CN107885038A - Device for correcting illumination homogeneity, bearing calibration and a kind of exposure projections system - Google Patents
Device for correcting illumination homogeneity, bearing calibration and a kind of exposure projections system Download PDFInfo
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- CN107885038A CN107885038A CN201610874597.1A CN201610874597A CN107885038A CN 107885038 A CN107885038 A CN 107885038A CN 201610874597 A CN201610874597 A CN 201610874597A CN 107885038 A CN107885038 A CN 107885038A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
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- Microscoopes, Condenser (AREA)
Abstract
The present invention relates to a kind of device for correcting illumination homogeneity, bearing calibration and a kind of exposure projections system, means for correcting includes variable shading correction device, including some correction components pair for being arranged on illuminating bundle cross section, some correction components overlap to cover whole illuminated field to being spaced setting along non-scan direction to cover whole illuminated field along scanning direction；Variable grey level compensation panel assembly, include the flat board of the relatively-movable different gray scale transmitances of two panels；And variable mirror array apparatus, including variable mirror Optical devices, variable mirror Optical devices are made up of the reflection mirror array of multiple variable reflectivities, by adjusting the shape of correction component pair and the reflectivity of overlap mode, the transmitance of flat board and reflection mirror array, the illumination uniformity of whole illuminated field under multiple light illumination modes is adjusted.The present invention, which solves, frequently changes the problem of pupil uniformity and visual field integral uniformity in the case of grey level compensation plate, and a variety of light illumination modes can not all meet performance.
Description
Technical field
The present invention relates to lithographic illumination technical field, more particularly to a kind of device for correcting illumination homogeneity, bearing calibration with
A kind of and exposure projections system.
Background technology
Photoetching process is used for producing the semiconductor devices, even if photoetching process electromagnetic radiation, such as ultraviolet (UV), deep UV or visible
Light, fine figure, many kinds of semiconductor devices, such as diode, triode and integrated electricity are produced in semiconductor device design
Road, it can be made of photoetching technique.Lithographic exposure systems generally include illuminator, the mask containing circuit diagram, projection system
System and silicon chip and silicon chip alignment tool for coating photoresist, the circuit diagram that illuminator is irradiated on mask, optical projection system handle
The picture of circuit diagram illumination region on mask is projected on chip.
In photoetching, two factors to be played a crucial role to picture quality are resolution ratio and depth of focus, so should obtain more
Good resolution ratio forms the figure of critical size, keeps suitable depth of focus again, it is necessary to improve the image space number of projection objective
It is worth aperture (NA), while the demands such as Uniform Illumination, high transmittance, pupil uniformity is proposed to illuminator.Require to shine in photoetching
Illuminated field caused by bright system is as far as possible uniform, and homogeneity error is as far as possible small, so that whole illuminating bundle can be equably radiated at
On mask, and it is project equally with substrate.Illumination uniformity can influence the line width uniformity of whole exposure field.
Step-scan etching system is typical etching system, it have rectangular illumination field, mask platform and work stage along
Full exposure area scan rectangle illuminated field, then steps to next exposure region, further along the exposure area scan rectangle illumination
, go on according to this.It is integrated along the light energy of scanning direction, is averaged the heterogeneity of scanning direction rectangular illumination field
Change, and scanning direction integral energy can cause whole exposure field exposure uneven in the heterogeneity of non-scan direction.
In order to solve the homogeneity question of step-by-step scanning photo-etching device, the scheme for having been carried out multiple homogeneity corrections at present is visited
Rope.
The first scheme is：Change transmissivity using multigroup correcting element.The system has bilateral structure, that is, is illuminating
Many correcting elements are inserted on field both sides, set them that there is certain transmitance to be distributed, so as to change the light of their institute overlay areas
By force.The each element in every side of illuminated field has the element of opposition, and every group of counter-element has identical X-coordinate, but edge in the Y direction
Opposite direction is inserted, and counter-element is also rotatable to have V-structure.Each maximum is inserted into illumination field areas to counter-element
Centre, do not overlap each other, can also be overlapping in illumination field areas.In this scenario, because each correcting element has Finite Width
Degree and thickness, therefore each correcting element has multiple sides.When illumination light beam angle is larger (during big Sigma illuminations), light
It may be formed and reflected in element side, cause shade.In addition there is also gap between adjacent correcting element, due to each gap
With 0 decay, and correcting element has the decay of non-zero, therefore gap can produce light leak, will in lighting area by the light in gap
The striped band or region band of larger intensity are produced, new heterogeneity is introduced due to the mutation of this transmitance.In order to compensate
Above-mentioned heterogeneity, it is proposed that a kind of method for compensating leakage light and shade, this method add volume on the basis of such scheme
Outer compensating plate, non-zero attenuation rate is set on compensating plate with gap corresponding region, and 100% transmission is set in other regions
Rate.Although above-mentioned light leak and shadow effect can be eliminated using this compensating plate with transmitance distribution, increase volume is needed
Outer compensating plate, and the transmitance distribution needs of compensating plate are corresponding with all gaps of correcting element, necessarily increase correction system
The complexity of system.
Second scheme is：Solves the problems, such as Lou light and shade using the tip shapes for changing correcting element.This is uniform
Property means for correcting can correct Strength Changes with the moveable fingers blade for being inserted in radiation beam edge.However, can be by school
The width of space periodic in positive Strength Changes depends on the movable of the finger piece blade for moving uniformity correction system
The size of device.In addition, in some cases, if the size or shape of the finger piece of irregular shape for correcting radiation beam
Changed, then the uniformity correction system may add up or change the one or more spy of radiation beam in a manner of undesired
Property, such as the pupil that radiation beam is formed.To overcome drawbacks described above, it is further proposed that blade position, i.e., be located at by improvement project
Condenser image planes, pupil property is preferable, and tool bit part width is the 1/2 of rear end, so blade compensation part is not overlapping, this
Sample can be very good to keep pupil property, and solve the problems, such as uniformity compensation and uniformity drift.
The third scheme is：Illuminator mid-early stage all eliminates variable shading cutter head with the grey level compensation plate of fixation and compensated
Heterogeneity caused by structure, but as the demand of the light illumination mode of lithography illuminating system is more and more, fixed gray scale is mended
Repaying plate can not meet that the uniformity in the case of multiple light illumination modes all optimizes.And change different compensation according to different light illumination modes
During plate loss, yield is influenceed, therefore proposes the variable scheme of grey level compensation plate in the case of different light illumination modes.By mobile two
The relative position of compensating plate, to change the illumination uniformity in the case of different light illumination modes.
At present in GaoNAQian roads illuminator, light illumination mode it is up to tens of in addition hundreds of, make compatible so many
The difficulty in process of variable grey level compensation plate, in addition long term drift caused by the material of illuminator and the uniformity of objective system with
And uniformity caused by being polluted during use changes, just need every half a year to redesign variable grey level compensation plate, change once
Compensating plate will also influence yield, it is necessary to propose a kind of frequency caused by solving a variety of light illumination mode uniformity compensations and uniformity drift
Numerous scheme for changing variable grey level compensation plate.
The content of the invention
The present invention provides a kind of device for correcting illumination homogeneity, bearing calibration and a kind of exposure projections system, to solve
Above-mentioned technical problem.
In order to solve the above technical problems, the present invention provides a kind of device for correcting illumination homogeneity, it is arranged above mask,
Including：
Variable shading correction device, including some correction components pair for being arranged on illuminating bundle cross section, some schools
Positive component overlaps whole to cover to being spaced setting along non-scan direction to cover whole illuminated field along scanning direction
The illuminated field；
Variable grey level compensation panel assembly, include the flat board of the relatively-movable different gray scale transmitances of two panels；And
Variable mirror array apparatus, including variable mirror Optical devices, the variable mirror Optical devices are by more
The reflection mirror array composition of individual variable reflectivity,
By the shape and overlap mode, the transmitance of the flat board and speculum that adjust the correction component pair
The reflectivity of array, adjust the illumination uniformity of the whole illuminated field under multiple light illumination modes.
It is preferred that the variable shading correction device be arranged at the mask nearby or the mask optical conjugate
Near face.
It is preferred that the correction component is to the first correction component including inserting the illuminated field along scanning direction, and edge
The second correction component that opposite direction inserts the illuminated field is scanned, the first correction component is identical with the second correction component count
And correspond.
It is preferred that on the first correction component and the second correction component on the scanning direction and beam Propagation direction
In the tabular being parallel to each other, and the first correction component and the second correction component can be done on the scanning direction respectively
At least motion in one dimension, to change the relative position of the two.
It is preferred that the transmitance distribution of the first correction component and the second correction component changes with change in location, and
The transmitance distribution of the first correction component has opposite in the direction of movement with the transmitance distribution of the second correction component
Variation tendency.
It is preferred that the transmitance point that the transmitance distribution of the first correction component and the second correction component is at least one-dimensional
Cloth.
It is preferred that the transmitance of the first correction component and the second correction component is distributed as linear function distribution, or
Quadratic function is distributed, either trigonometric function distribution or the combination of above-mentioned several function distribution.
It is preferred that the first correction component and the second correction component are cut in the beam Propagation perpendicular to the scanning direction
Face is rectangle, and the first correction component and the second correction component overlap in non-scan direction dislocation.
It is preferred that the first correction component and the second correction component are cut in the beam Propagation perpendicular to the scanning direction
Face is parallelogram or trapezoidal, and the first correction component and the second correction component are set non-scan direction dislocation is overlapping
Put, or the completely overlapped setting of dislocation-free.
It is preferred that the first correction component and the second correction component are cut in the beam Propagation perpendicular to the scanning direction
Face is stairstepping, and the first correction component and the second correction component have mirror-image structure relative to beam cross section.
It is preferred that all the first correction components are arranged on same plane, and adjacent two first schools
First is set to separate between positive component；All the second correction components are arranged at and the described first correction component place
In the different another plane of plane, and second is set to separate between adjacent two the second correction components.
It is preferred that first interval is equal with second gap size, it is 0.1mm.
It is preferred that the first correction component and the second correction component are made up of transmission material.
It is preferred that the first correction component and the second correction component in manufacture material by depositing transmission thing or decay
Thing is made.
It is preferred that the first correction component and the second correction component are decayed by depositing random point-like in manufacture material
Thing or light-blocking matter are made.
It is preferred that the variable grey level compensation panel assembly is arranged at the mask nearby or the optics of the mask is total to
Near yoke surface.
It is preferred that the variable mirror array apparatus also includes control device and measurement apparatus, the control device with
Multiple reflection mirror arrays are connected, for changing the reflectivity of the reflection mirror array；The measurement apparatus is installed on described
On reflection mirror array, the control device is fed back to for detecting whether the reflection mirror array is adjusted in place, and by result.
It is preferred that the reflection mirror array uses electro-optic crystal or electromagnetic drive.
Present invention also offers a kind of exposure projections system, includes light source, beam expander, first successively along paths direction
Speculum, light beam positioning unit, adjustable optical attenuator, energy monitoring unit, the second speculum, illuminator top module,
As described above device for correcting illumination homogeneity, projection objective, the mask in mask platform are the object plane position of projection objective, work
Silicon chip on part platform is projection objective image planes position.
It is preferred that the illuminator top module includes the first module, the second module and the 3rd module being arranged in order,
First module uses diffraction optical element group；Second module includes variable focus lens package and axicon, described to spread out
Optical element group is penetrated to be located on the front focal plane of the variable focus lens package；3rd module includes the variable edge of a knife array in pupil face to group
Part, even optical assembly, microlens array extra show mirror and optically focused microscope group, light beam are incident to the speculum after the optically focused microscope group
Array, by pupil imaging to the mask.
It is preferred that the device for correcting illumination homogeneity is arranged near the back focal plane of the optically focused microscope group, it is described variable
Reflection mirror array device is arranged at 45 degree of corners of the optically focused microscope group.
It is preferred that the diffraction optical element group uses runner, be provided with the runner multiple can form in far field
The diffraction optics piece of different light distribution, the diffraction optics piece are microlens array, either Fresnel Lenses or diffraction light
Grid.
It is preferred that the variable edge of a knife array in pupil face includes two block size identical edge of a knife array boards, every piece of institute to component
State edge of a knife array board and be provided with some size identical thang-kng patterns, by the relative position for adjusting two pieces of edge of a knife array boards
Put, change the visual field size of the light beam.
It is preferred that the illuminator top module includes the first module, the second module and the 3rd module being arranged in order,
First module uses diffraction optical element group；Second module includes variable focus lens package and axicon, described to spread out
Optical element group is penetrated to be located on the front focal plane of the variable focus lens package；3rd module includes even optical assembly, variable screening successively
Finishing tool mouth array is incident to the speculum battle array to, variable edge of a knife component and optically focused microscope group, light beam after the optically focused microscope group
Row, by pupil imaging to the mask.
It is preferred that the even optical assembly is combined using quartz pushrod or quartz pushrod.
It is preferred that the variable edge of a knife component is made up of four block size identical edge of a knife plates.
Present invention also offers a kind of bearing calibration of device for correcting illumination homogeneity as described above, including following step
Suddenly：
S1：Using the measuring unit measurement silicon chip face original uniform distribution being installed in work stage, pass through variable shading
Means for correcting and variable grey level compensation panel assembly change silicon chip surface uniformity, and after being obtained using litho machine software and being adjusted
Silicon chip surface uniformity is distributed；
S2：According to silicon chip surface uniformity demand, each reflectivity adjustment amount distribution in the reflection mirror array is calculated；
S3：It is distributed according to each reflectivity adjustment amount in the reflection mirror array, adjusts the reflectivity of each speculum；
S4：It is distributed using measuring unit repetition measurement silicon chip surface uniformity；
S5：Judge above-mentioned repetition measurement result, if meeting silicon chip surface uniformity demand, stop adjustment；If not satisfied, then continue
The reflectivity of the speculum is adjusted, until meeting silicon chip surface uniformity demand.
Compared with prior art, device for correcting illumination homogeneity provided by the invention, bearing calibration and a kind of exposure are thrown
Shadow system, has the following advantages that：
1. the present invention corrects light leak and shadow problem using variable shading correction device compensation integral uniformity, simultaneously
Keep pupil uniformity；The uniformity difference of multiple light illumination modes is compensated using variable grey level compensation panel assembly；Using variable anti-
The uniformity drift that lens array device compensates multiple light illumination modes is penetrated, so as to modulate illumination intensity distribution, meets a variety of illumination moulds
The uniformity demands and uniformity drift demand of formula；
2. the present invention does not need extra grey level compensation plate, you can it is up to standard to reach uniformity in Life cycle, reduces
Cost；
3. the present invention need not frequently change grey level compensation plate, yield is improved.
Brief description of the drawings
Fig. 1 is the structural representation of exposure projections system in the embodiment of the present invention one；
Structural representations of the Fig. 2 for the variable edge of a knife array in pupil face in the embodiment of the present invention one to component；
Fig. 3 is the structural representation of variable shading correction device in the embodiment of the present invention one；
Fig. 4 is the schematic diagram of the integration light distribution of non-scan direction in the embodiment of the present invention one；
Fig. 5 is that component is corrected in the embodiment of the present invention one to the schematic diagram on YZ sections；
Fig. 6 is the schematic diagram for the transmitance distribution that component pair is corrected in the embodiment of the present invention one；
Fig. 7 to Figure 10 is respectively that curve pass corresponding to the various transmitances distribution of component pair is corrected in the embodiment of the present invention one
It is schematic diagram；
Figure 11 is the structural representation of the 3rd module in the embodiment of the present invention one；
Figure 12 is the flow chart of the bearing calibration in the embodiment of the present invention one；
Figure 13 is the structural representation of the 3rd module in the embodiment of the present invention two.
In figure：101- light sources, 102- beam expanders, the speculums of 103- first, 104- light beams positioning unit, 105- can adjust light
Attenuator, 106- energy monitorings unit, the speculums of 107- second, the modules of 108- first, the modules of 109- second, the moulds of 110- the 3rd
Block, 111- device for correcting illumination homogeneity, 112- masks, 113- mask platforms, 114- projection objectives, 115- silicon chips, 116- works
Part platform, 117- pedestals, 118- optical axises, 119- light beams, 120- measuring units；201- illuminated fields, 202- first correct component, 203-
Second correction component, 204a- first is spaced, 204b- second is spaced, the array boards of 205- first, the array boards of 206- second, 207- hide
Light part；The 301- curves of light distribution；The linear distributions of 401- first, the linear distributions of 402- second, the distribution of 403- entirety transmitance；
The variable edge of a knife array in 501- pupils face is controlled component, the even optical assemblies of 502-, 503- optically focused microscope group, 504- reflection mirror arrays, 505-
Device, 506- measurement apparatus；601- quartz pushrods or quartz pushrod combination, the variable shading edge of a knife arrays of 602- are to, the variable edges of a knife of 603-
Component.
Embodiment
In order to facilitate the understanding of the purposes, features and advantages of the present invention, below in conjunction with the accompanying drawings to the present invention
Embodiment be described in detail.It should be noted that accompanying drawing of the present invention uses using simplified form and non-essence
Accurate ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
Device for correcting illumination homogeneity provided by the invention, as shown in Figure 1 to 11, it is arranged at the top of mask 112, bag
Include：
Variable shading correction device, include the correction component pair of some cross sections of light beam 119 for being arranged on illumination, Ruo Gansuo
Correction component is stated to being spaced setting along non-scan direction to cover whole illuminated field 201, is set along scanning direction (Y-direction) is overlapping
Put to cover the whole illuminated field 201, as shown in Figure 3；
Variable grey level compensation panel assembly, include the flat board of the relatively-movable different gray scale transmitances of two panels；And
Variable mirror array apparatus, including variable mirror Optical devices, the variable mirror Optical devices are by more
The reflection mirror array 504 of individual variable reflectivity forms, as shown in figure 11,
By the shape and overlap mode, the transmitance of the flat board and speculum that adjust the correction component pair
The reflectivity of array 504, adjust the illumination uniformity of the whole illuminated field 201 under multiple light illumination modes.
The present invention corrects light leak and shadow problem using variable shading correction device compensation integral uniformity, protects simultaneously
Hold pupil uniformity；The uniformity difference of multiple light illumination modes is compensated using variable grey level compensation panel assembly；Utilize Variable reflectance
Lens array device compensates the uniformity drift of multiple light illumination modes, so as to modulate illumination intensity distribution, meets a variety of light illumination modes
Uniformity demands and uniformity drift demand.
It is preferred that the variable shading correction device be arranged at the mask 112 nearby or the mask 112 light
Learn near conjugate planes.Specifically, asking emphasis, the correction component along scanning direction (Y-direction) to including inserting the photograph with reference to figure 3
First correction component 202 of light field 201, and insert the second of the illuminated field 201 along scanning opposite direction (- Y-direction) and correct component
203, the first correction component 202 is identical with the second correction quantity of component 203 and corresponds, the first correction component
202 and second correct the collective effect of component 203 in light beam 119, the illumination intensity of change institute overlay area.As shown in figure 4, light intensity
Distribution curve 301 represents a kind of integration light distribution of non-scan direction, and the first correction component 202 and second corrects
The correction component pair that component 203 forms, the partial sector in the integration light distribution can be independently corrected, and all M are to correction
Component is to (the first correction component 2021~MWith the second correction component 2031~MCorrespond) collective effect, you can regulation is whole to shine
Light intensity integral uniformity of the light field 201 in non-scan direction.
It is preferred that emphasis is asked to be corrected with reference to figure 7 to Figure 10, the first correction component 202 and second on component 203 in institute
Scanning direction is stated with being in the tabular being parallel to each other on beam Propagation direction, and the first correction component 202 and second corrects
Component 203 can do at least motion in one dimension on the scanning direction respectively, specifically, please to change the relative position of the two
For emphasis with reference to figure 5, the first correction component 202 and second corrects component 203 can be respectively along shown in arrow S1 and arrow S2
Direction movement.
It is preferred that please continue to refer to Fig. 6, the first correction component 202 and second corrects the transmitance distribution of component 203
Change with change in location, and the transmitance distribution of the first correction component 202 and the transmitance point of the second correction component 203
Cloth has opposite variation tendency in the direction of movement, and in other words, the transmitance of the first correction component 202 is distributed as dotted line institute
The first linear distribution 401 shown, such as：Its transmitance from the beginning 70% increase linearly to 100%；Second correction component
203 transmitance is distributed as the second linear distribution 402 shown in dotted line, such as：Its transmitance linearly reduces from the 100% of beginning
To 70%, the region that combination of the two can be covered in whole illuminated field 201 is realized such as entirety shown in solid in Fig. 6
Transmitance distribution 403, so as to realize the intensity modulation of needs.Certainly, the first correction component 202 can also have the transmission of segmentation
Rate is distributed, i.e.,：First correction component 202 initially in the coverage to 1/2, transmitance increases linearly to 100% from 50%,
There is uniform 100% transmitance in 1/2 to end coverage, now, the second correction component 203, which similarly has, to be divided
Section transmitance distribution, it is simply opposite with the transmitance distribution trend of the first correction component 202；So can be achieved correction component to
The purpose of undamped light in the range of the illuminated field 201 covered, also cause between adjacent correction component pair will not because of interval and
Increase extra astigmatism.
It is preferred that the transmitance distribution that the first correction component 202 and second corrects component 203 is at least one-dimensional saturating
Rate distribution is crossed, is specifically as follows linear function distribution, either quadratic function distribution or trigonometric function distribution, if or above-mentioned
The combination distribution of dry kind of function.
It is preferred that the first correction component 202 and second corrects component 203 in the light beam perpendicular to the scanning direction
It is rectangle to transmit section, and the first correction component 202 and second corrects component 203 and overlapping set in non-scan direction dislocation
Put, now, described transmitance is separately positioned on the similar face of this two correction components, or is arranged on two schools
The distinct surfaces of positive component.
It is preferred that the first correction component 202 and second corrects component 203 in the light beam perpendicular to the scanning direction
It is parallelogram or trapezoidal to transmit section, and the first correction component 202 and second corrects component 203 in the Non-scanning mode side
Overlapped to dislocation, now, described transmitance is separately positioned on the similar face of this two correction components, Huo Zheshe
Put in this two distinct surfaces for correcting component；This two correction components are non-scan direction can also dislocation-free be completely overlapped sets
Put, now, described transmitance is separately positioned on the distinct surfaces of this two correction components.
It is preferred that the first correction component 202 and second corrects component 203 in the light beam perpendicular to the scanning direction
It is stairstepping to transmit section, and the first correction component 202 and second corrects component 203 has mirror image knot relative to beam cross section
Structure, now, described transmitance are separately positioned on the similar face of this two correction components, or are arranged on two schools
The distinct surfaces of positive component.
It is preferred that ask emphasis referring to figs. 2 and 3, all first correction components 202 are arranged on same plane,
And the first interval 204a is set to separate between two adjacent the first correction components 202；All second correction groups
Part 203 is arranged in another plane different with the described first correction place plane of component 202, and adjacent two described second
The second interval 204b is set to separate between correction component 203, the first interval 204a is big with the described second interval 204b
Small equal minim gap, it is 0.1mm in the present embodiment.
It is preferred that the first correction component 202 and second corrects component 203 and is made up of transmission material, such as glass material.
It is preferred that the first correction component 202 and second corrects component 203 by depositing transmission thing in manufacture material
Or decay thing is made, such as：Chromium thin film is deposited on the glass substrate, and the functional form of different films is made according to position, is continuously changed
Become the thickness of film, to realize that predetermined transmitance is distributed.
It is preferred that the first correction component 202 and second corrects component 203 by depositing random point in manufacture material
Decay thing or light-blocking matter of shape is made, by controlling the density of the pointing object to realize that predetermined transmitance is distributed.
Specifically, the correction component can be formed as shown in Figure 7 to the position by shading piece 207 and overlapping cases
Light transmittance be distributed recessed conic section；The schematic diagram that light transmittance as shown in Figure 8 is distributed convex conic section can be formed；Can be with shape
Cubic curve is distributed symmetrically into light transmittance as shown in Figure 9；Light transmittance distribution asymmetric three as shown in Figure 10 can also be formed
Secondary curve.
It is preferred that the variable grey level compensation panel assembly is arranged at the mask 112 nearby or the mask 112
Near optical conjugate face.
It is preferred that asking emphasis, with reference to figure 11, the variable mirror array apparatus also includes control device 505 and measurement fills
506 are put, the control device 505 is connected with multiple reflection mirror arrays 504, for changing the reflection mirror array 504
Local parameter, and then change reflectivity；The measurement apparatus 506 is installed on the reflection mirror array 504, described for detecting
Whether reflection mirror array 504 is adjusted in place, and result is fed back into the control device 505.Specifically, the variable mirror
Array apparatus is used for the integral uniformity for compensating remnants and the uniformity drift for compensating multiple light illumination modes.
It is preferred that the reflection mirror array 504 uses electro-optic crystal or electromagnetic drive.Driven using electromagnetism or electro-optic crystal
Dynamic reflection mirror array 504, to realize the varying reflectivity of speculum, modulation illumination intensity distribution, meet a variety of light illumination modes
Uniformity demands and uniformity drift demand.
Device for correcting illumination homogeneity provided by the invention, variable obscuring blades are used as by the use of variable mirror array apparatus
Combination and the additional project of variable grey level compensation plate scheme, because variable shading correction device each corrects component to can be independent
Regulation cover the region of illuminated field 201 transmitance distribution；Meanwhile the different shape of component pair is corrected by setting, and set
Put the connected mode between two adjacent correction components pair so that the transmitance in region is shared between two adjacent correction group parts pair
Components will be corrected to independent transmitance between two, and the gap area between adjacent correction component pair has non-zero attenuation
Rate.Thus, you can leakage light and shade caused by avoiding the gap between adjacent correction component pair.In addition, variable grey level compensation plate
Device is used for the uniformity difference for compensating multiple light illumination modes；Variable mirror array apparatus is used to compensate multiple light illumination modes
Uniformity drift.The transmissivity or reflectivity of three above variable component are adjusted, is scanned in the case of controllable multiple light illumination modes
The distribution of direction integral energy, it also can control the uniformity of whole illuminated field 201 in the case of multiple light illumination modes.And especially exist
In GaoNAQian roads illuminator, it is ensured that do not have to change compensating plate in Life cycle, reduce cost, improve yield, improve
Reliability.
Please emphasis with reference to figure 1, present invention also offers a kind of exposure projections system, includes light successively along paths direction
Source 101, beam expander 102, the first speculum 103, light beam positioning unit 104, adjustable optical attenuator 105, energy monitoring unit
106th, the second speculum 107, illuminator top module, device for correcting illumination homogeneity as described above 111, projection objective
114, the mask 112 in mask platform 113 is the object plane position of projection objective 114, and the silicon chip 115 in work stage 116 is projection
The image planes position of object lens 114.Specifically, the light source 101 produces the light beam 119 for exposure, and it can be wavelength 248nm, or
Person wavelength 193nm, or the LASER Light Source of other wavelength.The light beam 119 that light source 101 is sent first passes around beam expander 102 and carried out
Collimation, and ellipse-shaped light is converted into circular light beam；First speculum 103 can be single speculum or comprising more
The complicated Transmission system of individual speculum, the light beam 119 being emitted from beam expander 102 is transferred to light beam positioning unit 104 by it；Light beam
Positioning unit 104 can correct the incoming position and angle of light beam 119 by the way that light beam 119 is sampled and analyzed；Then light beam
119 pass through the adjustable optical attenuator 105 and energy monitoring unit 106 of the energy for controlling illuminator；It is anti-by second
After penetrating mirror 107, light beam 119 enters illuminator top module, and rectangular illumination field is formed in the plane perpendicular to optical axis 118.
Mask 112 is placed in mask platform 113, and in step-scan exposure system, mask platform 113 can be with constant speed
Scanning motion is come and gone along Y-direction, the pattern on mask 112 is projected to silicon chip 115 by projection objective 114, such as：Projection objective
114 enlargement ratio is 0.25.Work stage 116 is arranged on pedestal 117, for carrying silicon chip 115.Exposed in step-scan and be
In system, work stage 116 can do two dimensional motion in the X/Y plane parallel to the image planes of projection objective 114, including in the Y direction with perseverance
Constant speed degree does scanning motion, is moved in a stepwise manner in X and Y-direction.
The figure of the reflection of projection objective 114 to silicon chip 115 can be passed through to the non-uniform lighting of the pattern on mask 112
On, cause the uniformity difference of figure, using device for correcting illumination homogeneity 111 provided by the invention to illuminating system homogeneity
Correction, the uniform line width of silicon chip 115 can be obtained.In addition, the degeneration of the performance of projection objective 114 also results in illumination uniformity
Change, causes the figure line width on silicon chip 115 non-homogeneous, is compensated by the regulation of device for correcting illumination homogeneity 111, Ke Yida
Figure line width purpose heterogeneous on to correction silicon chip 115.Further, illumination intensity distribution is measured in silicon chip 115, to test
As a result judgement is handled, and by electronic-controlled installation, automatically adjusts device for correcting illumination homogeneity 111, reaches compensation silicon chip in time
The purpose of 115 illumination intensity uniformities.
It is preferred that ask emphasis to refer to figure 1, the illuminator top module including be arranged in order the first module 108, the
Two modules 109 and the 3rd module 110, first module 108 use diffraction optical element group, and its main function is that generation is more
The different light illumination mode of kind, such as：Circular illumination pattern, ring illumination pattern, dipole illumination pattern and quadrupole illuminating pattern.Compared with
Goodly, the diffraction optical element group uses runner (not shown), be provided with the runner it is multiple can far field formed not
With the diffraction optics piece of light distribution, it is respectively intended to produce different light illumination modes, when needs wherein some diffraction optics
During piece, be transferred to light path, specifically, the diffraction optics piece can be microlens array, either Fresnel Lenses or
Diffraction grating.
Second module 109 includes variable focus lens package and axicon, and the diffraction optical element group is positioned at described
On the front focal plane of variable focus lens package, after second module 109 combines with the diffraction optics piece in the first module 108, it can obtain
To appropriate illumination iris, such as：Ring illumination pupil.In addition, change the focal length of the variable focus lens package and axicon
The partially coherent degree of light illumination mode can be changed, such as：Change the outer shroud and inner ring size of ring illumination pupil.
Please emphasis with reference to figure 11, the 3rd module 110 includes the variable edge of a knife array in pupil face to component 501, even optical assembly
502nd, microlens array extra show mirror and optically focused microscope group 503, it is preferred that the device for correcting illumination homogeneity 111 is arranged at institute
Near the back focal plane for stating optically focused microscope group 503, the variable mirror array apparatus be arranged at the optically focused microscope group 503 45 degree turn
At angle, light beam 119 is incident to the reflection mirror array 504 after the optically focused microscope group 503, by pupil imaging to the mask
On 112, and the pattern on mask 112 is illuminated.In order to obtain the trapezoidal illuminated field on scanning direction (i.e. Y-direction) point
There is deviation cloth, the position of mask 112 with respect to the back focal plane of optically focused microscope group 503.
It is preferred that emphasis is asked to include two block size identicals to component 501 with reference to figure 2, the variable edge of a knife array in pupil face
Edge of a knife array board, it is the first array board 205 and the second array board 206 in the present embodiment, every piece of edge of a knife array board is provided with
Some size identical thang-kng patterns, by adjusting the relative position of two pieces of edge of a knife array boards, can continuously it change described
Light beam 119 is in X and the visual field size of Y-direction.Specifically, the thang-kng pattern on the edge of a knife array board can utilize photoetching process
The absorbing film of accurate size is formed on quartz, the material of chemically reactive etching can also be used, such as：Silicon, existed using photoetching process
The hole of needs is etched in silicon version.
The light beam 119 being emitted by the 3rd module 110, is with rectangular illumination field in the plane perpendicular to optical axis 118
Size.Device for correcting illumination homogeneity 111 of the present invention is used for correcting the heterogeneity of rectangular illumination field, also for school
The line width heterogeneity of positive silicon chip 115.It can be between the 3rd module 110 and mask 112 near mask 112
Position, may be alternatively located near the optical conjugate face of mask 112.In the present embodiment, the device for correcting illumination homogeneity 111
In the 3rd module 110 near the back focal plane of optically focused microscope group 503.
Please emphasis with reference to figure 12, present invention also offers a kind of correction side of device for correcting illumination homogeneity as described above
Method, comprise the following steps：
S1：The original uniform distribution of silicon chip face is measured using the measuring unit 120 that is installed in work stage 116, by can
Become shading correction device and variable grey level compensation panel assembly changes silicon chip surface uniformity, and obtained using litho machine software through toning
Silicon chip surface uniformity distribution after whole；
S2：According to silicon chip surface uniformity demand, each reflectivity adjustment amount distribution in the reflection mirror array 504 is calculated；
S3：It is distributed according to each reflectivity adjustment amount in the reflection mirror array 504, adjusts the reflectivity of each speculum；
S4：It is distributed using the repetition measurement silicon chip surface uniformity of measuring unit 120；
S5：Judge above-mentioned repetition measurement result, if meeting silicon chip surface uniformity demand, stop adjustment；If not satisfied, then continue
The reflectivity of the speculum is adjusted, until meeting silicon chip surface uniformity demand.
Bearing calibration provided by the invention can control more by adjusting the transmissivity or reflectivity of three above variable component
The distribution of scanning direction integral energy in the case of individual light illumination mode, it also can control illuminated field 201 in the case of multiple light illumination modes
Uniformity.And especially in GaoNAQian roads illuminator, it is ensured that do not have to change compensating plate in Life cycle, reduce into
This, improves yield, improves reliability.
Embodiment two
Please emphasis be with reference to figure 13, the present embodiment and the difference of embodiment one：The concrete structure of 3rd module 110 is not
Together, the 3rd module 110 in the present embodiment specifically includes even optical assembly, and the even optical assembly in the present embodiment uses quartz pushrod or stone
English rod combination 601, with reference to variable shading edge of a knife array to 602, variable edge of a knife component 603 and optically focused microscope group 503, light beam 119
The reflection mirror array 504 is incident to after the optically focused microscope group 503, by pupil imaging to the mask 112, and to covering
Pattern on masterplate 112 is illuminated.In order to obtain the trapezoidal illumination field distribution on scanning direction (i.e. Y-direction), mask 112
Position have a deviation with respect to the back focal plane of optically focused microscope group 503, the present embodiment can equally realize the effect of modulation illumination intensity distribution.
It is preferred that the variable edge of a knife component 603 is made up of four block size identical edge of a knife plates.
In summary, device for correcting illumination homogeneity provided by the invention, bearing calibration and a kind of exposure projections system,
Including：Variable shading correction device, including some correction components pair for being arranged on illuminating bundle cross section, some correction groups
Part overlaps whole to cover to being spaced setting along non-scan direction to cover whole illuminated field 201 along scanning direction
The illuminated field 201；Variable grey level compensation panel assembly, include the flat board of the relatively-movable different gray scale transmitances of two panels；With
And variable mirror array apparatus, including variable mirror Optical devices, the variable mirror Optical devices are by multiple variable
The reflection mirror array 504 of reflectivity forms, by adjust it is described correction component pair shape and overlap mode, the flat board it is saturating
The reflectivity of rate and the reflection mirror array 504 is crossed, the illumination for adjusting the whole illuminated field 201 under multiple light illumination modes is equal
Even property.The achievable varying reflectivity of the present invention, to modulate illumination intensity distribution, meet the uniformity demands of a variety of light illumination modes
With uniformity drift demand.
Obviously, those skilled in the art can carry out the spirit of various changes and modification without departing from the present invention to invention
And scope.So, if these modifications and variations of the present invention belong to the claims in the present invention and its equivalent technologies scope it
Interior, then the present invention is also intended to including these changes and modification.
Claims (27)
1. a kind of device for correcting illumination homogeneity, it is arranged above mask, it is characterised in that including：
Variable shading correction device, including some correction components pair for being arranged on illuminating bundle cross section, some correction groups
Part overlaps whole described to cover to being spaced setting along non-scan direction to cover whole illuminated field along scanning direction
Illuminated field；
Variable grey level compensation panel assembly, include the flat board of the relatively-movable different gray scale transmitances of two panels；And
Variable mirror array apparatus, including variable mirror Optical devices, the variable mirror Optical devices by it is multiple can
The reflection mirror array composition of reflectivity-variable,
By the shape and overlap mode, the transmitance of the flat board and reflection mirror array that adjust the correction component pair
Reflectivity, adjust the illumination uniformity of the whole illuminated field under multiple light illumination modes.
2. device for correcting illumination homogeneity as claimed in claim 1, it is characterised in that the variable shading correction device is set
Near the mask or near the optical conjugate face of the mask.
3. device for correcting illumination homogeneity as claimed in claim 1, it is characterised in that the correction component including edge to scanning
The first correction component of the illuminated field is inserted in direction, and the second correction component of the illuminated field is inserted along scanning opposite direction,
The first correction component is identical with the second correction component count and corresponds.
4. device for correcting illumination homogeneity as claimed in claim 3, it is characterised in that the first correction component and the second school
In the tabular being parallel to each other on the scanning direction and beam Propagation direction on positive component, and the first correction component and
Second correction component can do at least motion in one dimension on the scanning direction respectively, to change the relative position of the two.
5. device for correcting illumination homogeneity as claimed in claim 4, it is characterised in that the first correction component and the second school
The transmitance distribution of positive component changes with change in location, and transmitance distribution and the second correction group of the first correction component
The transmitance distribution of part has opposite variation tendency in the direction of movement.
6. device for correcting illumination homogeneity as claimed in claim 5, it is characterised in that the first correction component and the second school
The transmitance that the transmitance distribution of positive component is at least one-dimensional is distributed.
7. device for correcting illumination homogeneity as claimed in claim 6, it is characterised in that the first correction component and the second school
The transmitance of positive component is distributed as linear function distribution, either quadratic function distribution or trigonometric function distribution, if or above-mentioned
The combination distribution of dry kind of function.
8. device for correcting illumination homogeneity as claimed in claim 5, it is characterised in that the first correction component and the second school
Positive component is rectangle in the beam Propagation section perpendicular to the scanning direction, the first correction component and the second correction component
Overlapped in non-scan direction dislocation.
9. device for correcting illumination homogeneity as claimed in claim 5, it is characterised in that the first correction component and the second school
Positive component is being parallelogram perpendicular to the beam Propagation section of the scanning direction or trapezoidal, the first correction component and
Second correction component overlaps in non-scan direction dislocation, or the completely overlapped setting of dislocation-free.
10. device for correcting illumination homogeneity as claimed in claim 5, it is characterised in that the first correction component and second
It is stairstepping that component, which is corrected, in the beam Propagation section perpendicular to the scanning direction, the first correction component and the second correction
Component has mirror-image structure relative to beam cross section.
11. device for correcting illumination homogeneity as claimed in claim 3, it is characterised in that all the first correction components
It is arranged on same plane, and sets first to separate between adjacent two the first correction components；All is described
Second correction component is arranged in another plane different with plane where the described first correction component, and described in adjacent two
Second is set to separate between second correction component.
12. device for correcting illumination homogeneity as claimed in claim 11, it is characterised in that first interval and described second
Gap size is equal, is 0.1mm.
13. device for correcting illumination homogeneity as claimed in claim 3, it is characterised in that the first correction component and second
Correction component is made up of transmission material.
14. device for correcting illumination homogeneity as claimed in claim 3, it is characterised in that the first correction component and second
Correction component is made by depositing transmission thing or decay thing in manufacture material.
15. device for correcting illumination homogeneity as claimed in claim 3, it is characterised in that the first correction component and second
Correction component is made by depositing random point-like decay thing or light-blocking matter in manufacture material.
16. device for correcting illumination homogeneity as claimed in claim 1, it is characterised in that the variable grey level compensation panel assembly
The mask is arranged at nearby or near the optical conjugate face of the mask.
17. device for correcting illumination homogeneity as claimed in claim 1, it is characterised in that the variable mirror array apparatus
Also include control device and measurement apparatus, the control device is connected with multiple reflection mirror arrays, described anti-for changing
Penetrate the reflectivity of lens array；The measurement apparatus is installed on the reflection mirror array, is for detecting the reflection mirror array
It is no to be adjusted in place, and result is fed back into the control device.
18. device for correcting illumination homogeneity as claimed in claim 17, it is characterised in that the reflection mirror array uses electric light
Crystal or electromagnetic drive.
19. a kind of exposure projections system, it is characterised in that include light source, beam expander, the first reflection successively along paths direction
Mirror, light beam positioning unit, adjustable optical attenuator, energy monitoring unit, the second speculum, illuminator top module, such as weigh
Profit requires the device for correcting illumination homogeneity and projection objective described in 1, and the mask in mask platform is the object plane of projection objective
Position, the silicon chip in work stage is projection objective image planes position.
20. exposure projections system as claimed in claim 19, it is characterised in that the illuminator top module is included successively
The first module, the second module and the 3rd module of arrangement, first module use diffraction optical element group；Second module
Including variable focus lens package and axicon, the diffraction optical element group is located on the front focal plane of the variable focus lens package；Institute
Stating the 3rd module includes the variable edge of a knife array in pupil face to component, even optical assembly, microlens array extra show mirror and optically focused microscope group, light
The reflection mirror array is incident to after optically focused microscope group described in Shu Jing, by pupil imaging to the mask.
21. exposure projections system as claimed in claim 20, it is characterised in that the device for correcting illumination homogeneity is arranged at
Near the back focal plane of the optically focused microscope group, the variable mirror array apparatus is arranged at 45 degree of turnings of the optically focused microscope group
Place.
22. exposure projections system as claimed in claim 20, it is characterised in that the diffraction optical element group uses runner,
Multiple diffraction optics pieces that different light distribution can be formed in far field are provided with the runner, the diffraction optics piece is micro-
Lens array, either Fresnel Lenses or diffraction grating.
23. exposure projections system as claimed in claim 20, it is characterised in that the variable edge of a knife array in pupil face is to component bag
Two block size identical edge of a knife array boards are included, every piece of edge of a knife array board is provided with some size identical thang-kng patterns, leads to
The relative position of two pieces of edge of a knife array boards is overregulated, changes the visual field size of the light beam.
24. exposure projections system as claimed in claim 19, it is characterised in that the illuminator top module is included successively
The first module, the second module and the 3rd module of arrangement, first module use diffraction optical element group；Second module
Including variable focus lens package and axicon, the diffraction optical element group is located on the front focal plane of the variable focus lens package；Institute
State the 3rd module includes even optical assembly, variable shading edge of a knife array to, variable edge of a knife component and optically focused microscope group, light beam warp successively
The reflection mirror array is incident to after the optically focused microscope group, by pupil imaging to the mask.
25. exposure projections system as claimed in claim 24, it is characterised in that the even optical assembly uses quartz pushrod or quartz
Rod combines.
26. exposure projections system as claimed in claim 24, it is characterised in that the variable edge of a knife component is by four block size phases
Same edge of a knife plate composition.
27. the bearing calibration of device for correcting illumination homogeneity as claimed in claim 1, it is characterised in that comprise the following steps：
S1：Using the measuring unit measurement silicon chip face original uniform distribution being installed in work stage, pass through variable shading correction
Device and variable grey level compensation panel assembly change silicon chip surface uniformity, and obtain the silicon chip after being adjusted using litho machine software
Surface uniformity is distributed；
S2：According to silicon chip surface uniformity demand, each reflectivity adjustment amount distribution in the reflection mirror array is calculated；
S3：It is distributed according to each reflectivity adjustment amount in the reflection mirror array, adjusts the reflectivity of each speculum；
S4：It is distributed using measuring unit repetition measurement silicon chip surface uniformity；
S5：Judge above-mentioned repetition measurement result, if meeting silicon chip surface uniformity demand, stop adjustment；If not satisfied, then continue to adjust
The reflectivity of the speculum, until meeting silicon chip surface uniformity demand.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610874597.1A CN107885038A (en) | 2016-09-30 | 2016-09-30 | Device for correcting illumination homogeneity, bearing calibration and a kind of exposure projections system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610874597.1A CN107885038A (en) | 2016-09-30 | 2016-09-30 | Device for correcting illumination homogeneity, bearing calibration and a kind of exposure projections system |
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| CN109657402A (en) * | 2019-01-07 | 2019-04-19 | 中国科学院光电技术研究所 | A kind of modeling method of light distribution, device, electronic equipment and storage medium |
| WO2020001645A1 (en) * | 2018-06-29 | 2020-01-02 | 上海微电子装备（集团）股份有限公司 | Lithography machine luminance uniformity compensation method and device, and illumination system and lithography machine |
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