Nečas et al., 2009 - Google Patents
The reflectance of non-uniform thin filmsNečas et al., 2009
- Document ID
- 2563154163262788417
- Author
- Nečas D
- Ohlídal I
- Franta D
- Publication year
- Publication venue
- Journal of Optics A: Pure and Applied Optics
External Links
Snippet
A general formula for the reflectance of a thin film with non-uniform thickness is derived based on expressing its thickness distribution density. Examples of such thickness distribution densities, corresponding to various shapes of the thickness non-uniformity, are …
- 239000010409 thin film 0 title abstract description 34
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infra-red light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical means
- G01B11/02—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating with measurement of polarization
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical means
- G01B11/02—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical means
- G01B11/02—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating with measurement of absorption or reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/57—Measuring gloss
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/636—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited using an arrangement of pump beam and probe beam; using the measurement of optical non-linear properties
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Mahjoub et al. | Influence of methane concentration on the optical indices of Titan’s aerosols analogues | |
Nečas et al. | Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films | |
Ohlídal et al. | Measurement of the thickness distribution and optical constants of non-uniform thin films | |
Nečas et al. | The reflectance of non-uniform thin films | |
Zhang et al. | Determination of infrared refractive index of ZnS and YbF3 thin films by spectroscopy | |
Nečas et al. | Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry | |
Hajakbari et al. | Optical properties of amorphous AlN thin films on glass and silicon substrates grown by single ion beam sputtering | |
Prachachet et al. | Investigation of optical characteristics of the evaporated Ta2O5 thin films based on ellipsometry and spectroscopy | |
Kanclíř et al. | Precision of silicon oxynitride refractive-index profile retrieval using optical characterization | |
Hilfiker et al. | Using interference enhancement to increase the information content of spectroscopic ellipsometry measurements | |
Franta et al. | Optical characterization of diamond-like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry | |
US20210079513A1 (en) | In Situ Density Control During Fabrication Of Thin Film Materials | |
Huasong et al. | Physical model of optical constants of SiO 2 thin films | |
Tikhonravov et al. | Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry | |
Irene et al. | In situ ellipsometry in microelectronics | |
Nevas et al. | Determination of thin-film parameters from high accuracy measurements of spectral regular transmittance | |
Jafar et al. | Jordan journal of physics | |
Zapien et al. | Real-time spectroscopic ellipsometry from 1.5 to 6.5 eV | |
McKerracher et al. | Thermal expansion coefficients and composition of sputter-deposited silicon oxynitride thin films | |
Ohlídal et al. | Optics of Inhomogeneous Thin Films with Defects: Application to Optical Characterization. Coatings 2021, 11, 22 | |
Kluska et al. | The Optical and Thermo-Optical Properties of Non-Stoichiometric Silicon Nitride Layers Obtained by the PECVD Method with Varying Levels of Nitrogen Content. Materials 2022, 15, 2260 | |
Shayapov et al. | Optical study of wedge-shaped films. Part I. Modeling | |
Liu et al. | Analysis and fabrication of antireflection coating with ultralow residual reflectance for single wavelength | |
Petrik | 2 Optical Characterization of | |
CN113466141A (en) | Method for nondestructive testing of metal substrate oxidation denaturation by using elliptical polarization spectrometer |