CN106931884A - The measuring system and its measuring method of Micro and nano manipulation platform Three Degree Of Freedom - Google Patents
The measuring system and its measuring method of Micro and nano manipulation platform Three Degree Of Freedom Download PDFInfo
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- CN106931884A CN106931884A CN201710243558.6A CN201710243558A CN106931884A CN 106931884 A CN106931884 A CN 106931884A CN 201710243558 A CN201710243558 A CN 201710243558A CN 106931884 A CN106931884 A CN 106931884A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
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Abstract
The present invention relates to the technical field of laser detection of Micro and nano manipulation platform, a kind of measuring system of Micro and nano manipulation platform Three Degree Of Freedom is disclosed, Micro and nano manipulation platform includes platform base and displacement platform, and the measuring system includes：First laser interferometer and second laser interferometer on first axle, and be located on displacement platform and be configured to criss-cross optical module, the optical module includes the first right angle optic portion and the second right angle optic portion；Also include the spectroscope in the light path of imageing sensor and the emergent ray being arranged on after being reflected through the first right angle optic portion, it is vertical through the light splitting optical path of dichroic mirror and the photosurface of described image sensor.Present invention also offers a kind of measuring method of Micro and nano manipulation platform Three Degree Of Freedom.Measuring system and its measuring method can realize the measurement of space three-freedom and certainty of measurement is high that the present invention is provided.
Description
Technical field
The present invention relates to the technical field of laser detection of Micro and nano manipulation platform, more particularly to a kind of Micro and nano manipulation platform three
The measuring system and its measuring method of the free degree.
Background technology
With the development and application of Micro and nano manipulation technology, multiple degrees of freedom especially realizes that the Micro and nano manipulation of rotary freedom is put down
Platform is increasingly paid close attention to, and angular displacement and the accurate measurement of displacement of the lines are the key factors for influenceing its development.
Laser interferometer because high resolution, noncontact, it is affected by environment it is small, be quick on the draw the advantages of be widely used in it is various
In precision measurement system.Laser interferometer is to carry out displacement measurement according to the interference between reference beam and measuring beam, if
When twice light beam optical path difference is not changed in, detector can find the letter of stabilization between property mutually long and the two poles of the earth of destructive interference
Number；If optical path difference is changed, detector can be in change in optical path length each time, between property mutually long and the two poles of the earth of destructive interference
Variable signal is found, these changes can be calculated and be used for measuring the change of divergence between two light paths.The laser that presently, there are
Interferometer can only often survey single translational motion or single angular displacement.When there is optical path difference to change, laser interferometer cannot
Judge that this change is to be produced by translational motion or produced by the rotation of Micro and nano manipulation platform, therefore cause Micro and nano manipulation platform
Translational motion and angular displacement cannot be carried out doing when the i.e. existing translational motion of the non-rotary motion for centering has rotary motion again
Decouple and measure simultaneously.
The content of the invention
(1) technical problem to be solved
It is an object of the present invention to provide a kind of measuring system of Micro and nano manipulation platform Three Degree Of Freedom, the measuring system energy
It is enough Micro and nano manipulation platform do when the i.e. existing translational motion of the non-rotary motion for centering has rotary motion again to translational motion with
Angular displacement decouple and measured simultaneously, and certainty of measurement is high, simple structure.
It is a further object to provide a kind of measuring method of Micro and nano manipulation platform Three Degree Of Freedom.
(2) technical scheme
In order to solve the above-mentioned technical problem, the invention provides a kind of measuring system of Micro and nano manipulation platform Three Degree Of Freedom,
The Micro and nano manipulation platform includes platform base and the displacement platform on the platform base, it is characterised in that including：
First laser interferometer and second laser interferometer on first axle, the launch hole of first laser interferometer
Central axis it is conllinear with the central axis of the launch hole of second laser interferometer；And
It is located on displacement platform and is configured to criss-cross optical module, the optical module includes and first laser interferometer pair
The the first right angle optic portion answered, the first right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and first
The incident ray of laser interferometer transmitting is straight through the first right angle minute surface of the first right angle optic portion and second with the incident ray
Emergent ray after the mirror-reflection of angle is parallel, and optical module also includes the second right angle corresponding with second laser interferometer eyeglass portion
Point, the second right angle optic portion include the first right angle minute surface and the second right angle minute surface, and second laser interferometer transmitting enter
Light is penetrated with the incident ray through the outgoing after the first right angle minute surface and the second right angle mirror-reflection of the second right angle optic portion
Light ray parallel；And
Also include in the light path of imageing sensor and the emergent ray being arranged on after being reflected through the first right angle optic portion
Spectroscope, it is vertical through the light splitting optical path of dichroic mirror and the photosurface of described image sensor.
Wherein, optical module includes the optical module base being arranged on displacement platform, is set on optical module base
Criss-cross four draw-in grooves are configured to, sheet glass is provided with each draw-in groove, wherein, near first laser interferometer
Two sheet glass form the first right angle optic portion, and two sheet glass near second laser interferometer form the second right angle eyeglass
Part, wherein, it is coated with towards the one side of first laser interferometer near two sheet glass of first laser interferometer reflective
Film, two sheet glass near second laser interferometer are coated with reflective membrane towards the one side of second laser interferometer.
Present invention also offers a kind of measuring method of Micro and nano manipulation platform Three Degree Of Freedom, it includes：
S1：By the Kinematic Decomposition of displacement platform into the translational motion along first axle, along vertical with first axle second
The translational motion of axis and the rotary motion around Platform center point, if displacement platform is a along the translation distance of second axis1, edge
The translation distance of first axle is a2, and around Platform center point the anglec of rotation be θ；
S2：The displacement X of the emergent ray of the first right angle optic portion is measured by imageing sensor1, draw along second
The translational motion of axis is apart from a1=X1/2；
S2：The first direction optical path difference Y on first axle is measured by first laser interferometer11；By second laser interferometer
Measure the second direction optical path difference Y on first axle22；First laser interferometer is calculated because of displacement platform by below equation
The optical path difference Y received along first axle translational motion1, first laser interferometer because displacement platform around Platform center point rotate transport
The dynamic optical path difference Y for receiving2With the translation distance a along first axle2；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4:Described in being located in the rotary motion of Platform center point, displacement platform rotation preceding first right angle optic portion
The first of first right angle minute surface of the first right angle optic portion after first pip and the displacement platform rotation of the first right angle minute surface
The distance between pip is m, the second pip of the second right angle minute surface of displacement platform rotation preceding first right angle optic portion
It is n with the distance between second pip of the second right angle minute surface of the first right angle optic portion after displacement platform rotation, then makes α
=m/n, and known L0For displacement platform do not move between the incident ray and emergent ray of preceding first right angle optic portion away from
From then calculating the anglec of rotation θ of displacement platform by following formula：
(3) beneficial effect
The measuring system of the Micro and nano manipulation platform Three Degree Of Freedom that the present invention is provided realizes displacement platform by imageing sensor
Second axis direction displacement measurement, and the position in first axle direction is realized by two laser interferometer on first axle
Shift measurement, and the anglec of rotation of Micro and nano manipulation platform is calculated indirectly, so as to realize displacement and the angle of space three-freedom
Measurement, overcomes the limitation of existing detection device well, meets space multivariant linear displacement real-time with angular displacement
Measurement feedback.Additionally, the simple in measurement system structure, certainty of measurement are high.
Brief description of the drawings
Fig. 1 is according to a kind of structural representation of the measuring system of Micro and nano manipulation platform Three Degree Of Freedom of the invention；
Fig. 2 is a kind of top view of the measuring system of the Micro and nano manipulation platform Three Degree Of Freedom in Fig. 1；
Fig. 3 is a structural representation for preferred embodiment of the optical module of the measuring system in Fig. 1；
Fig. 4 is the schematic diagram before and after the displacement platform motion in Fig. 1；
Fig. 5 is the Kinematic Decomposition schematic diagram of the displacement platform in Fig. 4, wherein (a) shows for the structure before displacement platform motion
It is intended to；B () is the schematic diagram that the displacement platform after decomposing is translated along X-axis；C () is that the displacement platform after decomposing is translated along Y-axis
Schematic diagram；And (d) is the schematic diagram that the displacement platform after decomposing rotates around displacement platform central point；
Fig. 6 be in Fig. 5 (b) displacement platform along incident ray and emergent ray before and after X-axis translation schematic diagram；
Fig. 7 be in Fig. 5 (c) displacement platform along incident ray and emergent ray before and after Y-axis translation schematic diagram；
Fig. 8 is the signal of incident ray and emergent ray of the displacement platform before and after the rotation of Platform center point in Fig. 5 (d)
Figure.
In figure, 1：First laser interferometer；2：Second laser interferometer；3：Imageing sensor；4：Displacement platform；5：Platform
Base；6：Optical module；601：Optical module base；602：Sheet glass；603：Fixed support；604：Travel(l)ing rest；605：Spiral shell
Bolt.
Specific embodiment
With reference to the accompanying drawings and examples, specific embodiment of the invention is described in further detail.Following instance
For illustrating the present invention, but it is not limited to the scope of the present invention.
In the description of the invention, it is to be understood that term " " center ", " longitudinal direction ", " transverse direction ", " length ", " width ",
" thickness ", " on ", D score, "front", "rear", "left", "right", " vertical ", " level ", " top ", " bottom " " interior ", " outward ", " up time
The orientation or position relationship of the instruction such as pin ", " counterclockwise ", " axial direction ", " radial direction ", " circumference ", " X-axis " " Y-axis " are based on accompanying drawing
Shown orientation or position relationship, are for only for ease of and describe of the invention and simplify description, signified rather than instruction or hint
Device or element must have specific orientation, with specific azimuth configuration and operation, therefore it is not intended that to of the invention
Limitation.
Additionally, term " first ", " second " are only used for describing purpose, and it is not intended that indicating or implying relatively important
Property or the implicit quantity for indicating indicated technical characteristic.Thus, define " first ", the feature of " second " can express or
Person implicitly includes at least one this feature.In the description of the invention, " multiple " is meant that at least two, such as two,
Three etc., unless otherwise expressly limited specifically.
In the present invention, unless otherwise clearly defined and limited, term " installation ", " connected ", " connection ", " fixation " etc.
Term should be interpreted broadly, for example, it may be fixedly connected, or be detachably connected, or integrally；Can be that machinery connects
Connect, or electrically connect or can communicate each other；Can be joined directly together, it is also possible to be indirectly connected to by intermediary, can be with
Be two element internals connection or two interaction relationships of element, unless otherwise clearly restriction.For this area
For those of ordinary skill, above-mentioned term concrete meaning in the present invention can be as the case may be understood.
Figures 1 and 2 show that of the measuring system of a kind of Micro and nano manipulation platform Three Degree Of Freedom of the invention is excellent
Select embodiment.As shown in figure 1, Micro and nano manipulation platform includes platform base 5 and the displacement platform 4 on platform base 5, should
Measuring system includes：First laser interferometer 1 and second laser interferometer 2 on first axle (Y-axis), first laser are done
The central axis of the launch hole of interferometer 1 is conllinear with the central axis of the launch hole of second laser interferometer 2；And be located at displacement put down
Criss-cross optical module 6 is configured on platform 4, the optical module 6 includes first prism square corresponding with first laser interferometer 1
Piece part, the first right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and first laser interferometer 1 is launched
Incident ray and the incident ray after the first right angle minute surface and the second right angle mirror-reflection of the first right angle optic portion
Emergent ray is parallel, and in this embodiment, the incident ray of the transmitting of first laser interferometer 1 incides the first right angle optic portion
The first right angle minute surface initial incidence angle be 45 °.Optical module also includes second right angle corresponding with second laser interferometer 2
Optic portion, the second right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and second laser interferometer is sent out
The incident ray penetrated is with the incident ray after the first right angle minute surface and the second right angle mirror-reflection of the second right angle optic portion
Emergent ray it is parallel.In this embodiment, the incident ray of the transmitting of second laser interferometer 2 incides the second right angle eyeglass portion
The initial incidence angle of the first right angle minute surface for dividing is 45 °.
Additionally, the measuring system also includes imageing sensor 3 and is arranged on after the first right angle optic portion reflection
Spectroscope 7 in the light path of emergent ray, the light splitting optical path reflected through spectroscope 7 is vertical with the photosurface of imageing sensor 3.
The measuring system of the micro-nano report control platform Three Degree Of Freedom that the present invention is provided passes through imageing sensor 3 and spectroscope 7
The displacement measurement on second axis (X-axis) direction vertical with Y-axis can be realized, by two laser interferometer energy in Y-axis
The displacement measurement of Y-direction is enough realized, and can indirectly calculate the anglec of rotation (the circular general of Micro and nano manipulation platform
It is described below), so as to realize the displacement and angular surveying of space three-freedom, the office of existing detection device is overcome well
It is sex-limited, meet space multivariant linear displacement and fed back with the real-time measurement of angular displacement.Additionally, the simple in measurement system structure,
Certainty of measurement is high.
Specifically, as shown in figure 3, the optical module 6 includes the optical module base 601 being arranged on displacement platform 1,
It is provided with optical module base 601 and is configured to criss-cross four draw-in grooves, sheet glass 602 is provided with each draw-in groove,
Wherein, near two sheet glass 602 (the first sheet glass and the second sheet glass) face of first laser interferometer 1 in optical module 6
Reflective membrane is coated with to the one side of first laser interferometer 1, near two sheet glass 602 the (the 3rd of second laser interferometer 2
Sheet glass and the 4th sheet glass) it is coated with reflective membrane towards the one side of second laser interferometer 2.
Preferably, optical module can also including two fixed supports 603 on optical module base 601 and two
In the travel(l)ing rest 604 of X-direction movement, one of fixed support 603 is abutted near first laser interferometer 1 respectively
On two sheet glass (the first sheet glass and the second sheet glass), another fixed support 603 abuts in swash near second respectively
On two sheet glass (the 3rd sheet glass and the 4th sheet glass) of optical interferometer 2, one of travel(l)ing rest 604 is connected to respectively
On second sheet glass and the 3rd sheet glass, another travel(l)ing rest 604 is connected to the first sheet glass and the 4th sheet glass respectively
On, the cross section of fixed support 603 and travel(l)ing rest 604 is all in isosceles rectangular shaped.It is provided with the outer end of travel(l)ing rest 604
Bolt 605, is provided with the screwed hole coordinated with bolt 605 on optical module base 601, when bolt head is twisted, shank of bolt
Portion is connected on travel(l)ing rest 604, so that travel(l)ing rest 604 is slided in X direction, so as to corresponding sheet glass be fixed on accordingly
Travel(l)ing rest 603 and fixed support 604 between.
In this embodiment, first laser interferometer 1, second laser interferometer 2 are connected with the support of platform base 5 respectively.
The invention also discloses a kind of measuring method of Micro and nano manipulation platform Three Degree Of Freedom, it is comprised the following steps:
S1：The motion (as shown in Figure 4) of Micro and nano manipulation platform is resolved into displacement platform 4 along the translational motion of X-axis (as schemed
Shown in 5 (b)), the translational motion (as shown in Fig. 5 (c)) along Y-axis and the rotary motion around Platform center point are (such as Fig. 5 (d) institutes
Show), if displacement platform 4 is a along the translation distance of X-axis1, it is a along the translation distance of Y-axis2And around the anglec of rotation of Platform center point
It is θ to spend；
S2：The displacement X of the emergent ray of the first right angle optic portion is measured by imageing sensor1, draw the flat of X-axis
Shifting movement is apart from a1=X1/2；
Specifically, as shown in fig. 6, L0When not moved for displacement platform 4, the incident ray AB of the first right angle optic portion with
The distance between emergent ray CD；L1For displacement platform 4 along X-axis translational motion after, the incident ray of the first right angle optic portion
The distance between AE and emergent ray FG X1；a1It is the distance that displacement platform 4 is translated along X-axis, L1-L0=DG=2 × a1, therefore pass through
The distance of measurement emergent ray movement can obtain displacement a of the Micro and nano manipulation platform along X-axis1=X1/2。
When displacement platform 4 is moved along X-axis, the change of the optical path difference of Y-direction turns to 0, i.e., when being moved along X-axis, first laser
Interferometer 1 and second laser interferometer 2 export unchanged.
S3：The first optical path difference Y of Y-axis is measured by first laser interferometer 111；Y-axis is measured by second laser interferometer 2
Second optical path difference Y22, first laser interferometer 1 is calculated because displacement platform 4 is received along Y-axis translational motion by below equation
The optical path difference Y for arriving1, the optical path difference Y that is received around Platform center point rotary motion by displacement platform of first laser interferometer 12And edge
The translation distance a of Y-axis2(as shown in Figure 7)；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4:Described in being located in the rotary motion of Platform center point, as shown in figure 8, displacement platform 4 rotates preceding first right angle
The distance between first pip E of first right angle optic portion after first pip B and displacement platform 4 rotation of optic portion
Be m, displacement platform 4 rotate preceding first right angle optic portion the second pip C rotated with displacement platform 4 after the first right angle eyeglass
The distance between second partial pip F is n, then make α=m/n, and known L0For displacement platform 4 does not move preceding first right angle
The distance between the incident ray AB and emergent ray CD of optic portion (as shown in Figure 7), then calculate displacement by following formula
The anglec of rotation θ of platform 4：
When displacement platform 4a is moved along Y-axis, first laser interferometer 1 is received because of displacement platform 4a along Y-axis translational motion
The optical path difference Y for arriving1, the optical path difference Y that is received around Platform center point rotary motion by displacement platform of first laser interferometer 12And edge
The translation distance a of Y-axis2(as shown in Figure 8), then Y1、Y2And a2Meet following equation；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
Displacement platform 4b before and after the rotary motion of Platform center point, when the direction and constant position of incident ray AB,
The direction and position of emergent ray CD also do not change.
In fig. 8, K points make horizontal linear KN excessively, and the horizontal line for crossing extended line and K points excessively that F makees GF meets at point N.
(1) angle for setting the rotation of displacement platform 4 is θ, and when rotation angle θ is 0 °, incident ray is AB, and emergent ray is
CD, the incidence angle of incident ray is 45 °, and the angle of emergence of emergent ray CD is also 45 °, therefore EB//CG.
(2) when rotation angle θ is not 0 °, incident ray is AE, and emergent ray is FG, the incidence angle of incident ray for 45 °+
θ, now ∠ KEF=45 °-θ, in right angle Δ EKF, ∠ KEF=45 °-θ, ∠ EKF=90 ° can obtain ∠ EFK=45 °+θ.
In Fig. 8, ∠ FKN=45 °-θ, ∠ GHM=∠ EFK=45 °+θ, ∠ KFN=∠ GFM=45 °+θ.So ∠ KNF
=180 ° of-∠ FKN- ∠ KFN=90 °.The extended line FN//EB of GF is parallel, so GF//EB.
The distance of AB to CD is BC=L1.The distance of FG to EB is EG, ∠ GEF=90 °-∠ BEK- ∠ KEF=2 θ, and EG
It is vertical with GF, so EG=EF × cos2 θ, wherein
EF=EK/cos (45 ° of-θ),
BK=BC × cos45 °,
EG=L can be obtained1。
So CD is parallel with FG and distance of distance of CD to AB and FG to AB is equal, therefore straight line CD and straight line FG overlaps.
Optical path difference after displacement platform 4 rotates is：Y2=EF+FC-EB-BC.From geometric knowledge, △ EOB
≈ △ COF (two triangles with shade are similar i.e. in figure), if the likelihood ratio is
∠ GEF=2 × θ；
Equation below can be obtained by conditions above：
In Δ FJK,∠ BEK=45 °-θ, ∠ EKB=θ, are known by sine：
Equation (1) and (2) joint solve the anglec of rotation θ that can obtain Micro and nano manipulation platform.
These are only presently preferred embodiments of the present invention, be not intended to limit the invention, it is all it is of the invention spirit and
Within principle, any modification, equivalent substitution and improvements made etc. should be included within the scope of the present invention.
Claims (3)
1. a kind of measuring system of Micro and nano manipulation platform Three Degree Of Freedom, the Micro and nano manipulation platform includes platform base and is located at
Displacement platform on the platform base, it is characterised in that including：
First laser interferometer and second laser interferometer on first axle, in the launch hole of first laser interferometer
Heart axis is conllinear with the central axis of the launch hole of second laser interferometer；And
It is located on displacement platform and is configured to criss-cross optical module, the optical module includes corresponding with first laser interferometer
First right angle optic portion, the first right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and first laser
The incident ray of interferometer transmitting is with the incident ray through the first right angle minute surface of the first right angle optic portion and the second prism square
Emergent ray after the reflection of face is parallel, and optical module also includes the second right angle optic portion corresponding with second laser interferometer,
The second right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and the incident light that second laser interferometer is launched
Line is with the incident ray through the emergent ray after the first right angle minute surface and the second right angle mirror-reflection of the second right angle optic portion
It is parallel；And
Also include dividing in the light path of imageing sensor and the emergent ray being arranged on after being reflected through the first right angle optic portion
Light microscopic is vertical through the light splitting optical path of dichroic mirror and the photosurface of described image sensor.
2. measuring system as claimed in claim 1, it is characterised in that optical module includes the optics being arranged on displacement platform
Unitized substructure, is provided with optical module base and is configured to criss-cross four draw-in grooves, and glass is provided with each draw-in groove
Glass piece, wherein, two sheet glass near first laser interferometer form the first right angle optic portion, near second laser interference
Two sheet glass of instrument form the second right angle optic portion, wherein, two sheet glass near first laser interferometer are towards the
The one side of one laser interferometer is coated with reflective membrane, and two sheet glass near second laser interferometer are dry towards second laser
The one side of interferometer is coated with reflective membrane.
3. a kind of measuring method of Micro and nano manipulation platform Three Degree Of Freedom, it is characterised in that including：
S1：By the Kinematic Decomposition of displacement platform into the translational motion along first axle, along the second axis vertical with first axle
Translational motion and the rotary motion around Platform center point, if displacement platform along second axis translation distance be a1, along first
The translation distance of axis is a2And around Platform center point the anglec of rotation be θ；
S2：The displacement X of the emergent ray of the first right angle optic portion is measured by imageing sensor1, draw along second axis
Translational motion is apart from a1=X1/2；
S2：The first direction optical path difference Y on first axle is measured by first laser interferometer11；Measured by second laser interferometer
Second direction optical path difference Y on first axle22；First laser interferometer is calculated because displacement platform is along by below equation
The optical path difference Y that the motion of one axis translation is received1, first laser interferometer connects because of displacement platform around Platform center point rotary motion
The optical path difference Y for receiving2With the translation distance a along first axle2；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4:Described in being located in the rotary motion of Platform center point, the first of displacement platform rotation preceding first right angle optic portion
First reflection of the first right angle minute surface of the first right angle optic portion after first pip and the displacement platform rotation of right angle minute surface
The distance between point is m, the second pip of the second right angle minute surface of displacement platform rotation preceding first right angle optic portion and position
It is n to move the distance between second pip of the second right angle minute surface of the first right angle optic portion after platform rotates, then make α=m/
N, and known L0For displacement platform does not move the distance between incident ray and emergent ray of preceding first right angle optic portion, then
The anglec of rotation θ of displacement platform is calculated by following formula：
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| CN105180842A (en) * | 2015-05-26 | 2015-12-23 | 张白 | Novel optical arm amplified high-precision angle sensor and measurement method |
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