CN104714363A - Gray-scale mask plate and method for manufacturing liquid crystal display by employing gray-scale mask plate - Google Patents
Gray-scale mask plate and method for manufacturing liquid crystal display by employing gray-scale mask plate Download PDFInfo
- Publication number
- CN104714363A CN104714363A CN201510138112.8A CN201510138112A CN104714363A CN 104714363 A CN104714363 A CN 104714363A CN 201510138112 A CN201510138112 A CN 201510138112A CN 104714363 A CN104714363 A CN 104714363A
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- Prior art keywords
- mask plate
- shading
- transition
- gray level
- zone
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The invention provides a gray-scale mask plate and a method for manufacturing a liquid crystal display by employing a gray-scale mask plate. The mask plate comprises a shading area and a transition area, wherein the transition area is adjacent to the shading area, and is located at the edge position of a mask plate body; the direction in which the shading area and the transition area are sequentially unfolded is defined to be the length direction; the direction vertical to the length direction is the width direction; the transition area comprises a plurality of shading strips and nonopaque slits which are in staggered distribution; the widths of the shading strips are arranged outwards in a linear decreasing manner; and the widths of the nonopaque slits are less than the minimal size which can be distinguished by an exposure machine. Through the arrangement of the mask plate with the transition area, light generates a diffraction effect in the transition area; the transition area penetrates through a photoetching mechanism with gradual change of light intensity; the problem of a residual edge exposure shadow area due to height differences among different films is avoided; continuous change of the film thicknesses is ensured; and fracture is avoided.
Description
Technical field
The present invention relates to the manufacture field of liquid crystal display, particularly a kind of gray level mask plate structure and utilize this mask plate to manufacture the method for liquid crystal display.
Background technology
Liquid crystal display is the main flow of current flat-panel screens.The panel of liquid crystal display, comprises the array base palte and colored filter substrate that be arranged in parallel, is provided with liquid crystal layer between the two.The aperture opening ratio of liquid crystal display is one of key factor affecting display index, and lower aperture opening ratio not only affects the quality of picture, also have impact on the power consumption of display.Have the method for designing much improving aperture opening ratio for image element circuit at present, wherein great majority all use organic insulating film.Organic organic insulating film is the non-conductive organic material of one deck, lower to the absorption coefficient of light after overcuring and decolouring processing procedure, stable in properties under the irradiation of ultraviolet light.As shown in Figure 1, LCD (Liquid Crystal Display) array substrate is provided with successively grid 10, gate insulator 20, source-drain electrode layer 30, inorganic insulation layer 40, organic insulating film 50 and ITO electrode layer 60.The thickness of organic insulating film 50 is about 10 times of other layers.Because organic insulating film 50 there are differences with other tunics are thick, cause creating larger drop as shown in Figure 1 at the edge of organic insulating film film 50, therefore the rete covered thereon can rupture, and finally causes loose contact even open circuit; Be residual 70 schematic diagram of photoresistance under scanning electron microscope in square frame in Fig. 2, because organic insulation film thickness and other layers exist larger drop, create the shadow region of photoetching, thus cause the problem such as residual of photoresistance and subsequent film thereof, finally cause the even terminal situation of burning of short circuit as shown in Figure 3.
Summary of the invention
The object of the present invention is to provide a kind of gray level mask plate and utilize this mask plate to manufacture the method for liquid crystal display, to solve because organic insulation film thickness and other layers exist the problem that larger drop causes photoresistance and subsequent film to remain.
The invention provides a kind of gray level mask plate, this mask plate comprises shading region and the zone of transition adjacent with described shading region, described zone of transition is positioned at the marginal position of described mask plate, the direction of definition shading region and zone of transition sequential deployment is length direction, the direction vertical with length direction is Width, described zone of transition comprises some shading strips of being interspersed and transmissive slit, the width of described shading strip outwards linearly successively decreases arrangement, and the width of described transmissive slit is less than the discernmible minimum dimension of exposure machine.
Further, described shading strip shape is rectangle, is arranged in order along its length, and described transmissive slit width is equal.
Further, described shading strip shape is trapezoidal, the connection shading region, long limit of this trapezoidal shading strip, the minor face of trapezoidal shading strip is away from shading region, described shading strip is arranged in order in the width direction, the narrowest part of described transmissive slit is less than the minimum widith that exposure machine resolution allows, and the widest part of transmissive slit is greater than the minimum widith that exposure machine resolution allows.
Further, the crisscross distribution of described shading strip, forms some light holes, and described light hole becomes large along its length successively.
The present invention also provides a kind of manufacture method of liquid crystal display, this liquid crystal display comprises array base palte and is positioned at the organic insulating film of array base palte, above-mentioned gray level mask plate forms the figure of this organic insulating film for exposing, the marginal portion of the zone of transition exposure organic insulating film of mask plate, after exposure, the thickness of organic insulation film edge is consecutive variations.
The present invention is by arranging a kind of mask plate with zone of transition, light is made to produce diffraction effect in zone of transition, realize the photoetching mechanism of zone of transition through the intensity gradual change of light, eliminate because different rete has difference in height edge exposure shadow region residue problem, ensure that thicknesses of layers consecutive variations, do not rupture.
Accompanying drawing explanation
Fig. 1 is each thicknesses of layers schematic diagram on array base palte;
Fig. 2 is that organic insulating film edge photoresistance remains schematic diagram;
Fig. 3 is that terminal burns schematic diagram;
Fig. 4 is gray level mask plate structure embodiment one of the present invention;
Fig. 5 is gray level mask plate structure embodiment two of the present invention;
Fig. 6 is gray level mask plate structure embodiment three of the present invention;
Fig. 7 is transmissive slit width and photoresistance consumption graph figure;
Fig. 8 exposes the rear mild schematic diagram of organic insulation film thickness for utilizing gray level mask plate of the present invention.
Embodiment
Below in conjunction with the drawings and specific embodiments, illustrate the present invention further, these embodiments should be understood only be not used in for illustration of the present invention and limit the scope of the invention, after having read the present invention, the amendment of those skilled in the art to the various equivalent form of value of the present invention has all fallen within the application's claims limited range.
The invention provides a kind of gray level mask plate, be illustrated in figure 4 gray level mask plate embodiment one of the present invention, this mask plate 100 comprises shading region 110 and the zone of transition 120 adjacent with described shading region, described zone of transition 120 is positioned at the marginal position of described mask plate 100, definition shading region 110 is the A direction shown in length direction and Fig. 4 with the direction of zone of transition 120 sequential deployment, the direction vertical with length direction is Width, described zone of transition 120 comprises some shading strips 121 of being interspersed and transmissive slit 122, described shading strip 121 shape is rectangle, be arranged in order along its length, the width of described shading strip 121 linearly successively decreases arrangement from inside to outside, the width of described transmissive slit 122 is equal, the width of described transmissive slit 122 is less than the discernmible minimum dimension of exposure machine, light is made to produce diffraction effect in zone of transition 110, realize zone of transition 120 to strengthen gradually from inside to outside through the intensity of light, the thickness at organic insulating film 50 edge realizes consecutive variations, thus can eliminate because different rete has difference in height edge exposure shadow region residue problem, ensure thicknesses of layers consecutive variations, do not rupture.
Fig. 5 is gray level mask plate embodiment two of the present invention, this mask plate 200 comprises shading region 210 and the zone of transition 220 adjacent with described shading region, described zone of transition 220 is positioned at the marginal position of described mask plate 200, definition shading region 210 is length direction with the direction of zone of transition 220 sequential deployment, the direction vertical with length direction is the B direction shown in Width and Fig. 5, described zone of transition 220 comprises some shading strips 221 of being interspersed and transmissive slit 222, described shading strip 221 shape is trapezoidal, the long limit 2211 of this trapezoidal shading strip 221 connects shading region, the minor face 2212 of trapezoidal shading strip 221 is away from shading region 210, described shading strip 221 is arranged in order in the width direction, the narrowest part of described transmissive slit 222 is less than the minimum widith of exposure machine resolution permission, the widest part of transmissive slit 222 is greater than the minimum widith that exposure machine resolution allows, thus make light produce desirable diffracting effect in zone of transition.Fig. 7 is transmissive slit width and photoresistance consumption graph figure, light can be made to produce in the scope of diffraction at the width of transmissive slit as shown in the figure, the width of transmissive slit is larger, the amount of the photoresistance consumed during exposure is more, based on this principle, the transmissive slit in mask plate edge transition district design width gradual change can realize thickness consecutive variations.
Fig. 6 is gray level mask plate embodiment three of the present invention, this mask plate 300 comprises shading region 310 and the zone of transition 320 adjacent with described shading region 310, described zone of transition 320 comprises shading strip 321 and transmissive slit, the crisscross distribution of shading strip 321, form some light holes 323, described light hole 323 becomes large along its length successively, through the intensity of light strengthen gradually from inside to outside.Fig. 8 exposes the rear mild schematic diagram of organic insulation film thickness for utilizing gray level mask plate of the present invention.
The present invention also provides a kind of manufacture method of liquid crystal display, this liquid crystal display comprises array base palte and is positioned at the organic insulating film of array base palte, above-mentioned gray level mask plate forms the figure of this organic insulating film for exposing, the marginal portion of the zone of transition exposure organic insulating film of mask plate, after exposure, the thickness of organic insulation film edge is consecutive variations.
The present invention is by arranging a kind of mask plate with zone of transition, light is made to produce diffraction effect in zone of transition, realize the photoetching mechanism of zone of transition through the intensity gradual change of light, eliminate because different rete has difference in height edge exposure shadow region residue problem, ensure that thicknesses of layers consecutive variations, do not rupture.
Claims (8)
1. a gray level mask plate, it is characterized in that: this mask plate comprises shading region and the zone of transition adjacent with described shading region, described zone of transition is positioned at the marginal position of described mask plate, the direction of definition shading region and zone of transition sequential deployment is length direction, the direction vertical with length direction is Width, described zone of transition comprises some shading strips of being interspersed and transmissive slit, the width of described shading strip outwards linearly successively decreases arrangement, and the width of described transmissive slit is less than the discernmible minimum dimension of exposure machine.
2. gray level mask plate according to claim 1, is characterized in that: described shading strip shape is rectangle, is arranged in order along its length.
3. gray level mask plate according to claim 2, is characterized in that: described transmissive slit width is equal.
4. gray level mask plate according to claim 1, is characterized in that: described shading strip shape is trapezoidal, and the connection shading region, long limit of this trapezoidal shading strip, the minor face of trapezoidal shading strip is away from shading region.
5. gray level mask plate according to claim 4, is characterized in that: described shading strip is arranged in order in the width direction.
6. gray level mask plate according to claim 4, is characterized in that: the narrowest part of described transmissive slit is less than the minimum widith that exposure machine resolution allows, and the widest part of transmissive slit is greater than the minimum widith that exposure machine resolution allows.
7. gray level mask plate according to claim 1, is characterized in that: the crisscross distribution of described shading strip, forms some light holes, and described light hole becomes large along its length successively.
8. the manufacture method of a liquid crystal display, this liquid crystal display comprises array base palte and is positioned at the organic insulating film of array base palte, it is characterized in that: the arbitrary described gray level mask plate of described claim 1 to 7 is for exposing the figure forming this organic insulating film, the marginal portion of the zone of transition exposure organic insulating film of mask plate, after exposure, the thickness of organic insulation film edge is consecutive variations.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510138112.8A CN104714363A (en) | 2015-03-26 | 2015-03-26 | Gray-scale mask plate and method for manufacturing liquid crystal display by employing gray-scale mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510138112.8A CN104714363A (en) | 2015-03-26 | 2015-03-26 | Gray-scale mask plate and method for manufacturing liquid crystal display by employing gray-scale mask plate |
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| CN104714363A true CN104714363A (en) | 2015-06-17 |
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| CN201510138112.8A Pending CN104714363A (en) | 2015-03-26 | 2015-03-26 | Gray-scale mask plate and method for manufacturing liquid crystal display by employing gray-scale mask plate |
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105511221A (en) * | 2016-01-05 | 2016-04-20 | 京东方科技集团股份有限公司 | Film layer, preparation method of film layer, substrate and display device |
| CN105589274A (en) * | 2016-03-11 | 2016-05-18 | 厦门天马微电子有限公司 | Mask plate, array substrate, liquid crystal display device and method for forming through holes |
| CN105607411A (en) * | 2016-01-29 | 2016-05-25 | 华灿光电(苏州）有限公司 | Photolithography mask and method for fabricating light-emitting diode by photolithography mask |
| CN106933023A (en) * | 2017-05-09 | 2017-07-07 | 深圳市华星光电技术有限公司 | A kind of preparation method of light shield and substrate of glass |
| CN107643557A (en) * | 2016-07-21 | 2018-01-30 | 擎中科技（上海）有限公司 | A kind of preparation method of optical grating construction, 3 d display device and optical grating construction |
| CN108227290A (en) * | 2018-01-31 | 2018-06-29 | 京东方科技集团股份有限公司 | Mask plate, the organic protection layer obtained using it and display device |
| WO2020173178A1 (en) * | 2019-02-28 | 2020-09-03 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method therefor, display device, and mask plate |
| WO2020237928A1 (en) * | 2019-05-30 | 2020-12-03 | 武汉华星光电半导体显示技术有限公司 | Oled display panel and photomask |
| CN112198757A (en) * | 2020-10-20 | 2021-01-08 | 蓝思科技（长沙）有限公司 | Monochromatic gradient film, preparation method thereof and photomask |
| WO2021218413A1 (en) * | 2020-04-30 | 2021-11-04 | 京东方科技集团股份有限公司 | Mask, display substrate and manufacturing method therefor, and display device |
| CN113608382A (en) * | 2021-08-11 | 2021-11-05 | 昆山龙腾光电股份有限公司 | Array substrate, manufacturing method thereof and display panel |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5725972A (en) * | 1995-05-17 | 1998-03-10 | Fujitsu Limited | Mask with gradual increase in transmittance from opaque to transparent region |
| JP2001092107A (en) * | 1999-09-27 | 2001-04-06 | Toshiba Corp | Method for correcting mask pattern and mask for exposure using the same |
| JP2002268200A (en) * | 2001-03-12 | 2002-09-18 | Matsushita Electric Ind Co Ltd | Photomask for gray tone exposure and method for applying photosensitive resin |
| JP2006128377A (en) * | 2004-10-28 | 2006-05-18 | Renesas Technology Corp | Semiconductor device, its manufacturing method and photomask |
| US20070259280A1 (en) * | 2003-06-26 | 2007-11-08 | Kabushiki Kaisha Toshiba | Photomask, exposure control method and method of manufacturing a semiconductor device |
| CN101393387A (en) * | 2007-09-17 | 2009-03-25 | 中芯国际集成电路制造(上海)有限公司 | Mask and method for manufacturing same |
| CN102736324A (en) * | 2012-06-25 | 2012-10-17 | 深圳市华星光电技术有限公司 | Photomask solidified by frame glue and manufacturing method of liquid crystal display panel |
| CN102830587A (en) * | 2012-09-11 | 2012-12-19 | 京东方科技集团股份有限公司 | Mask plate, CF (Color Filter), LCD (Liquid Crystal Display) device and manufacturing method |
| CN103620497A (en) * | 2012-06-29 | 2014-03-05 | 北京京东方光电科技有限公司 | Mask plate |
| CN104297996A (en) * | 2014-11-10 | 2015-01-21 | 上海天马微电子有限公司 | Color film substrate, liquid crystal display panel and display device |
-
2015
- 2015-03-26 CN CN201510138112.8A patent/CN104714363A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5725972A (en) * | 1995-05-17 | 1998-03-10 | Fujitsu Limited | Mask with gradual increase in transmittance from opaque to transparent region |
| JP2001092107A (en) * | 1999-09-27 | 2001-04-06 | Toshiba Corp | Method for correcting mask pattern and mask for exposure using the same |
| JP2002268200A (en) * | 2001-03-12 | 2002-09-18 | Matsushita Electric Ind Co Ltd | Photomask for gray tone exposure and method for applying photosensitive resin |
| US20070259280A1 (en) * | 2003-06-26 | 2007-11-08 | Kabushiki Kaisha Toshiba | Photomask, exposure control method and method of manufacturing a semiconductor device |
| JP2006128377A (en) * | 2004-10-28 | 2006-05-18 | Renesas Technology Corp | Semiconductor device, its manufacturing method and photomask |
| CN101393387A (en) * | 2007-09-17 | 2009-03-25 | 中芯国际集成电路制造(上海)有限公司 | Mask and method for manufacturing same |
| CN102736324A (en) * | 2012-06-25 | 2012-10-17 | 深圳市华星光电技术有限公司 | Photomask solidified by frame glue and manufacturing method of liquid crystal display panel |
| CN103620497A (en) * | 2012-06-29 | 2014-03-05 | 北京京东方光电科技有限公司 | Mask plate |
| CN102830587A (en) * | 2012-09-11 | 2012-12-19 | 京东方科技集团股份有限公司 | Mask plate, CF (Color Filter), LCD (Liquid Crystal Display) device and manufacturing method |
| CN104297996A (en) * | 2014-11-10 | 2015-01-21 | 上海天马微电子有限公司 | Color film substrate, liquid crystal display panel and display device |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105511221A (en) * | 2016-01-05 | 2016-04-20 | 京东方科技集团股份有限公司 | Film layer, preparation method of film layer, substrate and display device |
| CN105607411A (en) * | 2016-01-29 | 2016-05-25 | 华灿光电(苏州）有限公司 | Photolithography mask and method for fabricating light-emitting diode by photolithography mask |
| CN105607411B (en) * | 2016-01-29 | 2019-09-10 | 华灿光电(苏州）有限公司 | A kind of reticle and the method using reticle production light emitting diode |
| CN105589274B (en) * | 2016-03-11 | 2019-03-26 | 厦门天马微电子有限公司 | Mask plate, array substrate, liquid crystal display device and the method for forming through-hole |
| CN105589274A (en) * | 2016-03-11 | 2016-05-18 | 厦门天马微电子有限公司 | Mask plate, array substrate, liquid crystal display device and method for forming through holes |
| CN107643557A (en) * | 2016-07-21 | 2018-01-30 | 擎中科技（上海）有限公司 | A kind of preparation method of optical grating construction, 3 d display device and optical grating construction |
| CN106933023A (en) * | 2017-05-09 | 2017-07-07 | 深圳市华星光电技术有限公司 | A kind of preparation method of light shield and substrate of glass |
| CN108227290A (en) * | 2018-01-31 | 2018-06-29 | 京东方科技集团股份有限公司 | Mask plate, the organic protection layer obtained using it and display device |
| WO2020173178A1 (en) * | 2019-02-28 | 2020-09-03 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method therefor, display device, and mask plate |
| WO2020237928A1 (en) * | 2019-05-30 | 2020-12-03 | 武汉华星光电半导体显示技术有限公司 | Oled display panel and photomask |
| WO2021218413A1 (en) * | 2020-04-30 | 2021-11-04 | 京东方科技集团股份有限公司 | Mask, display substrate and manufacturing method therefor, and display device |
| CN112198757A (en) * | 2020-10-20 | 2021-01-08 | 蓝思科技（长沙）有限公司 | Monochromatic gradient film, preparation method thereof and photomask |
| CN113608382A (en) * | 2021-08-11 | 2021-11-05 | 昆山龙腾光电股份有限公司 | Array substrate, manufacturing method thereof and display panel |
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Application publication date: 20150617 |
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