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CN104425396A - Semiconductor package structure and manufacturing method thereof - Google Patents

Semiconductor package structure and manufacturing method thereof Download PDF

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Publication number
CN104425396A
CN104425396A CN201310393830.0A CN201310393830A CN104425396A CN 104425396 A CN104425396 A CN 104425396A CN 201310393830 A CN201310393830 A CN 201310393830A CN 104425396 A CN104425396 A CN 104425396A
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China
Prior art keywords
conductive
conductive portion
chip
semiconductor package
package structure
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Pending
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CN201310393830.0A
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Chinese (zh)
Inventor
林俊宏
孙得凯
陈奕廷
孙樱真
卢俊庭
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Advanced Semiconductor Engineering Inc
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Advanced Semiconductor Engineering Inc
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Priority to CN201310393830.0A priority Critical patent/CN104425396A/en
Publication of CN104425396A publication Critical patent/CN104425396A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48257Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item

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Abstract

A semiconductor package structure and a method for manufacturing the same. The semiconductor package structure includes a plurality of conductive elements, a chip, a package body, and a plurality of solder bumps. The conductive elements are separated from each other. The conductive elements each include a first conductive portion and a second conductive portion adjacent to each other. The chip is electrically connected to the conductive element. The packaging body wraps the chip and the first conductive part of the conductive element. The solder bump is in contact with only the second conductive portion of the conductive element.

Description

半导体封装结构及其制造方法Semiconductor package structure and manufacturing method thereof

技术领域technical field

本发明是有关于一种半导体封装结构及其制造方法,且特别是有关于一种具有导电元件与焊料凸块的半导体封装结构及其制造方法。The present invention relates to a semiconductor packaging structure and its manufacturing method, and in particular to a semiconductor packaging structure with conductive elements and solder bumps and its manufacturing method.

背景技术Background technique

半导体工业是近年来发展速度最快的高科技工业之一,随着电子技术的日新月异,高科技电子产业的相继问世,使得更人性化、功能更佳的电子产品不断地推陈出新,并朝向轻、薄、短、小的趋势设计。目前在半导体工艺当中,导线架(leadframe)是经常使用的构装承载器之一,而应用导线架作为承载器的钉架型封装结构(lead frame type package)更涵盖引脚插入型(Pin Through Hole,PTH)以及表面黏着型(Surface Mount Technology,SMT)等两大类,其中较常见的例如有双边引脚型封装结构(Dual In-Line Package,DIP)、在芯片上搭载导线架(Lead On Chip Package,LOC)的封装结构、四方扁平封装结构(Quad Flat Package,QFP),以及四方扁平无引脚封装结构(Quad Flat Non-leaded package,QFN package)等。The semiconductor industry is one of the fastest-growing high-tech industries in recent years. With the rapid development of electronic technology and the emergence of high-tech electronic industries, more humanized and better-functional electronic products are constantly being introduced, and are moving toward light, Thin, short and small trend design. At present, in the semiconductor process, the lead frame is one of the frequently used structure carriers, and the lead frame type package using the lead frame as the carrier covers the pin insertion type (Pin Through) Hole, PTH) and surface mount type (Surface Mount Technology, SMT) and other two categories, among which the more common ones are the dual-in-line package structure (Dual In-Line Package, DIP), and the chip is equipped with a lead frame (Lead On Chip Package (LOC) package structure, Quad Flat Package (QFP), and Quad Flat Non-leaded package (QFN package).

然而,一般四方扁平无引脚封装结构只具有平面接脚,因此难以顺应产品使用时热度造成的翘曲形变,而限制上板能力。However, the general quad flat no lead package structure only has planar pins, so it is difficult to comply with the warping deformation caused by heat when the product is used, thus limiting the board-mounting capability.

发明内容Contents of the invention

本发明是有关于一种半导体封装结构及其制造方法,能提高半导体封装结构上板能力。The invention relates to a semiconductor packaging structure and a manufacturing method thereof, which can improve the board loading capacity of the semiconductor packaging structure.

根据一实施例,提出一种半导体封装结构,其包括数个导电元件、一芯片、一封装体、与数个焊料凸块。导电元件互相分开。导电元件各包括邻接的一第一导电部分与一第二导电部分。芯片电性连接至导电元件。封装体包覆芯片与导电元件的第一导电部分。焊料凸块只与导电元件的第二导电部分接触。According to an embodiment, a semiconductor package structure is provided, which includes a plurality of conductive elements, a chip, a package body, and a plurality of solder bumps. The conductive elements are separated from each other. The conductive elements each include a first conductive portion and a second conductive portion adjacent to each other. The chip is electrically connected to the conductive element. The package body covers the chip and the first conductive part of the conductive element. The solder bump only contacts the second conductive portion of the conductive element.

根据另一实施例,提出一种半导体封装结构,其包括数个导电元件、数个互相分开的导电元件、一芯片、一封装体与数个焊料凸块。导电元件互相分开。导电元件各包括一第一导电部分。芯片具有数个导电柱配置于其一主动面上。焊料单元物理且电性连接导电柱与导电元件的第一导电部分。封装体包覆芯片、焊料单元与导电元件的第一导电部分。焊料凸块物性且电性连接导电元件。According to another embodiment, a semiconductor package structure is provided, which includes several conductive elements, several conductive elements separated from each other, a chip, a package body, and several solder bumps. The conductive elements are separated from each other. The conductive elements each include a first conductive portion. The chip has several conductive pillars arranged on one active surface. The solder unit physically and electrically connects the conductive column and the first conductive part of the conductive element. The package body covers the chip, the solder unit and the first conductive part of the conductive element. The solder bumps are physically and electrically connected to the conductive elements.

根据另一实施例,提出一种半导体封装结构的制造方法,其包括以下步骤。移除一导电层的一上部分,以定义出数个导电元件各个的一第一导电部分。利用数个电性连接件,物理并电性连接一芯片与第一导电部分。利用一封装体包覆芯片、电性连接件、与第一导电部分。移除导电层的一下部分,以定义出导电元件各个的一第二导电部分。配置数个焊料凸块。焊料凸块只与第二导电部分接触。According to another embodiment, a method for manufacturing a semiconductor package structure is provided, which includes the following steps. An upper portion of a conductive layer is removed to define a first conductive portion of each of the plurality of conductive elements. A chip is physically and electrically connected to the first conductive part by using several electrical connectors. A package is used to cover the chip, the electrical connector, and the first conductive part. A lower portion of the conductive layer is removed to define a second conductive portion of each of the conductive elements. Several solder bumps are arranged. The solder bumps are only in contact with the second conductive portion.

为让本发明的上述内容能更明显易懂,下文特举较佳实施例,并配合附图,作详细说明如下:In order to make the above-mentioned content of the present invention more obvious and understandable, the preferred embodiments are specifically cited below, together with the accompanying drawings, and are described in detail as follows:

附图说明Description of drawings

图1绘示根据一实施例的半导体封装结构的剖面图。FIG. 1 is a cross-sectional view of a semiconductor package structure according to an embodiment.

图2绘示根据一实施例的半导体封装结构的剖面图。FIG. 2 is a cross-sectional view of a semiconductor package structure according to an embodiment.

图3绘示根据一实施例的半导体封装结构的剖面图。FIG. 3 is a cross-sectional view of a semiconductor package structure according to an embodiment.

图4绘示根据一实施例的半导体封装结构的剖面图。FIG. 4 is a cross-sectional view of a semiconductor package structure according to an embodiment.

图5A至图5E绘示根据一实施例的半导体封装结构的制造方法。5A to 5E illustrate a method of manufacturing a semiconductor package structure according to an embodiment.

图6A至图6D绘示根据一实施例的半导体封装结构的制造方法。6A to 6D illustrate a method of manufacturing a semiconductor package structure according to an embodiment.

图7A至图7B绘示根据一实施例的半导体封装结构的制造方法。7A to 7B illustrate a method of manufacturing a semiconductor package structure according to an embodiment.

图8A至图8E绘示根据一实施例的半导体封装结构的制造方法。8A to 8E illustrate a method of manufacturing a semiconductor package structure according to an embodiment.

主要元件符号说明:Description of main component symbols:

102、202、202A、302:半导体封装结构102, 202, 202A, 302: semiconductor package structure

104、204、304:芯片104, 204, 304: chips

106:封装体106: Encapsulation

108、108A:导电元件108, 108A: Conductive elements

110:焊料凸块110: Solder bump

112、312:电性连接件112, 312: electrical connectors

114:第一导电部分114: first conductive part

116:第二导电部分116: second conductive part

118:上表面118: upper surface

120:侧表面120: side surface

122、122A:尖端122, 122A: tip

124:下表面124: lower surface

126:侧表面126: side surface

130、230、330:主动面130, 230, 330: active surface

132:下表面132: lower surface

234:导电柱234: Conductive column

436:导电层436: Conductive layer

438、538:凹槽438, 538: Groove

440:上表面440: upper surface

442、542:凹槽442, 542: Groove

444:下表面444: lower surface

348:下表面348: lower surface

350:芯片座350: chip holder

352:第一座部分352: Part I

354:第二座部分354: Part II

356:上表面356: upper surface

358:侧表面358: side surface

360:下表面360: lower surface

362:侧表面362: side surface

364:尖端364: cutting edge

366:凹槽366: Groove

D1、D2:高度差D1, D2: height difference

H:高度H: height

W1、W2、W3、W4:宽度W1, W2, W3, W4: Width

具体实施方式Detailed ways

请参照图1,其绘示根据一实施例的半导体封装结构102的剖面图。半导体封装结构102包括一芯片104、一封装体106、数个导电元件108、数个焊料凸块110与数个电性连接件112。Please refer to FIG. 1 , which illustrates a cross-sectional view of a semiconductor package structure 102 according to an embodiment. The semiconductor package structure 102 includes a chip 104 , a package body 106 , a plurality of conductive elements 108 , a plurality of solder bumps 110 and a plurality of electrical connectors 112 .

互相分开的导电元件108各包括邻接的一第一导电部分114与一第二导电部分116。第一导电部分114具有一上表面118与邻接上表面118的侧表面120。第二导电部分116具有一下表面124与邻接下表面124的侧表面126。实施例中,侧表面120与侧表面126为倾斜的表面,不垂直于分别邻接的上表面118与下表面124,且连接处定义出一尖端122。侧表面120与侧表面126从剖面图来看并不限于如图1所示的实质上向内凹的曲线,在其他实施例中,也可为直线或其他合适的形态。The separate conductive elements 108 each include a first conductive portion 114 and a second conductive portion 116 adjacent to each other. The first conductive portion 114 has an upper surface 118 and a side surface 120 adjacent to the upper surface 118 . The second conductive portion 116 has a lower surface 124 and a side surface 126 adjacent to the lower surface 124 . In one embodiment, the side surface 120 and the side surface 126 are inclined surfaces, which are not perpendicular to the adjacent upper surface 118 and lower surface 124 respectively, and a tip 122 is defined at the junction. Viewed from the cross-sectional view, the side surface 120 and the side surface 126 are not limited to the substantially inwardly concave curves as shown in FIG. 1 , and may also be straight lines or other suitable shapes in other embodiments.

于一实施例中,第一导电部分114与第二导电部分116连接处(即尖端122处)的宽度W1是大于第一导电部分114的上表面118的宽度W2,且大于第二导电部分116的下表面124宽度W3。此外,宽度W3大于宽度W2。于一实施例中,导电元件108的宽度是从第一导电部分114的上表面118往第一导电部分114与第二导电部分116的连接处逐渐变大,再往第二导电部分116的下表面124逐渐变小。导电元件108的材料例如为铜、铜合金或其他适用的金属材料。In one embodiment, the width W1 of the junction between the first conductive portion 114 and the second conductive portion 116 (ie at the tip 122 ) is greater than the width W2 of the upper surface 118 of the first conductive portion 114 and greater than the width W2 of the second conductive portion 116 The lower surface 124 has a width W3. In addition, the width W3 is greater than the width W2. In one embodiment, the width of the conductive element 108 gradually increases from the upper surface 118 of the first conductive portion 114 to the junction of the first conductive portion 114 and the second conductive portion 116 , and then to the bottom of the second conductive portion 116 Surface 124 tapers. The material of the conductive element 108 is, for example, copper, copper alloy or other suitable metal materials.

于此例中,电性连接件112是焊料单元,配置在芯片104的主动面130上。电性连接件112物理并电性连接芯片104与导电元件108的第一导电部分114。焊料单元包括锡球。In this example, the electrical connector 112 is a solder unit disposed on the active surface 130 of the chip 104 . The electrical connector 112 physically and electrically connects the chip 104 and the first conductive portion 114 of the conductive element 108 . The solder unit includes solder balls.

封装体106包覆芯片104、电性连接件112与导电元件108的第一导电部分114。封装体106具有突出导电元件108的尖端122的一下表面132,且导电元件108的第二导电部分116从尖端122延伸突出封装体106的下表面132。下表面132不限于如图所示的曲表面,在其他实施例中,亦可具有其他的形态。封装体106的下表面132与第二导电部分116的下表面124之间的高度差为D1。导电元件108经由封装体106彼此电性绝缘。封装体106可包括酚醛基树脂(Novolac-based resin)、环氧基树脂(epoxy-based resin)、硅基树脂(silicone-based resin)或其他适当的包覆剂。封装体106亦可包括适当的填充剂,例如是粉状的二氧化硅。The package body 106 covers the chip 104 , the electrical connector 112 and the first conductive portion 114 of the conductive element 108 . The package body 106 has a lower surface 132 protruding from the tip 122 of the conductive element 108 , and the second conductive portion 116 of the conductive element 108 extends from the tip 122 to protrude from the lower surface 132 of the package body 106 . The lower surface 132 is not limited to the curved surface shown in the figure, and may also have other shapes in other embodiments. A height difference between the lower surface 132 of the package body 106 and the lower surface 124 of the second conductive portion 116 is D1. The conductive elements 108 are electrically insulated from each other by the package body 106 . The package body 106 may include Novolac-based resin, epoxy-based resin, silicone-based resin or other suitable encapsulating agents. The package body 106 may also include a suitable filler, such as powdered silicon dioxide.

焊料凸块110只与导电元件108的第二导电部分116接触。更具体的来说,焊料凸块110只与第二导电部分116的下表面124与侧表面126接触。焊料凸块110并未接触到封装体106。于实施例中,焊料凸块110包括锡球,宽度W4为锡球回焊后的最大宽度。一般来说,W4>W1>W3>W2。第二导电部分116的下表面124与焊料凸块110底部之间的高度差为D2。高度差D2可大于高度差D1。第二导电部分116宽度由下表面124往与第一导电部分114连接处逐渐变大的结构,不但提供焊料凸块110大的接触面积,也对焊料凸块110造成卡止效果,因此能提高与焊料凸块110的接合强度,并增强焊料凸块110的结构强度,而提高剪力推球(ballshear)的性质。于实施例中,剪力分析结果可大于160g,例如约392.5g。质软的焊料凸块110可顺应、缓冲产品使用时受冲击、或发生热翘曲造成的形变应力,因此能提高半导体封装结构102上板(例如印刷电路板(PCB))的能力,使得半导体封装结构102能适用于各种封装应用。The solder bump 110 only contacts the second conductive portion 116 of the conductive element 108 . More specifically, the solder bump 110 is only in contact with the lower surface 124 and the side surface 126 of the second conductive portion 116 . The solder bump 110 does not contact the package body 106 . In an embodiment, the solder bump 110 includes a solder ball, and the width W4 is the maximum width of the solder ball after reflow. Generally speaking, W4>W1>W3>W2. The height difference between the lower surface 124 of the second conductive portion 116 and the bottom of the solder bump 110 is D2. The height difference D2 may be greater than the height difference D1. The structure in which the width of the second conductive portion 116 gradually increases from the lower surface 124 to the connection with the first conductive portion 114 not only provides a large contact area for the solder bump 110, but also causes a locking effect on the solder bump 110, thus improving the performance of the solder bump 110. The bonding strength with the solder bump 110 is enhanced, and the structural strength of the solder bump 110 is enhanced to improve the properties of the ballshear due to shear force. In an embodiment, the shear force analysis result may be greater than 160 g, such as about 392.5 g. The soft solder bumps 110 can conform to and cushion the deformation stress caused by impact or thermal warpage when the product is in use, so it can improve the ability of the semiconductor package structure 102 to be mounted on a board (such as a printed circuit board (PCB)), so that the semiconductor The packaging structure 102 can be suitable for various packaging applications.

图2绘示根据一实施例的半导体封装结构202的剖面图,其与图1的半导体封装结构102的差异说明如下。芯片204具有数个导电柱234配置于其一主动面230上。电性连接件112是焊料单元,配置在芯片204的导电柱234上。电性连接件112物理并电性连接芯片204上的导电柱234与导电元件108的第一导电部分114。焊料单元包括锡球。封装体106包覆芯片204、电性连接件112与导电元件108的第一导电部分114。FIG. 2 shows a cross-sectional view of a semiconductor package structure 202 according to an embodiment, and the differences between it and the semiconductor package structure 102 of FIG. 1 are described as follows. The chip 204 has a plurality of conductive pillars 234 disposed on an active surface 230 thereof. The electrical connector 112 is a solder unit disposed on the conductive pillar 234 of the chip 204 . The electrical connector 112 physically and electrically connects the conductive post 234 on the chip 204 to the first conductive portion 114 of the conductive element 108 . The solder unit includes solder balls. The package body 106 covers the chip 204 , the electrical connector 112 and the first conductive portion 114 of the conductive element 108 .

图3绘示根据一实施例的半导体封装结构202A的剖面图,其与图2的半导体封装结构202的差异说明如下。导电元件108A只具有第一导电部分114,换句话说,省略了图2的第二导电部分116。第一导电部分114互不垂直的侧表面120与下表面348之间定义出一尖端122A,其位置可实质上相同于图2所示的尖端122(亦即导电元件108A的第一导电部分114高度实质上等于图2的导电元件108的第一导电部分114)。封装体106的下表面132突出导电元件108A的尖端122A。焊料凸块110物性并电性连接第一导电部分114的下表面348,并突出封装体106的下表面132。FIG. 3 shows a cross-sectional view of a semiconductor package structure 202A according to an embodiment, and the differences between it and the semiconductor package structure 202 of FIG. 2 are described as follows. The conductive element 108A has only the first conductive portion 114 , in other words, the second conductive portion 116 of FIG. 2 is omitted. A tip 122A is defined between the non-perpendicular side surfaces 120 and the lower surface 348 of the first conductive portion 114, and its position may be substantially the same as that of the tip 122 shown in FIG. 2 (ie, the first conductive portion 114 of the conductive element 108A. The height is substantially equal to the first conductive portion 114 of the conductive element 108 of FIG. 2 ). The bottom surface 132 of the package body 106 protrudes from the tip 122A of the conductive element 108A. The solder bump 110 is physically and electrically connected to the lower surface 348 of the first conductive portion 114 and protrudes from the lower surface 132 of the package body 106 .

图4绘示根据一实施例的半导体封装结构302的剖面图,其与图1的半导体封装结构102的差异说明如下。半导体封装结构302包括芯片座350,其包括邻接的一第一座部分352与一第二座部分354。第一座部分352具有一上表面356与邻接上表面356的侧表面358。第二座部分354具有一下表面360与邻接下表面360的侧表面362。实施例中,侧表面358与侧表面362为倾斜的表面,不垂直于分别邻接的上表面356与下表面360,且连接处定义出一尖端364。侧表面358与侧表面362从剖面图来看并不限于如图4所示的实质上向内凹的曲线,在其他实施例中,也可为直线或其他合适的形态。芯片304可经由黏着层(未显示)贴附至芯片座350定义出第一座部分352的凹槽366底部。黏着层例如是一导电黏着材料或一非导电黏着材料,其中导电黏着材料例如是银胶,非导电黏着材料例如是非导电环氧树脂(epoxy)。于此例中,电性连接件312是导线,物理并电性连接芯片304的主动面330、导电元件108的第一导电部分114与芯片座350的第一座部分352。导线的材料可包括金、铜、镍、钯或其合金。FIG. 4 shows a cross-sectional view of a semiconductor package structure 302 according to an embodiment, and the differences between it and the semiconductor package structure 102 of FIG. 1 are described as follows. The semiconductor package structure 302 includes a die pad 350 including a first pad portion 352 and a second pad portion 354 adjacent thereto. The first seat portion 352 has an upper surface 356 and a side surface 358 adjacent to the upper surface 356 . The second seat portion 354 has a lower surface 360 and a side surface 362 adjacent to the lower surface 360 . In one embodiment, the side surface 358 and the side surface 362 are inclined surfaces, which are not perpendicular to the adjacent upper surface 356 and lower surface 360 respectively, and a point 364 is defined at the junction. Viewed from the cross-sectional view, the side surface 358 and the side surface 362 are not limited to the substantially inwardly concave curves as shown in FIG. 4 , and may also be straight lines or other suitable shapes in other embodiments. The die 304 may be attached to the bottom of the recess 366 defining the first seat portion 352 of the die holder 350 via an adhesive layer (not shown). The adhesive layer is, for example, a conductive adhesive material or a non-conductive adhesive material, wherein the conductive adhesive material is, for example, silver glue, and the non-conductive adhesive material is, for example, non-conductive epoxy resin (epoxy). In this example, the electrical connector 312 is a wire, which physically and electrically connects the active surface 330 of the chip 304 , the first conductive portion 114 of the conductive element 108 and the first seat portion 352 of the chip holder 350 . The material of the wire may include gold, copper, nickel, palladium or alloys thereof.

图5A至图5E绘示根据一实施例的半导体封装结构的制造方法。5A to 5E illustrate a method of manufacturing a semiconductor package structure according to an embodiment.

请参照图5A,提供一导电层436。于一实施例中,导电层436为铜箔。移除导电层436的一上部分,以形成数个凹槽438,并定义出第一导电部分114。于一实施例中,移除导电层436的方法可包括在导电层436的上表面440上形成图案化的光阻层(未显示),然后进行蚀刻步骤以从图案化的光阻层露出的上表面440向下移除导电层436,然后移除图案化的光阻层。于另一实施例中,移除导电层436的方法可包括在导电层436的上表面440上形成图案化的光阻层(未显示),然后进行电镀工艺以从图案化的光阻层露出的上表面440上形成金属镀层(未显示),然后移除图案化的光阻层,并以金属镀层作为蚀刻遮罩,进行蚀刻步骤以从上表面440向下移除导电层436,其中导电层436可为铜箔,金属镀层可为镍、金等材料。Referring to FIG. 5A , a conductive layer 436 is provided. In one embodiment, the conductive layer 436 is copper foil. An upper portion of the conductive layer 436 is removed to form a plurality of grooves 438 and define the first conductive portion 114 . In one embodiment, the method for removing the conductive layer 436 may include forming a patterned photoresist layer (not shown) on the upper surface 440 of the conductive layer 436, and then performing an etching step to expose the conductive layer 436 from the patterned photoresist layer. The conductive layer 436 is removed down the upper surface 440, and then the patterned photoresist layer is removed. In another embodiment, the method for removing the conductive layer 436 may include forming a patterned photoresist layer (not shown) on the upper surface 440 of the conductive layer 436, and then performing an electroplating process to expose the patterned photoresist layer. Form a metal plating layer (not shown) on the upper surface 440 of the upper surface 440, then remove the patterned photoresist layer, and use the metal plating layer as an etching mask, perform an etching step to remove the conductive layer 436 from the upper surface 440 downward, where the conductive Layer 436 can be copper foil, and the metal plating can be nickel, gold or other materials.

请参照图5B,利用覆晶工艺,以焊料单元的电性连接件112物理并电性连接芯片104与第一导电部分114。Referring to FIG. 5B , the flip-chip process is used to physically and electrically connect the chip 104 and the first conductive portion 114 with the electrical connector 112 of the solder unit.

请参照图5C,利用封装体106包覆芯片104与电性连接件112,并填充第一导电部分114之间的凹槽438。可利用数种封装技术形成封装体106,例如是压缩成型(compression molding)、液态封装型(liquid encapsulation)、注射成型(injectionmolding)或转注成型(transfer molding)。Referring to FIG. 5C , the chip 104 and the electrical connector 112 are covered by the package body 106 , and the groove 438 between the first conductive parts 114 is filled. The package body 106 can be formed using several packaging techniques, such as compression molding, liquid encapsulation, injection molding, or transfer molding.

请参照图5D,移除导电层436(图5C)的一下部分,以形成与凹槽438连通的凹槽442,并定义出一第二导电部分116。凹槽442露出封装体106的下表面132。相邻接的第一导电部分114与第二导电部分116构成导电元件108,且互相分开的导电元件108经由封装体106彼此电性绝缘。于一实施例中,移除导电层436的方法可包括在导电层436的下表面444(图5C)上形成图案化的光阻层(未显示),然后进行蚀刻步骤以从图案化的光阻层露出的下表面444向内移除导电层436,然后移除图案化的光阻层。于另一实施例中,移除导电层436的方法可包括在导电层436的下表面444上形成图案化的光阻层(未显示),然后进行电镀工艺以从图案化的光阻层露出的下表面444上形成金属镀层(未显示),然后移除图案化的光阻层,并以金属镀层作为蚀刻遮罩,进行蚀刻步骤以从下表面444向内移除导电层436,其中金属镀层可为镍、金等材料。Referring to FIG. 5D , a lower part of the conductive layer 436 ( FIG. 5C ) is removed to form a groove 442 communicating with the groove 438 and defining a second conductive portion 116 . The groove 442 exposes the lower surface 132 of the package body 106 . The adjacent first conductive portion 114 and the second conductive portion 116 constitute the conductive element 108 , and the conductive elements 108 separated from each other are electrically insulated from each other by the package body 106 . In one embodiment, the method of removing the conductive layer 436 may include forming a patterned photoresist layer (not shown) on the lower surface 444 of the conductive layer 436 (FIG. The exposed lower surface 444 of the resist layer removes the conductive layer 436 inwardly, and then removes the patterned photoresist layer. In another embodiment, the method for removing the conductive layer 436 may include forming a patterned photoresist layer (not shown) on the lower surface 444 of the conductive layer 436, and then performing an electroplating process to expose the patterned photoresist layer. Form a metal plating layer (not shown) on the lower surface 444 of the lower surface 444, then remove the patterned photoresist layer, and use the metal plating layer as an etching mask, perform an etching step to remove the conductive layer 436 from the lower surface 444 inwardly, wherein the metal Plating layer can be nickel, gold and other materials.

请参照图5E,配置数个焊料凸块110,其只与第二导电部分116接触。换句话说,焊料凸块110并未接触到封装体106。Referring to FIG. 5E , a plurality of solder bumps 110 are disposed, which are only in contact with the second conductive portion 116 . In other words, the solder bump 110 does not contact the package body 106 .

图6A至图6D绘示根据一实施例的半导体封装结构的制造方法。在图6A所述的步骤之前,可进行如图5A所述的步骤,于此不再赘述。6A to 6D illustrate a method of manufacturing a semiconductor package structure according to an embodiment. Before the steps shown in FIG. 6A , the steps shown in FIG. 5A can be performed, which will not be repeated here.

请参照图6A,提供一具有导电柱234于其主动面230上的芯片204,利用为焊料单元的电性连接件112物理并电性连接芯片204的导电柱234与第一导电部分114。Referring to FIG. 6A , a chip 204 with conductive pillars 234 on its active surface 230 is provided, and the conductive pillars 234 of the chip 204 are physically and electrically connected to the first conductive portion 114 by using the electrical connector 112 as a solder unit.

请参照图6B,利用封装体106包覆芯片204、导电柱234与电性连接件112,并填满第一导电部分114之间的凹槽438。Referring to FIG. 6B , the package 106 is used to cover the chip 204 , the conductive posts 234 and the electrical connectors 112 , and fill the groove 438 between the first conductive parts 114 .

请参照图6C,移除导电层436(图6B)的一下部分,以形成与凹槽438连通的凹槽442,并定义出第二导电部分116。相邻接的第一导电部分114与第二导电部分116构成导电元件108。Referring to FIG. 6C , a lower part of the conductive layer 436 ( FIG. 6B ) is removed to form a groove 442 communicating with the groove 438 and define the second conductive portion 116 . The adjacent first conductive portion 114 and the second conductive portion 116 constitute the conductive element 108 .

请参照图6D,配置数个焊料凸块110,其只与导电元件108的第二导电部分116接触。换句话说,焊料凸块110并未接触到封装体106。Referring to FIG. 6D , a plurality of solder bumps 110 are disposed, which are only in contact with the second conductive portion 116 of the conductive element 108 . In other words, the solder bump 110 does not contact the package body 106 .

图7A至图7B绘示根据一实施例的半导体封装结构的制造方法。在图7A所述的步骤之前,可进行如图6A至图6B所述的步骤,于此不再赘述。7A to 7B illustrate a method of manufacturing a semiconductor package structure according to an embodiment. Before the step shown in FIG. 7A , the steps shown in FIGS. 6A to 6B may be performed, and details are not repeated here.

请参照图7A,移除导电层436(图6B)的一下部分,留下的上部分形成导电元件108A的第一导电部分114。Referring to FIG. 7A , a lower portion of the conductive layer 436 ( FIG. 6B ) is removed, and the remaining upper portion forms the first conductive portion 114 of the conductive element 108A.

请参照图7B,配置焊料凸块110在导电元件108A(或第一导电部分114)露出的下表面348上。Referring to FIG. 7B , the solder bump 110 is disposed on the exposed lower surface 348 of the conductive element 108A (or the first conductive portion 114 ).

图8A至图8E绘示根据一实施例的半导体封装结构的制造方法。8A to 8E illustrate a method of manufacturing a semiconductor package structure according to an embodiment.

请参照图8A,提供一导电层436。移除导电层436的一上部分,以形成凹槽538与凹槽366,并定义出第一导电部分114与第一座部分352。Referring to FIG. 8A , a conductive layer 436 is provided. An upper portion of the conductive layer 436 is removed to form the groove 538 and the groove 366 to define the first conductive portion 114 and the first seating portion 352 .

请参照图8B,可经由黏着层(未显示)将芯片304贴附至凹槽366的底部。利用打线技术,使得为导线的电性连接件312物理并电性连接芯片304、第一导电部分114、与第一座部分352。Referring to FIG. 8B , the chip 304 can be attached to the bottom of the groove 366 via an adhesive layer (not shown). The wire bonding technology is used to physically and electrically connect the chip 304 , the first conductive portion 114 , and the first seat portion 352 by the electrical connection member 312 which is a wire.

请参照图8C,利用封装体106包覆芯片304、电性连接件312、第一导电部分114、与第一座部分352。Referring to FIG. 8C , the package 106 is used to cover the chip 304 , the electrical connector 312 , the first conductive portion 114 , and the first seat portion 352 .

请参照图8D,移除导电层436(图8C)的一下部分,以形成与凹槽538连通的凹槽542,并定义出第二导电部分116与第二座部分354。相邻接的第一导电部分114与第二导电部分116构成导电元件108。相邻接的第一座部分352与第二座部分354构成芯片座350。Referring to FIG. 8D , a lower portion of the conductive layer 436 ( FIG. 8C ) is removed to form a groove 542 communicating with the groove 538 , and to define the second conductive portion 116 and the second seating portion 354 . The adjacent first conductive portion 114 and the second conductive portion 116 constitute the conductive element 108 . The adjacent first seat portion 352 and the second seat portion 354 constitute the chip seat 350 .

请参照图8E,配置数个焊料凸块110,其只与导电元件108的第二导电部分116接触。换句话说,焊料凸块110并未接触到封装体106。Referring to FIG. 8E , a plurality of solder bumps 110 are disposed, which are only in contact with the second conductive portion 116 of the conductive element 108 . In other words, the solder bump 110 does not contact the package body 106 .

综上所述,虽然本发明已以较佳实施例揭露如上,然其并非用以限定本发明。本发明所属技术领域中具有通常知识者,在不脱离本发明的精神和范围内,当可作各种的更动与润饰。因此,本发明的保护范围当视权利要求书所界定者为准。To sum up, although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Those skilled in the art of the present invention can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be defined by the claims.

Claims (10)

1.一种半导体封装结构,其特征在于,包括:1. A semiconductor packaging structure, characterized in that, comprising: 数个互相分开的导电元件,各包括邻接的一第一导电部分与一第二导电部分;a plurality of mutually separated conductive elements, each comprising a first conductive portion and a second conductive portion adjacent to each other; 一芯片,电性连接至该些导电元件;a chip electrically connected to the conductive elements; 一封装体,包覆该芯片与该些导电元件的该些第一导电部分;以及a package covering the chip and the first conductive parts of the conductive elements; and 数个焊料凸块,只与该些导电元件的该些第二导电部分接触。Several solder bumps are only in contact with the second conductive parts of the conductive elements. 2.如权利要求1所述的半导体封装结构,其特征在于,更包括数个电性连接件,其中该芯片通过该些电性连接件连接至该些导电元件的该些第一导电部分。2. The semiconductor package structure according to claim 1, further comprising a plurality of electrical connectors, wherein the chip is connected to the first conductive parts of the conductive elements through the electrical connectors. 3.如权利要求1所述的半导体封装结构,其特征在于,该些导电元件的该些第二导电部分突出该封装体的一下表面。3. The semiconductor package structure according to claim 1, wherein the second conductive portions of the conductive elements protrude from a lower surface of the package. 4.如权利要求1所述的半导体封装结构,其特征在于,该第一导电部分与该第二导电部分连接处的一宽度是大于该第一导电部分的一上表面宽度,且大于该第二导电部分的一下表面宽度。4. The semiconductor package structure according to claim 1, wherein a width of the junction between the first conductive portion and the second conductive portion is larger than a width of an upper surface of the first conductive portion, and larger than the width of the first conductive portion. 2. The width of the lower surface of the conductive part. 5.如权利要求1所述的半导体封装结构,其特征在于,该导电元件的宽度是从该第一导电部分的一上表面往该第一导电部分与该第二导电部分的一连接处逐渐变大,再往该第二导电部分的一下表面逐渐变小。5. The semiconductor package structure according to claim 1, wherein the width of the conductive element is gradually from an upper surface of the first conductive portion to a junction between the first conductive portion and the second conductive portion become larger, and gradually become smaller towards the lower surface of the second conductive part. 6.如权利要求1所述的半导体封装结构,其特征在于,该第二导电部分具有一下表面与邻接该下表面的一侧表面,该焊料凸块只与该第二导电部分的该下表面与该侧表面接触。6. The semiconductor package structure according to claim 1, wherein the second conductive portion has a lower surface and one side surface adjacent to the lower surface, and the solder bump is only connected to the lower surface of the second conductive portion in contact with the side surface. 7.如权利要求1所述的半导体封装结构,其特征在于,该些电性连接件包括导线或焊料。7. The semiconductor package structure according to claim 1, wherein the electrical connectors comprise wires or solder. 8.一种半导体封装结构,其特征在于,包括:8. A semiconductor packaging structure, characterized in that it comprises: 数个互相分开的导电元件,各包括一第一导电部分;a plurality of mutually separated conductive elements, each including a first conductive portion; 数个焊料单元;several solder units; 一芯片,具有数个导电柱配置于其一主动面上,其中该些焊料单元物理且电性连接该些导电柱与该些导电元件的该些第一导电部分;A chip has a plurality of conductive pillars disposed on an active surface thereof, wherein the solder units are physically and electrically connected to the conductive pillars and the first conductive parts of the conductive elements; 一封装体,包覆该芯片、该些焊料单元与该些导电元件的该些第一导电部分;以及a package covering the chip, the solder units and the first conductive parts of the conductive elements; and 数个焊料凸块,物性且电性连接该些导电元件。A plurality of solder bumps are physically and electrically connected to the conductive elements. 9.如权利要求8所述的半导体封装结构,其特征在于,该些导电元件各更包括一第二导电部分邻接该第一导电部分,该些焊料凸块只与该些导电元件的该些第二导电部分接触。9. The semiconductor package structure according to claim 8, wherein each of the conductive elements further comprises a second conductive portion adjacent to the first conductive portion, and the solder bumps are only in contact with the conductive elements. The second conductive portion is in contact. 10.一种半导体封装结构的制造方法,其特征在于,包括:10. A method for manufacturing a semiconductor package structure, comprising: 移除一导电层的一上部分,以定义出数个导电元件各个的一第一导电部分;removing an upper portion of a conductive layer to define a first conductive portion of each of the plurality of conductive elements; 利用数个电性连接件,物理并电性连接一芯片与该些第一导电部分;physically and electrically connecting a chip with the first conductive parts by using a plurality of electrical connectors; 利用一封装体包覆该芯片、该些电性连接件、与该些第一导电部分;encapsulating the chip, the electrical connectors, and the first conductive parts with a package; 移除该导电层的一下部分,以定义出该些导电元件各个的一第二导电部分;以及removing a lower portion of the conductive layer to define a second conductive portion of each of the conductive elements; and 配置数个焊料凸块,该些焊料凸块只与该些第二导电部分接触。A plurality of solder bumps are configured, and the solder bumps are only in contact with the second conductive parts.
CN201310393830.0A 2013-09-02 2013-09-02 Semiconductor package structure and manufacturing method thereof Pending CN104425396A (en)

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Application publication date: 20150318