CN104730771A - Display substrate manufacturing method, display panel and alignment film manufacturing device - Google Patents
Display substrate manufacturing method, display panel and alignment film manufacturing device Download PDFInfo
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- CN104730771A CN104730771A CN201510145219.5A CN201510145219A CN104730771A CN 104730771 A CN104730771 A CN 104730771A CN 201510145219 A CN201510145219 A CN 201510145219A CN 104730771 A CN104730771 A CN 104730771A
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- 239000000758 substrate Substances 0.000 title claims abstract description 79
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 47
- 238000001704 evaporation Methods 0.000 claims abstract description 49
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 48
- 239000002120 nanofilm Substances 0.000 claims abstract description 46
- 239000002904 solvent Substances 0.000 claims abstract description 40
- 230000008020 evaporation Effects 0.000 claims abstract description 38
- 150000004985 diamines Chemical class 0.000 claims abstract description 35
- 238000010438 heat treatment Methods 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 20
- 239000003054 catalyst Substances 0.000 claims abstract description 19
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 46
- 239000011259 mixed solution Substances 0.000 claims description 16
- 239000004642 Polyimide Substances 0.000 claims description 13
- 229920001721 polyimide Polymers 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 9
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 5
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims description 3
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical group CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 claims description 3
- SLHXQWDUYXSTPA-UHFFFAOYSA-N 4-[5-(4-aminophenoxy)pentoxy]aniline Chemical compound C1=CC(N)=CC=C1OCCCCCOC1=CC=C(N)C=C1 SLHXQWDUYXSTPA-UHFFFAOYSA-N 0.000 claims description 3
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 claims description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 3
- 239000004952 Polyamide Substances 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- 229930188620 butyrolactone Natural products 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 229920002647 polyamide Polymers 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 8
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 5
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 90
- 238000006243 chemical reaction Methods 0.000 description 13
- 239000002994 raw material Substances 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 3
- 125000006159 dianhydride group Chemical group 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- 206010047571 Visual impairment Diseases 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Liquid Crystal (AREA)
Abstract
The embodiment of the invention provides a display substrate manufacturing method, a display panel and an alignment film manufacturing device, and belongs to the technical field of liquid crystal display. The problem of foreign matter frequent occurrence in the alignment film formation process can be solved, and the light alignment effect of alignment film is improved accordingly. The display substrate manufacturing method includes the steps of providing a substrate; conducting evaporation on the surface of the substrate with mixed liquor of dianhydride and a solvent so as to form first nano-film; under the heating condition, conducting evaporation on the first nano-film with mixed liquor of diamine, a catalyst and a solvent so as to form second nano-film; evaporating the solvents in the first nano-film and the second nano-film to enable the dianhydride and the diamine to generate a polymerization reaction under the effect of the catalyst, and forming an alignment film layer on the substrate. The display substrate manufacturing method can be used for manufacturing the display substrate.
Description
Technical Field
The invention relates to the technical field of liquid crystal display, in particular to a manufacturing method of a display substrate, a display panel and alignment film manufacturing equipment.
Background
At present, in the field of liquid crystal display, substrates below the 6 th generation line are coated by a relief printing (APR) transfer printing technology to prepare an alignment film. As shown in fig. 1, a droplet of Polyimide (PI) is ejected through a PI nozzle a and flows into a gap between a doctor blade b and a web roller c by the action of the doctor blade b, the web roller c brings the droplet of PI by rotation under the action of an external force to an APR plate e on a plate ketone d acting with the web roller c by a kneading force, and the APR plate e extrudes the PI liquid on the web roller c under the action of the kneading force and transfers the PI liquid onto a substrate f while the plate ketone d is moving.
However, in production practice, the inventors of the present application found that this coating method makes it very easy to insert PI particles into the nip between the plate ketone and the APR plate during transfer of the APR plate, so that solid foreign matters on the APR plate are difficult to remove, and a large amount of foreign matters are easily generated during transfer, which not only affects the thickness and uniformity of the formed alignment film, but also seriously affects the alignment effect during photo-alignment.
Disclosure of Invention
The invention provides a manufacturing method of a display substrate, a display panel and an alignment film manufacturing device, which can avoid the problem of high foreign matter generation of an alignment film in the film forming process, thereby improving the photo-alignment effect of the alignment film.
In order to achieve the purpose, the invention adopts the following technical scheme:
a method of manufacturing a display substrate, comprising:
providing a substrate;
evaporating mixed liquid of dianhydride and a solvent on the surface of the substrate to form a first nano film;
under the heating condition, evaporating and plating a mixed solution of diamine, a catalyst and a solvent on the first nano film to form a second nano film; and evaporating the solvent in the first nano-film and the second nano-film to enable dianhydride and diamine to perform polymerization reaction under the action of the catalyst, so as to form an oriented film layer on the substrate.
Optionally, at least one first nano film and at least one second nano film are formed on the substrate to form at least one alignment film layer.
Optionally, the heating temperature under the heating condition is 50-110 ℃.
Further, the molar mass ratio of the diamine to the dianhydride is 0.9: 1-1.1: 1, the molar mass ratio of the solvent to the dianhydride in the mixed solution of the dianhydride and the solvent is 3: 1-4: 1.
optionally, the dianhydride comprises at least one of cyclobutanetetracarboxylic dianhydride, 1,2,4, 5-pyromellitic dianhydride, 2,3, 5-tricarboxycyclopentylacetic dianhydride and 3, 4-dicarboxy-1, 2,3, 4-tetrahydro-1-naphthalic dianhydride; and/or
The diamine comprises at least one of p-phenylenediamine, 4 ' -diphenylamine, 4 ' -diaminodiphenylamine, 4 ' -diaminodiphenyl ether, 2 ' -bis (trifluoromethyl) -4,4 ' -diaminobiphenyl, 1, 5-bis (4-aminophenoxy) pentane and 2,2 ' -dimethyl-4, 4 ' -diaminobiphenyl; and/or
The solvent includes at least one of methyl pyrrolidone, butyrolactone, and butoxyethanol.
Preferably, after the forming of the alignment film layer on the substrate, the method further includes:
and curing the orientation film layer at the temperature of 210-250 ℃ for 10-40 minutes.
Optionally, when the alignment film layers are two layers, the thickness of the first alignment film layer is 800 angstroms to 1200 angstroms, the thickness of the second alignment film layer is 200 angstroms to 400 angstroms, and the second alignment film layer is located between the first alignment film layer and the substrate.
Preferably, the first alignment film layer is of a polyamide acid type, and the second alignment film layer is of a polyimide type.
A display panel comprising the display substrate produced by the production method according to any one of the above claims.
An oriented film manufacturing device comprises a first evaporation coating chamber and a second evaporation coating chamber connected with the first evaporation coating chamber; wherein,
the first evaporation chamber comprises a first material area and a first material rotating table which is arranged below the first material area and used for heating the first material area, and a substrate to be evaporated and a first rotating table used for lifting the substrate to be evaporated are oppositely arranged above the first material area;
the second evaporation chamber comprises a second material area and a second material rotating table arranged below the second material area and used for heating the second material, the upper portion of the second material area is relatively arranged on the to-be-evaporated substrate and used for lifting the to-be-evaporated substrate, and a heating plate is further arranged between the to-be-evaporated substrate and the second rotating table.
The invention provides a manufacturing method of a display substrate, a display panel and an alignment film manufacturing device. The method for preparing the oriented film by adopting the evaporation mode not only solves the problem of high foreign matter generation of the oriented film in the film forming process in the prior art, but also can accurately control the thickness of each nano film in the evaporation process, and can ensure that each component can react more fully during polymerization by reasonably adjusting the proportion among each component, so as to prepare a more uniform oriented film layer, thereby effectively improving the photo-orientation effect of the oriented film layer. The method is simple to operate and has certain productivity in actual production.
Drawings
FIG. 1 is a schematic diagram of a prior art transfer apparatus for an APR plate;
fig. 2 is a schematic view illustrating a method for manufacturing a display substrate according to an embodiment of the invention;
fig. 3 is a schematic view of an alignment film manufacturing apparatus according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Fig. 2 is a schematic view of a method for manufacturing a display substrate according to an embodiment of the invention. As shown in fig. 2, an embodiment of the present invention provides a method for manufacturing a display substrate, including:
step S1: providing a substrate;
step S2: evaporating mixed liquid of dianhydride and a solvent on the surface of the substrate to form a first nano film;
step S3: under the heating condition, evaporating and plating a mixed solution of diamine, a catalyst and a solvent on the first nano film to form a second nano film; and evaporating the solvent in the first nano-film and the second nano-film to enable dianhydride and diamine to perform polymerization reaction under the action of the catalyst, so as to form an oriented film layer on the substrate.
In this embodiment, a mixed solution of dianhydride and a solvent is evaporated on a surface of a substrate to form a first nano-film on the surface of the substrate, and then a mixed solution of diamine, a catalyst and a solvent is evaporated on the first nano-film to form a second nano-film. Here, the second nano-film is formed and the entire reaction system is heated, so that the solvent evaporated in the first nano-film and the second nano-film can be heated and volatilized at the temperature, and the dianhydride and the diamine in the nano-film can be polymerized under the action of the catalyst to form the alignment film layer. When dianhydride and diamine are polymerized under the action of catalyst to form the oriented film layer, the oriented film layer can be effectively cured because the reaction system is in a heating state.
The invention provides a manufacturing method of a display substrate, in the manufacturing method, diamine and dianhydride are layered and evaporated on the substrate, and polymerization reaction is carried out under the action of a catalyst to prepare an orientation film. The method for preparing the oriented film by adopting the evaporation mode solves the problem of high foreign matter generation in the film forming process of the oriented film in the prior art, can accurately control the thickness of each nano film in the evaporation process, can ensure that each component can react more fully during polymerization by reasonably adjusting the proportion among the components, and can prepare a more uniform oriented film layer, thereby effectively improving the photo-orientation effect of the oriented film layer. The method is simple to operate and has certain productivity in actual production.
In an optional embodiment of the present invention, at least one of the first nano-film and the second nano-film is formed on the substrate to form at least one alignment film layer. For example, in this embodiment, the first nano-film and the second nano-film are formed on the substrate, so as to form one alignment film layer, which is a cycle, and according to the actual requirement of the thickness of the alignment film to be prepared in the production process, multiple alignment film layers can be formed on the substrate by repeating the above cycle for multiple times. The formed multilayer orientation film layer not only can selectively position the layer position of the PI film layer in the multilayer orientation film layer, but also can enable orientation film layers with different components/types to fully play a synergistic effect when liquid crystals are oriented, thereby forming the orientation film with more excellent performance.
In an alternative embodiment of the present invention, the heating temperature under the heating condition is 50 to 110 ℃. In this embodiment, heat the reaction system when the second nano film is formed in the coating by vaporization, solvent in first nano film and the second nano film can be effectively volatilized on the one hand, on the other hand, through rationally adjusting the heating temperature, still can be when the second nano film is formed in the coating by vaporization, the realization is with the component in first nano film and the second nano film solidification film forming after polymerization, thereby can avoid follow-up required independent heating and after-baking process, and then save the cost, and the production efficiency is improved.
In a preferred embodiment of the present invention, the molar mass ratio of the diamine to the dianhydride is 0.9: 1-1.1: 1, the molar mass ratio of the solvent to the dianhydride in the mixed solution of the dianhydride and the solvent is 3: 1-4: 1. in the embodiment, by reasonably blending the molar mass ratio of diamine to dianhydride and the molar mass ratio of solvent to dianhydride, dianhydride and diamine can be polymerized more completely to form an oriented film layer with stronger structure in the process of vapor deposition film formation; in addition, the solvent amount is reasonably adjusted, so that the dianhydride or diamine can be completely volatilized in the polymerization reaction stage while the viscosity reduction effect is realized on the raw material dianhydride or diamine in the evaporation process, and the reaction system is not influenced.
It is understood that the amount of diamine and dianhydride in the polymerization reaction should be 1:1, but in large-scale production, the amount of each component in the reaction is slightly deviated and should be adjusted according to actual calculation values, so that the ratio of diamine to dianhydride may be in the range of 0.9: 1-1.1: floating within 1. Similarly, the molar mass ratio of the solvent to the dianhydride can be in the range of 3: 1-4: 1 are floated.
In an alternative embodiment of the present invention, the dianhydride comprises at least one of cyclobutanetetracarboxylic dianhydride, 1,2,4, 5-pyromellitic dianhydride, 2,3, 5-tricarboxycyclopentylacetic dianhydride, and 3, 4-dicarboxy-1, 2,3, 4-tetrahydro-1-naphthalic dianhydride (TDA); and/or the diamine comprises at least one of p-phenylenediamine, 4 ' -diphenylamine, 4 ' -diaminodiphenylamine, 4 ' -diaminodiphenyl ether, 2 ' -bis (trifluoromethyl) -4,4 ' -diaminobiphenyl, 1, 5-bis (4-aminophenoxy) pentane, and 2,2 ' -dimethyl-4, 4 ' -diaminobiphenyl; and/or the solvent comprises at least one of methyl pyrrolidone, butyrolactone and butoxyethanol.
In this example, the dianhydride in the first nano-film, the diamine in the second nano-film and the compounds commonly used for the solvent mixed with the dianhydride and the diamine are respectively given, and it should be noted that the solvent does not actually participate in the reaction in the whole reaction system, and the purpose of adding the solvent is to dilute the reaction raw material in order to avoid that the raw material such as dianhydride or diamine is unfavorable for evaporation due to too high viscosity when directly evaporating. In addition, in order to effectively perform the polymerization reaction of dianhydride and diamine, a catalyst is further added to the component for forming the second nano-film by vapor deposition so as to catalyze the reaction of dianhydride and diamine. The catalyst in this example may be a tertiary amine and potassium carbonate.
It is to be understood that the diamines, dianhydrides, solvents and catalysts used in the examples of the present invention are not limited to those listed above, and those skilled in the art can select suitable diamines, dianhydrides, solvents and catalysts in combination with the production conditions.
In a preferred embodiment of the present invention, after the forming the alignment film layer on the substrate, the method further includes: and curing the orientation film layer at the temperature of 210-250 ℃ for 10-40 minutes. In this embodiment, the alignment layer is cured at a high temperature, which can increase the hardness of the alignment layer and improve the alignment capability of the alignment layer. In a preferred embodiment of the present invention, the alignment film layer is cured at a temperature of 220 ℃ to 230 ℃ for 20 to 25 minutes to form an alignment film layer with better hardness, and the tilt angle of the alignment film layer is improved, thereby improving the alignment capability of the alignment film layer. It will be appreciated that the skilled person can select suitable temperatures and times within the above ranges in conjunction with the actual circumstances of the production.
In an optional embodiment of the present invention, when the alignment film layers are two layers, a thickness of the first alignment film layer is 800 angstroms to 1200 angstroms, a thickness of the second alignment film layer is 200 angstroms to 400 angstroms, and the second alignment film layer is located between the first alignment film layer and the substrate. In this embodiment, two alignment film layers are taken as an example, in a preferred embodiment of this embodiment, the first alignment film layer is of a polyamic acid type, and the second alignment film layer is of a polyimide type. The second oriented film layer is close to the substrate and has a certain layer thickness (or resistance) which can improve the afterimage, but has the defects of too soft hardness and weaker orientation capability; the first layer of orientation film layer is positioned on the second layer of orientation film layer, has the function of orientation liquid crystal, has higher hardness and can improve the orientation capability. Therefore, when two alignment film layers are included, the two alignment film layers can play a synergistic role, and the two alignment film layers can compensate each other in action, so that the finally formed alignment film has excellent performance.
It should be noted that each alignment film layer does not have a fixed thickness that is the most optimized, the thickness is selected from the viewpoint of maximizing the performance thereof, and the thickness of each alignment film layer can be determined by the thicknesses of the reaction raw materials dianhydride, diamine and solvent. In a preferred embodiment, the thickness of the first alignment layer is 1000-1200 angstroms, and the thickness of the second alignment layer is 200-300 angstroms. It should be noted here that the PI components forming the first alignment film layer and the second alignment film layer may be the same or different, as long as the types of the alignment film layers formed in the different alignment films are different, for example, the first alignment film layer is of a polyamide acid type, and the second alignment film layer is of a polyimide type.
An embodiment of the present invention provides a display panel including a display substrate manufactured by the manufacturing method according to any one of the above embodiments. The display panel provided in this embodiment includes an alignment film prepared by evaporation. The alignment film conforms to the process design, so that the boundary of the alignment film can be effectively prevented from entering a display area or a sealing coating area, and the photo-alignment effect of the display panel can be effectively improved.
Fig. 3 is a schematic view of an alignment film manufacturing apparatus according to an embodiment of the present invention. An alignment film manufacturing apparatus for performing the above-described evaporation of the alignment film layer on the display substrate according to an embodiment of the present invention will be specifically described with reference to fig. 3, where the alignment film manufacturing apparatus includes a first evaporation chamber a and a second evaporation chamber B connected to the first evaporation chamber a; wherein,
the first evaporation chamber A comprises a first material area 4 and a first material rotating table 1 which is arranged below the first material area 4 and used for heating the first material area 4, and a substrate 3 to be evaporated and a first rotating table 2 used for lifting the substrate 3 to be evaporated are oppositely arranged above the first material area 4;
the second evaporation chamber B includes a second material area 24 and a second material rotating table 21 disposed below the second material area 24 for heating the second material, a substrate 3 to be evaporated and a second rotating table 22 for lifting the substrate 3 to be evaporated are disposed above the second material area 24, and a heating plate 27 is further disposed between the substrate 3 to be evaporated and the second rotating table 22.
The alignment film manufacturing apparatus provided in this embodiment includes two similar evaporation chambers, i.e., a first evaporation chamber and a second evaporation chamber, and is different in that a heating plate 27 is further provided in the second evaporation chamber. As will be described in detail below.
The first evaporation chamber A sequentially comprises a first vacuum device 5 and a first material area 4 from bottom to top, wherein the first vacuum device 5 is positioned at the bottom of the first evaporation chamber A and provides vacuum degree for the first evaporation chamber A, and the first material area 4 can contain mixed solution of dianhydride and solvent; a first material rotating platform 1 used for heating the first material area 4 is arranged below the first material area 4, a substrate 3 to be evaporated is arranged above the first material area 4 relatively, and a first rotating platform 2 used for lifting the substrate 3 to be evaporated is arranged above the substrate 3 to be evaporated. The mixed solution of the dianhydride and the solvent in the first material area 4 is evaporated under the rotary heating of the first material rotary table 1, the evaporation is carried out on the substrate 3 to be evaporated corresponding to the upper part of the mixed solution, and the substrate 3 to be evaporated is uniformly plated with a first nano thin layer formed by the mixed solution of the dianhydride and the solvent on the surface of the substrate 3 to be evaporated through the lifting control of the first rotary table 2.
After the first nano thin layer is formed on the surface of the substrate 3 to be evaporated, the substrate 3 to be evaporated is transferred from the first evaporation chamber a to the second evaporation chamber B through the chamber inlet/outlet 6 by the transfer of the manipulator, similarly, the second evaporation chamber B and the first evaporation chamber a have similar structures, the same part includes a second vacuum device 25 which is positioned at the bottom of the second evaporation chamber B and provides vacuum degree for the chamber, a second material area 24 and a second material rotating table 21 which is arranged below the second material area 24 and is used for heating the second material area 24, and a second rotating table 22 which is arranged above the second material area 24 and is used for lifting the substrate 3 to be evaporated is relatively arranged above the substrate 3 to be evaporated.
The material contained in the second material area 24 may be a mixed solution of diamine, solvent and catalyst, the mixed solution is evaporated under the rotary heating of the second material rotating table 21, and is evaporated on the substrate to be evaporated 3 with the first nano thin film formed thereon corresponding to the upper side of the mixed solution, and the substrate to be evaporated 3 is further uniformly plated with the second nano thin film formed by the mixed solution of diamine, solvent and catalyst on the surface thereof by the lifting control of the second rotating table 22. In order to ensure that the solvent in the components plated on the surface of the substrate can be completely volatilized and the oriented film layer formed by the polymerization of the dianhydride and the diamine under the action of the catalyst can be solidified to form a film, a heating plate 27 is arranged between the substrate 3 to be evaporated and the second rotating machine table 22, wherein the temperature of the heating plate 27 can be adjusted between 50 ℃ and 110 ℃ according to the reaction condition in the reaction system. After the reaction is finished, an orientation film layer can be formed on the substrate 3 to be evaporated.
The embodiment of the invention provides an alignment film manufacturing device, which is simple and easy to operate, and can be widely applied to each operation link of a display substrate because the device has commonality with equipment required in TFT preparation links, such as resin generation, or solvent-to-metal etching and the like.
It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications can be made without departing from the scope of the invention.
Claims (10)
1. A method for manufacturing a display substrate, comprising:
providing a substrate;
evaporating mixed liquid of dianhydride and a solvent on the surface of the substrate to form a first nano film;
under the heating condition, evaporating and plating a mixed solution of diamine, a catalyst and a solvent on the first nano film to form a second nano film; and evaporating the solvent in the first nano-film and the second nano-film to enable the dianhydride and the diamine to perform polymerization reaction under the action of the catalyst, so as to form an oriented film layer on the substrate.
2. The manufacturing method according to claim 1,
and forming at least one first nano film and at least one second nano film on the substrate to form at least one alignment film layer.
3. The production method according to claim 1, wherein the heating temperature under the heating condition is 50 to 110 ℃.
4. The production method according to claim 1, wherein the molar mass ratio of the diamine to the dianhydride is 0.9: 1-1.1: 1, the molar mass ratio of the solvent to the dianhydride in the mixed solution of the dianhydride and the solvent is 3: 1-4: 1.
5. the production method according to claim 1, wherein the dianhydride comprises at least one of cyclobutanetetracarboxylic dianhydride, 1,2,4, 5-pyromellitic dianhydride, 2,3, 5-tricarboxycyclopentylacetic dianhydride, and 3, 4-dicarboxy-1, 2,3, 4-tetrahydro-1-naphthalic dianhydride; and/or
The diamine comprises at least one of p-phenylenediamine, 4 ' -diphenylamine, 4 ' -diaminodiphenylamine, 4 ' -diaminodiphenyl ether, 2 ' -bis (trifluoromethyl) -4,4 ' -diaminobiphenyl, 1, 5-bis (4-aminophenoxy) pentane and 2,2 ' -dimethyl-4, 4 ' -diaminobiphenyl; and/or
The solvent includes at least one of methyl pyrrolidone, butyrolactone, and butoxyethanol.
6. The manufacturing method according to any one of claims 1 to 5, further comprising, after the forming an alignment film layer on the substrate:
and curing the orientation film layer at the temperature of 210-250 ℃ for 10-40 minutes.
7. The manufacturing method of claim 6, wherein when the alignment film layers are two layers, the thickness of the first alignment film layer is 800 angstroms to 1200 angstroms, and the thickness of the second alignment film layer is 200 angstroms to 400 angstroms, and the second alignment film layer is located between the first alignment film layer and the substrate.
8. The manufacturing method according to claim 7, wherein the first alignment film layer is of a polyamide acid type and the second alignment film layer is of a polyimide type.
9. A display panel comprising the display substrate produced by the production method according to any one of claims 1 to 8.
10. The equipment for manufacturing the oriented film is characterized by comprising a first evaporation coating chamber and a second evaporation coating chamber connected with the first evaporation coating chamber; wherein,
the first evaporation chamber comprises a first material area and a first material rotating table which is arranged below the first material area and used for heating the first material area, and a substrate to be evaporated and a first rotating table used for lifting the substrate to be evaporated are oppositely arranged above the first material area;
the second evaporation chamber comprises a second material area and a second material rotating table arranged below the second material area and used for heating the second material, the upper portion of the second material area is relatively arranged on the to-be-evaporated substrate and used for lifting the to-be-evaporated substrate, and a heating plate is further arranged between the to-be-evaporated substrate and the second rotating table.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106292076A (en) * | 2016-11-01 | 2017-01-04 | 京东方科技集团股份有限公司 | The manufacture method of a kind of alignment film, producing device and alignment film |
| WO2018010249A1 (en) * | 2016-07-13 | 2018-01-18 | 深圳市华星光电技术有限公司 | Alignment film solvent, alignment film solution, and manufacturing method for an alignment film |
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| JPH04366920A (en) * | 1991-06-14 | 1992-12-18 | Kanegafuchi Chem Ind Co Ltd | Liquid crystal oriented film |
| CN1790136A (en) * | 2004-12-15 | 2006-06-21 | Jsr株式会社 | Liquid crystal orientation agent, orientation film, display component and optical component |
| CN101321845A (en) * | 2005-12-01 | 2008-12-10 | Lg化学株式会社 | Method of producing liquid crystal aligning layer, liquid crystal aligning layer produced using the same, and liquid crystal display including liquid crystal aligning layer |
| CN102167981A (en) * | 2010-02-25 | 2011-08-31 | 智索株式会社 | Liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display element |
| CN104020613A (en) * | 2014-06-30 | 2014-09-03 | 上海天马微电子有限公司 | Alignment method and liquid crystal display panel |
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| JPH04366920A (en) * | 1991-06-14 | 1992-12-18 | Kanegafuchi Chem Ind Co Ltd | Liquid crystal oriented film |
| CN1790136A (en) * | 2004-12-15 | 2006-06-21 | Jsr株式会社 | Liquid crystal orientation agent, orientation film, display component and optical component |
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| CN102167981A (en) * | 2010-02-25 | 2011-08-31 | 智索株式会社 | Liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display element |
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| WO2018010249A1 (en) * | 2016-07-13 | 2018-01-18 | 深圳市华星光电技术有限公司 | Alignment film solvent, alignment film solution, and manufacturing method for an alignment film |
| CN106292076A (en) * | 2016-11-01 | 2017-01-04 | 京东方科技集团股份有限公司 | The manufacture method of a kind of alignment film, producing device and alignment film |
| CN106292076B (en) * | 2016-11-01 | 2019-06-04 | 京东方科技集团股份有限公司 | A kind of production method of alignment film, producing device and alignment film |
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| CN104730771B (en) | 2017-08-25 |
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