Nothing Special   »   [go: up one dir, main page]

Petty et al., 1986 - Google Patents

High‐power radio‐frequency plasma source

Petty et al., 1986

View PDF
Document ID
16242484398488112033
Author
Petty C
Smith D
Publication year
Publication venue
Review of scientific instruments

External Links

Snippet

A high‐power radio‐frequency plasma source was built and tested for an antenna frequency of 2.45 MHz. A puff valve fed hydrogen gas into a plasma chamber made from 4‐in.‐diam Pyrex tubing. A helical antenna was wound directly around this chamber. The plasma …
Continue reading at dspace.mit.edu (PDF) (other versions)

Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometer or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/34—Dynamic spectrometers
    • H01J49/42—Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
    • H01J49/4205—Device types
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/14—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/02—Constructional details

Similar Documents

Publication Publication Date Title
Chen Experiments on helicon plasma sources
Perry et al. The application of the helicon source to plasma processing
Sakudo et al. Microwave ion source
Moiseenko et al. RF plasma production and heating below ion-cyclotron frequencies in Uragan torsatrons
Booth et al. The transition from symmetric to asymmetric discharges in pulsed 13.56 MHz capacitively coupled plasmas
Golubev et al. Formation of multi-charged ions and plasma stability at quasigasdynamic plasma confinement in a mirror magnetic trap
Skalyga et al. Gasdynamic ECR source of multicharged ions based on a cusp magnetic trap
Root et al. Experimental performance of a microwave cavity plasma disk ion source
Kelly et al. Laser ionization and radio frequency sustainment of high-pressure seeded plasmas
Zhu et al. A new argon‐ion laser based on an electrodeless plasma
CN112424901A (en) Low corrosion internal ion source for cyclotron
Petty et al. High‐power radio‐frequency plasma source
Lee et al. Ion energy spread and current measurements of the rf-driven multicusp ion source
US5350974A (en) Coaxial electromagnetic wave injection and electron cyclotron resonance ion source
Shamrai et al. Discharge disruptions in a helicon plasma source
Tong-Zhen et al. Helicon discharge using a Nagoya type III antenna
Edamura et al. Effects of voltage distribution along an induction coil and discharge frequency in inductively coupled plasmas
Sortais General review of recent developments for electron cyclotron resonance ion sources
Ganguli et al. Feed optimization for the slotted line antenna for high-density plasma production
Amemiya et al. Multicusp type machine for electron cyclotron resonance plasma with reduced dimensions
Geddes et al. Enhanced dissociation of molecular nitrogen in a microwave plasma with an applied magnetic field
Bolshukhin et al. Negative hydrogen ions and evidence for a potential dip in an electron cyclotron resonance discharge for highly charged ions
Peters New developments in rf-and filament-volume H− ion sources for accelerators
Yin et al. Coherent microwave generation from a pseudospark cathode Cherenkov maser
Mavrogenes et al. High charge picosecond pulses with a double gap subharmonic buncher