ATE514095T1 - Volumenlebensdauermessung - Google Patents
VolumenlebensdauermessungInfo
- Publication number
- ATE514095T1 ATE514095T1 AT07291091T AT07291091T ATE514095T1 AT E514095 T1 ATE514095 T1 AT E514095T1 AT 07291091 T AT07291091 T AT 07291091T AT 07291091 T AT07291091 T AT 07291091T AT E514095 T1 ATE514095 T1 AT E514095T1
- Authority
- AT
- Austria
- Prior art keywords
- semiconductor structure
- measuring
- measuring position
- microwave
- measuring probe
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/265—Contactless testing
- G01R31/2656—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2648—Characterising semiconductor materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07291091A EP2037288B1 (de) | 2007-09-11 | 2007-09-11 | Volumenlebensdauermessung |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE514095T1 true ATE514095T1 (de) | 2011-07-15 |
Family
ID=39204756
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT07291091T ATE514095T1 (de) | 2007-09-11 | 2007-09-11 | Volumenlebensdauermessung |
Country Status (7)
Country | Link |
---|---|
US (1) | US8008929B2 (de) |
EP (1) | EP2037288B1 (de) |
JP (1) | JP4990397B2 (de) |
KR (1) | KR101138701B1 (de) |
CN (1) | CN101802629B (de) |
AT (1) | ATE514095T1 (de) |
WO (1) | WO2009033629A1 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5686348B2 (ja) * | 2010-02-15 | 2015-03-18 | 国立大学法人東京農工大学 | 光誘起キャリアライフタイム測定方法、光入射効率測定方法、光誘起キャリアライフタイム測定装置、および光入射効率測定装置 |
US8912799B2 (en) * | 2011-11-10 | 2014-12-16 | Semiconductor Physics Laboratory Co., Ltd. | Accurate measurement of excess carrier lifetime using carrier decay method |
CN102736011B (zh) * | 2012-07-10 | 2014-05-07 | 中国科学院微电子研究所 | 确定AlGaN/GaN基异质结沟道载流子寿命的方法 |
FR3000549B1 (fr) | 2012-12-27 | 2015-04-24 | Centre Nat Rech Scient | Procede et dispositif pour caracteriser un milieu fluide a l'aide d'un substrat semi-conducteur |
US20140199822A1 (en) * | 2013-01-15 | 2014-07-17 | Micron Technology, Inc. | Methods of forming semiconductor device structures including an insulative material on a semiconductive material, and related semiconductor device structures and semiconductor devices |
JP6080101B2 (ja) | 2013-02-15 | 2017-02-15 | 信越半導体株式会社 | シリコン基板の再結合ライフタイム測定方法 |
US20140253137A1 (en) * | 2013-03-08 | 2014-09-11 | Macronix International Co., Ltd. | Test pattern design for semiconductor devices and method of utilizing thereof |
EP2851696B1 (de) | 2013-09-24 | 2016-04-20 | Imec | Verfahren zur Extraktion von Rekombinationsmerkmalen an metallisierten Halbleiteroberflächen |
CN103743950B (zh) * | 2013-12-27 | 2017-01-11 | 安徽省大富重工技术有限公司 | 一种天线相位的测试系统 |
CN103884977B (zh) * | 2014-03-06 | 2016-02-17 | 北京大学 | 一种预测半导体器件nbti寿命及其涨落的方法 |
CN103901335B (zh) * | 2014-04-22 | 2016-03-30 | 哈尔滨工业大学 | 一种半导体少数载流子寿命分布的红外偏振光学成像检测方法与系统 |
CN104101855A (zh) * | 2014-07-24 | 2014-10-15 | 上海华力微电子有限公司 | 监控探针卡漏电的方法及探针卡漏电监控系统 |
JP2016046352A (ja) * | 2014-08-21 | 2016-04-04 | 株式会社東芝 | 半導体デバイス検査装置、半導体デバイス検査方法および半導体デバイス製造方法 |
CN104266960B (zh) * | 2014-10-09 | 2017-09-15 | 广州市昆德科技有限公司 | 扫描式微波反射法载流子复合寿命测试系统及测试方法 |
JP6704275B2 (ja) * | 2016-03-28 | 2020-06-03 | 株式会社ディスコ | デバイスウエーハの評価方法 |
CN107868981B (zh) * | 2016-09-28 | 2020-09-29 | 清华大学 | 一种金属铂的半金属化合物及其制备方法 |
CN112366146A (zh) * | 2020-11-05 | 2021-02-12 | 天津中环领先材料技术有限公司 | 一种晶圆片的寿命测试方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4218143A (en) * | 1979-01-22 | 1980-08-19 | The United States Of America As Represented By The Secretary Of The Navy | Lattice matching measurement device |
US4809196A (en) * | 1986-04-10 | 1989-02-28 | International Business Machines Corporation | Method for designating/sorting semiconductor wafers according to predicted oxygen precipitation behavior |
JP2702807B2 (ja) * | 1990-08-09 | 1998-01-26 | 東芝セラミックス株式会社 | 半導体中の深い不純物準位の測定方法及びその装置 |
US5406214A (en) * | 1990-12-17 | 1995-04-11 | Semilab Felvezeto Fizikai Lab, Rt | Method and apparatus for measuring minority carrier lifetime in semiconductor materials |
CN1063159A (zh) * | 1992-01-23 | 1992-07-29 | 中国科学院上海技术物理研究所 | 测量半导体非平衡载流子寿命的新方法 |
JPH06151538A (ja) * | 1992-02-03 | 1994-05-31 | Leo Giken:Kk | 半導体ウエハの評価方法及びその装置 |
JPH077060A (ja) * | 1993-06-18 | 1995-01-10 | Fujitsu Ltd | 半導体装置の評価方法及び装置 |
JP3670051B2 (ja) * | 1995-06-06 | 2005-07-13 | 株式会社神戸製鋼所 | 半導体試料のキャリアのライフタイム測定方法及びその装置 |
US6346821B1 (en) * | 1998-03-27 | 2002-02-12 | Infineon Technologies Ag | Method for nondestructive measurement of minority carrier diffusion length and minority carrier lifetime in semiconductor devices |
HU227170B1 (en) * | 2000-02-17 | 2010-09-28 | Semilab Felvezetoe Fiz Lab Rt | Surface passivation method and arrangement for measuring life time of minority carrier of semiconductors |
JP4020810B2 (ja) * | 2002-03-29 | 2007-12-12 | 株式会社神戸製鋼所 | 半導体キャリアの寿命測定装置,その方法 |
-
2007
- 2007-09-11 AT AT07291091T patent/ATE514095T1/de not_active IP Right Cessation
- 2007-09-11 EP EP07291091A patent/EP2037288B1/de active Active
-
2008
- 2008-09-08 WO PCT/EP2008/007340 patent/WO2009033629A1/en active Application Filing
- 2008-09-08 CN CN200880106589.6A patent/CN101802629B/zh active Active
- 2008-09-08 JP JP2010523337A patent/JP4990397B2/ja active Active
- 2008-09-08 US US12/670,080 patent/US8008929B2/en active Active
- 2008-09-08 KR KR1020107007585A patent/KR101138701B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP2037288B1 (de) | 2011-06-22 |
US20100188094A1 (en) | 2010-07-29 |
EP2037288A1 (de) | 2009-03-18 |
CN101802629A (zh) | 2010-08-11 |
US8008929B2 (en) | 2011-08-30 |
KR101138701B1 (ko) | 2012-04-19 |
KR20100057079A (ko) | 2010-05-28 |
CN101802629B (zh) | 2014-01-22 |
WO2009033629A1 (en) | 2009-03-19 |
JP2010539678A (ja) | 2010-12-16 |
JP4990397B2 (ja) | 2012-08-01 |
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Legal Events
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RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |