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ATE376710T1 - LASER WITH AUTOMATED CONTROL OF BEAM QUALITY - Google Patents

LASER WITH AUTOMATED CONTROL OF BEAM QUALITY

Info

Publication number
ATE376710T1
ATE376710T1 AT00102800T AT00102800T ATE376710T1 AT E376710 T1 ATE376710 T1 AT E376710T1 AT 00102800 T AT00102800 T AT 00102800T AT 00102800 T AT00102800 T AT 00102800T AT E376710 T1 ATE376710 T1 AT E376710T1
Authority
AT
Austria
Prior art keywords
laser
automatic
bandwidth
wavelength
pulse energy
Prior art date
Application number
AT00102800T
Other languages
German (de)
Inventor
Frederic G Erie
Jesse D Buck
Palash P Das
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/248,466 external-priority patent/US6094448A/en
Application filed by Cymer Inc filed Critical Cymer Inc
Application granted granted Critical
Publication of ATE376710T1 publication Critical patent/ATE376710T1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1828—Diffraction gratings having means for producing variable diffraction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08081—Unstable resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1392—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length by using a passive reference, e.g. absorption cell

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laser Beam Processing (AREA)

Abstract

A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage, wavelength by controlling the position of an RMAX mirror in a line narrowing module and bandwidth is controller by adjusting the curvature of a grating in the line narrowing module. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt. <IMAGE>
AT00102800T 1999-02-11 2000-02-10 LASER WITH AUTOMATED CONTROL OF BEAM QUALITY ATE376710T1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/248,466 US6094448A (en) 1997-07-01 1999-02-11 Grating assembly with bi-directional bandwidth control
US09/390,579 US6212217B1 (en) 1997-07-01 1999-09-03 Smart laser with automated beam quality control

Publications (1)

Publication Number Publication Date
ATE376710T1 true ATE376710T1 (en) 2007-11-15

Family

ID=26939374

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00102800T ATE376710T1 (en) 1999-02-11 2000-02-10 LASER WITH AUTOMATED CONTROL OF BEAM QUALITY

Country Status (7)

Country Link
US (1) US6212217B1 (en)
EP (1) EP1028502B1 (en)
JP (1) JP3837005B2 (en)
KR (1) KR100329958B1 (en)
AT (1) ATE376710T1 (en)
DE (1) DE60036828T2 (en)
TW (1) TW447182B (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020127497A1 (en) * 1998-09-10 2002-09-12 Brown Daniel J. W. Large diffraction grating for gas discharge laser
US6493374B1 (en) * 1999-09-03 2002-12-10 Cymer, Inc. Smart laser with fast deformable grating
JP2000208848A (en) * 1999-01-19 2000-07-28 Komatsu Ltd Fixing device for flexure for reflection type wavelength selective element
JP2000205966A (en) * 1999-01-20 2000-07-28 Komatsu Ltd Wavelength measuring apparatus of vacuum ultraviolet laser
US6298080B1 (en) 1999-03-12 2001-10-02 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with adjustable bandwidth
US6700915B2 (en) 1999-03-12 2004-03-02 Lambda Physik Ag Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections
US6865210B2 (en) * 2001-05-03 2005-03-08 Cymer, Inc. Timing control for two-chamber gas discharge laser system
US6882674B2 (en) * 1999-12-27 2005-04-19 Cymer, Inc. Four KHz gas discharge laser system
US6496528B2 (en) * 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
JP2003518757A (en) * 1999-12-22 2003-06-10 サイマー， インコーポレイテッド Narrowing laser using bidirectional beam expansion
JP3357341B2 (en) * 2000-05-19 2002-12-16 知夫 藤岡 Cylindrical straight slab type gas laser
US6603789B1 (en) 2000-07-05 2003-08-05 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with improved beam parameters
US6801561B2 (en) 2000-09-25 2004-10-05 Lambda Physik Ag Laser system and method for spectral narrowing through wavefront correction
US6856638B2 (en) * 2000-10-23 2005-02-15 Lambda Physik Ag Resonator arrangement for bandwidth control
US6839372B2 (en) * 2000-11-17 2005-01-04 Cymer, Inc. Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
US20050286599A1 (en) * 2004-06-29 2005-12-29 Rafac Robert J Method and apparatus for gas discharge laser output light coherency reduction
US20060114956A1 (en) * 2004-11-30 2006-06-01 Sandstrom Richard L High power high pulse repetition rate gas discharge laser system bandwidth management
US7643522B2 (en) * 2004-11-30 2010-01-05 Cymer, Inc. Method and apparatus for gas discharge laser bandwidth and center wavelength control
US7366219B2 (en) 2004-11-30 2008-04-29 Cymer, Inc. Line narrowing module
JP4911558B2 (en) 2005-06-29 2012-04-04 株式会社小松製作所 Narrow band laser equipment
US8379687B2 (en) 2005-06-30 2013-02-19 Cymer, Inc. Gas discharge laser line narrowing module
US7321607B2 (en) * 2005-11-01 2008-01-22 Cymer, Inc. External optics and chamber support system
US8259764B2 (en) 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
GB0920752D0 (en) * 2009-11-26 2010-01-13 Univ St Andrews Laser
CN107968305A (en) * 2017-11-23 2018-04-27 黑龙江工程学院 A kind of four ends pump narrow spaces Solid State Laser generating means
CN115395349B (en) * 2022-10-27 2023-02-03 中国航天三江集团有限公司 Large-aperture laser system and light beam quality diagnosis method thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5025445A (en) * 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
US5095492A (en) 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
US5230005A (en) * 1991-11-05 1993-07-20 The United States Of America As Represented By The Secretary Of The Navy Electronic tuning of a broadband laser
JP3397337B2 (en) * 1992-04-02 2003-04-14 株式会社小松製作所 Narrow band laser device
US5297155A (en) * 1993-03-29 1994-03-22 E-Tek Dynamics, Inc. Tunable laser assembly
US5856991A (en) * 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
ES2195346T3 (en) * 1997-07-01 2003-12-01 Cymer Inc VERY NARROW BAND LASER WITH UNSTABLE RESONANCE CAVITY.
US6055348A (en) * 1998-09-23 2000-04-25 Lucent Technologies Inc. Tunable grating device and optical communication devices and systems comprising same

Also Published As

Publication number Publication date
DE60036828T2 (en) 2008-02-07
JP3837005B2 (en) 2006-10-25
EP1028502A3 (en) 2003-08-27
TW447182B (en) 2001-07-21
KR20000058000A (en) 2000-09-25
KR100329958B1 (en) 2002-03-22
EP1028502A2 (en) 2000-08-16
EP1028502B1 (en) 2007-10-24
DE60036828D1 (en) 2007-12-06
US6212217B1 (en) 2001-04-03
JP2000294864A (en) 2000-10-20

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Legal Events

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