CN107861339B - Two-stage gas-liquid separation and recovery device for immersion lithography machine - Google Patents
Two-stage gas-liquid separation and recovery device for immersion lithography machine Download PDFInfo
- Publication number
- CN107861339B CN107861339B CN201711338005.5A CN201711338005A CN107861339B CN 107861339 B CN107861339 B CN 107861339B CN 201711338005 A CN201711338005 A CN 201711338005A CN 107861339 B CN107861339 B CN 107861339B
- Authority
- CN
- China
- Prior art keywords
- gas
- liquid
- outlet
- liquid separation
- inlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D45/00—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces
- B01D45/02—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising gravity
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D45/00—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces
- B01D45/12—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by centrifugal forces
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention relates to a two-stage gas-liquid separation and recovery device for an immersion lithography machine. The invention comprises a gas-liquid separator, a gas-liquid separation tank, a liquid flow controller, a two-phase flow loop before gas and liquid separation, an exhaust loop after gas and liquid separation and a drainage loop after gas and liquid separation; the gas-liquid separator is connected with a two-phase flow loop before gas and liquid are separated and an inlet at the upper part of the gas-liquid separation tank, the gas-liquid separation tank is connected with an exhaust loop after gas and liquid are separated and an inlet of the liquid flow controller, and the liquid flow controller and the gas-liquid separator are connected with a drainage loop after gas and liquid are separated. The invention can realize continuous separation process for gas-liquid two-phase flow under the action of negative pressure suction, and compared with the prior solution, the invention has obvious improvement on separation and recovery efficiency and effect. Meanwhile, the interference to the negative pressure of the system is avoided, and the gas and the liquid in the system can be discharged and timely decompressed under the fault condition.
Description
Technical Field
The invention belongs to the technical field of gas-liquid separation and recovery devices, and relates to a two-stage gas-liquid separation and recovery device for an immersion lithography machine.
Background
The immersion lithography machine is developed on the basis of a traditional dry lithography machine, and compared with the dry lithography machine, the immersion lithography machine replaces a medium between the lower surface of the last projection objective of the dry lithography machine and photoresist on a silicon wafer with air, and the numerical aperture of the projection objective is improved, so that the resolution and focal depth of the lithography machine are improved. The liquid immersion method is a partial immersion method because the traditional dry photoetching technology is used as a basis. The immersion method is to fix the projection objective, and the lower surface of the last projection objective is always immersed in the liquid. In the step-and-scan process, different parts of the silicon wafer are immersed in the liquid, and the stable and continuous flow of the liquid is ensured for realizing the continuous updating of the liquid flow field. Here, due to the design of the airtight seal of the flow field and the arrangement of the recovery port of the immersion unit, the fluid medium in the recovery process is a gas-liquid two-phase flow medium, which can cause fluctuation of flow and pressure, thereby influencing the quality of exposure etching; in addition, since the submerged unit is a direct source of gas-liquid recovery, suction can only be performed from the end of the system using negative pressure, so in order to achieve a stable continuous flow of liquid, the recovery negative pressure must be controlled stably. Therefore, the immersion lithography machine needs to be equipped with a device that can perform gas-liquid separation and recovery under negative pressure.
In the existing gas-liquid separation and recovery solution, a gas-liquid separation tank with large volume and which separates gas from liquid by utilizing gravity is adopted, and a water pump is intermittently started to recover liquid after gas-liquid separation is realized in the separation tank. The implementation method has the following defects: (1) The immersion lithography machine requires that other devices except the lithography machine body are placed in a cabinet of a factory area, the existing gas-liquid separation tank occupies a large space, and only gravity is used for separating gas and liquid, so that the separation efficiency is low, and the separation effect is not good; (2) The immersion lithography has high index requirements on flow velocity, pressure and the like in an immersion flow field, so that the working mode of intermittently starting the water pump can cause great fluctuation of pressure and flow.
Disclosure of Invention
The invention aims to provide a two-stage gas-liquid separation and recovery device for an immersion lithography machine.
The invention relates to a two-stage gas-liquid separation recovery device for an immersion lithography machine, which comprises a gas-liquid separator, a gas-liquid separation tank, a liquid flow controller, a two-phase flow loop before gas and liquid separation, an exhaust loop after gas and liquid separation and a drainage loop after gas and liquid separation;
the upper inlet of the gas-liquid separator is connected with the two-phase flow loop before gas and liquid are separated, the upper outlet of the gas-liquid separator is connected with the upper inlet of the gas-liquid separation tank, the upper outlet of the gas-liquid separation tank is connected with the exhaust loop after gas and liquid are separated, the lower outlet of the gas-liquid separation tank is connected with the inlet of the liquid flow controller, and the outlet of the liquid flow controller is combined with the lower outlet of the gas-liquid separator into one path and then connected with the drainage loop after gas and liquid are separated.
The two-phase flow loop before the separation of the gas and the liquid comprises a first electromagnetic switch valve, a coriolis flowmeter and a first pressure transmitter; the inlet of the gas-liquid mixture is sequentially connected with the electromagnetic switch valve, the Ke-type flowmeter and the first pressure transmitter, the outlet of the first pressure transmitter is connected with the upper inlet of the gas-liquid separator, and the inlet of the gas-liquid mixture is connected with the outlet of the immersing unit.
The exhaust loop after the separation of the gas and the liquid comprises a second pressure transmitter, a water separator, a vacuum filter, a first manual valve, a hygrometer, a second electromagnetic switch valve, a gas flowmeter, a pressure controller, a vacuum overflow valve and a vacuum pump; an inlet of the second pressure transmitter is connected with an upper outlet of the gas-liquid separation tank, and an outlet of the pressure transmitter is connected with an inlet of the vacuum pump through the water separator, the vacuum filter, the hygrometer, the second electromagnetic switch valve, the gas flowmeter, the pressure controller and the water separator; a first manual valve inlet bypass is connected between the outlet of the second pressure transmitter and the inlet of the water separator, the first manual valve outlet bypass is connected with the outlet of the vacuum pump, a first gas unloading port is arranged at the connection part, and the other outlet of the first manual valve is a second gas unloading port; a bypass of a vacuum relief valve is connected between the outlet of the pressure controller and the inlet of the vacuum pump, the vacuum relief valve having a third gas unloading port.
The drainage loop after the separation of the gas and the liquid comprises a liquid flowmeter, a one-way valve, a water pump and a second manual valve; the outlet of the liquid flow controller is connected with the lower outlet of the gas-liquid separator to form one path, and then is divided into two paths, wherein one path is connected with the inlet of the liquid flowmeter and then is connected with the inlet of the water pump through the one-way valve; the other path is connected with an inlet of a second manual valve, an outlet of the second manual valve is connected with an outlet of the water pump, a second liquid unloading port is arranged at the joint, and the other outlet of the second manual valve is a first liquid unloading port.
Preferably, the gas-liquid separator is a centrifugal separator.
Preferably, the gas-liquid separation tank is provided with a liquid level meter for monitoring liquid level change.
Preferably, the water pump is a water pump with a self-priming function.
Preferably, the first pressure transmitter and the second pressure transmitter are both capacitive pressure transmitters.
The invention can realize continuous separation process for gas-liquid two-phase flow under the action of negative pressure suction, and compared with the prior solution, the invention has obvious improvement on separation and recovery efficiency and effect. Through the coordinated work of the exhaust loop and the drainage loop, the gas-liquid separation can be ensured to run continuously and uninterruptedly, and the gas-liquid two-phase flow injection is not influenced. The liquid separated in the gas-liquid separation device is directly extracted by the water pump with the self-priming function, so that the problem that the liquid cannot automatically flow out due to the existence of negative pressure in the gas-liquid separation device is overcome. The first electromagnetic switch valve type flowmeter and the first pressure transmitter are additionally arranged before the recovery device of the two-stage gas-liquid separation device, a certain protection effect is achieved on the whole device, and meanwhile, the front-back comparison can be formed on the actual use effect of the gas-liquid separation device, so that the regulation and replacement of components are facilitated. Through arranging the coriolis flowmeter in the two-phase flow loop before the separation of the gas and the liquid, and arranging the gas flowmeter and the liquid flowmeter in the exhaust loop and the drainage loop after the separation of the gas and the liquid, the monitoring and the metering of the medium flow conditions in various pipelines are realized. Through the cooperation of the pressure controller and the pressure transmitter, the system is continuously and stably supplied with negative pressure, and the system has stable suction conditions. Through the cooperation of liquid flow controller and level gauge, through continuous regulation drainage flow in the course of the work, the liquid level in the messenger gas-liquid separation jar keeps stable, has further guaranteed the coordination work effect that gas-liquid separator (centrifugal separation) and gas-liquid separation jar (gravity separation) two-stage separation retrieved. Therefore, the separation device can continuously and efficiently separate and recycle, and meanwhile, the interference to the negative pressure of the system is avoided as much as possible. Meanwhile, a manual valve is additionally arranged in each of the exhaust and drainage loops, so that pressure relief under fault conditions and gas and liquid in the system are discharged, and the system can be recovered to be normal as soon as possible.
Drawings
FIG. 1 is a schematic diagram of the overall structure of the present invention;
FIG. 2 is a simplified schematic illustration of the present invention assembled with an immersion unit and a projection objective;
Detailed Description
The invention is further described below with reference to the drawings and examples.
As shown in fig. 1, a two-stage gas-liquid separation recovery device for an immersion lithography machine comprises a gas-liquid separator 11 for gas-liquid separation by using a centrifugal principle, a gas-liquid separation tank 14 provided with a liquid level meter 13 for monitoring liquid level change, a liquid flow controller 12, a two-phase flow loop before gas and liquid separation, an exhaust loop after gas and liquid separation, and a drainage loop after gas and liquid separation; the upper inlet of the gas-liquid separator 11 is connected with a two-phase flow loop before gas and liquid are separated, the upper outlet of the gas-liquid separator 11 is connected with the upper inlet of the gas-liquid separation tank 14, the upper outlet of the gas-liquid separation tank 14 is connected with an exhaust loop after gas and liquid are separated, the lower outlet of the gas-liquid separation tank 14 is connected with the inlet of the liquid flow controller 12, and the outlet of the liquid flow controller 12 is combined with the lower outlet of the gas-liquid separator 11 into a path and then connected with a drainage loop after gas and liquid are separated.
The two-phase flow loop before gas and liquid separation comprises a first electromagnetic switch valve 8, a coriolis flowmeter 9 and a first pressure transmitter 10; the inlet 7 of the gas-liquid mixture is sequentially connected with the electromagnetic switch valve 8, the coriolis flowmeter 9 and the first pressure transmitter 10, the outlet of the first pressure transmitter 10 is connected with the upper inlet of the gas-liquid separator 11, the inlet 7 of the gas-liquid mixture is connected with the outlet of the immersion unit, and the gas-liquid separator 11 is a standard component.
The exhaust loop after gas and liquid separation comprises a second pressure transmitter 15, a water separator 16, a vacuum filter 17, a first manual valve 18, a hygrometer 19, a second electromagnetic switch valve 20, a gas flowmeter 21, a pressure controller 22, a vacuum overflow valve 23 and a vacuum pump 24; an inlet of the second pressure transmitter 15 is connected with an upper outlet of the gas-liquid separation tank 14, and an outlet of the pressure transmitter 15 is connected with an inlet of the vacuum pump 24 through the water separator 16, the vacuum filter 17, the hygrometer 19, the second electromagnetic switch valve 20, the gas flowmeter 21, the pressure controller 22; a first manual valve 18 inlet bypass is connected between the outlet of the second pressure transmitter 15 and the inlet of the water separator 16, the first manual valve 18 outlet bypass is connected with the outlet of the vacuum pump 24, a first gas unloading port 25 is arranged at the connection, and the other outlet of the first manual valve 18 is a second gas unloading port 27 which is used for gas unloading under the fault condition; a bypass of the vacuum relief valve 23 is connected between the outlet of the pressure controller 22 and the inlet of the vacuum pump 24, vacuum relief protection is performed, and the vacuum relief valve 23 has a third gas unloading port 32. The vacuum pump 24 provides a required negative pressure environment, the pressure controller 22 and the pressure transmitter 15 form a closed loop, and can continuously pump out the gas in the gas-liquid separation device, and simultaneously control the negative pressure in the gas-liquid separation device to meet the requirement of the immersion unit.
The drainage loop after gas and liquid separation comprises a liquid flowmeter 26, a one-way valve 28, a water pump 31 and a second manual valve 30; the outlet of the liquid flow controller 12 is connected with the lower outlet of the gas-liquid separator 11 to form a path, and then is divided into two paths, wherein one path is connected with the inlet of the liquid flowmeter 26 and then is connected with the inlet of the water pump 31 through the one-way valve 28; the other path is connected with the inlet of a second manual valve 30, the outlet of the second manual valve 30 is connected with the outlet of a water pump 31, a second liquid unloading port 33 is arranged at the joint, and the other outlet of the second manual valve 30 is a first liquid unloading port 29 which is used for unloading liquid under the fault condition.
The liquid level meter 13 monitors the liquid level change in the gas-liquid separation tank 14, and the liquid flow controller 12 adjusts according to the liquid level change, so that the liquid level in the gas-liquid separation device is ensured to be stable, and meanwhile, continuous liquid discharge is realized. The self-priming action of the water pump 31 ensures continuous gas-liquid separation in a negative pressure environment. The water pump 31 is a water pump having a self-priming function, and can provide the gas-liquid separation device with a capability of achieving stable suction operation under a large negative pressure condition.
The first pressure transmitter 10 and the second pressure transmitter 15 are both capacitive pressure transmitters, so that the pressure can be accurately measured, and meanwhile, the selected model is provided with a diaphragm, so that the influence on the measurement result caused by contact with different media is avoided.
The working principle of the invention is as follows:
as shown in fig. 2, the position of the two-stage gas-liquid separation recovery device 1 in the immersion lithography system is shown, and in the exposure etching process, light passes through the mask plate, the projection objective group 2 and the immersion unit 3, irradiates on the photoresist of the silicon wafer 5 placed on the wafer carrying table 4, exposes the silicon wafer 5, and accurately transfers the pattern on the mask plate onto the photoresist of the silicon wafer 5. The liquid injection device 6 continuously injects liquid into the immersion unit 3, and the two-stage gas-liquid separation recovery device 1 continuously extracts a gas-liquid mixture from the immersion unit 3, so that the flow field inside the immersion unit 3 is ensured to be updated. The outlet of the gas-liquid mixture in the two-stage gas-liquid separation recovery device is led out from the recovery outlet of the immersed unit 3.
The pressure controller and the second pressure transmitter form a negative pressure control loop. The pressure signal measured by the second pressure transmitter is converted into an analog signal and then is compared with a given signal in the pressure controller, so that the output value of the pressure controller is controlled, the vacuum pump is always started in the working process of the two-stage gas-liquid separation and recovery device, and the vacuum pump, the pressure controller and the gas flowmeter are matched for use to control the continuous and stable negative pressure environment and the suction rate in the suction process of the vacuum loop.
The liquid level meter of gas-liquid separation jar internally mounted continuously monitors the liquid level and changes, and according to the liquid level in the gas-liquid separation jar changes, liquid flow controller carries out the regulation of corresponding aperture size, has guaranteed that the liquid level in the gas-liquid separation jar is stable relatively, has also guaranteed gas-liquid separator and gas-liquid separation jar's collaborative work simultaneously, makes gas and liquid realize efficient separation, and the water pump is opened all the time, pumps at the rear end, has guaranteed the continuous recovery of liquid, has reduced the interference to retrieving the negative pressure production simultaneously.
In normal operation, the first solenoid valve is opened, and the coriolis flowmeter and the first pressure transmitter collect flow and pressure signals of the two-phase flow. The liquid level meter and the liquid flow controller in the liquid separating tank form closed loop feedback to keep the liquid level in the gas-liquid separating tank constant. The second pressure transmitter, the hygrometer, the electromagnetic switch valve, the gas flowmeter, the pressure controller and the vacuum pump are in a working state, and the gas flowmeter and the water pump are in a working state. When the system fails, the second electromagnetic switch valve, the pressure controller and the vacuum pump are closed, the first manual valve is opened, the second manual valve is opened to unload the system, and gas and liquid in the system are discharged, so that the system is recovered to be normal as soon as possible.
Claims (5)
1. A two-stage gas-liquid separation recovery device for an immersion lithography machine comprises a gas-liquid separator (11), a gas-liquid separation tank (14), a liquid flow controller (12), a two-phase flow loop before gas and liquid separation, an exhaust loop after gas and liquid separation and a drainage loop after gas and liquid separation; the method is characterized in that:
the upper inlet of the gas-liquid separator (11) is connected with a two-phase flow loop before gas and liquid are separated, the upper outlet of the gas-liquid separator (11) is connected with the upper inlet of the gas-liquid separation tank (14), the upper outlet of the gas-liquid separation tank (14) is connected with an exhaust loop after gas and liquid are separated, the lower outlet of the gas-liquid separation tank (14) is connected with the inlet of the liquid flow controller (12), and the outlet of the liquid flow controller (12) is connected with a drainage loop after gas and liquid are separated after being combined into a path with the lower outlet of the gas-liquid separator (11);
the two-phase flow loop before gas and liquid separation comprises a first electromagnetic switch valve (8), a coriolis flowmeter (9) and a first pressure transmitter (10); the inlet (7) of the gas-liquid mixture is sequentially connected with an electromagnetic switch valve (8), a coriolis flowmeter (9) and a first pressure transmitter (10), the outlet of the first pressure transmitter (10) is connected with the upper inlet of the gas-liquid separator (11), and the inlet (7) of the gas-liquid mixture is connected with the outlet of the immersion unit;
the exhaust loop after separating the gas and the liquid comprises a second pressure transmitter (15), a water separator (16), a vacuum filter (17), a first manual valve (18), a hygrometer (19), a second electromagnetic switch valve (20), a gas flowmeter (21), a pressure controller (22), a vacuum overflow valve (23) and a vacuum pump (24); an inlet of the second pressure transmitter (15) is connected with an upper outlet of the gas-liquid separation tank (14), and an outlet of the pressure transmitter (15) is connected with an inlet of the vacuum pump (24) through the water separator (16), the vacuum filter (17), the hygrometer (19), the second electromagnetic switch valve (20), the gas flowmeter (21), the pressure controller (22) in sequence; an inlet bypass of a first manual valve (18) is connected between an outlet of the second pressure transmitter (15) and an inlet of the water separator (16), the outlet bypass of the first manual valve (18) is connected with an outlet of the vacuum pump (24), a first gas unloading port (25) is arranged at the joint, and an outlet of the first manual valve (18) is a second gas unloading port (27); a bypass of a vacuum overflow valve (23) is connected between an outlet of the pressure controller (22) and an inlet of the vacuum pump (24), and the vacuum overflow valve (23) is provided with a third gas unloading port (32);
the drainage loop after gas and liquid separation comprises a liquid flowmeter (26), a one-way valve (28), a water pump (31) and a second manual valve (30); the outlet of the liquid flow controller (12) is connected with the lower outlet of the gas-liquid separator (11) to form one path, and then is divided into two paths, wherein one path is connected with the inlet of the liquid flowmeter (26) and then is connected with the inlet of the water pump (31) through the one-way valve (28); the other path is connected with an inlet of a second manual valve (30), an outlet of the second manual valve (30) is connected with an outlet of a water pump (31), a second liquid unloading port (33) is arranged at the joint, and the other outlet of the second manual valve (30) is a first liquid unloading port (29).
2. A two-stage gas-liquid separation recovery apparatus for an immersion lithography machine as claimed in claim 1, wherein: the gas-liquid separator (11) is a centrifugal separator.
3. A two-stage gas-liquid separation recovery apparatus for an immersion lithography machine as claimed in claim 1, wherein: the gas-liquid separation tank (14) is provided with a liquid level meter (13) for monitoring liquid level change.
4. A two-stage gas-liquid separation recovery apparatus for an immersion lithography machine as claimed in claim 1, wherein: the water pump (31) is a water pump with a self-priming function.
5. A two-stage gas-liquid separation recovery apparatus for an immersion lithography machine as claimed in claim 1, wherein: the first pressure transmitter (10) and the second pressure transmitter (15) are both capacitive pressure transmitters.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711338005.5A CN107861339B (en) | 2017-12-14 | 2017-12-14 | Two-stage gas-liquid separation and recovery device for immersion lithography machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711338005.5A CN107861339B (en) | 2017-12-14 | 2017-12-14 | Two-stage gas-liquid separation and recovery device for immersion lithography machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107861339A CN107861339A (en) | 2018-03-30 |
| CN107861339B true CN107861339B (en) | 2023-09-12 |
Family
ID=61706069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711338005.5A Active CN107861339B (en) | 2017-12-14 | 2017-12-14 | Two-stage gas-liquid separation and recovery device for immersion lithography machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107861339B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112781781B (en) * | 2020-12-29 | 2022-04-22 | 浙江启尔机电技术有限公司 | Disturbance force measuring device of immersion control unit |
| CN114002386B (en) * | 2021-10-29 | 2024-01-05 | 上海神开石油科技有限公司 | Miniature drainage device for gas source of gas analysis system |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102707580A (en) * | 2012-05-30 | 2012-10-03 | 浙江大学 | Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine |
| JP2014120693A (en) * | 2012-12-18 | 2014-06-30 | Nikon Corp | Liquid immersion member, exposure apparatus, exposure method, device manufacturing method, program, and recording medium |
| CN104035288A (en) * | 2014-06-05 | 2014-09-10 | 浙江大学 | Continuous gas-liquid separation device used for immersion type photoetching machine under negative-pressure environment |
| CN105467776A (en) * | 2015-12-11 | 2016-04-06 | 浙江大学 | Shunt control and pressure following apparatus and method provided with function of temperature control and used for immersion lithography |
| CN105536425A (en) * | 2016-01-19 | 2016-05-04 | 北京优工科技有限公司 | System and method for recovering mixed hydrocarbon from polyolefin discharged flare gas |
| CN105737427A (en) * | 2016-03-15 | 2016-07-06 | 西安交通大学 | One-grade self-overlaying low-temperature refrigeration circulating system using double-stage gas-liquid separator |
| CN207601507U (en) * | 2017-12-14 | 2018-07-10 | 浙江启尔机电技术有限公司 | For the two-stage gas-liquid separation retracting device of immersed photoetching machine |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7379155B2 (en) * | 2004-10-18 | 2008-05-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2017
- 2017-12-14 CN CN201711338005.5A patent/CN107861339B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102707580A (en) * | 2012-05-30 | 2012-10-03 | 浙江大学 | Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine |
| JP2014120693A (en) * | 2012-12-18 | 2014-06-30 | Nikon Corp | Liquid immersion member, exposure apparatus, exposure method, device manufacturing method, program, and recording medium |
| CN104035288A (en) * | 2014-06-05 | 2014-09-10 | 浙江大学 | Continuous gas-liquid separation device used for immersion type photoetching machine under negative-pressure environment |
| CN105467776A (en) * | 2015-12-11 | 2016-04-06 | 浙江大学 | Shunt control and pressure following apparatus and method provided with function of temperature control and used for immersion lithography |
| CN105536425A (en) * | 2016-01-19 | 2016-05-04 | 北京优工科技有限公司 | System and method for recovering mixed hydrocarbon from polyolefin discharged flare gas |
| CN105737427A (en) * | 2016-03-15 | 2016-07-06 | 西安交通大学 | One-grade self-overlaying low-temperature refrigeration circulating system using double-stage gas-liquid separator |
| CN207601507U (en) * | 2017-12-14 | 2018-07-10 | 浙江启尔机电技术有限公司 | For the two-stage gas-liquid separation retracting device of immersed photoetching machine |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107861339A (en) | 2018-03-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107861339B (en) | Two-stage gas-liquid separation and recovery device for immersion lithography machine | |
| CN104511408A (en) | Processing-liquid supply apparatus and processing-liquid supply method | |
| CN105217733B (en) | A kind of the nanometer filtering film water processing system and method for two-way flow | |
| CN107611055A (en) | A kind of pipeline liquid feed device for reducing bubble and producing and there is automatic row's bubble function | |
| JP2000189742A (en) | Gas dissolving module | |
| CN104035288A (en) | Continuous gas-liquid separation device used for immersion type photoetching machine under negative-pressure environment | |
| CN203569628U (en) | Silent pressure-superposed pipeline network water supply equipment | |
| CN110454137A (en) | A kind of blowdown apparatus of natural gas air inlet separator mesolow liquid | |
| CN204307428U (en) | Filter | |
| CN204601703U (en) | A kind of vacuum autobalance Drainage tank | |
| CN207601507U (en) | For the two-stage gas-liquid separation retracting device of immersed photoetching machine | |
| CN209521848U (en) | A kind of complete hidden exhaust system of deeper vacuum sewage collecting peculiar to vessel | |
| CN204699484U (en) | A kind of cutting fluid centralized processing system | |
| CN108371846B (en) | Gas-liquid separation device | |
| CN203154870U (en) | Instrument for extraction | |
| CN204225206U (en) | Air purification type non-negative pressure water-supply installation | |
| KR19990015330A (en) | Bubble separator for manufacturing semiconductor device, liquid supply device using same and driving method thereof | |
| CN104556254B (en) | A kind of vacuum realizes the separating and reclaiming device of variable concentrations liquid | |
| CN210876679U (en) | Negative pressure pipeline is from cleaning device | |
| JP6023038B2 (en) | Filter processing method, filter processing system, and computer-readable recording medium | |
| CN207828012U (en) | Ultrapure flotation unit for liquid immersion lithography | |
| CN203303898U (en) | Automatic proportioning machine | |
| CN203556523U (en) | Liquid cement circulating system for corrugated board production line | |
| CN207722638U (en) | A kind of automation ultrafiltration running gear | |
| RU2678653C1 (en) | Method and device for concentrating suspended components in water samples |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |