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ATE507506T1 - Flachdruckplattenvorläufer - Google Patents

Flachdruckplattenvorläufer

Info

Publication number
ATE507506T1
ATE507506T1 AT08750299T AT08750299T ATE507506T1 AT E507506 T1 ATE507506 T1 AT E507506T1 AT 08750299 T AT08750299 T AT 08750299T AT 08750299 T AT08750299 T AT 08750299T AT E507506 T1 ATE507506 T1 AT E507506T1
Authority
AT
Austria
Prior art keywords
plate precursor
flat plate
mszw
sensitizers
mixture
Prior art date
Application number
AT08750299T
Other languages
English (en)
Inventor
Jan Venneman
Peter Hendrikx
Paul Callant
Alexander Williamson
Original Assignee
Agfa Graphics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Graphics Nv filed Critical Agfa Graphics Nv
Application granted granted Critical
Publication of ATE507506T1 publication Critical patent/ATE507506T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Insulating Materials (AREA)
  • Electric Double-Layer Capacitors Or The Like (AREA)
  • Secondary Cells (AREA)
AT08750299T 2007-05-25 2008-05-15 Flachdruckplattenvorläufer ATE507506T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US94010107P 2007-05-25 2007-05-25
EP07108955 2007-05-25
PCT/EP2008/055954 WO2008145530A1 (en) 2007-05-25 2008-05-15 A lithographic printing plate precursor

Publications (1)

Publication Number Publication Date
ATE507506T1 true ATE507506T1 (de) 2011-05-15

Family

ID=38663059

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08750299T ATE507506T1 (de) 2007-05-25 2008-05-15 Flachdruckplattenvorläufer

Country Status (9)

Country Link
US (1) US20100104980A1 (de)
EP (1) EP2153280B1 (de)
CN (1) CN101681105B (de)
AT (1) ATE507506T1 (de)
BR (1) BRPI0811195A2 (de)
DE (1) DE602008006548D1 (de)
ES (1) ES2362956T3 (de)
PL (1) PL2153280T3 (de)
WO (1) WO2008145530A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100248150A1 (en) * 2007-12-19 2010-09-30 Agfa Graphics Nv Method for preparing lithographic printing plate precursors
JP5449866B2 (ja) 2009-05-29 2014-03-19 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
EP2290447A1 (de) 2009-08-25 2011-03-02 Agfa Graphics N.V. Satz zur Entwicklung einer Lithografiedruckplatte
EP3327088A1 (de) 2016-11-28 2018-05-30 Agfa-Gevaert Nv Mehrfarbiges laseraufzeichnungsverfahren
EP3392709A1 (de) 2017-04-21 2018-10-24 Agfa Nv Lithografiedruckplattenvorläufer

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3830914A1 (de) * 1988-09-10 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von kopien
US5202221A (en) * 1988-11-11 1993-04-13 Fuji Photo Film Co., Ltd. Light-sensitive composition
US5609992A (en) * 1994-11-01 1997-03-11 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US5759742A (en) * 1996-09-25 1998-06-02 Eastman Kodak Company Photosensitive element having integral thermally bleachable mask and method of use
US6335144B1 (en) * 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
JP4105371B2 (ja) * 2000-07-28 2008-06-25 富士フイルム株式会社 ネガ型感光性平版印刷版
DE10307453B4 (de) * 2003-02-21 2005-07-21 Kodak Polychrome Graphics Gmbh Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
EP1668417B1 (de) * 2003-09-22 2009-05-13 Agfa Graphics N.V. Photopolymerisierbare zusammensetzung.
JP4439327B2 (ja) * 2004-04-30 2010-03-24 富士フイルム株式会社 平版印刷版用原版
EP1751625B9 (de) * 2004-05-19 2012-03-14 Agfa Graphics N.V. Verfahren zur herstellung einer fotopolymer-druckplatte
DE602004011046T2 (de) * 2004-07-30 2009-01-02 Agfa Graphics N.V. Divinylfluorene
CN101095083B (zh) * 2004-11-05 2011-04-13 爱克发印艺公司 可光聚合的组合物
JP4792326B2 (ja) * 2005-07-25 2011-10-12 富士フイルム株式会社 平版印刷版の作製方法および平版印刷版原版
ATE445861T1 (de) * 2005-08-26 2009-10-15 Agfa Graphics Nv Photopolymer druckplattenvorläufer

Also Published As

Publication number Publication date
DE602008006548D1 (de) 2011-06-09
BRPI0811195A2 (pt) 2014-10-29
CN101681105A (zh) 2010-03-24
US20100104980A1 (en) 2010-04-29
EP2153280B1 (de) 2011-04-27
WO2008145530A1 (en) 2008-12-04
EP2153280A1 (de) 2010-02-17
ES2362956T3 (es) 2011-07-15
PL2153280T3 (pl) 2011-09-30
CN101681105B (zh) 2012-12-05

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