ATE384335T1 - Chipbefestigung - Google Patents
ChipbefestigungInfo
- Publication number
- ATE384335T1 ATE384335T1 AT04740528T AT04740528T ATE384335T1 AT E384335 T1 ATE384335 T1 AT E384335T1 AT 04740528 T AT04740528 T AT 04740528T AT 04740528 T AT04740528 T AT 04740528T AT E384335 T1 ATE384335 T1 AT E384335T1
- Authority
- AT
- Austria
- Prior art keywords
- adhesive layer
- carrier tape
- die
- singulated
- cured
- Prior art date
Links
- 239000012790 adhesive layer Substances 0.000 abstract 7
- 239000000758 substrate Substances 0.000 abstract 2
- 230000032798 delamination Effects 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/7806—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/27—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/274—Manufacturing methods by blanket deposition of the material of the layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83191—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on the semiconductor or solid-state body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Dicing (AREA)
- Die Bonding (AREA)
- Laser Beam Processing (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0315623A GB2404280B (en) | 2003-07-03 | 2003-07-03 | Die bonding |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE384335T1 true ATE384335T1 (de) | 2008-02-15 |
Family
ID=27741543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04740528T ATE384335T1 (de) | 2003-07-03 | 2004-07-01 | Chipbefestigung |
Country Status (11)
Country | Link |
---|---|
US (1) | US7989320B2 (de) |
EP (1) | EP1642332B1 (de) |
JP (1) | JP4625804B2 (de) |
KR (1) | KR101167894B1 (de) |
CN (1) | CN1816908B (de) |
AT (1) | ATE384335T1 (de) |
DE (1) | DE602004011343T2 (de) |
GB (1) | GB2404280B (de) |
MY (1) | MY141475A (de) |
TW (1) | TWI245376B (de) |
WO (1) | WO2005004226A1 (de) |
Families Citing this family (27)
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JP4659300B2 (ja) | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップの製造方法 |
US6676878B2 (en) | 2001-01-31 | 2004-01-13 | Electro Scientific Industries, Inc. | Laser segmented cutting |
AU2003211581A1 (en) * | 2002-03-12 | 2003-09-22 | Hamamatsu Photonics K.K. | Method of cutting processed object |
TWI326626B (en) | 2002-03-12 | 2010-07-01 | Hamamatsu Photonics Kk | Laser processing method |
CN100485901C (zh) | 2002-03-12 | 2009-05-06 | 浜松光子学株式会社 | 基板的分割方法 |
TWI520269B (zh) | 2002-12-03 | 2016-02-01 | Hamamatsu Photonics Kk | Cutting method of semiconductor substrate |
US8685838B2 (en) | 2003-03-12 | 2014-04-01 | Hamamatsu Photonics K.K. | Laser beam machining method |
JP4532358B2 (ja) * | 2005-06-15 | 2010-08-25 | 株式会社ディスコ | 半導体チップの製造方法 |
DE102005048153B4 (de) | 2005-10-06 | 2010-08-05 | Infineon Technologies Ag | Verfahren zur Herstellung eines Halbleiterbauteils mit Halbleiterchip und Klebstofffolie |
DE102005048826B3 (de) * | 2005-10-10 | 2007-04-12 | Infineon Technologies Ag | Halbleiterbauteil mit Halbleiterchip und Klebstofffolie und Verfahren zur Herstellung des Halbleiterchips und Halbleiterbauteils |
DE102005050127B3 (de) * | 2005-10-18 | 2007-05-16 | Infineon Technologies Ag | Verfahren zum Aufbringen einer Struktur aus Fügematerial auf die Rückseiten von Halbleiterchips |
JP2008235398A (ja) * | 2007-03-19 | 2008-10-02 | Disco Abrasive Syst Ltd | デバイスの製造方法 |
GB2458475B (en) * | 2008-03-18 | 2011-10-26 | Xsil Technology Ltd | Processing of multilayer semiconductor wafers |
JP2009231779A (ja) * | 2008-03-25 | 2009-10-08 | Lintec Corp | 半導体装置の製造方法 |
US20100167471A1 (en) | 2008-12-30 | 2010-07-01 | Stmicroelectronics Asia Pacific Pte. Ltd. | Reducing warpage for fan-out wafer level packaging |
US20110156239A1 (en) * | 2009-12-29 | 2011-06-30 | Stmicroelectronics Asia Pacific Pte Ltd. | Method for manufacturing a fan-out embedded panel level package |
US8502367B2 (en) | 2010-09-29 | 2013-08-06 | Stmicroelectronics Pte Ltd. | Wafer-level packaging method using composite material as a base |
US20160133486A1 (en) | 2014-11-07 | 2016-05-12 | International Business Machines Corporation | Double Layer Release Temporary Bond and Debond Processes and Systems |
US10475764B2 (en) * | 2014-12-26 | 2019-11-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Die bonder and methods of using the same |
JP6726215B2 (ja) * | 2015-04-28 | 2020-07-22 | ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー | フラッシュランプおよびマスクを使用して複数のチップをはんだ付けするための装置および方法 |
KR102194727B1 (ko) * | 2015-04-29 | 2020-12-23 | 삼성전기주식회사 | 인덕터 |
KR101797728B1 (ko) | 2016-03-11 | 2017-11-16 | 삼성디스플레이 주식회사 | 디스플레이 장치 |
US10269756B2 (en) * | 2017-04-21 | 2019-04-23 | Invensas Bonding Technologies, Inc. | Die processing |
US10607861B2 (en) | 2017-11-28 | 2020-03-31 | Nxp B.V. | Die separation using adhesive-layer laser scribing |
US10727219B2 (en) | 2018-02-15 | 2020-07-28 | Invensas Bonding Technologies, Inc. | Techniques for processing devices |
US11742314B2 (en) | 2020-03-31 | 2023-08-29 | Adeia Semiconductor Bonding Technologies Inc. | Reliable hybrid bonded apparatus |
CN113784513A (zh) * | 2021-08-10 | 2021-12-10 | 信维通信(江苏)有限公司 | 一种线路板成型方法 |
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-
2003
- 2003-07-03 GB GB0315623A patent/GB2404280B/en not_active Expired - Lifetime
-
2004
- 2004-06-30 TW TW093119635A patent/TWI245376B/zh not_active IP Right Cessation
- 2004-07-01 US US10/561,883 patent/US7989320B2/en not_active Expired - Fee Related
- 2004-07-01 EP EP04740528A patent/EP1642332B1/de not_active Expired - Lifetime
- 2004-07-01 DE DE602004011343T patent/DE602004011343T2/de not_active Expired - Lifetime
- 2004-07-01 CN CN2004800188867A patent/CN1816908B/zh not_active Expired - Fee Related
- 2004-07-01 MY MYPI20042629A patent/MY141475A/en unknown
- 2004-07-01 KR KR1020067000162A patent/KR101167894B1/ko not_active IP Right Cessation
- 2004-07-01 WO PCT/EP2004/007161 patent/WO2005004226A1/en active IP Right Grant
- 2004-07-01 AT AT04740528T patent/ATE384335T1/de active
- 2004-07-01 JP JP2006516088A patent/JP4625804B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW200504948A (en) | 2005-02-01 |
KR20060023196A (ko) | 2006-03-13 |
GB0315623D0 (en) | 2003-08-13 |
JP4625804B2 (ja) | 2011-02-02 |
KR101167894B1 (ko) | 2012-07-30 |
TWI245376B (en) | 2005-12-11 |
EP1642332B1 (de) | 2008-01-16 |
US7989320B2 (en) | 2011-08-02 |
WO2005004226B1 (en) | 2005-03-03 |
US20070224733A1 (en) | 2007-09-27 |
GB2404280A (en) | 2005-01-26 |
DE602004011343D1 (de) | 2008-03-06 |
CN1816908B (zh) | 2010-06-16 |
EP1642332A1 (de) | 2006-04-05 |
DE602004011343T2 (de) | 2008-12-24 |
MY141475A (en) | 2010-04-30 |
CN1816908A (zh) | 2006-08-09 |
WO2005004226A1 (en) | 2005-01-13 |
JP2009514185A (ja) | 2009-04-02 |
GB2404280B (en) | 2006-09-27 |
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