CN104280801A - Manufacturing method for diffraction optical element of any structure - Google Patents
Manufacturing method for diffraction optical element of any structure Download PDFInfo
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- CN104280801A CN104280801A CN201410539223.5A CN201410539223A CN104280801A CN 104280801 A CN104280801 A CN 104280801A CN 201410539223 A CN201410539223 A CN 201410539223A CN 104280801 A CN104280801 A CN 104280801A
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- optical element
- diffraction optical
- phase
- input face
- light wave
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
The invention provides a manufacturing method for a diffraction optical element of any structure. The method comprises the following steps that a phase position of an input face P1 and a phase position of an input face P2 are respectively phi1 and phi2 obtained through analysis, two beams of light pass through a beam splitter, a pure position phase is loaded on an SLM, and U1 is recorded in a holographic material I1 by means of interference of object light waves and plane reference light waves; a pure position phase is loaded to an SLM, U2 is recoded into a holographic material I2 in a similar mode, and I is equal to the sum of I1 and I2; finally, after the chemical developing and photographic fixing bleaching process is carried out, the needed holographic diffraction optical element is manufactured. An analysis method is utilized for designing and manufacturing the diffraction optical element of any structure. At first, numerical simulating and optical testing are carried out and well fit, and if a precise alignment instrument can be adopted, the two SLMs can be utilized for fast and accurately manufacturing the diffraction optical element with the precise and complex position phase.
Description
Technical field
The present invention relates to a kind of design of diffractive optical element method of arbitrary structures, belong to optical element field.
Background technology
Diffraction optical element is widely applied to many optical fields, such as wavefront shaping, line holographic projections, optical encryption etc.Design optical element is the recovery of amplitude and position phase in fact.Traditional optical element design is the iterative algorithm based on optimizing, such as R.W.Gerchberg and W.O.Saxton, " A practical algorithm for the determination of phase from image and diffraction plane pictures, " J.R.Fienup, " Reconstruction of an object from the modulus of its Fourier transform, " in the GS algorithm mentioned, G.Yang, B.Dong, B.Gu, J Zhuang, and O.K.Ersoy, " Gerchberg-Saton and Yang-Gu algorithm for phase retrieval in a nonunitary transform system:a comparison ", in the Y-G algorism mentioned and S.Kirkpatrick, C.D.Gelatt, and M.P.Vecchi, " Optimization by simulated annealing, " in simulated annealing etc.What these algorithms were just similar on output plane obtains amplitude and have ignored phase place.But, in many optical systems, can accurately simultaneously the diffraction optical element of modulated amplitude and phase place be very important.Arbitrary structures diffraction optical element is normally by multi-layer mask plate, and gray-tone mask plate, the methods such as electron beam lithography realize, such as Z.Cui. " Micro-Nanofabrication technologies and applications ".Very consuming time and expensive of these technology.Utilizing the method for holographic interference to make diffraction optical element is method very effective and with low cost, especially when manufacturing large area diffraction optical element.But, traditional holographic interference methods can only make simple optical grating construction or simple level crossing, such as M.Farhoud, J.Ferrera, A.J.Lochtefeld, et.al. " Fabrication of 200nm period nanomagnet arrays using interference lithography and a negative resist ", T.A.Savas, Satyen N.Shah, M.L.Schattenburg, et.al " Achromatic interferometric lithography for100-nm--period gratings and grids ", H.H.Solak, Y.Ekinci, and P.
" Photon-beam lithography reaches12.5nm half-pitch resolution ", A.Fernandez, H.T.Nguyen, J.A.Britten, et.al. " Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays, " and M.Campbell, D.N.Sharp, M.T.Harrison, et.al. " Fabrication of photonic crystals for the visible spectrum by holographic lithography " etc.
Diffraction optical element is widely applied to many optical fields, such as wavefront shaping, line holographic projections, optical encryption etc.Design optical element is the recovery of amplitude and position phase in fact.Traditional optical element design is the iterative algorithm based on optimizing, such as GS algorithm, Y-G algorism and simulated annealing etc.What these algorithms were just similar on output plane obtains amplitude and have ignored phase place.But, in many optical systems, can accurately simultaneously the diffraction optical element of modulated amplitude and phase place be very important.Arbitrary structures diffraction optical element is normally by multi-layer mask plate, and gray-tone mask plate, the methods such as electron beam lithography realize.Very consuming time and expensive of these technology.Utilizing the method for holographic interference to make diffraction optical element is method very effective and with low cost, especially when manufacturing large area diffraction optical element.But traditional holographic interference methods can only make simple optical grating construction or simple lens.And the diffraction optical element of large-area making arbitrary structures is a difficult problem of this area always.
Summary of the invention
In view of above-mentioned the deficiencies in the prior art part, the object of the present invention is to provide a kind of method for making of arbitrary structures diffraction optical element.
In order to achieve the above object, this invention takes following technical scheme: compared to prior art, the method for making of arbitrary structures diffraction optical element provided by the invention, comprises the following steps:
First, be respectively by resolving the phase place obtaining input face P1 and input face P2 respectively
with
two-beam is by beam splitter, and two-beam can be expressed as Ae in plane output face place
i α=U
1+ U
2;
Secondly, pure position phase
be loaded on SLM, U
1by the interference of Object light wave and plane reference light wave, be recorded in holographic material
Again, pure position phase
ripple is loaded into SLM, U
2be recorded in holographic material by same mode
then I=I
1+ I
2;
Finally, after the fixing bleaching process of chemical development, manufacture the hologram diffraction optical element needed.
The method for making of another kind of arbitrary structures diffraction optical element provided by the invention, comprises the following steps:
Step one, two phase boards, respectively as input face P1 and input face P2, are respectively by resolving the phase place obtaining input face P1 and input face P2 respectively
with
level crossing is as output face P3, and described input face P1 is vertical with input face P2 to be arranged, and arranges beam splitter in the normal intersection of input face P1 and input face P2, plane wave illumination input face P1 and P2, is modulated into wavefront and is
with
light wave, if A
01=A
02=1, by beam splitter, two-beam can be expressed as Ae at plane output face P3 place
i α=U
1+ U
2,
Wherein
frT{...} refer to parallel approximate under fresnel diffraction or Fraunhofer diffraction, obtaining PHASE DISTRIBUTION is
Wherein, ξ=FrT
-1{ Ae
i α, ang (...) refers to and asks argument, obtains according to parsing
with
obtain Ae
i α,
Suppose that the structure needing the diffraction optical element manufactured is P (x, y), if P (x, y)=cI ' (x, y), wherein c is constant,
Order
thus make the diffraction optical element of this structure;
Step 2, the light beam sent from laser instrument become plane wave through beam splitter and collimation lens, and light beam is as with reference to light R, and another bundle, by the modulation of pure phase space light, becomes Object light wave.The optical strength distribution of record can be written as
I(x，y)∝<O(x，y)*R*(x，y)> (2)
Wherein O (x, y) and R (x, y) is respectively the complex amplitude of Object light wave and reference light wave.Subscript * represents conjugation.Suppose that R (x, y) is for plane wave, then R (x, y)=e
-ikr, complicated Object light wave O (x, y) calculates two position phases by formula (1);
Finally, pure position phase
be loaded on SLM, U
1by the interference of Object light wave and plane reference light wave, be recorded in holographic material
pure position phase
be loaded into SLM, U
2be recorded in holographic material by same mode
then I=I
1+ I
2, after the fixing bleaching process of chemical development, namely produce hologram diffraction optical element.
The present invention utilizes the method design of parsing and manufactures arbitrary structures diffraction optical element.First carried out numerical simulation and Experiments of Optics, both are well coincide.If there is accurate aligning instrument to adopt, then two SLMs can be utilized to realize the making of the diffraction optical element fast and accurately with accurate complicated position phase.
Accompanying drawing explanation
Fig. 1 is for interfering schematic diagram;
Fig. 2 a is experimental record index path;
Fig. 2 b is experiment reproduction index path;
Fig. 3 is numerical simulation gained phase board schematic diagram;
Fig. 4 a is phase board micromechanism experiment effect figure;
Fig. 4 b is for reproducing Airy hot spot experiment effect figure.
Embodiment
The invention provides a kind of method for making of arbitrary structures diffraction optical element, for making object of the present invention, technical scheme and effect clearly, clearly, developing simultaneously referring to accompanying drawing, the present invention is described in more detail for embodiment.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
Embodiment
The method for making of arbitrary structures diffraction optical element disclosed in the present embodiment.
As shown in Figure 1, irradiate toward beam splitter and have plane wave, through beam splitter, plane wave illumination two pieces of phase boards or input face, two phase boards have phase place respectively
with
plane wave illumination two pieces is added with the phase board of phase place, is then just modulated into wavefront to be
with
light wave, in order to easy A
01=A
02=1, by beam splitter, two-beam can be expressed as Ae at plane output face P3 place
i α=U
1+ U
2, wherein
frT{...} refer to parallel approximate under fresnel diffraction or Fraunhofer diffraction.Can obtain PHASE DISTRIBUTION is
Wherein, ξ=FrT
-1{ Ae
i α, ang (...) refers to and asks argument, because phase place
with
resolve and obtain, so when two-beam is interfered, we point-devicely can obtain Ae
i α.
When having arbitrary structures P (x, y) when diffraction optical element needs manufactured, because for photoetching material or silver salt emulsion, development is just such as light intensity, and we can by this structure P (x, y) light intensity I ' (x is regarded as, y), i.e. P (x, y)=cI ' (x, y), c is constant.Then make
the diffraction optical element making arbitrary structures can be started according to Fig. 1.
Because the phase structure of twice needs to be added on SLM, and need accurate aligning, laboratory existence conditions is difficult to reach the accurate aligning a micron dimension, so, we have proposed two exposure techniques, realize the making of hologram diffraction optical element.Demonstrate the feasibility of proposed method.
Multi-functional optical experimental device is as shown in 2 (a), and we have employed a spatial light modulator (SLM) in an experiment, by re-expose technology, the hologram diffraction optical element of twice making is overlapped.The light beam sent from laser instrument becomes plane wave through beam splitter and collimation lens, and light beam is as reference light R, and another bundle, by the modulation of pure phase space light, becomes Object light wave.The optical strength distribution of record can be written as
I(x，y)∝<O(x，y)*R*(x，y)> (2)
Wherein O (x, y) and R (x, y) is respectively the complex amplitude of Object light wave and reference light wave.Subscript * represents conjugation.Suppose that R (x, y) is for plane wave, then R (x, y)=e
-ikr, complicated Object light wave O (x, y) can pass through formula (1) and calculate two position phases, and the process of making can be described below:
First, pure position phase
be loaded on SLM, U
1by the interference of Object light wave and plane reference light wave, be recorded in holographic material
secondly, pure position phase
be loaded into SLM, U
2be recorded in holographic material by same mode
then I=I
1+ I
2, Here it is double exposure technique.After the fixing bleaching process of chemical development, the hologram diffraction optical element of needs is just out manufactured.
When reference light wave R is irradiated on made hologram diffraction optical element, playback light can be expressed as:
On the output plane shown in Fig. 2 (b), just can obtain original design light beam
In order to verify the feasibility of the method, our design and the processing and fabricating hologram diffraction optical element of three phase boards.Utilize such diffraction optical element, incident plane wave can be modulated to Ai Li light beam.The parameter of experiment is as follows: He-Ne laser instrument, wavelength is 632.8nm, and power is 50mw.The pure position phase SLM of reflection-type (Holoeye Pluto), active regions is 8.64mm × 8.64mm pixel size is 8 μm × 8 μm, and pixel count is 1080 × 1080.The area of the silver salt dry plate of record is the same with the size of SLM.The distance of SLM and record dry plate is 200mm, SLM and the pitch angle of recording plane is 5 °, so the change tilting to cause can be ignored.Utilize numerical simulation phase mehtod
as shown in Figure 3, then they are once loaded on SLM.
Experiment light path is as shown in Fig. 2 (a).Utilize position phase
modulation Object light wave respectively with reference light wave in the plane interference of holographic recording dry plate.Interference fringe, by double exposure, is just recorded.For the susceptibility of silver salt dry plate, the time ratio of suitable control double exposure, the hologram diffraction optical element that record interference fringe can be obtained, as shown in Fig. 4 (a), utilize the image that optical profilometer (Veeco wyko NT9100) records.Stria is by each pixel modulation of SLM, and irregular main striped, be then the phase mehtod of holographic optical elements (HOE).Then, the optical characteristics of hologram diffraction optical element is analyzed.When in a branch of plane wave illumination to hologram diffraction optical element, as shown in Fig. 4 (b), on the back focal plane of fourier lense, CCD (Lumenera Infinity4-11c) can be utilized to collect Airy beam.The image gathered is+1 grade of hologram diffraction optical element, and diffraction efficiency is about 22%, comprises the noise that SLM zero level causes.The diffraction efficiency of the main waveform of Airy beam is about 15%.If make use of (bichromate gelatin) to make volume hologram, diffraction efficiency can be improved.The inequality of Airy beam fills by non-100% of SLM the zero level caused to cause.Uniform noise is that the time scale of exposure, the developing fixing technique in later stage and the trickle vibrations of dry plate cause by the fluctuation of hologram diffraction optical element air in the process made.The resolution of the diffraction optical element made receives the impact of slm pixel size.If have employed miniature system, then resolution can be improved.
The present invention utilizes the method design of parsing and manufactures arbitrary structures diffraction optical element.First carried out numerical simulation and Experiments of Optics, both are well coincide.If there is accurate aligning instrument to adopt, then two SLMs can be utilized to realize the making of the diffraction optical element fast and accurately with accurate complicated position phase.
Be understandable that, for those of ordinary skills, can be equal to according to technical scheme of the present invention and inventive concept thereof and replace or change, and all these change or replace the protection domain that all should belong to the claim appended by the present invention.
Claims (2)
1. a method for making for arbitrary structures diffraction optical element, is characterized in that comprising the following steps:
First, be respectively by resolving the phase place obtaining input face P1 and input face P2 respectively
with
two-beam is by beam splitter, and two-beam can be expressed as Ae in plane output face place
ia=U
1+ U
2;
Secondly, pure position phase
be loaded on SLM, U
1by the interference of Object light wave and plane reference light wave, be recorded in holographic material
Again, pure position phase
be loaded into SLM, U
2be recorded in holographic material by same mode
then I=I
1+ I
2;
Finally, after the fixing bleaching process of chemical development, manufacture the hologram diffraction optical element needed.
2. a method for making for arbitrary structures diffraction optical element, is characterized in that comprising the following steps:
Step one, two phase boards, respectively as input face P1 and input face P2, are respectively by resolving the phase place obtaining input face P1 and input face P2 respectively
with
level crossing is as output face P3, and described input face P1 is vertical with input face P2 to be arranged, and arranges beam splitter in the normal intersection of input face P1 and input face P2, plane wave illumination input face P1 and P2, is modulated into wavefront and is
with
light wave, if A
01=A
02=1, by beam splitter, two-beam can be expressed as Ae at plane output face P3 place
ia=U
1+ U
2,
Wherein
frT{...} refer to parallel approximate under fresnel diffraction or Fraunhofer diffraction, obtaining PHASE DISTRIBUTION is
Wherein, ξ=FrT
-1{ Ae
ia, ang (...) refers to and asks argument, obtains according to parsing
with
obtain Ae
ia,
Suppose that the structure needing the diffraction optical element manufactured is P (x, y), if P (x, y)=cI ' (x, y), wherein c is constant,
Order
thus make the diffraction optical element of this structure;
Step 2, the light beam sent from laser instrument become plane wave through beam splitter and collimation lens, and light beam is as with reference to light R, and another bundle, by the modulation of pure phase space light, becomes Object light wave.The optical strength distribution of record can be written as
I(x，y)∝<O(x，y)·R*(x，y)> (2)
Wherein O (x, y) and R (x, y) is respectively the complex amplitude of Object light wave and reference light wave.Subscript * represents conjugation.Suppose that R (x, y) is for plane wave, then R (x, y)=e
-ikr, complicated Object light wave O (x, y) calculates two position phases by formula (1);
Finally, pure position phase
be loaded on SLM, U
1by the interference of Object light wave and plane reference light wave, be recorded in holographic material
pure position phase
be loaded into SLM, U
2be recorded in holographic material by same mode
then I=I
1+ I
2, after the fixing bleaching process of chemical development, namely produce hologram diffraction optical element.
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|---|---|---|---|
| CN201410539223.5A CN104280801A (en) | 2014-09-27 | 2014-09-27 | Manufacturing method for diffraction optical element of any structure |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410539223.5A CN104280801A (en) | 2014-09-27 | 2014-09-27 | Manufacturing method for diffraction optical element of any structure |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104614969A (en) * | 2015-01-21 | 2015-05-13 | 佛山市智海星空科技有限公司 | Manufacturing system and method of diffraction optical element of any structure |
| CN108152949A (en) * | 2017-11-23 | 2018-06-12 | 北京理工大学 | The design method and device of a kind of diffraction optical element |
| CN110048293A (en) * | 2018-11-16 | 2019-07-23 | 哈尔滨工业大学（威海） | To the device and control method of distortion femto-second laser pulse synchronizing focus shaping |
| WO2020164346A1 (en) * | 2019-02-14 | 2020-08-20 | 杭州驭光光电科技有限公司 | Beam-splitting optical module and manufacturing method therefor |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1123452A (en) * | 1997-07-08 | 1999-01-29 | Shimadzu Corp | Diffraction interference measuring device |
| CN1308761A (en) * | 1998-05-05 | 2001-08-15 | 奥普蒂林克有限公司 | System and method for recording of information on a holographic recording medium, preferably an optical card |
| CN1415083A (en) * | 2000-01-04 | 2003-04-30 | Ut-巴特勒有限责任公司 | Improvements to acquistion and replay system for direct-to-digital holography and holovision |
| CN1563881A (en) * | 2004-04-01 | 2005-01-12 | 中国科学院上海光学精密机械研究所 | Phase difference amplifying device of combined interferometer |
| CN2748950Y (en) * | 2004-11-03 | 2005-12-28 | 中国科学院上海光学精密机械研究所 | Device for making variable-pitch holographic grating |
| CN1737612A (en) * | 2005-09-08 | 2006-02-22 | 上海交通大学 | Method for making grating strain floriation |
| JP2012008255A (en) * | 2010-06-23 | 2012-01-12 | Fujifilm Corp | Polarizing plate and display device with touch panel function |
-
2014
- 2014-09-27 CN CN201410539223.5A patent/CN104280801A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1123452A (en) * | 1997-07-08 | 1999-01-29 | Shimadzu Corp | Diffraction interference measuring device |
| CN1308761A (en) * | 1998-05-05 | 2001-08-15 | 奥普蒂林克有限公司 | System and method for recording of information on a holographic recording medium, preferably an optical card |
| CN1415083A (en) * | 2000-01-04 | 2003-04-30 | Ut-巴特勒有限责任公司 | Improvements to acquistion and replay system for direct-to-digital holography and holovision |
| CN1563881A (en) * | 2004-04-01 | 2005-01-12 | 中国科学院上海光学精密机械研究所 | Phase difference amplifying device of combined interferometer |
| CN2748950Y (en) * | 2004-11-03 | 2005-12-28 | 中国科学院上海光学精密机械研究所 | Device for making variable-pitch holographic grating |
| CN1737612A (en) * | 2005-09-08 | 2006-02-22 | 上海交通大学 | Method for making grating strain floriation |
| JP2012008255A (en) * | 2010-06-23 | 2012-01-12 | Fujifilm Corp | Polarizing plate and display device with touch panel function |
Non-Patent Citations (3)
| Title |
|---|
| JUNCHANG LI, ETC.: "A Detective Study on the Paraxial Digital Holography to Acquire the Amplitude and Phase Simultaneously", 《IEEE-INTERNATIONAL CONFERENCE ON INFORMATION ACQUISITION》 * |
| 何文奇 等: "一种基于双光束干涉的分级身份认证方法", 《物理学报》 * |
| 袁操今，翟宏琛: "利用相位模板实现数字全息超分辨成像", 《光子学报》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104614969A (en) * | 2015-01-21 | 2015-05-13 | 佛山市智海星空科技有限公司 | Manufacturing system and method of diffraction optical element of any structure |
| CN108152949A (en) * | 2017-11-23 | 2018-06-12 | 北京理工大学 | The design method and device of a kind of diffraction optical element |
| CN110048293A (en) * | 2018-11-16 | 2019-07-23 | 哈尔滨工业大学（威海） | To the device and control method of distortion femto-second laser pulse synchronizing focus shaping |
| WO2020164346A1 (en) * | 2019-02-14 | 2020-08-20 | 杭州驭光光电科技有限公司 | Beam-splitting optical module and manufacturing method therefor |
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Application publication date: 20150114 |