CN104575698A - Transparent conductive-film structure - Google Patents
Transparent conductive-film structure Download PDFInfo
- Publication number
- CN104575698A CN104575698A CN201310467701.1A CN201310467701A CN104575698A CN 104575698 A CN104575698 A CN 104575698A CN 201310467701 A CN201310467701 A CN 201310467701A CN 104575698 A CN104575698 A CN 104575698A
- Authority
- CN
- China
- Prior art keywords
- transparent conductive
- conductive film
- nano
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Non-Insulated Conductors (AREA)
- Laminated Bodies (AREA)
Abstract
The invention discloses a transparent conductive-film structure. The transparent conductive-film structure comprises a base board and a transparent conductive layer, wherein the transparent conductive layer is arranged on the surface of the base board, and the base board can be made of glass or plastic. For the invention, a plurality of silver nano wires and a plurality of conductive macromolecular particles are distributed in the transparent conductive layer, the length of each silver nano wire is between 10 micrometers and 70 micrometers, and the silver nano wires are arrayed in the plane direction in an interlaced manner; the conductive macromolecular particles are PEDOT PSS. The transparent conductive-film structure disclosed by the invention has the advantages that the area resistance is lower than 100 omega/sq, and the light transmission rate is higher than 87%; the transparent conductive-film structure disclosed by the invention can solve the problems that because two filming technologies must be performed in the manufacturing process in the prior art, the light transmission rate is lowered, and the manufacturing time is prolonged.
Description
Technical field
The present invention relates to a kind of structure of transparent conductive film, particularly a kind of structure of transparent conductive film being applied to contact panel.
Background technology
Scientific development is at a tremendous pace, and many mobile electronic devices are not only day by day compact, and the function had is also more and more complicated, thus requires also more and more high to the endurance of battery.Especially in recent years intelligent mobile phone and flat computer have swept in 3C consumer electronics market and have sold whirlwind for a moment, have almost become electronic product indispensable in modern's life.
Compact in order to pursue, many electronic installations are all given up keyboard and change employing touch-controlling interface, increase with the volume reduced because using keyboard to cause.And use the modal mode of touch-controlling interface to be use contact panel, particularly adopt projected capacitive touch panel.
For projected capacitive touch panel, it must use transparent conductive film to form electrode, and the material that transparent conductance film the most often uses is ITO(Indium Tin Oxide, tin indium oxide).
The surface resistance value of conventional I TO film also cannot be accomplished lower than 100 Ω/ and still possess more than 87% light transmittance on deflection ground, if increase its thickness in order to allow the surface resistance value of ITO lower than 100 Ω/, ITO layer now can by except low except light transmittance, and be full of cracks and impracticable more easily occurs.
In the various substitution material of current industry research and development ITO, based on metal grill (Metal Mesh), nano-sized carbon tube layer or nano-silver thread etc. made by nanometer silver granuel or shot copper.Wherein under the dual consideration of conductance and light transmittance, metal grill and nano-silver thread are the research and development main flows in current substitution material.
Please refer to Fig. 1, it discloses a kind of conducting film 9 using the prior art of metal grill or nano-silver thread, and it comprises substrate 91, metal grill or nano-silver thread layer 92 and protective layer 93.Use metal grill or nano-silver thread layer 92 must form protective layer 93 further exactly as one of them characteristic of contact panel and protect metal grill or nano-silver thread layer 92.This protective layer 93 is by the chemicals to acid or alkaline matter insensitiveness; example acryl; formed; usually conductivity is not had. the surface resistance that therefore will measure metal grill or nano-silver thread layer 92 is just not too easy; non-general existing four-point probe can measure easily, need use comparatively that specific apparatus is (probe need thicker special) instead..In addition the problem of metal grill method is that mist degree (haze) is too high, is often greater than 2.5%, is comparatively not suitable for the demand of contact panel to mist degree, and therefore application is upper just toward area of solar cell development.
Although adopt the mode of nano-silver thread layer can reach lower than 100 Ω/; even lower than 50 Ω/; but this kind of material method must arrange layer protective layer further on this layer; cause the technique that must have film in twice in manufacturing process; not only cause the decline of light transmittance also to cause the prolongation of manufacturing time, cost increases.
Therefore, if need the surface resistance of the conductive film of contact panel to be reduced to lower than 100 Ω/, light transmittance must reach more than 87% again simultaneously, and does not need membrane process in twice in the manufacture process of conducting film, and prior art also cannot meet its demand.
Summary of the invention
The object of the invention is to propose a kind of structure of transparent conductive film, the problem of the decline of light transmittance that solution prior art causes because having the technique of film in twice in manufacturing process and the prolongation of manufacturing time.
For achieving the above object, the present invention proposes a kind of structure of transparent conductive film, comprise a substrate and a transparency conducting layer, wherein substrate can be plastic base or glass substrate, transparency conducting layer is arranged at the surface of substrate, includes carrier, multiple nano-silver thread and multiple conducting polymer particle in transparency conducting layer.The length of described nano-silver thread is between 10 microns to 70 microns and be staggered along in-plane, described conducting polymer particle is PEDOT:PSS particle (poly-3,4-ethylenedioxythiophene/polystyrolsulfon acid particle), described nano-silver thread and described conducting polymer uniform particle are distributed in carrier.
In one of them concept of structure of transparent conductive film of the present invention, the nano-silver thread of transparency conducting layer and the weight ratio both conducting polymer particle are between the scope of 1:1 to 7:1.
In one of them concept of structure of transparent conductive film of the present invention, based on the total weight of transparency conducting layer, the content of nano-silver thread is between the scope of 0.5 percentage by weight to 3.0 percentage by weight.
In one of them concept of structure of transparent conductive film of the present invention, substrate is pet substrate (polyethylene terephthalate substrate), and thickness is between 25 microns to 200 microns.
In one of them concept of structure of transparent conductive film of the present invention, substrate is glass substrate, and thickness is between 50 microns to 4000 microns.
In one of them concept of structure of transparent conductive film of the present invention, the thickness of this transparency conducting layer is between 0.02 micron to 0.5 micron.
In one of them concept of structure of transparent conductive film of the present invention, more comprise a conductive protecting layer, be arranged at the surface of this transparency conducting layer.
In one of them concept of structure of transparent conductive film of the present invention; described conductive protecting layer comprises PEDOT:PSS conducting polymer particle (poly-3; 4-ethylenedioxythiophene/polystyrolsulfon acid conducting polymer particle), CNT (carbon nano-tube) or Graphene; namely this conductive protecting layer can include any one material such as PEDOT:PSS conducting polymer particle, CNT (carbon nano-tube) or Graphene, and described dispersion of materials is in this conductive protecting layer.
In one of them concept of structure of transparent conductive film of the present invention, described transparency conducting layer more comprises CNT (carbon nano-tube) or Graphene, namely transparency conducting layer more can include any one material such as CNT (carbon nano-tube) or Graphene, and described dispersion of materials is in this transparency conducting layer.
To sum up, be combined by by conducting polymer particle with nano-silver thread, the surface resistance of the transparency conducting layer of structure of transparent conductive film proposed by the invention can be reduced to lower than 100 Ω/, light transmittance can reach more than 87% simultaneously, mist degree below 2.5%, can solve the variety of problems that prior art has.In addition, the operation of upper film together is only needed can to complete the manufacture of structure of transparent conductive film.
Describe the present invention below in conjunction with the drawings and specific embodiments, but not as a limitation of the invention.
Accompanying drawing explanation
Fig. 1 is the cross-sectional view of prior art.
Fig. 2 is the cross-sectional view of the first embodiment of the present invention.
Fig. 3 is the cross-sectional view of the second embodiment of the present invention.
Wherein, Reference numeral:
1 structure of transparent conductive film
11 substrates
12 transparency conducting layers
121 carriers
122 nano-silver threads
123 conducting polymer particles
13 conductive protecting layers
2 structure of transparent conductive film
9 conducting films
91 substrates
92 metal net layers
93 protective layers
Embodiment
Please refer to Fig. 2, be the cross-sectional view of a specific embodiment of the present invention, disclose a structure of transparent conductive film 1, it mainly comprises substrate 11 and a transparency conducting layer 12.In the present embodiment, substrate 11 is PET material, and transparency conducting layer 12 is arranged at the surface of substrate 11, includes carrier 12 1, multiple nano-silver thread 122 and multiple conducting polymer particle 123 in transparency conducting layer 12.
In the present embodiment, the nano-silver thread 122 produced for Cambrios company used, its length is between 10 microns to 70 microns, and diameter between 10 nanometer to 60 nanometers, and is staggered in the horizontal direction on the surface of substrate 11.
The macromolecular material of tool conductivity is various, and such as polyacetylene (Polyacetylene), polyaniline (Polyaniline) and poly-BEEP cough up (Polypyrrole), poly-fen (Polythiophene) etc.But in contact panel field, the characteristic of light transmittance and high connductivity degree need be considered, thus the conducting polymer composite the most widely used on the market is at present the Poly (3 of poly-fen system, 4-ethylenedioxythiophene)-PEDOT(poly-3,4-ethylenedioxythiophene), product is mainly with mixed Polystyrenesulfonic acid-PSS(polystyrolsulfon acid) the mode of the aqueous solution exist.The conducting polymer particle 123 that the present embodiment uses is the PEDOT:PSS conducting polymer composite that Heraeus company produces, and its conductance can reach 1000S.cm.
The conductive layer of the present embodiment comprises the compound of nano-silver thread 122 and conducting polymer particle 123 simultaneously, the operation only needing upper film together just can on the substrate 11 forming surface resistance lower than 100 Ω/, mist degree lower than less than 2.5% and light transmittance higher than 87% transparent conductive film layer 12.And the present embodiment is applicable to the production procedure (production procedure of volume to volume) of Roll to Roll, contributes to a large amount of production.
Below further illustrate the manufacture method of structure of transparent conductive film of the present invention.
One, the selection of substrate
Substrate can be glass substrate or plastic base, and plastic base can choice for use PET material.PET base material must be considered avoid the scratch of PET film face in coating process, therefore the easier scratch face of PET has Hard-coat film (cured film) Protector better.
Moreover, the adherence with conducting polymer coating fluid must be considered, therefore select the PET person of priming paint (primer) better.
In addition, need consider that the penetrability of its light of applying conductive macromolecule PET film could reach >87%.
The PET base material (model is FE-PET, RHPA0) of Far East New Era Company measures through light peneration (Transmittance) 91%, also has the PET base material of Mitsubishi in addition, all can meet above-mentioned characteristic.
Two, the formulation selection of waterborne conductive liquid
As follows according to material behavior component design one:
Note: assistant director of a film or play's agent (DMSO, EG) i.e. assistant director of a film or play's agent (dimethyl sulfoxide (DMSO), ethylene glycol)
The electric conducting material solution coat obtained by formula one is on pet substrate, and wet film thickness is 12.31 to 13.85 microns, then after 110 DEG C of baking ovens toast 3 minutes, takes out cooling, and carries out test that is electrical and light transmittance.
Formula one is original formulation of the present invention, according to the surface resistance value of the conductive film made by formula one higher than 200 Ω/.After carrying out the adjustment of each composition to fill a prescription based on one, surface resistance value can be reduced to 100 Ω/below, but still has irregular colour and the unequal problem of thickness, makes overall light transmittance only can reach 82%.
After attempting further adding appropriate thermal stabilizer Ciba123DW and UV absorbent Ciba477DW, successfully obtain surface resistance and be worth 100 Ω/below and the nesa coating of light transmittance more than 87%, the formula two carrying out improveing based on to fill a prescription is as follows:
Utilize the structure of transparent conductive film made by formula two, when the build of transparency conducting layer 12 is between 0.2 micron to 0.6 micron, overall light transmittance can reach more than 87%, and the surface resistance value of conductive layer can lower than 100 Ω/.
To sum up, the structure of transparent conductive film 1 of the present embodiment is by using conducting polymer 123 and nano-silver thread 122 simultaneously, when the build of nesa coating 12 is between 0.2 micron to 0.6 micron, there is the light transmittance of more than 87% and the surface resistance lower than 100 Ω/.In addition, also only need upper membrane process together during fabrication, not only can meet the performance requirement of contact panel, also contribute to a large amount of production.
Please refer to Fig. 3, is the cross-sectional view of the second embodiment of the present invention, discloses a kind of structure of transparent conductive film 2.The Main Differences of the present embodiment and the first embodiment is more to comprise a conductive protecting layer 13; be arranged at the surface of transparent conductive film 12; be mainly used to guarantee further nano-silver thread 122 in transparent conductive film 12 can not by the acid of the etch process of follow-up touch panel module or alkali corrode, cause surface resistance value to increase.In addition; protective layer compared to conventional touch panel is made by isolation material; the conductive protecting layer 13 of the present embodiment, owing to having electrical conductivity, therefore can use four-point probe instrument directly to measure the surface resistance value of conducting membrane structure 2, improves the convenience of product test.Conductive protecting layer 13 does not comprise nano-silver thread, but comprises PEDOT:PSS conducting polymer particle, CNT (carbon nano-tube) or Graphene, or other similar conductive material.
Certainly; the present invention also can have other various embodiments; when not deviating from the present invention's spirit and essence thereof; those of ordinary skill in the art can make various corresponding change and distortion according to the present invention, but these change accordingly and are out of shape the protection range that all should belong to the claims in the present invention.
Claims (9)
1. a structure of transparent conductive film, is characterized in that, comprising:
One substrate; And
One transparency conducting layer, be arranged at the surface of this substrate, carrier, multiple nano-silver thread and multiple conducting polymer particle is comprised in this transparency conducting layer, the length of this nano-silver thread is between 10 microns to 70 microns and be staggered along in-plane, this conducting polymer particle is poly-3,4-ethylenedioxythiophene/polystyrolsulfon acid particle, this nano-silver thread and this conducting polymer uniform particle are distributed in this carrier.
2. structure of transparent conductive film as claimed in claim 1, it is characterized in that, in this transparency conducting layer, the weight ratio of this nano-silver thread and this conducting polymer particle is between the scope of 1:1 to 7:1.
3. structure of transparent conductive film as claimed in claim 2, it is characterized in that, based on the total weight of this transparency conducting layer, the content of this nano-silver thread is between the scope of 0.5 percentage by weight to 3.0 percentage by weight.
4. structure of transparent conductive film as claimed in claim 3, it is characterized in that, the thickness of this transparency conducting layer is between 0.02 micron to 0.5 micron.
5. structure of transparent conductive film as claimed in claim 4, is characterized in that, more comprise a conductive protecting layer, be arranged at the surface of this transparency conducting layer.
6. structure of transparent conductive film as claimed in claim 5, it is characterized in that, this conductive protecting layer comprises poly-3,4-ethylenedioxythiophene/polystyrolsulfon acid conducting polymer particle, CNT (carbon nano-tube) or Graphene.
7. structure of transparent conductive film as claimed in claim 6, it is characterized in that, this transparency conducting layer more comprises CNT (carbon nano-tube) or Graphene.
8. the structure of transparent conductive film as described in any one of claim 1 to 7, is characterized in that, this substrate is polyethylene terephthalate substrate, and thickness is between the scope of 25 microns to 200 microns.
9. the structure of transparent conductive film as described in any one of claim 1 to 7, is characterized in that, this substrate is glass substrate, and thickness is between the scope of 50 microns to 4000 microns.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310467701.1A CN104575698B (en) | 2013-10-09 | 2013-10-09 | Transparent conductive film structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310467701.1A CN104575698B (en) | 2013-10-09 | 2013-10-09 | Transparent conductive film structure |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104575698A true CN104575698A (en) | 2015-04-29 |
CN104575698B CN104575698B (en) | 2018-07-31 |
Family
ID=53091560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310467701.1A Active CN104575698B (en) | 2013-10-09 | 2013-10-09 | Transparent conductive film structure |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104575698B (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104861776A (en) * | 2015-06-02 | 2015-08-26 | 北京化工大学 | Anti-settling and self-leveling silver nanowire conductive printing ink and method for preparing transparent conducting thin film by using same |
CN105259715A (en) * | 2015-11-20 | 2016-01-20 | 深圳市华星光电技术有限公司 | Patterned electrode manufacturing method, liquid crystal display panel and liquid crystal display panel manufacturing method |
CN106683790A (en) * | 2016-12-02 | 2017-05-17 | 天津宝兴威科技股份有限公司 | Preparation method of novel nano-silver conductive thin film |
CN106782771A (en) * | 2016-12-02 | 2017-05-31 | 天津宝兴威科技股份有限公司 | A kind of novel nanometer silver composite conductive thin film |
CN106775133A (en) * | 2017-03-27 | 2017-05-31 | 上海天马有机发光显示技术有限公司 | A kind of flexible touch-control display panel and flexible touch control display apparatus |
CN109031812A (en) * | 2018-08-14 | 2018-12-18 | 合肥微晶材料科技有限公司 | A kind of handwriting pad Special flexible transparent conductive film and the hand-written film of flexibility based on it |
CN110070965A (en) * | 2019-03-26 | 2019-07-30 | 天津大学 | A kind of multi-layer-structure transparent conductive film and preparation method thereof |
CN110267406A (en) * | 2019-06-27 | 2019-09-20 | 湖南纳昇印刷电子科技有限公司 | A kind of ultrathin flexible EL sheet and preparation method thereof |
CN110305353A (en) * | 2019-06-06 | 2019-10-08 | 华南理工大学 | Starch base bottom AgNW/PEDOT flexible conductive film and preparation method thereof |
CN115129174A (en) * | 2021-03-26 | 2022-09-30 | 宸鸿科技(厦门)有限公司 | Touch control element and display device comprising same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102087885A (en) * | 2009-12-08 | 2011-06-08 | 中国科学院福建物质结构研究所 | Planar silver nanowire transparent conductive thin film and preparation method thereof |
CN102522145A (en) * | 2011-12-02 | 2012-06-27 | 浙江科创新材料科技有限公司 | Nanometer silver transparent electrode material and preparation method thereof |
WO2013036038A2 (en) * | 2011-09-06 | 2013-03-14 | Lg Innotek Co., Ltd. | Transparent conductive film, method of manufacturing the same, and touch panel having the same |
CN103140899A (en) * | 2010-07-30 | 2013-06-05 | 印可得株式会社 | Production method for a transparent conductive film and a transparent conductive film produced thereby |
-
2013
- 2013-10-09 CN CN201310467701.1A patent/CN104575698B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102087885A (en) * | 2009-12-08 | 2011-06-08 | 中国科学院福建物质结构研究所 | Planar silver nanowire transparent conductive thin film and preparation method thereof |
CN103140899A (en) * | 2010-07-30 | 2013-06-05 | 印可得株式会社 | Production method for a transparent conductive film and a transparent conductive film produced thereby |
WO2013036038A2 (en) * | 2011-09-06 | 2013-03-14 | Lg Innotek Co., Ltd. | Transparent conductive film, method of manufacturing the same, and touch panel having the same |
CN102522145A (en) * | 2011-12-02 | 2012-06-27 | 浙江科创新材料科技有限公司 | Nanometer silver transparent electrode material and preparation method thereof |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104861776A (en) * | 2015-06-02 | 2015-08-26 | 北京化工大学 | Anti-settling and self-leveling silver nanowire conductive printing ink and method for preparing transparent conducting thin film by using same |
CN105259715A (en) * | 2015-11-20 | 2016-01-20 | 深圳市华星光电技术有限公司 | Patterned electrode manufacturing method, liquid crystal display panel and liquid crystal display panel manufacturing method |
WO2017084150A1 (en) * | 2015-11-20 | 2017-05-26 | 深圳市华星光电技术有限公司 | Manufacturing method for patterned electrode, liquid crystal display panel and manufacturing method therefor |
CN106683790A (en) * | 2016-12-02 | 2017-05-17 | 天津宝兴威科技股份有限公司 | Preparation method of novel nano-silver conductive thin film |
CN106782771A (en) * | 2016-12-02 | 2017-05-31 | 天津宝兴威科技股份有限公司 | A kind of novel nanometer silver composite conductive thin film |
US10401998B2 (en) | 2017-03-27 | 2019-09-03 | Shanghai Tianma AM-OLED Co., Ltd. | Flexible touch display panel and flexible touch display device |
CN106775133A (en) * | 2017-03-27 | 2017-05-31 | 上海天马有机发光显示技术有限公司 | A kind of flexible touch-control display panel and flexible touch control display apparatus |
CN106775133B (en) * | 2017-03-27 | 2020-03-03 | 上海天马有机发光显示技术有限公司 | Flexible touch display panel and flexible touch display device |
CN109031812A (en) * | 2018-08-14 | 2018-12-18 | 合肥微晶材料科技有限公司 | A kind of handwriting pad Special flexible transparent conductive film and the hand-written film of flexibility based on it |
CN109031812B (en) * | 2018-08-14 | 2021-05-04 | 合肥微晶材料科技有限公司 | Special flexible transparent conductive film for handwriting board and flexible handwriting film based on same |
CN110070965A (en) * | 2019-03-26 | 2019-07-30 | 天津大学 | A kind of multi-layer-structure transparent conductive film and preparation method thereof |
CN110305353A (en) * | 2019-06-06 | 2019-10-08 | 华南理工大学 | Starch base bottom AgNW/PEDOT flexible conductive film and preparation method thereof |
CN110267406A (en) * | 2019-06-27 | 2019-09-20 | 湖南纳昇印刷电子科技有限公司 | A kind of ultrathin flexible EL sheet and preparation method thereof |
CN115129174A (en) * | 2021-03-26 | 2022-09-30 | 宸鸿科技(厦门)有限公司 | Touch control element and display device comprising same |
Also Published As
Publication number | Publication date |
---|---|
CN104575698B (en) | 2018-07-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104575698A (en) | Transparent conductive-film structure | |
KR101071289B1 (en) | Transparent conductive layered structure for a touch panel input device | |
CN104584142B (en) | Pattern of parallel lines comprising conductive material, pattern of parallel lines forming method, the base material with nesa coating, device and electronic equipment | |
JP6098860B2 (en) | Composite transparent conductor and device | |
CN102522145B (en) | Nanometer silver transparent electrode material and preparation method thereof | |
KR102581899B1 (en) | Transparent electrodes and electronic devices including the same | |
KR101479811B1 (en) | Substrate films for transparent electrode films | |
Altin et al. | Solution-processed transparent conducting electrodes with graphene, silver nanowires and PEDOT: PSS as alternative to ITO | |
CN204028877U (en) | A kind of double-layer capacitance type touch-screen transparent conductive film group based on nano-silver thread | |
US20140202734A1 (en) | Transparent Conductive Film, Method of Manufacturing the Same, and Touch Panel Having the Same | |
CN110033900A (en) | Flexible conductive film and preparation method thereof, display panel | |
JP2014120353A (en) | Parallel line pattern forming method, substrate with transparent conductive film attached thereto, device and electronic apparatus | |
CN103247366B (en) | Capacitance transparent conductive film and manufacturing method thereof | |
KR101420541B1 (en) | Conductive polymer composition and conductive film prepared from the composition | |
CN113409992B (en) | Flexible composite conductive film and preparation method and application thereof | |
KR101976760B1 (en) | Transparent Conducting Film based on Nanowire and a Method for Preparing Thereof) | |
CN106293182A (en) | A kind of contact panel based on Graphene and preparation method thereof | |
JP2018081133A (en) | Dimming film, dimmer using the same, and screen | |
JP6654954B2 (en) | Anisotropic conductive connection structure | |
US9779851B2 (en) | Thermoformable polymer thick film transparent conductor with haptic response and its use in capacitive switch circuits | |
KR20150132919A (en) | Composition of conductive layer and transparent conductor comprising the same | |
KR20110082464A (en) | Touch screen having transparent adhesive layer | |
TWM478896U (en) | Transparent conductive film structure | |
JP5705268B2 (en) | Transfer film and method for producing transparent conductive laminate | |
US20120028028A1 (en) | Manufacturing method of conductive thin film and product thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |