensation on the workpiece stage control system 5 and the mask stage control system 3, and the method can be used for online compensation and offline calibration, is not limited by the type of a sensor, and has stronger adaptability.
Although the embodiments of the present invention have been described in the specification, these embodiments are merely provided as a hint, and should not limit the scope of the present invention. Various omissions, substitutions, and changes may be made without departing from the spirit of the invention and are intended to be within the scope of the invention.
Claims (13)
1. A motion stage positioning error compensation apparatus, comprising:
the measurement mark comprises an X-direction measurement mark and a Y-direction measurement mark;
the mask table is used for bearing the mask plate and is connected with a mask table control system;
the workpiece table is used for bearing the substrate after the glue coating, and is connected with a workpiece table control system;
a projection objective for imaging the measurement mark on the mask onto a substrate;
an alignment device for measuring an imaging mark of the measurement mark on the developed substrate;
the X-direction measurement mark comprises two X-direction gratings, the Y-direction measurement mark comprises two Y-direction gratings, the X-direction measurement mark and the Y-direction measurement mark are arranged independently, the two X-direction gratings are arranged in a step shape and staggered along the X-axis direction, and the two Y-direction gratings are arranged in a step shape and staggered along the Y-axis direction;
the method comprises the steps of utilizing an X-direction measuring mark and a Y-direction measuring mark arranged on a mask plate, respectively carrying out X-direction stepping exposure and Y-direction stepping exposure on a substrate through a moving workpiece table, utilizing the Y-direction measuring mark arranged on the mask plate, carrying out Y-direction stepping exposure on the substrate through a moving mask table and the workpiece table, measuring deviation of overlapping areas of the measuring marks after a plurality of adjacent stepping exposures through an alignment device to obtain positioning errors of the workpiece table and the mask table, carrying out data processing to obtain a compensation table of the positioning errors, and respectively carrying out feedforward compensation on a workpiece table control system and the mask table control system through the obtained compensation table.
2. The motion stage positioning error compensation apparatus of claim 1, wherein the mask stage control system and the workpiece stage control system employ an interferometer, a grating scale, or a planar grating scale.
3. The motion stage positioning error compensation device of claim 1, wherein the alignment device employs a CCD or a grating scale.
4. The moving stage positioning error compensation apparatus according to claim 1, wherein the X-direction measurement marks and the Y-direction measurement marks are arranged in combination to form a combined mark, the X-direction measurement marks and the Y-direction measurement marks are alternately arranged in X-direction and Y-direction, respectively, wherein two X-directional gratings in the X-directional measurement marks are arranged in parallel along the Y-axis direction, two Y-directional gratings in the Y-directional measurement marks are arranged in parallel along the X-axis direction, the distance between the first edge of any X-direction grating in the X-direction measuring mark and the second edge of any Y-direction grating in the Y-direction measuring mark is larger than the length of the slit in the X-direction grating or the Y-direction grating, the first edge is the edge of any X-direction grating close to any Y-direction grating, and the second edge is the edge of any Y-direction grating close to any X-direction grating.
5. A compensation method of a motion platform positioning error compensation device is characterized by comprising the following steps:
s1: gluing the substrate, and uploading the glued substrate to a workpiece table;
s2: carrying out positioning error test exposure on the workpiece table;
s3: carrying out mask table positioning error test exposure;
s4: downloading the exposed substrate for development;
s5: uploading the developed substrate to a workpiece table again and moving the developed substrate to the lower part of the alignment device for measurement;
s6: calculating the positioning errors of the workpiece table and the mask table according to the measurement result, and performing data processing to obtain a positioning error compensation table;
s7: respectively carrying out feedforward compensation on the workpiece table control system and the mask table control system by using the obtained compensation table;
wherein, the motion table positioning error compensation device of any one of claims 1 to 4 is used in the positioning error test exposure in the steps S2 and S3.
6. The compensation method of claim 5, wherein the step S2 of performing a stage positioning error test exposure comprises the steps of:
s21: uploading a mask plate with the X-direction measurement mark and the Y-direction measurement mark arranged independently;
s22: moving the X-direction measuring mark above the projection objective and keeping the mask table still;
s23: setting the size of an exposure window to ensure that only the X-direction measurement mark region is transparent, and performing X-direction stepping exposure;
s24: and moving the Y-direction measuring mark above the projection objective, keeping the mask table still, setting the size of an exposure window, ensuring that only one area with the size of the Y-direction measuring mark is transparent, and carrying out Y-direction stepping exposure.
7. The compensation method according to claim 6, wherein the step dx of the X-direction step exposure and the step dy of the Y-direction step exposure are:
dx is the distance between the middle positions of two X-direction gratings in the X-direction measuring mark in the X-direction, Dy is the distance between the middle positions of two Y-direction gratings in the Y-direction measuring mark in the Y-direction, and M is the magnification of the objective lens.
8. The compensation method according to claim 7, wherein the step S3 of performing a mask stage positioning error test exposure comprises the steps of:
s31: uploading a mask plate with the X-direction measurement mark and the Y-direction measurement mark arranged independently;
s32: selecting a blank area on the substrate and moving the area under the projection objective;
s33: setting the size of an exposure window to ensure that only one region with the size of the Y-direction measurement mark is transparent;
s34: carrying out Y-direction motion mask stage by a step distance Ly, and simultaneously carrying out Y-direction stepping exposure on the workpiece stage by a step distance Dy, wherein the step distance Dy is Dy & M;
where Ly is the distance between the Y-direction measurement marks on the mask, Dy is the distance between the middle positions of the two Y-direction gratings in the Y-direction measurement marks in the Y-direction, and M is the magnification of the objective lens.
9. The compensation method according to claim 5, wherein in step S6, the positioning errors of the workpiece stage and the mask stage are obtained by calculating the deviation amount of the X-direction measurement mark and the deviation amount of the Y-direction measurement mark in three adjacent step exposures in the test exposure for the positioning errors of the workpiece stage and the mask stage, respectively.
10. The compensation method according to claim 5, wherein in step S7, if the reference value is not set, the compensation table obtained by the first test is used as the reference value, and the feedforward compensation is performed when the workpiece stage control system and the mask stage control system perform the servo control; if the reference value is set, comparing the compensation table obtained by the first test with the reference value, if the difference value is smaller than a preset warning threshold value, adopting the newly-tested compensation table to perform feedforward compensation, otherwise sending warning information to prompt a user, and selecting whether to continue the mass production exposure by the user, if the user selects to continue the production, adopting the newly-tested compensation table to perform feedforward compensation, otherwise, stopping the production; and if the difference value is larger than the preset dislocation threshold value, sending out error information and stopping production.
11. The compensation method of claim 5, wherein the step S2 of performing a stage positioning error test exposure comprises the steps of:
s21: uploading a mask plate with combined arrangement of an X-direction measurement mark and a Y-direction measurement mark;
s22: moving the combined mark on the mask plate to the position above the projection objective and keeping the mask table still;
s23: setting the size of an exposure window to ensure that only one combined mark region is transparent;
s24: and carrying out X-direction stepping exposure or Y-direction stepping exposure.
12. The compensation method of claim 11, wherein the step dx of the X-direction step exposure and the step dy of the Y-direction step exposure are:
dx is the distance between the middle positions of two X-direction gratings in the X-direction measuring mark on the mask in the X-axis direction, Dy is the distance between the middle positions of two Y-direction gratings in the Y-direction measuring mark on the mask in the Y-axis direction, and M is the magnification of the objective lens.
13. The compensation method according to claim 11, wherein the step S3 of performing a mask stage positioning error test exposure comprises the steps of:
s31: uploading a mask plate with combined arrangement of an X-direction measurement mark and a Y-direction measurement mark;
s32: selecting a blank area on the substrate and moving the area under the projection objective;
s33: setting the size of an exposure window to ensure that only one area with the size of the combined mark is transparent;
s34: carrying out Y-direction motion mask stage by a step distance Ly, and simultaneously carrying out Y-direction stepping exposure on the workpiece stage by a step distance Dy, wherein the step distance Dy is Dy & M;
where Ly is the distance between the combined marks on the mask, Dy is the distance between the middle positions of the two Y-directional gratings in the Y-directional measurement mark in the Y-axis direction, and M is the magnification of the objective lens.
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| CN111435068B (en) * | 2018-12-26 | 2022-08-02 | 深圳麦逊电子有限公司 | Method and system for checking integral step-by-step positioning precision of IC carrier plate testing machine |
| CN111505907B (en) * | 2019-01-31 | 2021-06-18 | 上海微电子装备（集团）股份有限公司 | Calibration method for positioning error of workpiece table |
| CN111624856B (en) * | 2019-02-28 | 2021-10-15 | 上海微电子装备（集团）股份有限公司 | Mask plate, motion table positioning error compensation device and compensation method |
| CN112578641B (en) * | 2019-09-30 | 2022-02-15 | 上海微电子装备（集团）股份有限公司 | Measuring mark combination, compensation device and compensation method for positioning error of motion platform |
| CN112929569B (en) * | 2021-02-04 | 2022-11-04 | 深圳中科飞测科技股份有限公司 | Detection device and detection method thereof |
| CN116794947B (en) * | 2023-08-25 | 2023-11-24 | 吉姆西半导体科技（无锡）有限公司 | Method for detecting mask plate bearing table distortion of lithography machine by using test mask plate |
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