CN104538380A - 小间距PoP封装单体 - Google Patents
小间距PoP封装单体 Download PDFInfo
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Abstract
本发明涉及一种小间距PoP封装单体,包括芯片、塑封材料和焊球;其特征是:所述焊球包括铜核球,在铜核球表面镀覆镀层钎料。所述焊球为椭球形、矩形柱形或圆柱形,铜核球为椭球形、矩形柱形或圆柱形。所述封装单体可以采用扇出型晶圆级封装或者基板PoP封装结构。本发明能够解决PoP封装坍塌、偏移的问题,并进一步减小间距,提高I/O数量。
Description
技术领域
本发明涉及一种小间距PoP封装单体,属于半导体封装技术领域。
背景技术
作为目前封装高密集成的主要方式,PoP(package on package,层叠封装)得到越来越多的重视。芯片的堆叠是提高电子封装高密化的主要途径之间,PoP设计已经在业界得到比较广泛的开发和应用。
现有技术中,一般采用锡球互连的PoP解决方案,这种结构在坍塌、位移(shift)等方面存在一定难度和不足。基板多层PoP芯片堆叠时,需将锡球与芯片一起塑封,不利于返修。传统的锡球X轴方向尺寸与Y轴尺寸相当,限制了间距时一步减小。
发明内容
本发明的目的是克服现有技术中存在的不足,提供一种小间距PoP封装单体,解决PoP封装坍塌、偏移的问题,并进一步减小间距,提高I/O数量。
按照本发明提供的技术方案,所述小间距PoP封装单体,包括芯片、塑封材料和焊球;其特征是:所述焊球包括铜核球,在铜核球表面镀覆镀层钎料。
进一步的,所述焊球为椭球形、矩形柱形或圆柱形,铜核球为椭球形、矩形柱形或圆柱形。
进一步的,所述封装单体包括塑封材料,塑封材料中塑封芯片,芯片的正面与塑封材料的正面平齐,芯片的高度小于塑封材料的高度;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
进一步的,所述封装单体包括塑封材料,塑封材料中塑封芯片和金属层,芯片的正面与塑封材料的正面平齐,芯片的高度小于塑封材料的高度;所述金属层的一表面与塑封材料的正面平齐,金属层的厚度小于塑封材料的高度;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
进一步的,所述封装单体包括塑封材料,塑封材料中塑封芯片、金属层和金属柱,芯片的正面与塑封材料的正面平齐,芯片的高度小于塑封材料的高度;所述金属层的一表面与塑封材料的正面平齐,金属层的另一表面与金属柱的一端连接,金属柱的另一端与塑封材料的背面平齐;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
进一步的,所述封装单体包括塑封材料,塑封材料中塑封芯片,芯片的背面与塑封材料的背面平齐,芯片的高度小于塑封材料的高度;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
进一步的,所述封装单体包括塑封材料,塑封材料中塑封芯片和金属层,芯片的背面与塑封材料的背面平齐,芯片的高度小于塑封材料的高度;所述金属层的一表面与塑封材料的背面平齐,金属层的厚度小于塑封材料的高度;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
进一步的,所述封装单体包括塑封材料,塑封材料中塑封芯片、金属层和金属柱,芯片的背面与塑封材料的背面平齐,芯片的高度小于塑封材料的高度;所述金属层的一表面与塑封材料的背面平齐,金属层的另一表面与金属柱的一端连接,金属柱的另一端与塑封材料的正面平齐;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
进一步的,所述封装单体为基板PoP封装结构,包括基板,在基板上采用塑封材料塑封芯片,在基板的正面设置焊盘,在焊盘上设置焊球;所述塑封材料全部覆盖基板的背面。
进一步的,所述封装单体为基板PoP封装结构,包括基板,在基板上采用塑封材料塑封芯片,在基板的正面设置焊盘,在焊盘上设置焊球;所述塑封材料部分覆盖基板的背面。
本发明所述的小间距PoP封装单体及PoP封装结构,将非中心对称型球或柱应用于扇出型晶圆级封装或PoP封装,可以解决PoP封装坍塌、偏移的问题,并进一步减小间距,提高I/O数量。
附图说明
图1为本发明所述小间距PoP封装单体第一种实施例的示意图。
图2为本发明所述小间距PoP封装单体第二种实施例的示意图。
图3为本发明所述小间距PoP封装单体第三种实施例的示意图。
图4为本发明所述小间距PoP封装单体第四种实施例的示意图。
图5为本发明所述小间距PoP封装单体第五种实施例的示意图。
图6为本发明所述小间距PoP封装单体第六种实施例的示意图。
图7为本发明所述小间距PoP封装单体第七种实施例的示意图。
图8为本发明所述小间距PoP封装单体第八种实施例的示意图。
图9为本发明所述小间距PoP封装结构第一种实施例的示意图。
图10为本发明所述小间距PoP封装结构第二种实施例的示意图。
具体实施方式
下面结合具体附图对本发明作进一步说明。
实施例一:
如图1所示,本发明包括塑封材料1-1,塑封材料1-1中塑封芯片1-2,芯片1-2的正面与塑封材料1-1的正面平齐,芯片1-2的高度小于塑封材料1-1的高度;在所述塑封材料1-1的正面设置RDL层1-3,RDL层1-3中设置再布线金属走线层1-4,再布线金属走线层1-4上设置UBM层1-5,再布线金属走线层1-4连接UBM层1-5和芯片1-2上的电极;在所述UBM层1-5上设置焊球100,焊球100包括铜核球200,在铜核球200表面镀覆镀层钎料300,镀层钎料300可以采用镍或合金材料(如SAC合金钎料);所述焊球100为椭球形、矩形柱形或圆柱形,铜核球200为椭球形、矩形柱形或圆柱形。
实施例一在制作时,采用现有技术中常规的方法(fan out WLP face down工艺)进行,具体为:在载体晶圆表面涂覆一层临时键合胶,将芯片1-2的电极面朝下贴片;采用塑封材料1-1将芯片1-2塑封并固化,然后将载体晶圆及塑封材料1-1翻转并去除载体晶圆及临时键合胶;在芯片1-2的电极一面制作RDL层1-3,在RDL层1-3上进行电镀、沉积,制作再布线金属走线层1-4和UBM层1-5;在UBM层1-5上植本发明所述的焊球100,将封装体切割成单个封装单体。
实施例二:
如图2所示,结构同实施例一,其中,在塑封材料1-1中还塑封有金属层2-1,金属层2-1的一表面与塑封材料1-1的正面平齐,金属层2-1的厚度小于塑封材料1-1的高度。
实施例三:
如图3所示,结构同实施例二,其中,在塑封材料1-1中还塑封有金属柱3-1,金属柱3-1的一端连接金属层2-1,另一端与塑封材料1-1的背面平齐。
实施例四:
如图4所示,结构同实施例一,其中,芯片1-2的背面与塑封材料1-1的背面平齐。
实施例四在制作时,采用现有技术(Fan out WLP face up工艺)进行,具体为:在载体晶圆表面涂覆一层临时键合胶,将芯片1-2的电极面朝上贴片;采用塑封材料1-1将芯片1-2塑封并固化,然后去除载体晶圆和临时键合胶;在芯片1-2的电极一面的表面制作RDL层1-3,在RDL层1-3上电镀、沉积,制作再布线金属走线层1-4和UBM层1-5;在UBM层1-5上植本发明所述的焊球100,将封装体切割成单个封装单体。
实施例五:
如图5所示,结构同实施例二,其中,芯片1-2的背面与塑封材料1-1的背面平齐,金属层2-1的一表面与塑封材料1-1的背面平齐,金属层2-1的厚度小于塑封材料1-1的高度。
实施例六:
如图6所示,结构同实施例三,其中,芯片1-2的背面与塑封材料1-1的背面平齐,金属层2-1的一表面与塑封材料1-1的背面平齐,金属层2-1的另一表面与金属柱3-1的一表面连接,金属柱3-1的另一表面与塑封材料1-1的正面平齐。
实施例七:
如图7所示,本发明为基板PoP封装结构,包括基板7-1,在基板7-1上采用塑封材料7-2塑封芯片7-3,在基板7-1的正面设置焊盘7-4,在焊盘7-4上设置焊球100;其中,塑封材料7-2全部覆盖基板7-1的背面。
实施例七在制作时,采用现有技术进行,具体为:在基板7-1进行贴片,将芯片7-3采用塑封材料7-2进行塑封并固化;再将基板7-1及塑封材料7-2翻转,在基板7-1正面的焊盘7-4上植本发明所述的焊球100,再将封装体切割成封装单体。
实施例八:
如图8所示,结构同实施例七,其中,塑封材料7-2部分覆盖基板7-1的背面。
如图9、图10所示,将本发明所述的小间距PoP封装单体进行堆叠、回流,可以得到小间距PoP封装结构;如图9所示,为将实施例四和实施例六所述的封装单体进行进堆叠;如图10所示,为将实施例七和实施例八所述的封装单体进行堆叠。
本发明案采用非中心对称型球(椭球形、矩形柱形、圆柱形等)取向排布应用于Fan out WLP(扇出型晶圆级封装)及PoP工艺,可以解决PoP堆叠加坍塌、偏移问题,并进一步减小间距,提高I/O数量;非对称型焊球的铜核球起到一定的支撑作用,在Y轴方向上达到PoP芯片堆叠的设计需求;同时,对比传统锡球,焊球在X轴方向可以设计很小,且回流前后变化较小,可以满足芯片小间距植球。这样的植球方法及结构,可以应用于PoP多层芯片互连堆叠,有效地解决坍塌、偏移等工艺问题。
Claims (10)
1.一种小间距PoP封装单体,包括芯片、塑封材料和焊球(100);其特征是:所述焊球(100)包括铜核球(200),在铜核球(200)表面镀覆镀层钎料(300)。
2.如权利要求1所述的小间距PoP封装单体,其特征是:所述焊球(100)为椭球形、矩形柱形或圆柱形,铜核球(200)为椭球形、矩形柱形或圆柱形。
3.如权利要求1所述的小间距PoP封装单体,其特征是:所述封装单体包括塑封材料,塑封材料中塑封芯片,芯片的正面与塑封材料的正面平齐,芯片的高度小于塑封材料的高度;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
4.如权利要求1所述的小间距PoP封装单体,其特征是:所述封装单体包括塑封材料,塑封材料中塑封芯片和金属层,芯片的正面与塑封材料的正面平齐,芯片的高度小于塑封材料的高度;所述金属层的一表面与塑封材料的正面平齐,金属层的厚度小于塑封材料的高度;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
5.如权利要求1所述的小间距PoP封装单体,其特征是:所述封装单体包括塑封材料,塑封材料中塑封芯片、金属层和金属柱,芯片的正面与塑封材料的正面平齐,芯片的高度小于塑封材料的高度;所述金属层的一表面与塑封材料的正面平齐,金属层的另一表面与金属柱的一端连接,金属柱的另一端与塑封材料的背面平齐;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
6.如权利要求1所述的小间距PoP封装单体,其特征是:所述封装单体包括塑封材料,塑封材料中塑封芯片,芯片的背面与塑封材料的背面平齐,芯片的高度小于塑封材料的高度;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
7.如权利要求1所述的小间距PoP封装单体,其特征是:所述封装单体包括塑封材料,塑封材料中塑封芯片和金属层,芯片的背面与塑封材料的背面平齐,芯片的高度小于塑封材料的高度;所述金属层的一表面与塑封材料的背面平齐,金属层的厚度小于塑封材料的高度;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
8.如权利要求1所述的小间距PoP封装单体,其特征是:所述封装单体包括塑封材料,塑封材料中塑封芯片、金属层和金属柱,芯片的背面与塑封材料的背面平齐,芯片的高度小于塑封材料的高度;所述金属层的一表面与塑封材料的背面平齐,金属层的另一表面与金属柱的一端连接,金属柱的另一端与塑封材料的正面平齐;在所述塑封材料的正面设置RDL层,RDL层中设置再布线金属走线层,再布线金属走线层上设置UBM层,再布线金属走线层连接UBM层和芯片上的电极,在UBM层上设置焊球。
9.如权利要求1所述的小间距PoP封装单体,其特征是:所述封装单体为基板PoP封装结构,包括基板,在基板上采用塑封材料塑封芯片,在基板的正面设置焊盘,在焊盘上设置焊球;所述塑封材料全部覆盖基板的背面。
10.如权利要求1所述的小间距PoP封装单体,其特征是:所述封装单体为基板PoP封装结构,包括基板,在基板上采用塑封材料塑封芯片,在基板的正面设置焊盘,在焊盘上设置焊球;所述塑封材料部分覆盖基板的背面。
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