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AU2001265057A1 - Apparatus and method for improving electron acceleration - Google Patents

Apparatus and method for improving electron acceleration

Info

Publication number
AU2001265057A1
AU2001265057A1 AU2001265057A AU6505701A AU2001265057A1 AU 2001265057 A1 AU2001265057 A1 AU 2001265057A1 AU 2001265057 A AU2001265057 A AU 2001265057A AU 6505701 A AU6505701 A AU 6505701A AU 2001265057 A1 AU2001265057 A1 AU 2001265057A1
Authority
AU
Australia
Prior art keywords
electron acceleration
improving electron
improving
acceleration
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001265057A
Inventor
Jovan Jevtic
Wayne L. Johnson
Bill H. Quon
Thomas H. Windhorn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2001265057A1 publication Critical patent/AU2001265057A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H01J37/32706—Polarising the substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
AU2001265057A 2000-06-02 2001-05-29 Apparatus and method for improving electron acceleration Abandoned AU2001265057A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US20856800P 2000-06-02 2000-06-02
US60208568 2000-06-02
PCT/US2001/017190 WO2001095352A2 (en) 2000-06-02 2001-05-29 Apparatus and method for accelerating electrons in a plasma reactor

Publications (1)

Publication Number Publication Date
AU2001265057A1 true AU2001265057A1 (en) 2001-12-17

Family

ID=22775074

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001265057A Abandoned AU2001265057A1 (en) 2000-06-02 2001-05-29 Apparatus and method for improving electron acceleration

Country Status (4)

Country Link
JP (1) JP2003536250A (en)
AU (1) AU2001265057A1 (en)
TW (1) TW506012B (en)
WO (1) WO2001095352A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4388287B2 (en) * 2003-02-12 2009-12-24 東京エレクトロン株式会社 Plasma processing apparatus and high-frequency power supply apparatus
CN101989525A (en) * 2009-08-05 2011-03-23 中微半导体设备(上海)有限公司 Plasma processing cavity and switchable matching network with switchable offset frequency
JP7250663B2 (en) * 2018-12-19 2023-04-03 東京エレクトロン株式会社 Plasma processing apparatus and impedance matching method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2543642B2 (en) * 1991-01-18 1996-10-16 アプライド マテリアルズ インコーポレイテッド System and method for treating a workpiece having high frequency alternating current electrical energy and relatively low frequency alternating current electrical energy
KR100226366B1 (en) * 1995-08-23 1999-10-15 아끼구사 나오유끼 Plasma equipment and plasma processing method
JPH10270419A (en) * 1997-03-24 1998-10-09 Hitachi Ltd Plasma etching apparatus and method

Also Published As

Publication number Publication date
TW506012B (en) 2002-10-11
WO2001095352A3 (en) 2002-05-30
WO2001095352A2 (en) 2001-12-13
JP2003536250A (en) 2003-12-02

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