Nothing Special   »   [go: up one dir, main page]

Graham et al., 2000 - Google Patents

Electrical and optical characterisation of capacitively and inductively coupled GEC reference cells

Graham et al., 2000

Document ID
2624133689022558268
Author
Graham W
Mahony C
Steen P
Publication year
Publication venue
Vacuum

External Links

Snippet

The Gaseous Electronics Conference (GEC) reference cell concept is designed to provide a standard discharge for comparative studies. It exists in both a capacitively and inductively coupled form. The electrical characterisation, by derivative probes, provides an accurate …
Continue reading at www.sciencedirect.com (other versions)

Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H01J37/32706—Polarising the substrate
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/34—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/62—Detectors specially adapted therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means by investigating the ionisation of gases; by investigating electric discharges, e.g. emission of cathode

Similar Documents

Publication Publication Date Title
Godyak et al. Probe measurements of electron-energy distributions in plasmas: what can we measure and how can we achieve reliable results?
Andreev et al. The Langmuir probe measurements in a low-pressure discharge supported by hollow cathode using the combined periodic and noise sweep signals
Dünnbier et al. Stability and excitation dynamics of an argon micro-scaled atmospheric pressure plasma jet
Bletzinger et al. Impedance characteristics of an rf parallel plate discharge and the validity of a simple circuit model
Lazik et al. Electrical and optical characteristics of a radio frequency glow discharge atomic emission source with dielectric sample atomization
Zhao et al. Experimental investigation of standing wave effect in dual-frequency capacitively coupled argon discharges: role of a low-frequency source
Synek et al. Advanced electrical current measurements of microdischarges: evidence of sub-critical pulses and ion currents in barrier discharge in air
Zhao et al. Suppression of nonlinear standing wave excitation via the electrical asymmetry effect
Kechkar et al. Investigation of the electron kinetics in O2 capacitively coupled plasma with the use of a Langmuir probe
Graham et al. Electrical and optical characterisation of capacitively and inductively coupled GEC reference cells
Su et al. Radially-dependent ignition process of a pulsed capacitively coupled RF argon plasma over 300 mm-diameter electrodes: multi-fold experimental diagnostics
Belkin et al. Characterization of helium/argon working gas systems in a radiofrequency glow discharge atomic emission source. Part II: Langmuir probe and emission intensity studies for Al, Cu and Macor samples
Guo et al. Time-resolved current and voltage measurements on a pulsed rf inductively coupled plasma
Sobolewski In situ measurement of electron emission yield at silicon dioxide surfaces exposed to argon plasmas
CN114216808A (en) Gas impurity detection device and detection method
Qayyum et al. Triple probe measurements in transient plasma of pulsed capacitive discharge
Sobolewski Monitoring sheath voltages and ion energies in high-density plasmas using noninvasive radio-frequency current and voltage measurements
Bogaerts et al. Comparison of modeling calculations with experimental results for rf glow discharge optical emission spectrometry
Bogaerts et al. Comparison between a radio-frequency and direct current glow discharge in argon by a hybrid Monte Carlo–fluid model for electrons, argon ions and fast argon atoms
Kudrna et al. Langmuir Probe Diagnostics of a Low Temperature Non‐Isothermal Plasma in a Weak Magnetic Field
Qayyum et al. Swept Langmuir probe investigation of a time varying DC discharge
Zhang et al. Rotational temperature of nitrogen glow discharge obtained by optical emission spectroscopy
Wilken et al. Development of a radio-frequency glow discharge source with integrated voltage and current probes
Barnat et al. RF discharge under the influence of a transverse magnetic field
Wilken et al. Electrical measurements at radio frequency glow discharges for spectroscopy