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CN106683904A - Preparation method for high-nitrogen-boron-doped three-dimensional graphene thin film used for flexible lithium ion hybrid capacitor - Google Patents

Preparation method for high-nitrogen-boron-doped three-dimensional graphene thin film used for flexible lithium ion hybrid capacitor Download PDF

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CN106683904A
CN106683904A CN201611014462.4A CN201611014462A CN106683904A CN 106683904 A CN106683904 A CN 106683904A CN 201611014462 A CN201611014462 A CN 201611014462A CN 106683904 A CN106683904 A CN 106683904A
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solution
graphene
defect
thin film
dimensional grapheme
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CN106683904B (en
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王恭凯
王振昆
王新
彭会芬
张昕
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Hebei University of Technology
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • H01G11/86Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/30Electrodes characterised by their material
    • H01G11/32Carbon-based
    • H01G11/36Nanostructures, e.g. nanofibres, nanotubes or fullerenes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/30Electrodes characterised by their material
    • H01G11/50Electrodes characterised by their material specially adapted for lithium-ion capacitors, e.g. for lithium-doping or for intercalation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13Energy storage using capacitors

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
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  • Crystallography & Structural Chemistry (AREA)
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Abstract

The invention discloses a preparation method for a high-nitrogen-boron-doped three-dimensional graphene thin film used for a flexible lithium ion hybrid capacitor. The preparation method comprises the following steps of mixing a graphite oxide solution and an acid based on proportion, washing and then performing lamination peeling, then mixing with a reducing agent solution, and heating for 1-12h to obtain a three-dimensional graphene block material; mixing the three-dimensional graphene block material with a nitrogen-boron compound water solution, heating at a temperature of 50-150 DEG C for 3-12h to obtain a graphene block material; and taking the material out and washing, and pressing at 5-40MPa, and then drying to finally obtain the high-nitrogen-boron-doped three-dimensional graphene thin film with thickness of 0.01-0.1mm. B adoption of the preparation method, the doping amount of N and B on the graphene structure can be greatly improved; and meanwhile, the graphene flexible three-dimensional structure is maintained, so that the negative electrode rate capability and the energy storage performance of the lithium ion hybrid capacitor are improved.

Description

A kind of flexible lithium ion mixed capacitor high nitrogen boron doping three-dimensional grapheme thin film Preparation method
Technical field
The three-dimensional grapheme thin film the present invention relates to a kind of high nitrogen boron of flexible lithium ion mixed capacitor negative material adulterates Preparation method, belong to field of new material preparation.
Background technology
Ultracapacitor has the advantages that power density is high, has extended cycle life as a kind of model electrochemical energy-storage units, Extensive promotion and application are obtained in fields such as portable electric appts, stand-by power supply and electric automobiles.With consumption electricity , towards the development of high integration, the research of flexible super capacitor energy storage technology is also like a raging fire, and achieves numerous for sub- product Break through, obtain the extensive concern of researcher.
Due to the energy density that symmetric form ultracapacitor is limited, for the research of lithium ion hybrid super capacitor becomes In burning hot.Wherein for negative material, there are multiple choices, the such as titanium oxide (TiO of nanostructured2, Li4Ti5O12Deng), other Metal-oxide, graphite etc., respectively there is excellent summary.Titanium oxide (the TiO of nanostructured2, Li4Ti5O12Deng) have prepare it is simple, can The advantages such as large-scale production, environmental friendliness, quick lithium ion intercalation speed, but its of a relatively high reaction potential (> 1.5V vs Li/Li+) cause plenary capacitance system running voltage low, cause unnecessary energy density to lose, this is that it is obtained To the biggest obstacle further applied;The fake capacitance storage electric charge produced using metal oxide surface redox reaction, compared with The lithium ion intercalation of diffusion control has higher reaction rate, it will be appreciated, however, that due to the electricity of metal-oxide Conductance is extremely low, has a strong impact on itself chemical property, compound with the material with carbon element of high conductivity as needing during active material, ability Improve electro-chemical activity;In addition, graphite is at present using most successful lithium ion battery negative material, with of a relatively high electricity Conductance, low cost, low (the 0.1V vs Li/Li of voltage platform+), the advantages of suitable theoretical capacity, but its is relatively low Lithium ion diffusibility have impact on the high rate performance of lithium ion battery.Meanwhile, existing negative material is difficult to meet flexible lithium ion The requirement of hybrid super capacitor.
Used as a kind of brand-new material, Graphene (Graphene) has high conductivity, high-specific surface area~2630m2/ g, height Carrier transport rate~200000cm2The excellent performances such as/Vs, wide electrochemical window.Therefore, Graphene is for negative pole material The selection of material embodies irreplaceable advantage.Graphene powder material in actual application, due to the suction of Van der Waals force Draw, Graphene is easy to reunite, affect its corresponding performance.Graphene powder is assembled into into flexible 3 D thin film, both may be used The performance for keeping Graphene itself excellent, can meet requirement of the flexible energy storage device to electrode material again.Although three-dimensional grapheme Thin film has higher lithium ion transport ability relative to other materials, if further improving the biography of lithium ion by a kind of method Conductance, then can greatly improve the high rate performance of battery.In addition, (fast charging and discharging) at higher current densities is had proven at present, Graphenic surface redox reaction is favourable for lithium ion battery high-power output performance, and chemical doping is for adjusting function One of most effective approach of material electrochemical performance, compared to unadulterated Graphene, nitrogen-doped graphene possesses more work Property region, be so more beneficial for the generation of the embedding lithium on its surface/de- lithium;In boron doped graphene, due to boron atom ratio carbon atom The few electronics of outer layer, in p-type doping, compares Graphene and has more preferable energy-storage property, and Boron contents are higher, its electrochemistry Can be better.There is now pertinent literature and report and adulterate to improve the chemical property of Graphene using heterogeneous element N, B, improve lithium from The energy-storage property of sub- battery, but at present, the doping of heterogeneous element N, B is but to limit its master for further optimizing energy-storage property Want factor.At present N, B doped graphene synthetic method is more, such as chemical vapor deposition (CVD) method, plasma discharge method, electric arc Electric discharge etc., and these methods have the problems such as preparation condition is harsh, doping is low, production cost is high.Therefore, in preparation technology Simply, the doping that heterogeneous element N, B how are improved on the premise of low production cost is that the mixing of graphene-based flexible lithium ion is super Level one new research direction of capacitor area.In view of this, in the case where three-dimensional grapheme film microstructure is not changed, It is necessary further to improve graphene film heterogeneous element N, B doping by a kind of method, to reach its electrochemistry is improved The purpose of energy, while being capable of achieving large-scale production, this will produce material impact in electrochemical energy storage field and wide application will be front Scape.
The content of the invention
The purpose of the present invention be easily reunite for graphene powder present in current technology, lithium ion conductivity is low, make High rate performance for flexible lithium ion mixed type super capacitor anode is low, and heterogeneous element N, B doping is low, and flexible lithium from A kind of the problems such as sub- mixed type super capacitor anode high rate performance and not high energy-storage property, there is provided flexible lithium ion mixing electric capacity Device with high nitrogen boron adulterate three-dimensional grapheme thin film preparation method.The method is by regulating and controlling graphene oxide defect, assemble in situ Into graphene three-dimensional structure, and doping and thin film post-treating and other steps after N, B heterogeneous element, obtain flexible lithium ion mixed type Super capacitor anode material high nitrogen boron doping three-dimensional grapheme thin film, regulates and controls simultaneously, according to scarce in three-dimensional grapheme defect Doping N/B is fallen into, N/B dopings are improved, to reach the purpose for improving capacity and high rate performance.The present invention can increase substantially graphite The doping of N, B in alkene structure, while keeping Graphene flexible 3 D structure, to reach lithium ion hybrid super electric capacity is improved The purpose of device negative pole high rate performance and energy-storage property.
The technical scheme is that:
A kind of flexible lithium ion mixed capacitor is adulterated the preparation method of three-dimensional grapheme thin film with high nitrogen boron, including following Step:
(1) preparation of rich defect graphite oxide solution:Graphite oxide solution is mixed in proportion with acid, at 50-150 DEG C Heating 2-8h, is obtained the graphite oxide solution of structure richness defect;Be centrifuged washing again, until obtain pH value=7, Concentration is the graphite oxide solution of the structure richness defect of 0.5-20mg/mL;
Wherein, the concentration of graphite oxide is 0.5-30mg/mL;The mass percentage concentration of acid is 10%-90%;Volume ratio is Graphite oxide solution:Acid=15:1-5:1;
(2) preparation of rich defect graphene oxide solution:The graphite oxide solution of the structure for obtaining richness defect is carried out into piece Layer is peeled off, and obtains structure richness defect graphene oxide solution;The concentration of structure richness defect graphene oxide solution is 0.5-20mg/ mL;
(3) preparation of rich defect three-dimensional grapheme block materials:By structure richness defect graphene oxide solution and reducing agent Solution mixes, and heats 1-12h at 50-150 DEG C, it is scrubbed after, obtain rich defect three-dimensional grapheme block materials;
Wherein, volume ratio graphene oxide solution:Reductant solution=20:1-5:1;The concentration of reductant solution is 0.1- 10mol/L;
(4) preparation of high nitrogen boron doping three-dimensional grapheme thin film:By rich defect three-dimensional grapheme block materials and nitrogen boronation The aqueous solution of compound, at 50-150 DEG C 3-12h is heated, the high nitrogen boron doped graphene block materials for obtaining, after taking-up It is scrubbed, suppress under 5-40MPa, then after drying is processed, finally give the thick high nitrogen boron doping of 0.01mm-0.1mm three-dimensional Graphene film;Wherein, mass ratio is three-dimensional grapheme block materials:Nitrogen boron compound aqueous solution=0.5:1-10:1;
It is 0.001%-1% that the concentration of the aqueous solution of described nitrogen boron compound is mass percent.
Acid-specific in described step (1) is hydrogen peroxide, sulphuric acid, nitric acid or phosphoric acid.
In described step (2), structure richness defect graphene oxide is few layer graphite oxide, and the graphene oxide number of plies is 1- 10 layers.
Lift-off technology in described step (2) is that the shearing machine in solution is peeled off or ultrasonication stripping means.
Reducing agent is preferably ascorbic acid, sodium ascorbate or hydrazine hydrate in described step (3).
In described step (4), nitrogen boron compound is preferably NH3BF3、C6H8BNO2, or NH4B(OH)4
In described step (1), defect refers mainly to the carbon room in graphene film Rotating fields;Graphite oxide solution is with stone Powdered ink body is raw material, according to graphite oxide solution obtained in traditional or improved Hummers methods, or for commercially available oxygen Graphite solution.
In described step (3), Graphene block materials are the Graphene that graphene oxide becomes after reduction, due to Van der Waals force attracts, and forms the Graphene macroscopic view block materials of the loose structure of self assembly.
Beneficial effects of the present invention are:
The problem that the present invention easily reunites for graphene powder, is assembled into three-dimensional block materials, both by Graphene first Prevent Graphene to reunite, the excellent performance of Graphene is maintained again.Meanwhile, it is on this basis different using defect control technique Prime element provides more rooms, and so as to prepare high nitrogen boron element doped graphene, both technologies combine the highly doped of gained Graphene has higher electrical conductivity and electro-chemical activity.Compare simple doping N, B heterogeneous element material, it is of the invention then in this base On plinth, two kinds of technologies are combined, i.e., fill up vacancy defect using heterogeneous element N, B, the presence in room is remarkably improved Graphene N, B doping, therefore can improve lithium ion storage capacity and the high rate performance as negative material, energy density and circulation longevity Life.Finally, highly doped three-dimensional grapheme block is pressed into by flexible thin-film material by post processing, can be mixed as flexible lithium ion Close capacitor anode to use, under the electric current density of 1A/g, its specific discharge capacity can reach 1000mAh/g, will be above report at present The utilization Graphene hydrogel in road make lithium ion battery negative specific discharge capacity (under the electric current density of 1A/g, its specific capacity Reach 500-600mAh/g), the requirement of following high-performance flexible lithium-ion mixture super capacitor device can be met, with important Theoretical and practical significance.
Description of the drawings
The specific embodiment of the present invention is described in further detail below in conjunction with the accompanying drawings.
Fig. 1 is the photomacrograph of the high nitrogen boron doping three-dimensional grapheme thin film in embodiment 3.
Fig. 2 is the XPS collection of illustrative plates of the high nitrogen boron doping three-dimensional grapheme thin film in embodiment 3.
Fig. 3 is the SEM figures of the high nitrogen boron doping three-dimensional grapheme thin film in embodiment 3.
Fig. 4 is that the high nitrogen boron doping three-dimensional grapheme thin film in embodiment 3 makees flexible lithium ion hybrid super capacitor The high rate performance curve of negative pole.
Specific embodiment
The present invention is further described to combine preferred implementation below against accompanying drawing.
The preparation method of three-dimensional grapheme thin film the invention provides a kind of high nitrogen boron adulterates, including:(1) rich defect oxidation The preparation of graphite solution:By certain density graphite oxide solution, according to a certain volume example uniformly mixes with certain density acid, At a certain temperature heating a period of time, the graphite oxide solution that structure has abundant defect is obtained.By the graphite oxide for obtaining Solution is washed, and to remove impurity element in solution, finally obtains the graphite oxide solution of the structure richness defect of pH value of solution=7; In step (1), described defect refers mainly to the carbon room in graphene film Rotating fields;Graphite oxide solution is to be with graphite composite powder Raw material, it is according to graphite oxide solution obtained in traditional or improved Hummers methods or molten for commercially available graphite oxide Liquid;The concentration range of graphite oxide is 0.5-30mg/mL;The mass percentage concentration scope (solute concentration) of acid is 10%-90%; Graphite oxide solution is 15 with the volume range of acid:1-5:1.Heating temperature range is 50-150 DEG C;Heat time heating time, scope was 2-8h.(2) preparation of rich defect graphene oxide solution:The structure for obtaining richness defect graphite oxide solution is carried out into lamella stripping From to obtain structure richness defect graphene oxide solution;In step (2), the graphene oxide of structure richness defect is few layer oxygen Graphite, the graphene oxide number of plies is 1-10 layers;Lift-off technology can be that the shearing machine in solution is peeled off or ultrasonication is peeled off Method.(3) preparation of rich defect three-dimensional grapheme block materials:By certain density structure richness defect graphene oxide solution with Reducing agent uniformly mixes according to a certain volume, under the conditions of uniform temperature heating a period of time, it is scrubbed after, obtain rich defect three Dimension Graphene block materials;In step (3), Graphene block materials become Graphene for graphene oxide after reduction, Because Van der Waals force attracts, the Graphene macroscopic view block materials of the loose structure of self assembly are formed;Graphene oxide concentration range For 0.5-20mg/mL;Reducing agent is the compound with reducing power, preferably ascorbic acid, sodium ascorbate, hydrazine hydrate; The concentration of reductant solution is 0.1-10mol/L;Graphene oxide solution is 20 with the volume range of reducing agent:1-5:1;Plus Hot temperature range is 50-150 DEG C;Heat time heating time, scope was 1-12h.(4) preparation of high nitrogen boron doping three-dimensional grapheme thin film:Press According to certain mass than by three-dimensional grapheme block materials and at least containing a kind of aqueous solution of nitrogen boron compound, in a constant temperature Degree lower heating a period of time, the Graphene block materials for obtaining are taken out, it is scrubbed, suppress under a certain pressure, then drying After process, high nitrogen boron doping three-dimensional grapheme thin film is finally given;In step (4), nitrogen boron compound is preferably NH3BF3、 C6H8BNO2、NH4B(OH)4;Heating temperature range is 50-150 DEG C;Heat time heating time, scope was 3-12h.Pressing pressure scope is 5- 40MPa;Thin film is the stratified material with 0.01mm-0.1mm thickness that block materials are formed through compacting;It is three-dimensional usually grand See three dimensional structure.
For a better understanding of the present invention, describe the present invention below in conjunction with specific embodiment, but should recognize It is that the present invention is illustrated to know these embodiments, and the unrestricted present invention.Compound used in following examples Or reagent is commercially available, or can be prepared by conventional method well known by persons skilled in the art;The experiment for being used Instrument can be buied by commercial sources.
Embodiment 1:Graphite oxide solution (graphite oxide solution, the following examples obtained in Hummers methods of 2mg/mL 1h is peeled off in ultrasonication together), and ultrasonic power is 500W, centrifugation, and rotating speed 4000rpm, centrifugation time 30min take upper liquid Body, obtains the graphene oxide solution of 2mg/mL;The graphene oxide solution of the 2mg/mL for obtaining, the Vitamin C with 1mol/L Sour sodium reduction agent is with 10:1 uniform mixing, heats 2h at 100 DEG C, it is scrubbed after, obtain three-dimensional grapheme block materials;To obtain Graphene block materials take out, it is scrubbed, under 5MPa pressure suppress, then drying process after, finally give thickness and be about The three-dimensional grapheme thin film of 0.04mm.
Embodiment 2:1h is peeled off in the graphite oxide solution ultrasonication of 2mg/mL, and ultrasonic power is 500W, and centrifugation turns Fast 4000rpm, centrifugation time 30min, takes supernatant liquid, obtains the graphene oxide solution of 2mg/mL;The 2mg/mL for obtaining Graphene oxide solution, with the sodium ascorbate reducing agent of 1mol/L with 10:1 uniform mixing, at 100 DEG C 2h is heated, and Jing is washed After washing, three-dimensional grapheme block materials are obtained;It is 0.47% by the three-dimensional grapheme block materials of acquirement and mass percent NH3BF3Aqueous solution is with 5:4 mass ratio mixing, at 100 DEG C 4h is heated, and the Graphene block materials for obtaining are taken out, and Jing is washed Wash, suppress under 5MPa pressure, then after drying is processed, finally give the nitrogen boron doping three-dimensional grapheme that thickness is about 0.04mm Thin film.
Embodiment 3:The graphite oxide solution of 2mg/mL and the H that mass percent is 30%2O2Solution is with 10:1 volume ratio is equal Even mixing, heats 4h under 100 DEG C of environment, and, finally obtains the knot of pH value of solution=7 with 10000rpm rotating speeds centrifuge washing repeatedly The graphite oxide solution (the graphite oxide solution concentration for obtaining structure richness defect is 2mg/mL) of structure richness defect, by the structure for obtaining 1h is peeled off in the ultrasonication in the case where ultrasonic power is 500W of the graphite oxide solution of rich defect, is then centrifuged for separating, rotating speed 4000rpm, centrifugation time 30min, takes supernatant liquid, obtains the graphene oxide solution of rich defect of 2mg/mL (in solution Structure richness defect graphene oxide is few layer graphite oxide, and the graphene oxide number of plies is 1-10 layers.Following examples are same);Obtain The graphene oxide solution of the rich defect of the 2mg/mL for arriving, with the sodium ascorbate reducing agent of 1mol/L with volume ratio 10:1 is uniform Mixing, 100 DEG C heat 2h, it is scrubbed after, obtain rich defect three-dimensional grapheme block materials;By the rich defect three-dimensional stone for obtaining Black alkene block materials and the NH that mass percent is 0.47%3BF3Aqueous solution is with 5:4 mass ratio mixing, heats at 100 DEG C 4h, the Graphene block materials for obtaining are taken out, scrubbed, are suppressed under 5MPa pressure, then after drying is processed, are finally given Thickness is about the high nitrogen boron doping three-dimensional grapheme thin film of 0.04mm.
Embodiment 4:The graphite oxide solution of 2mg/mL and the H that mass percent is 30%2O2Solution is with 15:1 volume ratio is equal Even mixing, heats 4h under 100 DEG C of environment, and, finally obtains the knot of pH value of solution=7 with 10000rpm rotating speeds centrifuge washing repeatedly The graphite oxide solution (the graphite oxide solution concentration for obtaining is 2mg/mL) of structure richness defect;By the oxygen of the structure for obtaining richness defect 1h is peeled off in the ultrasonication in the case where ultrasonic power is 500W of graphite solution, is then centrifuged for separating, rotating speed 4000rpm, centrifugation time 30min, takes supernatant liquid, obtains the graphene oxide solution of the rich defect of 2mg/mL;The rich defect of the 2mg/mL for obtaining Graphene oxide solution, with the sodium ascorbate reducing agent of 1mol/L with 10:1 volume ratio uniformly mixes, in 100 DEG C of heating 2h, it is scrubbed after, obtain rich defect three-dimensional grapheme block materials;By the rich defect three-dimensional grapheme block materials for obtaining and matter Amount percentage ratio is 0.47% NH3BF3Aqueous solution is with 5:4 mass ratio mixing, heats 4h, by the Graphene for obtaining at 100 DEG C Block materials take out, scrubbed, suppress under 5MPa pressure, then after drying is processed, finally give thickness and be about 0.04mm's High nitrogen boron doping three-dimensional grapheme thin film.
Embodiment 5:The graphite oxide solution of 2mg/mL and the H that mass percent is 30%2O2Solution is with 10:1 volume ratio is equal Even mixing, heats 4h under 100 DEG C of environment, and, finally obtains the knot of pH value of solution=7 with 10000rpm rotating speeds centrifuge washing repeatedly The graphite oxide solution (the graphite oxide solution concentration for obtaining is 2mg/mL) of structure richness defect;By the oxygen of the structure for obtaining richness defect 1h is peeled off in the ultrasonication in the case where ultrasonic power is 500W of graphite solution, is then centrifuged for separating, rotating speed 4000rpm, centrifugation time 30min, takes supernatant liquid, obtains the graphene oxide solution of the rich defect of 2mg/mL;The rich defect of the 2mg/mL for obtaining Graphene oxide solution, with the sodium ascorbate reducing agent of 1mol/L with 10:1 volume ratio uniformly mixes, in 100 DEG C of heating 2h, it is scrubbed after, obtain rich defect three-dimensional grapheme block materials;By the rich defect three-dimensional grapheme block materials for obtaining and matter Amount percentage ratio is 0.47% NH3BF3Aqueous solution is with 5:4 mass ratio mixing, heats 4h, by the Graphene for obtaining at 70 DEG C Block materials take out, scrubbed, suppress under 5MPa pressure, then after drying is processed, finally give thickness and be about 0.04mm's High nitrogen boron doping three-dimensional grapheme thin film.
Embodiment 6:The graphite oxide solution of 2mg/mL and the H that mass percent is 30%2O2Solution is with 10:1 volume ratio is equal Even mixing, heats 4h under 100 DEG C of environment, and, finally obtains the knot of pH value of solution=7 with 10000rpm rotating speeds centrifuge washing repeatedly The graphite oxide solution (the graphite oxide solution concentration for obtaining is 2mg/mL) of structure richness defect;By the oxygen of the structure for obtaining richness defect 1h is peeled off in the ultrasonication in the case where ultrasonic power is 500W of graphite solution, is then centrifuged for separating, rotating speed 4000rpm, centrifugation time 30min, takes supernatant liquid, obtains the graphene oxide solution of the rich defect of 2mg/mL;The rich defect of the 2mg/mL for obtaining Graphene oxide solution, with the sodium ascorbate reducing agent of 1mol/L with 10:1 volume ratio uniformly mixes, in 100 DEG C of heating 2h, it is scrubbed after, obtain rich defect three-dimensional grapheme block materials;By the rich defect three-dimensional grapheme block materials for obtaining and matter Amount percentage ratio is 0.47% C6H8BNO2Aqueous solution is with 5:4 mass ratio mixing, heats 4h, by the graphite for obtaining at 120 DEG C Alkene block materials take out, scrubbed, suppress under 5MPa pressure, then after drying is processed, finally give thickness and be about 0.04mm High nitrogen boron doping three-dimensional grapheme thin film.
Embodiment 7:The graphite oxide solution of 2mg/mL and the H that mass percent is 30%2O2Solution is with 10:1 volume ratio is equal Even mixing, heats 4h under 100 DEG C of environment, and, finally obtains the knot of pH value of solution=7 with 10000rpm rotating speeds centrifuge washing repeatedly The graphite oxide solution (the graphite oxide solution concentration for obtaining is 2mg/mL) of structure richness defect;By the oxygen of the structure for obtaining richness defect 1h is peeled off in the ultrasonication in the case where ultrasonic power is 500W of graphite solution, is then centrifuged for separating, rotating speed 4000rpm, centrifugation time 30min, takes supernatant liquid, obtains the graphene oxide solution of the rich defect of 2mg/mL;The rich defect of the 2mg/mL for obtaining Graphene oxide solution, with the sodium ascorbate reducing agent of 1mol/L with 10:1 volume ratio uniformly mixes, in 100 DEG C of heating 2h, it is scrubbed after, obtain rich defect three-dimensional grapheme block materials;By the rich defect three-dimensional grapheme block materials for obtaining and matter Amount percentage ratio is 0.47% NH4B(OH)4Aqueous solution is with 5:4 mass ratio mixing, heats 2h, by the stone for obtaining at 100 DEG C Black alkene block materials take out, scrubbed, suppress under 5MPa pressure, then after drying is processed, finally give thickness and be about The high nitrogen boron doping three-dimensional grapheme thin film of 0.04mm.
The preparation and performance test of electrode:By obtained high nitrogen boron doping three-dimensional grapheme thin film tablet machine with 5MPa pressures To on Copper Foil, metal lithium sheet is that to electrode, CELGARD 2400 is barrier film, LiPF6For electrolyte, group in Ar glove boxs is being full of Button cell is dressed up, constant current is carried out using new prestige battery test system (BTS-5V20mA, Shenzhen Neware Co.Ltd.) Charge-discharge test.Charging/discharging voltage scope is 0.01-3V, and electric current density is 1A/g, and performance is as shown in table 1.
Table 1
The embodiment 1,2,3 characterized by XPS in table 1 can be analyzed by regulating and controlling Graphene defect, reach regulation and control nitrogen The purpose of boron doping amount.Embodiment 1 (zero defect and undope) and embodiment 2 (zero defect, doping) compare and show without lacking In the case of falling into, nitrogen boron can be doped in Graphene, but the doping of nitrogen boron is a relatively low numerical value;By embodiment 2 The comparison of (zero defect, doping) and embodiment 3 (defective, doping), the doping of nitrogen boron is substantially than flawless in embodiment 3 Nitrogen boron doping amount in embodiment 2 is much higher, and the specific capacity of the embodiment 3 under same current density (1A/g) compares embodiment 2 is high, illustrates that the energy-storage property that high nitrogen boron doping three-dimensional grapheme thin film makees flexible lithium ion mixed capacitor negative material is good.
The present invention reaches the purpose of regulation and control nitrogen boron doping amount by regulating and controlling Graphene defect level, is illustrated in figure 1 flexible height The photomacrograph of nitrogen boron doping three-dimensional graphite thin film.Fig. 2 is that flexible high nitrogen boron adulterates the XPS collection of illustrative plates of three-dimensional graphite thin film, can be with Find out the appearance of nitrogen boron doping characteristic peak.Fig. 3 is the SEM figures of flexible high nitrogen boron doping three-dimensional graphite thin film, it can be observed that stone Black alkene fexible film Cross Section Morphology is stratiform three dimensional structure.Fig. 4 is that initial three-dimensional graphene film mixes with lithium ion after doping The test result of capacitor anode high rate performance, the high rate performance after as can be seen from the figure adulterating substantially is increased substantially, and is shown Advantage of the high nitrogen boron doping three-dimensional grapheme thin film in negative pole aspect of performance is shown.
Above content is to combine specific preferred implementation further description made for the present invention, it is impossible to assert Being embodied as of the present invention is confined to these explanations, and one of ordinary skill in the art should be understood that without departing from the principle of the invention On the premise of, it be all by possible that can also do various replacements, change and modifications.Therefore, the present invention should not be limited to optimal reality Apply example and accompanying drawing disclosure of that.
Unaccomplished matter of the present invention is known technology.

Claims (6)

1. a kind of flexible lithium ion mixed capacitor with high nitrogen boron adulterate three-dimensional grapheme thin film preparation method, it is characterized by should Method is comprised the following steps:
(1)The preparation of rich defect graphite oxide solution:Graphite oxide solution is mixed in proportion with acid, is added at 50-150 DEG C Hot 2-8 h, are obtained the graphite oxide solution of structure richness defect;Washing is centrifuged again, until obtaining pH value=7, dense Spend the graphite oxide solution of the structure richness defect for 0.5-20 mg/mL;
Wherein, the concentration of graphite oxide is 0.5-30 mg/mL;The mass percentage concentration of acid is 10 %-90 %;Volume ratio is oxygen Graphite solution:Acid=15:1-5:1;
(2)The preparation of rich defect graphene oxide solution:The graphite oxide solution of the structure for obtaining richness defect is carried out into lamella stripping From obtaining structure richness defect graphene oxide solution;The concentration of structure richness defect graphene oxide solution is 0.5-20 mg/mL;
(3)The preparation of rich defect three-dimensional grapheme block materials:By structure richness defect graphene oxide solution and reductant solution Mixing, at 50-150 DEG C heat 1-12 h, it is scrubbed after, obtain rich defect three-dimensional grapheme block materials;
Wherein, volume ratio graphene oxide solution:Reductant solution=20:1-5:1;The concentration of reductant solution is 0.1- 10 mol/L;
(4)The preparation of high nitrogen boron doping three-dimensional grapheme thin film:By rich defect three-dimensional grapheme block materials and nitrogen boron compound Aqueous solution, at 50-150 DEG C heat 3-12 h, the high nitrogen boron doped graphene block materials for obtaining, Jing after taking-up Washing, suppresses under 5-40 MPa, then after drying is processed, finally gives the thick high nitrogen boron doping three of the mm of 0.01 mm- 0.1 Dimension graphene film;Wherein, mass ratio is three-dimensional grapheme block materials:Nitrogen boron compound aqueous solution=0.5:1-10:1;
It is the % of 0.001 %- 1 that the concentration of the aqueous solution of described nitrogen boron compound is mass percent.
2. the flexibility lithium ion mixed capacitor as claimed in claim 1 preparation side of high nitrogen boron doping three-dimensional grapheme thin film Method, it is characterized by described step(1)In acid-specific be hydrogen peroxide, sulphuric acid, nitric acid or phosphoric acid.
3. the flexibility lithium ion mixed capacitor as claimed in claim 1 preparation side of high nitrogen boron doping three-dimensional grapheme thin film Method, it is characterized by described step(2)In, structure richness defect graphene oxide is few layer graphite oxide, the graphene oxide number of plies For 1-10 layers.
4. the flexibility lithium ion mixed capacitor as claimed in claim 1 preparation side of high nitrogen boron doping three-dimensional grapheme thin film Method, it is characterized by described step(2)In lift-off technology be solution in shearing machine peel off or ultrasonication stripping means.
5. the flexibility lithium ion mixed capacitor as claimed in claim 1 preparation side of high nitrogen boron doping three-dimensional grapheme thin film Method, it is characterized by described step(3)Middle reducing agent is preferably ascorbic acid, sodium ascorbate or hydrazine hydrate.
6. the flexibility lithium ion mixed capacitor as claimed in claim 1 preparation side of high nitrogen boron doping three-dimensional grapheme thin film Method, it is characterized by described step(4)In, nitrogen boron compound is preferably NH3BF3、C6H8BNO2Or NH4B(OH)4
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