AU2001243289A1 - Method and apparatus for mixed-mode optical proximity correction - Google Patents
Method and apparatus for mixed-mode optical proximity correctionInfo
- Publication number
- AU2001243289A1 AU2001243289A1 AU2001243289A AU4328901A AU2001243289A1 AU 2001243289 A1 AU2001243289 A1 AU 2001243289A1 AU 2001243289 A AU2001243289 A AU 2001243289A AU 4328901 A AU4328901 A AU 4328901A AU 2001243289 A1 AU2001243289 A1 AU 2001243289A1
- Authority
- AU
- Australia
- Prior art keywords
- mixed
- mode optical
- optical proximity
- proximity correction
- correction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Theoretical Computer Science (AREA)
- Evolutionary Computation (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Semiconductor Lasers (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/514,551 US6584609B1 (en) | 2000-02-28 | 2000-02-28 | Method and apparatus for mixed-mode optical proximity correction |
| US09514551 | 2000-02-28 | ||
| PCT/US2001/006144 WO2001065315A2 (en) | 2000-02-28 | 2001-02-26 | Method and apparatus for mixed-mode optical proximity correction |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001243289A1 true AU2001243289A1 (en) | 2001-09-12 |
Family
ID=24047688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001243289A Abandoned AU2001243289A1 (en) | 2000-02-28 | 2001-02-26 | Method and apparatus for mixed-mode optical proximity correction |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US6584609B1 (en) |
| EP (1) | EP1264213B1 (en) |
| JP (1) | JP4947533B2 (en) |
| AU (1) | AU2001243289A1 (en) |
| WO (1) | WO2001065315A2 (en) |
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| US6370679B1 (en) | 1997-09-17 | 2002-04-09 | Numerical Technologies, Inc. | Data hierarchy layout correction and verification method and apparatus |
| US6243855B1 (en) * | 1997-09-30 | 2001-06-05 | Kabushiki Kaisha Toshiba | Mask data design method |
| US5958635A (en) | 1997-10-20 | 1999-09-28 | Motorola, Inc. | Lithographic proximity correction through subset feature modification |
| JP3101594B2 (en) | 1997-11-06 | 2000-10-23 | キヤノン株式会社 | Exposure method and exposure apparatus |
| US6114071A (en) | 1997-11-24 | 2000-09-05 | Asml Masktools Netherlands B.V. | Method of fine feature edge tuning with optically-halftoned mask |
| US6081658A (en) | 1997-12-31 | 2000-06-27 | Avant! Corporation | Proximity correction system for wafer lithography |
| JP2002501634A (en) | 1998-03-17 | 2002-01-15 | エーエスエムエル マスクツールズ ネザーランズ ビー．ヴィ． | Method of forming linear pattern of less than quarter exposure wavelength using high transmittance halftone phase shift mask |
| JP2000020564A (en) | 1998-06-29 | 2000-01-21 | Mitsubishi Electric Corp | Device for correcting layout pattern data, method for correcting layout pattern data, manufacture of semiconductor device using the method, and recording medium having recorded manufacturing program of semiconductor device thereon |
| JP3241010B2 (en) | 1998-11-18 | 2001-12-25 | 日本電気株式会社 | Optical proximity correction method for semiconductor manufacturing process |
| JP2000162758A (en) * | 1998-11-30 | 2000-06-16 | Matsushita Electric Ind Co Ltd | Method for correcting optical proximity effect |
| US6301697B1 (en) | 1999-04-30 | 2001-10-09 | Nicolas B. Cobb | Streamlined IC mask layout optical and process correction through correction reuse |
| US6249904B1 (en) * | 1999-04-30 | 2001-06-19 | Nicolas Bailey Cobb | Method and apparatus for submicron IC design using edge fragment tagging to correct edge placement distortion |
| US6467076B1 (en) * | 1999-04-30 | 2002-10-15 | Nicolas Bailey Cobb | Method and apparatus for submicron IC design |
-
2000
- 2000-02-28 US US09/514,551 patent/US6584609B1/en not_active Expired - Lifetime
-
2001
- 2001-02-26 WO PCT/US2001/006144 patent/WO2001065315A2/en active Application Filing
- 2001-02-26 EP EP01916242.9A patent/EP1264213B1/en not_active Expired - Lifetime
- 2001-02-26 JP JP2001563954A patent/JP4947533B2/en not_active Expired - Lifetime
- 2001-02-26 AU AU2001243289A patent/AU2001243289A1/en not_active Abandoned
-
2002
- 2002-12-20 US US10/327,454 patent/US6988259B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP1264213A2 (en) | 2002-12-11 |
| US20030097647A1 (en) | 2003-05-22 |
| WO2001065315A3 (en) | 2002-04-04 |
| WO2001065315A2 (en) | 2001-09-07 |
| EP1264213B1 (en) | 2015-09-23 |
| US6988259B2 (en) | 2006-01-17 |
| US6584609B1 (en) | 2003-06-24 |
| JP2003525470A (en) | 2003-08-26 |
| JP4947533B2 (en) | 2012-06-06 |
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