CN106770373A - A kind of detection method of surface flaw - Google Patents
A kind of detection method of surface flaw Download PDFInfo
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- CN106770373A CN106770373A CN201710080872.7A CN201710080872A CN106770373A CN 106770373 A CN106770373 A CN 106770373A CN 201710080872 A CN201710080872 A CN 201710080872A CN 106770373 A CN106770373 A CN 106770373A
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- light
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- incident light
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8822—Dark field detection
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- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
The invention discloses a kind of detection method of surface flaw, belong to detection technique field.It is used to solve existing beauty defects detection, there is a problem of in a short time obtaining high-resolution testing result.Including：Measured piece is arranged on articles holding table, when the first incident light scatters light by forming first after measured piece, the first image acquisition units directly over measured piece is arranged on and is obtained the first scattering light, and determine that measured piece irradiated area has defect according to the first scattering light；There will be defect region and be defined as the first tested block, the second incident light projects the first tested block by the second focus lamp, when the second incident light scatters light by forming second after the first tested block, by the light pipe being arranged on above articles holding table, into photodetector；Wherein, after measured piece is by the tested block of upper determination first, the first incident light stops the irradiation measured piece.
Description
Technical field
The invention belongs to detection technique field, more particularly to a kind of detection method of surface flaw.
Background technology
Due to the limitation of modern processing, precison optical component surface inevitably leaves respectively in process
Class defect, these defects refer to pit, cut, open bubble and the edge damage that optical element leaves after polishing on its surface
Deng.In actual applications, the defect that optical element surface is present, the light scattering for causing dissipates in some situations than other kinds of
Penetrate intensity much larger, energy absorption caused to element, it is harmful show off, the destruction of diffraction decorative pattern, film layer, damage from laser etc..
At present, the method that can carry out beauty defects detection is more, and common method has micrometering method and develops in recent years
Laser frequency spectrum method, coherent filtering imaging method, dark-field imaging method for getting up etc..Above-mentioned detection method, can reach inspection higher
Precision is surveyed, in actual applications, in order to obtain the high-resolution of detected member, is then needed for certain detected member, flower
Take the long time；If can obtain the beauty defects of detected member in a short time, the detection image for obtaining is necessarily
The relatively low situation of resolution ratio.
In sum, existing beauty defects detection, existing can not in a short time obtain high-resolution testing result
Problem.
The content of the invention
Shortcoming it is an object of the invention to overcome above-mentioned prior art, proposes a kind of detection method of surface flaw.It is used to
Existing beauty defects detection is solved, there is a problem of in a short time obtaining high-resolution testing result.
The embodiment of the present invention provides a kind of detection method of surface flaw, including：
Measured piece is arranged on articles holding table, from the measured piece into the first direction of the first angle to the measured piece
The first incident light is projected, when first incident light scatters light by forming first after the measured piece, the quilt is arranged on
The first image acquisition units surveyed directly over part obtain the first scattering light, and determine the quilt according to the described first scattering light
Survey part irradiated area and there is defect；
There will be defect region and be defined as the first tested block, the second incident light passes sequentially through chopper, beam-expanding system, first
Focus lamp, light path turnover component and the second focus lamp project the described first tested block, when second incident light is by described
Second is formed after first tested block and scatter light, by the light pipe being arranged on above the articles holding table, into photodetector；Its
In, after the measured piece is by the tested block of upper determination described first, first incident light stops the irradiation measured piece.
Preferably, the articles holding table can be moved.
Preferably, described first image collecting unit includes imaging len and CCD.
Preferably, first incident light is white light；
Second incident light is laser.
Preferably, second incident light is Gaussian beam before by the beam expanding lens.
Preferably, the focus into the second scattering light of the photosurface of the photodetector is Airy disk.
In the embodiment of the present invention, there is provided a kind of detection method of surface flaw, including：Measured piece is arranged on articles holding table
On, the first incident light is projected to the measured piece into the first direction of the first angle from the measured piece, enter when described first
Light is penetrated when the first scattering light is formed after the measured piece, the first image acquisition units directly over the measured piece are arranged on
The first scattering light is obtained, and determines that the measured piece irradiated area has defect according to the described first scattering light；To deposit
It is defined as the first tested block in defect region, the second incident light passes sequentially through chopper, beam-expanding system, the first focus lamp, light path
Turnover component and the second focus lamp project the described first tested block, when second incident light is by after the described first tested block
Form second and scatter light, by the light pipe being arranged on above the articles holding table, into photodetector；Wherein, in the quilt
After part is surveyed by the tested block of upper determination described first, first incident light stops the irradiation measured piece.In the above method, first adopt
Detection is scanned to measured piece with dark field imaging method, can quickly determine that measured piece surface has defect region, true
After determining beauty defects region, do not changing measured piece position on articles holding table, realized to beauty defects region by scattering method
Detection；In embodiments of the present invention, due to having suffered a convergent lens in the light path of scattering detection, by the second incident light by poly-
The spot diameter that the first tested block surface is irradiated to after collection mirror diminishes so that the hot spot of the second scattering light that detector is received is straight
Footpath is located on detector photosurface close to Airy disk, and focus, so as to reduce the veiling glare on detector photosurface, is carried
Certainty of measurement high.By the above method, can quickly determine that detected member surface is present during one-time detection
Defect region can realize the high precision test in defect region again.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
The accompanying drawing to be used needed for having technology description is briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, can be with
Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is a kind of detection method of surface flaw schematic flow sheet provided in an embodiment of the present invention；
Fig. 2A is surface defects detection system architecture front view provided in an embodiment of the present invention；
Fig. 2 B are surface defects detection system architecture left view provided in an embodiment of the present invention；
Fig. 3 A are BRDF measuring systems structural representation provided in an embodiment of the present invention；
Fig. 3 B are the second incident light provided in an embodiment of the present invention by the first tested block light path schematic diagram.
Specific embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.It is based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made
Embodiment, belongs to the scope of protection of the invention.
Fig. 1 is a kind of detection method of surface flaw schematic flow sheet provided in an embodiment of the present invention, as shown in figure 1, this hair
A kind of detection method of surface flaw that bright embodiment is provided mainly comprises the following steps：
Step 101, measured piece is arranged on articles holding table, from the measured piece into the first direction of the first angle to institute
State measured piece and project the first incident light, when first incident light scatters light by forming first after the measured piece, set
The first image acquisition units directly over the measured piece obtain the first scattering light, and true according to the described first scattering light
There is defect in the fixed measured piece irradiated area；
Step 102, there will be defect region and is defined as the first tested block, and the second incident light passes sequentially through chopper, expands
System, the first focus lamp, light path turnover component and the second focus lamp project the described first tested block, when second incident light
Light is scattered by forming second after the described first tested block, by the light pipe being arranged on above the articles holding table, into photoelectricity
Detector；Wherein, after the measured piece is by the tested block of upper determination described first, first incident light stops the irradiation quilt
Survey part.
Fig. 2A is surface defects detection system architecture front view provided in an embodiment of the present invention, is situated between below with reference to Fig. 2A
Continue step 101.
As shown in Figure 2 A, measured piece is arranged on articles holding table, and the first image acquisition units are arranged on measured piece and just go up
Side is, it is necessary to explanation, the region immediately below the first image acquisition units is the irradiation area of measured piece.In practical application
In, can be according to the specific requirement of measured piece, it would be desirable to which the region of detection is arranged on immediately below the first image acquisition units.
In embodiments of the present invention, the first incident light and measured piece are into the first angle, and are thrown from the first direction of measured piece
It is mapped on measured piece, after the first incident illumination is mapped to measured piece, the first scattering light and the first reflected light can be formed, first dissipates
The first image acquisition units that penetrating light can be arranged on directly over measured piece get, and the first reflected light then can be from measured piece
Second direction project.
It should be noted that the first angle formed between the first incident light and measured piece is respectively less than 90 degree, first direction
For on measured piece with the first incident light direction of illumination be in reverse direction, correspondingly, second direction is and first direction position phase
To direction, it is also possible to be defined as and the second scattering light direction of illumination identical direction.
Specifically, as shown in Figure 2 A, the first incident light is mapped to precison optical component surface so that incident angle α is oblique, when first
When incident illumination is mapped to the smooth surface area without defect, according to the reflection law of light, the first incident light can be with identical angle
Degree α forms the first reflected light from another side outgoing；And when the first incident illumination is mapped to defect surface, because defect is special
Localized micro structure, the first incident light will be scattered in a relatively wide angular range come.Defect can be regarded as one
Individual luminous secondary souce, the imaging len directly over irradiation area can collect the scattering light in certain pore size angular region,
And exclude outside the angular region of aperture the reflection light of smooth surface, thus can (English be in CCD：Charge-
Coupled Device, Chinese is referred to as：Charge coupled cell) photosurface on obtain the picture of defect.Due to there was only dissipating for defect
The photosensitive surface that luminous energy reaches CCD by imaging len is penetrated, and the reflected light of the smooth surface around defect can not be reached, so
The image obtained on CCD is the bright picture of defect under dark background.If on optical surfaces in the areas imaging of CCD imaging lens
Without defect, then no light can be into imaging len, then the image for obtaining is a piece of uniform dark background.Measured by CCD
The light energy value of different directions around defect, just can obtain the distribution situation of the scattered energy of defect.
It should be noted that in embodiments of the present invention, the first incident light is white light.
It should be noted that the second shown in fig. 2 incident light and get along well the first incident light simultaneously incide precise light
Element surface is learned, is to illustrate the first incident light and second while there is the first incident light and the second incident light in the figure
Incident light can from different directions incide precison optical component surface.
In embodiments of the present invention, in order to be able to the quick precision for determining measured piece defect domain of the existence and determining defect,
Defect accuracy detection can be carried out on the premise of it is determined that surface has defect.
It should be noted that in surface defects detection system provided in an embodiment of the present invention, articles holding table can be along any
Direction is moved, and articles holding table is adjustable and controllable in the displacement of all directions.For example, when it is determined that measured piece is present
After defect region, can be according to the distance between the first incident light and the second incident light, it is determined that setting the articles holding table of measured piece
Moving direction and displacement, with ensure it is mobile after measured piece there is the irradiated region that defect region is the second incident light
Domain.
Fig. 2 B are surface defects detection system architecture left view provided in an embodiment of the present invention, and Fig. 3 A are the embodiment of the present invention
(English is the BRDF of offer：Bidirectional Reflectance Distribution Function, Chinese is referred to as：It is double
To Reflectance Distribution Function) measuring system structural representation, Fig. 3 B are that the second incident light provided in an embodiment of the present invention passes through first
Tested block light path schematic diagram.Below in conjunction with Fig. 2 B, Fig. 3 A and Fig. 3 B, step 102 is specifically introduced.
In a step 102, be there is into defect region in measured piece and be defined as the first tested block, and the first of measured piece is tested
Block is placed into the second incident light irradiation area.In embodiments of the present invention, to the moving method and displacement of articles holding table not
Do specific restriction.
As shown in Figure 2 B, the second incident light is projected by the first tested block, can be received in the top of the first tested block
To the second scattering light.Wherein, just the first incident illumination is mapped to behind defect region dissipating of obtaining to the first scattering shown in Fig. 2 B
Light is penetrated, just the second incident illumination is mapped to the scattering light obtained after the first tested block for the second scattering, due to the first incident light and the
Two incident lights do not irradiate measured piece at the same time, i.e., after the first tested block is determined on measured piece, will not be same on the first tested block
When scatter the first scattering light and second scattering light.
As shown in Figure 3A, the second incident light from laser 1 passes sequentially through chopper 2, beam expanding lens 3, the first focus lamp
4, the light path turnover focus lamp 6 of component 5 and second is irradiated to articles holding table 7, herein, the measured piece set on articles holding table, and it is tested
The tested block of the first of part is located exactly at the light area of the second incident light.
In actual applications, the second unpolarized light beam of the outgoing of laser 1 chopping modulation of device 2 chopped first.Second enters
After light is penetrated through the beam-expanding collimation of beam expanding lens 3, focused on through the first condenser lens 4, through light beam steering component 5 after, it is incident at a certain angle
To measured piece surface, after being reflected by measured piece surface second scatters light sequentially passes through diaphragm 8, and light pipe 9 enters into light
On the photosurface of electric explorer 10.
It should be noted that the wavelength of the second incident light can be 532nm, can be 635nm, or 650nm,
In the embodiment of the present invention, the wavelength to the second incident light does not do specific restriction.
It should be noted that in actual applications, due to measured piece be can on precision optics surface, and precision optics surface
Can there are multiple defect regions.In order to distinguish the multiple defect regions on measured piece, it is preferable that will be true for the first time on measured piece
Surely there is defect region and be named as the first tested block, second determination has defect region and be named as the second tested block, third time
It is determined that there is defect region is named as the 3rd tested block, in embodiments of the present invention, to defect number of regions present on measured piece
Amount is not limited, meanwhile, the quantity of the tested block to being named on measured piece is not also limited.
In actual applications, because the second light intensity of incident light is distributed as Gaussian beam, with certain angle of divergence, and hot spot
Diameter is smaller, and in order to improve measuring speed, spot diameter needs to reach certain numerical value.In embodiments of the present invention, can be by
Beam expanding lens is changed to beam-expanding system, beam-expanding system be actually one kind without burnt inverted telescope system, Kepler looks in the distance the expansion of form
Similar to spatial filter structure, after beam expanding lens, beam divergence angle reduces light beam beam mirror structure, and beam diameter becomes big, and
The space filtering effect of beam expanding lens has filtered the high frequency veiling glare in light beam, makes light beam light distribution more uniform.
In actual applications, the second incident illumination after component of being transferred by light path is mapped to the first tested block surface
When, the second incident light can be scattered to all directions, and detector 10 will receive the smaller scattering light of scope.In this hair
In bright embodiment, in order that obtaining detector 10 can receive scattering light on a large scale, can in the optical path increase an aggregation
Lens, i.e. the second convergent lens, then the second incident light the first tested block surface, the first tested block are irradiated to after the second focus lamp
Surface hot spot reduces so that the spot diameter for surveying the reception of detector 10 is approximately Airy disk, and focus then positioned at detector 10
On photosurface, as shown in Figure 3 B, the light path shown in the first light, detector 10 will receive the scattering light of α range sizes.Can be with
Find out α≤β, after using condenser lens, convergent lens reduces the space multistory angular region that detector receives scattering light
, reduce veiling glare and enter detector, and beam divergence angle is reduced, effectively increase certainty of measurement.
In embodiments of the present invention, after the second incident light reflects by the first tested block, the entrance of the second scattering light is become
Onto the photosurface of detector 10.Due to the processing method and existing skill of the optical signal that the embodiment of the present invention is received to detector
The processing method of the optical signal that detector is received is identical in art, repeats no more again.
In sum, a kind of detection method of surface flaw is the embodiment of the invention provides, due to the light path in scattering detection
A convergent lens is suffered, the second incident light has been diminished by being irradiated to the spot diameter on the first tested block surface after condensing lens,
So that the second spot diameter for scattering light that detector is received is located on detector photosurface close to Airy disk, and focus, from
And the veiling glare on detector photosurface is reduced, improve certainty of measurement.By the above method, can be in one-time detection
During, i.e., can quickly determine that detected member surface has defect region and can realize the high precision test in defect region again,
Existing beauty defects detection is solved, there is a problem of in a short time obtaining high-resolution testing result.
, but those skilled in the art once know basic creation although preferred embodiments of the present invention have been described
Property concept, then can make other change and modification to these embodiments.So, appended claims are intended to be construed to include excellent
Select embodiment and fall into having altered and changing for the scope of the invention.
Obviously, those skilled in the art can carry out various changes and modification without deviating from essence of the invention to the present invention
God and scope.So, if these modifications of the invention and modification belong to the scope of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to comprising these changes and modification.
Claims (6)
1. a kind of detection method of surface flaw, it is characterised in that including：
Measured piece is arranged on articles holding table, is projected to the measured piece into the first direction of the first angle from the measured piece
First incident light, when first incident light scatters light by forming first after the measured piece, is arranged on the measured piece
First image acquisition units of surface obtain the first scattering light, and determine the measured piece according to the described first scattering light
There is defect in irradiated area；
There will be defect region and be defined as the first tested block, the second incident light passes sequentially through chopper, beam-expanding system, the first focusing
Mirror, light path turnover component and the second focus lamp project the described first tested block, when second incident light passes through described first
Second is formed after tested block and scatter light, by the light pipe being arranged on above the articles holding table, into photodetector；Wherein,
After the measured piece is by the tested block of upper determination described first, first incident light stops the irradiation measured piece.
2. the method for claim 1, it is characterised in that the articles holding table can be moved.
3. the method for claim 1, it is characterised in that described first image collecting unit includes imaging len and CCD.
4. the method for claim 1, it is characterised in that first incident light is white light；Second incident light is
Laser.
5. the method for claim 1, it is characterised in that second incident light was before by the beam expanding lens
Gaussian beam.
6. the method for claim 1, it is characterised in that enter the photosurface of the photodetector described second dissipates
The focus for penetrating light is Airy disk.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710080872.7A CN106770373A (en) | 2017-02-08 | 2017-02-08 | A kind of detection method of surface flaw |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710080872.7A CN106770373A (en) | 2017-02-08 | 2017-02-08 | A kind of detection method of surface flaw |
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| CN201710080872.7A Pending CN106770373A (en) | 2017-02-08 | 2017-02-08 | A kind of detection method of surface flaw |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108827981A (en) * | 2018-06-27 | 2018-11-16 | 西安工业大学 | The detection system and its measurement method of ultra-smooth optical element surface defect type |
| CN109297987A (en) * | 2018-11-05 | 2019-02-01 | 西安工业大学 | High reflective mirror surface scattering multi-parameter distribution characterization measuring device and measuring method |
| CN110006924A (en) * | 2019-04-18 | 2019-07-12 | 西安工业大学 | A kind of detection method of optical element surface tiny flaw two-dimensional silhouette |
| CN110849900A (en) * | 2018-08-21 | 2020-02-28 | 深圳中科飞测科技有限公司 | Wafer defect detection system and method |
| WO2020051779A1 (en) * | 2018-09-11 | 2020-03-19 | 合刃科技（深圳）有限公司 | Defect detection method and detection system for curved surface object |
| CN118149725A (en) * | 2024-03-14 | 2024-06-07 | 北京京瀚禹电子工程技术有限公司 | Device pin detection system |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108827981A (en) * | 2018-06-27 | 2018-11-16 | 西安工业大学 | The detection system and its measurement method of ultra-smooth optical element surface defect type |
| CN110849900A (en) * | 2018-08-21 | 2020-02-28 | 深圳中科飞测科技有限公司 | Wafer defect detection system and method |
| WO2020051779A1 (en) * | 2018-09-11 | 2020-03-19 | 合刃科技（深圳）有限公司 | Defect detection method and detection system for curved surface object |
| CN109297987A (en) * | 2018-11-05 | 2019-02-01 | 西安工业大学 | High reflective mirror surface scattering multi-parameter distribution characterization measuring device and measuring method |
| CN110006924A (en) * | 2019-04-18 | 2019-07-12 | 西安工业大学 | A kind of detection method of optical element surface tiny flaw two-dimensional silhouette |
| CN118149725A (en) * | 2024-03-14 | 2024-06-07 | 北京京瀚禹电子工程技术有限公司 | Device pin detection system |
| CN118149725B (en) * | 2024-03-14 | 2024-09-10 | 北京京瀚禹电子工程技术有限公司 | Device pin detection system |
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Application publication date: 20170531 |