Nothing Special   »   [go: up one dir, main page]

Clergereaux et al., 2007 - Google Patents

Comparison between continuous and microwave oxygen plasma post-treatment on organosilicon plasma deposited layers: Effects on structure and properties

Clergereaux et al., 2007

Document ID
2365695532136082837
Author
Clergereaux R
Calafat M
Benitez F
Escaich D
de Larclause I
Raynaud P
Esteve J
Publication year
Publication venue
Thin Solid Films

External Links

Snippet

The aim of this work is to characterize and understand the effects of oxygen plasma post- treatments on plasma polymerized hexamethyldisiloxane (ppHMDSO) layers, as these post- treatments on plasma polymerized layers are an alternative way to produce SiOx (x≈ 2) …
Continue reading at www.sciencedirect.com (other versions)

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0272Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

Similar Documents

Publication Publication Date Title
Manakhov et al. Optimization of cyclopropylamine plasma polymerization toward enhanced layer stability in contact with water
Drábik et al. Super‐Hydrophobic Coatings Prepared by RF Magnetron Sputtering of PTFE
Despax et al. Deposition of “polysiloxane” thin films containing silver particles by an RF asymmetrical discharge
KR102051328B1 (en) Gas barrier film
Danilov et al. Modification of Polydimethylsiloxane Thin Films in H2 Radio‐frequency Plasma Investigated by Infrared Reflection Absorption Spectroscopy
Hegemann et al. Energy conversion efficiency in low-and atmospheric-pressure plasma polymerization processes, Part II: HMDSO
Hovish et al. Open air plasma deposition of superhydrophilic titania coatings
Polonskyi et al. Deposition of Al nanoparticles and their nanocomposites using a gas aggregation cluster source
Steves et al. Silicon oxide barrier films deposited on PET foils in pulsed plasmas: influence of substrate bias on deposition process and film properties
Marquardt et al. Protecting silver cultural heritage objects with atomic layer deposited corrosion barriers
Mitschker et al. Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface‐Near Regions During the Deposition of SiOx Films
Hussein et al. Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications
Pfuch et al. Characterization of SiO2 thin films prepared by plasma-activated chemical vapour deposition
Clergereaux et al. Comparison between continuous and microwave oxygen plasma post-treatment on organosilicon plasma deposited layers: Effects on structure and properties
Vernhes et al. Single-material inhomogeneous optical filters based on microstructural gradients in plasma-deposited silicon nitride
Jaritz et al. Comparison of HMDSO and HMDSN as precursors for high‐barrier plasma‐polymerized multilayer coating systems on polyethylene terephthalate films
Hoppe et al. Influence of organic surface chemistry on the nucleation of plasma deposited SiOx films
Meshkova et al. The role of the gradient film properties in silica moisture barriers synthesized in a roll‐to‐roll atmospheric pressure plasma enhanced CVD reactor
Levrau et al. Atomic layer deposition of TiO2 on surface modified nanoporous low-k films
Twomey et al. Properties of Siloxane Coatings Deposited in a Reel‐to‐Reel Atmospheric Pressure Plasma System
Kuzminova et al. Barrier coatings on polymeric foils for food packaging
Baek et al. Intense pulsed UV light treatment to design functional optical films from perhydropolysilazane: an alternative to conventional heat treatment processes
Vernhes et al. Plasma treatment of porous SiNx: H films for the fabrication of porous-dense multilayer optical filters with tailored interfaces
Jedrzejczak et al. Carbon coatings with high concentrations of silicon deposited by RF PECVD method at relatively high self-bias
Choudhury et al. Studies of radiofrequency plasma deposition of hexamethyldisiloxane films and their thermal stability and corrosion resistance behavior