MXPA05011543A - Novedosos fotoiniciadores tri-funcionales. - Google Patents
Novedosos fotoiniciadores tri-funcionales.Info
- Publication number
- MXPA05011543A MXPA05011543A MXPA05011543A MXPA05011543A MXPA05011543A MX PA05011543 A MXPA05011543 A MX PA05011543A MX PA05011543 A MXPA05011543 A MX PA05011543A MX PA05011543 A MXPA05011543 A MX PA05011543A MX PA05011543 A MXPA05011543 A MX PA05011543A
- Authority
- MX
- Mexico
- Prior art keywords
- phenylene
- photoinitiators
- cyclohexanediyl
- novel
- novel trifunctional
- Prior art date
Links
- 229910003849 O-Si Inorganic materials 0.000 abstract 2
- 229910003872 O—Si Inorganic materials 0.000 abstract 2
- -1 cyclohexanediyl Chemical group 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 150000002576 ketones Chemical class 0.000 abstract 1
- 125000004430 oxygen atom Chemical group O* 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/782—Ketones containing a keto group bound to a six-membered aromatic ring polycyclic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
- C07C225/22—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/20—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by nitrogen atoms not being part of nitro or nitroso groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
- C07C45/46—Friedel-Crafts reactions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/63—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of halogen; by substitution of halogen atoms by other halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/64—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of functional groups containing oxygen only in singly bound form
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
- C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
- C07C45/70—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction with functional groups containing oxygen only in singly bound form
- C07C45/71—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction with functional groups containing oxygen only in singly bound form being hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/782—Ketones containing a keto group bound to a six-membered aromatic ring polycyclic
- C07C49/784—Ketones containing a keto group bound to a six-membered aromatic ring polycyclic with all keto groups bound to a non-condensed ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/80—Ketones containing a keto group bound to a six-membered aromatic ring containing halogen
- C07C49/813—Ketones containing a keto group bound to a six-membered aromatic ring containing halogen polycyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
- C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Silicon Polymers (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
La invencion se refiere a cetonas novedosas de las Formulas I y II (ver formulas I y II) en donde R1, R2, R3, y R4, son por ejemplo, C1-C8alquilo, R5 es por ejemplo hidrogeno A es Cl, Br, -O- R7, -NR8R9 or -S-R16, A' es -O-, -NH- o -NR8-, X y Y son independientemente del otro -O-R10, o -N(R11)( R12), n es un entero de 1 hasta 10, R6 es por ejemplo, un radical n-valente de C2-C20alquilo lineal o ramificado, la cadena de carbonos del cual puede estar interrumpida por ciclohexandiil, fenilene, -CH(OH)-, -C(C2H5,)(CH2-CH2OH)-, -C(CH3) (CH2-CH2-OH)-, -C(CH2-CH2-OH)2-, -N(CH3)-, -N(C2H5)-, -N(CH2-CH2-OH)-, -CO-O-, -O-CO-, -P(CH2-CH2-OH)-, -P(O)(CH2-CH2-OH)-, -O-P(O-CH2-CH2-OH)-O-, -O-P(O) (O-CH2-CH2-OH)-O-, -O-ciclohexandiil-C(CH3)2-ciclohexandiil-O-, -O-fenilen-C(CH3)2-fenilen-O-, -O-fenilen-CH2-fenilen-O-, -Si(CH3)2-, -O-Si(CH3)2-O-, -O-Si(CH3)(O-CH3)-O-, -Si(CH3)(R17)-O-Si(CH3)(R18)-, 5-(2-hidroxietil)-[1,3,5]triazinan-2,4,6-trion-1,3-diilo y/o por uno a nueve atomos de oxigeno.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03405318 | 2003-05-06 | ||
PCT/EP2004/050689 WO2004099262A1 (en) | 2003-05-06 | 2004-05-04 | Novel trifunctional photoinitiators |
Publications (1)
Publication Number | Publication Date |
---|---|
MXPA05011543A true MXPA05011543A (es) | 2005-12-14 |
Family
ID=33427278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MXPA05011543A MXPA05011543A (es) | 2003-05-06 | 2004-05-04 | Novedosos fotoiniciadores tri-funcionales. |
Country Status (15)
Country | Link |
---|---|
US (1) | US7462650B2 (es) |
EP (1) | EP1620475B1 (es) |
JP (2) | JP5085930B2 (es) |
KR (1) | KR101201242B1 (es) |
CN (1) | CN1784429B (es) |
AT (1) | ATE448252T1 (es) |
AU (1) | AU2004236436B2 (es) |
BR (1) | BRPI0410118B1 (es) |
CA (1) | CA2522014C (es) |
DE (1) | DE602004024054D1 (es) |
MX (1) | MXPA05011543A (es) |
NZ (1) | NZ543895A (es) |
RU (1) | RU2348652C2 (es) |
TW (1) | TW200508255A (es) |
WO (1) | WO2004099262A1 (es) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MXPA05011543A (es) * | 2003-05-06 | 2005-12-14 | Ciba Sc Holding Ag | Novedosos fotoiniciadores tri-funcionales. |
DE602006019788D1 (de) | 2005-12-01 | 2011-03-03 | Basf Se | Oximester-Fotoinitiatoren |
US8338499B2 (en) | 2006-12-21 | 2012-12-25 | Agfa Graphics Nv | Amine co-initiators for radiation curable compositions |
US8110610B2 (en) | 2006-12-21 | 2012-02-07 | Agfa Graphics N.V. | Amine co-initiators for radiation curable compositions |
EP2129659B1 (en) * | 2007-04-04 | 2013-05-29 | Basf Se | Alpha-hydroxyketones |
EP2139961A1 (en) * | 2007-04-25 | 2010-01-06 | Basf Se | Tinted clear coatings for wood |
WO2009050116A2 (en) * | 2007-10-17 | 2009-04-23 | Basf Se | Adhesion promoting photoinitiators for uv cured coatings over metal surfaces |
JP2010083772A (ja) * | 2008-09-30 | 2010-04-15 | Gc Corp | 歯科用根管充填材組成物 |
WO2010071956A1 (en) | 2008-12-22 | 2010-07-01 | Canadian Bank Note Company, Limited | Improved printing of tactile marks for the visually impaired |
WO2010077132A1 (en) | 2008-12-31 | 2010-07-08 | Draka Comteq B.V. | Uvled apparatus for curing glass-fiber coatings |
WO2010108862A1 (en) | 2009-03-24 | 2010-09-30 | Basf Se | Novel oligofunctional photoinitiators |
RU2572839C2 (ru) * | 2010-02-23 | 2016-01-20 | Колопласт А/С | Полимерные фотоинициаторы |
EP2388239B1 (en) | 2010-05-20 | 2017-02-15 | Draka Comteq B.V. | Curing apparatus employing angled UV-LEDs |
US8871311B2 (en) | 2010-06-03 | 2014-10-28 | Draka Comteq, B.V. | Curing method employing UV sources that emit differing ranges of UV radiation |
DK2418183T3 (en) | 2010-08-10 | 2018-11-12 | Draka Comteq Bv | Method of curing coated glass fibers which provides increased UVLED intensity |
CN103601629B (zh) * | 2010-11-12 | 2015-08-26 | 深圳市有为化学技术有限公司 | 对位或间位官能团化芳香酮类化合物、其制备方法及其光聚合引发剂 |
EP2604663B1 (en) | 2011-12-16 | 2017-08-09 | Agfa Graphics N.V. | Curable liquids and inkjet inks for food packaging applications |
JP6163726B2 (ja) * | 2012-09-28 | 2017-07-19 | 株式会社リコー | 非水系光重合性組成物、インクジェットインク、及びインクカートリッジ |
KR101804646B1 (ko) | 2012-10-19 | 2017-12-04 | 바스프 에스이 | 하이브리드 광개시제 |
JP2015061897A (ja) * | 2013-08-23 | 2015-04-02 | Dicグラフィックス株式会社 | 紫外線硬化型コーティングニス組成物の印刷方法 |
JP2015196765A (ja) * | 2014-04-01 | 2015-11-09 | 東洋インキScホールディングス株式会社 | 活性エネルギー線硬化型ワニス組成物およびその積層物 |
JP2016088969A (ja) * | 2014-10-30 | 2016-05-23 | 横浜ゴム株式会社 | 紫外線硬化性樹脂組成物 |
CN104591991A (zh) * | 2014-12-05 | 2015-05-06 | 沈阳师范大学 | 羟基酮双官能团光引发剂的制备方法 |
US9988539B2 (en) * | 2015-11-12 | 2018-06-05 | Ricoh Company, Ltd. | Active-energy-ray-curable composition, active-energy-ray-curable ink, composition stored container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured material, and structure |
BR112018011683B1 (pt) * | 2015-12-08 | 2021-08-10 | 3M Innovative Properties Company | Kit de partes para uso dental e composição dental autoadesiva, autocurável e autocondicionante para uso dental ou ortodôntico |
PL3263666T3 (pl) * | 2016-06-27 | 2018-12-31 | Evonik Degussa Gmbh | Powłoka oddzielająca uniemożliwiająca przenikanie |
CN106278848A (zh) * | 2016-08-16 | 2017-01-04 | 甘肃金盾化工有限责任公司 | 一种双[4‑(2‑羟基‑2‑甲基丙酰基)苯基]甲烷的生产工艺 |
EP3395793B9 (en) | 2017-04-24 | 2021-09-29 | IGM Group B.V. | Process for the preparation of alpha-functionalized ketones |
US10865219B2 (en) | 2017-06-27 | 2020-12-15 | Borealis Ag | Process for the preparation of bis(acyl)phospinic acid sylyl esters |
US11642841B2 (en) * | 2017-10-13 | 2023-05-09 | Ut-Battelle, Llc | Indirect additive manufacturing process |
CN110563588B (zh) * | 2018-06-06 | 2023-02-17 | 湖北固润科技股份有限公司 | 单或双肉桂酸酯类光引发剂及其制备方法和应用 |
CN110563589B (zh) * | 2018-06-06 | 2023-02-03 | 湖北固润科技股份有限公司 | 单或双肉桂酸甲酯类光引发剂及其制备方法和应用 |
CN109503343B (zh) * | 2018-12-28 | 2022-07-12 | 常州久日化学有限公司 | 一种光引发剂184的制备方法 |
CN109678735B (zh) * | 2018-12-28 | 2022-02-22 | 山东久日化学科技有限公司 | 一种烷基胺原位回收利用技术制备 |
US11254617B2 (en) | 2019-01-09 | 2022-02-22 | Ut-Battelle, Llc | Indirect additive manufacturing process using amine-containing adhesive polymers |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
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US4097538A (en) * | 1977-02-23 | 1978-06-27 | General Electric Company | Dehydrochlorination of a dihydroxydiphenyl trichloroethane |
EP0003002B1 (de) | 1977-12-22 | 1984-06-13 | Ciba-Geigy Ag | Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone |
JPS5499815A (en) * | 1978-01-24 | 1979-08-07 | Kouichi Sasaki | Internal combustion engine system using hydrogen as fuel |
JPS559028A (en) * | 1978-07-06 | 1980-01-22 | Takayuki Shioiri | Novel 3'-(alpha-hydroxybenzyl)-propiophenone and its preparation |
DE3008411A1 (de) * | 1980-03-05 | 1981-09-10 | Merck Patent Gmbh, 6100 Darmstadt | Neue aromatisch-aliphatische ketone, ihre verwendung als photoinitiatoren sowie photopolymerisierbare systeme enthaltend solche ketone |
US5145885A (en) | 1983-08-15 | 1992-09-08 | Ciba-Geigy Corporation | Photopolymerizable compositions containing aminoaryl ketone photoinitiators |
EP0138754B1 (de) | 1983-08-15 | 1988-05-25 | Ciba-Geigy Ag | Photohärtbare Gemische |
JPS6277346A (ja) * | 1985-09-28 | 1987-04-09 | Nippon Oil & Fats Co Ltd | 新規なビスヒドロキシアルキルフエノンおよびそれを有効成分とする光重合開始剤 |
JPH06102698B2 (ja) * | 1990-04-27 | 1994-12-14 | 積水化学工業株式会社 | 光重合性組成物 |
US5506279A (en) * | 1993-10-13 | 1996-04-09 | Minnesota Mining And Manufacturing Company | Acrylamido functional disubstituted acetyl aryl ketone photoinitiators |
GB9522683D0 (en) | 1995-11-06 | 1996-01-10 | Coates Brothers Plc | Photoinitiator |
DE19700064A1 (de) * | 1996-01-13 | 1997-07-17 | Basf Ag | Gele mit thermotropen Eigenschaften |
ATE251605T1 (de) * | 1999-01-12 | 2003-10-15 | Clariant Finance Bvi Ltd | Benzophenone und ihre verwendung als photoinitiatoren |
ATE409708T1 (de) * | 2000-12-13 | 2008-10-15 | Ciba Holding Inc | Oberflächenaktive photoinitiatoren |
TWI312786B (en) * | 2001-11-08 | 2009-08-01 | Ciba Sc Holding Ag | Novel difunctional photoinitiators |
ES2394202T3 (es) * | 2002-07-19 | 2013-01-23 | Basf Se | Nuevos fotoiniciadores bifuncionales |
MXPA05011543A (es) * | 2003-05-06 | 2005-12-14 | Ciba Sc Holding Ag | Novedosos fotoiniciadores tri-funcionales. |
-
2004
- 2004-05-04 MX MXPA05011543A patent/MXPA05011543A/es active IP Right Grant
- 2004-05-04 NZ NZ543895A patent/NZ543895A/en unknown
- 2004-05-04 CN CN2004800119848A patent/CN1784429B/zh not_active Expired - Fee Related
- 2004-05-04 RU RU2005137820/04A patent/RU2348652C2/ru not_active IP Right Cessation
- 2004-05-04 US US10/552,952 patent/US7462650B2/en active Active
- 2004-05-04 EP EP04741507A patent/EP1620475B1/en not_active Expired - Lifetime
- 2004-05-04 BR BRPI0410118-9B1A patent/BRPI0410118B1/pt not_active IP Right Cessation
- 2004-05-04 AU AU2004236436A patent/AU2004236436B2/en not_active Ceased
- 2004-05-04 AT AT04741507T patent/ATE448252T1/de not_active IP Right Cessation
- 2004-05-04 KR KR1020057021069A patent/KR101201242B1/ko not_active IP Right Cessation
- 2004-05-04 WO PCT/EP2004/050689 patent/WO2004099262A1/en active Application Filing
- 2004-05-04 JP JP2006505585A patent/JP5085930B2/ja not_active Expired - Fee Related
- 2004-05-04 CA CA2522014A patent/CA2522014C/en not_active Expired - Fee Related
- 2004-05-04 DE DE602004024054T patent/DE602004024054D1/de not_active Expired - Lifetime
- 2004-05-05 TW TW093112445A patent/TW200508255A/zh unknown
-
2012
- 2012-08-13 JP JP2012179629A patent/JP5763599B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
AU2004236436B2 (en) | 2009-12-03 |
CA2522014A1 (en) | 2004-11-18 |
JP2012237011A (ja) | 2012-12-06 |
KR101201242B1 (ko) | 2012-11-15 |
WO2004099262A1 (en) | 2004-11-18 |
RU2348652C2 (ru) | 2009-03-10 |
KR20060004688A (ko) | 2006-01-12 |
JP2006525399A (ja) | 2006-11-09 |
NZ543895A (en) | 2008-03-28 |
RU2005137820A (ru) | 2006-07-27 |
EP1620475B1 (en) | 2009-11-11 |
TW200508255A (en) | 2005-03-01 |
BRPI0410118A (pt) | 2006-05-23 |
ATE448252T1 (de) | 2009-11-15 |
CN1784429B (zh) | 2010-06-02 |
US20060270748A1 (en) | 2006-11-30 |
JP5085930B2 (ja) | 2012-11-28 |
CA2522014C (en) | 2012-12-18 |
US7462650B2 (en) | 2008-12-09 |
JP5763599B2 (ja) | 2015-08-12 |
DE602004024054D1 (de) | 2009-12-24 |
EP1620475A1 (en) | 2006-02-01 |
AU2004236436A1 (en) | 2004-11-18 |
BRPI0410118B1 (pt) | 2013-12-24 |
CN1784429A (zh) | 2006-06-07 |
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