CN107238980A - A kind of colored filter and its manufacture method - Google Patents
A kind of colored filter and its manufacture method Download PDFInfo
- Publication number
- CN107238980A CN107238980A CN201710484550.9A CN201710484550A CN107238980A CN 107238980 A CN107238980 A CN 107238980A CN 201710484550 A CN201710484550 A CN 201710484550A CN 107238980 A CN107238980 A CN 107238980A
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- spacer material
- layer
- accommodating hole
- black
- auxiliary
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a kind of colored filter and its manufacture method, include the flatness layer of black-matrix layer, the chromatic filter layer that is arranged between the black-matrix layer and the covering black-matrix layer and chromatic filter layer；Also include main spacer material and auxiliary spacer material；The main spacer material is arranged on the flatness layer；The flatness layer is provided with accommodating hole, and the auxiliary spacer material is arranged in the accommodating hole, and the depth of accommodating hole is equal to the difference in height of the main spacer material and auxiliary spacer material in flatness layer top surface above section.The present invention is capable of the homogeneity of stability contorting auxiliary spacer material, mask plate cost is not increased, and new influence liquid crystal panel picture quality problems will not be produced, so as to reduce due to product quality problem caused by homogeneity difference, and on the premise of ensureing that main spacer material and auxiliary spacer material difference in height are arranges value, the absolute altitude of auxiliary spacer material is improved, to improve the elasticity of spacer material and the face anti-pressure ability of liquid crystal panel.
Description
Technical field
The invention belongs to technical field of liquid crystal display, and in particular to a kind of colored filter and its manufacture method.
Background technology
Liquid crystal panel in TFT-LCD includes color membrane substrates and array base palte, is filled out between color membrane substrates and array base palte
Filled with liquid crystal, wherein, the spacer material of the making on color membrane substrates primarily serves the effect of support.Current color membrane substrates are generally adopted
Designed with double spacer materials, while including higher main spacer material and relatively low auxiliary spacer material, main spacer material and auxiliary spacer material
Between there is difference in height, only main spacer material plays a supportive role in the absence of external forces, when liquid crystal panel by outside press
During power, auxiliary spacer material plays a supportive role jointly with main spacer material, so the difference in height between main spacer material and auxiliary spacer material
Can allow for liquid crystal panel has certain deflection, with absorbing external pressure.
Traditional spacer material processing procedure is completed by the different half-tone mask plate of a transmitance, is open by adjusting
The transmitance in portion forms the difference in height of main spacer material and auxiliary spacer material, but this technique is for spacer material material light reaction
Feature request is higher.When making spacer material, big light exposure can reduce the difference in height between auxiliary spacer material and main spacer material,
Small exposure rate can cause to aid in the material photochemical reaction of dottle pin object area incomplete, the hardly possible control of thickness homogeneity.In addition, such as
Shown in Fig. 1, in traditional color membrane substrates, main spacer material and auxiliary spacer material are designed with substrate so that the absolute height of auxiliary spacer material
Degree is less than main spacer material, and the decline of height can reduce the elasticity of spacer material, so as to reduce the face anti-pressure ability of liquid crystal panel.
The content of the invention
In view of the above-mentioned problems, the present invention proposes a kind of colored filter and its manufacture method, can stability contorting auxiliary every
The homogeneity of underbed, does not increase mask plate cost, and will not produce new influence liquid crystal panel picture quality problems, so as to
Reduce the product quality problem caused due to homogeneity difference；And ensureing that main spacer material and auxiliary spacer material difference in height are setting
On the premise of value, the absolute altitude of auxiliary spacer material is improved, to improve the elasticity of spacer material and the face anti-pressure ability of liquid crystal panel.
Above-mentioned technical purpose is realized, above-mentioned technique effect is reached, the present invention is achieved through the following technical solutions：
A kind of colored filter, including black-matrix layer, be arranged between the black-matrix layer chromatic filter layer, with
And the flatness layer of the covering black-matrix layer and chromatic filter layer；Also include main spacer material and auxiliary spacer material；The master every
Underbed is arranged on the flatness layer；The flatness layer is provided with accommodating hole, and the auxiliary spacer material is arranged on the accommodating hole
It is interior, and the depth of accommodating hole is equal to the difference in height of the main spacer material and auxiliary spacer material in flatness layer top surface above section.
Further, the accommodating hole runs through flatness layer, the bottom surface of the auxiliary spacer material and the table of the black matrix"
Face is fitted, and the lateral wall of auxiliary spacer material is fitted with accommodating hole madial wall.
Further, the accommodating hole is groove-like, and the bottom surface of the auxiliary spacer material and lateral wall are and accommodating hole
Laminating.
Further, the black-matrix layer limits multiple subpixel areas；Adjacent color in the chromatic filter layer
The edge noncontact in block area, black matrix" is arranged between adjacent color lump area edge.
Further, the main spacer material and auxiliary spacer material are located at the vertical direction of black matrix" respectively.
Further, the main spacer material and auxiliary spacer material are obtained using the full exposure method of opening；It is described auxiliary every
The quantity of underbed is multiple, and the quantity of the accommodating hole on the flatness layer is corresponding with aiding in the quantity of spacer material.
A kind of manufacture method of colored filter, comprises the following steps：
S1：Form black-matrix layer；
S2：Chromatic filter layer is formed in black-matrix layer；
S3：Flatness layer is formed on chromatic filter layer；
S4：Multiple accommodating holes are formed on flatness layer；
S5：Main spacer material is formed on the surface of flatness layer and auxiliary dottle pin owner's dottle pin in accommodating hole is formed
Thing and auxiliary spacer material are equal to the depth of the accommodating hole in the difference in height of flatness layer top surface above section.
Further, the step S2 is specially：The photoresist for manufacturing chromatic filter layer is coated in black-matrix layer,
Mask plate is placed on photoresist.
Further, the step S3 is specially：The photoresist for manufacturing flatness layer is coated on chromatic colour filter layer, will
Mask plate is placed on photoresist.
Further, the step S4 is specially：The photoresist for manufacturing spacer material is coated on flatness layer top surface and accommodating
In hole, mask plate is placed on photoresist.
Beneficial effects of the present invention：
(1) present invention is able to ensure that auxiliary spacer material has the homogeneity of height, and maintain main spacer material and auxiliary every
The absolute altitude of auxiliary spacer material is improved while underbed difference in height, while Taper Angle angle is improved, so as to carry
The elasticity and the face compressive resistance of liquid crystal panel of high auxiliary spacer material.
(2) the main spacer material of the colored filter in the present invention and auxiliary spacer material can be adopted by using a mask plate
Once completed to make with the exposure of full mouth, it is not necessary to by exposing respectively, without making multiple mask plates or using opening portion saturating
The different intermediate tone mask version of rate is crossed, so as to greatly reduce technological process and production cost.
Brief description of the drawings
Fig. 1 is the structure sectional view of traditional color filter；
Fig. 2 is the colored filter sectional view after progress black-matrix layer processing procedure；
Fig. 3 is the colored filter sectional view after progress chromatic filter layer processing procedure；
Fig. 4 is the colored filter sectional view after progress flatness layer processing procedure；
Fig. 5 is the colored filter sectional view after the main spacer material of progress and auxiliary spacer material processing procedure.
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, with reference to embodiments, to the present invention
It is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, it is not used to
Limit the present invention.
The application principle of the present invention is explained in detail below in conjunction with the accompanying drawings.
Because the auxiliary spacer material of colored filter of the prior art is not up to saturation exposure, institute in manufacturing process
It is poor with its homogeneity, and the top width and bottom width of auxiliary spacer material are smaller, thus its elastic restoration ratio is poor, because
This, the present invention proposes a kind of colored filter and its manufacture method, can improve auxiliary spacer material during processing procedure
Homogeneity, so as to solve the various bad problems brought because homogeneity is not good.
Embodiment one
As shown in Figure 2-5, a kind of colored filter, including underlay substrate 1, black-matrix layer 2, it is arranged on the black square
The flatness layer 4 of chromatic filter layer 3 and the covering black-matrix layer and chromatic filter layer between battle array layer, in addition to it is main every
Underbed 5 and auxiliary spacer material 6；
The main spacer material 5 is arranged on the flatness layer 4；The flatness layer 4 is provided with accommodating hole, the auxiliary dottle pin
Thing 6 is arranged in the accommodating hole, and the depth of accommodating hole is equal to the main spacer material 5 and auxiliary spacer material 6 on flatness layer top
The difference in height Δ of face above section, so that winner's spacer material 5 is identical with the actual height value of auxiliary spacer material 6.
In formula of the embodiment of the present invention, the accommodating hole run through flatness layer 4, it is described auxiliary spacer material 6 bottom surface with it is described
The surface laminating of black matrix", and aid in the lateral wall of spacer material 6 to be fitted with accommodating hole madial wall；
Preferably, the black-matrix layer 2 is formed on underlay substrate 1, limits multiple subpixel areas；The colour
The edge noncontact in the adjacent color lump area in filter layer 3, black matrix" is arranged between adjacent color lump area edge；The main dottle pin
Thing 5 and auxiliary spacer material 6 are located at the vertical direction of black matrix" respectively.
In embodiments of the present invention, the main spacer material 5 and auxiliary spacer material 6 are made by light-proof material, and it is main every
Underbed 5 and auxiliary spacer material 6 are obtained using the full exposure method of opening, and therefore, all auxiliary spacer material exposure areas have
Identical light exposure, and improve within the identical time for exposure photochemical reaction rate of spacer material photosensitive resin, so that
Solidification photosensitive material after leaving more photochemical reactions at the marginal position exposed in development, the edge of exposure
TaperAngled (cone angle) angle direction is closer to vertical direction, so as to effectively improve the homogeneous of auxiliary spacer material
Property, and its Taper Angle angle is more easy to close to vertical.
Embodiment two
The present embodiment and the difference of embodiment one are：The accommodating hole is groove-like, the bottom surface of the auxiliary spacer material 6
And lateral wall is fitted with accommodating hole.
It is identical with embodiment one with part.
Embodiment three
As shown in Figure 2-5, a kind of manufacture method of colored filter, comprises the following steps：
S1：Black-matrix layer is formed on underlay substrate, Fig. 2 is specifically shown in；
The step S1 is specially：The photoresist for manufacturing black-matrix layer is coated on glass substrate, mask plate is put
In on photoresist, the position that mask plate forms black matrix" needed for correspondence offers unthreaded hole, the shape and black matrix" of unthreaded hole
It is adapted, then face exposure carries out light reaction, development and forms black matrix".
S2：Chromatic filter layer is formed in black-matrix layer, Fig. 3 is specifically shown in；
The step S2 is specially：The photoresist for manufacturing chromatic filter layer is coated in black-matrix layer, by mask plate
It is placed on photoresist, mask plate offers unthreaded hole, unthreaded hole in the position of the corresponding subpixel area in each color lump area of chromatic filter layer
Shape and pixel openings be adapted, the pattern that then face exposure carries out light reaction, development is formed needed for pixel.
S3：Being formed on chromatic filter layer has flatness layer, and forms multiple accommodating holes on flatness layer, is specifically shown in Fig. 4；
The step S3 is specially：The photoresist for manufacturing flatness layer is coated on chromatic colour filter layer, mask plate is put
In on photoresist, mask plate offers unthreaded hole, the shape and accommodating hole of unthreaded hole in the position that correspondence flatness layer need to leave accommodating hole
Size and angle be adapted, then face exposure carry out light reaction, development formed needed for accommodating hole.
S4：Main spacer material is formed on flatness layer and auxiliary spacer material in accommodating hole is formed, main spacer material and auxiliary
Help spacer material to be equal to the depth of accommodating hole in the difference in height of flatness layer top surface above section, be specifically shown in Fig. 5.
The step S4 is specially：The photoresist for manufacturing spacer material is coated in flatness layer top surface and accommodating hole, will be covered
Film version is placed on photoresist, and mask plate offers unthreaded hole, the shape of unthreaded hole in the position of the main spacer material of correspondence and auxiliary spacer material
It is adapted with main spacer material and auxiliary spacer material, then face exposure carries out light reaction and forms main spacer material and auxiliary spacer material.
In summary：
(1) present invention is able to ensure that auxiliary spacer material has the homogeneity of height, and maintain main spacer material and auxiliary every
The absolute altitude of auxiliary spacer material is improved while underbed difference in height, so as to improve the elasticity and liquid crystal surface of auxiliary spacer material
The face compressive resistance of plate.
(2) the main spacer material of the colored filter in the present invention and auxiliary spacer material can be adopted by using a mask plate
Once completed to make with the exposure of full mouth, it is not necessary to by exposing respectively, without making multiple mask plates or using opening portion saturating
The different intermediate tone mask version of rate is crossed, so as to greatly reduce technological process and production cost.
The general principle and principal character and advantages of the present invention of the present invention has been shown and described above.The technology of the industry
Personnel are it should be appreciated that the present invention is not limited to the above embodiments, and the simply explanation described in above-described embodiment and specification is originally
The principle of invention, without departing from the spirit and scope of the present invention, various changes and modifications of the present invention are possible, these changes
Change and improvement all fall within the protetion scope of the claimed invention.The claimed scope of the invention by appended claims and its
Equivalent thereof.
Claims (10)
1. a kind of colored filter, including black-matrix layer, the chromatic filter layer that is arranged between the black-matrix layer and
Cover the flatness layer of the black-matrix layer and chromatic filter layer；It is characterized in that：Also include main spacer material and auxiliary spacer material；
The main spacer material is arranged on the flatness layer；The flatness layer is provided with accommodating hole, and the auxiliary spacer material is arranged on institute
State in accommodating hole, and the depth of accommodating hole is equal to the height of the main spacer material and auxiliary spacer material in flatness layer top surface above section
Degree is poor.
2. a kind of colored filter according to claim 1, it is characterised in that：The accommodating hole runs through flatness layer, described
The bottom surface of auxiliary spacer material is fitted with the surface of the black matrix", and the lateral wall of auxiliary spacer material is pasted with accommodating hole madial wall
Close.
3. a kind of colored filter according to claim 1, it is characterised in that：The accommodating hole is groove-like, described auxiliary
The bottom surface and lateral wall for helping spacer material are fitted with accommodating hole.
4. a kind of colored filter according to any one of claim 1-3, it is characterised in that：The black-matrix layer limit
Make multiple subpixel areas；The edge noncontact in the adjacent color lump area in the chromatic filter layer, black matrix" is arranged on phase
Between adjacent color lump area edge.
5. a kind of colored filter according to claim 4, it is characterised in that：The main spacer material and auxiliary spacer material point
Not Wei Yu black matrix" vertical direction.
6. a kind of colored filter according to claim 5, it is characterised in that：The main spacer material and auxiliary spacer material are equal
Obtained using the full exposure method of opening；The quantity of the auxiliary spacer material is multiple, the quantity of the accommodating hole on the flatness layer
It is corresponding with aiding in the quantity of spacer material.
7. a kind of manufacture method of colored filter, it is characterised in that：Comprise the following steps：
S1：Form black-matrix layer；
S2：Chromatic filter layer is formed in black-matrix layer；
S3：Flatness layer is formed on chromatic filter layer；
S4：Multiple accommodating holes are formed on flatness layer；
S5：Main spacer material is formed on the surface of flatness layer and formed auxiliary dottle pin owner spacer material in accommodating hole and
Spacer material is aided in be equal to the depth of the accommodating hole in the difference in height of flatness layer top surface above section.
8. a kind of manufacture method of colored filter according to claim 7, it is characterised in that：The step S2 is specific
For：The photoresist for manufacturing chromatic filter layer is coated in black-matrix layer, mask plate is placed on photoresist.
9. a kind of manufacture method of colored filter according to claim 7, it is characterised in that：The step S3 is specific
For：The photoresist for manufacturing flatness layer is coated on chromatic colour filter layer, mask plate is placed on photoresist.
10. a kind of manufacture method of colored filter according to claim 7, it is characterised in that：The step S4 is specific
For：The photoresist for manufacturing spacer material is coated in flatness layer top surface and accommodating hole, mask plate is placed on photoresist.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710484550.9A CN107238980A (en) | 2017-06-23 | 2017-06-23 | A kind of colored filter and its manufacture method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710484550.9A CN107238980A (en) | 2017-06-23 | 2017-06-23 | A kind of colored filter and its manufacture method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107238980A true CN107238980A (en) | 2017-10-10 |
Family
ID=59986699
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710484550.9A Pending CN107238980A (en) | 2017-06-23 | 2017-06-23 | A kind of colored filter and its manufacture method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107238980A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108646471A (en) * | 2018-05-09 | 2018-10-12 | 深圳市华星光电技术有限公司 | To box substrate and preparation method thereof, display panel on display panel |
| CN109407413A (en) * | 2018-11-12 | 2019-03-01 | 惠科股份有限公司 | Display panel, display device and manufacturing photomask thereof |
| CN112859452A (en) * | 2021-02-24 | 2021-05-28 | 合肥京东方显示技术有限公司 | Display substrate, manufacturing method thereof, display panel and display device |
| CN113937439A (en) * | 2020-06-29 | 2022-01-14 | 上海天马微电子有限公司 | Phase shifter manufacturing method, phase shifter and antenna |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104238199A (en) * | 2014-09-10 | 2014-12-24 | 京东方科技集团股份有限公司 | Color film substrate, manufacturing method thereof and display device |
| CN104298010A (en) * | 2014-08-28 | 2015-01-21 | 合肥京东方光电科技有限公司 | Display substrate, display substrate manufacturing method and display device |
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2017
- 2017-06-23 CN CN201710484550.9A patent/CN107238980A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104298010A (en) * | 2014-08-28 | 2015-01-21 | 合肥京东方光电科技有限公司 | Display substrate, display substrate manufacturing method and display device |
| CN104238199A (en) * | 2014-09-10 | 2014-12-24 | 京东方科技集团股份有限公司 | Color film substrate, manufacturing method thereof and display device |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108646471A (en) * | 2018-05-09 | 2018-10-12 | 深圳市华星光电技术有限公司 | To box substrate and preparation method thereof, display panel on display panel |
| CN108646471B (en) * | 2018-05-09 | 2021-06-04 | Tcl华星光电技术有限公司 | Upper box aligning substrate for display panel, manufacturing method of upper box aligning substrate and display panel |
| CN109407413A (en) * | 2018-11-12 | 2019-03-01 | 惠科股份有限公司 | Display panel, display device and manufacturing photomask thereof |
| US11487145B2 (en) | 2018-11-12 | 2022-11-01 | HKC Corporation Limited | Display panel, mask for manufacturing same, and display device |
| CN113937439A (en) * | 2020-06-29 | 2022-01-14 | 上海天马微电子有限公司 | Phase shifter manufacturing method, phase shifter and antenna |
| CN113937439B (en) * | 2020-06-29 | 2022-08-16 | 上海天马微电子有限公司 | Phase shifter manufacturing method, phase shifter and antenna |
| CN112859452A (en) * | 2021-02-24 | 2021-05-28 | 合肥京东方显示技术有限公司 | Display substrate, manufacturing method thereof, display panel and display device |
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