CN105130205A - Preparation method of film-plating liquid for antireflection film of high anti-weathering type photovoltaic glass - Google Patents
Preparation method of film-plating liquid for antireflection film of high anti-weathering type photovoltaic glass Download PDFInfo
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- CN105130205A CN105130205A CN201510526290.8A CN201510526290A CN105130205A CN 105130205 A CN105130205 A CN 105130205A CN 201510526290 A CN201510526290 A CN 201510526290A CN 105130205 A CN105130205 A CN 105130205A
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Abstract
The invention relates to the preparation technique of nanometer coatings, and aims to provide a preparation method of film-plating liquid for an antireflection film of high anti-weathering type photovoltaic glass. The preparation method comprises the steps of: taking ethyl orthosilicate, methyl triethoxysilane, dehydrated alcohol, isopropyl alcohol and deionized water, and uniformly mixing the taken ethyl orthosilicate, the taken methyl triethoxysilane, the taken dehydrated alcohol, the taken isopropyl alcohol and the taken deionized water so as to obtain a mixture; adding hydrochloric acid into the mixture to regulate the pH value of the mixture to be 2-4; after a reaction, aging the mixture so as to obtain acid catalyzed silica sol; taking solvent-based silica sol of which the average particle diameter is 20-40nm and the solid content is 10%, and adding a hydrochloric acid aqueous solution into the solvent-based silica sol to regulate the pH value of the solvent-based silica sol so as to be matched with that of the mixture; taking the acid catalyzed silica sol and the solvent-based silica sol according to the proportion by mass of the acid catalyzed silica sol to the solvent-based silica sol being 1:1.5-2.2, and then mixing the acid catalyzed silica sol and the solvent-based silica sol to perform a reaction with stirring; and after the reaction, aging the prepared product so as to obtain the film-plating liquid for the antireflection film of the high anti-weathering type photovoltaic glass. According to the antireflection film prepared by the method disclosed by the invention, on the basis that a higher hardness is maintained, the transmissivity of the coating of the antireflection film under high humidity environment is greatly improved.
Description
Technical field
The present invention relates to nano coating technology of preparing, particularly a kind of preparation method of high durable type photovoltaic glass anti-reflection film coating liquid.
Background technology
Photovoltaic glass anti-reflection film is coated in photovoltaic module cover-plate glass surface improve sunlight transmitance thus increase photovoltaic module to the coated material of the utilising efficiency of luminous energy, and thus the transmitance performance of anti-reflection film is very large for the generated energy impact in photovoltaic module power generation process.In order to reach anti-reflection performance, the specific refractory power of anti-reflection film must lower than its base material and photovoltaic glass (specific refractory power about 1.41), therefore photovoltaic glass anti-reflection film is generally prepared by sol-gel method by silicon precursors such as tetraethoxys, form the vesicular structure coating of about 100nm at glass basic surface.This kind of sol gel porous coating structure is inside and outside containing more residual hydroxy groups, is easy to absorb the moisture in air, thus, anti-reflection film when humidity comparatively large (more than 70%RH) its transmitance easily decline.
For the problems referred to above, the present invention controls by control punch structure control technique the surface tension that coating mesoporous size reduces coating holes structure, and coating is kept relative stability under various ambient moisture.
Summary of the invention
Main purpose of the present invention is to overcome deficiency of the prior art, provides a kind of preparation method of high durable type photovoltaic glass anti-reflection film coating liquid.For solving the problems of the technologies described above, solution of the present invention is:
A kind of preparation method of high durable type photovoltaic glass anti-reflection film coating liquid is provided, comprises the steps:
(1) get tetraethoxy, Union carbide A-162, dehydrated alcohol, Virahol and deionized water by the mass ratio of 3: 1: 3: 1: 2, mix under the stir speed (S.S.) of 300r/min; Add the hydrochloric acid as catalyzer, control its add-on and make mixing solutions pH value between 2 ~ 4; React 8 ~ 10h at 25 DEG C after, ageing 2 days, obtains acid catalysis silicon sol;
(2) the solvent-borne type silicon sol that particle diameter at 20 ~ 40nm, solid content is 10% is averaged, under the agitation condition of 300r/min, add the aqueous hydrochloric acid that mass concentration is 5%, regulate sol pH to be consistent with the acid catalysis silicon sol of step (1) gained;
(3) the acid catalysis silicon sol of step (1) gained and the solvent-borne type silicon sol of step (2) gained is got, hybrid reaction under 300r/min stirring velocity by the mass ratio of 1: 1.5 ~ 2.2; Temperature of reaction 25 DEG C, after reaction times 6h, ageing 3 days, obtains high durable type photovoltaic glass anti-reflection film coating liquid.
In the present invention, solvent-borne type silicon sol described in step (2), its solvent is the mixing of any one or two kinds in ethanol, Virahol.
Principle of work of the present invention:
The major cause of transmitance to the water vapour sensitivity in air of porous anti-reflection film is that the pore structure in anti-reflection film is pore, has very large surface tension large, from air, easily absorbs moisture produce siphonage.And pore aperture is larger, surface tension is then less; But the mechanical property of excessive aperture to anti-reflection film is unfavorable, easily causes caving in of pore structure.The present invention finds that on previous experiments basis the vesicular structure aperture that mean particle size is piled up out at the grain silicon colloidal sol of 20 ~ 40nm is moderate, have good anti-moisture performance (this is the one side of weather resistance), the anti-reflection film simultaneously prepared maintains good physical strength (pencil hardness is at 3 ~ 4H).
Compared with prior art, the invention has the beneficial effects as follows:
The anti-reflection film prepared by the inventive method is keeping, on the basis that hardness is higher, significantly improve the transmitance of anti-reflection film coating under high humidity (more than 80%RH) environment.
Embodiment
Be described in further detail the present invention below in conjunction with embodiment, embodiment can make professional and technical personnel's comprehend the present invention of this specialty, but does not limit the present invention in any way.
The preparation method of high durable type photovoltaic glass anti-reflection film coating liquid of the present invention, comprises the steps:
(1) get tetraethoxy, Union carbide A-162, dehydrated alcohol, Virahol and deionized water by the mass ratio of 3: 1: 3: 1: 2, mix under the stir speed (S.S.) of 300r/min; Add the hydrochloric acid as catalyzer, control its add-on and make mixing solutions pH value between 2 ~ 4; React 8 ~ 10h at 25 DEG C after, ageing 2 days, obtains acid catalysis silicon sol;
(2) the solvent-borne type silicon sol that particle diameter at 20 ~ 40nm, solid content is 10% is averaged, under the agitation condition of 300r/min, add the aqueous hydrochloric acid that mass concentration is 5%, regulate sol pH to be consistent with the acid catalysis silicon sol of step (1) gained;
(3) the acid catalysis silicon sol of step (1) gained and the solvent-borne type silicon sol of step (2) gained is got, hybrid reaction under 300r/min stirring velocity by the mass ratio of 1: 1.5 ~ 2.2; Temperature of reaction 25 DEG C, after reaction times 6h, ageing 3 days, obtains high durable type photovoltaic glass anti-reflection film coating liquid.
Solvent-borne type silicon sol described in step (2), its solvent is the mixing of any one or two kinds in ethanol, Virahol.Solvent-borne type silicon sol both can adopt known technology to make by oneself and obtain, and commercially available silicon sol also can be adopted to dilute obtained (CR-23-IPA as Zhangjiagang Churen New Materials Technology Co., Ltd.).
In order to carry out the performance test of coating, when utilizing that in the present invention, coating liquid prepares anti-reflection film, have employed dip-coating method, be specially: at envrionment temperature 20 ~ 25 DEG C, under the condition of relative air humidity 40 ± 5%, the ultra-white float glass of 10cm ╳ 10cm is cleaned up and complete drying after, impregnated in 2min in coating liquid, after with the speed of 7 ~ 10cm/min, glass is lifted with vertical direction, 180 DEG C of baking oven thermal treatment 15min are put into after surface drying, then put into 300 DEG C of baking oven thermal treatment 10min, obtain the anti-reflection film of about 110nm thickness.
Coating transmission measurement is tested according to ISO9050 method;
Coating moisture resistance properties is tested by the following method: coating sample is placed on the change of average transmittances after 48h under closed, relative humidity 90% environment; Coating pencil hardness presses ISO15184 standard testing.
Testing data in each embodiment sees the following form:
In above example, in comparative example 1 and 2, be respectively the sample that silicon dioxide gel particle diameter is less and larger.
As can be seen from test result, when the particle diameter of silicon sol is less (comparative example 1), anti-reflection film anti-moisture performance poor (transmitance declines 2.0% in wet condition), and when the particle diameter of silicon sol is larger (comparative example 2), the lower only 2H of pencil hardness of coating.The transmitance of 2-5 sample anti-reflection film, hardness and anti-moisture performance are all higher.
Finally, it should be noted that above what enumerate is only specific embodiments of the invention.Obviously, the invention is not restricted to above embodiment, a lot of distortion can also be had.All distortion that those of ordinary skill in the art can directly derive or associate from content disclosed by the invention, all should think protection scope of the present invention.
Claims (2)
1. a preparation method for high durable type photovoltaic glass anti-reflection film coating liquid, is characterized in that, comprise the steps:
(1) get tetraethoxy, Union carbide A-162, dehydrated alcohol, Virahol and deionized water by the mass ratio of 3: 1: 3: 1: 2, mix under the stir speed (S.S.) of 300r/min; Add the hydrochloric acid as catalyzer, control its add-on and make mixing solutions pH value between 2 ~ 4; React 8 ~ 10h at 25 DEG C after, ageing 2 days, obtains acid catalysis silicon sol;
(2) the solvent-borne type silicon sol that particle diameter at 20 ~ 40nm, solid content is 10% is averaged, under the agitation condition of 300r/min, add the aqueous hydrochloric acid that mass concentration is 5%, regulate sol pH to be consistent with the acid catalysis silicon sol of step (1) gained;
(3) the acid catalysis silicon sol of step (1) gained and the solvent-borne type silicon sol of step (2) gained is got, hybrid reaction under 300r/min stirring velocity by the mass ratio of 1: 1.5 ~ 2.2; Temperature of reaction 25 DEG C, after reaction times 6h, ageing 3 days, obtains high durable type photovoltaic glass anti-reflection film coating liquid.
2. method according to claim 1, is characterized in that, solvent-borne type silicon sol described in step (2), and its solvent is the mixing of any one or two kinds in ethanol, Virahol.
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| CN106381051A (en) * | 2016-08-23 | 2017-02-08 | 杭州国为光伏技术有限公司 | Photovoltaic coated glass protective solution, preparation method and application thereof |
| CN106431001A (en) * | 2016-10-12 | 2017-02-22 | 福建农林大学 | Method for preparing hydrophobic SiO2 antireflective coating with organic-inorganic hybrid method |
| CN106477908A (en) * | 2016-10-12 | 2017-03-08 | 福建农林大学 | A kind of hydrophobic SiO2The preparation method of anti-reflection film |
| CN106477909A (en) * | 2016-10-12 | 2017-03-08 | 福建农林大学 | One kind prepares hydrophobic SiO with dodecyl triethoxysilane2The method of anti-reflection film |
| CN106497160A (en) * | 2016-10-29 | 2017-03-15 | 袁春华 | A kind of method of utilization Fructus Ananadis comosi sauced for high stability coating liquid |
| CN106630668A (en) * | 2016-10-12 | 2017-05-10 | 福建农林大学 | Method for preparing SiO2 antireflection film with controllable refractive index by using propyltriethoxysilane |
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| CN107325598A (en) * | 2017-08-17 | 2017-11-07 | 芜湖华欣诺电化学科技有限公司 | A kind of preparation method of high rigidity antireflective coating coating liquid, a kind of film plating process of glass high rigidity antireflective coating and its application |
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| CN103771727A (en) * | 2013-12-31 | 2014-05-07 | 河南安彩高科股份有限公司 | Anti-reflection glass substrate as well as preparation method and application thereof |
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| CN106381051A (en) * | 2016-08-23 | 2017-02-08 | 杭州国为光伏技术有限公司 | Photovoltaic coated glass protective solution, preparation method and application thereof |
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